Disclosed herein are apparatuses, systems, methods, and computer-readable media relating to area selection in charged particle microscope (CPM) imaging. For example, in some embodiments, a CPM support apparatus may include: first logic to generate a first data set associated with an area of a specimen by processing data from a first imaging round of the area by a CPM; second logic to generate predicted parameters of the area; and third logic to determine whether a second imaging round of the area is to be performed by the CPM based on the predicted parameters of the area; wherein the first logic is to, in response to a determination by the third logic that a second imaging round of the area is to be performed, generate a second data set, including measured parameters, associated with the area by processing data from a second imaging round of the area by the CPM.
G06T 7/73 - Détermination de la position ou de l'orientation des objets ou des caméras utilisant des procédés basés sur les caractéristiques
G06V 10/22 - Prétraitement de l’image par la sélection d’une région spécifique contenant ou référençant une formeLocalisation ou traitement de régions spécifiques visant à guider la détection ou la reconnaissance
G06V 20/69 - Objets microscopiques, p. ex. cellules biologiques ou pièces cellulaires
H01J 37/22 - Dispositifs optiques ou photographiques associés au tube
H01J 37/26 - Microscopes électroniques ou ioniquesTubes à diffraction d'électrons ou d'ions
A method including performing, with a charged particle system having a first milling setting, a first milling operation on a sample at a first time, generating a first image of the sample based on the first milling operation, determining, based on the first image, a first set of tracking features of the sample, performing, with the charged particle system having the first milling setting, a second milling operation on the sample at a second time, generating a second image of the sample based on the second milling operation, determining, based on the second image, a first change to the first set of tracking features, and adjusting the first milling setting to a second milling setting based on the first change.
A charged particle beam system includes a source of charged particles and a charged particle beam column to focus the charged particles into a charged particle beam having a landing energy. A magnetic lens is formed in the charged particle beam column along an axis based on a magnetic lens excitation in the coils. The magnetic lens focuses the charged particle beam at a first crossover on the axis. An electrostatic lens is formed in the charged particle beam column along the axis based on a voltage applied to the booster tube. The electrostatic lens focuses the charged particle beam at a second crossover on the axis. The first crossover is based on the magnetic lens excitation. The introduction of an extra crossover overcomes previous limitations of the maximum working distance at very small landing energies and maximum field of view.
Methods and apparatus are disclosed for classifying regions of a substrate prior to performing an analytic procedure involving analyte particles supported on the substrate. Regions of the substrate are sparsely scanned using low-energy electron point projection (LEEPP) imaging. Regions are classified as suitable for the analytic procedure (or not) based on defects visible in the respective images. Given one suitable region, neighboring regions are scanned to increase the yield of suitable regions. Based on a distribution of suitable regions, a deposition pattern is planned, and analyte is deposited according to the plan. Following deposition, suitable regions are scanned again to identify or count visible analyte molecules visible. Based on numbers of analyte molecules found, regions are earmarked for analyte characterization, e.g. by low-energy electron holography and reconstruction. A trained machine learning classifier provides consistent, accurate image classification across a range of defect types.
Methods of aligning specimen images of specimen sections situated on a substrate include obtaining an optical or SEM image of the substrate and locating and aligning optical or SEM images of each specimen section. The specimen sections are then imaged with an SEM to obtain preview images, and a region of interest (ROI) in at least one of the preview images is selected. The preview images are processed so that at least portions of the preview images proximate the ROI are aligned. Based on the alignment of the preview images, final SEM image of selected specimen sections are obtained so that a set of images aligned in three dimensions is available. Image alignment can use cross-correlation with a fixed or variable reference that can be updated as specimen section images are processed.
Embodiments herein relate to a process for electron holography image aberration reduction. A system can comprise a memory that stores, and a processor that executes, computer executable components. The computer executable components can comprise a propagating component that reduces hologram aberration of an electron hologram (EH) image by modifying of a pair of sequenced parameters of an array upon which the EH image is constructed, resulting in a modified array, and a generating component that generates a propagated EH image using a propagator comprising the modified array.
G03H 5/00 - Procédés ou appareils holographiques utilisant des particules ou des ondes autres que celles couvertes par les groupes ou pour obtenir des hologrammesProcédés ou appareils pour en obtenir une image optique
7.
MAGNETIC SHIELDING OF THE PHOTOMULTIPLIER IN THE MAGNETIC IMMERSION FIELD
Charged-particle detectors using scintillators are situated in a vacuum chamber and include a photomultiplier tube (PMT) that is situated at or near a pole piece of a magnetic objective lens. To maintain satisfactory PMT operation, the PMT is situated within a PMT shield constructed of a high saturation value magnetic material. With the disclosed shields, PMT operation in strong magnetic fields is satisfactory, even for magnetic field magnitudes of at least 0.5 T.
Methods include producing a charged particle beam with a charged particle beam source and directing the charged particle beam along a beam axis of a charged particle beam column to a target, directing the charged particle beam through an elongated aperture that is situated by an offset with respect to the beam axis, and focusing the beam to the target to produce an asymmetric intensity cross-section for the beam, wherein the cross-section has a sharp intensity edge at the target based on the offset elongated aperture.
H01J 37/28 - Microscopes électroniques ou ioniquesTubes à diffraction d'électrons ou d'ions avec faisceaux de balayage
H01J 37/304 - Commande des tubes par une information en provenance des objets, p. ex. signaux de correction
H01J 37/317 - Tubes à faisceau électronique ou ionique destinés aux traitements localisés d'objets pour modifier les propriétés des objets ou pour leur appliquer des revêtements en couche mince, p. ex. implantation d'ions
9.
CHARGING ARTIFACT MITIGATION VIA SCANNING DIRECTION ROTATION
Systems/techniques are provided for facilitating charging artifact mitigation via scanning direction rotation. In various embodiments, a system can access a charged-particle microscope that is loaded with a specimen. In various aspects, the system can generate an aggregated image of the specimen, based on a plurality of images of the specimen that are captured by the charged-particle microscope according to a target scanning direction and a plurality of rotated scanning directions. In some instances, the plurality of rotated scanning directions and the target scanning direction can be uniformly distributed within a 360-degree range. In various cases, the specimen can charge non-homogeneously during scanning, each of the plurality of images can exhibit respective charging artifacts, and the aggregated image can exhibit no or reduced charging artifacts.
Scanning transmission electron microscope, STEM, having a sample plane, the STEM comprising a primary electron beam source arranged to provide a primary electron beam to a sample located at the sample plane of the STEM. A STEM detector, wherein the sample plane is located between the primary electron beam source and the STEM detector. A first secondary electron, SE, detector located between the primary electron beam source and the sample plane of the STEM. A second SE detector located between the sample plane and the STEM detector. Signal acquisition circuitry configured to acquire simultaneously a first signal from the first SE detector, a second signal from the second SE detector, and a third signal from the STEM detector. There is also a method for generating an image from the STEM.
An electron microscope is disclosed and comprises an electron beam source for producing an electron beam, a vacuum chamber and a sample holder disposed in the vacuum chamber to hold a sample intersecting the electron beam. An image detector is disposed in the vacuum chamber to capture a diffraction pattern formed by electrons received from a sample held in the sample holder and produce image data comprising the captured diffraction pattern. A computing device is disposed in the vacuum chamber, connected to the image detector and configured to process the image data to produce compacted data from the image data. The compacted data requires less storage or bandwidth than the image data. A data connection connects the computing device to a data transmission, storage or further computing device outside the vacuum chamber to make the compacted data available outside the vacuum chamber. A method of operating the electron microscope is also disclosed.
37 - Services de construction; extraction minière; installation et réparation
Produits et services
Site services, namely, preparing, assessing, and optimizing laboratory and research environments for equipment installation; conducting visual inspections, site measurements, and reporting; developing corrective action plans; providing computer-aided design (CAD) drawings and layout documentation; and consulting regarding facility readiness, infrastructure requirements, and environmental factors that may affect equipment performance; turnkey installation services, namely, preparing installation sites, performing environmental readiness and infrastructure setup, installing and calibrating laboratory and imaging equipment, including microscopes, and delivering fully operational systems ready for end-use
42 - Services scientifiques, technologiques et industriels, recherche et conception
Produits et services
Software as a service (SaaS) featuring software for operating, monitoring, and managing electron microscopy systems; for enabling remote operation and control of microscopes; for monitoring system performance, environmental conditions, and equipment utilization; for enhancing image resolution and data quality; and for providing analytics, diagnostics, and reporting on system health and productivity
14.
JUNCTION BETWEEN HEXABORIDE-CONTAINING AND TANTALUM-CONTAINING COMPONENTS
Apparatus and methods are disclosed for a mechanically stable, long-life junction between hexaboride-containing and tantalum-containing components. Examples are used as a cold field emitter assembly which is compatible with ultra-high vacuum and occasional high-temperature flashing. A metal adapter is welded to a hexaboride electrode. Some embodiments use a tantalum adapter and a LaB6 microrod electrode with a nanorod emitter tip. Other material combinations are disclosed, as also usage in electron sources for electron microscopes. In variations, the adapter is deposited onto a filament and the electrode then welded to the adapter.
