In order to improve analysis accuracy while reducing analysis labor, a liquid chromatograph device 100 for quantifying a prescribed substance to be measured comprises a control unit 9 that, on the basis of RMS coefficients that are respective ratios of response ratios Rr of the substance to be measured and a plurality of prescribed standard substances different from the substance to be measured to substance quantity ratios Rn of the substance to be measured and the standard substances, substance quantities of the standard substances, and detection response ratios based on detection results for the substance to be measured and the standard substances, quantifies the substance to be measured with respect to each of the standard substances and averages results of quantification of the substance to be measured with respect to each of the standard substances, thereby determining final quantification results.
G01N 27/62 - Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating the ionisation of gases, e.g. aerosolsInvestigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating electric discharges, e.g. emission of cathode
2.
PARTICLE MEASUREMENT DEVICE, PARTICLE MEASUREMENT METHOD, AND REFLECTANCE REFERENCE SAMPLE
The purpose of the present invention is to provide a technology that makes it possible to easily perform individual identification on a reference sample that is used to calibrate a result of measuring the size of particles in a sample by using light. A reference sample according to the present invention is provided with a transparent flat plate having a window. The transparent flat plate is provided with a boundary surface having a reflectance that is substantially equal to the reflectance of a sample. One surface of the transparent flat plate has formed thereon a shape pattern that represents ID information for identifying the reference sample (see fig. 12).
G01N 15/00 - Investigating characteristics of particlesInvestigating permeability, pore-volume or surface-area of porous materials
G01N 15/0227 - Investigating particle size or size distribution by optical means using imagingInvestigating particle size or size distribution by optical means using holography
3.
CHARGED PARTICLE BEAM DEVICE AND METHOD FOR CONTROLLING CHARGED PARTICLE BEAM DEVICE
This charged particle beam device comprises: a charged particle beam irradiation optical system; a sample stage; a driving mechanism that drives the sample stage; and a computer that sets a cross-section of the sample in a processing area of the sample and controls the charged particle beam irradiation optical system and the driving mechanism when slicing the processing area. The computer sets an angle that is defined by the surface to be irradiated of the sample and the irradiation axis of the charged particle beam by controlling the driving mechanism on the basis of the angle that is defined by the surface to be irradiated and the irradiation axis, and controls the charged particle beam irradiation optical system and the driving mechanism so that areas that are to be irradiated by a plurality of charged particle beams that are irradiated in prescribed directions of the processing area of the sample when slicing the processing area are set, and the processing area is sliced by being scanned by the charged particle beams while the angle is maintained.
H01J 37/317 - Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. ion implantation
This automated analysis device is provided with a plurality of analysis units for analyzing a specimen, a buffer portion which holds a plurality of specimen racks on which are placed specimen containers holding the specimen, a sampler portion which conveys the specimen racks held in the buffer portion to the analysis units, and a control portion which, when performing a process to deliver the specimen racks to the plurality of analysis units, outputs synchronization signals to all the plurality of analysis units, wherein the analysis unit performs a delivery process starting from the synchronization signal, and the analysis unit performs a delivery process starting from the synchronization signal.
G01N 35/02 - Automatic analysis not limited to methods or materials provided for in any single one of groups Handling materials therefor using a plurality of sample containers moved by a conveyor system past one or more treatment or analysis stations
G01N 35/00 - Automatic analysis not limited to methods or materials provided for in any single one of groups Handling materials therefor
5.
CHARGED PARTICLE BEAM DEVICE AND METHOD FOR CONTROLLING CHARGED PARTICLE BEAM DEVICE
This charged particle beam device, which is for processing a sample, comprises: a charged particle beam–emitting optical system that emits a charged particle beam; a sample stage that holds a sample; a drive mechanism that drives the sample stage; and a computer that sets a cross-section of the sample in a processing region of the sample and controls the charged particle beam–emitting optical system and the drive mechanism when slicing the set processing region. The computer sets an irradiation position in a position where each of a plurality of emitted charged particle beams overlap in a first direction of the sample processing region when slicing the processing region.
This charged particle beam device, which is for etching a sample, comprises: a charged particle beam–emitting optical system that emits a charged particle beam; a sample stage that holds a sample; a drive mechanism that drives the sample stage; a gas supply part that supplies etching gas to the surface of the sample; and a computer that sets a processing region of the sample and controls the charged particle beam–emitting optical system and the drive mechanism so as to irradiate the set processing region with the charged particle beam and etch the sample. The computer sets a processing region on the sample that differs with each scan.
H01J 37/305 - Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
H01J 37/317 - Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. ion implantation
This machining method includes: a machining step of irradiating a sample constituted from a stack of multiple layers with a focused ion beam so as to machine a cross-section of the sample by a predetermined amount; an image generation step of generating an observation image of the cross-section of the sample by irradiating the sample with an electron beam after the machining step is ended; and a specific-layer determination step of determining whether a specific layer of the multiple layers has been exposed or not on the basis of the observation image.
The present invention provides a control method for a charged particle beam device for irradiating a focused ion beam onto a sample in which a plurality of layers are laminated, thereby processing a cross-section of the sample at a processing angle that is a prescribed angle. The control method includes: an image generation step for irradiating an electron beam onto the sample, detecting secondary electrons or reflected electrons generated from the sample, and generating an observation image of a cross-section of the sample on the basis of the detection result; an angle deviation calculation step for calculating the angle deviation between the angle of the cross-section and the processing angle on the basis of the observation image; and, a control step for controlling the attitude of the sample or the irradiation direction of the electron beam so as to eliminate the angle deviation calculated in the angle deviation calculation step.
The present invention provides a computer, a program, and a charged particle beam processing system, with which it is possible to reduce adjustment and setting work of conditions for observation or machining by an operator in an FIB-SEM composite device. This computer comprises: an information acquisition unit that acquires information relating to a recipe to be executed by a charged particle beam device provided with a charged particle irradiation optical system; and an information management unit that generates recipe management information on the basis of the information acquired by the information acquisition unit and stores the recipe management information in a storage unit.
This charged particle beam device (10) comprises a focused ion beam irradiation optical system (14), an electron beam irradiation optical system (15), a needle (18), a needle-driving mechanism (19), a display device (21), and a computer (22). The computer (22) stores coordinate data for the needle-driving mechanism (19) when the tip of the needle (18) matches a prescribed position in an image obtained by irradiating the needle (18) with a focused ion beam or an electron beam. The computer (22) controls the needle-driving mechanism (19) and the focused ion beam irradiation optical system (14) such that when the total amount of change in the coordinate data in a suitable period is at least a prescribed threshold, a process is executed for removing, by means of irradiation with the focused ion beam, at least a portion of a deposition film attached to the tip of the needle (18).
H01J 37/20 - Means for supporting or positioning the object or the materialMeans for adjusting diaphragms or lenses associated with the support
H01J 37/317 - Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. ion implantation
11.
CHARGED PARTICLE BEAM DEVICE AND METHOD FOR ADJUSTING CHARGED PARTICLE BEAM DEVICE
An ion beam lens barrel (17) of this charged particle beam device comprises an ion source (41) and an ion optical system (42). The ion optical system (42) comprises an aperture member (62) having formed therein multiple through-holes (62a), from among which a selection is made in order to allow a portion of a beam of ions (ion beam IB) generated from the ion source (41) to pass. A control device of the charged particle beam device records position information of observation axes, that is, predetermined axes in accordance with a reference sample (R) which has been positioned with respect to the predetermined axes, as recognized in an image obtained by irradiating the reference sample (R) with the ion beam. The control device drives the aperture member (62) using a drive mechanism such that predetermined parts forming some of the through-holes (62a) as recognized in an image obtained by irradiating the aperture member (62) with the ion beam are positioned with respect to the observation axes.
H01J 37/04 - Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
H01J 37/09 - DiaphragmsShields associated with electron- or ion-optical arrangementsCompensation of disturbing fields
H01J 37/305 - Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
A focused ion beam lens barrel (17) of this charged particle beam device comprises an ion source (41) and an ion optical system (42). The ion optical system (42) comprises an aperture member (54b) having formed therein a plurality of through-holes that are switched in order to cause a portion of the beams (ion beams) of the ions generated by the ion source (41) to pass therethrough. Any of the plurality of through-holes are switched while the optical conditions of the ion optical system (42) are maintained in a prescribed projection mode (second projection mode). The plurality of through-holes include fine round holes for viewing that are disposed in the center of the ion beam, and first rectangular holes for processing and second rectangular holes for viewing and processing that are disposed away from the center of the ion beam.
An ion beam tube (17) of a composite beam device (10) is provided with an ion source (41) and an ion optical system (42). The ion optical system (42) is provided with a diaphragm member (55b) in which at least one through-hole (55c) that is switchable in order to pass part of an ion beam (ion beam IB) generated from the ion source (41) therethrough is formed. The ion optical system (42) is provided with a blocking member (54b) that blocks part of the ion beam passing through the through-hole (55c) of the diaphragm member (55b), and a blocking drive mechanism (54a) that drives the blocking member (54b). The blocking drive mechanism (54a) performs switching between the presence and absence of blocking of the ion beam passing through the through-hole (55c) of the diaphragm member (55b) by the blocking member (54b) in a state where the ion optical system (42) maintains a predetermined optical condition.
