JTEC Corporation

Japon

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Type PI
        Brevet 22
        Marque 7
Juridiction
        International 21
        États-Unis 7
        Canada 1
Date
2026 juin 1
2026 (AACJ) 4
2025 3
2021 1
Avant 2021 21
Classe IPC
C12M 1/00 - Appareillage pour l'enzymologie ou la microbiologie 5
C12M 3/00 - Appareillage pour la culture de tissus, de cellules humaines, animales ou végétales, ou de virus 5
G21K 1/06 - Dispositions pour manipuler des particules ou des rayonnements ionisants, p. ex. pour focaliser ou pour modérer utilisant la diffraction, la réfraction ou la réflexion, p. ex. monochromateurs 5
C12M 1/10 - Appareillage pour l'enzymologie ou la microbiologie montés rotativement 4
C12N 5/10 - Cellules modifiées par l'introduction de matériel génétique étranger, p. ex. cellules transformées par des virus 3
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Classe NICE
09 - Appareils et instruments scientifiques et électriques 7
07 - Machines et machines-outils 2
Statut
En Instance 2
Enregistré / En vigueur 27

1.

JTEC

      
Numéro d'application 1923530
Statut Enregistrée
Date de dépôt 2026-03-02
Date d'enregistrement 2026-03-02
Propriétaire JTEC CORPORATION (Japon)
Classes de Nice  ?
  • 07 - Machines et machines-outils
  • 09 - Appareils et instruments scientifiques et électriques

Produits et services

Semiconductor processing machines, equipment, apparatus and instruments, and their parts and accessories; glass processing machines, equipment, apparatus and instruments, and their parts and accessories; ceramics processing machines, equipment, apparatus and instruments, and their parts and accessories; chemical processing machines, equipment, apparatus, and instruments, and their parts and accessories; machines, equipment, apparatus, and instruments for use in manufacturing and processing wafers for electronic devices, and their parts and fittings. Mirrors for synchrotron radiation for optics purposes; X-ray mirrors for optics purposes; special mirrors for optics purposes; X-ray condensing devices and their parts for optics purposes; optical machines, equipment, apparatus and instruments; high-precision form measuring apparatus using interferometers; measuring and testing machines, equipment, apparatus and instruments; electric or magnetic meters and testers; electronic computing machines, equipment, apparatus and instruments and their parts.

2.

JTEC

      
Numéro d'application 248262500
Statut En instance
Date de dépôt 2026-03-02
Propriétaire JTEC CORPORATION (Japon)
Classes de Nice  ? 09 - Appareils et instruments scientifiques et électriques

Produits et services

(1) Mirrors for synchrotron radiation for optics purposes; X-ray mirrors for optics purposes; special mirrors for optics purposes; X-ray condensing devices and their parts for optics purposes; optical machines, equipment, apparatus and instruments; high-precision form measuring apparatus using interferometers; measuring and testing machines, equipment, apparatus and instruments; electric or magnetic meters and testers; electronic computing machines, equipment, apparatus and instruments and their parts.

3.

JTEC

      
Numéro de série 79452378
Statut En instance
Date de dépôt 2026-03-02
Propriétaire JTEC CORPORATION (Japon)
Classes de Nice  ?
  • 07 - Machines et machines-outils
  • 09 - Appareils et instruments scientifiques et électriques

Produits et services

Semiconductor processing machines, equipment, apparatus and instruments, and their parts and accessories; glass processing machines, equipment, apparatus and instruments, and their parts and accessories; ceramics processing machines, equipment, apparatus and instruments, and their parts and accessories; chemical processing machines, equipment, apparatus, and instruments, and their parts and accessories; machines, equipment, apparatus, and instruments for use in manufacturing and processing wafers for electronic devices, and their parts and fittings Mirrors for synchrotron radiation for optics purposes; X-ray mirrors for optics purposes; special mirrors for optics purposes; X-ray condensing devices and their parts for optics purposes; optical machines, equipment, apparatus and instruments; measuring and testing machines, equipment, apparatus and instruments

4.

CONTAINER FOR CENTRIFUGAL SEPARATION AND CENTRIFUGAL SEPARATION SYSTEM

      
Numéro d'application JP2025025125
Numéro de publication 2026/023465
Statut Délivré - en vigueur
Date de dépôt 2025-07-14
Date de publication 2026-01-29
Propriétaire
  • FOUNDATION FOR BIOMEDICAL RESEARCH AND INNOVATION AT KOBE (Japon)
  • JTEC CORPORATION (Japon)
Inventeur(s)
  • Kubo Hirotsugu
  • Shioyama Takahiro
  • Nomura Kenichi
  • Adachi Soichiro
  • Makino Hodaka
  • Taguchi Akihiko
  • Saino Orie
  • Morita Kenichi
  • Ono Takahiro
  • Matsui Tsubasa
  • Kusumoto Kenji

Abrégé

[Problem] To provide a container for centrifugal separation and a centrifugal separation system that make it possible to efficiently recover a target component. [Solution] A container 10 for centrifugal separation includes: a first end section 101 and a second end section 102 in a rotation axis Ra direction; and a storage section 100 that is provided between the first end section 101 and the second end section 102 and is capable of storing a fluid. The first end section 101 has a protrusion 12P facing the second end section 102, and the protrusion 12P is provided with a fluid inlet/outlet 12M.

Classes IPC  ?

  • B04B 1/02 - Centrifugeurs à tambours rotatifs à parois pleines pour la séparation de mélanges essentiellement liquides contenant ou non des particules solides sans cloisons intérieures
  • B04B 5/02 - Centrifugeurs constitués par plusieurs tambours indépendants tournant autour d'un axe situé entre les tambours
  • B04B 11/04 - Alimentation ou déchargement cycliqueSystèmes de commande à cet effet
  • C12M 1/10 - Appareillage pour l'enzymologie ou la microbiologie montés rotativement
  • C12M 1/28 - Inoculateur ou échantillonneur incorporé au récipient

5.

