- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devicesmaterials therefororiginals thereforapparatus specially adapted therefor
- G03F 1/72 - Repair or correction of mask defects
Patent holdings for IPC class G03F 1/72
Total number of patents in this class: 255
10-year publication summary
|
28
|
26
|
17
|
17
|
21
|
16
|
14
|
16
|
21
|
3
|
| 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 | 2026 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Carl Zeiss SMT GmbH | 3210 |
47 |
| Taiwan Semiconductor Manufacturing Company, Ltd. | 47211 |
45 |
| Carl Zeiss SMS Ltd. | 54 |
23 |
| Samsung Electronics Co., Ltd. | 153573 |
16 |
| ASML Netherlands B.V. | 7732 |
11 |
| Kioxia Corporation | 10706 |
10 |
| Intel Corporation | 46638 |
6 |
| Dai Nippon Printing Co., Ltd. | 4208 |
6 |
| KLA Corporation | 1788 |
6 |
| Applied Materials, Inc. | 19999 |
5 |
| Hoya Corporation | 2737 |
4 |
| Agc, Inc. | 5285 |
4 |
| Changxin Memory Technologies, Inc. | 4924 |
4 |
| United Microelectronics Corp. | 4440 |
3 |
| D2s, Inc. | 189 |
3 |
| Photronics, Inc. | 42 |
3 |
| Semes Co., Ltd. | 1584 |
3 |
| Toppan Printing Co., Ltd. | 2103 |
3 |
| Siemens Industry Software Inc. | 1744 |
3 |
| Synopsys, Inc. | 2727 |
2 |
| Other owners | 48 |