- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devicesmaterials therefororiginals thereforapparatus specially adapted therefor
- G03F 7/004 - Photosensitive materials
Patent holdings for IPC class G03F 7/004
Total number of patents in this class: 9715
10-year publication summary
|
556
|
563
|
556
|
573
|
620
|
635
|
644
|
708
|
809
|
894
|
| 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| FUJIFILM Corporation | 29839 |
1898 |
| Shin-Etsu Chemical Co., Ltd. | 5795 |
612 |
| JSR Corporation | 2542 |
593 |
| Tokyo Ohka Kogyo Co., Ltd. | 1547 |
550 |
| Sumitomo Chemical Company, Limited | 9109 |
297 |
| Toray Industries, Inc. | 7015 |
271 |
| Taiwan Semiconductor Manufacturing Company, Ltd. | 46182 |
202 |
| Samsung SDI Co., Ltd. | 8901 |
202 |
| Hitachi Chemical Company, Ltd. | 2316 |
150 |
| Samsung Electronics Co., Ltd. | 149198 |
132 |
| Resonac Corporation | 3008 |
125 |
| DuPont Electronic Materials International, LLC | 427 |
125 |
| Mitsubishi Chemical Corporation | 4612 |
123 |
| LG Chem, Ltd. | 17706 |
116 |
| Tokyo Electron Limited | 13155 |
108 |
| Taiyo Ink Mfg. Co., Ltd. | 210 |
106 |
| Mitsubishi Gas Chemical Company, Inc. | 3509 |
105 |
| Merck Patent GmbH | 5752 |
97 |
| Inpria Corporation | 131 |
92 |
| Taiyo Holdings Co., Ltd. | 294 |
84 |
| Other owners | 3727 |