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2025
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Invention
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Vapor phase growth apparatus and vapor phase growth method.
A vapor phase growth apparatus accor... |
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Invention
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Charged particle beam writing apparatus, shot data correction method and charged particle beam wr... |
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Invention
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Multiple charged particle beam writing method, multiple charged particle beam writing apparatus, ... |
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Invention
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Multiple-beam image acquisition apparatus and multiple-beam image acquisition method.
A multiple... |
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Invention
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Multi-electron beam image acquisition apparatus, multi-electron beam image acquisition method, el... |
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Invention
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Photoelectron source, multi-photoelectron source and multi-beam irradiation apparatus.
In one em... |
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2024
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Invention
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Method for generating writing data, writing data generation apparatus, method of charged-particle... |
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Invention
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Vapor phase growth apparatus.
A vapor phase growth apparatus according to an embodiment includes... |
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Invention
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Holder and vapor phase growth apparatus.
A holder according to an embodiment includes a portion ... |
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Invention
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Maintenance system for semiconductor manufacturing apparatus.
A maintenance system for a semicon... |
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Invention
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Mark position measuring device and mark position measuring method. This mark position measuring d... |
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Invention
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Multiple charged particle beam writing apparatus and multiple charged particle beam writing metho... |
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Invention
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Multiple charged particle beam writing method and multiple charged particle beam writing apparatu... |
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Invention
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Blanking aperture array system, charged particle beam writing apparatus, and method for inspectin... |
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Invention
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Method of adjusting charged particle beam writing apparatus, charged particle beam writing appara... |
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Invention
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Inspection apparatus and method for generating inspection image.
According to one embodiment, an... |
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Invention
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Method for adjusting deflection position of charged particle beam drawing, and charged particle b... |
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Invention
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Electromagnetic lens, scanning electron microscope, and multi-electron beam inspection apparatus.... |
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Invention
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Pattern inspection device, focal point position adjustment method, and pattern inspection method.... |
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Invention
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Method for calculating effective temperature of multi-charged particle beam writing region, multi... |
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Invention
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Multi-beam writing method and multi-beam writing apparatus.
In one embodiment, a multi-beam writ... |
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Invention
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Electronic component and charged particle beam irradiation apparatus.
An electronic component of... |
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Invention
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Electromagnetic lens and multi-electron beam irradiation device. An electromagnetic lens accordin... |
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Invention
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Multi-charged particle beam writing method and multi-charged particle beam writing apparatus.
In... |
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Invention
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Charged particle beam drawing device, drift amount calculation method, and charged particle beam ... |
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Invention
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Effective temperature calculation method for multi-charged particle beam writing region, multi-ch... |
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Invention
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Method for diagnosing abnormality of blanking aperture array substrate and multi-beam drawing met... |
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Invention
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Multi-electron beam irradiation device and multi-electron beam irradiation method. A multi-electr... |
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Invention
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Multiple electron beam irradiation device and multiple electron beam irradiation method. A multip... |
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Invention
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Beam position measurement method and charged particle beam writing method.
In one embodiment, a ... |
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Invention
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Charged particle beam writing apparatus, discharge detection method, and discharge detection appa... |
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Invention
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Roller retainer, roller-retainer connected body, cross roller guide, and stage device.
In one em... |
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Invention
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Method for determining line segment intersections in figure of writing data, apparatus for determ... |
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Invention
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Electron beam writing method, electron beam writing apparatus, and non-transitory material comput... |
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Invention
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Method for adjusting multi-electron beam and multi-electron beam inspection device. A method for ... |
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Invention
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Drawing data examination method, drawing method, drawing apparatus, and non-transitory storage me... |
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Invention
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Charged particle beam writing apparatus and charged particle beam writing method.
In one embodim... |
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Invention
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Pattern inspection device and pattern inspection method. A pattern inspection device according to... |
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Invention
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Nonlinear error measurement method for stage position measurement system and charged particle bea... |
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Invention
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Electronic component and charged particle beam irradiation apparatus.
An electronic component ac... |
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2023
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Invention
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Effective temperature calculation method for multi–charged particle beam drawing area, multi–char... |
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Invention
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Method for calculating effective temperature of multi-charged particle beam drawing area, multi-c... |
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Invention
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Susceptor cover |
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Invention
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Cover base for susceptors |
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Invention
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Susceptor |
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2017
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P/S
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Multiple electron beams mask writers used for manufacturing semiconductors |
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P/S
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Multiple electron beams mask writers used for manufacturing
semiconductors. |
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2016
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P/S
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Measuring and testing machines and instruments; optical
inspection apparatus for industrial use;... |
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P/S
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Instruction relating to operation and design of semiconductor manufacturing machines and systems |
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P/S
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Application software relating to maintenance manual for
semiconductor manufacturing machines and... |
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2015
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P/S
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Semiconductor making machines. Repair and maintenance of semiconductor manufacturing machines and... |
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2014
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P/S
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Semiconductor manufacturing machines and systems Repair and maintenance of semiconductor manufact... |
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P/S
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Semiconductor manufacturing machines and systems. Repair and maintenance of semiconductor manufac... |
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P/S
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Equipment for depositing on semiconductor wafers; equipment for performing epitaxial growth on se... |
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P/S
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Apparatus for depositing on semiconductor wafers; apparatus for performing epitaxial growth on se... |
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P/S
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Apparatus for depositing on semiconductor wafers; apparatus
for performing epitaxial growth on s... |
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2007
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P/S
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Semiconductor manufacturing machines Repair and maintenance of semiconductor manufacturing machin... |
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2003
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P/S
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SEMI-CONDUCTOR MANUFACTURING APPARATUS, NAMELY, ELECTRON BEAM EXPOSURE MACHINES, EPITAXIAL REACTO... |
