A radio-frequency (RF) generator arrangement includes a combiner that includes an RF plug socket and an RF generator including a plug that matches the RF plug socket. The RF plug socket includes an opening for receiving the plug, an external contact for connection to an earth connection, an internal contact for connection to an RF signal, and an opening-narrowing device configured to reduce the opening so that the opening assumes a reduced-opening state when the plug is removed. In the reduced-opening state, an opening distance of the opening is reduced compared to a first opening distance, and/or an opening cross section of the opening is reduced compared to a first opening cross section. The opening-narrowing device includes an electrically conductive barrier connected to the external contact and configured to prevent electromagnetic radiation of the RF signal emitted from the internal contact from exiting from the opening in the reduced-opening state.
H01P 5/18 - Dispositifs à accès conjugués, c.-à-d. dispositifs présentant au moins un accès découplé d'un autre accès consistant en deux guides couplés, p. ex. coupleurs directionnels
H01R 24/40 - Dispositifs de couplage en deux pièces, ou l'une des pièces qui coopèrent dans ces dispositifs, caractérisés par leur structure générale ayant des contacts disposés concentriquement ou coaxialement spécialement adaptés à la haute fréquence
H05H 7/02 - Circuits ou systèmes d'alimentation en énergie haute fréquence
PLASMA STATE MONITORING DEVICE FOR CONNECTING TO AN IMPEDANCE MATCHING CIRCUIT FOR A PLASMA GENERATION SYSTEM, PLASMA GENERATION SYSTEM, AND METHOD FOR MONITORING THE PLASMA GENERATION SYSTEM
A plasma state monitoring device for connecting to an impedance matching circuit for a plasma generation system is configured to capture a first group of time-varying measured values recorded in a temporally sequential manner, capture a second group of time-varying measured values of at least one measured variable comprising at least one of a voltage, a current, or a phase relationship between the voltage and the current recorded in a temporally sequential manner, represent the first group of time-varying measured values in a first diagram, and represent the second group of time-varying measured values in a second diagram. The second diagram has two axes, one of which is a time axis. The first group of time-varying measured values and the second group of time-varying measured values have been captured within an at least partially identical time period, thereby enabling a state monitoring of the plasma generation system.
A method includes providing a first power from an output terminal of a balanced amplifier to a discharge chamber. The balanced amplifier includes two amplifier paths, each of which supplies a signal to a coupler. The coupler is configured to combine the signals as a function of their phase relationship and supply a power as the first power to the output terminal and/or as a second power to an isolation terminal. The method further includes setting a first phase relationship between the signals for a predefined time in order to ignite the plasma, and setting a second phase relationship in order to maintain the plasma. Under the second phase relationship, substantially an entirety of the power is supplied to the output terminal. Under the first phase relationship, a third power reflected from the discharge chamber is reflected back to the discharge chamber in a proportion large enough for the ignition.
A control device for actuating an impedance matching circuit for a plasma generation system having an input terminal and an output terminal for connection between an RF generator and a load is provided. The control device is configured to use a predeterminable operating frequency of the RF generator, a predetermined target power of the RF generator, and model parameters of the RF generator to determine a target impedance value for the input terminal of the impedance matching circuit. The target impedance value has a value different to a nominal impedance in order to increase a characteristic operating value of the RF generator for the predeterminable operating frequency and the predeterminable target power.
A method for igniting and supplying a laser or a processing plasma in a discharge chamber with electrical power includes providing a power from an output terminal of an amplifier to the discharge chamber. The amplifier includes two amplifier paths, each of which supplies a respective signal to a combiner. The combiner is configured to combine the signals as a function of an amplitude relationship and/or a phase relationship between the signals and to supply the power to the output terminal and/or an isolation terminal. The method further includes actuating an impedance switching arrangement connected to the isolation terminal and a ground according to a first actuation mode in order to ignite the laser or the processing plasma, and actuating the impedance switching arrangement according to a second actuation mode in order to operate the laser or maintain the processing plasma in the discharge chamber.
A method for igniting and/or maintaining a plasma process using a pulsed high-frequency signal includes generating the pulsed high-frequency signal, changing a frequency of the high-frequency signal according to a frequency sweep and/or changing an amplitude of the high-frequency signal according to a power sweep during a predetermined first time interval within a pulse, monitoring at least one process parameter of the plasma process, determining a relationship of the at least one process parameter to the frequency sweep or the power sweep, and detecting whether the at least one process parameter having the relationship to the frequency sweep or the power sweep has assumed a predetermined value or is in a predetermined value range.
A method for operating a heavy-duty component includes determining a first quantity of heat created by the heavy-duty component, determining a second quantity of heat that is capable of being dissipated by a volume flow of a coolant, determining a difference between the first and second quantities of heat, and based on the difference, at a first operating point at which the second quantity of heat is greater than the first quantity of heat, reducing the volume flow, at a second operating point at which the second quantity of heat is less than the first quantity of heat, increasing the volume flow, and at a third operating point at which a third quantity of heat that is capable of being dissipated by a maximum volume flow of the coolant is less than or equal to the first quantity of heat, reducing the first quantity of heat that is created.
A plasma ignition detection device for connecting to an impedance matching circuit for a plasma generation system is configured to process first time-variant measured values from a first predetermined location of the impedance matching circuit. An applied first reactive and/or active power is capable of being determined from the first time-variant measured values. The plasma ignition detection device is further configured to process second time-variant values associated with a second location of the impedance matching circuit, the second location being different to the first predetermined location. An applied second reactive and/or active power is capable of being determined from the second time-variant values. The plasma ignition detection device is further configured to determine a first time-variant variable from the first time-variant measured values, determine a second time-variant variable from the second time-variant values, and generate an output signal describing a plasma state, depending on the first and second time-variant variables.