A computation device is provided for measuring the dimensions of patterns formed on a sample based on a signal obtained from a charged particle beam device. The computation device includes a positional deviation amount calculation unit for calculating the amount of positional deviation in a direction parallel to a wafer surface between two patterns having different heights based on an image acquired at a given beam tilt angle; a pattern inclination amount calculation unit for calculating an amount of pattern inclination from the amount of positional deviation using a predetermined relational expression for the amount of positional deviation and the amount of pattern inclination; and a beam tilt control amount calculation unit for controlling the beam tilt angle so as to match the amount of pattern inclination. The pattern measurement device sets the beam tilt angle to a calculated beam tilt angle, reacquires an image and measures the patterns.
G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
G01B 15/04 - Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons for measuring contours or curvatures
G01N 23/225 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or by measuring secondary emission from the material using electron or ion microprobes
This sample piece relocating device (10) comprises an optical interferometry device (11), a sample piece carrying device (13) and a control device (21). The control device (21) controls the sample piece carrying device (13) on the basis of information related to a process in which a charged-particle beam device is used to irradiate a sample (S) with a charged-particle beam, thereby preparing a sample piece. The sample piece carrying device (13) controlled by the control device (21) separates and extracts the sample piece from the sample (S) and holds and carries the sample piece to a sample piece holder.
A method of washing an aspiration probe of an in-vitro diagnostic system is disclosed. The aspiration probe comprises an outer surface and an inner surface forming an inner space for receiving a fluid. The method comprises dipping the aspiration probe into a first wash fluid so that the outer surface is immersed at least in part into the first wash fluid, aspirating an amount of the first wash fluid into the inner space of the aspiration probe, propagating an ultrasonic vibration to the outer surface of the aspiration probe via the first wash fluid, and rinsing the outer surface and the inner surface of the aspiration probe with a second wash fluid. Further, an in-vitro diagnostic method and an in-vitro diagnostic system are disclosed.
An object of the present disclosure is to provide a charged particle beam apparatus that can quickly find a correction condition for a new aberration that is generated in association with beam adjustment. In order to achieve the above object, the present disclosure proposes a charged particle beam apparatus configured to include an objective lens (7) configured to focus a beam emitted from a charged particle source and irradiate a specimen, a visual field movement deflector (5 and 6) configured to deflect an arrival position of the beam with respect to the specimen, and an aberration correction unit (3 and 4) disposed between the visual field movement deflector and the charged particle source, in which the aberration correction unit is configured to suppress a change in the arrival position of the beam irradiated under different beam irradiation conditions.
A method for observing a biological tissue sample includes: forming a sample block; cutting up the sample block into a plurality of sample pieces and fixing each of the sample pieces to a sample piece placement member to form a plurality of observation samples; specifying an observation target area for performing precise observation; specifying and registering a coordinate of the observation target area on the sample piece for each of the observation samples; milling including irradiating the observation target area of the sample piece with an ion beam using gas as an ion source or a neutral particle beam with reference to the coordinate and exposing an observation surface inside the sample piece; and obtaining a SEM image of the observation surface with a scanning electron microscope.
G01N 23/2251 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or by measuring secondary emission from the material using electron or ion microprobes using incident electron beams, e.g. scanning electron microscopy [SEM]
An object of the present disclosure is to provide a charged particle beam apparatus that can quickly find a correction condition for a new aberration that is generated in association with beam adjustment. In order to achieve the above object, the present disclosure proposes a charged particle beam apparatus configured to include an objective lens (7) configured to focus a beam emitted from a charged particle source and irradiate a specimen, a visual field movement deflector (5 and 6) configured to deflect an arrival position of the beam with respect to the specimen, and an aberration correction unit (3 and 4) disposed between the visual field movement deflector and the charged particle source, in which the aberration correction unit is configured to suppress a change in the arrival position of the beam irradiated under different beam irradiation conditions.
An electrophoresis device has: a sample tray (112) on which there are placed a positive-electrode-side buffer solution container (103) containing a buffer solution and a phoresis medium container (102) containing a phoresis medium, and which is driven in a vertical direction and a horizontal direction; a thermostat oven unit (113) that holds a capillary array having a capillary head in which a plurality of capillaries are bundled in a single unit at one end thereof in a state where the capillary array being held in a state in which the capillary head protrudes downward, and that keeps the interior temperature constant; a solution-delivering mechanism (106) for delivering the phoresis medium in the phoresis medium container to the capillary array from the capillary head; and a power source for applying a voltage to both ends of the capillary array. Holes for insertion of the capillary head are provided in upper sections of the positive-electrode-side buffer solution container and the phoresis medium container. The thermostat oven unit is provided with a first lid member (207) that is positioned above the sample tray and seals the upper section of the positive-electrode-side buffer solution container while the phoresis medium is being delivered by the solution-delivering mechanism.
In an is-TPG method in which lasers having two different wavelengths are used to generate a wavelength-variable far-infrared light, a far-infrared light (TPG light) having an unstable output at a broad wavelength is also slightly generated at the same time with only one laser light. The generated is-TPG and the TPG light are converted, after passing through a specimen, to near-infrared light inside a nonlinear optical crystal for detection and are observed by a detector. The signal light output of the is-TPG light becomes unstable due to the TPG light. According to the present invention, the TPG light is removed by means of a slit and the like (filter) immediately before the specimen and is not introduced into the nonlinear optical crystal for detection. At this time, by using a change in the emission direction when the frequency of the is TPG light is changed, the filter is moved in accordance with the frequency so that only the is-TPG light passes therethrough (see FIG. 1C).
G01N 21/3581 - Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light using far infrared lightInvestigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light using Terahertz radiation
G01J 3/10 - Arrangements of light sources specially adapted for spectrometry or colorimetry
Provided is a plasma processing method in which the etching amount is highly uniformly and the processing yield is improved, and a plasma processing device. This method for etching a tungsten film includes: a first step of supplying plasma of an organic gas containing fluorine to a substrate having a tungsten film on at least a portion of the surface thereof to deposit a fluorocarbon layer, and forming an intermediate layer containing tungsten and fluorine and having self-saturating properties between the fluorocarbon layer and the tungsten film; and a second step of removing the fluorocarbon layer and the intermediate layer using plasma of oxygen gas.
H01L 21/28 - Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups
H01L 27/11556 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with floating gate characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels the channels comprising vertical portions, e.g. U-shaped channels
H01L 27/11582 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with charge-trapping gate insulators, e.g. MNOS or NROM characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels the channels comprising vertical portions, e.g. U-shaped channels
This automatic analyzing device is equipped with an interlock unit having: an actuating member which is supported to be movable between a lock position and a release position, and which engages, at the lock position, with a projection provided on a frontward end section of a cover that covers an upper face of a housing, thereby inhibiting the cover from rotating to an open position; an electromagnetic drive means for driving the actuating member; and a drive connection means that connects the actuating member and the electromagnetic drive means together and drives the actuating member by transmitting the movement of the electromagnetic drive means to the actuating member. The interlock unit is disposed on a front face of the housing at a position corresponding to the interlock unit so as to be attachable to and detachable from the housing in a state where a front plate of a front opening has been removed. Due to this configuration, access to the interlock unit is made easier, thereby improving maintenance performance.
Provided are: a plasma processing device which suppresses the contamination of samples and improves processing yield; an internal member for a plasma processing device; and a method for manufacturing said internal member. A plasma processing device that uses plasma, which is formed from a processing gas supplied into a processing chamber inside a vacuum vessel, to process a to-be-processed wafer that has been placed in the processing chamber, wherein the surface of a member disposed inside the processing chamber and facing the plasma is formed from a dielectric material, and the dielectric material includes a first material which chemically combines with the supplied processing gas and is volatilized, and a second material in which the volume of a non-volatile compound that is generated by the second material chemically combining with the processing gas is greater than before the chemical combination.
Provided is an interlock unit which can inhibit the rotation of a cover from a closed position to an open position, and which comprises: a hollow case that has a cuboid shape and is disposed in a position that is adjacent to an inner side surface of a housing and below an end of the cover on the opposite side from a support shaft in the closed position; a working member that is provided to the top surface of the case, is movably supported between a non-operating position and an operating position, and in the operating position prevents rotation of the cover to the open position by engaging with a protruding portion provided to the cover; an electromagnetic drive means that is provided below the working member and is for driving the working member; and a driving-coupling means that drives the working member by coupling the working member and the electromagnetic drive means and transmitting the operation of the electromagnetic drive means to the working member. It is thereby possible to improve maintenance of the interlock unit by facilitating access to the interlock unit.
