- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devicesmaterials therefororiginals thereforapparatus specially adapted therefor
- G03F 1/72 - Repair or correction of mask defects
Patent holdings for IPC class G03F 1/72
Total number of patents in this class: 240
10-year publication summary
|
21
|
28
|
26
|
17
|
17
|
21
|
16
|
14
|
15
|
8
|
| 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Carl Zeiss SMT GmbH | 2912 |
43 |
| Taiwan Semiconductor Manufacturing Company, Ltd. | 41731 |
42 |
| Carl Zeiss SMS Ltd. | 47 |
22 |
| Samsung Electronics Co., Ltd. | 142777 |
13 |
| ASML Netherlands B.V. | 7280 |
10 |
| Kioxia Corporation | 10256 |
10 |
| Intel Corporation | 46639 |
6 |
| Dai Nippon Printing Co., Ltd. | 4028 |
6 |
| KLA Corporation | 1492 |
6 |
| Applied Materials, Inc. | 18269 |
5 |
| Hoya Corporation | 2734 |
4 |
| Changxin Memory Technologies, Inc. | 4925 |
4 |
| Siemens Industry Software Inc. | 1655 |
4 |
| United Microelectronics Corp. | 4194 |
3 |
| Photronics, Inc. | 42 |
3 |
| Semes Co., Ltd. | 1384 |
3 |
| Toppan Printing Co., Ltd. | 2141 |
3 |
| Agc, Inc. | 4663 |
3 |
| Hitachi High-Tech Science Corporation | 327 |
2 |
| Synopsys, Inc. | 2783 |
2 |
| Other owners | 46 |