- All sections
- C - Chemistrymetallurgy
- C23F - Non-mechanical removal of metallic material from surfacesinhibiting corrosion of metallic materialinhibiting incrustation in generalmulti-step processes for surface treatment of metallic material involving at least one process provided for in class and at least one process covered by subclass or or class
- C23F 1/12 - Gaseous compositions
Patent holdings for IPC class C23F 1/12
Total number of patents in this class: 195
10-year publication summary
|
20
|
9
|
18
|
19
|
15
|
12
|
22
|
13
|
11
|
8
|
| 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Tokyo Electron Limited | 12712 |
24 |
| ASM IP Holding B.V. | 2077 |
20 |
| Applied Materials, Inc. | 18621 |
19 |
| Central Glass Company, Limited | 1265 |
12 |
| Taiwan Semiconductor Manufacturing Company, Ltd. | 42704 |
6 |
| Lam Research Corporation | 5239 |
5 |
| Beijing NMC Co., Ltd. | 113 |
5 |
| Beijing E-town Semiconductor Technology, Co., Ltd | 284 |
4 |
| BASF SE | 20933 |
3 |
| Centre National de La Recherche Scientifique | 10418 |
3 |
| Headway Technologies, Inc. | 694 |
3 |
| Showa Denko K.K. | 2230 |
3 |
| National Oilwell Varco, L.P. | 1671 |
3 |
| The Regents of the University of Colorado, a body corporate | 2644 |
3 |
| Tokyo Electron U.S. Holdings, Inc | 743 |
3 |
| Hitachi High-Tech Corporation | 5310 |
3 |
| Heraeus Electronics GmbH & Co. KG | 101 |
3 |
| Merck Patent GmbH | 5831 |
2 |
| Robert Bosch GmbH | 42689 |
2 |
| Semiconductor Energy Laboratory Co., Ltd. | 11403 |
2 |
| Other owners | 67 |