- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devicesmaterials therefororiginals thereforapparatus specially adapted therefor
- G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
Patent holdings for IPC class G03F 7/00
Total number of patents in this class: 11876
10-year publication summary
|
591
|
649
|
665
|
613
|
702
|
1033
|
1120
|
1471
|
1474
|
653
|
| 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 | 2026 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| ASML Netherlands B.V. | 7785 |
1326 |
| Canon Inc. | 42633 |
818 |
| FUJIFILM Corporation | 30327 |
626 |
| Taiwan Semiconductor Manufacturing Company, Ltd. | 47734 |
614 |
| Carl Zeiss SMT GmbH | 3258 |
577 |
| Samsung Electronics Co., Ltd. | 155224 |
293 |
| Applied Materials, Inc. | 20145 |
250 |
| Tokyo Electron Limited | 13617 |
179 |
| Shin-Etsu Chemical Co., Ltd. | 5997 |
174 |
| KLA Corporation | 1812 |
171 |
| Kioxia Corporation | 10727 |
169 |
| Samsung SDI Co., Ltd. | 10194 |
155 |
| Boe Technology Group Co., Ltd. | 43343 |
152 |
| Gigaphoton Inc. | 1313 |
117 |
| LG Chem, Ltd. | 17883 |
110 |
| Samsung Display Co., Ltd. | 38092 |
107 |
| Molecular Imprints, Inc. | 232 |
106 |
| Tokyo Ohka Kogyo Co., Ltd. | 1544 |
91 |
| Cymer, LLC | 405 |
78 |
| Nikon Corporation | 7284 |
76 |
| Other owners | 5687 |