JTEC Corporation

Japan

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Date
2026 June 1
2026 (YTD) 4
2025 3
2021 1
Before 2021 21
IPC Class
C12M 1/00 - Apparatus for enzymology or microbiology 5
C12M 3/00 - Tissue, human, animal or plant cell, or virus culture apparatus 5
G21K 1/06 - Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction, or reflection, e.g. monochromators 5
C12M 1/10 - Apparatus for enzymology or microbiology rotatably mounted 4
C12N 5/10 - Cells modified by introduction of foreign genetic material, e.g. virus-transformed cells 3
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NICE Class
09 - Scientific and electric apparatus and instruments 7
07 - Machines and machine tools 2
Status
Pending 2
Registered / In Force 27

1.

JTEC

      
Application Number 1923530
Status Registered
Filing Date 2026-03-02
Registration Date 2026-03-02
Owner JTEC CORPORATION (Japan)
NICE Classes  ?
  • 07 - Machines and machine tools
  • 09 - Scientific and electric apparatus and instruments

Goods & Services

Semiconductor processing machines, equipment, apparatus and instruments, and their parts and accessories; glass processing machines, equipment, apparatus and instruments, and their parts and accessories; ceramics processing machines, equipment, apparatus and instruments, and their parts and accessories; chemical processing machines, equipment, apparatus, and instruments, and their parts and accessories; machines, equipment, apparatus, and instruments for use in manufacturing and processing wafers for electronic devices, and their parts and fittings. Mirrors for synchrotron radiation for optics purposes; X-ray mirrors for optics purposes; special mirrors for optics purposes; X-ray condensing devices and their parts for optics purposes; optical machines, equipment, apparatus and instruments; high-precision form measuring apparatus using interferometers; measuring and testing machines, equipment, apparatus and instruments; electric or magnetic meters and testers; electronic computing machines, equipment, apparatus and instruments and their parts.

2.

JTEC

      
Application Number 248262500
Status Pending
Filing Date 2026-03-02
Owner JTEC CORPORATION (Japan)
NICE Classes  ? 09 - Scientific and electric apparatus and instruments

Goods & Services

(1) Mirrors for synchrotron radiation for optics purposes; X-ray mirrors for optics purposes; special mirrors for optics purposes; X-ray condensing devices and their parts for optics purposes; optical machines, equipment, apparatus and instruments; high-precision form measuring apparatus using interferometers; measuring and testing machines, equipment, apparatus and instruments; electric or magnetic meters and testers; electronic computing machines, equipment, apparatus and instruments and their parts.

3.

JTEC

      
Serial Number 79452378
Status Pending
Filing Date 2026-03-02
Owner JTEC CORPORATION (Japan)
NICE Classes  ?
  • 07 - Machines and machine tools
  • 09 - Scientific and electric apparatus and instruments

Goods & Services

Semiconductor processing machines, equipment, apparatus and instruments, and their parts and accessories; glass processing machines, equipment, apparatus and instruments, and their parts and accessories; ceramics processing machines, equipment, apparatus and instruments, and their parts and accessories; chemical processing machines, equipment, apparatus, and instruments, and their parts and accessories; machines, equipment, apparatus, and instruments for use in manufacturing and processing wafers for electronic devices, and their parts and fittings Mirrors for synchrotron radiation for optics purposes; X-ray mirrors for optics purposes; special mirrors for optics purposes; X-ray condensing devices and their parts for optics purposes; optical machines, equipment, apparatus and instruments; measuring and testing machines, equipment, apparatus and instruments

4.

CONTAINER FOR CENTRIFUGAL SEPARATION AND CENTRIFUGAL SEPARATION SYSTEM

      
Application Number JP2025025125
Publication Number 2026/023465
Status In Force
Filing Date 2025-07-14
Publication Date 2026-01-29
Owner
  • FOUNDATION FOR BIOMEDICAL RESEARCH AND INNOVATION AT KOBE (Japan)
  • JTEC CORPORATION (Japan)
Inventor
  • Kubo Hirotsugu
  • Shioyama Takahiro
  • Nomura Kenichi
  • Adachi Soichiro
  • Makino Hodaka
  • Taguchi Akihiko
  • Saino Orie
  • Morita Kenichi
  • Ono Takahiro
  • Matsui Tsubasa
  • Kusumoto Kenji

Abstract

[Problem] To provide a container for centrifugal separation and a centrifugal separation system that make it possible to efficiently recover a target component. [Solution] A container 10 for centrifugal separation includes: a first end section 101 and a second end section 102 in a rotation axis Ra direction; and a storage section 100 that is provided between the first end section 101 and the second end section 102 and is capable of storing a fluid. The first end section 101 has a protrusion 12P facing the second end section 102, and the protrusion 12P is provided with a fluid inlet/outlet 12M.

IPC Classes  ?

  • B04B 1/02 - Centrifuges with rotary bowls provided with solid jackets for separating predominantly liquid mixtures with or without solid particles without inserted separating walls
  • B04B 5/02 - Centrifuges consisting of a plurality of separate bowls rotating round an axis situated between the bowls
  • B04B 11/04 - Periodical feeding or dischargingControl arrangements therefor
  • C12M 1/10 - Apparatus for enzymology or microbiology rotatably mounted
  • C12M 1/28 - Inoculator or sampler being part of container

5.

