Provided are: a composition for chemical mechanical polishing; and a polishing method using the same. The composition allows rapid polishing of a polishing surface that contains a silver material for wiring, and makes it possible to obtain a polished surface having a high reflective property. This composition for chemical mechanical polishing comprises (A) abrasive grains, (B) a liquid medium, (C) an oxidizing agent, and (D) a nitrogen-containing hetrocyclic compound. The absolute value of the zeta potential of the (A) component of the composition for chemical mechanical polishing is 10 mV or more. When the content of the (C) component is noted as Mc (mass %) and the content of the (D) component is noted as Md (mass %), Mc/Md is 10 to 200.
A method for separating extracellular vesicles comprises: bringing a sample containing extracellular vesicles into contact with a carrier comprising a ligand for capturing extracellular vesicles; and bringing the carrier after being brought into contact with the sample into contact with a buffer containing a saccharide, wherein the saccharide is at least one saccharide selected from the group consisting of glucose, glucosamine, N-acetylglucosamine, and oligosaccharides and polysaccharides derived therefrom, and the ligand is capable of binding to the saccharide.
This radiation-sensitive composition comprises: a compound represented by formula (1) and a radiation-sensitive acid-generating body formed from a radiation-sensitive cation and an organic anion having a steroid skeleton or a 9,10-ethanoanthracene skeleton. In formula (1), R11, R12, and R13 are each independently, a C1-20 monovalent aliphatic hydrocarbon group.
Disclosed is a resin composition which contains: a polymer (A) that has an ethylenically unsaturated double bond, and has a weight average molecular weight (Mw) of 1,500-500,000; and a compound (B) that has two or more groups represented by formula (Y) and satisfies conditions (α1), (α2), and (α3). In formula (Y), R31 represents a hydrogen atom or an alkyl group having 1-5 carbon atoms, and * represents a bond with another moiety in the compound (B). (α1) The molecular weight is 1,000 or less. (α2) The solubility in toluene at 25°C is 20 mass% or more. (α3) The 1% weight loss temperature is more than 130°C as determined by simultaneous thermogravimetric-differential thermal analysis (TG/DTA).
B32B 5/28 - Layered products characterised by the non-homogeneity or physical structure of a layer characterised by the presence of two or more layers which comprise fibres, filaments, granules, or powder, or are foamed or specifically porous one layer being a fibrous or filamentary layer impregnated with or embedded in a plastic substance
B32B 15/08 - Layered products essentially comprising metal comprising metal as the main or only constituent of a layer, next to another layer of a specific substance of synthetic resin
C08J 5/24 - Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs
This compound is represented by formula (1A), formula (1B), formula (2-1), or formula (2-2). The explanation for each substituent in the formulae is as described in the specification.
C07C 25/24 - Halogenated aromatic hydrocarbons with unsaturated side chains
C07C 2/64 - Addition to a carbon atom of a six-membered aromatic ring
C07C 13/19 - Monocyclic hydrocarbons or acyclic hydrocarbon derivatives thereof with a six-membered ring with a cyclohexane ring substituted by unsaturated hydrocarbon groups
C07C 13/567 - FluorenesCompletely or partially hydrogenated fluorenes
C07C 17/266 - Preparation of halogenated hydrocarbons by reactions involving an increase in the number of carbon atoms in the skeleton by condensation reactions of hydrocarbons and halogenated hydrocarbons
C08G 61/00 - Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
6.
RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND COMPOUND
This radiation-sensitive composition comprises a polymer that, when reacted with an acid, exhibits a change in solubility in a developing solution. At least one of the polymer and a component other than the polymer has a partial structure represented by formula (1).