An object of the present disclosure is to propose a height measuring device which performs height measurement with high accuracy at each height with a relatively simple configuration even when the sample surface height changes greatly. A height measuring device which includes a projection optical system configured to project a light ray onto an object to be measured and a detection optical system including a detection element configured to detect a reflected light ray from the object to be measured, where the projection optical system includes a light splitting element (103) which splits a trajectory of the light ray with which the object to be measured is irradiated into a plurality of parts, and thus it is possible to project a light ray to a predetermined position even when the object to be measured is located at a plurality of heights, is proposed.
The present invention reduces the turnaround time of an automated analyzer. During a period when cyclic measurement by a measurement unit is unnecessary, a controller washes a reaction vessel using a washing cycle having a cycle time shorter than that of an analysis cycle. A single analysis cycle and a single washing cycle both include a reaction disc stopping period and rotation period. In the washing cycle, there is no time during the stopping period when a sample dispensing mechanism, reagent dispensing mechanism, or stirring mechanism operates but there is a time when a washing mechanism operates. The washing cycle stopping period is shorter than the analysis cycle stopping period. The amount of rotation of the reaction disk in the analysis cycle rotation period is the same as the amount of rotation of the reaction disk in the washing cycle rotation period.
G01N 35/00 - Automatic analysis not limited to methods or materials provided for in any single one of groups Handling materials therefor
G01N 35/02 - Automatic analysis not limited to methods or materials provided for in any single one of groups Handling materials therefor using a plurality of sample containers moved by a conveyor system past one or more treatment or analysis stations
The present invention has a computation device for measuring the dimensions of patterns formed on a sample on the basis of a signal obtained from a charged particle beam device. The computation device has a positional deviation amount calculation unit for calculating the amount of positional deviation in a direction parallel to a wafer surface between two patterns having different heights on the basis of an image acquired at a given beam tilt angle; a pattern inclination amount calculation unit for calculating an amount of pattern inclination from the amount of positional deviation using a predetermined relational expression for the amount of positional deviation and the amount of pattern inclination; and a beam tilt control amount calculation unit for controlling the beam tilt angle so as to match the amount of pattern inclination. The pattern measurement device sets the beam tilt angle to a calculated beam tilt angle, reacquires an image and measures the patterns.
G01B 15/04 - Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons for measuring contours or curvatures
G01N 23/225 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or by measuring secondary emission from the material using electron or ion microprobes
In the case of adopting a configuration in which reagent bottles are radially disposed on a reagent disk and a reagent dispensing mechanism is rotated to access the reagent bottles, one reagent bottle includes a plurality of suction ports in which suction positions are different from each other, resulting in prolonging a step of dispensing a reagent. The invention is directed to an automatic analyzer including: a reagent disk that accommodates a plurality of reagent bottles including a plurality of suction ports and conveys the reagent bottles to a desired position by rotating in a circumferential direction around a central axis; and a reagent dispensing mechanism that rotates around a rotational axis and sucks a reagent of the reagent bottle placed at a predetermined position on the reagent disk. The reagent bottle is accommodated in the reagent disk such that the central axis of the reagent bottle and a diameter of the reagent disk form a predetermined inclination.
The present invention realizes a medical material transport system that is low-cost, stable, and safe, the medical material transport system being such that even if a failure occurs in an individual specimen transport device, the failure does not extend to the system as a whole. Collection of a specimen is requested from a specimen collection request terminal 107, and a management unit (108) issues a reception command 110 for the specimen. A drone 101 that has received the reception command 110 for the specimen departs from a standby dock 105 on the basis of the received information and flies to a specimen recovery location 106, and a specimen tray for placing the specimen is taken out from a specimen holder 102. A specimen container is contained in the specimen tray, and the specimen tray is returned to the specimen holder 102 and locked using a lock mechanism. The drone 101 flies to an arrival station 104, and after arriving, uses an unlocking key, and the specimen tray is disengaged from the specimen holder 102. After the specimen container in the specimen tray is collected, the specimen tray is placed in the specimen holder 102, and the drone 101 returns to the standby dock 105.
The present invention makes it possible for an automated analyzer including two or more types of photometers to obtain suitable output of the measurement results of the plurality of photometers and suitable data alarm output even if there is an abnormality, or the like, at the time of measurement. This automated analyzer includes, for example, two types of photometers having different quantitative ranges and an analysis control unit for controlling analysis that includes measurement of a given sample using the two types of photometers. If two types of data alarms corresponding to abnormalities, or the like, during measurement have been added to the two types of measurement results from the two types of photometers, the analysis control unit selects measurement result and data alarm output corresponding to the combination of the two types of data alarms and outputs the same to a user as analysis results.
G01N 35/02 - Automatic analysis not limited to methods or materials provided for in any single one of groups Handling materials therefor using a plurality of sample containers moved by a conveyor system past one or more treatment or analysis stations
G01N 35/00 - Automatic analysis not limited to methods or materials provided for in any single one of groups Handling materials therefor
G01N 21/27 - ColourSpectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands using photo-electric detection
This automated analysis device is provided with a plurality of analysis units for analyzing a specimen, a buffer portion which holds a plurality of specimen racks on which are placed specimen containers holding the specimen, a sampler portion which conveys the specimen racks held in the buffer portion to the analysis units, and a control portion which, when performing a process to deliver the specimen racks to the plurality of analysis units, outputs synchronization signals to all the plurality of analysis units, wherein the analysis unit performs a delivery process starting from the synchronization signal, and the analysis unit performs a delivery process starting from the synchronization signal.
G01N 35/02 - Automatic analysis not limited to methods or materials provided for in any single one of groups Handling materials therefor using a plurality of sample containers moved by a conveyor system past one or more treatment or analysis stations
G01N 35/00 - Automatic analysis not limited to methods or materials provided for in any single one of groups Handling materials therefor
This gas component monitoring device comprises a gas component monitoring part that forms plasma by re-excitation downstream of an installed position of a workpiece and monitors light emission of the plasma, wherein the gas component monitoring part includes: an introduction gas supply part that supplies an introduction gas; a nozzle part which has a hole through which the introduction gas supplied from the introduction gas supply part passes and an opening for allowing a portion of gas to be analyzed that flows through an exhaust pipe part to be taken up into the interior of the hole at an intermediate point in the hole; a discharge electrode part that causes an electrical discharge in the gas to be analyzed that is taken up into the interior of the nozzle part from the opening and the introduction gas supplied into the hole to generate a plasma inside the nozzle; and a light emission detection part that detects light emission of the plasma generated inside the nozzle by the discharge electrode part.
G01N 21/73 - Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light thermally excited using plasma burners or torches
The present invention provides a semiconductor manufacturing device with which it is possible to use a complex gas to etch, at a high speed and a high accuracy, a metal film containing a transition metal element. This semiconductor manufacturing device has: a vacuum container 60; a processing chamber 1 provided in the vacuum container, a sample 3 that has formed thereon a metal film containing a transition metal element being placed on a stage 4 installed in the processing chamber 1; and a vaporization chamber 2 provided in the vacuum container, a vaporization nozzle unit 70 for vaporizing a complex gas raw material liquid fed from the exterior being installed in the vaporization chamber 2. A complex gas obtained by vaporizing the complex gas raw material liquid is introduced into the processing chamber, and the metal film on the sample is etched.
Provided is a technique which pertains to a method for operating a vacuum processing device and with which effective transportation and processing can be achieved in processing a plurality of steps when the vacuum processing device is a link type vacuum processing device. A method for operating a vacuum processing device according to an embodiment has a first step (steps 601-607) for selecting a single first processing unit and a single second processing unit among a plurality of processing units with regard to each of wafers so as to minimize the time required for processing all the plurality of wafers in a plurality of processing steps, and determining a transport schedule including a transportation path for using the selected processing units. In the first step, the transportation schedule including the transport path is constructed for at least a single wafer, by using the first processing unit selected excluding at least a single first processing unit from the plurality of first processing units. This operation method selects an optimal transportation schedule when the second step is rate-controlled.
H01L 21/677 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereofApparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for conveying, e.g. between different work stations
B65G 49/07 - Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for semiconductor wafers
In this dry etching method using plasma, when etching an organic film, by alternately repeating a first step of shielding Ar ions and irradiating only oxygen radicals on the organic film of a sample, and a second step of irradiating noble gas ions on the organic film, it is possible to perform an etching process with good precision while suppressing variation in etching of the organic film. This makes it possible to suppress collapse of an LS pattern formed on a silicon substrate, etc.
Provided is a plasma treatment device comprising: a treatment chamber wherein a wafer 1 is treated using plasma; a high-frequency power source which supplies high-frequency electricity for generating the plasma; a sample stage 2 which is positioned in the treatment chamber and whereon the wafer 1 is mounted; and a DC power source 106 which is electrically connected to the sample stage 2 and which causes the sample stage 2 to generate an adsorptive power. The sample stage 2 comprises: a protrusion part 201a which adsorbs the wafer 1 by the adsorptive power; and a step part 201b which protrudes from the protrusion part 201a at the lower part of the protrusion part 201a. A ring 5, which can abut the lower surface of the wafer 1, is disposed on the outer side of the protrusion part 201a. When the wafer 1 is adsorbed on the upper surface of the protrusion part 201a of the sample stage 2, a space 7 defined by the wafer 1, the protrusion part 201a, and the ring 5 is sealed.
