- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devicesmaterials therefororiginals thereforapparatus specially adapted therefor
- G03F 1/74 - Repair or correction of mask defects by charged particle beam [CPB], e.g. focused ion beam
Patent holdings for IPC class G03F 1/74
Total number of patents in this class: 119
10-year publication summary
|
5
|
7
|
8
|
7
|
2
|
18
|
19
|
14
|
8
|
12
|
| 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 | 2026 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Carl Zeiss SMT GmbH | 3345 |
50 |
| Hoya Corporation | 2691 |
14 |
| Taiwan Semiconductor Manufacturing Company, Ltd. | 48539 |
11 |
| Samsung Electronics Co., Ltd. | 158337 |
9 |
| D2s, Inc. | 199 |
4 |
| Varian Semiconductor Equipment Associates, Inc. | 1182 |
3 |
| Carl Zeiss SMS Ltd. | 56 |
3 |
| Toppan Photomask Co., Ltd. | 34 |
3 |
| Hitachi High-Tech Analysis Corporation | 285 |
3 |
| Intel Corporation | 47069 |
2 |
| Applied Materials, Inc. | 20459 |
2 |
| V Technology Co., Ltd. | 381 |
2 |
| ASML Netherlands B.V. | 7959 |
1 |
| Bruker Nano, Inc. | 381 |
1 |
| Carl Zeiss SMS GmbH | 46 |
1 |
| IMS Nanofabrication GmbH | 61 |
1 |
| KLA-Tencor Corporation | 2518 |
1 |
| Semiconductor Manufacturing International (Beijing) Corporation | 1031 |
1 |
| Semiconductor Manufacturing International (Shanghai) Corporation | 1732 |
1 |
| Carl Zeiss SMT Inc. | 9 |
1 |
| Other owners | 5 |