The charged beam particle system including a first electron detector, a second electron detector, and a first scanning deflector positioned between the first electron detector and the second electron detector, where the first scanning deflector includes a deflector interior surface including a frustoconical shape.
A method for mixed signal synchronization for a charged particle column includes generating an optical pulse signal from a light source that emits a light beam pulse towards a sample within the charged particle column, generating a radio frequency (RF) signal associated with a RF cavity that pulses a charged particle beam towards the sample, generating a composite signal using at least the RF signal and the optical pulse signal, and controlling, based at least in part on the composite signal, at least one of i) the light source or ii) RF signals for the RF cavity such that light beam pulses and charged particle beam pulses are synchronized at the sample.
H01J 37/04 - Dispositions des électrodes et organes associés en vue de produire ou de commander la décharge, p. ex. dispositif électronoptique, dispositif ionoptique
17.
TEMPORAL CHARACTERIZATION OF OSCILLATOR SIGNALS IN CHARGED PARTICLE MICROSCOPY
A method for characterization of a light beam within a charged particle column, the method comprising: directing a light beam pulse towards a sample within the charged particle column; directing a charged particle beam pulse towards the sample; detecting charged particles that, based at least in part on the light beam pulse and the charged particle beam pulse, interacted with the sample; determining a time delay between the charged particle beam pulse and the light beam pulse based at least in part on the charged particles; and determining at least one characteristic of the light beam pulse based at least in part on the time delay.
Embodiments of the present disclosure improve the performance of charged particle beam systems during imaging and/or microanalysis, at least in part by permitting a system and/or user to account for the influence of electromagnetic interference on beam direction and/or shape. Techniques are described for identifying, tracking, and/or correcting electromagnetic interference-induced beam drifts, as well as techniques for localizing defects in integrated circuit devices.
Embodiments of the present disclosure improve the performance of charged particle beam systems during imaging and/or microanalysis, at least in part by permitting a system and/or user to account for the influence of electromagnetic interference on beam direction and/or shape. Techniques are described for identifying, tracking, and/or correcting electromagnetic interference-induced beam drifts, as well as techniques for localizing defects in integrated circuit devices.
G01N 23/2251 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en mesurant l'émission secondaire de matériaux en utilisant des microsondes électroniques ou ioniques en utilisant des faisceaux d’électrons incidents, p. ex. la microscopie électronique à balayage [SEM]
In one example, a method performed via a computing device for providing support to a charged particle beam system includes computing a drift estimate based at least in part on a first set of image frames acquired with a charged particle beam column and a detector from a first portion of a sample. The method also includes configuring the charged particle beam column and the detector to acquire a second set of image frames from a second portion of the sample. The method further includes performing drift compensation during acquisition of the second set of image frames based at least in part on the drift estimate.
Systems/techniques are provided for facilitating large language model assistance for charged-particle microscope operation. In various embodiments, a system can access a natural language instruction associated with a charged-particle microscope, where the natural language instruction can request that the charged-particle microscope undergo a configurable settings adjustment or perform an automated task. In various aspects, the system can cause, in response to the natural language instruction, the charged-particle microscope to capture, according to a default microscopy protocol, an image or an energy spectrum of a specimen that is currently loaded on a stage of the charged-particle microscope. In various instances, the system can execute a large language model on both the natural language instruction and the image or energy spectrum of the specimen, thereby yielding a natural language response that indicates how implementing the natural language instruction would affect the specimen.
G06F 40/274 - Conversion de symboles en motsAnticipation des mots à partir des lettres déjà entrées
G10L 13/08 - Analyse de texte ou génération de paramètres pour la synthèse de la parole à partir de texte, p. ex. conversion graphème-phonème, génération de prosodie ou détermination de l'intonation ou de l'accent tonique
H01J 37/26 - Microscopes électroniques ou ioniquesTubes à diffraction d'électrons ou d'ions
A method for aligning a pulsed laser beam in microscopy may include directing a first pulsed photon beam toward a target, directing a charged particle beam towards the target, determining a diffraction pattern resulting from an interaction of the charged particle beam with the target, directing a second pulsed photon beam towards the target, and determining a deviation of the diffraction pattern based at least in part on the second pulsed photon beam. In some embodiments, the method may include controlling, based at least in part on the deviation, a direction of pulsed photon emission by a light source, directing a third pulsed photon beam toward the target, generating detector data based at least in part on charged particles that result from a second interaction with the target and the third pulsed photon beam, and determining a position of the third pulsed photon beam, relative to the charged particle beam using the detector data.
H01J 37/244 - DétecteursComposants ou circuits associés
H01J 37/04 - Dispositions des électrodes et organes associés en vue de produire ou de commander la décharge, p. ex. dispositif électronoptique, dispositif ionoptique
A method for mixed signal synchronization for a charged particle column includes generating an optical pulse signal from a light source that emits a light beam pulse towards a sample within the charged particle column, generating a radio frequency (RF) signal associated 5 with a RF cavity that pulses a charged particle beam towards the sample, generating a composite signal using at least the RF signal and the optical pulse signal, and controlling, based at least in part on the composite signal, at least one of i) the light source or ii) RF signals for the RF cavity such that light beam pulses and charged particle beam pulses are synchronized at the sample.
H01J 37/04 - Dispositions des électrodes et organes associés en vue de produire ou de commander la décharge, p. ex. dispositif électronoptique, dispositif ionoptique
H01J 37/22 - Dispositifs optiques ou photographiques associés au tube
24.
SPLIT-COLUMN ACCELERATION TUBE FOR SCANNING ELECTRON MICROSCOPE
Embodiments of the present disclosure include systems, methods, algorithms, and non-transitory media storing computer-readable instructions for charged particle imaging and microanalysis. A charged particle beam system can include an objective lens assembly, defining an aperture collocated with a first axis. The system can include a bifurcated acceleration tube. The acceleration tube can include a primary segment, a secondary segment, intersecting the primary segment, the secondary segment being oriented at an angle, a, relative to the first axis, and a common segment, disposed at least partially in the aperture. The system can include a separator. The separator can include one or more charged-particle optical elements disposed in the common segment and configured to apply a deflection force to electrons having a negative velocity in a first direction. The deflection force can redirect the electrons toward a second direction substantially aligned with a second axis.
Systems/techniques are provided for facilitating large language model assistance for charged-particle microscope operation. In various embodiments, a system can access a natural language instruction associated with a charged-particle microscope, where the natural language instruction can request that the charged-particle microscope undergo a configurable settings adjustment or perform an automated task. In various aspects, the system can cause, in response to the natural language instruction, the charged-particle microscope to capture, according to a default microscopy protocol, an image or an energy spectrum of a specimen that is currently loaded on a stage of the charged-particle microscope. In various instances, the system can execute a large language model on both the natural language instruction and the image or energy spectrum of the specimen, thereby yielding a natural language response that indicates how implementing the natural language instruction would affect the specimen.
G06F 40/274 - Conversion de symboles en motsAnticipation des mots à partir des lettres déjà entrées
G10L 13/08 - Analyse de texte ou génération de paramètres pour la synthèse de la parole à partir de texte, p. ex. conversion graphème-phonème, génération de prosodie ou détermination de l'intonation ou de l'accent tonique
H01J 37/26 - Microscopes électroniques ou ioniquesTubes à diffraction d'électrons ou d'ions
26.
LARGE LANGUAGE MODEL ASSISTANCE FOR CHARGED-PARTICLE MICROSCOPE OPERATION
Systems/techniques are provided for facilitating large language model assistance for charged-particle microscope operation. In various embodiments, a system can access a natural language instruction associated with a charged-particle microscope, where the natural language instruction can request that the charged-particle microscope undergo a configurable settings adjustment or perform an automated task. In various aspects, the system can cause, in response to the natural language instruction, the charged-particle microscope to capture, according to a default microscopy protocol, an image or an energy spectrum of a specimen that is currently loaded on a stage of the charged-particle microscope. In various instances, the system can execute a large language model on both the natural language instruction and the image or energy spectrum of the specimen, thereby yielding a natural language response that indicates how implementing the natural language instruction would affect the specimen.
G06F 40/274 - Conversion de symboles en motsAnticipation des mots à partir des lettres déjà entrées
G10L 13/08 - Analyse de texte ou génération de paramètres pour la synthèse de la parole à partir de texte, p. ex. conversion graphème-phonème, génération de prosodie ou détermination de l'intonation ou de l'accent tonique
H01J 37/26 - Microscopes électroniques ou ioniquesTubes à diffraction d'électrons ou d'ions
A method for flexible beam blanking in ultrafast transmission charged particle microscopy may include directing, during a first time interval, a first charged particle beam and a first pulsed photon beam towards a target, generating a first image of the target based at least in part on first interactions of the first charged particle beam with the target, directing, during a second time interval, a second charged particle beam toward the target, and generating a second image of the target based at least in part on second interactions of the second charged particle beam, and generating a corrected image of the target based at least in part on the first and second image.
H01J 37/04 - Dispositions des électrodes et organes associés en vue de produire ou de commander la décharge, p. ex. dispositif électronoptique, dispositif ionoptique
H01J 37/20 - Moyens de support ou de mise en position de l'objet ou du matériauMoyens de réglage de diaphragmes ou de lentilles associées au support
H01J 37/22 - Dispositifs optiques ou photographiques associés au tube
H01J 37/28 - Microscopes électroniques ou ioniquesTubes à diffraction d'électrons ou d'ions avec faisceaux de balayage
28.
