Français Register Login

  • All sections
  • G - Physics
  • G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devicesmaterials therefororiginals thereforapparatus specially adapted therefor
  • G03F 1/76 - Patterning of masks by imaging

Patent holdings for IPC class G03F 1/76

Total number of patents in this class: 200

10-year publication summary

20
21
20
11
12
18
14
13
17
3
2017 2018 2019 2020 2021 2022 2023 2024 2025 2026

Principal owners for this class

Owner
All patents
This class
Taiwan Semiconductor Manufacturing Company, Ltd.
47734
43
Shin-Etsu Chemical Co., Ltd.
5997
13
Applied Materials, Inc.
20145
10
Lam Research Corporation
5560
8
Boe Technology Group Co., Ltd.
43343
8
Samsung Electronics Co., Ltd.
155224
7
FUJIFILM Corporation
30327
7
Kioxia Corporation
10727
7
Hoya Corporation
2734
5
Google LLC
44062
5
Texas Instruments Incorporated
19636
4
ASML Netherlands B.V.
7785
4
United Microelectronics Corp.
4463
3
Synopsys, Inc.
2729
3
Tsinghua University
6128
3
Hefei BOE Optoelectronics Technology Co., Ltd.
1393
3
Mycronic AB
167
3
Beijing Vfortune New Energy Power Technology Development Co., Ltd.
26
3
Samsung Display Co., Ltd.
38092
2
LG Chem, Ltd.
17883
2
Other owners 57

  • ipowner home
  • ipqwery home
  • contact us
  • privacy policy
  • terms and conditions
© 2026 IPQwery All rights reserved