- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devicesmaterials therefororiginals thereforapparatus specially adapted therefor
- G03F 1/32 - Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portionPreparation thereof
Patent holdings for IPC class G03F 1/32
Total number of patents in this class: 370
10-year publication summary
|
25
|
27
|
48
|
37
|
36
|
32
|
52
|
26
|
27
|
6
|
| 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Hoya Corporation | 2745 |
136 |
| Shin-Etsu Chemical Co., Ltd. | 5658 |
48 |
| Taiwan Semiconductor Manufacturing Company, Ltd. | 42704 |
19 |
| SK Enpulse Co., Ltd. | 63 |
16 |
| Agc, Inc. | 4839 |
14 |
| Dai Nippon Printing Co., Ltd. | 4082 |
12 |
| Boe Technology Group Co., Ltd. | 41139 |
12 |
| Samsung Display Co., Ltd. | 34696 |
10 |
| Toppan Photomask Co., Ltd. | 42 |
8 |
| Shenzhen China Star Optoelectronics Technology Co., Ltd. | 8478 |
7 |
| Samsung Electronics Co., Ltd. | 146092 |
5 |
| Hoya Electronics Singapore Pte. Ltd. | 10 |
5 |
| Nikon Corporation | 7163 |
4 |
| ASML Netherlands B.V. | 7385 |
4 |
| Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd. | 3715 |
4 |
| S&S Tech Co., Ltd. | 31 |
4 |
| Kioxia Corporation | 10290 |
4 |
| Tekscend Photomask Corp. | 30 |
4 |
| Beijing BOE Display Technology Co., Ltd. | 2793 |
3 |
| Toppan Printing Co., Ltd. | 2133 |
3 |
| Other owners | 48 |