Abrégé

A plasma supply device 10A according to the present invention comprises: a first electrode that includes a cylindrical part 12 and a columnar plug part 11 which is inserted from an end part of the cylindrical part 12 on one side; a first insulating part 13A that surrounds an outer circumferential surface 12b of an end part of the cylindrical part 12 on the other side; a second insulating part 14 that surrounds the outer circumferential surface of a portion other than the end part of the cylindrical part 12 on the other side; and an exterior part 15, as a second electrode, that surrounds the first insulating part 13A and the second insulating part 14. The cylindrical part 12 is longer than the columnar plug part 11. Moreover, the value calculated by the expression "L/Φ1", where Φ1 is the inner diameter of a portion of the space within the cylindrical part 12 not occupied by the columnar plug 11, and L is the length of said portion, is 4 or less. According to the present invention, it is possible to prevent electrode wear at a low cost.

Classes IPC  ?

• H05H 1/30 - Torches à plasma utilisant des champs électromagnétiques appliqués, p. ex. de l'énergie à haute fréquence ou sous forme de micro-ondes

Abrégé

[Problem] To provide a vacuum evacuation device having excellent characteristics related to cleaning of deposits. [Solution] The vacuum evacuation device comprises: a pressure vessel 100B; a rotor lower-cylinder part 103b rotatably held in the pressure vessel 100B; and a screw stator 131 disposed to face the rotor lower-cylinder part 103b in the pressure vessel 100B with an outer discharge gap part 264 interposed therebetween. A voltage can be applied to the screw stator 131. Projected parts 131b that are continuous at a prescribed angle in the circumferential direction are disposed at at least a part of the surface where the screw stator 131 and the rotor lower-cylinder part 103b face each other, thereby a drag pump part is constituted. The projected parts 131b are each formed into a tapered shape narrowing to the tip side thereof.

Classes IPC  ?

• F04D 19/04 - Pompes multiétagées spécialement adaptées pour réaliser un vide poussé, p. ex. pompes moléculaires

Abrégé

[Problem] To provide a vacuum evacuation device that is low-cost and excellent in cleaning effect. [Solution] This vacuum evacuation device includes a plasma generation device 210. The plasma generation device 210 is configured to, for example, include: a plasma generation chamber 230 formed in a cathode electrode part 216; a fuel gas supply port part 214 arranged in an annular flow passage; a second insulation part 220 arranged in the plasma generation chamber 230; a connector 222 arranged in the plasma generation chamber 230; and a first insulation part 218 for electrically insulating the plasma generation chamber 230. Radicals can be supplied from the second insulation part 220 to an inside of a case composed of an outer cylinder and the like.

Classes IPC  ?

• F04D 19/04 - Pompes multiétagées spécialement adaptées pour réaliser un vide poussé, p. ex. pompes moléculaires
• H05H 1/24 - Production du plasma

Abrégé

b of the second line and ground. The capacity variable portion comprises a diode 7 connected between the other end of the second line and ground, a capacitor 8 connected in series to the diode between the other end of the second line and the diode, a variable DC power supply 11 connected between ground and a connection point 9 between the capacitor and the diode so as to apply reverse bias voltage to the diode, and a resistor 10 connected in series to the variable DC power supply between the connection point and ground.

Classes IPC  ?

• H03H 7/38 - Réseaux d'adaptation d'impédance
• H01P 5/18 - Dispositifs à accès conjugués, c.-à-d. dispositifs présentant au moins un accès découplé d'un autre accès consistant en deux guides couplés, p. ex. coupleurs directionnels

Abrégé

This coaxial microwave plasma torch comprises: a body 1 having a coaxial structure comprising an inside discharge antenna 2 and an outside opposite electrode 3; a microwave input unit 4 that is provided on the base end side of the discharge antenna in the body; a plasma generation unit 6 that is provided on the end 2a side of the discharge antenna in the body and is in communication with a plasma exit 5; and a gas supply unit 7 that supplies a gas to the plasma generation unit. The end of the discharge antenna is formed in a hemispherical shape, and a portion of the opposite electrode facing the end of the discharge antenna is formed in a taper shape toward the plasma exit.

Classes IPC  ?

