- All sections
- C - Chemistrymetallurgy
- C23F - Non-mechanical removal of metallic material from surfacesinhibiting corrosion of metallic materialinhibiting incrustation in generalmulti-step processes for surface treatment of metallic material involving at least one process provided for in class and at least one process covered by subclass or or class
- C23F 4/02 - Processes for removing metallic material from surfaces, not provided for in group or by evaporation
Patent holdings for IPC class C23F 4/02
Total number of patents in this class: 40
10-year publication summary
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2
|
3
|
5
|
4
|
0
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5
|
5
|
2
|
4
|
0
|
| 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 | 2026 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| ASM IP Holding B.V. | 2481 |
11 |
| Applied Materials, Inc. | 20625 |
4 |
| Tokyo Electron Limited | 13987 |
3 |
| Denso Corporation | 25820 |
2 |
| Central Glass Company, Limited | 1297 |
2 |
| FEI Company | 1063 |
2 |
| Harris & Bruno International , Inc. | 2 |
2 |
| 38th Research Institute, China Electronics Technology Group Corporation | 58 |
1 |
| Alliance for Sustainable Energy, LLC | 303 |
1 |
| Aperam | 143 |
1 |
| Canon Machinery Inc. | 36 |
1 |
| Hyogo Prefecture | 22 |
1 |
| JFE Steel Corporation | 7675 |
1 |
| Nippon Light Metal Company, Ltd. | 695 |
1 |
| Quertech Ingenierie | 31 |
1 |
| Rutgers, The State University of New Jersey | 1996 |
1 |
| Zanini Auto Grup, S.A. | 44 |
1 |
| Tokyo Electron U.S. Holdings, Inc | 923 |
1 |
| GE Infrastructure Technology, LLC | 6151 |
1 |
| Hitachi High-Tech Corporation | 5995 |
1 |
| Other owners | 1 |