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2024
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Invention
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Reverse photomask that phase shift film pattern is used for reflective pattern, and blankmask for... |
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Invention
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Frame assembly used for mounting pellicle on photomask.
A frame assembly for mounting a pellicle... |
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Invention
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Phase shift blankmask and photomask for euv lithography with absorbing film of crsb.
Blankmasks ... |
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2023
|
Invention
|
Extreme ultraviolet lithography blankmask and photomask comprising highly reflective phase shift ... |
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Invention
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Phase shift blankmask and photomask for euv lithography.
Disclosed is a blankmask for EUV lithog... |
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Invention
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Blankmask for euv lithography with absorbing film, and photomask fabricated with the same.
Blank... |
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Invention
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Pellicle for euv lithography.
The pellicle has a pellicle portion that allows transmission of EU... |
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2022
|
Invention
|
Phase shift blankmask and photomask for euv lithography. A blankmask for extreme ultraviolet lith... |
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2021
|
Invention
|
Phase shift blankmask and photomask for euv lithography. A blankmask for EUV lithography includes... |
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Invention
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Reflective type blankmask and photomask for euv. Disclosed is a blankmask for EUV includes a subs... |
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2020
|
Invention
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Pellicle for euv lithography, and method for manufacturing the same.
A pellicle for extreme ultr... |
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|
Invention
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Reflective type blankmask for euv, and method for manufacturing the same. A blankmask for EUV inc... |
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|
Invention
|
Blankmask with backside conductive layer, and photomask manufactured with the same.
A blankmask ... |
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|
Invention
|
Blankmask and photomask for extreme ultraviolet lithography. A blankmask for extreme ultraviolet ... |
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|
Invention
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Half-tone attenuated phase shift blankmask and photomask for euv lithography. The disclosure rela... |
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|
Invention
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Pellicle for extreme ultraviolet lithography using boron nitride nanotube and method for producin... |
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Invention
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Blankmask and photomask.
A blankmask includes a transparent substrate, a phase-shift film, and a... |
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2019
|
Invention
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Pellicle for euv lithography and method for manufacturing the same.
Disclosed is a pellicle for ... |
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|
Invention
|
Blankmask and photomask.
A blankmask includes a hard film and a light-shielding film formed on a... |
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Invention
|
Blank mask and photomask. A blank mask includes a light-shielding film and a hard film which are ... |
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2018
|
Invention
|
Blankmask and photomask, and methods of fabricating the same. A blankmask according to the presen... |
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Invention
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Pellicle for euv lithography and method of fabricating the same. Disclosed is a pellicle for extr... |
|
|
Invention
|
Phase-shift blankmask and method of fabricating the same.
A phase-shift blankmask according to t... |
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|
Invention
|
Phase-shift blankmask and phase-shift photomask.
Disclosed are a phase-shift blankmask and a pha... |
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|
Invention
|
Pellicle for euv lithography and method of fabricating the same. Disclosed are a pellicle for an ... |
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2015
|
Invention
|
Phase shift blankmask and photomask. Disclosed is a phase-shift blankmask for manufacturing a pho... |
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|
Invention
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Blankmask and photomask using the same. Disclosed are a blankmask and a photomask, in which compo... |
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|
Invention
|
Phase-shift blankmask and photomask. Disclosed is a phase-shift blankmask, in which a light-shiel... |
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|
Invention
|
Blankmask and photomask using the same. A blankmask and a photomask using the same are provided. ... |
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2014
|
Invention
|
Blankmask and photomask. 2 gas in an electron-beam repair process. |
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2013
|
Invention
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Blankmask and method for fabricating photomask using the same. Provided is a blankmask with a lig... |
|
|
Invention
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Phase-shift blankmask and method for fabricating the same. Provided is a phase-shift blankmask in... |
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2012
|
Invention
|
Mask blank, photomask, and method for manufacturing same. Provided are a method of manufacturing ... |
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Invention
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Mask blank, photomask, and method for manufacturing same. The present invention provides a method... |
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Invention
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Blankmask and photomask using the same. Provided is a blankmask for a hardmask. In the blankmask,... |
