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  • C - Chemistrymetallurgy
  • C23F - Non-mechanical removal of metallic material from surfacesinhibiting corrosion of metallic materialinhibiting incrustation in generalmulti-step processes for surface treatment of metallic material involving at least one process provided for in class and at least one process covered by subclass or or class
  • C23F 4/00 - Processes for removing metallic material from surfaces, not provided for in group or

Patent holdings for IPC class C23F 4/00

Total number of patents in this class: 349

10-year publication summary

30
38
40
25
20
17
13
7
14
7
2017 2018 2019 2020 2021 2022 2023 2024 2025 2026

Principal owners for this class

Owner
All patents
This class
Tokyo Electron Limited
13742
37
Lam Research Corporation
5605
21
Applied Materials, Inc.
20325
19
Hitachi High-Tech Corporation
5777
10
Hon Hai Precision Industry Co., Ltd.
4029
8
Tsinghua University
6192
8
Canon Anelva Corporation
684
8
Adeia Semiconductor Solutions LLC
762
8
Varian Semiconductor Equipment Associates, Inc.
1187
6
Samsung Display Co., Ltd.
38470
5
FUJIFILM Corporation
30458
5
Central Glass Company, Limited
1290
5
Japan Aviation Electronics Industry, Limited
1849
5
Techinsights Inc.
96
5
Toyo Kohan Co., Ltd.
429
5
Taiwan Semiconductor Manufacturing Company, Ltd.
48140
4
Seagate Technology LLC
3961
4
Boe Technology Group Co., Ltd.
43856
4
Tohoku University
2956
4
US Synthetic Corporation
621
4
Other owners 174

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