A fuse tripping acceleration arrangement for being arranged between a bidirectional voltage transformer of a current transformer device and an energy store having at least one electrochemical energy converter is provided. The fuse tripping acceleration arrangement includes two energy-store-side connections, two current-transformer-side connections, at least one fuse connected between one of the two energy-store-side connections and one of the two current-transformer-side connections, and an energy storage device with a predetermined internal resistance. The energy storage device is electrically connected in parallel with the two energy-store-side connections.
A power supply arrangement for a plurality of plasma generators includes a power input connection, a data connection, and an AC generator stage configured to convert a power from the power input connection into an AC power. The power supply arrangement is configured to ensure that the AC power is supplied to a first load as a first AC power and to a second load spatially remote from the first load as a second AC power, not simultaneously. The power supply arrangement is controllable in such a way that the first AC power and the second AC power have different characteristics in one or more of output current, output voltage, output frequency, output power, or output profile of current and/or voltage, and is configured to output a drive signal for an impedance matching apparatus assigned to one of the first AC power and the second AC power.
A method for heating a medium includes generating a first radio-frequency (RF) feed signal having a first operating frequency, incoupling the first RF feed signal into the medium so as to heat the medium, determining a first RF signal reflection, and changing the first operating frequency based on the first RF signal reflection. During a first test interval, the first operating frequency is increased. During a second test interval, the first operating frequency is reduced. The method further includes determining a second RF signal during the first test interval, determining a third RF signal reflection during the second test interval, after the second test interval has elapsed, generating a second RF feed signal with a second operating frequency, and incoupling the second RF feed signal into the medium. The second operating frequency is selected based on the first, the second, and the third RF signal reflections.
A plasma power supply system for a plasma processing system is provided. The plasma processing system includes a first plasma source and a second plasma source in adjacent sections of a plasma chamber. The plasma processing system is configured in such a way that in different sections different materials are deposited. A substrate is processed by a plasma in the plasma chamber. The power supply system includes a first power supply configured to supply a first AC power to the first plasma source, a second power supply configured to supply a second AC power to the second plasma source, a first sensor for monitoring a plasma process parameter of the first plasma source, a control unit configured to determine a first operating data related to the plasma process parameter, and control the second power supply based on the first operating data in order to decrease crazing on the substrate.
A control circuit for at least two drivers is provided. Each of the two drivers is configured to switch on and off electrically driven switching elements that are electrically connected to each other. The control circuit includes a first parallel-to-serial-converter including a first parallel input port and a first serial output-port connectable to a first driver, a second parallel-to-serial-converter including a second parallel input port and a second serial output-port connectable to a second driver, and a processor unit configured to send a first data package stream to the first parallel input port, and send a second data package stream to the second parallel input port. Both the first data package stream and the second data package stream are configured to be converted to serial-data-streams at the first serial output-port and the second serial output-port, respectively. The serial data-streams are configured to control the at least two drivers.
H05H 1/46 - Production du plasma utilisant des champs électromagnétiques appliqués, p. ex. de l'énergie à haute fréquence ou sous forme de micro-ondes
H03K 17/687 - Commutation ou ouverture de porte électronique, c.-à-d. par d'autres moyens que la fermeture et l'ouverture de contacts caractérisée par l'utilisation de composants spécifiés par l'utilisation, comme éléments actifs, de dispositifs à semi-conducteurs les dispositifs étant des transistors à effet de champ
14.
Method for establishing a supply voltage and inverter
A method for building up a mains voltage by using a plurality of independently controlled virtual synchronous machine (VISMA) power inverters includes supplying each VISMA power inverter with power, starting a VISMA control in each VISMA power inverter by specifying a target mains voltage to a control model of the plurality of VISMA power inverters for generating a virtual target mains voltage in each VISMA power inverter, transferring a synchronization event to all of the plurality of VISMA power inverters for phase matching of the virtual target mains voltages of the plurality of VISMA power inverters with respect to one another, building up an output AC voltage with a matched phase position depending on the target mains voltage and the synchronization event in each VISMA power inverter, and simultaneously building up of the mains voltage by all of the plurality of VISMA power inverters using the output AC voltages.
H02J 3/40 - Synchronisation d'un générateur pour sa connexion à un réseau ou à un autre générateur
H02J 3/10 - Systèmes d'alimentation en courant constant
H02J 3/38 - Dispositions pour l’alimentation en parallèle d’un seul réseau, par plusieurs générateurs, convertisseurs ou transformateurs
H02J 3/48 - Dispositions pour l’alimentation en parallèle d’un seul réseau, par plusieurs générateurs, convertisseurs ou transformateurs contrôlant la répartition de puissance entre les générateurs, convertisseurs ou transformateurs contrôlant la répartition de la composante en phase
15.
SIGNAL PROCESSING SYSTEM AND POWER SUPPLY DEVICE HAVING A SIGNAL PROCESSING SYSTEM
A signal processing system includes an acquisition device configured to acquire a repeating signal trace in a specified time interval. The signal trace varies as a function of a plasma process state of a plasma process. The signal processing system further includes a determining device configured to generate a data stream describing the plasma process, based on at least two signal traces acquired in one time interval each. The data stream contains a continuously determined stability indicator for the plasma process.
A method for impedance matching using an impedance matching network is provided. The impedance matching network includes an input, an output, and at least two matching stages connected in series, each matching stage having a respective variable reactance. The method includes a) measuring an input impedance at the input, b) determining an intermediate impedance occurring between the two matching stages from the input impedance and at least one present state value of at least one of two matching stages, c) determining an alteration target value for at least one of the variable reactances of the two matching stages from the intermediate impedance and a model of the impedance matching network, d) altering a state of at least one of the two matching stages based on the alteration target value, and e) repeating steps a) to d).
A power supply device for generating an electrical high frequency (HF) power signal for a plasma includes a power generator and an impedance matching arrangement connected to the power generator. The power supply device is configured to determine an impedance variable at an input of the impedance matching arrangement or at an output of the power generator, determine an impedance-based quality index in a predefined time period, and output the impedance-based quality index.