H01L 21/683 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereofApparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for supporting or gripping
In order to prevent an erroneous determination of an on-film defect, the sensitivity of the post-inspection is reduced so that a film swelling due to a minute defect would not be detected. Classification is performed to determine whether a defect is at least one of an on-film defect and a film swelling, by performing a coordinate correction on the result of a post-inspection by an actual-defect fine alignment using the result of a pre-inspection performed with two-stage thresholds, and by checking defects against each other. In addition, classification is performed to determine whether a defect is at least one of an on-film defect and a film swelling by, during the post-inspection, preparing instruction data from information of the refractive index and thickness of a film formed on a wafer and comparing the instruction data with a signal intensity ratio of a detection system.
In film thickness/depth measurement of a wafer in processing during etching, because the detected light intensity amount fluctuates and the measurement accuracy of the film thickness/depth decreases due to fluctuations in light intensity of the light source and fluctuations in the air of the region through which the light passes, the total light intensity or average light intensity at a given frequency is calculated from the spectroscopic spectrum measured at each time during etching processing; a present-time estimated total light intensity or estimated average light intensity, estimated using the total light intensity or average light intensity measured in the past prior to the present time is calculated; a change ratio is calculated, which is the ratio of the present-time total light intensity and estimated total light intensity, or the ratio of the average light intensity and the estimated average light intensity; the light intensity at each for wavelength at the present time is corrected using the calculated change ratio; and film thickness/depth measurement is carried out using the corrected light intensity at each wavelength.
The present invention provides a charged particle beam apparatus capable of efficiently reducing the effect of a residual magnetic field when SEM observation is performed. The charged particle beam apparatus according to the present invention includes a first mode for passing a direct current to a second coil after turning off a first coil, and a second mode for passing an alternating current to the second coil after turning off the first coil.
The present invention enables high-accuracy etching while also curbing and reducing surface roughness on a transition metal film. With regard to a transition metal film containing a transition metal element formed on a sample, the invention involves etching by: a first step for isotropically generating a transition metal oxide layer on the surface of the transition metal film while keeping the temperature of the sample at or below 100°C; a second step for raising the temperature of the sample to a predetermined temperature between 150°C and 250°C while supplying a complexation gas to the transition metal oxide layer; a third step for removing, by sublimating, a reactant generated by a reaction between the complexation gas and the transition metal oxide formed in the first step, while keeping the temperature of the sample at 150°C to 250°C; and a fourth step for cooling the sample.
A state of a sample surface is accurately determined without lowering analysis efficiency. There is provided an apparatus for determining a state of a sample to be analyzed contained in a container, in which the apparatus acquires an image of the sample, analyzes a position and a size of an object to be detected with respect to a detection range set in the image by using the image of the sample, and determines the state of the sample based on a result of the analysis.
The present invention realizes a composite charged particle beam apparatus capable of suppressing a leakage magnetic field from a pole piece forming an objective lens of an SEM with a simple structure. The charged particle beam apparatus according to the present invention obtains an ion beam observation image while passing a current to a first coil constituting the objective lens, and performs an operation of reducing the image shift by passing a current to a second coil with a plurality of current values, and determines a current to be passed to the second coil based on a difference between the operations.
a light guide. The light guide has an incident surface configured to incident a light from the scintillator, an emission surface configured to emit a light incident from the incident surface, and a first surface configured to guide the light incident from the incident surface to a side of the emission surface. The light guide has a bent portion. The bent portion has a second surface configured to guide the light to the side of the emission surface in regions excluding a region between the incident surface and the emission surface.
In order to enable a wafer to be heated uniformly and to enable processing throughput to be increased, this sample processing method of processing a sample repeats, a plurality of times, processing steps that include: an adsorption step of forming a layer of a reactant on the surface of a sample placed on a sample stage inside a processing chamber that is connected to a plasma generating chamber, with plasma being generated by a plasma generating means inside the plasma generating chamber into which processing gas has been introduced; a detaching step of heating the sample by a heating lamp disposed outside a sample chamber and a heater installed inside the sample stage to vaporize the layer of the reactant to detach the layer of the reactant from the surface of the sample; and a cooling step of cooling the sample heated in the detaching step, wherein in the adsorption step, the heating lamp and heater are feedforward controlled by a control unit to set the sample to a first temperature state, and in the detaching step, the heating lamp and heater are controlled by the control unit such that when the sample is heated, the heater is feedback controlled to set the sample to a second temperature state.
A method for treating a film structure comprising an underlayer film disposed in advance on a sample to be treated, and an overlayer film of the treatment object disposed on the underlayer film, in order to achieve a configuration with which it is possible to remove a reaction layer so that roughness is not generated on a surface other than the layer to be etched due to adhered/deposited radicals on the surface other than the layer to be etched, in a case in which the radicals are adsorbed on the surface of the layer to be etched, a reaction layer is formed, and the reaction layer is removed, wherein the film structure is treated by repeating: an adsorption step in which activated particles are supplied into a treatment chamber, the activated particles are adsorbed on the surface of the overlayer film to create a compound with the material of the overlayer film, and a reaction product layer is formed; a removal step in which plasma formed by supplying oxygen into the treatment chamber is used to remove deposits including particles that adhered to the surface of the underlayer film, among the activated particles supplied into the treatment chamber; and a desorption step in which a sample to be treated, which has passed through the adsorption step and the removal step, is heated, and the reaction product layer on the overlayer film is desorbed and removed.
The present disclosure pertains to a method, a system, and a computer-readable medium for highly precisely measuring the depth of a recess formed in a sample even when, inter alia, the material or pattern density of the sample differs. In order to achieve the purpose described above, there are proposed a method, a measurement system, and a non-temporary computer-readable medium for storing program commands that can be executed by a computer system, the method, system, and medium involving: using a measurement tool to acquire an image or a luminance distribution of a region including a recess formed in a sample; extracting a first characteristic of the interior of the recess, and a second characteristic pertaining to the dimensions or area of the recess, from the acquired image or luminance distribution; and inputting the extracted first characteristic and second characteristic to a model that indicates the relationship between the first characteristic, the second characteristic, and a depth index value of the recess to thereby derive the depth index value of the recess.
G01B 15/00 - Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons
H01J 37/22 - Optical or photographic arrangements associated with the tube
H01L 21/66 - Testing or measuring during manufacture or treatment
Provided is an automated analyzer comprising an ultrasonic cleaner capable of obtaining a consistent cleaning effect regardless of the operating temperature environment. This automated analyzer comprises: a dispensing mechanism having a nozzle for dispensing a sample or reagent; an ultrasonic cleaner 26 for cleaning the nozzle; and a control unit 28. The ultrasonic cleaner comprises: a cleaning tank 206; an ultrasonic vibrator 205; and a vibration head 209 that extends from the ultrasonic vibrator to the cleaning tank and has a distal end part that is inserted into the cleaning tank. The control unit inserts the nozzle into the cleaning tank and carries out a heating operation for heating the ultrasonic vibrator by driving the ultrasonic vibrator according to a driving condition different from that for a cleaning operation for cleaning the nozzle by driving the ultrasonic vibrator.
The present invention addresses the problem of improving analysis performance of an electrophoresis device. In order to resolve the problem, this electrophoresis device is provided with: a capillary array provided with capillaries, a capillary head that binds one end of the capillaries, an electrode holder that holds an electrode provided at the other end of the capillaries, and a detecting unit provided to the capillaries; a first heating unit for heating the capillaries; and an irradiation detecting unit that irradiates the detecting unit with light and detects fluorescent light generated by a fluorescence labelling sample inside the capillaries, wherein the electrophoreses device is characterized by having a second heating unit for heating the detecting unit.
This automated analyzer comprises: a sample disk for mounting sample containers accommodating samples; a sample disk control unit for controlling the rotation of the sample disk; a sample dispensing probe for sucking the sample out of a sample container that has arrived at a prescribed suction position as a result of the rotation of the sample disk; a photometer for carrying out automatic biochemical analysis; a blood coagulation time detection unit for carrying out blood coagulation time analysis; a light-blocking cover that covers the photometer and blood coagulation time detection unit; and a sample information output unit for outputting sample information. The sample information output unit acquires analysis information indicating the analysis state of the mounted samples and position information indicating the positions of the samples as sample disk monitor information 401 and displays the analysis information, the position information, and an image 402 showing the light-blocking cover on the imaging unit so as to overlap.