ELECTRICAL AND THERMAL CONNECTION CABLE FOR CHARGED PARTICLE MICROSCOPES
Systems, methods, and communication cables taught herein provide cryogenic cooling, high voltage connections, and other electrical connections to a sample on a stage within a vacuum environment while still enabling stage motion in at least five degrees of freedom with minimal stage vibration to enable new or improved measurement applications in-situ within the microscope such as atom probe tomography and testing of quantum computing components. The connection cables taught herein combine connections into a single connection cable within an outer spring that is suitable for use in ultra-high vacuum. The connection cables are also shaped and configured to maintain at least a minimum standoff distance from components in the nearby environment (e.g., chamber walls and other equipment) to prevent mechanical, electrical, and thermal shortcutting.
H01B 7/42 - Conducteurs ou câbles isolés caractérisés par la forme avec des dispositions pour la dissipation ou la conduction de la chaleur
H01B 7/22 - Fils rubans ou métalliques, p. ex. d'acier
H01B 7/29 - Protection contre les dommages provoqués par des facteurs extérieurs, p. ex. gaines ou armatures par des températures extrêmes ou par les flammes
Disclosed herein are systems for classifying microscopic components of physical samples, as well as related methods, computing devices, and computer-readable media. For example, in some embodiments, a method for classifying microscopic components of a physical sample may include: generating a set of regions-of-interest (ROIs) in an image representative of the physical sample, wherein the image is generated by a microscopy system using a first analysis mode; generating an initial classification for an ROI by applying a trained machine-learning model to at least the portion of the image associated with the ROI; generating a confidence score associated with the initial classification; and when the confidence score for an initial classification of an ROI does not satisfy a set of confidence criteria, causing the microscopy system to re-analyze at least the portion of the sample associated with the ROI using a second analysis mode different than the first analysis mode.
G06V 20/69 - Objets microscopiques, p. ex. cellules biologiques ou pièces cellulaires
G06V 10/25 - Détermination d’une région d’intérêt [ROI] ou d’un volume d’intérêt [VOI]
G06V 10/82 - Dispositions pour la reconnaissance ou la compréhension d’images ou de vidéos utilisant la reconnaissance de formes ou l’apprentissage automatique utilisant les réseaux neuronaux
H01J 37/244 - DétecteursComposants ou circuits associés
30.
DIGITAL SAMPLE MODEL FOR INSTRUMENTAL OPTIMIZATION
System and methods are disclosed for a scientific instrument support system. In at least one embodiment, the system includes a sample, a physical asset configured to interact with the sample, and one or more computing devices having executable instructions stored thereon. When executed, the executable instructions cause the one or more computing devices to generate one or more predictions based on simulations of one or more of the sample, the physical asset, or an interaction of the physical asset with the sample, and update a physics-based digital model of the sample based on accuracy of the one or more predictions. The physics-based digital model is used to reconstruct chemical and physical properties of the sample to generate the simulations of the sample.
G06F 30/20 - Optimisation, vérification ou simulation de l’objet conçu
G06F 30/27 - Optimisation, vérification ou simulation de l’objet conçu utilisant l’apprentissage automatique, p. ex. l’intelligence artificielle, les réseaux neuronaux, les machines à support de vecteur [MSV] ou l’apprentissage d’un modèle
A charged particle microscope that incorporates dual data stream output interfaces within its imaging system. These interfaces enable the microscope to capture and process data from the charged particle camera in two distinct ways, leading to enhanced imaging capabilities and improved flexibility. This invention has the potential to significantly advance the field of charged particle microscopy and find applications in various scientific and industrial settings.
A method and charged particle microscope for obtaining a tilt series of images based on exposure of a region of interest of a sample to a charged particle beam at a plurality of tilt angles. The method comprises the step of tracking a field of view (FOV) during the step of obtaining the tilt series of images. The method comprises the step of producing a tomographic image of a sample volume related to said region of interest based on at least some images of the obtained tilt series. As defined herein, the step of tracking the field of view (FOV) comprises the step of exposing a tracking region that is substantially outside of said region of interest (ROI). The charged particle microscope as defined herein is arranged for performing the method as defined herein.
G01N 23/046 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en transmettant la radiation à travers le matériau et formant des images des matériaux en utilisant la tomographie, p. ex. la tomographie informatisée
G01N 23/06 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en transmettant la radiation à travers le matériau et mesurant l'absorption
G01N 23/2251 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en mesurant l'émission secondaire de matériaux en utilisant des microsondes électroniques ou ioniques en utilisant des faisceaux d’électrons incidents, p. ex. la microscopie électronique à balayage [SEM]
33.
BROAD ION BEAM (BIB) SYSTEMS FOR MORE EFFICIENT PROCESSING OF MULTIPLE SAMPLES
Systems and methods for operating a broad ion beam (BIB) polisher in a sample preparation workflow having improved uptime, are disclosed. An example method for operating a broad ion beam (BIB) polisher having improved uptime according to the present invention comprises causing a first BIB source to emit a first broad ion beam towards a sample positioned within an interior volume of the BIB polisher while the first BIB source is in emitting the first broad ion beam towards the sample, removing a second BIB source from the BIB polisher that is configured to emit a second broad ion beam towards the sample when in use.
A method and charged particle microscope for obtaining a tilt series of images based on exposure of a region of interest of a sample to a charged particle beam at a plurality of tilt angles. The method comprises the step of changing the tilt angle at a tilt angle speed while acquiring the tilt series of images. The method further comprises the step of tracking a position of at least a part of the sample during the changing of the tilt angle, and changing, based on the step of tracking the position, the relative position of the sample with respect to the charged particle beam to keep the region of interest within a field of view. As defined herein, the method comprises the steps of starting a recovery process based on a detection of an anomaly in the tracking of the position of the sample.
Embodiments herein relate to a process for sample support recognition. A system can comprise a memory that stores, and a processor that executes, computer executable components. The computer executable components can comprise an imaging component that captures an image of an unknown sample support comprising a material layer; and a matching component that matches the unknown sample support to a known sample support based on an unknown non-uniformity profile comprising one or more non-uniformities of the material layer in the image of the unknown sample support.
Disclosed herein are charged particle microscopy (CPM) support systems, as well as related methods, computing devices, and computer-readable media. For example, in some embodiments, a CPM support apparatus may include: first logic to cause a CPM to generate a single image of a first portion of a specimen; second logic to generate a first mask based on one or more regions-of-interest provided by user annotation of the single image; and third logic to train a machine-learning model using the single image and the one or more regions-of-interest. The first logic may cause the CPM to generate multiple images of corresponding multiple additional portions of the specimen, and the second logic may, after the machine-learning model is trained using the single image and the one or more regions-of-interest, generate multiple masks based on the corresponding images of the additional portions of the specimen using the machine-learning model without retraining.
G06V 20/69 - Objets microscopiques, p. ex. cellules biologiques ou pièces cellulaires
G01N 23/04 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en transmettant la radiation à travers le matériau et formant des images des matériaux
G06F 18/214 - Génération de motifs d'entraînementProcédés de Bootstrapping, p. ex. ”bagging” ou ”boosting”
G06T 3/4053 - Changement d'échelle d’images complètes ou de parties d’image, p. ex. agrandissement ou rétrécissement basé sur la super-résolution, c.-à-d. où la résolution de l’image obtenue est plus élevée que la résolution du capteur
G06V 10/22 - Prétraitement de l’image par la sélection d’une région spécifique contenant ou référençant une formeLocalisation ou traitement de régions spécifiques visant à guider la détection ou la reconnaissance
37.
HYBRID BACKGROUND EXTRACTION IN ELECTRON HOLOGRAPHY
Embodiments herein relate to a process for electron holography image background extraction. A system can comprise a memory that stores, and a processor that executes, computer executable components. The computer executable components can comprise a blurring component that executes a primary blurring action and a secondary blurring action on an original electron holography (EH) image characterized by a set of pixels having a set of original pixel values, and a generating component that generates a set of modified pixel values, for the set of pixels, based on a difference of a set of first pixel values, of the set of pixels, resulting from the primary blurring action and a set of second pixel values, of the set of pixels, resulting from the secondary blurring action.
Embodiments herein relate to a process for imaging device virtual simulation. A system can comprise a memory that stores, and a processor that executes, computer executable components. The computer executable components can comprise a rendering engine component that renders a virtual environment comprising a three-dimensional simulation of a simulated imaging device comprising a simulated chamber having a simulated object for analysis being rendered therein; and a simulating component that generates simulation data corresponding to a directed interaction comprising a three-dimensional modification of the simulated object.
Energy dependent defocus in electron beam systems due to a configuration change can be automatically corrected. A method implemented by an electron microscope system can involve receiving an electron beam from a transmission electron microscope. The transmission electron microscope can include an imaging system arranged after a sample plane. The electron beam can include an electron energy loss spectrum due to an interaction with a sample. The method can further involve focusing, by optical components of the energy spectrometer, the electron energy loss spectrum on a detector. Additionally, the method can involve determining information about a change in magnification of the imaging system. The method can involve adjusting, based on the change to the magnification, an operation of one or more optical components such that at least a portion of the electron energy loss spectrum is refocused onto the detector.