A switchable reactance unit includes an RF terminal configured to connect to a transmission line for transmitting a signal at a frequency in a range of 1 - 200 MHz, and a switching arrangement comprising a plurality of switching elements used in parallel. Each switching element has a control terminal, and is connected to the RF terminal via at least one individual reactance assigned to the switching element and connected in series with the switching element. The switching elements are controllable or controlled via their control terminals in such a way that they switch simultaneously.
An impedance matching circuit includes a radiofrequency terminal and a series circuit connected to the radiofrequency terminal, wherein the series circuit comprises at least one reactance and at least one switching element having a drive input. A drive circuit is connected to the drive input and a coupler is connected to the drive circuit so as to an enable signal input. The impedance matching circuit enables short switching times and low losses in the at least one switching element.
A radio-frequency high-voltage waveguide device including an electrical conductor configured for operation with a radio frequency and a high voltage relative to a gaseous environment and/or a ground body, an electrically conductive contact unit that is in contact with the conductor at at least one point, the contact unit being arranged on an electrically insulating mount, and an electrically conductive field distribution assembly arranged on the electrically conductive contact unit, the assembly being electrically conductively connected to the contact unit and arranged at least partly in an inside of the mount.
Power supply devices for generating at least one electric high-frequency power signal for a plasma having at least a first plasma state and a second plasma state are provided. The power supply devices are configured to determine a first variable that characterizes a power reflected by the plasma in the first plasma state, determine a second variable that characterizes a power reflected by the plasma in the second plasma state, generate a third variable based on the first variable and the second variable, and control at least one of a frequency or a power of the high-frequency power signal based on the third variable.
A cooling device for cooling at least one electronic component, as well as an electronic assembly with a cooling device and an electronic component. The cooling device has at least one cooling body through which a cooling medium flows. The cooling device further includes a cooling plate defining a through recess in which the cooling body is arranged at least in part. A through recess is particularly easy to produce, so that the complete cooling device can be manufactured very cost effectively. At least one cooling pipe in direct contact with the cooling plate and/or the electronic component to be cooled transports cooling medium from and to the cooling body, so that the cooling device can effectively absorb heat generated at the electronic component.
A power supply system includes a power converter configured to generate a high-frequency power signal and be connected to a load to supply a plasma process or gas laser process with power. The power converter includes at least one amplifier stage having first and second amplifier paths each having an amplifier. The first and second amplifier path are connected to a phase-shifting coupler unit that is configured to couple phase-shifted output signals from the first and second amplifier paths to form the high-frequency power signal. At least one amplifier of the first and second amplifier paths includes a field effect transistor implemented in a semiconductor device with a semiconductor structure having a substantially layered construction, and the semiconductor device includes a channel, a current flowing in the channel substantially in parallel with layers of the semiconductor structure.
H01J 37/32 - Tubes à décharge en atmosphère gazeuse
H01L 29/78 - Transistors à effet de champ l'effet de champ étant produit par une porte isolée
H01L 29/417 - Electrodes caractérisées par leur forme, leurs dimensions relatives ou leur disposition relative transportant le courant à redresser, à amplifier ou à commuter
A power supply system includes a digital-to-analogue converter (DAC) configured to generate an analogue signal and an amplifier path on which the analogue signal is amplified to generate a high-frequency power signal to be provided to a plasma chamber for supplying a plasma process with high-frequency power. The DAC is configured to be connected to an arc detection device that is configured to monitor the plasma chamber for arcs and be controlled by the arc detection device to modify the analogue signal in response to detecting an occurrence of an arc.
Methods and systems for impedance matching between loads and power generators are provided. The methods include: supplying a power generated by a power generator to a load by an impedance matching system that includes at least one reactance adjustable by at least one actuator and is configured to transform the load impedance at an input end of the load into a transformed load impedance at an input end of the impedance matching system, determining a power reflected at the load or at least one variable associated with the reflected power, determining, based on the reflected power or the at least one variable, that there is a mismatch, determining a trajectory in a complex load plane according to at least one specified criterion, and controlling the at least one actuator such that the transformed load impedance follows the trajectory to match an output impedance of the power generator.
A power supply system comprises an amplifier stage that includes at least one transistor, for example an LDMOS transistor. The transistor is connected to a supply voltage via a power connection, and is controlled by a control voltage at the control connection of the transistor. In some implementations, a first controller is provided for adjusting the control voltage of the transistor, and a second controller is provided for adjusting the supply voltage. In some implementations, one of the controllers is designed to feed a state signal to the other controller, and the other controller is designed to evaluate the state signal.
H03F 1/02 - Modifications des amplificateurs pour augmenter leur rendement, p. ex. étages classe A à pente glissante, utilisation d'une oscillation auxiliaire
H01J 37/32 - Tubes à décharge en atmosphère gazeuse
H03F 3/193 - Amplificateurs à haute fréquence, p. ex. amplificateurs radiofréquence comportant uniquement des dispositifs à semi-conducteurs comportant des dispositifs à effet de champ
H03F 3/20 - Amplificateurs de puissance, p. ex. amplificateurs de classe B, amplificateur de classe C
H03F 3/345 - Amplificateurs de courant continu dans lesquels tous les étages sont couplés en courant continu comportant uniquement des dispositifs à semi-conducteurs comportant des dispositifs à effet de champ
A non-linear high-frequency amplifier arrangement suitable for generating power outputs ≥1 kW at frequencies of ≥1 MHz for plasma excitation is provided. The arrangement includes two LDMOS transistors each connected by their source connection to aground connection point, where the LDMOS transistors have the same design and are arranged in an assembly, a power transformer whose primary winding is connected to drain connections of the LDMOS transistors, a signal transformer whose secondary winding is connected by a first end to a gate connection of one LDMOS transistor and by a second end to a gate connection of the other LDMOS transistor, and a feedback path from the drain connection to the gate connection of each of the LDMOS transistors.