Provided are a charged particle beam device and a detector which enable non-invasive observation of a biochemical sample, without staining or immobilization, with a simple and high observation throughput. The charged particle beam device comprises: an electron optical system; a stage (64); a sample chamber (100) having a first insulating layer (110) that holds a sample (200) and is in contact with the sample (200), and a conductive layer (120) formed on the first insulating layer (110); signal detection circuits (20), (50) that are connected to the conductive layer (120) and detect a current flowing in the conductive layer (120); and a main control unit (14) that controls the electron optical system and the stage (64). The main control unit (14) irradiates the conductive layer (120) of the sample chamber (100) placed on the stage (64) with an electron beam (12) from the electron optical system, and detection signals from the signal detection circuits (20), (50) are input.
Several kV of applied voltage are required to take a biological sample and, as a result, EWOD electrodes, etc., are damaged and electrodes cannot be reused for droplet movement. The present invention addresses the issue of providing: a biochemical cartridge that can be used a plurality of times for taking biological samples using a capillary array, etc.; and a biochemical analysis device using the biochemical cartridge. In order to solve this issue, this biochemical cartridge is characterized by having provided therein: a channel through which samples are transported; a plurality of electrodes that are arranged upon the channel, along the direction that samples are transported, and are provided for transporting the samples; and openings facing the plurality of electrodes arranged on the downstream side of the channel.
G01N 35/08 - Automatic analysis not limited to methods or materials provided for in any single one of groups Handling materials therefor using a stream of discrete samples flowing along a tube system, e.g. flow injection analysis
G01N 1/00 - SamplingPreparing specimens for investigation
G01N 37/00 - Details not covered by any other group of this subclass
53.
BIOCHEMICAL CARTRIDGE AND BIOCHEMICAL ANALYSIS DEVICE
In order to enable a biological sample to be taken at a position at a prescribed distance from an EWOD electrode, this biochemical cartridge comprises: a droplet channel having a plurality of EWOD electrodes that transport sample droplets being droplets including the biological sample, said EWOD electrodes being arranged in a direction in which the sample droplets are transported; and a sample intake unit at a position at which the biological sample in the sample droplet is taken in, said position being at a prescribed distance from an EWOD electrode at an end of the droplet channel. The biochemical cartridge is characterized by: the sample intake unit being at a position that is lower than the droplet channel having the EWOD electrode at the end thereof, when the biological sample is taken; and there being a smooth continuation between the droplet channel and the sample intake unit.
G01N 35/08 - Automatic analysis not limited to methods or materials provided for in any single one of groups Handling materials therefor using a stream of discrete samples flowing along a tube system, e.g. flow injection analysis
G01N 1/00 - SamplingPreparing specimens for investigation
G01N 37/00 - Details not covered by any other group of this subclass
The present invention implements an alignment system which has high reproducibility of position information at the time of re-observation, and enables a user to efficiently and easily re-observe an area of interest. In the alignment system which enables correlated observation between an image capturing device (104) and a charged particle ray device (100), a plurality of position adjustment points are set on a sample carrier in a state where the samples are placed. An alignment control unit (153) obtains a conversion matrix for converting a coordinate system of the image capturing device and a coordinate system of the charged particle ray device, on the basis of position information and magnification for each of the plurality of position adjustment points when a first image is captured by the image capturing device and position information and magnification for each of the plurality of position adjustment points when observation is performed by the charged particle ray device, and converts a field of view designated for the first image to field-of-view information about the charged particle ray device by using the conversion matrix.
A minimum peak is determined from analysis results, a correction wavelength at which an S/N ratio of the minimum peak is greatest is determined, and the determined correction wavelength is used to execute correction of the minimum peak. A plurality of detector output value correction method are registered in a processor, correction method is selected from default correction method or from among a plurality of preset correction methods according to an object to perform correction.
G01N 21/31 - Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
(3) A solution that contains a salt with a concentration of 1 mol/L or more and a saturation concentration or less and is cooled and maintained to a temperature equal to or higher than a solidification point and lower than 25° C.
A control system for this charged particle beam system obtains a first factor by performing a multiresolution analysis using a wavelet transformation or a discrete wavelet transformation on at least a part of an image or a signal obtained by a charged particle beam device. The control system obtains a second factor by performing any of maximum value calculation, numerical calculation corresponding to a designated order among the orders of magnitude, fitting to a histogram, average value calculation, and summation calculation on at least a part of the first factor or the absolute value of the first factor.
The present invention provides a highly reliable fuel battery cell such that power generation efficiency for the fuel battery cell is improved and such that an electrode and an electrolyte film are not susceptible to damage. The fuel battery cell includes: a support substrate (2,3) which has a region provided with a support part that has a reticulated pattern in a plan view; a first electrode 4 on the support substrate; an electrolyte film 5 on the first electrode; and a second electrode 6 on the electrolyte film. The first electrode includes: a first thin film electrode 4A that is formed to cover at least the region; and a first reticulated electrode 4B provided corresponding to the support part and connected to the first thin film electrode, the first reticulated electrode having a greater thickness than the first thin film electrode and a reticulated shape in a plan view.
A dichroic mirror array according to the present disclosure is provided with, with respect to a right-handed XYZ cartesian coordinate system: a first group in which m (m≥2) dichroic mirrors DA1-DAm are arranged parallel to each other in the positive direction of the X-axis; and a second group in which n (n≥2) dichroic mirrors DB1-DBn are arranged parallel to each other in the negative direction of the X-axis. Incident surfaces of DA1-DAm and DB1-DBn are perpendicular to the XZ plane. In addition, the slopes of straight lines, formed by projecting the normal lines of the incident surfaces of DA1-DAm onto the XZ plane, are negative, and the slopes of straight lines, formed by projecting the normal lines of the incident surfaces of DB1-DBn onto the XZ plane, are positive.
This automated analyzer 100 comprises: a sample probe 11a for dispensing a substance to be dispensed into a plurality of reaction vessels 2 for causing a sample to be analyzed to react with a reagent, a measurement unit (light source 4a, spectrophotometer 4, and control device 21) for measuring a reaction liquid produced from the sample and reagent in a reaction vessel 2, a cleaning tank for probe cleaning, and a control device 21 for controlling the operation of the probe, measurement unit, and cleaning tank 13. The cleaning tank 13 comprises a cleaning pool 36 for storing cleaning water for immersing and cleaning the probe and a drying tank 37 for sucking up cleaning water having adhered to the surface of the probe. The control device 21 causes the drying tank 37 to suck up the cleaning water on the surface of the probe after the probe has been immersed in the cleaning water of the cleaning water pool 36 and cleaned. As a result, it is possible to reduce the amount of cleaning water used to clean the probe.
A thermal cycler 160 comprises: a support block 3 that supports a reaction vessel 2, a Peltier element 5 that is thermally coupled to the support block 3 and adjusts the temperature of a sample solution 1 held in the reaction vessel 2 by heating and cooling the support block 3, a temperature sensor 4 for measuring the temperature of the support block 3, and a temperature adjustment unit 230 that controls current and voltage supplied to the Peltier element 5 in accordance with the temperature of the support block 3 measured by the temperature sensor 4, wherein the reaction vessel 2 having an opening at an upper part 21 and a conical portion tapering down to the lower part is employed, and the Peltier element 5 is arranged so as to be parallel to the portion of a conical generatrix 23 in the reaction vessel 2.
The present invention suppresses an influence of noise caused by a device or an environment, and evaluates line edge roughness or a line width roughness. To this end, an averaged signal profile 405 is obtained from a moving average of S pixels (S is an integer larger than 1) in a Y-direction on a signal profile that represents an X-directional secondary electronic signal volume distribution for prescribed Y coordinates obtained from a top-down image, an edge position 406 of a line pattern is extracted on the basis of the averaged signal profile, and the height of the noise floor is calculated on the basis of first power spectrum density 407 of LER data or LWR data based on the extracted edge position and a second power spectrum density 409 of a rectangular window function corresponding to the moving average of the S pixels.
G01B 15/04 - Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons for measuring contours or curvatures
G01N 23/2251 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or by measuring secondary emission from the material using electron or ion microprobes using incident electron beams, e.g. scanning electron microscopy [SEM]
H01L 21/66 - Testing or measuring during manufacture or treatment
Provided is a reaction vessel that makes it possible to measure the amount of light from a reaction liquid without degrading a function for keeping the reaction vessel at a prescribed temperature. A reaction vessel for an automated analyzer according to an embodiment of this invention has a cylindrical shape around a first axis. The overall length of the reaction vessel in the first axis direction is longer than the overall length in the direction of a second axis perpendicular to the first axis and the overall length in the direction of a third axis perpendicular to the first axis and second axis. An opening for dispensing liquid is provided at a portion of the reaction vessel at one end in the first axis direction. The reaction vessel has a first flat surface that has one side that extends in the first axis direction from a portion of the reaction vessel at the other end in the first axis direction and another side that extends in the second axis direction. At a portion of the reaction vessel opposing the first flat surface in the third axis direction, the reaction vessel has a second flat surface that is roughly parallel to the first flat surface. Lateral surface side portions of the first and second flat surfaces are formed so as to bend toward the outside of the reaction vessel. The lengths of the first and second flat surfaces in the first axis direction are less than half the overall length in the first axis direction.