PLASMA-ASSISTED POLISHING DEVICE

      
Numéro d'application JP2025019442
Numéro de publication 2025/249508
Statut Délivré - en vigueur
Date de dépôt 2025-05-29
Date de publication 2025-12-04
Propriétaire
  • JTEC CORPORATION (Japon)
  • THE UNIVERSITY OF OSAKA (Japon)
Inventeur(s)
  • Yamamura Kazuya
  • Hikawa Hideaki
  • Okubo Mamoru
  • Tanaka Tomoyuki
  • Kanezaki Ryota

Abrégé

[Problem] To provide a plasma-assisted polishing device capable of reliably transmitting the rotational force of a rotary shaft to a rotary head by connecting the rotary shaft and a support shaft of the rotary head with electric insulation properties, absorbing the tolerance of each part, and accurately bringing a polishing pad and a workpiece into close contact with each other. [Solution] In a rotary head 14, a head body 88 provided with a mounting part 15 on a lower surface and a support shaft 89 are linked by a link plate 90 so as to be swingable and rotatable with respect to a head body. An end part of the support shaft is coaxially connected to an end part of the rotary shaft 13 by a connection tool 91 having electric insulation property, and at least the support shaft is detachably attached to the connection tool. A washer 92 for slidably receiving the tip of the support shaft is embedded in a surface opposite to a mounting part of the head body, and an engagement shaft 95 is penetrated in an orthogonal state at a tip part of the support shaft. A center hole 97 penetrating through a shaft part 96 of the support shaft is provided in the center of the link plate, and an engagement groove 98 for receiving both end parts of the engagement shaft by providing a clearance is provided on the link plate or the head body, and the link plate is detachably attached to the head body.

Classes IPC  ?

  • B24B 1/00 - Procédés de meulage ou de polissageUtilisation d'équipements auxiliaires en relation avec ces procédés
  • H01L 21/304 - Traitement mécanique, p. ex. meulage, polissage, coupe

6.

PLASMA CVM PROCESSING METHOD AND APPARATUS THEREFOR

      
Numéro d'application JP2024037024
Numéro de publication 2025/084360
Statut Délivré - en vigueur
Date de dépôt 2024-10-17
Date de publication 2025-04-24
Propriétaire JTEC CORPORATION (Japon)
Inventeur(s) Tanaka Tomoyuki

Abrégé

[Problem] To provide a plasma CVM processing method and an apparatus therefor with which it is possible to suppress an increase in surface roughness of a surface to be processed when etching a single crystal semiconductor wafer, a dielectric substrate of crystal or the like, or an X-ray mirror material by a plasma CVM process using a nozzle-type electrode under high pressure. [Solution] A plasma CVM processing method in which high-frequency power is applied to a nozzle-type electrode disposed facing a processing surface of a workpiece to generate plasma based on a process gas under high pressure, and neutral radicals generated in the plasma are caused to act on the surface of the workpiece to remove a volatile substance generated by a chemical reaction between the neutral radicals and a workpiece constituent element during processing, the method comprising a step for simultaneously performing: a step for sucking in the process gas supplied to the periphery of the nozzle-type electrode from a gas suction port opened in the nozzle-type electrode on the workpiece-processing surface side; and a step for applying a positive bias voltage to a conductive workpiece holder for holding the workpiece.

Classes IPC  ?

  • H01L 21/3065 - Gravure par plasmaGravure au moyen d'ions réactifs

7.

PLASMA-ASSISTED POLISHING METHOD AND DEVICE THEREFOR

      
Numéro d'application JP2024035095
Numéro de publication 2025/074994
Statut Délivré - en vigueur
Date de dépôt 2024-10-01
Date de publication 2025-04-10
Propriétaire
  • JTEC CORPORATION (Japon)
  • OSAKA UNIVERSITY (Japon)
Inventeur(s)
  • Yamamura Kazuya
  • Kanaoka Masahiko
  • Kanezaki Ryota
  • Hikawa Hideaki

Abrégé

[Problem] To provide a plasma-assisted polishing method and a device therefor, capable of suppressing one-sided wear of a polishing pad and facilitating attachment/detachment work of a polishing pad and a workpiece in processing of a hard-to-work material using a plasma-assisted polishing method. [Solution] In an operation for relatively moving a workpiece W and a polishing pad P, the workpiece is polished by a combination of the rotation of the workpiece and the polishing pad each having an axis in a first direction, and the swing in a second direction orthogonal to the first direction and increasing or decreasing the distance between the two axes. The workpiece and the polishing pad face each other by being detachably held by mounting parts 10, 13 provided with rotary shafts 9, 12 each directed in the first direction. When the workpiece and/or the polishing pad is attached/detached, the workpiece and the polishing pad are moved in the second direction beyond a range of oscillation in a normal polishing process in a state of stopping the rotation of the workpiece and/or the polishing pad, and the workpiece and/or the polishing pad is attached/detached to/from the mounting part in a state where the workpiece and/or the polishing pad is exposed from the facing member.

Classes IPC  ?

  • B24B 1/00 - Procédés de meulage ou de polissageUtilisation d'équipements auxiliaires en relation avec ces procédés
  • B24D 3/00 - Propriétés physiques des corps ou feuilles abrasives, p. ex. surfaces abrasives de nature particulièreCorps ou feuilles abrasives caractérisés par leurs constituants
  • B24D 3/14 - Propriétés physiques des corps ou feuilles abrasives, p. ex. surfaces abrasives de nature particulièreCorps ou feuilles abrasives caractérisés par leurs constituants les constituants étant utilisés comme agglomérants et étant essentiellement inorganiques céramiques, c.-à-d. agglomérants vitrifiés
  • B24D 7/00 - Meules agglomérées, ou meules comportant des segments abrasifs rapportés, conçues pour travailler autrement que par la périphérie, p. ex. par le côtéBagues ou accessoires pour le montage de ces meules
  • H01L 21/304 - Traitement mécanique, p. ex. meulage, polissage, coupe

8.

