• All sections
  • H - Electricity
  • H01L - Semiconductor devices not covered by class
  • H01L 21/225 - Diffusion of impurity materials, e.g. doping materials, electrode materials, into, or out of, a semiconductor body, or between semiconductor regionsRedistribution of impurity materials, e.g. without introduction or removal of further dopant using diffusion into, or out of, a solid from or into a solid phase, e.g. a doped oxide layer

Patent holdings for IPC class H01L 21/225

Total number of patents in this class: 1509

10-year publication summary

214
230
206
179
158
111
74
66
75
16
2016 2017 2018 2019 2020 2021 2022 2023 2024 2025

Principal owners for this class

Owner
All patents
This class
Taiwan Semiconductor Manufacturing Company, Ltd.
41636
161
International Business Machines Corporation
60649
126
Texas Instruments Incorporated
19479
59
Infineon Technologies AG
8180
50
Fuji Electric Co., Ltd.
5063
50
Infineon Technologies Austria AG
2110
31
Semiconductor Manufacturing International (Shanghai) Corporation
1774
31
Hitachi Chemical Company, Ltd.
2367
30
Applied Materials, Inc.
18358
30
United Microelectronics Corp.
4189
29
GLOBALFOUNDRIES U.S. Inc.
6438
28
Samsung Electronics Co., Ltd.
142415
24
Semiconductor Manufacturing International (Beijing) Corporation
1032
24
Tokyo Ohka Kogyo Co., Ltd.
1520
23
Intel Corporation
46613
22
Institute of Microelectronics, Chinese Academy of Sciences
1367
19
Screen Holdings Co., Ltd.
2748
19
Micron Technology, Inc.
26095
18
Mitsubishi Electric Corporation
45461
18
Toray Industries, Inc.
6847
18
Other owners 699