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  • All sections
  • G - Physics
  • G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devicesmaterials therefororiginals thereforapparatus specially adapted therefor
  • G03F 7/26 - Processing photosensitive materialsApparatus therefor

Patent holdings for IPC class G03F 7/26

Total number of patents in this class: 1439

10-year publication summary

63
101
100
127
88
84
59
49
38
44
2016 2017 2018 2019 2020 2021 2022 2023 2024 2025

Principal owners for this class

Owner
All patents
This class
FUJIFILM Corporation
29817
128
Nissan Chemical Corporation
2101
80
JSR Corporation
2542
73
Taiwan Semiconductor Manufacturing Company, Ltd.
46161
71
Tokyo Electron Limited
13136
58
Shin-Etsu Chemical Co., Ltd.
5784
58
Nissan Chemical Industries, Ltd.
1698
56
Tokyo Ohka Kogyo Co., Ltd.
1547
52
Mitsubishi Gas Chemical Company, Inc.
3499
50
Micron Technology, Inc.
26558
32
MacDermid Graphics Solutions, LLC
119
27
Applied Materials, Inc.
19248
23
International Business Machines Corporation
61721
22
Eastman Kodak Company
2798
22
Samsung Electronics Co., Ltd.
149087
18
Samsung SDI Co., Ltd.
8878
16
Boe Technology Group Co., Ltd.
41781
16
GLOBALFOUNDRIES U.S. Inc.
6418
16
DuPont Electronic Materials International, LLC
428
15
Cheil Industries Inc.
842
14
Other owners 592

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