G01N 35/02 - Automatic analysis not limited to methods or materials provided for in any single one of groups Handling materials therefor using a plurality of sample containers moved by a conveyor system past one or more treatment or analysis stations
According to the present invention, a chemical dispensing mechanism 115 is provided with a liquid surface sensor for detecting the liquid surface of a chemical. A chemical container 122 is mounted on a chemical disk 116. A computer 132 has a calculation control unit comprising a control unit 140 and a calculation unit 141 and generating a control signal for controlling the operation of the chemical dispensing mechanism 115. The calculation control unit performs a first raising operation, in which a chemical stored in the chemical container 122 is suctioned by the chemical dispensing mechanism 115 and the chemical dispensing mechanism is then raised up to a first bubble detection position, determines whether a liquid surface is present by acquiring the detection result of the liquid surface sensor, and outputs an alert indicating the presence of a bubble on the liquid surface when the liquid surface has been determined to be absent. The first bubble detection position is the position at which the tip section of a dispensing nozzle of the chemical dispensing mechanism 115 remains inside the liquid when there are no bubbles present on the liquid surface, and is exposed from the inside of the liquid when there are bubbles present on the liquid surface.
The purpose of this invention is to provide a test method that can efficiently execute a step of evaluating the surface condition of a dispensing probe of a dispensing device. In this test method, using a first dispensing probe, a first solution in which a pigment has been dissolved is dispensed into a first container in advance and a second solution in which a pigment has not been dissolved is dispensed into a second container in advance. Using a second dispensing probe, the first solution and the second are drawn and discharged, respectively. Afterward, the surface condition of the second dispensing probe is evaluated by finding the amount of pigment recovered by the second solution (see fig. 2).
G01N 35/10 - Devices for transferring samples to, in, or from, the analysis apparatus, e.g. suction devices, injection devices
G01N 35/02 - Automatic analysis not limited to methods or materials provided for in any single one of groups Handling materials therefor using a plurality of sample containers moved by a conveyor system past one or more treatment or analysis stations
Provided is an electrolyte measuring device capable of highly accurately detecting malfunction in the device. This electrolyte measuring device is provided with: an ion-selective electrode to which an ionic solution containing ions is supplied; a reference electrode; a measuring unit for measuring the electric potential difference between the ion-selective electrode and the reference electrode; and an electric current measuring unit for measuring an electric current flowing through the reference electrode.
G01N 27/26 - Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating electrochemical variablesInvestigating or analysing materials by the use of electric, electrochemical, or magnetic means by using electrolysis or electrophoresis
The present invention provides an automated analyzer that is highly maintainable and reliable by eliminating dripping from and drop adhesion to a probe distal end when a dispensing probe is being replaced. This automated analyzer comprises a probe 120 that is replaceably attached to an arm part 206 of a dispensing mechanism, a tube 201 that is connected to the probe and forms a dispensing flow path, a syringe 121 that is connected to the tube and discharges/draws out system water into/from the dispensing flow path, and a controller 181. Before the probe is removed from the arm part, the controller causes the syringe to draw the system water out from the dispensing flow path such that the system water is removed from the probe.
The present invention stabilizes the amount of the electron beam emitted from a thermal field emission electron source. Accordingly, the thermal field emission electron source has: a needle-shaped electron source 301; a metal wire 302 to which the electron source is fixed and which heats the electron source; a stem 303 fixed to an insulator and energizing the meal wire; a first electrode 304 having a first opening portion 304a and disposed so that the end of the electron source is projected from the first opening portion; a second electrode 306 having a second opening portion 306a; and an insulating body 307 for positioning the first electrode and the second electrode so that the central axis of the first opening portion and the central axis of the second opening portion coincide with each other and electrically insulating the first electrode from the second electrode. The thermal field emission electron source is provided with a structure for reducing the amount of a gas emitted by the heating of the first electrode.
In order to introduce a reagent with little residual liquid amount and enable fluidic manipulation to be carried out by deformation of an elastic film, a sealed sample processing device is configured to include: a reagent storing part 80 which comprises a bonding part bonding an upper film and a lower film and provided around a storage space for storing a reagent between the upper film and lower film; an analysis chip 10 which has a lower side channel through which a liquid flows on the lower side and an upper side channel through which a liquid flows on the upper side; and an elastic film 20 which seals the lower side of the analysis chip. At least a portion of the lower film of the reagent storing part 80 is bonded to the upper side of the analysis chip, with a removed part, where a portion of the lower film is removed, being provided over the upper side channel, the bonding part has a low strength bonding portion where at least a portion of the area between the removed part and the storage space has a weaker bonding strength than the other portions, and both ends of the upper side channel are in communication with different lower side channels.
In this invention, there are cleaning positions 25a, 25b, 25c where cleaning tanks 19, 20, 21 discharge cleaning water onto the surfaces of nozzles 10, 12, 14 and drying positions 26a, 26b, 26c where the cleaning water adhered to the surfaces of the nozzles 10, 12, 14 is sucked up. During movement from the cleaning positions 25a, 25b, 25c for the nozzles 10, 12, 14 to the drying positions 26a, 26b, 26c for the nozzles 10, 12, 14, a control device 24 causes system water to be discharged from the nozzles 10, 12, 14 for a first time, and during the sucking up of the cleaning water on the surfaces of the nozzles 10, 12, 14 at the drying positions 26a, 26b, 26c, the control device 24 causes the system water to be discharged from the nozzles 10, 12, 14 for a second time. As a result, it is possible to effectively remove adhered water drops during nozzle cleaning.
Provided is an automated analysis device which makes use of an existing sensor to measure a quantity of liquid in a container, and which is capable of detecting a flow passage abnormality, including failure of a solenoid valve or a pressure changing unit. This automated analysis device operates a syringe 103, a first solenoid valve 104, and a second solenoid valve 105, to implement prescribed suction, ejection, and discharge operations in a container 101, a drainage unit 108, and flow passage systems 113, 114, and determines the presence or absence of an abnormality in the flow passage systems on the basis of a quantity of liquid measured by a sensor 102.
In sample transporting devices, the operation sound of a belt conveyor and the driving sound of a drive motor are caused by operating a transportation line when transporting samples, and reducing the driving sound and operation sound is required. In the present invention, a detection signal of the detection sensor 309 is detected by a detection unit 310, and a control unit 111 performs controlling to change the current value and the driving frequency of a belt driving motor 304 of a transporting line 301 and change the driving torque and the driving rotary speed of the transporting line on the basis of the amount and number of samples transported by a belt 303, wherein the amount and number of samples transported by the belt can be obtained by the detection signal or a sample amount measured by a sample transporting system. Accordingly, noise reduction is achieved by driving the belt driving motor under suitable conditions according to the amount and number of the samples transported by the transporting line, and reducing the operation sound of the belt driving motor or mechanisms and the like.
G01N 35/02 - Automatic analysis not limited to methods or materials provided for in any single one of groups Handling materials therefor using a plurality of sample containers moved by a conveyor system past one or more treatment or analysis stations
Provided is a liquid droplet ejection device with which it is possible to introduce a sample into an analysis apparatus so that highly precise analysis can be performed even if there is a very small liquid sample. This liquid droplet ejection device 10 comprises: a first flow path C1, which is formed along a first direction D1 and in which a liquid flows; a second flow path C2 and a third flow path C3, which are connected to an outlet of the first flow path and through which a gas flows; a fourth flow path C4, which is connected to the outlet of the first flow path, an outlet of the second flow path, and an outlet of the third flow path and is formed along the first direction, and in which the liquid and the gas flow; a fifth flow path C5 and a sixth flow path C6, which are connected to an outlet of the fourth flow path and in which the gas flows; and a seventh flow path C7, which is connected to the outlet of the fourth flow path, an outlet of the fifth flow path, and an outlet of the sixth flow path, is formed along the first direction, has a width greater than that of the fourth flow path, and in which the liquid and the gas flow.
Provided is a charged particle beam device using a light guide capable of enhancing light utilization efficiency. The charged particle beam device is provided with: a scintillator 10 which emits light when a charged particle beam is incident thereon; a light receiving element 12; and a detector 16 having a light guide 11 for guiding the light generated by the scintillator 10 to the light receiving element 12. The light guide 11 is provided with: an incident plane 11a disposed opposite a light emitting plane of the scintillator 10 and receiving the light emitted by the scintillator 10; an exit plane 11b disposed opposite the light receiving element 12 and having light exit therefrom; and a reflecting plane 11c1 opposing the incident plane 11a and disposed at an angle with respect to the incident plane 11a so as to reflect the light incident from the incident plane 11a toward the exit plane 11b. The exit plane 11b is smaller than the incident plane 11a, and a slope 11d opposing the reflecting plane 11c1 and disposed at an angle with respect to the incident plane 11a is provided between the incident plane 11a and the exit plane 11b.
