Tokyo Electron Limited

Japan


Create a watch for Tokyo Electron Limited
Total IP 13,185
Total IP incl. subs 13,257 (+ 126 for subs)
Total IP Rank # 69
IP Activity Score 4.5/5.0    8,764
IP Activity Rank # 56
IP AS incl. subs 4.3/5.0    8,766
Stock Symbol
ISIN JP3571400005
Market Cap. 8668609632540.0  (JPY)
Industry Semiconductor Equipment & Materials
Sector Technology
Dominant Nice Class Machines and machine tools

Patents

Trademarks

8,292 94
0 2
4,698 93
6
 
Last Patent 2025 - Method for removing titanium oxi...
First Patent 1978 - Magnetron sputtering target and ...
Last Trademark 2025 - EPSIRA
First Trademark 1989 - TEL

Subsidiaries

6 subsidiaries with IP (126 patents, 0 trademarks)

2 subsidiaries without IP

 Register for free to unlock the subsidiary list

Industry (Nice Classification)

Latest Inventions, Goods, Services

2025 Invention Etching method and etching apparatus. An etching method includes a first storage process of supp...
Invention Computer program, information processing method, and information processing device. The present ...
Invention Plasma processing with magnetic ring x point. A plasma etching system that includes a plasma pro...
Invention Apparatus for transporting substrate, system for processing substrate, and method of transporting...
Invention Silicon carbonitride film-forming method and plasma processing apparatus. A silicon carbonitride...
Invention Substrate processing system. A technique for suppressing a metal component from remaining at a b...
Invention Methods to automatically adjust one or more parameters of a camera system for optimal 3d reconstr...
Invention Polishing apparatus and substrate polishing method. A polishing apparatus includes: a processing...
G/S Semiconductor manufacturing machines and parts therefor; flat panel display manufacturing machine...
G/S Semiconductor manufacturing machines and their component parts and fittings; flat panel display ...
Invention Substrate processing method, substrate processing system, and protective film. A substrate proce...
Invention Stage, inspection device, and method of operating stage. A stage includes a substrate support co...
Invention Control valve control method and substrate processing device. Provided are: a control valve contr...
Invention Substrate processing method, substrate processing system, and parameter correction method. In thi...
Invention Method for removing titanium oxide film and substrate processing device. The purpose of the prese...
Invention Method for determining optimum thickness measurement position, substrate processing method, and s...
Invention Film, article, and plasma processing device. abcdd, where: M represents a metal atom; a, b, c, an...
Invention Substrate heating apparatus and substrate heating method. A substrate heating apparatus includes...
Invention Temperature regulating device and plasma processing device. This temperature regulating device fo...
Invention Substrate support and substrate treatment device. Disclosed is a substrate support comprising: a ...
Invention Substrate treatment method and substrate treatment apparatus. A substrate treatment method inclu...
Invention Transfer device, semiconductor manufacturing system, and transfer method. A transfer device incl...
Invention Liquid processing apparatus. A liquid processing apparatus includes a holder that holds and rota...
Invention Plasma processing apparatus and upper electrode. Provided are a plasma processing apparatus and a...
Invention Method for depositing film on substrate and device for depositing film on substrate. When deposit...
Invention Substrate processing method and substrate processing apparatus. A substrate processing method is...
Invention Cleaning method and plasma treatment device. A cleaning method for a plasma treatment apparatus a...
Invention Substrate processing method and substrate processing device. This substrate processing method inc...
Invention Film formation method and film formation device. A film formation method according to an embodime...
Invention Information processing apparatus, detection method, and substrate processing apparatus. An infor...
Invention Plasma processing device. Provided is a technique for improving the accuracy of an electrical par...
Invention Substrate processing device and control method. This substrate processing device comprises a subs...
Invention Cable connecting method, production method of connecting member, and thermal processing apparatus...
Invention Substrate processing device and substrate processing method. A substrate processing device accord...
Invention Surface passivation for achieving controllable queue time for post-planarization process. A meth...
Invention Film-forming method and film-forming apparatus. A film-forming method includes (a) providing a s...
G/S Installation, maintenance and repair of semiconductor manufacturing machines; installation, maint...
G/S Installation, maintenance and repair of semiconductor manufacturing machines; installation, main...
Invention Method for selectively depositing etch stop layer. A method for making a semiconductor device can...
Invention Systems and methods that utilize metal-coated processing heads to improve wet processing of semic...
Invention Method for etching a metal hard mask. A method for forming a semiconductor device can include rec...
Invention Substrate processing device and transport method. This substrate processing device includes a cha...
Invention Substrate processing method and substrate processing apparatus. In one exemplary embodiment of th...
Invention Wafer overlay registration in hybrid bonding. A method of hybrid bonding includes accessing firs...
2024 G/S Semiconductor manufacturing machines and their component parts and fittings
G/S Semiconductor manufacturing machines and their component parts and fittings; flat panel display m...
G/S Semiconductor manufacturing machines used for coating and deposition processes, and their compone...
Invention Method of forming hard mask structure. A method for forming a semiconductor device can include f...
Invention Method and apparatus for damascene etching. A method for etching a wafer includes providing the ...
Invention Method for patterning mask layer over substrate. A method includes forming a first mask over a s...
Invention Method for selectively depositing etch stop layer. A method for making a semiconductor device ca...
Invention Method for etching a metal hard mask. A method for forming a semiconductor device can include re...
G/S Downloadable computer software for controlling semiconductor manufacturing processes; downloadabl...
G/S Downloadable computer software for controlling semiconductor manufacturing processes; downloadab...
2023 Invention Substrate treatment device and film thickness estimation method. A substrate processing apparatu...
Invention Substrate processing method, substrate processing device, and storage medium. A substrate proces...
G/S Machines and instruments used for measuring and testing semiconductor manufacturing machines, nam...
G/S Machines and instruments used for measuring and testing semiconductor manufacturing machines; co...
2022 G/S Semiconductor manufacturing machines and their component parts and fittings.
Invention Film forming method and film forming apparatus. A film forming method includes (A) to (C) as fol...
2021 G/S Semiconductor manufacturing machines and their component parts and fittings; machines for mainten...
G/S Semiconductor manufacturing machines and their component parts and fittings; machines for mainte...