C07C 65/03 - Compounds having carboxyl groups bound to carbon atoms of six-membered aromatic rings and containing any of the groups OH, O-metal, —CHO, keto, ether, groups, groups, or groups containing hydroxy or O-metal groups monocyclic and having all hydroxy or O-metal groups bound to the ring
C07C 65/05 - Compounds having carboxyl groups bound to carbon atoms of six-membered aromatic rings and containing any of the groups OH, O-metal, —CHO, keto, ether, groups, groups, or groups containing hydroxy or O-metal groups monocyclic and having all hydroxy or O-metal groups bound to the ring o-Hydroxy carboxylic acids
C07C 65/21 - Compounds having carboxyl groups bound to carbon atoms of six-membered aromatic rings and containing any of the groups OH, O-metal, —CHO, keto, ether, groups, groups, or groups containing ether groups, groups, groups, or groups
C07C 309/06 - Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing halogen atoms, or nitro or nitroso groups bound to the carbon skeleton
C07C 309/09 - Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing oxygen atoms bound to the carbon skeleton containing etherified hydroxy groups bound to the carbon skeleton
C07C 309/11 - Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing oxygen atoms bound to the carbon skeleton containing etherified hydroxy groups bound to the carbon skeleton with the oxygen atom of at least one of the etherified hydroxy groups further bound to a carbon atom of a six-membered aromatic ring
C07C 309/12 - Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing oxygen atoms bound to the carbon skeleton containing esterified hydroxy groups bound to the carbon skeleton
C07C 309/17 - Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing carboxyl groups bound to the carbon skeleton
C07C 309/39 - Sulfonic acids having sulfo groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton containing halogen atoms bound to the carbon skeleton
C07C 309/41 - Sulfonic acids having sulfo groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton containing singly-bound oxygen atoms bound to the carbon skeleton
C07C 309/58 - Carboxylic acid groups or esters thereof
C07C 317/22 - SulfonesSulfoxides having sulfone or sulfoxide groups and singly-bound oxygen atoms bound to the same carbon skeleton with sulfone or sulfoxide groups bound to carbon atoms of six-membered aromatic rings of the carbon skeleton
C07D 317/44 - Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms having the hetero atoms in positions 1 and 3 ortho- or peri-condensed with carbocyclic rings or ring systems
C07D 317/56 - Radicals substituted by sulfur atoms
Provided are: a radiation-sensitive composition having good storage stability and having excellent sensitivity, CDU, and under-exposure CDU when forming a pattern; a pattern formation method; and an onium salt compound. This radiation-sensitive composition comprises a solvent and a polymer including a structural unit (I) having an acid-dissociable group. The polymer includes an iodo group. Further, at least the radiation-sensitive composition contains an onium salt compound including a partial structure (a) represented by formula (a), or the polymer includes a structural unit (II) including the partial structure (a) represented by formula (a).
C08F 212/14 - Monomers containing only one unsaturated aliphatic radical containing one ring substituted by hetero atoms or groups containing hetero atoms
A radiation sensitive resin composition includes: a resin including a repeating unit A which includes an acid-dissociable group; an onium salt including an organic acid anion moiety and an onium cation moiety; and a solvent. The onium salt includes at least one group selected from the group consisting of a pentafluorosulfanyl group, a pentafluorosulfanyloxy group, and a pentafluorosulfanylthio group.
A radiation-sensitive composition contains: a polymer, solubility of which in a developer solution is capable of being altered by an action of an acid; an anion represented by formula (1); and a radiation-sensitive onium cation containing an aromatic ring and at least one fluorine atom or fluorine atom-containing group bonded to the aromatic ring. Ar1 represents a group obtained by removing one hydrogen atom from a substituted or unsubstituted aromatic ring; n is an integer of 1 to 3; R1 represents a single bond or a substituted or unsubstituted divalent hydrocarbon group; L1 represents —O—, (*)n—R2—O—, or —NR3—, wherein in a case in which n is no less than 2, L1 represents (*)n—R2—O—; * denotes a site bonding to Ar1; R2 represents a substituted or unsubstituted hydrocarbon group having a valency of (n+1); and R3 represents a hydrogen atom or a monovalent hydrocarbon group.
