- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devicesmaterials therefororiginals thereforapparatus specially adapted therefor
- G03F 1/58 - Absorbers, e.g. opaque materials having two or more different absorber layers, e.g. stacked multilayer absorbers
Patent holdings for IPC class G03F 1/58
Total number of patents in this class: 166
10-year publication summary
7
|
10
|
18
|
23
|
18
|
24
|
11
|
10
|
5
|
4
|
2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 |
Principal owners for this class
Owner |
All patents
|
This class
|
---|---|---|
Hoya Corporation | 2734 |
63 |
Taiwan Semiconductor Manufacturing Company, Ltd. | 41731 |
20 |
Shin-Etsu Chemical Co., Ltd. | 5560 |
15 |
Applied Materials, Inc. | 18269 |
12 |
Samsung Electronics Co., Ltd. | 142777 |
5 |
LG Chem, Ltd. | 17503 |
4 |
Agc, Inc. | 4663 |
4 |
S&S Tech Co., Ltd. | 29 |
4 |
Toppan Photomask Co., Ltd. | 42 |
4 |
Kioxia Corporation | 10256 |
3 |
Samsung Display Co., Ltd. | 33900 |
2 |
Nikon Corporation | 7149 |
2 |
Carl Zeiss SMT GmbH | 2912 |
2 |
Boe Technology Group Co., Ltd. | 40311 |
2 |
GLOBALFOUNDRIES U.S. Inc. | 6439 |
2 |
Toppan Printing Co., Ltd. | 2141 |
2 |
KLA Corporation | 1492 |
2 |
WI-A Corporation | 17 |
2 |
Tekscend Photomask Corp. | 27 |
2 |
Apple Inc. | 54076 |
1 |
Other owners | 13 |