H03F 1/52 - Circuits pour la protection de ces amplificateurs
H01J 37/32 - Tubes à décharge en atmosphère gazeuse
H03F 3/30 - Amplificateurs push-pull à sortie uniqueDéphaseurs pour ceux-ci
H03F 3/193 - Amplificateurs à haute fréquence, p. ex. amplificateurs radiofréquence comportant uniquement des dispositifs à semi-conducteurs comportant des dispositifs à effet de champ
H03F 3/217 - Amplificateurs de puissance de classe DAmplificateurs à commutation
H01L 27/06 - Dispositifs consistant en une pluralité de composants semi-conducteurs ou d'autres composants à l'état solide formés dans ou sur un substrat commun comprenant des éléments de circuit passif intégrés avec au moins une barrière de potentiel ou une barrière de surface le substrat étant un corps semi-conducteur comprenant une pluralité de composants individuels dans une configuration non répétitive
H01L 29/78 - Transistors à effet de champ l'effet de champ étant produit par une porte isolée
H03F 3/195 - Amplificateurs à haute fréquence, p. ex. amplificateurs radiofréquence comportant uniquement des dispositifs à semi-conducteurs dans des circuits intégrés
High-frequency amplifier apparatuses suitable for producing output powers of at least 1 kW at frequencies of at least 2 MHz for plasma excitation are disclosed. These high-frequency amplifiers include two transistors, the source or emitter connections of which are each connected to a ground connection point. The transistors can have an identical design and are arranged on a multilayer printed circuit board. The apparatus also includes a power transformer, the primary winding of which is connected to the drain or collector connections of the transistors. The primary winding and the secondary winding of the power transformer are each in the form of planar conductor tracks which are arranged in different upper layers of the multilayer printed circuit board.
H03F 1/00 - Détails des amplificateurs comportant comme éléments d'amplification uniquement des tubes à décharge, uniquement des dispositifs à semi-conducteurs ou uniquement des composants non spécifiés
H03F 1/30 - Modifications des amplificateurs pour réduire l'influence des variations de la température ou de la tension d'alimentation
H01J 37/32 - Tubes à décharge en atmosphère gazeuse
H03F 3/193 - Amplificateurs à haute fréquence, p. ex. amplificateurs radiofréquence comportant uniquement des dispositifs à semi-conducteurs comportant des dispositifs à effet de champ
H03F 3/30 - Amplificateurs push-pull à sortie uniqueDéphaseurs pour ceux-ci
H03F 1/56 - Modifications des impédances d'entrée ou de sortie, non prévues ailleurs
H03F 3/21 - Amplificateurs de puissance, p. ex. amplificateurs de classe B, amplificateur de classe C comportant uniquement des dispositifs à semi-conducteurs
H05K 1/16 - Circuits imprimés comprenant des composants électriques imprimés incorporés, p. ex. une résistance, un condensateur, une inductance imprimés
H05K 1/18 - Circuits imprimés associés structurellement à des composants électriques non imprimés
29.
Directional couplers and methods for tuning directional couplers
This disclosure relates to directional couplers and methods of tuning directional couplers formed in a printed circuit board. The directional couplers include a main line for transmitting power and at least one secondary line having a coupling portion arranged parallel and at a distance from the main line in a coupling region. The directional coupler includes one or more additional coupling lines that have a coupling portion that runs parallel to and at a distance from the coupling section of the at least one secondary line. The one or more additional coupling lines have a connection arranged on the outer portion of the printed circuit board for selective grounding or connection to an external connection.
H01P 5/18 - Dispositifs à accès conjugués, c.-à-d. dispositifs présentant au moins un accès découplé d'un autre accès consistant en deux guides couplés, p. ex. coupleurs directionnels
The invention relates to high-frequency amplifier apparatuses suitable for generating power outputs of at least 1 kW at frequencies of at least 2 MHz. The apparatuses include two LDMOS transistors each connected by their source connection to ground. The transistors can have the same design and can be arranged in an assembly (package). The apparatus also includes a circuit board lying flat against a metallic cooling plate and connected to the cooling plate, which can be connected to ground, and the assembly is arranged on or against the circuit board. The apparatuses have a power transformer, whose primary winding is connected to the drain connections of the transistors, and a signal transmitter. A secondary winding of the signal transmitter is connected to the gate connections of the two transistors. Each of the gate connections is connected to ground via at least one voltage-limiting structural element.
H01J 37/32 - Tubes à décharge en atmosphère gazeuse
H03F 3/193 - Amplificateurs à haute fréquence, p. ex. amplificateurs radiofréquence comportant uniquement des dispositifs à semi-conducteurs comportant des dispositifs à effet de champ
H03F 3/30 - Amplificateurs push-pull à sortie uniqueDéphaseurs pour ceux-ci
31.
Power combiner having a symmetrically arranged cooling body and power combiner arrangement
A power combiner for coupling, splitting, or coupling and splitting high-frequency signals, the power combiner has a first input for a first high-frequency signal, a second input for a second high-frequency signal, an output, an equalizing connection, a first electrical conductor arranged between the first input and the output, wherein the first electrical conductor has a first total surface shaped primarily as a first planar surface electrode, a second electrical conductor arranged between the second input and the equalizing connection, wherein the second electrical conductor has a second total surface shaped primarily as a second planar surface electrode, and wherein the second electrical conductor is capacitively and inductively coupled to the first electrical conductor; and a cooling body, wherein more than 70% of the first total surface of the first electrical conductor is a same distance from the cooling body as the second total surface of the second electrical conductor.
A power combiner in the form of a balanced LC combiner is provided. Inputs of the power combiner are isolated from one another via at least one RC matching element. The at least one RC matching element is dimensioned such that the connection between the inputs is at a stable potential during operation of the power combiner at at least one position. The power combiner can be formed in a planar design and have electrically conductive layers running parallel to one another. At least an inductor and a combiner capacitor are formed in the electrically conductive layers. A power combiner arrangement including the power combiner and high-frequency signal sources attached at least two inputs is also provided. The high-frequency signal sources can be in the form of frequency-agile transistor amplifiers.
