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G03F 1/00
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Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticlesMask blanks or pellicles thereforContainers specially adapted thereforPreparation thereof |
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G03F 1/02
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by photographic processes for production of originals simulating relief |
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G03F 1/04
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by montage processes |
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G03F 1/06
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from printing surfaces |
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G03F 1/08
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Originals having inorganic imaging layers, e.g. chrome masks (G03F 1/12 takes precedence);; |
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G03F 1/10
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by exposing and washing out pigmented or coloured organic layers; by colouring macromolecular patterns |
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G03F 1/12
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by exposing silver-halide-containing photosensitive materials or diazo-type photosensitive materials |
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G03F 1/14
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Originals characterised by structural details, e.g. supports, cover layers, pellicle rings |
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G03F 1/16
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Originals having apertures, e.g. for corpuscular lithography |
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G03F 1/20
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Masks or mask blanks for imaging by charged particle beam [CPB] radiation, e.g. by electron beamPreparation thereof |
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G03F 1/22
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Masks or mask blanks for imaging by radiation of 100 nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masksPreparation thereof |
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G03F 1/24
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Reflection masksPreparation thereof |
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G03F 1/26
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Phase shift masks [PSM]PSM blanksPreparation thereof |
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G03F 1/28
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Phase shift masks [PSM]PSM blanksPreparation thereof with three or more diverse phases on the same PSMPreparation thereof |
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G03F 1/29
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Rim PSM or outrigger PSMPreparation thereof |
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G03F 1/30
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Alternating PSM, e.g. Levenson-Shibuya PSMPreparation thereof |
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G03F 1/32
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Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portionPreparation thereof |
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G03F 1/34
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Phase-edge PSM, e.g. chromeless PSMPreparation thereof |
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G03F 1/36
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Masks having proximity correction featuresPreparation thereof, e.g. optical proximity correction [OPC] design processes |
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G03F 1/38
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Masks having auxiliary features, e.g. special coatings or marks for alignment or testingPreparation thereof |
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G03F 1/40
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Electrostatic discharge [ESD] related features, e.g. antistatic coatings or a conductive metal layer around the periphery of the mask substrate |
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G03F 1/42
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Alignment or registration features, e.g. alignment marks on the mask substrates |
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G03F 1/44
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Testing or measuring features, e.g. grid patterns, focus monitors, sawtooth scales or notched scales |
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G03F 1/46
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Antireflective coatings |
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G03F 1/48
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Protective coatings |
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G03F 1/50
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Mask blanks not covered by groups Preparation thereof |
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G03F 1/52
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Reflectors |
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G03F 1/54
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Absorbers, e.g. opaque materials |
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G03F 1/56
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Organic absorbers, e.g. photo-resists |
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G03F 1/58
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Absorbers, e.g. opaque materials having two or more different absorber layers, e.g. stacked multilayer absorbers |
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G03F 1/60
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Substrates |
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G03F 1/62
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Pellicles or pellicle assemblies, e.g. having membrane on support framePreparation thereof |
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G03F 1/64
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Pellicles or pellicle assemblies, e.g. having membrane on support framePreparation thereof characterised by the frames, e.g. structure or material thereof |
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G03F 1/66
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Containers specially adapted for masks, mask blanks or pelliclesPreparation thereof |
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G03F 1/68
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Preparation processes not covered by groups |
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G03F 1/70
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Adapting basic layout or design of masks to lithographic process requirements, e.g. second iteration correction of mask patterns for imaging |
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G03F 1/72
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Repair or correction of mask defects |
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G03F 1/74
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Repair or correction of mask defects by charged particle beam [CPB], e.g. focused ion beam |
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G03F 1/76
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Patterning of masks by imaging |
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G03F 1/78
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Patterning of masks by imaging by charged particle beam [CPB], e.g. electron beam |
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G03F 1/80
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Etching |
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G03F 1/82
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Auxiliary processes, e.g. cleaning |
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G03F 1/84
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Inspecting |
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G03F 1/86
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Inspecting by charged particle beam [CPB] |
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G03F 1/88
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Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticlesMask blanks or pellicles thereforContainers specially adapted thereforPreparation thereof prepared by photographic processes for producing originals simulating relief |
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G03F 1/90
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Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticlesMask blanks or pellicles thereforContainers specially adapted thereforPreparation thereof prepared by montage processes |
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G03F 1/92
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Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticlesMask blanks or pellicles thereforContainers specially adapted thereforPreparation thereof prepared from printing surfaces |
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G03F 3/00
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Colour separationCorrection of tonal value |
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G03F 3/02
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Colour separationCorrection of tonal value by retouching |
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G03F 3/04
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Colour separationCorrection of tonal value by photographic means |
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G03F 3/06
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Colour separationCorrection of tonal value by photographic means by masking |
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G03F 3/08
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Colour separationCorrection of tonal value by photoelectric means |