Systems or techniques are provided for facilitating in situ protective polymer via milling-excitation. In various embodiments, a device can comprise an ion beam emitter that can be configured to perform milling of a cutface of a specimen via an ion beam. In various aspects, the device can comprise a gas injector that can be configured to deliver a decomposed precursor to the cutface. In various instances, the ion beam can polymerize the decomposed precursor, thereby growing a polymer shield layer on the cutface during the milling.
Apparatus include a sample carrier including a base member and a sample support assembly coupled to the base member, wherein the sample support assembly includes a holder having opposing first and second holder portions configured to compress a sample within a holder receiving portion, wherein the base member is configured to engage a sample stage within a microscope chamber. Methods include securing a sample carrier in a microscope chamber and charging/discharging the sample at least in part through an electrical coupling in the chamber.
Variable dosage ion beam milling techniques for sample preparation are disclosed. A charged particle microscope system can be configured to remove a first layer of material from a sample to reduce a thickness of a first portion of the sample by at least directing an ion beam toward the first portion of the sample. After the first layer is removed, a second layer of material can be removed from the sample to reduce a thickness of a second portion of the sample by at least directing the ion beam toward the second portion of the sample. The ion beam can be directed toward the second portion according to a variable dose.
Embodiments herein relate to a process for imaging device virtual simulation. A system can comprise a memory that stores, and a processor that executes, computer executable components. The computer executable components can comprise a rendering engine component that renders a virtual environment comprising a three-dimensional simulation of a simulated imaging device comprising a simulated chamber having a simulated object for analysis being rendered therein; and a simulating component that generates simulation data corresponding to a directed interaction comprising a three-dimensional modification of the simulated object.
G06T 19/00 - Transformation de modèles ou d'images tridimensionnels [3D] pour infographie
G06T 19/20 - Édition d'images tridimensionnelles [3D], p. ex. modification de formes ou de couleurs, alignement d'objets ou positionnements de parties
G06F 3/00 - Dispositions d'entrée pour le transfert de données destinées à être traitées sous une forme maniable par le calculateurDispositions de sortie pour le transfert de données de l'unité de traitement à l'unité de sortie, p. ex. dispositions d'interface
A charged particle system including a plasma source configured to generate an ion beam including a plurality of ion species and an ion beam optics chamber in fluid communication with the plasma source. The ion beam optics chamber includes an electromagnetic element configured to generate a first magnetic field to separate each of the ion species of the plurality of ion species and a conductive container configured to measure a first current corresponding to a first ion species of the plurality of ion species.
Systems or techniques are provided for facilitating spectral image analysis via integration-constrained fitting. In various embodiments, a system can access a spectral image of a specimen captured by a scientific instrument, wherein pixels of the spectral image respectively correspond to energy spectra. In various aspects, the system can fit in pixel-wise fashion a function to the energy spectra, wherein the function comprises a plurality of terms that are additively combined, wherein a first term of the plurality of terms represents a fine structure of the energy spectra, and wherein an integral associated with the first term is constrained to zero. In various instances, the system can segment the spectral image by material, based on the first term.
G06V 20/69 - Objets microscopiques, p. ex. cellules biologiques ou pièces cellulaires
G06V 10/26 - Segmentation de formes dans le champ d’imageDécoupage ou fusion d’éléments d’image visant à établir la région de motif, p. ex. techniques de regroupementDétection d’occlusion
G06V 10/762 - Dispositions pour la reconnaissance ou la compréhension d’images ou de vidéos utilisant la reconnaissance de formes ou l’apprentissage automatique utilisant le regroupement, p. ex. de visages similaires sur les réseaux sociaux
46.
TILED REGION ADJACENCY GRAPH COMPUTATION VIA PIXEL-REGION ADJACENCY GRAPHS
Systems or techniques are provided for facilitating tiled region adjacency graph computation via pixel-region adjacency graphs. In various embodiments, a system can access an image generated by a scientific instrument. In various aspects, the system can perform marker-based watershed segmentation on a region adjacency graph of the image, wherein the region adjacency graph can be constructed from a plurality of pixel-region adjacency graphs respectively corresponding to a plurality of tiles of the image.
G06T 7/187 - DécoupageDétection de bords impliquant des croissances de zonesDécoupageDétection de bords impliquant des fusions de zonesDécoupageDétection de bords impliquant un étiquetage de composantes connexes
A method for preparing a planar lamella from a multi-layer structure includes milling a first marker in a first side surface of the multi-layer structure, the multi-layer structure including multiple layers that are parallel to a top surface of the multi-layer structure, obtaining a first image of the first side surface, the first image showing the first marker, determining, based on the first image, a pattern offset, and milling, based on the pattern offset, a target marker on a target layer of the multiple layers. One or more non-transitory computer-readable storage media storing instructions that, upon execution on a system, cause the system to perform operations of the method.
Systems for and methods for generating precise structure reconstruction using slice and view images, are disclosed. An example method comprises, obtaining a slice and view images of a sample that depicts a 3D fiducial and cross-sections of a structure in the sample. The 3D fiducial is configured such that when a layer of material having a uniform thickness is removed from a surface of the sample that includes the 3D fiducial the cross-sectional shape of the 3D fiducial in the new surface is consistent. Relative positions are determined between the 3D fiducial the cross-sections of the structure in individual images. Positional relationships are then determined between the cross-sections of the structure in different images in a common reference frame based on the relative positions.
G06T 7/73 - Détermination de la position ou de l'orientation des objets ou des caméras utilisant des procédés basés sur les caractéristiques
G06T 7/33 - Détermination des paramètres de transformation pour l'alignement des images, c.-à-d. recalage des images utilisant des procédés basés sur les caractéristiques
G06T 7/55 - Récupération de la profondeur ou de la forme à partir de plusieurs images
G06T 7/66 - Analyse des attributs géométriques des moments d'image ou du centre de gravité
G06T 17/10 - Description de volumes, p. ex. de cylindres, de cubes ou utilisant la GSC [géométrie solide constructive]
H01J 37/20 - Moyens de support ou de mise en position de l'objet ou du matériauMoyens de réglage de diaphragmes ou de lentilles associées au support
H01J 37/22 - Dispositifs optiques ou photographiques associés au tube
H01J 37/28 - Microscopes électroniques ou ioniquesTubes à diffraction d'électrons ou d'ions avec faisceaux de balayage
H10B 41/27 - Dispositifs de mémoire morte reprogrammable électriquement [EEPROM] comprenant des grilles flottantes caractérisés par les agencements tridimensionnels, p. ex. avec des cellules à des niveaux différents de hauteur la région de source et la région de drain étant à différents niveaux, p. ex. avec des canaux inclinés les canaux comprenant des parties verticales, p. ex. des canaux en forme de U
H10B 43/27 - Dispositifs EEPROM avec des isolants de grille à piégeage de charge caractérisés par les agencements tridimensionnels, p. ex. avec des cellules à des niveaux différents de hauteur la région de source et la région de drain étant à différents niveaux, p. ex. avec des canaux inclinés les canaux comprenant des parties verticales, p. ex. des canaux en forme de U
Systems, devices, and techniques for heating a sample are described. A heating assembly can include a membrane. The membrane can include carbon nanotube material. The heating assembly includes a support, mechanically coupled with the membrane. The support can be configured to integrate with a charged particle beam system. The heating assembly also includes a heating circuit, electrically coupled with the membrane. The heating circuit can be configured to direct an electrical current through the membrane.
H01J 37/26 - Microscopes électroniques ou ioniquesTubes à diffraction d'électrons ou d'ions
G01N 1/44 - Traitement d'échantillons mettant en œuvre un rayonnement, p. ex. de la chaleur
H01J 37/02 - Tubes à décharge pourvus de moyens permettant l'introduction d'objets ou d'un matériau à exposer à la décharge, p. ex. pour y subir un examen ou un traitement Détails
H01J 37/20 - Moyens de support ou de mise en position de l'objet ou du matériauMoyens de réglage de diaphragmes ou de lentilles associées au support
H01J 37/24 - Circuits non adaptés à une application particulière du tube et non prévus ailleurs
A sample holder tip (hereinafter referred to as a sample tip) releasably holds a sample, wherein the sample tip comprises: a cradle comprising beryllium, with a recess for releasably receiving the sample, and a bumper comprising aluminium. In particular, the disclosure relates to a sample tip that may be used in a charged particle microscope.
Methods and systems for implementing artificial intelligence enabled metrology are disclosed. An example method includes segmenting a first image of structure into one or more classes to form an at least partially segmented image, associating at least one class of the at least partially segmented image with a second image, and performing metrology on the second image based on the association with at least one class of the at least partially segmented image.