PLASMA-ASSISTED POLISHING DEVICE

      
Application Number JP2025019442
Publication Number 2025/249508
Status In Force
Filing Date 2025-05-29
Publication Date 2025-12-04
Owner
  • JTEC CORPORATION (Japan)
  • THE UNIVERSITY OF OSAKA (Japan)
Inventor
  • Yamamura Kazuya
  • Hikawa Hideaki
  • Okubo Mamoru
  • Tanaka Tomoyuki
  • Kanezaki Ryota

Abstract

[Problem] To provide a plasma-assisted polishing device capable of reliably transmitting the rotational force of a rotary shaft to a rotary head by connecting the rotary shaft and a support shaft of the rotary head with electric insulation properties, absorbing the tolerance of each part, and accurately bringing a polishing pad and a workpiece into close contact with each other. [Solution] In a rotary head 14, a head body 88 provided with a mounting part 15 on a lower surface and a support shaft 89 are linked by a link plate 90 so as to be swingable and rotatable with respect to a head body. An end part of the support shaft is coaxially connected to an end part of the rotary shaft 13 by a connection tool 91 having electric insulation property, and at least the support shaft is detachably attached to the connection tool. A washer 92 for slidably receiving the tip of the support shaft is embedded in a surface opposite to a mounting part of the head body, and an engagement shaft 95 is penetrated in an orthogonal state at a tip part of the support shaft. A center hole 97 penetrating through a shaft part 96 of the support shaft is provided in the center of the link plate, and an engagement groove 98 for receiving both end parts of the engagement shaft by providing a clearance is provided on the link plate or the head body, and the link plate is detachably attached to the head body.

IPC Classes  ?

  • B24B 1/00 - Processes of grinding or polishingUse of auxiliary equipment in connection with such processes
  • H01L 21/304 - Mechanical treatment, e.g. grinding, polishing, cutting

6.

PLASMA CVM PROCESSING METHOD AND APPARATUS THEREFOR

      
Application Number JP2024037024
Publication Number 2025/084360
Status In Force
Filing Date 2024-10-17
Publication Date 2025-04-24
Owner JTEC CORPORATION (Japan)
Inventor Tanaka Tomoyuki

Abstract

[Problem] To provide a plasma CVM processing method and an apparatus therefor with which it is possible to suppress an increase in surface roughness of a surface to be processed when etching a single crystal semiconductor wafer, a dielectric substrate of crystal or the like, or an X-ray mirror material by a plasma CVM process using a nozzle-type electrode under high pressure. [Solution] A plasma CVM processing method in which high-frequency power is applied to a nozzle-type electrode disposed facing a processing surface of a workpiece to generate plasma based on a process gas under high pressure, and neutral radicals generated in the plasma are caused to act on the surface of the workpiece to remove a volatile substance generated by a chemical reaction between the neutral radicals and a workpiece constituent element during processing, the method comprising a step for simultaneously performing: a step for sucking in the process gas supplied to the periphery of the nozzle-type electrode from a gas suction port opened in the nozzle-type electrode on the workpiece-processing surface side; and a step for applying a positive bias voltage to a conductive workpiece holder for holding the workpiece.

IPC Classes  ?

7.

PLASMA-ASSISTED POLISHING METHOD AND DEVICE THEREFOR

      
Application Number JP2024035095
Publication Number 2025/074994
Status In Force
Filing Date 2024-10-01
Publication Date 2025-04-10
Owner
  • JTEC CORPORATION (Japan)
  • OSAKA UNIVERSITY (Japan)
Inventor
  • Yamamura Kazuya
  • Kanaoka Masahiko
  • Kanezaki Ryota
  • Hikawa Hideaki

Abstract

[Problem] To provide a plasma-assisted polishing method and a device therefor, capable of suppressing one-sided wear of a polishing pad and facilitating attachment/detachment work of a polishing pad and a workpiece in processing of a hard-to-work material using a plasma-assisted polishing method. [Solution] In an operation for relatively moving a workpiece W and a polishing pad P, the workpiece is polished by a combination of the rotation of the workpiece and the polishing pad each having an axis in a first direction, and the swing in a second direction orthogonal to the first direction and increasing or decreasing the distance between the two axes. The workpiece and the polishing pad face each other by being detachably held by mounting parts 10, 13 provided with rotary shafts 9, 12 each directed in the first direction. When the workpiece and/or the polishing pad is attached/detached, the workpiece and the polishing pad are moved in the second direction beyond a range of oscillation in a normal polishing process in a state of stopping the rotation of the workpiece and/or the polishing pad, and the workpiece and/or the polishing pad is attached/detached to/from the mounting part in a state where the workpiece and/or the polishing pad is exposed from the facing member.

IPC Classes  ?

  • B24B 1/00 - Processes of grinding or polishingUse of auxiliary equipment in connection with such processes
  • B24D 3/00 - Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special natureAbrasive bodies or sheets characterised by their constituents
  • B24D 3/14 - Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special natureAbrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially inorganic ceramic, i.e. vitrified bondings
  • B24D 7/00 - Bonded abrasive wheels, or wheels with inserted abrasive blocks, designed for acting otherwise than only by their periphery, e.g. by the front faceBushings or mountings therefor
  • H01L 21/304 - Mechanical treatment, e.g. grinding, polishing, cutting

8.