MACHINING METHOD EMPLOYING ORGANIC FINE PARTICLES

      
Numéro d'application JP2020037321
Numéro de publication 2021/066071
Statut Délivré - en vigueur
Date de dépôt 2020-09-30
Date de publication 2021-04-08
Propriétaire JTEC CORPORATION (Japon)
Inventeur(s)
  • Okada Hiromi
  • Aono Shinya
  • Tsumura Takashi

Abrégé

[Problem] To provide a machining method employing organic fine particles that can be used to manufacture, by means of elastic emission machining (EEM) processing, which has demonstrated excellent results, an optical element, or a glass substrate provided with a high precision surface, for use in an optical system having a wavelength band from the vacuum ultraviolet region to the hard X-ray region, that resolves the problem of agglomeration of the machining fine particles, and with which, even if the machining fine particles are attached to the surface of a workpiece after machining, the machining fine particles can easily be removed. [Solution] An EEM process for machining a workpiece employs a machining liquid in which machining fine particles (3) that are capable of adhering to a surface (2) of a workpiece (1) by means of a physiochemical interaction are dispersed in a solvent, causes the machining liquid to flow along the workpiece surface, and, by means of the shear flow of the machining liquid, removes the machining fine particles that have attached to the workpiece surface in a no-load state together with workpiece surface atoms that have bonded to the machining fine particles, wherein organic fine particles are used as the only solid material for the machining fine particles.

Classes IPC  ?

  • B24B 31/00 - Machines ou dispositifs pour polir ou travailler par abrasion des surfaces "au tonneau", ou au moyen d'autres appareils, dans lesquels les pièces à travailler ou les produits abrasifs sont libresAccessoires à cet effet
  • B24C 1/00 - Méthodes d'utilisation de jet abrasif en vue d'effectuer un travail déterminéUtilisation d'équipements auxiliaires liés à ces méthodes
  • B24C 11/00 - Emploi de matériaux abrasifs spécifiés pour les jets abrasifs

9.

DEFORMABLE MIRROR AND METHOD FOR MANUFACTURING SAME

      
Numéro d'application JP2019001556
Numéro de publication 2020/148911
Statut Délivré - en vigueur
Date de dépôt 2019-01-18
Date de publication 2020-07-23
Propriétaire JTEC CORPORATION (Japon)
Inventeur(s)
  • Ichii Yoshio
  • Okada Hiromi
  • Tsumura Takashi

Abrégé

22 as a main component; and piezoelectric elements, the piezoelectric elements being arranged and bonded with left-right symmetry to both sides of a strip-shaped reflective surface formed at a center line section along a longitudinal direction, said surface being at least a front surface from among a front and a back surface of the mirror substrate. A bonding material containing, as a main component, metal nanoparticles having a particle diameter of 100 nm or less is used to bond the mirror substrate and piezoelectric elements.

Classes IPC  ?

  • G02B 5/09 - Miroirs à facettes multiples ou polygonales
  • G02B 5/10 - Miroirs à surfaces courbes
  • G02B 26/06 - Dispositifs ou dispositions optiques pour la commande de la lumière utilisant des éléments optiques mobiles ou déformables pour commander la phase de la lumière
  • G21K 1/06 - Dispositions pour manipuler des particules ou des rayonnements ionisants, p. ex. pour focaliser ou pour modérer utilisant la diffraction, la réfraction ou la réflexion, p. ex. monochromateurs

10.

METHOD FOR PRODUCING MULTILAYER MYOCARDIAL TISSUE CULTURE

      
Numéro d'application JP2019038272
Numéro de publication 2020/067479
Statut Délivré - en vigueur
Date de dépôt 2019-09-27
Date de publication 2020-04-02
Propriétaire
  • OSAKA UNIVERSITY (Japon)
  • JTEC CORPORATION (Japon)
Inventeur(s)
  • Miyagawa, Shigeru
  • Sawa, Yoshiki
  • Nakazato, Taro
  • Sasai, Masao
  • Liu, Li
  • Tsumura, Takashi
  • Uemura, Toshimasa
  • Jin, Meihua

Abrégé

The present invention provides: a method for producing a multilayer myocardial tissue culture, comprising culturing myocardial cells seeded on a fiber sheet made from a biocompatible polymer under a pseudo-microgravity environment; a multilayer myocardial tissue culture which is produced by the method, is thick, and has a high survival rate; and others.

Classes IPC  ?

  • C12N 5/077 - Cellules mésenchymateuses, p. ex. cellules osseuses, cellules de cartilage, cellules stromales médulaires, cellules adipeuses ou cellules musculaires
  • A61K 35/34 - MusclesCellules musculaires lissesCœurCellules souches cardiaquesMyoblastesMyocytesCardiomyocytes
  • A61K 35/545 - Cellules souches embryonnairesCellules souches pluripotentesCellules souches pluripotentes induitesCellules souches non caractérisées
  • A61L 27/16 - Matériaux macromoléculaires obtenus par des réactions faisant intervenir uniquement des liaisons non saturées carbone-carbone
  • A61L 27/18 - Matériaux macromoléculaires obtenus par des réactions autres que celles faisant intervenir uniquement des liaisons non saturées carbone-carbone
  • A61L 27/38 - Cellules animales
  • A61L 27/40 - Matériaux composites, c.-à-d. en couches ou contenant un matériau dispersé dans une matrice constituée d'un matériau analogue ou différent
  • A61L 27/58 - Matériaux au moins partiellement résorbables par le corps
  • A61P 9/00 - Médicaments pour le traitement des troubles du système cardiovasculaire
  • C12N 5/10 - Cellules modifiées par l'introduction de matériel génétique étranger, p. ex. cellules transformées par des virus

11.