H05K 1/18 - Circuits imprimés associés structurellement à des composants électriques non imprimés
H01P 5/16 - Dispositifs à accès conjugués, c.-à-d. dispositifs présentant au moins un accès découplé d'un autre accès
H03H 7/48 - Réseaux pour connecter plusieurs sources ou charges, fonctionnant sur la même fréquence ou dans la même bande de fréquence, à une charge ou à une source commune
H03H 1/00 - Détails de réalisation des réseaux d'impédances dont le mode de fonctionnement électrique n'est pas spécifié ou est applicable à plus d'un type de réseau
33.
Generating a plurality of clock signals or high-frequency signals
The invention relates to a device for generating a plurality of clock signals or high-frequency signals. The devices includes a reference signal generator, which is connected to an oscillator and generates at its output a reference signal with a reference frequency fx. The device also includes at least one signal processor, for example, a DDS, which is connected to the reference frequency generator via a first signal line and to which the reference signal with the reference frequency fx is supplied, and which is configured to generate an output signal having a frequency less than fx.
The invention relates to a redox flow battery system, comprising a controller and a battery inverter, which is suitable for charging and/or discharging a battery. The battery inverter comprises: a) a plurality of battery connections, to each of which at least one battery can be connected; b) a first measuring device, which is suitable for measuring the voltage at a battery connection and which is connected to the controller with regard to signaling; c) a second measuring device, which is suitable for measuring the current at a battery connection and which is connected to the controller with regard to signaling; d) a grid connection, which can be connected to an alternating-current supply grid; and e) a plurality of DC/DC converters, of which at least one has a first bridge circuit directly connected to a battery connection.
H02J 7/00 - Circuits pour la charge ou la dépolarisation des batteries ou pour alimenter des charges par des batteries
G01R 31/3842 - Dispositions pour la surveillance de variables des batteries ou des accumulateurs, p. ex. état de charge combinant des mesures de tension et de courant
H01M 8/18 - Éléments à combustible à régénération, p. ex. batteries à flux REDOX ou éléments à combustible secondaires
H02H 7/125 - Circuits de protection de sécurité spécialement adaptés aux machines ou aux appareils électriques de types particuliers ou pour la protection sectionnelle de systèmes de câble ou de ligne, et effectuant une commutation automatique dans le cas d'un changement indésirable des conditions normales de travail pour convertisseursCircuits de protection de sécurité spécialement adaptés aux machines ou aux appareils électriques de types particuliers ou pour la protection sectionnelle de systèmes de câble ou de ligne, et effectuant une commutation automatique dans le cas d'un changement indésirable des conditions normales de travail pour redresseurs pour convertisseurs ou redresseurs statiques pour redresseurs
H01M 10/46 - Accumulateurs combinés par structure avec un appareil de charge
H01M 16/00 - Combinaisons structurelles de différents types de générateurs électrochimiques
H02H 7/12 - Circuits de protection de sécurité spécialement adaptés aux machines ou aux appareils électriques de types particuliers ou pour la protection sectionnelle de systèmes de câble ou de ligne, et effectuant une commutation automatique dans le cas d'un changement indésirable des conditions normales de travail pour convertisseursCircuits de protection de sécurité spécialement adaptés aux machines ou aux appareils électriques de types particuliers ou pour la protection sectionnelle de systèmes de câble ou de ligne, et effectuant une commutation automatique dans le cas d'un changement indésirable des conditions normales de travail pour redresseurs pour convertisseurs ou redresseurs statiques
H02M 3/335 - Transformation d'une puissance d'entrée en courant continu en une puissance de sortie en courant continu avec transformation intermédiaire en courant alternatif par convertisseurs statiques utilisant des tubes à décharge avec électrode de commande ou des dispositifs à semi-conducteurs avec électrodes de commande pour produire le courant alternatif intermédiaire utilisant des dispositifs du type triode ou transistor exigeant l'application continue d'un signal de commande utilisant uniquement des dispositifs à semi-conducteurs
H02M 1/32 - Moyens pour protéger les convertisseurs autrement que par mise hors circuit automatique
H02M 3/158 - Transformation d'une puissance d'entrée en courant continu en une puissance de sortie en courant continu sans transformation intermédiaire en courant alternatif par convertisseurs statiques utilisant des tubes à décharge avec électrode de commande ou des dispositifs à semi-conducteurs avec électrode de commande utilisant des dispositifs du type triode ou transistor exigeant l'application continue d'un signal de commande utilisant uniquement des dispositifs à semi-conducteurs avec commande automatique de la tension ou du courant de sortie, p. ex. régulateurs à commutation comprenant plusieurs dispositifs à semi-conducteurs comme dispositifs de commande finale pour une charge unique
H02M 1/00 - Détails d'appareils pour transformation
35.
Redundant Power Supply System for a plasma process
A power supply system for a plasma process includes two separate power supplies of essentially identical performance characteristics, including a first power supply and a second power supply, and a data transfer connection operably coupling the two power supplies for data communication between the two power supplies. The first power supply is configured to: receive, in a standby mode, data via the data transfer connection from the second power supply supplying power to a plasma process in a normal operating mode, and supply, in an active backup mode, power to the plasma process in place of the second power supply, as a function of the received data. The first power supply can supply in the active backup mode to the plasma process the power having one or more characteristics that are substantially the same as those of the power provided by the second power supply in the normal operating mode.
H01J 37/32 - Tubes à décharge en atmosphère gazeuse
H02J 3/14 - Circuits pour réseaux principaux ou de distribution, à courant alternatif pour règler la tension dans des réseaux à courant alternatif par changement d'une caractéristique de la charge du réseau par interruption, ou mise en circuit, des charges du réseau, p. ex. charge équilibrée progressivement
H02J 9/06 - Circuits pour alimentation de puissance de secours ou de réserve, p. ex. pour éclairage de secours dans lesquels le système de distribution est déconnecté de la source normale et connecté à une source de réserve avec commutation automatique
H03F 3/217 - Amplificateurs de puissance de classe DAmplificateurs à commutation
An overvoltage limitation device, for an alternating current (AC) voltage generating system having an inverter circuit unit configured to supply power to a load with dynamic load impedance, includes: input connections for connection to the inverter circuit unit, output connections for connection to an intermediate circuit voltage unit connected to the inverter circuit unit, a rectifier including an alternating current connection and a direct current connection connected to the output connections, and an AC voltage converter including a primary side connected to the input connections and a secondary side connected to the alternating current connection. The overvoltage limitation device is configured such that, when peak values of an AC voltage exceed a first predetermined value at the input connections, power is transported from the input connections via the AC voltage converter and the rectifier to the output connections, and thus the AC voltage is limited to a second predetermined value.