MACHINING METHOD EMPLOYING ORGANIC FINE PARTICLES

      
Application Number JP2020037321
Publication Number 2021/066071
Status In Force
Filing Date 2020-09-30
Publication Date 2021-04-08
Owner JTEC CORPORATION (Japan)
Inventor
  • Okada Hiromi
  • Aono Shinya
  • Tsumura Takashi

Abstract

[Problem] To provide a machining method employing organic fine particles that can be used to manufacture, by means of elastic emission machining (EEM) processing, which has demonstrated excellent results, an optical element, or a glass substrate provided with a high precision surface, for use in an optical system having a wavelength band from the vacuum ultraviolet region to the hard X-ray region, that resolves the problem of agglomeration of the machining fine particles, and with which, even if the machining fine particles are attached to the surface of a workpiece after machining, the machining fine particles can easily be removed. [Solution] An EEM process for machining a workpiece employs a machining liquid in which machining fine particles (3) that are capable of adhering to a surface (2) of a workpiece (1) by means of a physiochemical interaction are dispersed in a solvent, causes the machining liquid to flow along the workpiece surface, and, by means of the shear flow of the machining liquid, removes the machining fine particles that have attached to the workpiece surface in a no-load state together with workpiece surface atoms that have bonded to the machining fine particles, wherein organic fine particles are used as the only solid material for the machining fine particles.

IPC Classes  ?

  • B24B 31/00 - Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work or the abrasive material is looseAccessories therefor
  • B24C 1/00 - Methods for use of abrasive blasting for producing particular effectsUse of auxiliary equipment in connection with such methods
  • B24C 11/00 - Selection of abrasive materials for abrasive blasts

9.

DEFORMABLE MIRROR AND METHOD FOR MANUFACTURING SAME

      
Application Number JP2019001556
Publication Number 2020/148911
Status In Force
Filing Date 2019-01-18
Publication Date 2020-07-23
Owner JTEC CORPORATION (Japan)
Inventor
  • Ichii Yoshio
  • Okada Hiromi
  • Tsumura Takashi

Abstract

22 as a main component; and piezoelectric elements, the piezoelectric elements being arranged and bonded with left-right symmetry to both sides of a strip-shaped reflective surface formed at a center line section along a longitudinal direction, said surface being at least a front surface from among a front and a back surface of the mirror substrate. A bonding material containing, as a main component, metal nanoparticles having a particle diameter of 100 nm or less is used to bond the mirror substrate and piezoelectric elements.

IPC Classes  ?

  • G02B 5/09 - Multifaceted or polygonal mirrors
  • G02B 5/10 - Mirrors with curved faces
  • G02B 26/06 - Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the phase of light
  • G21K 1/06 - Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction, or reflection, e.g. monochromators

10.

METHOD FOR PRODUCING MULTILAYER MYOCARDIAL TISSUE CULTURE

      
Application Number JP2019038272
Publication Number 2020/067479
Status In Force
Filing Date 2019-09-27
Publication Date 2020-04-02
Owner
  • OSAKA UNIVERSITY (Japan)
  • JTEC CORPORATION (Japan)
Inventor
  • Miyagawa, Shigeru
  • Sawa, Yoshiki
  • Nakazato, Taro
  • Sasai, Masao
  • Liu, Li
  • Tsumura, Takashi
  • Uemura, Toshimasa
  • Jin, Meihua

Abstract

The present invention provides: a method for producing a multilayer myocardial tissue culture, comprising culturing myocardial cells seeded on a fiber sheet made from a biocompatible polymer under a pseudo-microgravity environment; a multilayer myocardial tissue culture which is produced by the method, is thick, and has a high survival rate; and others.

IPC Classes  ?

  • C12N 5/077 - Mesenchymal cells, e.g. bone cells, cartilage cells, marrow stromal cells, fat cells or muscle cells
  • A61K 35/34 - MusclesSmooth muscle cellsHeartCardiac stem cellsMyoblastsMyocytesCardiomyocytes
  • A61K 35/545 - Embryonic stem cellsPluripotent stem cellsInduced pluripotent stem cellsUncharacterised stem cells
  • A61L 27/16 - Macromolecular materials obtained by reactions only involving carbon-to-carbon unsaturated bonds
  • A61L 27/18 - Macromolecular materials obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds
  • A61L 27/38 - Animal cells
  • A61L 27/40 - Composite materials, i.e. layered or containing one material dispersed in a matrix of the same or different material
  • A61L 27/58 - Materials at least partially resorbable by the body
  • A61P 9/00 - Drugs for disorders of the cardiovascular system
  • C12N 5/10 - Cells modified by introduction of foreign genetic material, e.g. virus-transformed cells

11.

