- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devicesmaterials therefororiginals thereforapparatus specially adapted therefor
- G03F 1/70 - Adapting basic layout or design of masks to lithographic process requirements, e.g. second iteration correction of mask patterns for imaging
Patent holdings for IPC class G03F 1/70
Total number of patents in this class: 721
10-year publication summary
|
46
|
58
|
48
|
64
|
82
|
70
|
87
|
56
|
46
|
12
|
| 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 | 2026 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Taiwan Semiconductor Manufacturing Company, Ltd. | 47734 |
184 |
| ASML Netherlands B.V. | 7785 |
94 |
| Samsung Electronics Co., Ltd. | 155224 |
59 |
| Synopsys, Inc. | 2729 |
43 |
| D2s, Inc. | 196 |
23 |
| United Microelectronics Corp. | 4463 |
21 |
| Kioxia Corporation | 10727 |
15 |
| Carl Zeiss SMT GmbH | 3258 |
14 |
| International Business Machines Corporation | 62325 |
12 |
| Canon Inc. | 42633 |
11 |
| Applied Materials, Inc. | 20145 |
10 |
| KLA Corporation | 1812 |
10 |
| Intel Corporation | 46737 |
7 |
| Tokyo Electron Limited | 13617 |
7 |
| Nikon Corporation | 7284 |
7 |
| Lam Research Corporation | 5560 |
7 |
| GLOBALFOUNDRIES U.S. Inc. | 6397 |
7 |
| Google LLC | 44062 |
7 |
| Siemens Industry Software Inc. | 1747 |
7 |
| DTS, Inc. | 380 |
6 |
| Other owners | 170 |