H02M 7/48 - Transformation d'une puissance d'entrée en courant continu en une puissance de sortie en courant alternatif sans possibilité de réversibilité par convertisseurs statiques utilisant des tubes à décharge avec électrode de commande ou des dispositifs à semi-conducteurs avec électrode de commande
H02M 1/32 - Moyens pour protéger les convertisseurs autrement que par mise hors circuit automatique
H02M 7/00 - Transformation d'une puissance d'entrée en courant alternatif en une puissance de sortie en courant continuTransformation d'une puissance d'entrée en courant continu en une puissance de sortie en courant alternatif
H02M 7/06 - Transformation d'une puissance d'entrée en courant alternatif en une puissance de sortie en courant continu sans possibilité de réversibilité par convertisseurs statiques utilisant des tubes à décharge sans électrode de commande ou des dispositifs à semi-conducteurs sans éléctrode de commande
H02M 7/5387 - Transformation d'une puissance d'entrée en courant continu en une puissance de sortie en courant alternatif sans possibilité de réversibilité par convertisseurs statiques utilisant des tubes à décharge avec électrode de commande ou des dispositifs à semi-conducteurs avec électrode de commande utilisant des dispositifs du type triode ou transistor exigeant l'application continue d'un signal de commande utilisant uniquement des dispositifs à semi-conducteurs, p. ex. onduleurs à impulsions à un seul commutateur dans une configuration en pont
A method of maintaining a supply of power to a load comprising operating a power generator connected to a mains voltage in a rated operating mode, generating a power signal by the power generator, feeding the power signal to the load, monitoring the mains voltage or a variable derived therefrom for an occurrence of a first specified event, and operating the power generator in a first predefined operating mode based on the occurrence of the first specified event, wherein the first predefined operating mode differs from the rated operating mode.
H05H 1/46 - Production du plasma utilisant des champs électromagnétiques appliqués, p. ex. de l'énergie à haute fréquence ou sous forme de micro-ondes
H02J 9/06 - Circuits pour alimentation de puissance de secours ou de réserve, p. ex. pour éclairage de secours dans lesquels le système de distribution est déconnecté de la source normale et connecté à une source de réserve avec commutation automatique
38.
Control arrangement, control system and high frequency power generating device
Techniques are described for controlling the power and/or matching the impedance of the output impedance of a high frequency power generator to the impedance of a load, in particular a plasma discharge. A control arrangement may include a control unit, to which a target value, an actual value, and a correction value is supplied, the control unit being set up to generate an adjustment value by taking into account the correction value. The control arrangement may also include a device for determining the correction value, to which a control value is supplied and which is set up to determine the correction value by taking into account the control value and a default value. In some embodiments, when the control value deviates from the default value, the correction value influences the control unit such that the actual value deviates from the target value in the adjusted state of the control unit.
H03H 7/40 - Adaptation automatique de l'impédance de charge à l'impédance de la source
H05H 1/46 - Production du plasma utilisant des champs électromagnétiques appliqués, p. ex. de l'énergie à haute fréquence ou sous forme de micro-ondes
G05B 11/06 - Commandes automatiques électriques dans lesquelles le signal de sortie représente une fonction continue de l'écart par rapport à la valeur désirée, c.-à-d. commande continue
H01J 37/32 - Tubes à décharge en atmosphère gazeuse
39.
Electric power conversion device and method for charging and discharging energy storage devices
An electric power conversion device for charging and discharging energy storage devices having at least one bidirectional voltage converter which can be connected to a power supply network and to at least one electrochemical energy converter for an energy storage device that is configured as a flow battery and has a circulation arrangement for electrolytes. The electric power conversion device has a controller connected to the voltage converter and is designed to control the voltage converter with regard to the power flow direction thereof. The controller is designed to control one or more energy storage peripheral devices associated with the electrolytes depending on the power flow direction of the voltage converter specified by the controller. The controller has at least one control port for connection of at least one of these energy storage peripheral devices.
H01M 10/46 - Accumulateurs combinés par structure avec un appareil de charge
H02J 7/00 - Circuits pour la charge ou la dépolarisation des batteries ou pour alimenter des charges par des batteries
H01M 8/18 - Éléments à combustible à régénération, p. ex. batteries à flux REDOX ou éléments à combustible secondaires
H02J 3/32 - Dispositions pour l'équilibrage de charge dans un réseau par emmagasinage d'énergie utilisant des batteries avec moyens de conversion
H02J 7/34 - Fonctionnement en parallèle, dans des réseaux, de batteries avec d'autres sources à courant continu, p. ex. batterie tampon
H01M 8/04186 - Dispositions pour la commande des paramètres des réactifs, p. ex. de la pression ou de la concentration des réactifs chargés en liquide ou en électrolyte
H02M 3/24 - Transformation d'une puissance d'entrée en courant continu en une puissance de sortie en courant continu avec transformation intermédiaire en courant alternatif par convertisseurs statiques
40.
Energy storage system and method for increasing the efficiency of an energy storage system
An energy storage system including an energy store with a plurality of flow batteries, a first voltage converter, an intermediate circuit connected to the first voltage converter, a second voltage converter connected to the intermediate circuit and a first of the batteries, a third voltage converter connected to the intermediate circuit and a second of the batteries, and a controller connected to the first, second, and third voltage converters. The controller is configured to simultaneously control a power flow direction of the second voltage converter and a power flow direction of the third voltage converter such that the power flow direction of the second voltage controller is in an opposite direction of the power flow direction of the third voltage controller, to control a power flow direction of the first voltage controller, and to charge and discharge the batteries.
