- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devicesmaterials therefororiginals thereforapparatus specially adapted therefor
- G03F 7/207 - Means for focusing, e.g. automatically
Patent holdings for IPC class G03F 7/207
Total number of patents in this class: 34
10-year publication summary
|
2
|
5
|
2
|
3
|
1
|
0
|
0
|
1
|
2
|
1
|
| 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 | 2026 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Nikon Corporation | 7229 |
2 |
| ASML Netherlands B.V. | 7987 |
2 |
| Dai Nippon Printing Co., Ltd. | 4254 |
2 |
| Northwestern University | 3564 |
2 |
| Shanghai Micro Electronics Equipment (Group) Co., Ltd. | 192 |
2 |
| International Business Machines Corporation | 62754 |
1 |
| Panasonic Corporation | 18809 |
1 |
| Applied Materials, Inc. | 20514 |
1 |
| Taiwan Semiconductor Manufacturing Company, Ltd. | 48629 |
1 |
| ASML Holding N.V. | 487 |
1 |
| Cymer, LLC | 418 |
1 |
| Carl Zeiss SMT GmbH | 3356 |
1 |
| Fujikura Ltd. | 3110 |
1 |
| Asahi Kasei E-materials Corporation | 202 |
1 |
| Dexerials Corporation | 2005 |
1 |
| Eran & Jan, Inc | 2 |
1 |
| Esko-Graphics Imaging GmbH | 90 |
1 |
| Prodways | 7 |
1 |
| Screen Holdings Co., Ltd. | 3198 |
1 |
| Shanghai Micro Electronics Equipment Co., Ltd. | 49 |
1 |
| Other owners | 9 |