MONONUCLEAR CELL SEPARATING DEVICE AND MONONUCLEAR CELL SEPARATING METHOD

      
Numéro d'application JP2018002497
Numéro de publication 2018/139583
Statut Délivré - en vigueur
Date de dépôt 2018-01-26
Date de publication 2018-08-02
Propriétaire
  • FOUNDATION FOR BIOMEDICAL RESEARCH AND INNOVATION AT KOBE (Japon)
  • JTEC CORPORATION (Japon)
Inventeur(s)
  • Taguchi, Akihiko
  • Niino, Yukiko
  • Tsumura, Takashi
  • Morita, Kenichi

Abrégé

This mononuclear cell separating device comprises: an introducing means 210 for introducing a centrifugal separation medium from a bottom surface of a container 100 in which a blood sample is stored; a centrifugal separation means 300 for causing centrifugal separation to be performed by the container 100 in which the centrifugal separation medium and the blood sample are layered in this order from the bottom surface side; a detecting means 400 for detecting a blood clot present in a mononuclear cell layer after the centrifugal separation; a removing means 220 for removing the detected blood clot; and a collecting means 230 for collecting mononuclear cells. Further, the mononuclear cell separating method according to the present invention includes an introducing step, a centrifugal separation step, a detecting step, a removing step and a collecting step corresponding to each constituent element of the mononuclear cell separating device of the present invention.

Classes IPC  ?

  • G01N 33/48 - Matériau biologique, p. ex. sang, urineHémocytomètres

12.

LARGE-SCALE CELL CULTURE SYSTEM AND VESSEL-VESSEL CELL LIQUID TRANSFER DEVICE FOR USE THEREIN, AND ROTARY CELL CULTURE DEVICE

      
Numéro d'application JP2017002558
Numéro de publication 2017/187680
Statut Délivré - en vigueur
Date de dépôt 2017-01-25
Date de publication 2017-11-02
Propriétaire JTEC CORPORATION (Japon)
Inventeur(s)
  • Tsumura Takashi
  • Uemura Toshimasa
  • Uchita Yudai

Abrégé

[Problem] To provide: a large-scale cell culture system whereby it becomes possible to culture a pluripotent stem cell, particularly an iPS cell, which is intended to be used in regenerative medicine or the like, on a large scale in the absence of a feeder cell or a coating agent while maintaining the undifferentiated state thereof, it also becomes possible to subculture the cell while eliminating fluctuations resulted from the differences in skill of operators, and it also becomes possible to culture an adherent cell in a floating state; a vessel-vessel cell liquid transfer device which can be used in the system; and a rotary cell culture device. [Solution] A large-scale cell culture system for subculturing and for the translocation between spheroids and a liquid culture medium in a closed system using a vessel having a syringe-type structure to produce cells on a large scale, wherein, in the vessel, a front flange and a back flange, which have the same circular outer shape as each other, are provided integrally at both ends of an outer cylinder part and a head part is capped with a detachable cap, so that the vessel can perform rotary culturing utilizing the front flange and the back flange in such a state that a cell liquid, which comprises cells suspended in a liquid culture medium, is filled in a space closed with a gasket of a plunger.

Classes IPC  ?

  • C12M 1/00 - Appareillage pour l'enzymologie ou la microbiologie
  • C12M 1/10 - Appareillage pour l'enzymologie ou la microbiologie montés rotativement
  • C12N 5/07 - Cellules animales ou tissus animaux

13.

METHOD FOR SEEDING CELLS TO SCAFFOLD MATERIAL AND DEVICE THEREFOR

      
Numéro d'application JP2016087221
Numéro de publication 2017/141531
Statut Délivré - en vigueur
Date de dépôt 2016-12-14
Date de publication 2017-08-24
Propriétaire
  • PUBLIC UNIVERSITY CORPORATION YOKOHAMA CITY UNIVERSITY (Japon)
  • JTEC CORPORATION (Japon)
Inventeur(s)
  • Taniguchi Hideki
  • Takebe Takanori
  • Tsumura Takashi
  • Ono Takahiro

Abrégé

[Problem] To provide: a method for seeding cells to a scaffold material, whereby cells can be automatically and uniformly seeded within a short period of time from the core part of a scaffold material, even in the case where the scaffold material has a relatively large size, and the usage amount of a cell suspension, in which the cells are suspended in a medium, can be minimized; and a device therefor. [Solution] A cell seeding device for uniformly seeding cells to a porous scaffold material, said porous scaffold material being capable of serving as a scaffold for the three-dimensional growth of the cells, by driving a syringe filled with a cell suspension in which the cells are suspended in a medium, said cell seeding device comprising: on a base part 11, a scaffold material-holding part 31 that holds the porous scaffold material 3; a main movable part 12 that holds an outer cylinder part 21 of the syringe 2, said syringe being provided with a needle 23 having a plurality of discharge ports formed in the side face thereof, and is movable forward and backward along the puncture direction; and a sub-movable part 13 that holds one end part of a plunger 22 of the syringe and is movable forward and backward relative to the outer cylinder part of the syringe.

Classes IPC  ?

  • C12N 5/071 - Cellules ou tissus de vertébrés, p. ex. cellules humaines ou tissus humains
  • C12M 1/00 - Appareillage pour l'enzymologie ou la microbiologie
  • C12M 1/26 - Inoculateur ou échantillonneur

14.

Method for culturing pluripotent stem cells

      
Numéro d'application 15515449
Numéro de brevet 10696951
Statut Délivré - en vigueur
Date de dépôt 2015-09-30
Date de la première publication 2017-08-03
Date d'octroi 2020-06-30
Propriétaire JTEC Corporation (Japon)
Inventeur(s)
  • Uemura, Toshimasa
  • Onomura, Yui
  • Tsumura, Takashi

Abrégé

Provided is a method for efficiently culturing pluripotent stem cells with higher safety. The present invention relates to a method for culturing pluripotent stem cells, the method comprising culturing an isolated pluripotent stem cells in a pseudo-microgravity environment to proliferate the pluripotent stem cells while maintaining the pluripotent stem cells in an undifferentiated state, thereby forming and growing spheroids of the pluripotent stem cells; and a method for inducing differentiation of pluripotent stem cells by using the method.