G06T 7/174 - DécoupageDétection de bords impliquant l'utilisation de plusieurs images
G06T 7/30 - Détermination des paramètres de transformation pour l'alignement des images, c.-à-d. recalage des images
G06V 10/26 - Segmentation de formes dans le champ d’imageDécoupage ou fusion d’éléments d’image visant à établir la région de motif, p. ex. techniques de regroupementDétection d’occlusion
G06V 10/44 - Extraction de caractéristiques locales par analyse des parties du motif, p. ex. par détection d’arêtes, de contours, de boucles, d’angles, de barres ou d’intersectionsAnalyse de connectivité, p. ex. de composantes connectées
G06V 10/764 - Dispositions pour la reconnaissance ou la compréhension d’images ou de vidéos utilisant la reconnaissance de formes ou l’apprentissage automatique utilisant la classification, p. ex. des objets vidéo
G06V 10/82 - Dispositions pour la reconnaissance ou la compréhension d’images ou de vidéos utilisant la reconnaissance de formes ou l’apprentissage automatique utilisant les réseaux neuronaux
A method and system for obtaining electron tomography data from a sample includes a) focussing an electron beam at a first location on a surface of the sample, b) tilting the surface of the sample to a tilt angle to the electron beam while maintaining the surface of the sample at the focus of the electron beam, c) detecting the electron beam focussed at the first location on the surface of the sample, d) translating the sample at the tilt angle to move the focus of the electron beam to at least a second location of the surface of the sample, e) detecting the electron beam focussed on at least the second location on the surface of the sample, and repeating steps b) to e) at one or more different tilt angles.
A61B 6/00 - Appareils ou dispositifs pour le diagnostic par radiationsAppareils ou dispositifs pour le diagnostic par radiations combinés avec un équipement de thérapie par radiations
Apparatus and methods are disclosed for a mechanically stable, long-life, cold field emitter assembly which is compatible with ultra-high vacuum and occasional high-temperature flashing. A metal adapter is welded between a hexaboride electrode and a metal filament. Some embodiments use a tungsten filament, a tantalum adapter, and a LaB6 microrod electrode with a nanorod emitter tip. Other material combinations are disclosed, as also usage in electron sources for electron microscopes. In variations, the adapter is deposited onto the filament and the electrode then welded to the adapter.
In some embodiments, a tool-matching system includes a first controller and a plurality of second controllers. Each of the second controllers is configured to support a digital twin and control configuration parameters of the corresponding measuring instrument. The first controller is configured to estimate configuration-parameter changes for the measuring instruments based on instrument drift data. The estimated parameter changes are directed at tool matching the measuring instruments at a future time. The first controller is also configured to receive a plurality of reports evaluating the estimated configuration-parameter changes. Each of the reports is generated with the respective digital twin based on a respective subset of the estimated configuration-parameter changes. The first controller is also configured to instruct the second controllers to implement the estimated configuration-parameter changes when the reports indicate effectiveness of the estimated configuration-parameter changes for the tool matching of the measuring instruments at the future time.
In some embodiments, a support apparatus for a scientific instrument includes an interface device configured to receive a dataset including a charged-particle-microscope (CPM) image of a sample and a plurality of energy-dispersive X-ray spectroscopy (EDS) spectra of the sample. Each of the EDS spectra corresponds to a respective pixel of the CPM image. The support apparatus also includes one or more electronic processing devices configured to: compute a phase map of the sample by applying phase analysis to the dataset, the phase map identifying groups of pixels representing different respective phases of the sample; for each group of the identified groups of pixels, determine a respective element set based on the EDS spectra corresponding to the group; and for a selected chemical element, compute a corresponding elemental map of the sample based on the identified groups of pixels and the determined respective element sets.
G01N 23/2209 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en mesurant l'émission secondaire de matériaux en utilisant la spectroscopie dispersive en longueur d’onde [WDS]
G01N 23/2251 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en mesurant l'émission secondaire de matériaux en utilisant des microsondes électroniques ou ioniques en utilisant des faisceaux d’électrons incidents, p. ex. la microscopie électronique à balayage [SEM]
In accordance with the present invention, there is provided a scanning electron microscope comprising: an electron source; a sample holder for holding a sample to be analysed; a projector; and a first detector. Each of the electron source and the sample holder are arranged upon an optical axis of the scanning electron microscope. The projector is moveable between a first, operational position in which the projector is located along the optical axis downstream of the sample holder and between the sample holder and the first detector, and a second, retracted position in which the projector is located away from the optical axis. There is also provided a method of imaging a sample with the scanning electron microscope.
G01N 23/2251 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en mesurant l'émission secondaire de matériaux en utilisant des microsondes électroniques ou ioniques en utilisant des faisceaux d’électrons incidents, p. ex. la microscopie électronique à balayage [SEM]
G01N 23/2204 - Supports d’échantillons à cet effetMoyens de transport des échantillons à cet effet
H01J 37/244 - DétecteursComposants ou circuits associés
H01J 37/28 - Microscopes électroniques ou ioniquesTubes à diffraction d'électrons ou d'ions avec faisceaux de balayage
A method for quality control is executable by an electronic processing device. The method includes receiving a spectrum collected from a sample, inputting the spectrum to an autoencoder trained with a plurality of training spectra belonging to a class, and indicating whether the spectrum is a member of the class based on an output from the trained autoencoder.
A method of mapping compositional variation within a specimen comprises: acquiring an electron backscatter image of the surface of the specimen using a first set of electron beam parameters; identifying, from the electron backscatter image, a plurality of locations of areas or points on the specimen to be analyzed by energy dispersive X-ray spectroscopy (EDS); acquiring an EDS spectrum from each of the identified locations or points using a second set of electron beam parameters that are different than the first set of electron beam parameters; and generating a map of compositional variation across the specimen from the plurality of EDS spectra.
G01N 23/20091 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en utilisant la diffraction de la radiation par les matériaux, p. ex. pour rechercher la structure cristallineRecherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en utilisant la diffusion de la radiation par les matériaux, p. ex. pour rechercher les matériaux non cristallinsRecherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en utilisant la réflexion de la radiation par les matériaux en mesurant le spectre de dispersion d’énergie [EDS] du rayonnement diffracté
An ion beam system including a plasma source tube defining a plasma source chamber, a first gas reservoir housing a first gas, a second gas reservoir housing a second gas, a first controller fluidly coupled to the first gas reservoir and configured to control a first flow rate of the first gas, and a second controller fluidly coupled to the second gas reservoir and configured to control a second flow rate of the second gas. The system also includes a first capillary constriction including a first end fluidly coupled to the first controller and a second end fluidly coupled to the plasma source chamber, and a second capillary constriction including a third end fluidly coupled to the second controller and a fourth end fluidly coupled to the plasma source chamber, where the first capillary constriction and the second capillary constriction are distinct.
Systems or techniques are provided for image metrology. In various embodiments, a system can comprise a memory that stores computer executable components and a processor that executes the computer executable components stored in the memory. The computer executable components can comprise a measurement component that accesses a k-distance data tree comprising positional coordinates of a plurality of shapes within an image; and measures distances between neighboring shapes of the plurality of shapes, wherein the measuring comprises parsing the k-distance data tree for nearest neighbor shapes within the plurality of shapes.
G06T 7/73 - Détermination de la position ou de l'orientation des objets ou des caméras utilisant des procédés basés sur les caractéristiques
G06V 10/26 - Segmentation de formes dans le champ d’imageDécoupage ou fusion d’éléments d’image visant à établir la région de motif, p. ex. techniques de regroupementDétection d’occlusion
G06V 10/44 - Extraction de caractéristiques locales par analyse des parties du motif, p. ex. par détection d’arêtes, de contours, de boucles, d’angles, de barres ou d’intersectionsAnalyse de connectivité, p. ex. de composantes connectées
G06V 10/82 - Dispositions pour la reconnaissance ou la compréhension d’images ou de vidéos utilisant la reconnaissance de formes ou l’apprentissage automatique utilisant les réseaux neuronaux
61.
SYSTEMS AND METHODS FOR ANALYZING A SAMPLE USING CHARGED PARTICLE BEAMS AND ACTIVE PIXEL CONTROL SENSORS
Systems and methods taught herein utilize a single detector to provide both unidimensional data (e.g., for direct topographical imaging) and multidimensional data (e.g., for crystallographic data) for a sample that is interrogated with a charged particle beam. In some examples, unidimensional data can include signal intensity due to backscattered electrons received across the entire detector surface while multidimensional data can include signal intensity due to backscattered electrons as a function of pixel position. By obtaining unidimensional data and multidimensional data from a single detector, the unidimensional data and multidimensional data can be obtained at a same location, at a same time, or both at the same location and same time.
A method of imaging a sample includes acquiring one or more first images of a region of the sample at a first imaging condition with a charged particle microscope system. The one or more first images are applied to an input of a trained machine learning model to obtain a predicted image indicating atom structure probability in the region of the sample. An enhanced image indicating atom locations in the region of the sample based on the atom structure probability in the predicted image is caused to be displayed in response to obtaining the predicted image.
Objective lenses, charged particle microscopes including the same, and associated methods are disclosed herein. An objective lens can include a lens body, a shielding electrode, and a steering electrode. The objective lens is configured such that varying a steering electrode voltage adjusts a location of a main objective plane of the objective lens to vary a focal working distance of the objective lens. A method can include positioning a sample relative to an objective lens and operating the objective lens to focus a charged particle beam to a focus location.
