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2012
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Invention
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Method of forming metal carbide barrier layers for fluorocarbon films. A method of forming metal ... |
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Invention
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Method for modifying metal cap layers in semiconductor devices. A method for forming a semiconduc... |
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Invention
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Method of slimming radiation-sensitive material lines in lithographic applications. A method and ... |
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Invention
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Etch process for controlling pattern cd and integrity in multi-layer masks. A method of patternin... |
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Invention
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Method for controlling dangling bonds in fluorocarbon films. Embodiments of the invention describ... |
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Invention
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Method for patterning a full metal gate structure. A method of patterning a gate structure (100, ... |
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Invention
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Method of etching silicon nitride films. A processing method is provided for plasma etching featu... |
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Invention
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Method of operating filament assisted chemical vapor deposition system. A method of performing a ... |
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Invention
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Method of etching features in silicon nitride films. A processing method is provided for plasma e... |
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2011
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Invention
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Double patterning with inline critical dimension slimming. A method for double patterning a subst... |
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Invention
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Sidewall image transfer pitch doubling and inline critical dimension slimming. A method for patte... |
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Invention
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Method of depositing dielectric films using microwave plasma. Embodiments of the invention descri... |
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Invention
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Selective etch process for silicon nitride. A method for selectively etching a substrate (25, 140... |
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Invention
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Method for high aspect ratio patterning in spin-on layer. A method of patterning a substrate (110... |
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Invention
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Method of selectively etching an insulation stack for a metal interconnect. A method of patternin... |
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2010
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Invention
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Method for reworking a silicon-containing arc layer on a substrate. A method is provided for rewo... |
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2009
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Invention
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Method for forming aluminum-doped metal carbonitride gate electrodes. A method for forming an alu... |
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2008
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Invention
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Electrical contacts for integrated circuits and methods of forming using gas cluster ion beam pro... |
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Invention
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Optical metrology of single features. The profile of a single feature formed on a wafer can be de... |
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Invention
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Apparatus and methods of forming a gas cluster ion beam using a low-pressure source. Embodiments ... |
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Invention
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Dynamic temperature backside gas control for improved within-substrate processing uniformity. Con... |
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Invention
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Processing system and method for performing high throughput non-plasma processing. Embodiments of... |
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Invention
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Model and parameter selection for optical metrology. A profile model for use in optical metrology... |
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Invention
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Atomic layer deposition systems and methods. Systems and methods for depositing thin films using ... |
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Invention
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Semiconductor wafer boat for batch processing. A boat (50) is provided for stacking semiconductor... |
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2007
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Invention
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Generation of a library of periodic grating diffraction signals. A method of generating a library... |
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Invention
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Processing system containing a hot filament hydrogen radical source for integrated substrate proc... |
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Invention
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Semiconductor devices containing nitrided high dielectric constant films and method of forming. A... |
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Invention
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Method for double patterning a developable anti-reflective coating. A method for double patternin... |
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Invention
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Substrate cleaning method. A method is provided for reducing the amount of film fragments (66a) d... |
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Invention
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Method for integrated substrate processing in copper metallization. A method of copper metallizat... |
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Invention
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Exhaust assembly for a plasma processing system and method. An exhaust assembly is described for ... |
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Invention
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Thermal processing system with improved process gas flow and method for injecting a process gas i... |
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Invention
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Method for formation of oxidized aluminum nitride films. A method is provided for in-situ formati... |
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Invention
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Depositing ruthenium films using ionized physical vapor deposition (ipvd). An iPVD system (200A) ... |
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Invention
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Method for creating a built-in self test (bist) table for monitoring a monolayer deposition (mld)... |
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Invention
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Monitoring a monolayer deposition (mld) system using a built-in self test (bist) table. A method ... |
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Invention
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Monitoring a system during low-pressure processes. A method of monitoring a processing system (10... |
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Invention
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Monitoring a single-wafer processing system. A method of monitoring a single-wafer processing sys... |
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Invention
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Semiconductor device with gate dielectric containing aluminum and mixed rare earth elements. A se... |
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Invention
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Method of forming mixed rare earth nitride and aluminum nitride films by atomic layer deposition.... |
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Invention
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Method of forming mixed rare earth oxide and mixed rare earth aluminate films by atomic layer dep... |
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Invention
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Method of forming mixed rare earth oxynitride and aluminum oxynitride films by atomic layer depos... |
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Invention
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Semiconductor device with gate dielectric containing mixed rare earth elements. A semiconductor d... |
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Invention
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Thermal processing furnace, gas delivery system therefor, and methods for delivering a process ga... |
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Invention
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Method for replacing a nitrous oxide based oxidation process with a nitric oxide based oxidation ... |
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Invention
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System for introducing a precursor gas to a vapor deposition system. A system for introducing a p... |
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Invention
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Method for integrating a conformal ruthenium layer into copper metallization of high aspect ratio... |
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Invention
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Method for introducing a precursor gas to a vapor deposition system. A method for introducing a p... |
