- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devicesmaterials therefororiginals thereforapparatus specially adapted therefor
- G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
Patent holdings for IPC class G03F 7/00
Total number of patents in this class: 10370
10-year publication summary
591
|
590
|
649
|
664
|
611
|
688
|
947
|
972
|
1429
|
812
|
2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 |
Principal owners for this class
Owner |
All patents
|
This class
|
---|---|---|
ASML Netherlands B.V. | 7381 |
1017 |
Canon Inc. | 39818 |
734 |
FUJIFILM Corporation | 29350 |
632 |
Taiwan Semiconductor Manufacturing Company, Ltd. | 42636 |
478 |
Carl Zeiss SMT GmbH | 2976 |
387 |
Samsung Electronics Co., Ltd. | 145864 |
230 |
Applied Materials, Inc. | 18589 |
204 |
Kioxia Corporation | 10289 |
162 |
Boe Technology Group Co., Ltd. | 41047 |
150 |
Tokyo Electron Limited | 12694 |
141 |
Samsung SDI Co., Ltd. | 8276 |
127 |
Shin-Etsu Chemical Co., Ltd. | 5651 |
115 |
LG Chem, Ltd. | 17620 |
111 |
KLA Corporation | 1543 |
107 |
Molecular Imprints, Inc. | 266 |
106 |
Samsung Display Co., Ltd. | 34641 |
100 |
Konica Minolta Medical & Graphic, Inc. | 785 |
83 |
Tokyo Ohka Kogyo Co., Ltd. | 1543 |
82 |
Gigaphoton Inc. | 1227 |
78 |
Micron Technology, Inc. | 26258 |
72 |
Other owners | 5254 |