• H05H 1/30 - Torches à plasma utilisant des champs électromagnétiques appliqués, p. ex. de l'énergie à haute fréquence ou sous forme de micro-ondes

Abrégé

This coaxial microwave plasma torch comprises: a body 1 having a coaxial structure composed of a discharge antenna 2 and a counter electrode 3; a microwave input unit 4 provided to the discharge antenna base end side of the body; a plasma generation unit 6 provided to the discharge antenna tip 2a side of the body and in communication with a plasma outlet 5; a gas supply unit 7 that supplies a gas to the plasma generation unit; and an ignition mechanism 11 for plasma ignition. The ignition mechanism is provided with: a dielectric ignition pipe which has one end connected to the body to be opened to an inner space of the coaxial structure, and in which the opening at the one end is directed to the tip of the discharge antenna; an ignition gas supply unit connected to the other end of the ignition gas pipe; a pair of electrodes 14a, 14b provided on the outside of the ignition gas pipe; and a power supply unit 15 connected to the electrodes. The ignition mechanism is provided to the upstream side of a flow of the gas relative to the plasma generation unit.

Classes IPC  ?

• H05H 1/30 - Torches à plasma utilisant des champs électromagnétiques appliqués, p. ex. de l'énergie à haute fréquence ou sous forme de micro-ondes

Abrégé

Provided is a high frequency power source allowing the user to arbitrarily set a temporal change pattern for the value of high frequency power to be outputted. A high frequency power source 10A according to the present invention includes an output portion 20 configured to output high frequency power to a load 40 via an impedance matching circuit 30, a data storage portion 13A configured to store command data created by a user, and a control portion 12A configured to control the output portion 20 and the impedance matching circuit 30 on the basis of the command data stored in the data storage portion 13A. Each of a plurality of records that constitute the command data includes power command data about a value of high frequency power to be outputted and matching operation command data about whether to activate the impedance matching circuit 30, and the control portion sends a power signal, which is generated on the basis of the power command data, to the output portion and a synchronization signal, which is generated on the basis of the matching operation command data, to the impedance matching circuit.

Classes IPC  ?

• H01J 37/32 - Tubes à décharge en atmosphère gazeuse
• H05H 1/46 - Production du plasma utilisant des champs électromagnétiques appliqués, p. ex. de l'énergie à haute fréquence ou sous forme de micro-ondes

Abrégé

Provided is an impedance matching device capable of promptly improving an impedance mismatch between a high-frequency power source and a load even when the impedance of the load continuously changes. An impedance matching device according to the present invention is for use in a high-frequency power system configured to supply a load with an output from a high-frequency power source via a matching circuit whose constant is mechanically changed, and the impedance matching device includes a matching condition value acquisition portion for acquiring a matching condition value indicating a matching condition between the high-frequency power source and a load, and a control portion for controlling an oscillation frequency of the high-frequency power source based on the matching condition value. When the matching condition value indicates deterioration of the matching condition, the control portion changes the oscillation frequency with a first slope toward improving the matching condition, and thereafter shifts the oscillation frequency back to an original value with a second slope more gradual than the first slope.

Classes IPC  ?

• H01J 37/32 - Tubes à décharge en atmosphère gazeuse
• H03H 7/38 - Réseaux d'adaptation d'impédance

Abrégé

b made of non-magnetic metal meshes are arranged concentrically to the resonator body and in nested manner in the cavity at a distance from both the interior surface of the side wall and the reaction tube.

Classes IPC  ?

• H05H 1/46 - Production du plasma utilisant des champs électromagnétiques appliqués, p. ex. de l'énergie à haute fréquence ou sous forme de micro-ondes
• H01J 37/32 - Tubes à décharge en atmosphère gazeuse
• H01P 7/06 - Résonateurs à cavité

Abrégé

Provided is a cavity resonator, comprising a conductive resonator main body (1), comprising an inner cavity (5) which is configured from a lateral wall (2) having a rectangular cross-section and an upper wall (3) and a lower wall (4) which respectively close an upper end aperture and a lower end aperture of the lateral wall (2). A microwave supply port (6) is disposed in the lateral wall, and a waveguide pipe (7) is connected to the microwave supply port via an inductivity window (13). Reaction pipe attachment ports (3a, 4a) are respectively disposed upon the upper wall and the lower wall. A reaction pipe (8) is attached to the reaction pipe attachment ports, connecting the top and bottom of the cavity, and extending at an intersection to the axis of the waveguide pipe. Rectangular tube parts (10a-10c) which are formed from a non-magnetic metal mesh are positioned nested along the same axis as the resonator main body (1) in locations spaced from the inner face of the lateral wall of the cavity interior and from the reaction pipe.

Classes IPC  ?