MONONUCLEAR CELL SEPARATING DEVICE AND MONONUCLEAR CELL SEPARATING METHOD

      
Application Number JP2018002497
Publication Number 2018/139583
Status In Force
Filing Date 2018-01-26
Publication Date 2018-08-02
Owner
  • FOUNDATION FOR BIOMEDICAL RESEARCH AND INNOVATION AT KOBE (Japan)
  • JTEC CORPORATION (Japan)
Inventor
  • Taguchi, Akihiko
  • Niino, Yukiko
  • Tsumura, Takashi
  • Morita, Kenichi

Abstract

This mononuclear cell separating device comprises: an introducing means 210 for introducing a centrifugal separation medium from a bottom surface of a container 100 in which a blood sample is stored; a centrifugal separation means 300 for causing centrifugal separation to be performed by the container 100 in which the centrifugal separation medium and the blood sample are layered in this order from the bottom surface side; a detecting means 400 for detecting a blood clot present in a mononuclear cell layer after the centrifugal separation; a removing means 220 for removing the detected blood clot; and a collecting means 230 for collecting mononuclear cells. Further, the mononuclear cell separating method according to the present invention includes an introducing step, a centrifugal separation step, a detecting step, a removing step and a collecting step corresponding to each constituent element of the mononuclear cell separating device of the present invention.

IPC Classes  ?

  • G01N 33/48 - Biological material, e.g. blood, urineHaemocytometers

12.

LARGE-SCALE CELL CULTURE SYSTEM AND VESSEL-VESSEL CELL LIQUID TRANSFER DEVICE FOR USE THEREIN, AND ROTARY CELL CULTURE DEVICE

      
Application Number JP2017002558
Publication Number 2017/187680
Status In Force
Filing Date 2017-01-25
Publication Date 2017-11-02
Owner JTEC CORPORATION (Japan)
Inventor
  • Tsumura Takashi
  • Uemura Toshimasa
  • Uchita Yudai

Abstract

[Problem] To provide: a large-scale cell culture system whereby it becomes possible to culture a pluripotent stem cell, particularly an iPS cell, which is intended to be used in regenerative medicine or the like, on a large scale in the absence of a feeder cell or a coating agent while maintaining the undifferentiated state thereof, it also becomes possible to subculture the cell while eliminating fluctuations resulted from the differences in skill of operators, and it also becomes possible to culture an adherent cell in a floating state; a vessel-vessel cell liquid transfer device which can be used in the system; and a rotary cell culture device. [Solution] A large-scale cell culture system for subculturing and for the translocation between spheroids and a liquid culture medium in a closed system using a vessel having a syringe-type structure to produce cells on a large scale, wherein, in the vessel, a front flange and a back flange, which have the same circular outer shape as each other, are provided integrally at both ends of an outer cylinder part and a head part is capped with a detachable cap, so that the vessel can perform rotary culturing utilizing the front flange and the back flange in such a state that a cell liquid, which comprises cells suspended in a liquid culture medium, is filled in a space closed with a gasket of a plunger.

IPC Classes  ?

  • C12M 1/00 - Apparatus for enzymology or microbiology
  • C12M 1/10 - Apparatus for enzymology or microbiology rotatably mounted
  • C12N 5/07 - Animal cells or tissues

13.

METHOD FOR SEEDING CELLS TO SCAFFOLD MATERIAL AND DEVICE THEREFOR

      
Application Number JP2016087221
Publication Number 2017/141531
Status In Force
Filing Date 2016-12-14
Publication Date 2017-08-24
Owner
  • PUBLIC UNIVERSITY CORPORATION YOKOHAMA CITY UNIVERSITY (Japan)
  • JTEC CORPORATION (Japan)
Inventor
  • Taniguchi Hideki
  • Takebe Takanori
  • Tsumura Takashi
  • Ono Takahiro

Abstract

[Problem] To provide: a method for seeding cells to a scaffold material, whereby cells can be automatically and uniformly seeded within a short period of time from the core part of a scaffold material, even in the case where the scaffold material has a relatively large size, and the usage amount of a cell suspension, in which the cells are suspended in a medium, can be minimized; and a device therefor. [Solution] A cell seeding device for uniformly seeding cells to a porous scaffold material, said porous scaffold material being capable of serving as a scaffold for the three-dimensional growth of the cells, by driving a syringe filled with a cell suspension in which the cells are suspended in a medium, said cell seeding device comprising: on a base part 11, a scaffold material-holding part 31 that holds the porous scaffold material 3; a main movable part 12 that holds an outer cylinder part 21 of the syringe 2, said syringe being provided with a needle 23 having a plurality of discharge ports formed in the side face thereof, and is movable forward and backward along the puncture direction; and a sub-movable part 13 that holds one end part of a plunger 22 of the syringe and is movable forward and backward relative to the outer cylinder part of the syringe.

IPC Classes  ?

  • C12N 5/071 - Vertebrate cells or tissues, e.g. human cells or tissues
  • C12M 1/00 - Apparatus for enzymology or microbiology
  • C12M 1/26 - Inoculator or sampler

14.

