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2025
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Invention
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Apparatus for plasma processing. An apparatus for plasma processing includes an insulating struct... |
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Invention
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Wet processing system and nozzle for dispensing a liquid laterally across a semiconductor wafer. ... |
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2024
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Invention
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Anti-spacer masking process using resist layer with solubility shifting agent. A method for formi... |
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Invention
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Method for selective exposure of wafer to corrective irradiation at a per-die level. A method of ... |
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Invention
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Direct current superposition (dcs) for protection of organic mandrel during spacer deposition. Me... |
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Invention
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Method for etching a pattern in a layer of a substrate. A method for etching a pattern in a layer... |
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Invention
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Substrate support with printed heater. A substrate support includes a top plate including a diele... |
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Invention
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Integrated optical nanothermometry for real-time wafer temperature monitoring during processing. ... |
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Invention
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Sidewall metal contact integration through the direct etch of a merged source-and-drain contact. ... |
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Invention
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Contact patterning. A method of forming contacts includes forming a conformal etch stop layer ove... |
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Invention
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Selective etching in semiconductor devices. A method includes providing a workpiece in an etching... |
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Invention
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Sidewall metal contact formation through incorporation of a replacement metal contact integration... |
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Invention
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Systems and methods for panel polishing. Methods of manufacturing a semiconductor device are disc... |
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Invention
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Method and system for plasma process. A method for plasma processing includes providing a tailore... |
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Invention
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Correcting of design and mask shape position due to die and wafer distortion for bonding. Aspects... |
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Invention
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Critical dimension uniformity tuning based on mask design feature density. A method of processing... |
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Invention
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Reversible overcoat compositions. Reversible overcoat compositions for overcoating structures dur... |
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Invention
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Method and system for plasma process. A method for generating a bias voltage includes generating ... |
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Invention
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Wafer support for measuring wafer geometry. A wafer measurement stage for supporting a semiconduc... |
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Invention
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Device and method for determining wafer bow. An apparatus for measuring bow of a wafer includes a... |
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Invention
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Area selective deposition of metals for electronic devices. Method for area selective deposition ... |
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Invention
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Oxidation based atomic layer etching. Atomic layer etching is provided. A method can include form... |
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Invention
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Methods of forming semiconductor cladding layers for source and drain contacts and sidewall metal... |
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Invention
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High aspect ratio carbon layer etch with improved throughput and process window. Various embodime... |
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Invention
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Selective deposition on metal-containing mask using promoter. A method includes of selective depo... |
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Invention
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Methods for protecting a peripheral edge and backside of a semiconductor substrate. Various embod... |
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Invention
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Selective non-plasma deposition of mask protection material. A method for selectively depositing ... |
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Invention
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Methods of forming ferroelectric devices. A method of forming a ferroelectric device includes for... |
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Invention
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Methods for wet atomic layer etching of transition metal oxide dielectric materials. 22x(1-x)22 d... |
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Invention
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Methods of estimating line width and systems thereof. A method for estimating line width of a pat... |
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Invention
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Plasma processing system with direct current superposition. A plasma processing system is disclos... |
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Invention
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Balanced resonator source for plasma processing. According to an embodiment, a plasma processing ... |
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Invention
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Methods and structures for improving etch profile of metallic layer. A method for fabricating sem... |
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Invention
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Multiple input post mix showerhead. Aspects of the present disclosure provide an apparatus, which... |
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Invention
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Low resistance liner. A method of processing a substrate includes forming an amorphous silicon (a... |
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Invention
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Device fabrication methods with ion beam processing. A method for fabricating a photonic integrat... |
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Invention
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Wafer bonding overlay measurement system. A method for overlay measurement is disclosed. The meth... |
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Invention
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Optical metrology. A method for monitoring a plurality of process chambers, the method includes g... |
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Invention
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Plasma processing with phase-locked waveforms. A plasma processing method includes applying AC wa... |
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Invention
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Layer by layer etch process. A method of forming a device, the method includes loading a substrat... |
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Invention
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Plasma process for etching a multilayer stack. A method for patterning includes having a substrat... |
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Invention
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Methods for forming vertically layered ionic liquid crystal (ilc) structures on a semiconductor s... |
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Invention
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Sub-millisecond optical detection of pulsed plasma processes. An optical emission spectroscopy (O... |
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Invention
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Endpoint detection in dry development of photoresist. A method of endpoint detection includes per... |
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Invention
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Method of forming a memory device in a recessed feature. A method of forming a memory device on a... |
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Invention
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Wafer bow metrology system. Aspects of the present disclosure provide a metrology system for meas... |
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Invention
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Method to pattern a semiconductor substrate using a multilayer photoresist film stack. Embodiment... |
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Invention
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Methods for patterning a semiconductor substrate using metalate salt ionic liquid crystals. Embod... |
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Invention
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Method and system for plasma process. A method for a plasma process includes generating plasma wi... |
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Invention
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Torsional shear testing for semiconductor surface bonds. A method of testing semiconductor surfac... |
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2019
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G/S
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Semiconductor manufacturing support services, namely, repair
or maintenance of semiconductor man... |
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G/S
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Semiconductor manufacturing support services, namely, technical support services in the nature of... |
