- All sections
- H - Electricity
- H01L - Semiconductor devices not covered by class
- H01L 21/225 - Diffusion of impurity materials, e.g. doping materials, electrode materials, into, or out of, a semiconductor body, or between semiconductor regionsRedistribution of impurity materials, e.g. without introduction or removal of further dopant using diffusion into, or out of, a solid from or into a solid phase, e.g. a doped oxide layer
Patent holdings for IPC class H01L 21/225
Total number of patents in this class: 1509
10-year publication summary
214
|
230
|
206
|
179
|
158
|
111
|
74
|
66
|
75
|
16
|
2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 |
Principal owners for this class
Owner |
All patents
|
This class
|
---|---|---|
Taiwan Semiconductor Manufacturing Company, Ltd. | 41636 |
161 |
International Business Machines Corporation | 60649 |
126 |
Texas Instruments Incorporated | 19479 |
59 |
Infineon Technologies AG | 8180 |
50 |
Fuji Electric Co., Ltd. | 5063 |
50 |
Infineon Technologies Austria AG | 2110 |
31 |
Semiconductor Manufacturing International (Shanghai) Corporation | 1774 |
31 |
Hitachi Chemical Company, Ltd. | 2367 |
30 |
Applied Materials, Inc. | 18358 |
30 |
United Microelectronics Corp. | 4189 |
29 |
GLOBALFOUNDRIES U.S. Inc. | 6438 |
28 |
Samsung Electronics Co., Ltd. | 142415 |
24 |
Semiconductor Manufacturing International (Beijing) Corporation | 1032 |
24 |
Tokyo Ohka Kogyo Co., Ltd. | 1520 |
23 |
Intel Corporation | 46613 |
22 |
Institute of Microelectronics, Chinese Academy of Sciences | 1367 |
19 |
Screen Holdings Co., Ltd. | 2748 |
19 |
Micron Technology, Inc. | 26095 |
18 |
Mitsubishi Electric Corporation | 45461 |
18 |
Toray Industries, Inc. | 6847 |
18 |
Other owners | 699 |