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  • All sections
  • G - Physics
  • G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devicesmaterials therefororiginals thereforapparatus specially adapted therefor
  • G03F 7/213 - Exposing with the same light pattern different positions of the same surface at the same time

Patent holdings for IPC class G03F 7/213

Total number of patents in this class: 27

10-year publication summary

1
5
6
4
2
1
2
2
0
1
2017 2018 2019 2020 2021 2022 2023 2024 2025 2026

Principal owners for this class

Owner
All patents
This class
ASML Netherlands B.V.
7774
3
Applied Materials, Inc.
20135
2
Nikon Corporation
7286
2
Cymer, LLC
405
2
EV Group E. Thallner GmbH
421
2
Samsung Display Co., Ltd.
38022
1
Huawei Technologies Co., Ltd.
120925
1
The Board of Trustees of the Leland Stanford Junior University
6609
1
Board of Regents, The University of Texas System
6067
1
The Arizona Board of Regents on Behalf of the University of Arizona
2262
1
Danmarks Tekniske Universitet
1020
1
Ecole Polytechnique Federale de Lausanne (epfl)
1594
1
IMS Nanofabrication GmbH
60
1
National University of Singapore
2566
1
Nova Measuring Instruments Ltd.
67
1
Ushio Denki Kabushiki Kaisha
1201
1
Xeikon Prepress NV
24
1
TERA-print, LLC
12
1
PlayNitride Display Co., Ltd.
342
1
Onto Innovation Inc.
378
1
Other owners 1

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