Classes IPC  ?

  • C12N 5/00 - Cellules non différenciées humaines, animales ou végétales, p. ex. lignées cellulairesTissusLeur culture ou conservationMilieux de culture à cet effet
  • C12M 1/28 - Inoculateur ou échantillonneur incorporé au récipient
  • C12N 5/074 - Cellules souches adultes
  • C12N 5/10 - Cellules modifiées par l'introduction de matériel génétique étranger, p. ex. cellules transformées par des virus
  • C12M 1/34 - Mesure ou test par des moyens de mesure ou de détection des conditions du milieu, p. ex. par des compteurs de colonies
  • C12M 3/00 - Appareillage pour la culture de tissus, de cellules humaines, animales ou végétales, ou de virus

15.

ROTATING CULTURE DEVICE AND CULTURE VESSEL FOR USE IN ROTATING CULTURE DEVICE

      
Numéro d'application JP2017000509
Numéro de publication 2017/119513
Statut Délivré - en vigueur
Date de dépôt 2017-01-10
Date de publication 2017-07-13
Propriétaire JTEC CORPORATION (Japon)
Inventeur(s)
  • Tsumura Takashi
  • Ono Takahiro

Abrégé

[Problem] To provide, at low cost, a rotating culture device with which it is easy understand or control a dispersed state of cell masses without worsening the ability to perform maintenance or conduct work such as removing a culture vessel, replacing a culture medium, installing a culture vessel, etc., and with which, even in a culture vessel having a large volume, cell masses can be cultured in a dispersed state without being locally concentrated. As a result, cell masses are prevented from colliding with each other, enabling large-scale culturing of high-quality uniform cell tissues and culturing of larger cells. [Solution] The present invention is provided with a cylindrical culture vessel 10 which is axially elongated, a bearing mechanism 11 for bearing the culture vessel 10 so that the culture vessel 10 can rotate about an axis, a rotational drive means 12 for driving the culture vessel 10 to rotate, a tilting means 13 for tilting the bearing mechanism 11 so that the axis of the culture vessel 10 is inclined upward and downward, and a control means 15 for controlling operation of the rotational drive means 12 and the tilting means 13.

Classes IPC  ?

  • C12M 1/10 - Appareillage pour l'enzymologie ou la microbiologie montés rotativement
  • C12M 1/00 - Appareillage pour l'enzymologie ou la microbiologie
  • C12M 3/00 - Appareillage pour la culture de tissus, de cellules humaines, animales ou végétales, ou de virus
  • C12N 5/02 - Propagation de cellules individuelles ou de cellules en suspensionLeur conservationMilieux de culture à cet effet

16.

OsakaMirror

      
Numéro d'application 1305699
Statut Enregistrée
Date de dépôt 2016-02-17
Date d'enregistrement 2016-02-17
Propriétaire JTEC CORPORATION (Japon)
Classes de Nice  ? 09 - Appareils et instruments scientifiques et électriques

Produits et services

Mirrors for synchrotron radiation for optics purposes; X-ray mirrors for optics purposes; special mirrors for optics purposes; X-ray condensing devices and their parts for optics purposes; optical machines, apparatus and instruments; high-precision form measuring apparatus using interferometers; measuring and testing machines, apparatus and instruments.

17.

CellPet

      
Numéro d'application 1300628
Statut Enregistrée
Date de dépôt 2016-02-17
Date d'enregistrement 2016-02-17
Propriétaire JTEC CORPORATION (Japon)
Classes de Nice  ? 09 - Appareils et instruments scientifiques et électriques

Produits et services

Laboratory apparatus and instruments; cell culture vessels for laboratory use and their parts, fittings and accessories; cell incubators for laboratory use and their parts, fittings and accessories; cell culture apparatus for laboratory use and their parts, fittings and accessories; computer programs for cell culture control.

18.

CellMeister

      
Numéro d'application 1300629
Statut Enregistrée
Date de dépôt 2016-02-17
Date d'enregistrement 2016-02-17
Propriétaire JTEC CORPORATION (Japon)
Classes de Nice  ? 09 - Appareils et instruments scientifiques et électriques

Produits et services

Laboratory apparatus and instruments; cell culture vessels for laboratory use and their parts, fittings and accessories; cell incubators for laboratory use and their parts, fittings and accessories; cell culture apparatus for laboratory use and their parts, fittings and accessories; pipettes; centrifugal separators, centrifuge tubes, heaters, thermostats, mixers, heating and mixing devices, and dispensers for laboratory use; cell counting devices for laboratory use; cell separation devices for laboratory use; devices for use in analytical experiments of biological and chemical substances; biochemical analysis devices; chemical analysis machines, apparatus and instruments; measuring and testing machines, apparatus and instruments; optical machines, apparatus and instruments; processed glass, other than for building; ozonizers; electrolysers; computer programs for chemical analyses; computer programs for cell culture control.

19.

METHOD FOR CULTURING PLURIPOTENT STEM CELLS

      
Numéro d'application JP2015077824
Numéro de publication 2016/052657
Statut Délivré - en vigueur
Date de dépôt 2015-09-30
Date de publication 2016-04-07
Propriétaire
  • NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (Japon)
  • JTEC CORPORATION (Japon)
Inventeur(s)
  • Uemura Toshimasa
  • Onomura Yui
  • Tsumura Takashi

Abrégé

Provided is a method for efficiently culturing pluripotent stem cells at a higher safety. The present invention relates to: a method for culturing pluripotent stem cells, said method comprising culturing isolated pluripotent stem cells in a quasi-microgravity environment, thus proliferating the pluripotent stem cells while retaining the pluripotent stem cells in undifferentiated conditions, and thereby forming and developing spheroids of the pluripotent stem cells; and a method for inducing differentiation of pluripotent stem cells using the aforesaid method.