• H01P 7/06 - Résonateurs à cavité
• C23C 16/511 - Revêtement chimique par décomposition de composés gazeux, ne laissant pas de produits de réaction du matériau de la surface dans le revêtement, c.-à-d. procédés de dépôt chimique en phase vapeur [CVD] caractérisé par le procédé de revêtement au moyen de décharges électriques utilisant des décharges à micro-ondes
• H01L 21/3065 - Gravure par plasmaGravure au moyen d'ions réactifs
• H05H 1/46 - Production du plasma utilisant des champs électromagnétiques appliqués, p. ex. de l'énergie à haute fréquence ou sous forme de micro-ondes

Abrégé

A plasma processing system comprises a reaction pipe line (4) extending in the vertical direction, a pair of discharge electrodes (5, 6) arranged at an interval so that the inner space of the reaction pipe line is interposed therebetween, a power supply (13) for applying a voltage to the pair of discharge electrodes, water supply means (9, 18) for supplying water (W) from above the reaction pipe line along the inner wall surface thereof and discharging the water from an opening (2) at the lower end of the reaction pipe line, a gas-to-be-processed supply means (8) for supplying a gas (G) to be processed into the reaction pipe line and passing the gas through the reaction pipe line, electrolyte solution supply means (11, 11a) for supplying an electrolyte solution into the reaction pipe line from above, and a control means (14) for controlling the power supply and the electrolyte solution supply means to form a current path between the pair of discharge electrodes by supplying the electrolyte solution from the electrolyte solution supply means and to interrupt the current path by stopping electrolyte solution supply from the electrolyte solution supply means, thereby inducing discharge. In the vicinity of the inflow portion of the gas to be processed in the reaction pipe line, a narrowed portion (15) and an expanded portion (16) continuous to the underside thereof are provided.

Classes IPC  ?

• B01J 19/08 - Procédés utilisant l'application directe de l'énergie ondulatoire ou électrique, ou un rayonnement particulaireAppareils à cet usage
• B01D 53/70 - Composés halogénés organiques

Abrégé

A microwave line plasma generation system in which a uniform plasma density can be attained in the plasma processing region. The microwave line plasma generation system comprises a waveguide (1), first and second microwave generation sources (2, 3), a first microwave transmission path (4) connected between the first microwave generation source and the opening on one end side of the waveguide and supplying a microwave into the waveguide, a second microwave transmission path (5) connected between the second microwave generation source and the opening on the other end side of the waveguide and supplying a microwave into the waveguide, transmission path length adjusting means (10, 11) respectively provided in the way of the first and second microwave transmission paths in order to adjust the transmission path length of the microwave transmission path, gas sources (12, 13), and a plasma generation means (16). The plasma generation means (16) has a plasma generation chamber extending in the propagating direction of microwave in the waveguide, and a plasma discharge opening for discharging a plasma generated in the plasma generation chamber in the shape of a line.

Classes IPC  ?

• H05H 1/46 - Production du plasma utilisant des champs électromagnétiques appliqués, p. ex. de l'énergie à haute fréquence ou sous forme de micro-ondes
• H05H 1/24 - Production du plasma

Abrégé

A coaxial microwave plasma torch, comprising, an outside conductor (1) formed in a cylindrical shape, a cylindrical electric discharge tube (3) fixedly inserted into an axial hole (2) formed in the outside conductor on one end face (4) side, and a coaxial cable (6) having one end fitted to the other end face of the outside conductor. An antenna (9) electrically connected to an inside conductor (8) is fitted to the one end of the coaxial cable and extended into the electric discharge tube through a through-hole (11) axially passed through between the other end face (5) of the outside conductor and the bottom face of the axial hole. The outside conductor (7) of the coaxial cable is electrically connected to the outside conductor, and a gas inlet pipeline (13) supplying a gas into the electric discharge tube is fitted in the outside conductor.

Classes IPC  ?

• B23K 9/02 - Soudage de joints continusSupportsPièces rapportées
• H05B 31/26 - Action sur la forme de la décharge par des dispositifs de soufflage de gaz

Abrégé

A coaxial microwave plasma torch, comprising, an outside conductor (1)
formed in a cylindrical shape, a cylindrical electric discharge tube (3)
fixedly inserted
into an axial hole (2) formed in the outside conductor on one end face (4)
side, and a
coaxial cable (6) having one end fitted to the other end face of the outside
conductor.
An antenna (9) electrically connected to an inside conductor (8) is fitted to
the one end
of the coaxial cable and extended into the electric discharge tube through a
through-hole
(11) axially passed through between the other end face (5) of the outside
conductor and
the bottom face of the axial hole. The outside conductor (7) of the coaxial
cable is
electrically connected to the outside conductor, and a gas inlet pipeline (13)
supplying a
gas into the electric discharge tube is fitted in the outside conductor.

Classes IPC  ?

• H05H 1/30 - Torches à plasma utilisant des champs électromagnétiques appliqués, p. ex. de l'énergie à haute fréquence ou sous forme de micro-ondes