- All sections
- H - Electricity
- H01L - Semiconductor devices not covered by class
- H01L 21/308 - Chemical or electrical treatment, e.g. electrolytic etching using masks
Patent holdings for IPC class H01L 21/308
Total number of patents in this class: 4944
10-year publication summary
|
635
|
646
|
535
|
546
|
536
|
359
|
353
|
307
|
297
|
143
|
| 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Taiwan Semiconductor Manufacturing Company, Ltd. | 42222 |
819 |
| Samsung Electronics Co., Ltd. | 144426 |
306 |
| International Business Machines Corporation | 61123 |
277 |
| Tokyo Electron Limited | 12571 |
211 |
| Applied Materials, Inc. | 18433 |
158 |
| United Microelectronics Corp. | 4232 |
157 |
| GLOBALFOUNDRIES U.S. Inc. | 6427 |
154 |
| Micron Technology, Inc. | 26214 |
140 |
| Intel Corporation | 46751 |
116 |
| Semiconductor Manufacturing International (Shanghai) Corporation | 1774 |
91 |
| Lam Research Corporation | 5207 |
76 |
| Changxin Memory Technologies, Inc. | 4927 |
74 |
| FUJIFILM Corporation | 29251 |
71 |
| Semiconductor Manufacturing International (Beijing) Corporation | 1033 |
66 |
| Nanya Technology Corporation | 2386 |
56 |
| Kioxia Corporation | 10282 |
52 |
| Tessera, Inc. | 624 |
50 |
| Shin-Etsu Chemical Co., Ltd. | 5602 |
46 |
| Mitsubishi Gas Chemical Company, Inc. | 3443 |
45 |
| Nissan Chemical Industries, Ltd. | 1725 |
45 |
| Other owners | 1934 |