Classes IPC  ?

  • C12N 5/10 - Cellules modifiées par l'introduction de matériel génétique étranger, p. ex. cellules transformées par des virus
  • C12N 5/0735 - Cellules souches embryonnairesCellules germinales embryonnaires
  • C12N 5/074 - Cellules souches adultes

20.

OSAKAMIRROR

      
Numéro de série 79190306
Statut Enregistrée
Date de dépôt 2016-02-17
Date d'enregistrement 2017-06-20
Propriétaire JTEC CORPORATION (Japon)
Classes de Nice  ? 09 - Appareils et instruments scientifiques et électriques

Produits et services

Mirrors for synchrotron radiation for optics purposes; X-ray mirrors for optics purposes; special mirrors for optics purposes (( ; X-ray condensing devices for optics purposes and structural parts therefor ))

21.

CELL CULTURE DEVICE HAVING CULTURE MEDIUM REPLACEMENT FUNCTION

      
Numéro d'application JP2013055362
Numéro de publication 2013/129558
Statut Délivré - en vigueur
Date de dépôt 2013-02-28
Date de publication 2013-09-06
Propriétaire JTEC CORPORATION (Japon)
Inventeur(s)
  • Tsumura Takashi
  • Ono Takahiro

Abrégé

[Problem] To provide a small-scale cell culture device for culturing cells in a small number of Petri dishes, said cell culture device having a culture medium replacement function whereby the automated replacement of the culture medium and the culturing of the cells can be carried out within the same cavity, significantly reducing device costs. [Solution] At least a top set and a bottom set of discs are provided within an incubation chamber (1). Petri dishes (4, 6) into which cells and a culture medium have been introduced are supported by the lower discs (18, 29). Lids (5, 7) are supported by the upper discs (19, 30). The bottoms of the lids are exposed. It is possible to achieve a state in which the Petri dishes are covered with the lids by moving the lower discs and the upper discs towards each other in the vertical direction, and a state in which the lids are offset from the Petri dishes in the lateral direction and the Petri dishes are partially exposed by moving the lower discs and the upper discs away from each other in the vertical direction and rotating either the lower discs or the upper discs by a prescribed angle. A culture medium replacement means (13) is inserted into the exposed portion of a Petri dish from above through insertion holes formed in the upper plates, the culture medium is replaced, the lids are made to cover the Petri dishes, and the culturing of the cells is continued.

Classes IPC  ?

  • C12M 3/00 - Appareillage pour la culture de tissus, de cellules humaines, animales ou végétales, ou de virus
  • C12M 1/00 - Appareillage pour l'enzymologie ou la microbiologie

22.

Reflective surface shape controllable mirror device, and method for manufacturing reflective surface shape controllable mirror

      
Numéro d'application 13519175
Numéro de brevet 09287016
Statut Délivré - en vigueur
Date de dépôt 2010-12-28
Date de la première publication 2013-01-10
Date d'octroi 2016-03-15
Propriétaire
  • JTEC CORPORATION (Japon)
  • OSAKA UNIVERSITY (Japon)
Inventeur(s)
  • Yamauchi, Kazuto
  • Kimura, Takashi
  • Tsumura, Takashi

Abrégé

The device is configured from: a reflective surface shape controllable mirror in which a band-shaped X-ray reflective surface 2 is formed on a central portion of a front surface of a substrate 1, reference planes 3 are formed along both sides of the X-ray reflective surface, and a plurality of piezoelectric elements 4 are attached to at least one of front and back surfaces of the substrate so as to be arranged in the longitudinal direction of the X-ray reflective surface on both side portions of the substrate, and a multichannel control system for applying a voltage to each of the piezoelectric elements.

Classes IPC  ?

  • G02B 26/08 - Dispositifs ou dispositions optiques pour la commande de la lumière utilisant des éléments optiques mobiles ou déformables pour commander la direction de la lumière
  • G21K 1/06 - Dispositions pour manipuler des particules ou des rayonnements ionisants, p. ex. pour focaliser ou pour modérer utilisant la diffraction, la réfraction ou la réflexion, p. ex. monochromateurs

23.

Rotating culture vessel and automatic cell culture apparatus using same

      
Numéro d'application 13375606
Numéro de brevet 10287539
Statut Délivré - en vigueur
Date de dépôt 2010-06-09
Date de la première publication 2012-04-05
Date d'octroi 2019-05-14
Propriétaire JTEC CORPORATION (Japon)
Inventeur(s)
  • Tsumura, Takashi
  • Okada, Hiromi
  • Uemura, Toshimasa
  • Oyabu, Yoshimi

Abrégé

Disclosed is a rotating culture vessel based on a rotating culture technology using an RWV, by which cell seeding, liquid medium exchange, quality control and so on can be automated and degassing can be conducted simultaneously with liquid medium exchange without disturbing the cells under culture. Also disclosed is an automatic cell culture apparatus using the same. A rotating culture vessel, which contains cells and a liquid culture medium, to be attached to a horizontal rotating shaft of a rotating culture device to three-dimensionally culture the cells, wherein one or more inlets/outlets for supplying cells and a liquid culture medium at the early stage and then taking out the cultured cells, are formed at appropriate position of a flat cylindrical culture container; at least one pair of a supply port and a discharge port for liquid medium exchange is provided on the outer circumferential cylindrical face of the culture container.

Classes IPC  ?

  • C12M 3/04 - Appareillage pour la culture de tissus, de cellules humaines, animales ou végétales, ou de virus comportant des moyens fournissant des couches minces
  • C12M 3/00 - Appareillage pour la culture de tissus, de cellules humaines, animales ou végétales, ou de virus

24.

