2018
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Invention
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Memory device with predetermined start-up value. A method for making a semiconductor memory devic... |
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Invention
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Methods and systems for clamping a substrate. Methods and arrangement for clamping substrates to ... |
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Invention
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Charged particle blocking element, exposure apparatus comprising such an element, and method for ... |
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Invention
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Charged particle source module. The invention relates to a charged particle source module for gen... |
2017
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Invention
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Secure chips with serial numbers. An electronic device comprising a semiconductor chip which comp... |
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Invention
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Fabricating unique chips using a charged particle multi-beamlet lithography system. Method of man... |
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Invention
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Adjustment assembly and substrate exposure system comprising such an adjustment assembly. The inv... |
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Invention
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Feedthrough device and signal conductor path arrangement. Feedthrough device (50; 150), for formi... |
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Invention
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Method and apparatus for aligning substrates on a substrate support unit. The invention relates t... |
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Invention
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Method and system for fabricating unique chips using a charged particle multi-beamlet lithography... |
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Invention
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Secure chips with serial numbers. An electronic device comprises a semiconductor chip (100) which... |
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Invention
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Substrate holding device, method for manufacturing such a device, and apparatus and method for pr... |
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Invention
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Substrate processing apparatus. the electrical wiring, the optical fibers, and the cooling arrang... |
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Invention
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Method and encoding device for encoding a sequence of m-bit pattern words and outputting a frame ... |
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Invention
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Method and device for generating a decoded and synchronized output. The invention relates to a me... |
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Invention
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Method and system for the removal and/or avoidance of contamination in charged particle beam syst... |
2016
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Invention
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Control system and method for lithography apparatus. A method for initializing a first operation ... |
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Invention
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Individual beam pattern placement verification in multiple beam lithography. Methods and systems ... |
2015
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Invention
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Load lock system and method for transferring substrates in a lithography system. The present inve... |
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Invention
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Enclosure for a target processing machine. The invention relates to an assembly (1) for enclosing... |
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Invention
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Proximity effect correction in a charged particle lithography system. The invention relates to a ... |
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Invention
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Enhanced stitching by overlap dose and feature reduction. A method for processing exposure data (... |
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Invention
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Lithography system, sensor, converter element and method of manufacture. Charged particle beamlet... |
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Invention
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Electrical charge regulation for a semiconductor substrate during charged particle beam processin... |
2014
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Invention
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Cathode arrangement, electron gun, and lithography system comprising such electron gun. The inven... |
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Invention
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Charged particle lithography system with sensor assembly. The invention relates to a charged part... |
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Invention
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Electrode cooling arrangement. The invention relates to a collimator electrode, comprising an ele... |
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Invention
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Multi-electrode electron optics. The invention relates to a collimator electrode stack (70), comp... |
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Invention
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Multi-electrode stack arrangement. The invention relates to an electrode stack (70) comprising st... |
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Invention
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Target processing unit. The invention relates to a projection lens assembly for directing a beam ... |
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Invention
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Charged particle optical device. The invention relates to a charged particle optical device for m... |
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Invention
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Drying device for use in a lithography system. The invention relates to a drying apparatus for us... |
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Invention
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Charged particle lithography system. A charged particle lithography system for exposing a wafer a... |
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Invention
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Beam grid layout. A sub-beam aperture array for forming a plurality of sub-beams from one or more... |
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Invention
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Cabinet for electronic equipment. Cabinet (10) for accommodating electronic equipment (46). The c... |
2013
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Invention
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Interconnect structure, modulation device and lithography system comprising such device. An inter... |
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Invention
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Modulation device and lithography system comprising such device. A modulation device (106) for us... |
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Invention
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Determining a position of a substrate in lithography. The invention relates to a substrate (12, 5... |
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Invention
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Multi-axis differential interferometer. The invention relates to a multi-axis differential interf... |
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Invention
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Method for determining a beamlet position and method for determining a distance between two beaml... |
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Invention
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Charged particle lithography system and beam generator. The present invention relates to a charge... |
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Invention
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Charged particle multi-beamlet lithography system and cooling arrangement manufacturing method. A... |
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Invention
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Charged particle lithography system and beam generator. The invention relates to a charged partic... |
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Invention
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Modulation device and power supply arrangement. The invention relates to a modulation device for ... |
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Invention
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Arrangement and method for transporting radicals. The invention relates to an arrangement for tra... |
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Invention
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Charged particle lithography system with alignment sensor and beam measurement sensor. A multi-be... |
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Invention
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Lithography system and method for processing a target, such as a wafer. A method for operating a ... |
2012
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Invention
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Device for spot size measurement at wafer level using a knife edge and a method for manufacturing... |