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2025
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Invention
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Bias supply with resonant switching.
Embodiments of the invention includes various power supplie... |
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Invention
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Nanosecond pulser rf isolation for plasma systems.
Embodiments of the invention include a plasma... |
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Invention
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Variable output impedance rf generator.
Various RF plasma systems are disclosed that do not requ... |
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2024
|
Invention
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Pulsed voltage source for plasma processing applications.
Embodiments provided herein generally ... |
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Invention
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Ion current droop compensation. A pulse generator is disclosed. The pulse generator includes a DC... |
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Invention
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Efficient energy recovery in a nanosecond pulser circuit.
Some embodiments include a nanosecond ... |
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2023
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Invention
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Nanosecond pulser adc system. A nanosecond pulser system is disclosed. In some embodiments, the n... |
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Invention
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High voltage plasma control. A high voltage pulsing power system is disclosed that include a DC p... |
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Invention
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Wafer biasing in a plasma chamber.
Some embodiments include methods and systems for wafer biasin... |
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Invention
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Variable output impedance rf generator. Various RF plasma systems are disclosed that do not requi... |
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Invention
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Apparatus and method of generating a waveform.
Some embodiments include a high voltage waveform ... |
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P/S
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Plasma generators for semi-conductor processing Power supplies, high voltage power supplies, high... |
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2022
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Invention
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High voltage pulse generator for high-energy beam kickers. A high voltage inductive adder is disc... |
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Invention
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High frequency rf generator and dc pulsing.
A nanosecond pulser system is disclosed. In some emb... |
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Invention
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Bipolar high voltage pulser. A bipolar high voltage bipolar pulsing power supply is disclosed tha... |
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Invention
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Ion current droop compensation. In some embodiments, a high voltage power supply is disclosed tha... |
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Invention
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Apparatus and method of generating a waveform. Some embodiments include a high voltage waveform g... |
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Invention
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Efficient energy recovery in a nanosecond pulser circuit. Some embodiments include a nanosecond p... |
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2021
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Invention
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High voltage nanosecond pulser. A nanosecond pulser may include a plurality of switch modules, a ... |
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Invention
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Nonlinear transmission line high voltage pulse sharpening with energy recovery. Some embodiments ... |
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Invention
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Wafer biasing in a plasma chamber. Some embodiments include methods and systems for wafer biasing... |
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Invention
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Spatially variable wafer bias power system. A plasma deposition system comprising a wafer platfor... |
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Invention
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High frequency rf generator and dc pulsing. A nanosecond pulser system is disclosed. In some embo... |
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Invention
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Precise plasma control system. Some embodiments include a pulsing power supply comprising a power... |
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Invention
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Nanosecond pulser thermal management. Some embodiments include a thermal management system for a ... |
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Invention
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Nanosecond pulser rf isolation for plasma systems. Embodiments of the invention include a plasma ... |
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Invention
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Nanosecond pulser pulse generation. Some embodiments include a high voltage pulsing power supply.... |
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2020
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Invention
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Nanosecond pulser bias compensation with correction. Some embodiments include a high voltage puls... |
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|
Invention
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Efficient nanosecond pulser with source and sink capability for plasma control applications. Some... |
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Invention
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Precise plasma control system. Some embodiments include a plasma system comprising: a plasma cham... |
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Invention
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Nanosecond pulser rf isolation.
Some embodiments include a plasma system that includes a plasma ... |
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Invention
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Nanosecond pulser rf isolation. Some embodiments include a plasma system that includes a plasma c... |
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Invention
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Klystron driver. Some embodiments include a resonant converter klystron driver. A resonant conver... |
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2019
|
Invention
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Nanosecond pulser bias compensation. A high voltage power system is disclosed. In some embodiment... |
