Carl Zeiss SMT AG

Allemagne

Commandez votre montre hebdomadaire Carl Zeiss SMT AG
Quantité totale PI 205
Quantité totale incluant filiales 239 (+ 34 pour les filiales)
Rang # Quantité totale PI 6 436
Note d'activité PI 0/5.0    0
Rang # Activité PI 1 697 722
Parent Carl Zeiss SMT GmbH

Brevets

Marques

1 0
0 0
204 0
0
 
Dernier brevet 2012 - Lithographic apparatus and devic...
Premier brevet 1988 - Interferometer for measuring opt...

Filiales

2 subsidiaries with IP (34 patents, 0 trademarks)

1 subsidiaries without IP

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Derniers inventions, produits et services

2012 Invention Lithographic apparatus and device manufacturing method. An immersion lithography apparatus includ...
Invention Lithographic apparatus and device manufacturing method. Liquid is supplied to a space between the...
2011 Invention Lithographic apparatus and device manufacturing method. In an immersion lithography apparatus or ...
2009 Invention Dielectric mirror and method for the production thereof, and a projection illumination system for...
Invention Transmitting optical element consisting of magnesium-aluminium spinel. The invention relates to a...
Invention Field facet mirror for use in an illumination optic of a projection illumination system for euv m...
Invention Illumination system for a projection exposure apparatus in semiconductor lithography and projecti...
Invention Projection exposure apparatus for semiconductor lithography comprising a device for the thermal m...
Invention Method and apparatus for determining an optical characteristic of an optical system. A method for...
Invention Lithographic apparatus comprising an internal sensor and a mini-reactor, and method for treating ...
Invention Method for describing a retardation distribution in a microlithographic projection exposure appar...
Invention Illumination optics for euv microlithography and illumination system and projection exposure appa...
Invention Component for setting a scan-integrated illumination energy in an object plane of a microlithogra...
Invention Device for microlithographic projection illumination and method for testing such a device. The in...
Invention Device for microlithographic projection illumination and device for the inspection of a surface o...
Invention Projection objective for a microlithography apparatus and method. A projection objective for a m...
Invention Projection optic for microlithography comprising an intensity-correcting device. A projection opt...
Invention Projection objective for microlithography. A projection objective (7) for microlithography is use...
Invention Method of bonding two components by,,fusion bonding" to form a bonded structure. The present inve...
Invention Method for operating an illumination system of a microlithographic projection exposure apparatus....
Invention Facet mirror for use in a projection exposure apparatus for microlithography. A facet mirror is t...
Invention Optcal system for a microlithographic projection exposure apparatus and microlithographic exposur...
Invention Cleaning module, euv lithography device and method for the cleaning thereof. In order to be able ...
Invention Protection module and euv lithography apparatus with protection module. In EUV lithography appara...
Invention Imaging device in a projection exposure machine. An imaging device in a projection exposure mach...
Invention Lighting system for a microlithography projection exposure installation. The invention relates to...
Invention Illumination system of a microlithographic projection exposure apparatus. An illumination system ...
Invention Projection exposure system for microlithography with a measurement device. A projection exposure ...
2008 Invention Illumination system for a microlithographic projection exposure apparatus. An illumination system...
Invention Optical device comprising a spring device with a range of constant spring force. The present inve...
Invention Microlithographic projection exposure apparatus. A projection exposure apparatus for microlithogr...
Invention Projection illumination system for euv microlithography. The invention relates to a projection il...
Invention Illumination system for illuminating a mask in a microlithographic exposure apparatus. An illumin...
Invention An element, in particular an optical element, for immersion lithography. The present invention re...
Invention Illumination optics and projection exposure apparatus. An illumination optics is used for illumin...
Invention Illumination optics for microlithography. An illumination optics for microlithography comprises a...
Invention Cleaning module and euv lithography device with cleaning module. In order to enable a more gentle...
Invention Polariser. The invention concerns an optical system having an optical axis (OA) and comprising a ...
Invention Illumination system of a microlithographic projection exposure apparatus. The invention concerns ...
Invention Optical system and method for characterising an optical system. The invention concerns an optical...
Invention Optical element for the reflection of uv radiation, method for manufacturing the same and project...
Invention Device and method for conditioning optical elements by means of laser ablation. The present inven...
Invention Optical device with improved imaging behaviour and method therefor. The invention relates to an o...
Invention Imaging optical system, projection exposure installation for micro-lithography comprising an imag...
Invention Imaging optical system and projection exposure installation for micro-lithography with an imaging...
Invention Optical aperture device. There is provided an optical module (106.1) comprising an aperture devic...
Invention Optical aperture device. There is provided an optical module comprising an aperture device and a ...
2007 Invention Method for removing a contamination layer from an optical surface, method for generating a cleani...
2006 Invention Catadioptric projection objective with intermediate image. In a catadioptric projection objectiv...