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2015
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Invention
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Method for measuring a lithography mask or a mask blank. A method for measuring a substrate in th... |
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2012
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Invention
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Optically transparent and electrically conductive coatings and method for their deposition on a s... |
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Invention
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Method and apparatus for analyzing and for removing a defect of an euv photomask. The invention r... |
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Invention
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Apparatus and method for investigating an object. The present invention refers to an apparatus an... |
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Invention
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Method and apparatus for processing a substrate with a focussed particle beam. The invention rela... |
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Invention
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Apparatus and method for analyzing and modifying a specimen surface. The invention refers to a pr... |
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2011
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Invention
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Method for characterizing a structure on a mask and device for carrying out said method. A method... |
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Invention
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Method and apparatus for correcting errors on a wafer processed by a photolithographic mask.
A m... |
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Invention
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Method and apparatus for correcting errors on a wafer processed by a photolithographic mask. The ... |
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Invention
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Method and apparatus for analyzing and / or repairing of an euv mask defect. The invention relate... |
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Invention
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Controllable transmission and phase compensation of transparent material. A system for processing... |
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Invention
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A method for determining the performance of a photolithographic mask. The invention relates to a ... |
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2010
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Invention
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Mask inspection microscope with variable illumination setting. During mask inspection it is neces... |
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Invention
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Method for processing an object with miniaturized structures.
A method for processing an object ... |
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Invention
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Determination of the relative position of two structures. A method is provided for determining th... |
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Invention
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Method and calibration mask for calibrating a position measuring apparatus. A method for calibrat... |
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2009
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Invention
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Method and device for measuring the relative local position error of one of the sections of an ob... |
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Invention
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Method for determining a repair shape of a defect on or in the vicinity of an edge of a substrate... |
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Invention
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Microscope for reticle inspection with variable illumination settings. During mask inspection pre... |
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Invention
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Method and apparatus for measuring structures on photolithography masks. The invention relates to... |
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Invention
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Method for electron beam induced etching. The invention relates to a method for electron beam ind... |
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Invention
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Method for electron beam induced etching of layers contaminated with gallium. The invention relat... |
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Invention
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Method for electron beam induced deposition of conductive material. The invention relates to a me... |
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Invention
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Method for analyzing masks for photolithography. The invention relates to a method for analyzing ... |
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Invention
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Microscope and microscopy method for examining a reflecting object. Provision is made for a micro... |
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Invention
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Method and apparatus for measuring of masks for the photo-lithography. The invention relates to a... |
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Invention
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Method for processing an object with miniaturized structures. The present invention relates to a ... |
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Invention
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Autofocus device and autofocusing method for an imaging device. An autofocus device for an imagin... |
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Invention
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Method and apparatus for mapping of line-width size distributions on photomasks. In general, in o... |
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2008
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Invention
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Method for repairing phase shift masks. The invention relates to a method for repairing phase shi... |
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Invention
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Measuring system and measuring method. The invention relates to a measuring system comprising a t... |
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Invention
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Holding apparatus for holding an object. The invention relates to a holding apparatus for holding... |
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Invention
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Method and apparatus for analyzing a group of photolithographic masks. The invention relates to a... |
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Invention
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Method for determining lithographically relevant mask defects. The present invention relates to a... |
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Invention
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Microscope illumination system. The invention relates to a microscope illumination system compris... |
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Invention
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Apparatus and method for measuring the positions of marks on a mask.
An apparatus for measuring ... |
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Invention
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Apparatus and method for measuring the positions of marks on a mask. An apparatus (1 ) for measur... |
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Invention
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Method and apparatus for determining the relative overlay shift of stacked layers. A method is pr... |
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Invention
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Apparatus for measurement of substrates. The invention relates to an apparatus for measurement of... |
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2007
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Invention
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Apparatus for measurement of structures on photolithographic masks. The invention relates to an a... |
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Invention
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Microscope and microscopy method for space-resolved measurement of a predetermined structure, in ... |
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Invention
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Calibrating method for a mask writer. A calibrating method for a mask writer is provided, said me... |
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Invention
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Method and apparatus for determining the position of a structure on a carrier relative to a refer... |
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Invention
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Catadioptric objective. The invention relates to a catadioptric objective (OB) comprising a first... |
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Invention
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Microscope objective having a tubular optical system. An imaging optical system (1) comprising an... |
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Invention
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Apparatus and method for mask metrology. There is provided a mask metrology apparatus (1) compris... |
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Invention
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Device and method for measuring lithography masks. The invention relates to a device for measurin... |
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Invention
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Method for determination of residual errors. There is provided a method for determining residual ... |
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Invention
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Method and apparatus for the spatially resolved determination of the phase and amplitude of the e... |
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2006
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Invention
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Method and device for analysing the imaging behaviour of an optical imaging element. The inventio... |