Method for culturing pluripotent stem cells

      
Application Number 15515449
Grant Number 10696951
Status In Force
Filing Date 2015-09-30
First Publication Date 2017-08-03
Grant Date 2020-06-30
Owner JTEC Corporation (Japan)
Inventor
  • Uemura, Toshimasa
  • Onomura, Yui
  • Tsumura, Takashi

Abstract

Provided is a method for efficiently culturing pluripotent stem cells with higher safety. The present invention relates to a method for culturing pluripotent stem cells, the method comprising culturing an isolated pluripotent stem cells in a pseudo-microgravity environment to proliferate the pluripotent stem cells while maintaining the pluripotent stem cells in an undifferentiated state, thereby forming and growing spheroids of the pluripotent stem cells; and a method for inducing differentiation of pluripotent stem cells by using the method.

IPC Classes  ?

  • C12N 5/00 - Undifferentiated human, animal or plant cells, e.g. cell linesTissuesCultivation or maintenance thereofCulture media therefor
  • C12M 1/28 - Inoculator or sampler being part of container
  • C12N 5/074 - Adult stem cells
  • C12N 5/10 - Cells modified by introduction of foreign genetic material, e.g. virus-transformed cells
  • C12M 1/34 - Measuring or testing with condition measuring or sensing means, e.g. colony counters
  • C12M 3/00 - Tissue, human, animal or plant cell, or virus culture apparatus

15.

ROTATING CULTURE DEVICE AND CULTURE VESSEL FOR USE IN ROTATING CULTURE DEVICE

      
Application Number JP2017000509
Publication Number 2017/119513
Status In Force
Filing Date 2017-01-10
Publication Date 2017-07-13
Owner JTEC CORPORATION (Japan)
Inventor
  • Tsumura Takashi
  • Ono Takahiro

Abstract

[Problem] To provide, at low cost, a rotating culture device with which it is easy understand or control a dispersed state of cell masses without worsening the ability to perform maintenance or conduct work such as removing a culture vessel, replacing a culture medium, installing a culture vessel, etc., and with which, even in a culture vessel having a large volume, cell masses can be cultured in a dispersed state without being locally concentrated. As a result, cell masses are prevented from colliding with each other, enabling large-scale culturing of high-quality uniform cell tissues and culturing of larger cells. [Solution] The present invention is provided with a cylindrical culture vessel 10 which is axially elongated, a bearing mechanism 11 for bearing the culture vessel 10 so that the culture vessel 10 can rotate about an axis, a rotational drive means 12 for driving the culture vessel 10 to rotate, a tilting means 13 for tilting the bearing mechanism 11 so that the axis of the culture vessel 10 is inclined upward and downward, and a control means 15 for controlling operation of the rotational drive means 12 and the tilting means 13.

IPC Classes  ?

  • C12M 1/10 - Apparatus for enzymology or microbiology rotatably mounted
  • C12M 1/00 - Apparatus for enzymology or microbiology
  • C12M 3/00 - Tissue, human, animal or plant cell, or virus culture apparatus
  • C12N 5/02 - Propagation of single cells or cells in suspensionMaintenance thereofCulture media therefor

16.

OsakaMirror

      
Application Number 1305699
Status Registered
Filing Date 2016-02-17
Registration Date 2016-02-17
Owner JTEC CORPORATION (Japan)
NICE Classes  ? 09 - Scientific and electric apparatus and instruments

Goods & Services

Mirrors for synchrotron radiation for optics purposes; X-ray mirrors for optics purposes; special mirrors for optics purposes; X-ray condensing devices and their parts for optics purposes; optical machines, apparatus and instruments; high-precision form measuring apparatus using interferometers; measuring and testing machines, apparatus and instruments.

17.

CellPet

      
Application Number 1300628
Status Registered
Filing Date 2016-02-17
Registration Date 2016-02-17
Owner JTEC CORPORATION (Japan)
NICE Classes  ? 09 - Scientific and electric apparatus and instruments

Goods & Services

Laboratory apparatus and instruments; cell culture vessels for laboratory use and their parts, fittings and accessories; cell incubators for laboratory use and their parts, fittings and accessories; cell culture apparatus for laboratory use and their parts, fittings and accessories; computer programs for cell culture control.

18.

CellMeister

      
Application Number 1300629
Status Registered
Filing Date 2016-02-17
Registration Date 2016-02-17
Owner JTEC CORPORATION (Japan)
NICE Classes  ? 09 - Scientific and electric apparatus and instruments

Goods & Services

Laboratory apparatus and instruments; cell culture vessels for laboratory use and their parts, fittings and accessories; cell incubators for laboratory use and their parts, fittings and accessories; cell culture apparatus for laboratory use and their parts, fittings and accessories; pipettes; centrifugal separators, centrifuge tubes, heaters, thermostats, mixers, heating and mixing devices, and dispensers for laboratory use; cell counting devices for laboratory use; cell separation devices for laboratory use; devices for use in analytical experiments of biological and chemical substances; biochemical analysis devices; chemical analysis machines, apparatus and instruments; measuring and testing machines, apparatus and instruments; optical machines, apparatus and instruments; processed glass, other than for building; ozonizers; electrolysers; computer programs for chemical analyses; computer programs for cell culture control.

19.