A method of Particle-Induced X-Ray Emission (PIXE) analysis comprises: (a) delivering a first ion beam from a first ion source and comprising ions having a first composition onto an area of a sample, wherein the kinetic energy of the ions is not greater than 50 kilo-electron-Volts (keV); (b) simultaneously with the delivering of the first ion beam onto the sample area, delivering a second ion beam from a second ion source onto the sample area, the second ion beam comprising ions having a second composition, wherein the kinetic energy of the ions of the second ion beam is not greater than 50 keV; and (c) detecting X-rays that are emitted from the sample area in response to the simultaneous delivery of the first and second ion beams thereto.
G01N 23/2257 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en mesurant l'émission secondaire de matériaux en utilisant des microsondes électroniques ou ioniques en utilisant des faisceaux d’ions incidents, p. ex. des faisceaux de protons en mesurant les rayons X excités, c.-à-d. émission de rayons X induite par particules [PIXE]
H01J 37/244 - DétecteursComposants ou circuits associés
A scientific instrument, for example an electron microscope, is disclosed and comprises a moveable stage with a sample holder. A cold finger is in contact with a heat sink and comprises a cooling plate configured to contact the sample holder to cool the sample holder in a rapid cooling position. A thermally conductive flexible member thermally connects the sample holder and the cold finger to cool the sample holder away from the rapid cooling position, where the sample can be investigated, imaged, and the like. Embodiments are disclosed in which both the cold and the sample holder move or in which only the cold finger move between a rapid cooling and other configurations. Also disclosed is a corresponding method for operating the scientific instrument. The disclosure advantageously combines rapid cooling in the rapid cooling position with reduced limitation of movement of the sample holder away from the parked position.
Systems and methods for adjusting scanning patterns in scientific instruments based on electromagnetic interference. One example charged particle instrument includes a chamber supporting a sample, a column coupled to the chamber, a pump configured to establish a vacuum within the chamber, a sensing device configured to detect a measure of a frequency of electromagnetic interference generated via the pump, and a controller including an electronic processor and a memory. The column includes a charged particle source configured to generate a charged particle beam traveling through the column and into the chamber. The charged particle beam is generated according to a scanning pattern. The controller configured to receive, from the sensing device, a signal indicative of the frequency of the electromagnetic interference and adjust the scanning pattern based on the frequency of the electromagnetic interference.
In a transmission electron microscope, an intermediate lens assembly receives a beam of electrons after leaving a primary lens and forms an image of a sample in a sample holder. The intermediate lens assembly comprises a first lens, a second lens, a first port in a first port plane and a second port in a second port plane. The first port and the second port receive a wave front manipulating device for manipulating the wave front of the beam. In a first mode, a controller controls the first and second lenses to direct the diffraction pattern into a second diffraction plane wherein the second diffraction plane is coincident with the first port plane. In a second mode, the controller controls the first and second lenses to direct the diffraction pattern into a third diffraction plane wherein the third diffraction plane is coincident with the second port plane.
Segmented endpointing techniques for sample preparation are disclosed. A charged particle microscope system can be configured to remove a first layer of material from the sample by directing an ion beam toward a surface of the sample in a pattern. The pattern corresponding to a segment of the sample. After the first layer is removed, the system can remove a second layer of material from the segment such that a thickness of at least a portion of the segment is reduced. Removing the second layer can include directing the ion beam toward the portion of the sample in N patterns corresponding to N segments of the portion, obtaining an image of the surface of the sample, and stopping, based on the image, the directing of the ion beam toward a segment of the N segments.
Systems, components, and methods for beam-induced deposition are described. A charged particle beam system can include a vacuum chamber. The system can include a charged particle beam source, operably coupled with the vacuum chamber and including an emitter section and a column section, the charged particle beam source being configured to generate a beam of charged particles and to direct the beam of charged particles into the vacuum chamber. The system can include a precursor source, operably coupled with the vacuum chamber and configured to direct a gas stream comprising a precursor into the vacuum chamber. The precursor can include a hydrocarbon having a vapor pressure greater than about 1.6×10−4 mbar at about 293 K and about 101.3 kPa, and wherein the hydrocarbon is not naphthalene.
Embodiments herein relate to sample support imaging and sample location identification at a sample support to be used for microscopy imaging. A system can comprise a memory that stores, and a processor that executes, computer executable components. The computer executable components can comprise a beam directing component that instructs a focused ion beam (FIB) device of a beam system to direct an ion beam at a sample support, and a field application component that affects secondary charged particles, emitted from the sample support due to the ion beam, by directing activation of a negative field from the beam system during application of the ion beam by the FIB device.
Charged-particle beam (CPB) optical systems can include a beam acceptance aperture plate defining a first acceptance aperture and at least one second acceptance aperture, situated with respect to a CPB source so that a first CPB is transmitted by the first acceptance aperture and a second CPB is transmitted by a second acceptance aperture. A CPB lens is situated to receive the first and second CPBs from the beam acceptance aperture plate and direct the first and second CPBs towards a filter aperture plate to transmit selected spectral portion of the second CPB. The selected spectral component of the first CPB can be selectively directed to a workpiece by a beam steering deflector along the same axis. In some examples, the first and second CPBs have different beam currents and only one is directed to a workpiece.
H01J 37/05 - Dispositifs électronoptiques ou ionoptiques pour la séparation des électrons ou des ions en fonction de leur énergie
H01J 37/04 - Dispositions des électrodes et organes associés en vue de produire ou de commander la décharge, p. ex. dispositif électronoptique, dispositif ionoptique
A system and method for spectrometry of a sample in a plasma is described. The system includes a split ring resonator, an electrode, and a delivery system. The split ring resonator has a discharge gap, and the electrode is arranged in proximity to, but spaced apart from, the discharge gap such that. When a sufficient power is supplied to a plasma generated in the discharge gap, the plasma extends towards and couples with the electrode, so that the plasma is established in a region between the discharge gap and the electrode. The delivery system is for introduction of a sample into the plasma established in the region between the discharge gap and the electrode. The system is configured to direct an output from the plasma to a spectrometer for analysis.
H05H 1/00 - Production du plasmaMise en œuvre du plasma
G01N 21/67 - Systèmes dans lesquels le matériau analysé est excité de façon à ce qu'il émette de la lumière ou qu'il produise un changement de la longueur d'onde de la lumière incidente excité électriquement, p. ex. par électroluminescence en utilisant des arcs électriques ou des décharges électriques
H01J 49/00 - Spectromètres pour particules ou tubes séparateurs de particules
Methods for using a single electron microscope system for investigating a sample with twin electron beams having different focal lengths include the steps of emitting electrons toward the sample, forming the electrons into a two beams, and then modifying the focal properties of at least one of the two beams such that they have different focal planes. Once the two beams have different focal planes, the first electron beam is focused at the sample, and the second electron beam is focused so that it acts as a TEM beam that is parallel beam when incident on the sample. Emissions resultant from the first electron beam and the TEM beam being incident on the sample can then be detected by a single detector or detector array and used to generate a TEM image.
G01N 23/207 - Diffractométrie, p. ex. en utilisant une sonde en position centrale et un ou plusieurs détecteurs déplaçables en positions circonférentielles
G01N 33/00 - Recherche ou analyse des matériaux par des méthodes spécifiques non couvertes par les groupes
G03H 5/00 - Procédés ou appareils holographiques utilisant des particules ou des ondes autres que celles couvertes par les groupes ou pour obtenir des hologrammesProcédés ou appareils pour en obtenir une image optique
H01J 37/04 - Dispositions des électrodes et organes associés en vue de produire ou de commander la décharge, p. ex. dispositif électronoptique, dispositif ionoptique
H01J 37/26 - Microscopes électroniques ou ioniquesTubes à diffraction d'électrons ou d'ions
Embodiments herein relate to apodization of a hologram. A system can comprise a memory that stores, and a processor that executes, computer executable components. The computer executable components can comprise an obtaining component that obtains a signal of an energy-based initial hologram, an expansion component that expands the initial hologram at a boundary of the initial hologram, resulting in an expanded hologram having an expanded portion at the boundary, and a filter application component that, based on the expanded hologram, applies an apodization filter to overlap the expanded portion of the expanded hologram.
Variations in charged-particle-beam (CPB) source location are determined by scanning an alignment aperture that is fixed with respect to a beam defining aperture in a CPB, particularly at edges of a defocused CPB illumination disk. The alignment aperture is operable to transmit a CPB portion to a secondary emission surface that produces secondary emission directed to a scintillator element. Scintillation light produced in response is directed out of a vacuum enclosure associated with the CPB via a light guide to an external photodetection system.
An apparatus for moving first and second sample holders between respective first and second starting positions and respective first and second end positions comprises a guide assembly configured to: guide the first sample holder along a first path from the first starting position to the first end position and back along the first path from the first end position to the first starting position; and guide the second sample holder along a second path from the first starting position to the second end position and back along the second path from the second end position to the second starting position. The guide assembly is configured such that the first and second sample holders are spaced apart as they move along at least a portion of the lengths of their respective paths.
B65G 25/06 - Transporteurs comportant un porte-charges ou un impulseur à mouvement cyclique, p. ex. à va-et-vient, désengagé de la charge pendant le mouvement de retour le porte-charges ou l'impulseur ayant des courses aller et retour identiques, p. ex. transporteurs à mouvement alternatif à porte-charges, p. ex. des courroies
77.