MIRROR DEVICE FOR CONTROLLING SHAPE OF REFLECTIVE SURFACE, AND METHOD FOR PRODUCING MIRROR FOR CONTROLLING SHAPE OF REFLECTIVE SURFACE

      
Numéro d'application JP2010073716
Numéro de publication 2011/081182
Statut Délivré - en vigueur
Date de dépôt 2010-12-28
Date de publication 2011-07-07
Propriétaire
  • JTEC Corporation (Japon)
  • OSAKA UNIVERSITY (Japon)
Inventeur(s)
  • Yamauchi Kazuto
  • Kimura Takashi
  • Tsumura Takashi

Abrégé

Provided is a mirror device for controlling the shape of a reflective surface, which: has a laminate structure formed from materials having different thermal expansion coefficients; eliminates the error in processing the surface shape caused by distortions resulting from the temperature differences during the production of a mirror, and the error in the surface shape caused by distortions resulting from the conditions of the installation environment during the process in which nano light is focused; achieves an nmth order shape accuracy; changes the X-ray beam into an ideal wavefront; and can change the focal distance. The device is configured from: a mirror for controlling the shape of a reflective surface in which a band-shaped X-ray reflective surface (2) is formed on the center of the surface of a substrate (1), reference planes (3) are formed along both sides of the X-ray reflective surface, and a plurality of piezoelectric elements (4) are joined and arranged on the front and back surfaces and along the entire edges of the substrate in the lengthwise direction of the X-ray reflective surface; and a multichannel control system which applies a voltage to each piezoelectric element (4).

Classes IPC  ?

  • G21K 1/06 - Dispositions pour manipuler des particules ou des rayonnements ionisants, p. ex. pour focaliser ou pour modérer utilisant la diffraction, la réfraction ou la réflexion, p. ex. monochromateurs
  • G02B 5/10 - Miroirs à surfaces courbes

25.

ROTATING CULTURE VESSEL AND AUTOMATIC CELL CULTURE APPARATUS USING SAME

      
Numéro d'application JP2010059754
Numéro de publication 2010/143651
Statut Délivré - en vigueur
Date de dépôt 2010-06-09
Date de publication 2010-12-16
Propriétaire
  • JTEC Corporation (Japon)
  • National Institute of Advanced Industrial Science and Technology (Japon)
Inventeur(s)
  • Tsumura Takashi
  • Okada Hiromi
  • Uemura Toshimasa
  • Oyabu Yoshimi

Abrégé

Disclosed is a rotating culture vessel based on a rotating culture technology using an RWV, by which cell seeding, liquid medium exchange, quality control and so on can be automated and degassing can be conducted simultaneously with liquid medium exchange without disturbing the cells under culture. Also disclosed is an automatic cell culture apparatus using the same. A rotating culture vessel, which contains cells and a liquid culture medium therein, to be attached to a horizontal rotating shaft of a rotating culture device to thereby three-dimensionally culture the cells, wherein one or more inlets/outlets (19, 20, 21) for supplying cells and a liquid culture medium at the early stage and then taking out the cultured cells, are formed at appropriate position(s) of a flat cylindrical culture container (18); at least one pair of a supply port (22) and a discharge port (23) for liquid medium exchange is provided on the outer circumferential cylindrical face of the culture container (18); the paired supply port and discharge port are positioned 180° opposite to each other; and the center line of the discharge port (23) passes through the rotational center, while the center line of the supply port (22) is eccentrically positioned with respect to the rotating center.

Classes IPC  ?

  • C12M 1/00 - Appareillage pour l'enzymologie ou la microbiologie
  • C12M 1/10 - Appareillage pour l'enzymologie ou la microbiologie montés rotativement
  • C12M 3/00 - Appareillage pour la culture de tissus, de cellules humaines, animales ou végétales, ou de virus

26.

Electron-beam-assisted EEM method

      
Numéro d'application 11989960
Numéro de brevet 08235769
Statut Délivré - en vigueur
Date de dépôt 2006-08-03
Date de la première publication 2010-09-02
Date d'octroi 2012-08-07
Propriétaire
  • Yuzo Mori (Japon)
  • JTEC Corporation (Japon)
Inventeur(s) Mori, Yuzo

Abrégé

To provide an electron beam assisted EEM method that can realize ultraprecision machining of workpieces, including glass ceramic materials, in which at least two component materials different from each other in machining speed in a machining process are present in a refined mixed state and the surface state is not even, to a surface roughness of 0.2 to 0.05 nm RMS. The EEM method comprises a working process in which a workpiece and chemically reactive fine particles are allowed to flow along the working face to remove atoms on the working face chemically bonded to the fine particles together with the fine particles through chemical interaction between the fine particles and the working face interface. The workpiece comprises at least two component materials present in a refined mixed state and different from each other in machining speed in the machining process. After the exposure of the workpiece in its working face to an electron beam to conduct modification so that the machining speed of the surface layer part in the working face is substantially even, ultraprecision smoothening is carried out by working process.

Classes IPC  ?

  • B24B 49/00 - Appareillage de mesure ou de calibrage pour la commande du mouvement d'avance de l'outil de meulage ou de la pièce à meulerAgencements de l'appareillage d'indication ou de mesure, p. ex. pour indiquer le début de l'opération de meulage

27.

