- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devicesmaterials therefororiginals thereforapparatus specially adapted therefor
- G03F 1/26 - Phase shift masks [PSM]PSM blanksPreparation thereof
Patent holdings for IPC class G03F 1/26
Total number of patents in this class: 367
10-year publication summary
|
38
|
37
|
40
|
31
|
29
|
26
|
19
|
21
|
9
|
12
|
| 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 | 2026 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Hoya Corporation | 2691 |
64 |
| Taiwan Semiconductor Manufacturing Company, Ltd. | 48629 |
60 |
| Shin-Etsu Chemical Co., Ltd. | 6127 |
43 |
| Samsung Electronics Co., Ltd. | 158605 |
13 |
| Boe Technology Group Co., Ltd. | 44484 |
12 |
| Agc, Inc. | 5590 |
11 |
| S&S Tech Co., Ltd. | 33 |
11 |
| Applied Materials, Inc. | 20514 |
9 |
| SK Hynix Inc. | 12611 |
8 |
| ASML Netherlands B.V. | 7987 |
7 |
| Carl Zeiss SMT GmbH | 3356 |
7 |
| Samsung Display Co., Ltd. | 38914 |
6 |
| Beijing BOE Display Technology Co., Ltd. | 3010 |
6 |
| KLA-Tencor Corporation | 2517 |
4 |
| National Research Council of Canada | 1549 |
4 |
| Powerchip Semiconductor Manufacturing Corporation | 409 |
4 |
| Tekscend Photomask Corp. | 35 |
4 |
| Luminamask Co., Ltd. | 29 |
4 |
| Nikon Corporation | 7229 |
3 |
| Shenzhen China Star Optoelectronics Technology Co., Ltd. | 8471 |
3 |
| Other owners | 84 |