TRANSMISSION ELECTRON MICROSCOPY OF STREAMS OF IONS AND MOLECULES
A method of analyzing a sample by an electron microscope comprises: generating ions, molecules, or other particles, such as droplets, from a sample of interest; introducing the ions, molecules or other particles into an evacuated chamber of a Transmission Electron Microscope (TEM) in a direction that intersects the path of a pulsed electron beam; on each pulse of the electron beam, recording an electron diffraction pattern pertaining to ions through which the said pulse passes; and calculating a three-dimensional (3D) structure of an ion species from the recorded electron diffraction patterns.
G01N 23/20058 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en utilisant la diffraction de la radiation par les matériaux, p. ex. pour rechercher la structure cristallineRecherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en utilisant la diffusion de la radiation par les matériaux, p. ex. pour rechercher les matériaux non cristallinsRecherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en utilisant la réflexion de la radiation par les matériaux en mesurant la diffraction des électrons, p. ex. la diffraction d’électrons lents [LEED] ou la diffraction d’électrons de haute énergie en incidence rasante [RHEED]
G01N 23/2055 - Analyse des diagrammes de diffraction
G01N 23/2251 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en mesurant l'émission secondaire de matériaux en utilisant des microsondes électroniques ou ioniques en utilisant des faisceaux d’électrons incidents, p. ex. la microscopie électronique à balayage [SEM]
H01J 37/26 - Microscopes électroniques ou ioniquesTubes à diffraction d'électrons ou d'ions
H01J 37/256 - Tubes analyseurs à spot par faisceaux électroniques ou ioniquesMicro-analyseurs utilisant des faisceaux de balayage
A charged particle microscope system, comprising an electron source housing a Wehnelt electrode and a cathode, wherein the electron source may include a dry environment defining a volume between the Wehnelt electrode and the cathode that may be substantially water-free, a beam column including a plurality of electromagnetic lens elements, and a vacuum chamber including a sample holder. An electron beam axis may be defined from the cathode to the sample holder.
A charged particle beam microscope system directs a charged particle beam to a sample to produce a plurality of images for a plurality of areas of the sample. Respective first sets of one or more aberration predictor values are acquired for each of the plurality of images. During the image acquisition, an aberration measurement and a corresponding second set of aberration predictor values are periodically acquired. An aberration model is obtained using the aberration measurements the corresponding second sets of aberration predictor values, wherein the model takes a set of aberration predictor values as an input and outputs predicted aberration data. The model is applied to the first sets of aberration predictor values to obtain respective aberration data, which is used to reduce or at least partially correct for aberration in the charged particle microscope images. A sample reconstruction is obtained using the acquired charged particle microscope images.
Aberration correction systems and charged particle microscope systems including the same. An apparatus can include a plurality of electrostatic multipole elements configured to at least partially correct an axial chromatic aberration of the charged particle beam. The apparatus additionally includes a deflector assembly with a corrector electrostatic prism. The corrector electrostatic prism can include a first corrector prism electrode and a second corrector prism electrode that define an electrode gap therebetween and a deflector optical axis extends within the electrode gap. The plurality of electrostatic multipole elements can include a first hexapole-generating element, a second hexapole-generating element, a third hexapole-generating element, and/or a fourth hexapole-generating element. In some examples, the second hexapole-generating element is positioned proximate to a midpoint of the deflector optical axis. In some examples, each of the second hexapole-generating element and the third hexapole-generating element is positioned at least partially within the corrector electrostatic prism.
Aberration correction systems and charged particle microscope systems including the same. An apparatus can include a charged particle source and an optical column. The optical column can include a multipole condenser with one or more condenser quadrupole-generating elements and/or a multipole objective with a plurality of objective multipole elements. The plurality of objective multipole elements can include at least three quadrupole-generating elements and at least three octupole-generating elements configured to at least partially correct a spherical aberration of a charged particle beam. The optical column can be configured such that the charged particle beam enters the multipole objective with a non-circular beam profile and/or such that the charged particle beam is characterized by a non-circular beam profile through at least a portion of the multipole objective.
A method of producing an electron diffraction pattern comprises of directing an electron beam to be incident upon a sample and detecting, by a particle detector with an array of pixels, electrons scattered from the sample. The detecting comprises, for each detected electron at a pixel, measuring an energy value that is proportional to the energy of the detected electron. The measured energy value of each detected electron and an identifier of the pixel that detected the electron are sent to a processing device. An energy-weighted contribution value from each measured energy value is calculated by the processing device using an energy-dependent function. The energy-dependent function produces energy-weighted contribution values that vary with electron energy. An energy-weighted electron diffraction pattern is then generated using pixel positions associated with each pixel identifier, and the energy-weighted contribution values.
Milling depth is selected based on sample dimensions to increase the rate at which sample images are acquired. A cutface height and associated focused ion beam dose are selected based on an image of a previously acquired sectional surface. Edges in the image can be identified such as those corresponding to a sample mount or a coating applied to the sample and used to establish a CPB dose. Cutface height can be based on a single or multiple prior sectional surface images.
In some embodiments, a scientific instrument includes a manipulator configured to controllably rotate a sample, an electron-beam column configured to direct an electron beam to a selected impact point on the sample; and a detector configurable to detect an angularly resolved pattern and a flux of back-scattered electrons. The scientific instrument also includes an electronic controller configured to: determine a first crystal orientation of the sample based on the angularly resolved pattern acquired when the electron-beam column is operated to keep the electron beam fixed at the impact point; operate the manipulator to place the sample into a second crystal orientation in which an angular difference between the determined first crystal orientation and a target crystal orientation is estimated to be canceled; and determine the second crystal orientation based on an SACP acquired when the electron-beam column is operated to rock the electron beam at the impact point.
G01N 23/20025 - Porte-échantillons ou leurs supports
G01N 23/20058 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en utilisant la diffraction de la radiation par les matériaux, p. ex. pour rechercher la structure cristallineRecherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en utilisant la diffusion de la radiation par les matériaux, p. ex. pour rechercher les matériaux non cristallinsRecherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en utilisant la réflexion de la radiation par les matériaux en mesurant la diffraction des électrons, p. ex. la diffraction d’électrons lents [LEED] ou la diffraction d’électrons de haute énergie en incidence rasante [RHEED]
G01N 23/203 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en utilisant la diffraction de la radiation par les matériaux, p. ex. pour rechercher la structure cristallineRecherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en utilisant la diffusion de la radiation par les matériaux, p. ex. pour rechercher les matériaux non cristallinsRecherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en utilisant la réflexion de la radiation par les matériaux en mesurant la rétrodiffusion
85.
MULTIPOLE ELEMENTS AND CHARGED PARTICLE MICROSCOPE SYSTEMS INCLUDING THE SAME
Multipole elements and charged particle microscope systems including the same. In an example, an apparatus can include plurality of electrodes including a first shape subset and a second shape subset. Each electrode of the first shape subset includes an electrode active surface with a shape that is different than that of each electrode of the second shape subset. In another example, an apparatus can include a plurality of electrodes including a first side subset and a second side subset. Each electrode includes an electrode extension extending along a first lateral direction or a second lateral direction. In another example, an apparatus can include an optical column with a plurality of multipole elements that are fully contained within a first angular envelope that subtends a first angle that is at most 50 degrees while the working distance is at most 10 mm.
Cryogenic cleaning devices comprise a body and an attachment element for attaching the body to a vacuum chamber to provide a fluid path between the body and the vacuum chamber. A surface is configured to accumulate gas molecules received into the body via the fluid path by condensing and/or adsorbing the gas molecules on the surface when cooled and a single-stage refrigeration system is configured to cool the surface. A pump is configured to pump out the accumulated gas molecules during baking of and a valve is moveable between a first position in which the fluid path is open to allow the gas molecules to be evacuated from the vacuum chamber into the body, and a second position in which the fluid path is closed to prevent the gas molecules from being received into the body.
F04B 37/08 - Pompes spécialement adaptées aux fluides compressibles et ayant des caractéristiques pertinentes non prévues dans les groupes ou présentant un intérêt autre que celui visé par ces groupes pour l'évacuation par moyens thermiques par condensation ou réfrigération, p. ex. pompes cryogéniques
Aspects of a sample holder configured for an analytical instrument system, as well as components and methods for reproducible sample motion are described. An apparatus for coupling a specimen with an instrument can include a rear lever arm, a front lever arm, coupled with the rear lever arm, and a sample cradle, coupled with the front lever arm via an S-flexure.
A method comprises providing reference data indicative of at least one reference energy-dispersive x-ray spectrum, providing measured data indicative of at least one measured energy-dispersive x-ray spectrum obtained from a sample, and determining a transformation based on a comparison of the measured data with the reference data. A system configured to determine a transformation based on a comparison of measured data with reference data is also described.
G01N 23/20091 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en utilisant la diffraction de la radiation par les matériaux, p. ex. pour rechercher la structure cristallineRecherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en utilisant la diffusion de la radiation par les matériaux, p. ex. pour rechercher les matériaux non cristallinsRecherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en utilisant la réflexion de la radiation par les matériaux en mesurant le spectre de dispersion d’énergie [EDS] du rayonnement diffracté
A method of template matching a tensorial template of a target particle to identify instances of that target within a tomogram comprises obtaining a tensorial template of the target particle, wherein the tensorial template describes the shape at all rotations of the target particle with a tensor field, and using the tensorial template to identify instances of that target particle within a tomogram.