METHOD AND APPARATUS OF PRECISELY MEASURING INTENSITY PROFILE OF X-RAY NANOBEAM

      
Numéro d'application JP2009055474
Numéro de publication 2010/097968
Statut Délivré - en vigueur
Date de dépôt 2009-03-19
Date de publication 2010-09-02
Propriétaire
  • JTEC Corporation (Japon)
  • OSAKA UNIVERSITY (Japon)
Inventeur(s)
  • Yamauchi, Kazuto
  • Mimura, Hidekazu
  • Okada, Hiromi

Abrégé

Provided are a method and an apparatus of precisely measuring the intensity profile of an x-ray nanobeam, which can measure x-rays having different wavelengths with one knife edge and can perform optimal measurements corresponding to the depth of focus of an x-ray beam and the conditions of other measurement devices, using a dark field measurement method which enables precise measurements of the profile of an x-ray beam using a knife edge and using diffracted and transmitted x-rays. The knife edge (4) is formed of a heavy metal which advances the phase of an x-ray passing therethrough and is fabricated in such a manner that the thickness may change in the longitudinal direction continuously or in a stepwise fashion. The knife edge (4) is so set that an x-ray beam may traverse the knife edge (4) at such a thickness position as to achieve a phase shift in a range wherein a transmitted x-ray and a diffracted x-ray diffracted at the end of the knife edge may reinforce each other, and a superposed x-ray of the diffracted x-ray and the transmitted x-ray is measured by an x-ray detector.

Classes IPC  ?

  • G01T 1/29 - Mesure effectuée sur des faisceaux de radiations, p. ex. sur la position ou la section du faisceauMesure de la distribution spatiale de radiations
  • G21K 1/00 - Dispositions pour manipuler des particules ou des rayonnements ionisants, p. ex. pour focaliser ou pour modérer
  • H05G 2/00 - Appareils ou procédés spécialement adaptés à la production de rayons X, n'utilisant pas de tubes à rayons X, p. ex. utilisant la génération d'un plasma

28.

X-ray condensing method and its device using phase restoration method

      
Numéro d'application 12440121
Numéro de brevet 07936860
Statut Délivré - en vigueur
Date de dépôt 2007-12-27
Date de la première publication 2010-07-22
Date d'octroi 2011-05-03
Propriétaire
  • JTEC Corporation (Japon)
  • Osaka University (Japon)
Inventeur(s)
  • Yamauchi, Kazuto
  • Mimura, Hidekazu
  • Okada, Hiromi

Abrégé

An X-ray condensing method and its device are provided with an X-ray mirror that has a wavefront adjustable function to finely adjust a wavefront of a reflecting X-ray, measure an X-ray intensity distribution in the vicinity of a focus, measure an X-ray intensity distribution in the vicinity of the X-ray mirror or use a known X-ray intensity distribution of an incident X-ray, calculate a complex amplitude distribution at the reflective surface by using a phase restoration method from the X-ray intensity distribution in the vicinity of the focus and the X-ray intensity distribution in the vicinity of the reflective surface, calculate a wavefront aberration of an X-ray condensing optical system from the complex amplitude distribution, and control the reflective surface of the X-ray mirror with the wavefront adjustable function so that the wavefront aberration is minimized.

Classes IPC  ?

  • G21K 1/06 - Dispositions pour manipuler des particules ou des rayonnements ionisants, p. ex. pour focaliser ou pour modérer utilisant la diffraction, la réfraction ou la réflexion, p. ex. monochromateurs
  • G01D 18/00 - Test ou étalonnage des appareils ou des dispositions prévus dans les groupes
  • G01N 23/04 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en transmettant la radiation à travers le matériau et formant des images des matériaux

29.

X-RAY CONDENSING METHOD AND ITS DEVICE USING PHASE RESTORATION METHOD

      
Numéro d'application JP2007075132
Numéro de publication 2008/081873
Statut Délivré - en vigueur
Date de dépôt 2007-12-27
Date de publication 2008-07-10
Propriétaire
  • JTEC Corporation (Japon)
  • OSAKA UNIVERSITY (Japon)
Inventeur(s)
  • Yamauchi, Kazuto
  • Mimura, Hidekazu
  • Okada, Hiromi

Abrégé

[PROBLEMS TO BE SOLVED] By making use of a phase restoration method based on the wave optics theory and by using a intensity distribution of condensed light beams of hard X-rays used for an actual evaluation that are condensed by a mirror, a phase error distribution on the mirror, i.e., an X-ray wavefront measurement method to obtain shape errors is proposed and an X-ray condensing method and its device using a phase restoration method to optimize an X-ray condensing optical system by making use of such an X-ray wavefront measurement method are proposed. [MEANS FOR SOLVING THE PROBLEMS] An X-ray condensing method and its device are provided with an X-ray mirror that has a wavefront adjustable function to finely adjust a wavefront of a reflecting X-ray, measure an X-ray intensity distribution in the vicinity of a focus, measure an X-ray intensity distribution in the vicinity of the X-ray mirror or use a known X-ray intensity distribution of an incident X-ray, calculate a complex amplitude distribution at the reflective surface by using a phase restoration method from the X-ray intensity distribution in the vicinity of the focus and the X-ray intensity distribution in the vicinity of the reflective surface, calculate a wavefront aberration of an X-ray condensing optical system from the complex amplitude distribution, and control the reflective surface of the X-ray mirror with the wavefront adjustable function so that the wavefront aberration is minimized.

Classes IPC  ?

  • G21K 1/06 - Dispositions pour manipuler des particules ou des rayonnements ionisants, p. ex. pour focaliser ou pour modérer utilisant la diffraction, la réfraction ou la réflexion, p. ex. monochromateurs
  • G01N 23/207 - Diffractométrie, p. ex. en utilisant une sonde en position centrale et un ou plusieurs détecteurs déplaçables en positions circonférentielles
  • G01N 23/223 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en mesurant l'émission secondaire de matériaux en irradiant l'échantillon avec des rayons X ou des rayons gamma et en mesurant la fluorescence X
  • G02B 5/10 - Miroirs à surfaces courbes
  • G21K 7/00 - Microscopes à rayons gamma ou à rayons X
  • H01L 21/027 - Fabrication de masques sur des corps semi-conducteurs pour traitement photolithographique ultérieur, non prévue dans le groupe ou