- All sections
- H - Electricity
- H01L - Semiconductor devices not covered by class
- H01L 21/308 - Chemical or electrical treatment, e.g. electrolytic etching using masks
Patent holdings for IPC class H01L 21/308
Total number of patents in this class: 5020
10-year publication summary
|
635
|
645
|
535
|
546
|
536
|
359
|
354
|
307
|
298
|
223
|
| 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Taiwan Semiconductor Manufacturing Company, Ltd. | 43400 |
836 |
| Samsung Electronics Co., Ltd. | 147622 |
307 |
| International Business Machines Corporation | 61471 |
278 |
| Tokyo Electron Limited | 12899 |
224 |
| Applied Materials, Inc. | 18892 |
161 |
| United Microelectronics Corp. | 4249 |
158 |
| GLOBALFOUNDRIES U.S. Inc. | 6415 |
154 |
| Micron Technology, Inc. | 26210 |
136 |
| Intel Corporation | 47129 |
117 |
| Semiconductor Manufacturing International (Shanghai) Corporation | 1758 |
91 |
| Lam Research Corporation | 5310 |
78 |
| Changxin Memory Technologies, Inc. | 4927 |
74 |
| FUJIFILM Corporation | 29586 |
71 |
| Semiconductor Manufacturing International (Beijing) Corporation | 1033 |
66 |
| Nanya Technology Corporation | 2546 |
57 |
| Shin-Etsu Chemical Co., Ltd. | 5687 |
52 |
| Kioxia Corporation | 10441 |
52 |
| Tessera, Inc. | 619 |
50 |
| Texas Instruments Incorporated | 19445 |
44 |
| Mitsubishi Gas Chemical Company, Inc. | 3482 |
44 |
| Other owners | 1970 |