- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devicesmaterials therefororiginals thereforapparatus specially adapted therefor
- G03F 7/38 - Treatment before imagewise removal, e.g. prebaking
Patent holdings for IPC class G03F 7/38
Total number of patents in this class: 1349
10-year publication summary
|
111
|
154
|
149
|
150
|
109
|
84
|
106
|
77
|
61
|
38
|
| 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Shin-Etsu Chemical Co., Ltd. | 5644 |
183 |
| FUJIFILM Corporation | 29329 |
128 |
| Taiwan Semiconductor Manufacturing Company, Ltd. | 42549 |
117 |
| Sumitomo Chemical Company, Limited | 9046 |
112 |
| Tokyo Electron Limited | 12681 |
78 |
| Tokyo Ohka Kogyo Co., Ltd. | 1546 |
72 |
| JSR Corporation | 2512 |
70 |
| Applied Materials, Inc. | 18565 |
45 |
| Merck Patent GmbH | 5828 |
26 |
| Nissan Chemical Industries, Ltd. | 1718 |
26 |
| DuPont Electronic Materials International, LLC | 426 |
25 |
| Samsung Electronics Co., Ltd. | 145630 |
24 |
| International Business Machines Corporation | 61198 |
18 |
| Lam Research Corporation | 5222 |
17 |
| Carbon, Inc. | 396 |
17 |
| Central Glass Company, Limited | 1265 |
14 |
| Inpria Corporation | 119 |
14 |
| Nissan Chemical Corporation | 2004 |
13 |
| Osaka University | 3375 |
11 |
| Mitsubishi Gas Chemical Company, Inc. | 3461 |
10 |
| Other owners | 329 |