• All sections
  • H - Electricity
  • H01L - Semiconductor devices not covered by class
  • H01L 21/225 - Diffusion of impurity materials, e.g. doping materials, electrode materials, into, or out of, a semiconductor body, or between semiconductor regionsRedistribution of impurity materials, e.g. without introduction or removal of further dopant using diffusion into, or out of, a solid from or into a solid phase, e.g. a doped oxide layer

Patent holdings for IPC class H01L 21/225

Total number of patents in this class: 1537

10-year publication summary

214
230
206
179
158
111
76
66
76
43
2016 2017 2018 2019 2020 2021 2022 2023 2024 2025

Principal owners for this class

Owner
All patents
This class
Taiwan Semiconductor Manufacturing Company, Ltd.
43854
163
International Business Machines Corporation
61596
126
Texas Instruments Incorporated
19456
60
Fuji Electric Co., Ltd.
5214
51
Infineon Technologies AG
8257
50
United Microelectronics Corp.
4256
33
Applied Materials, Inc.
18968
31
Infineon Technologies Austria AG
2181
31
Semiconductor Manufacturing International (Shanghai) Corporation
1754
31
Hitachi Chemical Company, Ltd.
2335
30
GLOBALFOUNDRIES U.S. Inc.
6409
28
Samsung Electronics Co., Ltd.
147983
24
Semiconductor Manufacturing International (Beijing) Corporation
1033
24
Intel Corporation
47239
23
Tokyo Ohka Kogyo Co., Ltd.
1552
23
Institute of Microelectronics, Chinese Academy of Sciences
1392
21
Screen Holdings Co., Ltd.
2896
19
Micron Technology, Inc.
26255
18
Mitsubishi Electric Corporation
46590
18
Toray Industries, Inc.
7002
18
Other owners 715