Mapper Lithography IP B.V.

Pays‑Bas

 
Quantité totale PI 135
Rang # Quantité totale PI 9 641
Note d'activité PI 0/5.0    0
Rang # Activité PI 1 669 956

Brevets

Marques

3 0
0 0
132 0
0
 
Dernier brevet 2019 - Methods and systems for clamping...
Premier brevet 2000 - Field emission photocathode arra...

Derniers inventions, produits et services

2018 Invention Memory device with predetermined start-up value. A method for making a semiconductor memory devic...
Invention Methods and systems for clamping a substrate. Methods and arrangement for clamping substrates to ...
Invention Charged particle blocking element, exposure apparatus comprising such an element, and method for ...
Invention Charged particle source module. The invention relates to a charged particle source module for gen...
2017 Invention Secure chips with serial numbers. An electronic device comprising a semiconductor chip which comp...
Invention Fabricating unique chips using a charged particle multi-beamlet lithography system. Method of man...
Invention Adjustment assembly and substrate exposure system comprising such an adjustment assembly. The inv...
Invention Feedthrough device and signal conductor path arrangement. Feedthrough device (50; 150), for formi...
Invention Method and apparatus for aligning substrates on a substrate support unit. The invention relates t...
Invention Method and system for fabricating unique chips using a charged particle multi-beamlet lithography...
Invention Secure chips with serial numbers. An electronic device comprises a semiconductor chip (100) which...
Invention Substrate holding device, method for manufacturing such a device, and apparatus and method for pr...
Invention Substrate processing apparatus. the electrical wiring, the optical fibers, and the cooling arrang...
Invention Method and encoding device for encoding a sequence of m-bit pattern words and outputting a frame ...
Invention Method and device for generating a decoded and synchronized output. The invention relates to a me...
Invention Method and system for the removal and/or avoidance of contamination in charged particle beam syst...
2016 Invention Control system and method for lithography apparatus. A method for initializing a first operation ...
Invention Individual beam pattern placement verification in multiple beam lithography. Methods and systems ...
2015 Invention Load lock system and method for transferring substrates in a lithography system. The present inve...
Invention Enclosure for a target processing machine. The invention relates to an assembly (1) for enclosing...
Invention Proximity effect correction in a charged particle lithography system. The invention relates to a ...
Invention Enhanced stitching by overlap dose and feature reduction. A method for processing exposure data (...
Invention Lithography system, sensor, converter element and method of manufacture. Charged particle beamlet...
Invention Electrical charge regulation for a semiconductor substrate during charged particle beam processin...
2014 Invention Cathode arrangement, electron gun, and lithography system comprising such electron gun. The inven...
Invention Charged particle lithography system with sensor assembly. The invention relates to a charged part...
Invention Electrode cooling arrangement. The invention relates to a collimator electrode, comprising an ele...
Invention Multi-electrode electron optics. The invention relates to a collimator electrode stack (70), comp...
Invention Multi-electrode stack arrangement. The invention relates to an electrode stack (70) comprising st...
Invention Target processing unit. The invention relates to a projection lens assembly for directing a beam ...
Invention Charged particle optical device. The invention relates to a charged particle optical device for m...
Invention Drying device for use in a lithography system. The invention relates to a drying apparatus for us...
Invention Charged particle lithography system. A charged particle lithography system for exposing a wafer a...
Invention Beam grid layout. A sub-beam aperture array for forming a plurality of sub-beams from one or more...
Invention Cabinet for electronic equipment. Cabinet (10) for accommodating electronic equipment (46). The c...
2013 Invention Interconnect structure, modulation device and lithography system comprising such device. An inter...
Invention Modulation device and lithography system comprising such device. A modulation device (106) for us...
Invention Determining a position of a substrate in lithography. The invention relates to a substrate (12, 5...
Invention Multi-axis differential interferometer. The invention relates to a multi-axis differential interf...
Invention Method for determining a beamlet position and method for determining a distance between two beaml...
Invention Charged particle lithography system and beam generator. The present invention relates to a charge...
Invention Charged particle multi-beamlet lithography system and cooling arrangement manufacturing method. A...
Invention Charged particle lithography system and beam generator. The invention relates to a charged partic...
Invention Modulation device and power supply arrangement. The invention relates to a modulation device for ...
Invention Arrangement and method for transporting radicals. The invention relates to an arrangement for tra...
Invention Charged particle lithography system with alignment sensor and beam measurement sensor. A multi-be...
Invention Lithography system and method for processing a target, such as a wafer. A method for operating a ...
2012 Invention Device for spot size measurement at wafer level using a knife edge and a method for manufacturing...