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G03F 3/10
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Checking the colour or tonal value of separation negatives or positives |
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G03F 5/00
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Screening processesScreens therefor |
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G03F 5/02
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Screening processesScreens therefor by projecting methods |
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G03F 5/04
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Screening processesScreens therefor by projecting methods changing the screen effect |
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G03F 5/06
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Screening processesScreens therefor by projecting methods changing the diaphragm effect |
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G03F 5/08
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Screening processesScreens therefor by projecting methods using line screens |
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G03F 5/10
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Screening processesScreens therefor by projecting methods using cross-line screens |
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G03F 5/12
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Screening processesScreens therefor by projecting methods using other screens, e.g. granulated screen |
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G03F 5/14
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Screening processesScreens therefor by contact methods |
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G03F 5/16
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Screening processesScreens therefor by contact methods using grey half-tone screens |
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G03F 5/18
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Screening processesScreens therefor by contact methods using colour half-tone screens |
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G03F 5/20
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Screening processesScreens therefor using screens for gravure printing |
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G03F 5/22
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Screening processesScreens therefor combining several screensElimination of moire |
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G03F 5/24
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Screening processesScreens therefor by multiple exposure, e.g. combined processes for line photo and screen |
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G03F 7/00
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Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor |
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G03F 7/04
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Chromates |
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G03F 7/06
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Silver salts |
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G03F 7/07
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Silver salts used for diffusion transfer |
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G03F 7/008
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Azides |
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G03F 7/09
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Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers |
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G03F 7/11
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Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers |
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G03F 7/12
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Production of screen printing forms or similar printing forms, e.g. stencils |
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G03F 7/14
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Production of collotype printing forms |
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G03F 7/16
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Coating processesApparatus therefor |
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G03F 7/18
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Coating curved surfaces |
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G03F 7/20
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ExposureApparatus therefor |
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G03F 7/021
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Macromolecular diazonium compoundsMacromolecular additives, e.g. binders |
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G03F 7/22
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Exposing sequentially with the same light pattern different positions of the same surface |
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G03F 7/23
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Automatic means therefor |
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G03F 7/24
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Curved surfaces |
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G03F 7/025
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Non-macromolecular photopolymerisable compounds having carbon-to-carbon triple bonds, e.g. acetylenic compounds |
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G03F 7/26
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Processing photosensitive materialsApparatus therefor |
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G03F 7/027
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Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds |
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G03F 7/28
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Processing photosensitive materialsApparatus therefor for obtaining powder images |
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G03F 7/029
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Inorganic compoundsOnium compoundsOrganic compounds having hetero atoms other than oxygen, nitrogen or sulfur |
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G03F 7/30
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Imagewise removal using liquid means |
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G03F 7/031
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Organic compounds not covered by group |
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G03F 7/32
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Liquid compositions therefor, e.g. developers |
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G03F 7/033
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Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers |
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G03F 7/34
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Imagewise removal by selective transfer, e.g. peeling away |
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G03F 7/035
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Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyurethanes |
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G03F 7/36
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Imagewise removal not covered by groups , e.g. using gas streams, using plasma |
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G03F 7/037
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Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyamides or polyimides |
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G03F 7/38
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Treatment before imagewise removal, e.g. prebaking |
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G03F 7/039
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Macromolecular compounds which are photodegradable, e.g. positive electron resists |
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G03F 7/40
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Treatment after imagewise removal, e.g. baking |
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G03F 7/42
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Stripping or agents therefor |
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G03F 7/075
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Silicon-containing compounds |
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G03F 7/085
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Photosensitive compositions characterised by adhesion-promoting non-macromolecular additives |
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G03F 7/095
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Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer |
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G03F 7/105
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Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images |
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G03F 7/115
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Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having supports or layers with means for obtaining a screen effect or for obtaining better contact in vacuum printing |
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G03F 7/207
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Means for focusing, e.g. automatically |
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G03F 7/213
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Exposing with the same light pattern different positions of the same surface at the same time |
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G03F 9/00
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Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically |
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G03F 9/02
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Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically combined with means for automatic focusing |