G06V 10/75 - Organisation de procédés de l’appariement, p. ex. comparaisons simultanées ou séquentielles des caractéristiques d’images ou de vidéosApproches-approximative-fine, p. ex. approches multi-échellesAppariement de motifs d’image ou de vidéoMesures de proximité dans les espaces de caractéristiques utilisant l’analyse de contexteSélection des dictionnaires
G06V 20/69 - Objets microscopiques, p. ex. cellules biologiques ou pièces cellulaires
A sample carrier for a charged particle microscope. The sample carrier comprises a planar or substantially planar body, an opening, and at least one protrusion. The opening is provided in the planar or substantially planar body. The protrusion extends into the opening within a plane defined by the planar or substantially planar body. The protrusion is configured to hold a charged particle microscopy sample.
Dual beam charged particle microscopy systems, sensors, and techniques are disclosed. A charged particle microscope system can include a vacuum chamber, a sample stage disposed in the vacuum chamber, a first beam source operable to direct a first particle beam into the vacuum chamber, a second beam source operable to direct a second particle beam into the vacuum chamber, a first charged particle sensor, and a second charged particle sensor. The first charged particle sensor can include a detector cell having a semiconductor layer characterized by a bandgap equal to or greater than about 2.0 eV, oriented to detect secondary electrons generated based on an interaction between the first particle beam or the second particle beam and the sample. The second charged particle sensor can include a scintillator detector configured to be saturated from electrons generated based on an interaction between the second particle beam and the sample.
G01N 23/2251 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en mesurant l'émission secondaire de matériaux en utilisant des microsondes électroniques ou ioniques en utilisant des faisceaux d’électrons incidents, p. ex. la microscopie électronique à balayage [SEM]
G01N 23/203 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en utilisant la diffraction de la radiation par les matériaux, p. ex. pour rechercher la structure cristallineRecherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en utilisant la diffusion de la radiation par les matériaux, p. ex. pour rechercher les matériaux non cristallinsRecherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en utilisant la réflexion de la radiation par les matériaux en mesurant la rétrodiffusion
In some embodiments, a scientific instrument includes an electron-beam column configured to scan an electron beam across a sample. The electron-beam column includes a beam blanker configured to gate the electron beam in response to a drive signal. The scientific instrument also includes an electron detector configured to measure a flux of transmitted or scattered electrons having interacted with the sample and an electronic controller configured to acquire an image of the sample using values of the flux measured with the electron detector for a plurality of electron-beam scan locations. The electronic controller is further configured to cause the drive signal to have a gating frequency at which the image has a moiré pattern therein.
H01J 37/04 - Dispositions des électrodes et organes associés en vue de produire ou de commander la décharge, p. ex. dispositif électronoptique, dispositif ionoptique
93.
Lamella End-Pointing Via Graph-Weighted Neural Networks
Systems or techniques are provided for facilitating lamella end-pointing via graph-weighted neural networks. In various embodiments, a system can access an image captured by a scientific instrument, wherein the image depicts a cutface of a lamella. In various aspects, the system can generate, via execution of a graph-weighted neural network, a classification label for the cutface, wherein the classification label can indicate to which one of a plurality of defined classes the cutface belongs. In various instances, the system can, in response to the classification label indicating that the cutface does not belong to a target class of the plurality of defined classes, instruct the scientific instrument to incrementally mill the cutface of the lamella.
G06V 10/82 - Dispositions pour la reconnaissance ou la compréhension d’images ou de vidéos utilisant la reconnaissance de formes ou l’apprentissage automatique utilisant les réseaux neuronaux
G06F 30/12 - CAO géométrique caractérisée par des moyens d’entrée spécialement adaptés à la CAO, p. ex. interfaces utilisateur graphiques [UIG] spécialement adaptées à la CAO
G06V 10/764 - Dispositions pour la reconnaissance ou la compréhension d’images ou de vidéos utilisant la reconnaissance de formes ou l’apprentissage automatique utilisant la classification, p. ex. des objets vidéo
G06V 10/774 - Génération d'ensembles de motifs de formationTraitement des caractéristiques d’images ou de vidéos dans les espaces de caractéristiquesDispositions pour la reconnaissance ou la compréhension d’images ou de vidéos utilisant la reconnaissance de formes ou l’apprentissage automatique utilisant l’intégration et la réduction de données, p. ex. analyse en composantes principales [PCA] ou analyse en composantes indépendantes [ ICA] ou cartes auto-organisatrices [SOM]Séparation aveugle de source méthodes de Bootstrap, p. ex. "bagging” ou “boosting”
G06V 20/69 - Objets microscopiques, p. ex. cellules biologiques ou pièces cellulaires
G06V 20/70 - Étiquetage du contenu de scène, p. ex. en tirant des représentations syntaxiques ou sémantiques
Methods include conditioning at least a portion of a gas delivery system with a carbon-based conditioning agent to provide a carbon-based residual, and etching a substrate with a focused ion beam, in the presence of an ammonia-based delayering agent provided by the gas delivery system and in the presence of the carbon-based residual, wherein the carbon-based residual reduces a topographical variation of a depth of the etching. Apparatus include a focused ion beam system configured to deliver a focused ion beam to a sample, and a pre-conditioned gas delivery system configured to deliver an ammonia-based delayering agent to the sample at least while the focused ion beam is being delivered to the sample, wherein the pre-conditioned gas delivery system includes a carbon-based residual in the gas delivery system, wherein a portion of the carbon-based residual is present at the sample during the etching of the sample with the ammonia-based delayering agent.
Sample regions of interest (ROIs) for use in autofocus procedures are identified based on a gradient image of the sample. ROIs with gradient values greater that a threshold are selected, and eigenvalues of the associated image matrices are determined. ROIs with suitable variation in eigenvalues such as at least two relatively large eigenvalues are associated with high contrast features orientated in multiple directions so that such ROIs are suitable for automatic focus and astigmatism correction. Suitable ROIs can also be identified based on a histogram of gradient orientations.
Methods and systems for performing sample lift-out and creating attachments for highly reactive materials within charged particle microscopy systems are disclosed herein. Methods include creating attachments between a sample manipulator and a sample within a charged particle system and translating a sample manipulator so that the sample manipulator is proximate to a sample such that a portion of the sample manipulator proximate to the sample is composed of a high sputter yield material. The methods and systems include milling, with a charged particle beam, the high sputter yield material such that portions of the high sputter yield material are removed from the sample manipulator without milling away material from the sample such that at least some of the removed high sputter yield material redeposits to form an attachment between the sample manipulator and the sample without milling material away from the sample.
A grid for sampling a liquid specimen includes a first layer and a backing material supporting the first layer. The first layer includes a plurality of lanes, each lane having a first end configured to receive a droplet of the liquid specimen, a second end opposite the first end, and a length extending from the first end to the second end.
In some embodiments, a scientific instrument includes an electron-beam column configured to scan an electron beam across a sample and a segmented electron detector configured to receive diffracted beams produced by diffraction of the electron beam in the sample. The segmented electron detector has a plurality of segments arranged in a two-dimensional array, with each of the segments being configured to generate a respective output signal representing a respective integrated flux of electrons received thereat. The scientific instrument also includes an electronic controller configured to receive a set of frames from the segmented electron detector, each of the frames representing a respective set of output signals generated by the segments in response to an electron diffraction pattern projected onto the segmented electron detector, and further configured to communicate with a computing device programmed to generate a strain map of the sample based on the set of frames.
G01B 15/06 - Dispositions pour la mesure caractérisées par l'utilisation d'ondes électromagnétiques ou de radiations de particules, p. ex. par l'utilisation de micro-ondes, de rayons X, de rayons gamma ou d'électrons pour mesurer la déformation dans un solide
H01J 37/244 - DétecteursComposants ou circuits associés
H01J 37/26 - Microscopes électroniques ou ioniquesTubes à diffraction d'électrons ou d'ions
H01J 37/28 - Microscopes électroniques ou ioniquesTubes à diffraction d'électrons ou d'ions avec faisceaux de balayage
99.
LIQUID SPECIMEN GRID FOR TRANSMISSION ELECTRON MICROSCOPE
A grid for sampling a liquid specimen. The grid includes a mesh and a foil. The mesh includes a plurality of grid bars defining a plurality of openings. The plurality of grid bars forms an outer perimeter of each opening. The foil is coupled to the mesh and the foil includes a plurality of holes. A subset of the plurality of holes is aligned with each of the plurality of openings. Each hole of the subset is spaced from the outer perimeter of the corresponding opening defined by the plurality of grid bars.
Systems, components, and methods for generating differential phase contrast (DPC) data are described. Methods include operations for directing the beam of electrons through a material sample disposed in the microscope column, wherein interactions of the material sample and the beam of electrons produce a scattered portion of the beam of electrons. The methods include directing the scattered portion onto the energy filter, the energy filter being configured to disperse the scattered portion along a dispersal axis by energy and to direct a subset of the scattered portion toward a detector of the energy filter. The operations include generating detector data using the subset of the scattered portion incident on the detector, the detector data comprising EELS data. The operations also include generating differential phase contrast data using the detector data.