METHOD FOR CULTURING PLURIPOTENT STEM CELLS

      
Application Number JP2015077824
Publication Number 2016/052657
Status In Force
Filing Date 2015-09-30
Publication Date 2016-04-07
Owner
  • NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (Japan)
  • JTEC CORPORATION (Japan)
Inventor
  • Uemura Toshimasa
  • Onomura Yui
  • Tsumura Takashi

Abstract

Provided is a method for efficiently culturing pluripotent stem cells at a higher safety. The present invention relates to: a method for culturing pluripotent stem cells, said method comprising culturing isolated pluripotent stem cells in a quasi-microgravity environment, thus proliferating the pluripotent stem cells while retaining the pluripotent stem cells in undifferentiated conditions, and thereby forming and developing spheroids of the pluripotent stem cells; and a method for inducing differentiation of pluripotent stem cells using the aforesaid method.

IPC Classes  ?

  • C12N 5/10 - Cells modified by introduction of foreign genetic material, e.g. virus-transformed cells
  • C12N 5/0735 - Embryonic stem cellsEmbryonic germ cells
  • C12N 5/074 - Adult stem cells

20.

OSAKAMIRROR

      
Serial Number 79190306
Status Registered
Filing Date 2016-02-17
Registration Date 2017-06-20
Owner JTEC CORPORATION (Japan)
NICE Classes  ? 09 - Scientific and electric apparatus and instruments

Goods & Services

Mirrors for synchrotron radiation for optics purposes; X-ray mirrors for optics purposes; special mirrors for optics purposes (( ; X-ray condensing devices for optics purposes and structural parts therefor ))

21.

CELL CULTURE DEVICE HAVING CULTURE MEDIUM REPLACEMENT FUNCTION

      
Application Number JP2013055362
Publication Number 2013/129558
Status In Force
Filing Date 2013-02-28
Publication Date 2013-09-06
Owner JTEC CORPORATION (Japan)
Inventor
  • Tsumura Takashi
  • Ono Takahiro

Abstract

[Problem] To provide a small-scale cell culture device for culturing cells in a small number of Petri dishes, said cell culture device having a culture medium replacement function whereby the automated replacement of the culture medium and the culturing of the cells can be carried out within the same cavity, significantly reducing device costs. [Solution] At least a top set and a bottom set of discs are provided within an incubation chamber (1). Petri dishes (4, 6) into which cells and a culture medium have been introduced are supported by the lower discs (18, 29). Lids (5, 7) are supported by the upper discs (19, 30). The bottoms of the lids are exposed. It is possible to achieve a state in which the Petri dishes are covered with the lids by moving the lower discs and the upper discs towards each other in the vertical direction, and a state in which the lids are offset from the Petri dishes in the lateral direction and the Petri dishes are partially exposed by moving the lower discs and the upper discs away from each other in the vertical direction and rotating either the lower discs or the upper discs by a prescribed angle. A culture medium replacement means (13) is inserted into the exposed portion of a Petri dish from above through insertion holes formed in the upper plates, the culture medium is replaced, the lids are made to cover the Petri dishes, and the culturing of the cells is continued.

IPC Classes  ?

  • C12M 3/00 - Tissue, human, animal or plant cell, or virus culture apparatus
  • C12M 1/00 - Apparatus for enzymology or microbiology

22.

Reflective surface shape controllable mirror device, and method for manufacturing reflective surface shape controllable mirror

      
Application Number 13519175
Grant Number 09287016
Status In Force
Filing Date 2010-12-28
First Publication Date 2013-01-10
Grant Date 2016-03-15
Owner
  • JTEC CORPORATION (Japan)
  • OSAKA UNIVERSITY (Japan)
Inventor
  • Yamauchi, Kazuto
  • Kimura, Takashi
  • Tsumura, Takashi

Abstract

The device is configured from: a reflective surface shape controllable mirror in which a band-shaped X-ray reflective surface 2 is formed on a central portion of a front surface of a substrate 1, reference planes 3 are formed along both sides of the X-ray reflective surface, and a plurality of piezoelectric elements 4 are attached to at least one of front and back surfaces of the substrate so as to be arranged in the longitudinal direction of the X-ray reflective surface on both side portions of the substrate, and a multichannel control system for applying a voltage to each of the piezoelectric elements.

IPC Classes  ?

  • G02B 26/08 - Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
  • G21K 1/06 - Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction, or reflection, e.g. monochromators

23.

Rotating culture vessel and automatic cell culture apparatus using same

      
Application Number 13375606
Grant Number 10287539
Status In Force
Filing Date 2010-06-09
First Publication Date 2012-04-05
Grant Date 2019-05-14
Owner JTEC CORPORATION (Japan)
Inventor
  • Tsumura, Takashi
  • Okada, Hiromi
  • Uemura, Toshimasa
  • Oyabu, Yoshimi

Abstract

Disclosed is a rotating culture vessel based on a rotating culture technology using an RWV, by which cell seeding, liquid medium exchange, quality control and so on can be automated and degassing can be conducted simultaneously with liquid medium exchange without disturbing the cells under culture. Also disclosed is an automatic cell culture apparatus using the same. A rotating culture vessel, which contains cells and a liquid culture medium, to be attached to a horizontal rotating shaft of a rotating culture device to three-dimensionally culture the cells, wherein one or more inlets/outlets for supplying cells and a liquid culture medium at the early stage and then taking out the cultured cells, are formed at appropriate position of a flat cylindrical culture container; at least one pair of a supply port and a discharge port for liquid medium exchange is provided on the outer circumferential cylindrical face of the culture container.