H02J 7/00 - Circuits pour la charge ou la dépolarisation des batteries ou pour alimenter des charges par des batteries
H02J 3/32 - Dispositions pour l'équilibrage de charge dans un réseau par emmagasinage d'énergie utilisant des batteries avec moyens de conversion
H02J 3/36 - Dispositions pour le transfert de puissance électrique entre réseaux à courant alternatif par l'intermédiaire de haute tension à courant continu
H02J 9/06 - Circuits pour alimentation de puissance de secours ou de réserve, p. ex. pour éclairage de secours dans lesquels le système de distribution est déconnecté de la source normale et connecté à une source de réserve avec commutation automatique
H02M 3/24 - Transformation d'une puissance d'entrée en courant continu en une puissance de sortie en courant continu avec transformation intermédiaire en courant alternatif par convertisseurs statiques
41.
Power supply systems and methods for generating power
A power supply system includes a power converter configured to generate a high-frequency power signal and connected to a load to supply a plasma process or a gas laser process with power. The power converter has at least one amplifier path including at least one amplifier, an analog signal generated from a digital signal by a digital-analog converter (DAC) being supplied to the amplifier path, and a logic circuit unit configured to generate the digital signal and connected upstream of the DAC. The logic circuit unit has a signal data memory for storing signal data values for generating an analog signal form, an amplitude data memory for storing amplitude data values for influencing amplitudes of the analog signals, and a multiplier for multiplying the signal data values by the amplitude data values. The power converter includes an adjustable voltage supply for supplying the amplifier with a voltage.
A power supply system includes a power converter configured to generate a high-frequency power signal and be connected to a load to supply a plasma process or gas laser process with power. The power converter includes at least one amplifier stage having first and second amplifier paths each having an amplifier. The first and second amplifier path are connected to a phase-shifting coupler unit that is configured to couple phase-shifted output signals from the first and second amplifier paths to form the high-frequency power signal. At least one amplifier of the first and second amplifier paths includes a field effect transistor implemented in a semiconductor device with a semiconductor structure having a substantially layered construction, and the semiconductor device includes a channel, a current flowing in the channel substantially in parallel with layers of the semiconductor structure.
H01J 37/32 - Tubes à décharge en atmosphère gazeuse
H01L 29/78 - Transistors à effet de champ l'effet de champ étant produit par une porte isolée
H01L 29/417 - Electrodes caractérisées par leur forme, leurs dimensions relatives ou leur disposition relative transportant le courant à redresser, à amplifier ou à commuter
Devices and methods for monitoring a discharge in a plasma process are provided. An example method includes detecting at least a first signal path of at least one plasma supply signal within at least a first time range within at least one period of the plasma supply signal, detecting at least a second signal path of the at least one plasma supply signal within at least a second time range which is at the point corresponding to the first time range in at least one other period of the plasma supply signal, and generating an identification signal if the second signal path deviates by at least a distance from the first signal path. The distance has a minimum time difference and a minimum signal amplitude difference. The method enables to identify arcs in a very reliable and very rapid manner.
A cooling device for cooling at least one electronic component, as well as an electronic assembly with a cooling device and an electronic component. The cooling device has at least one cooling body through which a cooling medium flows. The cooling device further includes a cooling plate defining a through recess in which the cooling body is arranged at least in part. A through recess is particularly easy to produce, so that the complete cooling device can be manufactured very cost effectively. At least one cooling pipe in direct contact with the cooling plate and/or the electronic component to be cooled transports cooling medium from and to the cooling body, so that the cooling device can effectively absorb heat generated at the electronic component.
Various methods and systems control the power of a process power supply by a control circuit with a controller and several control channels, wherein each control channel comprises an actual value and a target value of a control variable. The systems and methods specify target values of the control variables, determine the actual values of the control variables, determine a selected control channel with the assistance of a selection variable dependent upon the actual value, determine a selected control difference from the target value and the actual value of the selected control channel, and control the control loop with the selected control difference of the selected control channel.
G05B 5/01 - Dispositions pour éliminer l'instabilité électriques
G05B 11/42 - Commandes automatiques électriques avec les dispositions nécessaires pour obtenir des caractéristiques particulières, p. ex. proportionnelles, intégrales, différentielles pour obtenir une caractéristique à la fois proportionnelle et dépendante du temps, p. ex. P.I., P.I.D.
A power-supply system has a power converter configured to generate a high-frequency power signal and supply the high-frequency power signal to a load such as a plasma or gas laser process. The power converter includes a digital-to-analog converter (DAC) configured to generate an analog signal from a digital signal, an amplifier path in which the generated analog signal is amplified, and a logic-circuit unit coupled upstream of the DAC and configured to generate the digital signal and supply the generated digital signal to the DAC. The logic-circuit unit includes a signal-data buffer storing a signal-data value for generating a shape of the analog signal, an amplitude-data buffer storing an amplitude-data value for influencing an amplitude of the analog signal, and a multiplier configured to multiply the signal-data value by the amplitude-data value.
H02M 1/08 - Circuits spécialement adaptés à la production d'une tension de commande pour les dispositifs à semi-conducteurs incorporés dans des convertisseurs statiques
H02M 7/5387 - Transformation d'une puissance d'entrée en courant continu en une puissance de sortie en courant alternatif sans possibilité de réversibilité par convertisseurs statiques utilisant des tubes à décharge avec électrode de commande ou des dispositifs à semi-conducteurs avec électrode de commande utilisant des dispositifs du type triode ou transistor exigeant l'application continue d'un signal de commande utilisant uniquement des dispositifs à semi-conducteurs, p. ex. onduleurs à impulsions à un seul commutateur dans une configuration en pont
H03F 3/217 - Amplificateurs de puissance de classe DAmplificateurs à commutation
H01J 37/32 - Tubes à décharge en atmosphère gazeuse
H01J 37/24 - Circuits non adaptés à une application particulière du tube et non prévus ailleurs
An arc extinguishing method for extinguishing arcs in a plasma chamber of a plasma system, comprising providing a plasma operating power during a plasma operation to the plasma chamber for generating plasma in the plasma chamber and carrying out a plasma-processing process using the generated plasma, by generating an analog signal by a digital-to-analog converter (DAC) and amplifying the generated analog signal on an amplifier path, monitoring, by an arc detection device, the plasma system for arcs, and in response to detecting an occurrence of an arc, controlling the DAC by the arc detection device such that the generated analog signal by the DAC is modified.
