- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devicesmaterials therefororiginals thereforapparatus specially adapted therefor
- G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
Patent holdings for IPC class G03F 7/00
Total number of patents in this class: 10619
10-year publication summary
584
|
580
|
637
|
654
|
607
|
690
|
962
|
1003
|
1436
|
999
|
2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 |
Principal owners for this class
Owner |
All patents
|
This class
|
---|---|---|
ASML Netherlands B.V. | 7429 |
1063 |
Canon Inc. | 40280 |
746 |
FUJIFILM Corporation | 29506 |
634 |
Taiwan Semiconductor Manufacturing Company, Ltd. | 43158 |
492 |
Carl Zeiss SMT GmbH | 3016 |
418 |
Samsung Electronics Co., Ltd. | 147334 |
242 |
Applied Materials, Inc. | 18819 |
216 |
Kioxia Corporation | 10346 |
163 |
Boe Technology Group Co., Ltd. | 41461 |
151 |
Tokyo Electron Limited | 12841 |
145 |
Samsung SDI Co., Ltd. | 8494 |
129 |
KLA Corporation | 1598 |
122 |
Shin-Etsu Chemical Co., Ltd. | 5680 |
119 |
LG Chem, Ltd. | 17643 |
111 |
Molecular Imprints, Inc. | 264 |
106 |
Samsung Display Co., Ltd. | 35100 |
100 |
Tokyo Ohka Kogyo Co., Ltd. | 1545 |
86 |
Gigaphoton Inc. | 1240 |
84 |
Konica Minolta Medical & Graphic, Inc. | 760 |
80 |
Micron Technology, Inc. | 26164 |
73 |
Other owners | 5339 |