IPC Classes  ?

  • C12M 3/04 - Tissue, human, animal or plant cell, or virus culture apparatus with means providing thin layers
  • C12M 3/00 - Tissue, human, animal or plant cell, or virus culture apparatus

24.

MIRROR DEVICE FOR CONTROLLING SHAPE OF REFLECTIVE SURFACE, AND METHOD FOR PRODUCING MIRROR FOR CONTROLLING SHAPE OF REFLECTIVE SURFACE

      
Application Number JP2010073716
Publication Number 2011/081182
Status In Force
Filing Date 2010-12-28
Publication Date 2011-07-07
Owner
  • JTEC Corporation (Japan)
  • OSAKA UNIVERSITY (Japan)
Inventor
  • Yamauchi Kazuto
  • Kimura Takashi
  • Tsumura Takashi

Abstract

Provided is a mirror device for controlling the shape of a reflective surface, which: has a laminate structure formed from materials having different thermal expansion coefficients; eliminates the error in processing the surface shape caused by distortions resulting from the temperature differences during the production of a mirror, and the error in the surface shape caused by distortions resulting from the conditions of the installation environment during the process in which nano light is focused; achieves an nmth order shape accuracy; changes the X-ray beam into an ideal wavefront; and can change the focal distance. The device is configured from: a mirror for controlling the shape of a reflective surface in which a band-shaped X-ray reflective surface (2) is formed on the center of the surface of a substrate (1), reference planes (3) are formed along both sides of the X-ray reflective surface, and a plurality of piezoelectric elements (4) are joined and arranged on the front and back surfaces and along the entire edges of the substrate in the lengthwise direction of the X-ray reflective surface; and a multichannel control system which applies a voltage to each piezoelectric element (4).

IPC Classes  ?

  • G21K 1/06 - Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction, or reflection, e.g. monochromators
  • G02B 5/10 - Mirrors with curved faces

25.

ROTATING CULTURE VESSEL AND AUTOMATIC CELL CULTURE APPARATUS USING SAME

      
Application Number JP2010059754
Publication Number 2010/143651
Status In Force
Filing Date 2010-06-09
Publication Date 2010-12-16
Owner
  • JTEC Corporation (Japan)
  • National Institute of Advanced Industrial Science and Technology (Japan)
Inventor
  • Tsumura Takashi
  • Okada Hiromi
  • Uemura Toshimasa
  • Oyabu Yoshimi

Abstract

Disclosed is a rotating culture vessel based on a rotating culture technology using an RWV, by which cell seeding, liquid medium exchange, quality control and so on can be automated and degassing can be conducted simultaneously with liquid medium exchange without disturbing the cells under culture. Also disclosed is an automatic cell culture apparatus using the same. A rotating culture vessel, which contains cells and a liquid culture medium therein, to be attached to a horizontal rotating shaft of a rotating culture device to thereby three-dimensionally culture the cells, wherein one or more inlets/outlets (19, 20, 21) for supplying cells and a liquid culture medium at the early stage and then taking out the cultured cells, are formed at appropriate position(s) of a flat cylindrical culture container (18); at least one pair of a supply port (22) and a discharge port (23) for liquid medium exchange is provided on the outer circumferential cylindrical face of the culture container (18); the paired supply port and discharge port are positioned 180° opposite to each other; and the center line of the discharge port (23) passes through the rotational center, while the center line of the supply port (22) is eccentrically positioned with respect to the rotating center.

IPC Classes  ?

  • C12M 1/00 - Apparatus for enzymology or microbiology
  • C12M 1/10 - Apparatus for enzymology or microbiology rotatably mounted
  • C12M 3/00 - Tissue, human, animal or plant cell, or virus culture apparatus

26.

Electron-beam-assisted EEM method

      
Application Number 11989960
Grant Number 08235769
Status In Force
Filing Date 2006-08-03
First Publication Date 2010-09-02
Grant Date 2012-08-07
Owner
  • Yuzo Mori (Japan)
  • JTEC Corporation (Japan)
Inventor Mori, Yuzo

Abstract

To provide an electron beam assisted EEM method that can realize ultraprecision machining of workpieces, including glass ceramic materials, in which at least two component materials different from each other in machining speed in a machining process are present in a refined mixed state and the surface state is not even, to a surface roughness of 0.2 to 0.05 nm RMS. The EEM method comprises a working process in which a workpiece and chemically reactive fine particles are allowed to flow along the working face to remove atoms on the working face chemically bonded to the fine particles together with the fine particles through chemical interaction between the fine particles and the working face interface. The workpiece comprises at least two component materials present in a refined mixed state and different from each other in machining speed in the machining process. After the exposure of the workpiece in its working face to an electron beam to conduct modification so that the machining speed of the surface layer part in the working face is substantially even, ultraprecision smoothening is carried out by working process.

IPC Classes  ?

  • B24B 49/00 - Measuring or gauging equipment for controlling the feed movement of the grinding tool or workArrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation

27.