A method for producing an arc detection signal on the basis of a plurality of observation signals comprises producing an arc detection part-signal for each of at least two observation signals. Producing each of the part-signals includes correlating the respective observation signal with a correlation signal by influencing the correlation signal with the respective observation, thereby producing a correlation result; producing or modifying a coefficient on the basis of the correlation result; and weighting the respective observation signal with the coefficient. The arc detection part-signals are added to form the arc detection signal.
In one aspect, a method includes protecting passive components connected to a high-frequency generator. In another aspect, a system includes a high-frequency generator having an HF source generating a high-frequency power signal at a fundamental frequency, and having a first control circuit which is fed with a signal related to an HF power transmitted by a high-frequency cable between the high-frequency generator and a load.
H05H 1/46 - Production du plasma utilisant des champs électromagnétiques appliqués, p. ex. de l'énergie à haute fréquence ou sous forme de micro-ondes
G05F 3/00 - Systèmes non rétroactifs pour la régulation des variables électriques par l'utilisation d'un élément non commandé, ou d'une combinaison d'éléments non commandés, un tel élément ou une telle combinaison étant propre à exercer par lui-même une régulation
H01J 37/32 - Tubes à décharge en atmosphère gazeuse
50.
Method for matching the impedance of the output impedance of a high-frequency power supply arrangement to the impedance of a plasma load and high-frequency power supply arrangement
A method for matching the impedance of the output impedance of a high-frequency power supply arrangement to the impedance of a plasma load includes, in a first impedance matching mode, matching the impedance of the output impedance of the high-frequency power supply arrangement by changing the frequency of the high-frequency signal produced. If the frequency is outside a specified frequency range, in a second impedance matching mode the impedance of the output impedance of the high-frequency power supply arrangement is matched by mechanically or electrically modifying a circuit which is arranged downstream of the high-frequency signal producer.
A plasma supply device generates an output power greater than 500 W at an essentially constant basic frequency greater than 3 MHz and powers a plasma process to which is supplied the generated output power, and from which reflected power is returned to the plasma supply device. The plasma supply device includes at least one inverter connected to a DC power supply, which inverter has at least one switching element, and an output network, wherein the at least one output network includes at least one inductance that has at least one magnetic field strengthening element that is a Perminvar ferrite.
In a method for extinguishing an arc in a gas discharge chamber in which power is supplied to a gas discharge chamber and in which both with a current flow in a first direction and with a current flow in a second inverse direction there is produced a gas discharge, when an arc is identified, the power supply to the gas discharge chamber is interrupted, and residual energy which is in a supply line to the gas discharge chamber and/or in the gas discharge chamber is supplied to an energy store.
In some aspects, a power supply system for a plasma application and/or an induction heating system includes at least two controllable power generators of different types. Each controllable power generator includes an associated identifier, and at least one operating unit for controlling at least one of the power generators, the operating unit includes an operating application to import the respective identifiers from the power generators that are connected to the operating application, and based on generator-specific configuration data that are stored for each power generator and the identifiers, the operating application constructs a graphic user interface on a display device of the operating unit.
In some aspects of the invention, a system for operating a plurality of plasma and/or induction heating processing systems includes an operating unit that has a display device on which a graphic user interface can be displayed, at least two power generators that supply power to a plasma process or an induction heating process, and a network that connects the operating unit to the power generators to transmit signals between the operating unit and the power generators. The graphic user interface includes a static region and a dynamic region, and a selection device for selecting information to be displayed in the dynamic region.
B23K 9/02 - Soudage de joints continusSupportsPièces rapportées
G01R 31/00 - Dispositions pour tester les propriétés électriquesDispositions pour la localisation des pannes électriquesDispositions pour tests électriques caractérisées par ce qui est testé, non prévues ailleurs
G06F 15/18 - dans lesquels un programme est modifié en fonction de l'expérience acquise par le calculateur lui-même au cours d'un cycle complet; Machines capables de s'instruire (systèmes de commande adaptatifs G05B 13/00;intelligence artificielle G06N)
H05H 1/46 - Production du plasma utilisant des champs électromagnétiques appliqués, p. ex. de l'énergie à haute fréquence ou sous forme de micro-ondes
55.
Method of detecting arc discharge in a plasma process
An arc discharge detection device is used for detecting arc discharges in a plasma process. The arc discharge detection device includes a comparator configured to emit an arc discharge detection signal and receive an instantaneous value of the signal or a signal proportional thereto, a minimum or maximum value detection device configured to receive the signal and to determine a minimum or maximum value of the signal within a predetermined time period, a setting means configured to receive the minimum or maximum value and to generate a reference signal from the minimum or maximum value, such that the reference signal is supplied to the comparator, and such that the comparator changes the signal level of the arc discharge detection signal when the comparator detects that the instantaneous value has reached the reference signal.
For driving at least two HF power generators that supply a plasma process with HF power, at least one drive signal is generated and at least one pulse signal is generated. Then, based on the at least one drive signal and the at least one pulse signal, a pulsed HF power signal is generated by each of the at least two HF power generator.
A 3 dB coupler includes at least one first and one second electric conductor that are spaced apart from each other and are capacitively and inductively coupled to each other in a coupling region. The first conductor represents the primary side of a transformer, and the second conductor represents the secondary side of the transformer. The first and second conductors each have a winding number of n>1.
brevets