Provided is an automatic analysis device that has a simple structure and can be miniaturized. The automatic analysis device according to the present disclosure comprises: a reagent tank that holds a reagent container that contains a reagent; and a lid opening/closing device including a lid opening/closing member configured to be movable in a first direction parallel to a vertical direction and a second direction perpendicular to the first direction. The lid opening/closing member is characterized by: integrally comprising a first member for opening a lid of the reagent container and a second member for closing the lid; being configured to be movable between a first position and a second position, the first position located above the reagent container and the second position located below the first position in the first direction such that the bottom surface of the lid opening/closing member comes into contact with the reagent container; being configured to be movable between the second position and a third position that is away from the second position in the second direction; opening the lid by means of the first member when moving from the second position to the third position; and closing the lid by means of the second member when moving from the third position to the second position.
G01N 35/00 - Automatic analysis not limited to methods or materials provided for in any single one of groups Handling materials therefor
G01N 35/02 - Automatic analysis not limited to methods or materials provided for in any single one of groups Handling materials therefor using a plurality of sample containers moved by a conveyor system past one or more treatment or analysis stations
76.
ANALYSIS DEVICE HAVING LIQUID CHROMATOGRAPH, AND LIQUID CHROMATOGRAPH ANALYSIS METHOD
Through the present invention, an analysis device having a liquid chromatograph, and a liquid chromatograph analysis method are realized, whereby it is possible to avoid a condition in which a plurality of separation columns reach the end of their service life and a plurality of streams become unusable at the same time, and to suppress device stoppage or a significant reduction in throughput. In the present invention, a control unit determines whether a condition exists in which there are no usable streams among streams 1, 2, and 3, and when there is no usable stream, the control unit skips sample introduction in the cycle. When there is one usable stream in the cycle, the stream is used. When there are a plurality of usable streams in the cycle, the stream having the smallest stream number is used when there are a plurality of streams having the smallest remaining number of uses of a separation column. When there is one stream having the smallest remaining number of uses of the separation column, the stream to which the separation column having the smallest remaining number of uses is connected is used.
G01N 27/62 - Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating the ionisation of gases, e.g. aerosolsInvestigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating electric discharges, e.g. emission of cathode
G01N 30/32 - Control of physical parameters of the fluid carrier of pressure or speed
G01N 30/46 - Flow patterns using more than one column
Provided is an automated analyzer for clinical testing that makes it possible to reduce the costs, and the like, associated with the handling of a plurality of exterior structural components necessary for various device configurations corresponding to a single-module method or module-assembly method. This automated analyzer (1) is configured from a single module or a combination of a plurality of modules. Each module is selected from a plurality of types of modules varying by specifications and/or analysis types. Each module may be, for example, a biological analysis module (for example, analysis module 2C) or an immunity analysis module (for example, analysis module 2D). The automated analyzer (1) has a universalized cover member (for example, exterior structural component 3g) that can be attached to and removed from a lateral surface of any of the plurality of modules. Each of the lateral surfaces of the modules has an attachment part at a position corresponding to the position of an attachment component of the cover member.
Provided is an automatic analysis device that can suppress concentration of a reagent made to react with a specimen. This automatic analysis device is provided with: a reagent container which accommodates a reagent and which has attached thereto a perforable lid; a perforation unit for perforating the lid; and a reagent suction nozzle that is inserted into a hole formed by perforation and that sucks up the reagent. The automatic analysis device is characterized by being further provided with a state storage unit that stores the state as to whether the reagent container is in an unused state or in a used state, and a state update unit that, when the lid is perforated by the perforation unit while the reagent container is in an unused state, updates the state stored in the state storage unit to the used state.
G01N 35/00 - Automatic analysis not limited to methods or materials provided for in any single one of groups Handling materials therefor
G01N 35/02 - Automatic analysis not limited to methods or materials provided for in any single one of groups Handling materials therefor using a plurality of sample containers moved by a conveyor system past one or more treatment or analysis stations
pixelpixel, the device control unit sets a sampling frequency fpixelsampshotshot of optical pulse irradiations per unit pixel time by the unit pixel time.
Provided is a mirror electron inspection device that is a defect inspection device for detecting defects of, for example, a semiconductor substrate and evaluates the temperature dependence of the defects in vacuum. A heating stage (6) is mounted through an electrically and thermally insulated fixing member (206) on a moving stage (7) installed in a sample chamber of the device, wherein said heating stage (6) has: a heater (heat generating body) (201) that is electrically insulated and covered with an insulator (202); a heater base (203) mounted with a sample (5); and a heat shield plate serving also as an equipotential surface (204). A heater power supply (12) is connected to the heater (heat generating body) (201). A sample application power supply (11) is connected to the heater base (203). The heater power supply (12) and the sample application power supply (11) are electrically isolated from each other.
Provided is an automated analyzer comprising a temperature regulator that can be made more compact in size while maintaining high-precision temperature regulation. In a temperature-regulating unit (20) of the automated analyzer, a first chemical reservoir (1) is constituted by a large-diameter spiral-shaped pipe, and a second chemical reservoir (2) is constituted by a large-diameter chemical reservoir container. The first chemical reservoir (1), which is positioned upstream of the second chemical reservoir (2), has an internal capacity that is set so as to be greater than the volume of a single discharge of each of syringe pumps (29, 30, 31), and the second chemical reservoir (2) also has an internal capacity (volume) that is set so as to be greater than the volume of a single discharge of each of the respective syringe pumps (29, 30, 31).
Provided are a spectral calibration device and a spectral calibration method that can highly accurately carry out spectral calibration even when peaks emerge simultaneously among fluorescent pigments. This spectral calibration device is for calculating a color conversion matrix for use in a color conversion process, and is provided with: a spectroscopy signal acquisition unit that acquires a spectroscopy signal of fluorescent light detected over time; a candidate calculation unit that calculates, on the basis of the spectroscopy signal, a color conversion matrix candidate for each of parameter values which are dependent on the frequency of simultaneous emergences of the fluorescent peaks of the fluorescent pigments; and a selection unit that selects a color conversion matrix on the basis of an evaluation value calculated for each of the candidates.
This electrolyte concentration measurement device is provided with: an ion selective electrode to which a liquid is supplied; a reference electrode serving as a reference of an electric potential; an electric potential measurement unit that acquires the electric potential of the ion selective electrode; a concentration calculation unit that calculates the concentration of ions included in the liquid from the electric potential acquired by the electric potential measurement unit; an electric potential monitoring unit that continuously monitors the electric potential of the ion selective electrode and generates an electric potential response curve; and a timing signal acquisition unit that acquires a timing signal relating to a timing of each operation; and an electric potential response curve analysis unit that detects an abnormality sign of the device on the basis of a relationship between the electric potential response curve and the timing signal.
G01N 27/26 - Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating electrochemical variablesInvestigating or analysing materials by the use of electric, electrochemical, or magnetic means by using electrolysis or electrophoresis
G01N 27/333 - Ion-selective electrodes or membranes
The present invention rapidly and very accurately quantitatively discriminates cancer using a cellular sample, e.g., a tissue fragment or smear. More specifically, provided are a method and apparatus for analyzing the growth activity or malignancy of cells by measuring the signal intensity for phosphorus, or the signal intensity for phosphorus and sulfur, of the cells.
Provided is a capillary array unit configured for easy attachment/detachment. A capillary array unit comprises: a capillary; a load header provided at one end of the capillary; a capillary head provided at the other end of the capillary; a detection unit provided to a part of the capillary; and a holding body for holding the capillary. The holding body is provided with a first holding part for holding the capillary in a curved shape, a second holding part for holding the capillary in a straight line, and a guide for moving the second holding part in a prescribed direction.
Provided are a program and personal information protection method which are executed by a system which is operated by a medical practitioner, said program and method comprising: a display process of causing a monitor part 2 to display an examination result screen 3 including personal information which identifies a subject; an identification process of identifying the personal information in the examination result screen 3 which is displayed in the display process; and an invalidation process of invalidating the personal information identified in the identification process in a captured image which includes the examination result screen 3. Instances of personal information being displayed in error to outside users are thus reduced in comparison to the prior art, and sharing of examination result information is implemented smoothly.
The present invention is an electron source provided with a columnar tip (4) of a hexaboride single crystal, a metal tube (12) for holding the columnar tip (4) of a hexaboride single crystal, and a filament (18) connected to the metal tube (12) at the center portion, wherein the electron source is characterized in that a portion of the columnar tip (4) of a hexaboride single crystal beyond the portion held by the metal tube (12) is formed as a cone shape, the distal end portion of the cone shape has a (310) crystal face, and Schottky electrons are released from the (310) crystal face. The present invention makes it possible to provide a novel electron source provided with a large current density and long-term stability of the released current and monochromaticity.