METHOD AND APPARATUS OF PRECISELY MEASURING INTENSITY PROFILE OF X-RAY NANOBEAM

      
Application Number JP2009055474
Publication Number 2010/097968
Status In Force
Filing Date 2009-03-19
Publication Date 2010-09-02
Owner
  • JTEC Corporation (Japan)
  • OSAKA UNIVERSITY (Japan)
Inventor
  • Yamauchi, Kazuto
  • Mimura, Hidekazu
  • Okada, Hiromi

Abstract

Provided are a method and an apparatus of precisely measuring the intensity profile of an x-ray nanobeam, which can measure x-rays having different wavelengths with one knife edge and can perform optimal measurements corresponding to the depth of focus of an x-ray beam and the conditions of other measurement devices, using a dark field measurement method which enables precise measurements of the profile of an x-ray beam using a knife edge and using diffracted and transmitted x-rays. The knife edge (4) is formed of a heavy metal which advances the phase of an x-ray passing therethrough and is fabricated in such a manner that the thickness may change in the longitudinal direction continuously or in a stepwise fashion. The knife edge (4) is so set that an x-ray beam may traverse the knife edge (4) at such a thickness position as to achieve a phase shift in a range wherein a transmitted x-ray and a diffracted x-ray diffracted at the end of the knife edge may reinforce each other, and a superposed x-ray of the diffracted x-ray and the transmitted x-ray is measured by an x-ray detector.

IPC Classes  ?

  • G01T 1/29 - Measurement performed on radiation beams, e.g. position or section of the beamMeasurement of spatial distribution of radiation
  • G21K 1/00 - Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
  • H05G 2/00 - Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma

28.

X-ray condensing method and its device using phase restoration method

      
Application Number 12440121
Grant Number 07936860
Status In Force
Filing Date 2007-12-27
First Publication Date 2010-07-22
Grant Date 2011-05-03
Owner
  • JTEC Corporation (Japan)
  • Osaka University (Japan)
Inventor
  • Yamauchi, Kazuto
  • Mimura, Hidekazu
  • Okada, Hiromi

Abstract

An X-ray condensing method and its device are provided with an X-ray mirror that has a wavefront adjustable function to finely adjust a wavefront of a reflecting X-ray, measure an X-ray intensity distribution in the vicinity of a focus, measure an X-ray intensity distribution in the vicinity of the X-ray mirror or use a known X-ray intensity distribution of an incident X-ray, calculate a complex amplitude distribution at the reflective surface by using a phase restoration method from the X-ray intensity distribution in the vicinity of the focus and the X-ray intensity distribution in the vicinity of the reflective surface, calculate a wavefront aberration of an X-ray condensing optical system from the complex amplitude distribution, and control the reflective surface of the X-ray mirror with the wavefront adjustable function so that the wavefront aberration is minimized.

IPC Classes  ?

  • G21K 1/06 - Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction, or reflection, e.g. monochromators
  • G01D 18/00 - Testing or calibrating apparatus or arrangements provided for in groups
  • G01N 23/04 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or by transmitting the radiation through the material and forming images of the material

29.

X-RAY CONDENSING METHOD AND ITS DEVICE USING PHASE RESTORATION METHOD

      
Application Number JP2007075132
Publication Number 2008/081873
Status In Force
Filing Date 2007-12-27
Publication Date 2008-07-10
Owner
  • JTEC Corporation (Japan)
  • OSAKA UNIVERSITY (Japan)
Inventor
  • Yamauchi, Kazuto
  • Mimura, Hidekazu
  • Okada, Hiromi

Abstract

[PROBLEMS TO BE SOLVED] By making use of a phase restoration method based on the wave optics theory and by using a intensity distribution of condensed light beams of hard X-rays used for an actual evaluation that are condensed by a mirror, a phase error distribution on the mirror, i.e., an X-ray wavefront measurement method to obtain shape errors is proposed and an X-ray condensing method and its device using a phase restoration method to optimize an X-ray condensing optical system by making use of such an X-ray wavefront measurement method are proposed. [MEANS FOR SOLVING THE PROBLEMS] An X-ray condensing method and its device are provided with an X-ray mirror that has a wavefront adjustable function to finely adjust a wavefront of a reflecting X-ray, measure an X-ray intensity distribution in the vicinity of a focus, measure an X-ray intensity distribution in the vicinity of the X-ray mirror or use a known X-ray intensity distribution of an incident X-ray, calculate a complex amplitude distribution at the reflective surface by using a phase restoration method from the X-ray intensity distribution in the vicinity of the focus and the X-ray intensity distribution in the vicinity of the reflective surface, calculate a wavefront aberration of an X-ray condensing optical system from the complex amplitude distribution, and control the reflective surface of the X-ray mirror with the wavefront adjustable function so that the wavefront aberration is minimized.

IPC Classes  ?

  • G21K 1/06 - Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction, or reflection, e.g. monochromators
  • G01N 23/207 - Diffractometry, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions
  • G01N 23/223 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or by measuring secondary emission from the material by irradiating the sample with X-rays or gamma-rays and by measuring X-ray fluorescence
  • G02B 5/10 - Mirrors with curved faces
  • G21K 7/00 - Gamma ray or X-ray microscopes
  • H01L 21/027 - Making masks on semiconductor bodies for further photolithographic processing, not provided for in group or