H01J 1/148 - Solid thermionic cathodes characterised by the material with compounds having metallic conductive properties, e.g. lanthanum boride, as an emissive material
H01J 1/15 - Cathodes heated directly by an electric current
H01J 9/04 - Manufacture of electrodes or electrode systems of thermionic cathodes
The present invention provides a concave diffraction grating capable of improved diffraction efficiency by suppressing spherical aberration. The concave diffraction grating is a concave diffraction grating 2 for dispersing and focusing light and comprises sawtooth grating grooves 21 on a concave substrate 24, with the sawtooth grating grooves 21 being unequally spaced. The concave diffraction grating 2 for dispersing and focusing light is formed by preparing a planar diffraction grating with a sawtooth shape which is formed on a planar substrate by photo-lithography and etching or machining and which forms unequally spaced grating grooves 21, deforming and mounting the planar diffraction grating along a fixed convex substrate to obtain a mold of a concave diffraction grating, and transferring the mold of the concave diffraction grating to the surface of a metal or a resin.
The present invention minimizes the worsening of a measurement turnaround time when a plurality of mixed measurement items having different incubation times are measured using an automatic analysis device. In this invention, after an automatic analysis device receives a sample request (step 5-1), a request analysis unit of a computer of an analysis module acquires the ratio of shortened measurement items among inspection items in a received analysis request (step 5-2). A planning unit of the computer determines an idle cycle from the ratio of shortened measurement items and the number of schedule items (step 5-3) and if the idle cycle is necessary (step 5-4), schedules a shortened measurement idle cycle for, for example, making an incubator available, at a time scheduled for a sample to be measured in advance (step 5-8). As a result, it is possible to use the position of a shortened measurement item during the measurement thereof and reduce waiting for measurement to start.
The purpose of the invention is to stably operate an ultrasonic vibrator and prevent cleaning liquid from splashing in an ultrasonic cleaner. This ultrasonic cleaner comprises: a cleaning tank 206 for storing cleaning liquid; an ultrasonic vibrator 205; a vibration head 209 having a neck 304 that extends from the ultrasonic vibrator to the cleaning tank and a leading end part 210 that has a cylindrical hole 211 for which the longitudinal direction is the vertical direction; and a first cover 601 that has openings corresponding to the neck and cylindrical hole. The first cover is installed so as to cover the cleaning tank at a height where the first cover is in contact with the liquid surface of the cleaning liquid.
G01N 35/10 - Devices for transferring samples to, in, or from, the analysis apparatus, e.g. suction devices, injection devices
B08B 3/12 - Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
The purpose of the present invention is to provide an ion beam device with which it is possible to efficiently and accurately acquire information regarding the three-dimensional structure of a sample. The ion beam device according to the present invention comprises an ion source capable of generating a plurality of types of ion beams. By repeatedly shaving the sample surface uniformly in the thickness direction of the sample and observing the surface shape, the surface shape at each position in the thickness direction of the sample is obtained (see fig. 1).
Provided is an ion milling device with which it is possible to enhance ion distribution reproducibility. The ion milling device has: an ion source (1); a sample stage (2) on which a sample (4) that is processed by being irradiated with an unfocused ion beam from the ion source (1) is mounted; and a drive unit (8) which is disposed between the ion source (1) and the sample stage (2) and causes a linear ion beam measurement member (7) extending in a first direction to be moved in a second direction orthogonal to the first direction. In a state in which an ion beam is being output from the ion source (1) under a first irradiation condition, the ion beam measurement member (7) is moved by the drive unit (8) within an ion beam irradiation range, and an ion beam current that flows through the ion beam measurement member (7) due to irradiation of the ion beam measurement member (7) with the ion beam is measured.
When a dispensing tip is imaged from below, liquid adhered to the tip falls downward and makes an imaging mechanism unclean. The present invention comprises a buffer having a hole for holding a tip for dispensing by being penetrated by the same, a probe for dispensing that has a distal end to which the tip is to be attached, an imaging unit for imaging the tip, and a control unit for carrying out control so as to mount the tip on the probe by pressing the probe into the tip while the same is being held by the buffer as a result of the passage of the same through the hole. The imaging unit is disposed so as to image the tip in an orientation facing from the upper side to the lower side in the gravity direction.
This biomolecule analysis device is characterized by comprising a thin film having a nanopore, a liquid tank that is disposed so as to be in contact with the thin film and contains an electrolyte solution, an electrode that is in contact with the liquid tank, a measurement unit that is connected to the electrode, and a control unit for controlling the voltage applied to the electrode according to the measurement results of the measurement unit, wherein a biomolecule is introduced into the electrolyte solution, a first end of the biomolecule is connected to a control chain and a molecular motor, and the control chain is joined to a primer at the upstream end thereof and has a spacer at the downstream end thereof.
Provided is an automatic analysis device which appropriately manages and efficiently make use of consumables. This automatic analysis device is provided with: a storage container holding part that holds storage containers for storing consumables; a conveyance mechanism for conveying the consumables stored in the storage containers; and a control unit, wherein the storage containers store first consumables and second consumables, and the control unit determines the use state of the storage containers for the first consumables and the use state of the storage containers for the second consumables, determines whether the first consumables stored in the storage containers can be used on the basis of the use state of the storage containers for the first consumables, and determines whether the second consumables stored in the storage containers can be used on the basis of the use state of the storage containers for the second consumables.
G01N 35/02 - Automatic analysis not limited to methods or materials provided for in any single one of groups Handling materials therefor using a plurality of sample containers moved by a conveyor system past one or more treatment or analysis stations
G01N 35/00 - Automatic analysis not limited to methods or materials provided for in any single one of groups Handling materials therefor
96.
SPECIMEN HOLDER CONVEYANCE LINE AND SPECIMEN INSPECTION AUTOMATION SYSTEM
The present invention enables transfer of a specimen holder between conveyance lines which have different conveyance directions, without using a new driving mechanism. This specimen holder conveyance line is provided with: a first conveyance line for conveying a specimen holder in a first direction; a second conveyance line for conveying the specimen holder in a second direction different from the first direction; and a passage port which is provided between the first conveyance line and the second conveyance line and through which the specimen holder passes. The specimen holder conveyance line is characterized by being further provided with an inclined guide that is inclined with respect to the first conveyance line so as to guide the specimen holder to the passage port, wherein: when the specimen holder comes into contact with the inclined guide, the inclined guide is pushed out or warped by the conveyance force of the first conveyance line; and, in accordance with movement of the specimen holder along the inclined guide, the inclined guide is returned to the original state so that the specimen holder passes through the passage port and is transferred to the second conveyance line.
Provided is a liquid level detection device capable of accurately detecting an interface inside a container regardless of the type of a separator or the state of the interface. This liquid level detection device 100 is configured to have: an irradiation unit 110 which irradiates a side surface of a sample container 200, containing a sample having layers 210, 220, 300, with light; a light receiving unit 120 that receives transmitted light from the sample container; an analysis unit 130 that acquires the interfaces between the layers from the received amount of the transmitted light; a first drive unit 150 that moves the sample container vertically relative to the irradiation unit and the light receiving unit; a second drive unit 160 that moves the sample container in the circumferential direction of the sample container relative to the irradiation unit and the light receiving unit; and a control unit 170 that controls the first and second drive units, wherein the second drive unit is controlled so that the light receiving unit receives the transmitted light at first and second irradiation angles, and the interfaces between the layers are acquired on the basis of the received amounts of transmitted light at the first and second irradiation angles.
The present invention comprises: a biochemical analysis unit 201 and an electrolyte analysis unit 211, that analyze a sample; one analysis unit-use control CPU 120 for controlling the operation of the biochemical analysis unit 201 and the electrolyte analysis unit 211; and a storage unit 133 that stores, for the biochemical analysis unit 201 and the electrolyte analysis unit 211, time charts 302, 312, 314, 322 for operations having different objectives. At least one of each of the biochemical analysis unit 201 and the electrolyte analysis unit 211 operates in a mutually independent manner on the basis of the time charts 302, 312, 314, 322 stored in the storage unit 133.
Provided are an automatic analyzer and an optical measurement method for correcting a variation in the multiplication factor of a photoelectric element with high accuracy. The automatic analyzer comprises: a photoelectric element which generates electrons by light and outputs a current signal; a voltage application unit which applies a voltage to the photoelectric element; and a processing unit which corrects a variation in the multiplication factor of the photoelectric element, wherein the photoelectric element outputs a pulse signal as the current signal, and the processing unit corrects the variation in the multiplication factor on the basis of the pulse area of the pulse signal.
Provided are a charged particle gun and a charged particle beam device in which the vibration of an electron source is reduced and which have a small machine difference in vibration resistance performance. The charged particle gun of the present disclosure is provided with: a charged particle source that emits a charged particle beam; a cylinder to which the charged particle source is fixed; a fixing component that is fitted into the cylinder and is movable in a perpendicular direction; a chassis having an opening into which the cylinder can be inserted and a support portion that supports the fixing component; a first support component and a second support component that are disposed between the fixing component and the support portion; and a push-in component that moves the cylinder downwards by being pressed against the fixing component. The charged particle gun is characterized in that the second support component is compressively deformed in the perpendicular direction and is larger than the first support component in the perpendicular direction.
H01J 37/04 - Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
H01J 37/065 - Construction of guns or parts thereof