A radiation-sensitive composition contains: a polymer, solubility of which in a developer solution is capable of being altered by an action of an acid; an anion represented by formula (1); and a radiation-sensitive onium cation containing an aromatic ring and at least one fluorine atom or fluorine atom-containing group bonded to the aromatic ring. Ar1 represents a group obtained by removing one hydrogen atom from a substituted or unsubstituted aromatic ring; n is an integer of 1 to 3; R1 represents a single bond or a substituted or unsubstituted divalent hydrocarbon group; L1 represents —O—, (*)n—R2—O—, or —NR3—, wherein in a case in which n is no less than 2, L1 represents (*)n—R2—O—; * denotes a site bonding to Ar1; R2 represents a substituted or unsubstituted hydrocarbon group having a valency of (n+1); and R3 represents a hydrogen atom or a monovalent hydrocarbon group.
JAPAN AS REPRESENTED BY DIRECTOR-GENERAL NATIONAL INSTITUTE OF INFECTIOUS DISEASES (Japan)
Inventor
Aoto, Yoshimasa
Masuda, Kanae
Isayama, Jun
Kawasaki, Hiroshi
Kawakami, Eiryo
Amagai, Masayuki
Sugai, Motoyuki
Hisatsune, Junzo
Yu, Liansheng
Abstract
The present invention addresses the problem of providing a method for determining a person showing responsiveness to bleach therapy. The present invention encompasses a method for determining responsiveness to bleach therapy, the method involving a determination step a in which, when a bacterium contained in a subject sample has one or more selected from the base sequences described in SEQ ID NO:1 to SEQ ID NO:173 and base sequences showing 80% or greater identity with said base sequences, it is determined that the subject shows responsiveness to bleach therapy.
The present invention provides: a semiconductor substrate manufacturing method using a film-forming composition which has good storage stability and can form a film that is excellent in terms of film formation properties, etching resistance and basic liquid resistance; and a film-forming composition. This semiconductor substrate manufacturing method includes a step for coating a substrate with a film-forming composition. The film-forming composition contains a solvent and a metal compound which is composed of at least a metal atom and a polyhydric alcohol, the metal atom being at least one metal that is selected from the group consisting of magnesium, calcium, strontium, barium, scandium, yttrium, zirconium, hafnium, manganese, cobalt, nickel, zinc, aluminum, gallium, indium, tin, and lead.
G03F 7/11 - Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
C08G 65/34 - Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives
12.
RADIATION-SENSITIVE COMPOSITION, PATTERN FORMATION METHOD, POLYMER, AND COMPOUND
Provided are: a radiation-sensitive composition capable of exhibiting sensitivity, CDU, overexposure CDU, and development defect suppressing properties at levels equal to or greater than conventional levels, when forming a pattern; a pattern formation method; a polymer; and a compound. This radiation-sensitive composition comprises a first polymer having a structural unit (I) containing an acid-dissociable group, a second polymer different from the first polymer, and a solvent, wherein: the second polymer has a structural unit (i) containing an amide bond, an ester bond, and a fluorine atom; and the weight-average molecular weight of the second polymer in terms of polystyrene is at most 20,000.
G03F 7/039 - Macromolecular compounds which are photodegradable, e.g. positive electron resists
C07C 233/49 - Carboxylic acid amides having carbon atoms of carboxamide groups bound to hydrogen atoms or to acyclic carbon atoms having the nitrogen atom of at least one of the carboxamide groups bound to a carbon atom of a hydrocarbon radical substituted by carboxyl groups with the substituted hydrocarbon radical bound to the nitrogen atom of the carboxamide group by an acyclic carbon atom having the carbon atom of the carboxamide group bound to a carbon atom of an acyclic unsaturated carbon skeleton
C07C 255/16 - Carboxylic acid nitriles having cyano groups bound to acyclic carbon atoms containing cyano groups and singly-bound oxygen atoms bound to the same carbon atom of an acyclic carbon skeleton
C07C 271/22 - Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atoms of the carbamate groups bound to hydrogen atoms or to acyclic carbon atoms to carbon atoms of hydrocarbon radicals substituted by carboxyl groups
C07C 275/28 - Derivatives of urea, i.e. compounds containing any of the groups the nitrogen atoms not being part of nitro or nitroso groups having nitrogen atoms of urea groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton
A method for producing expanded beads that have excellent in-mold moldability and produce a molded article of polyethylene-based resin expanded beads having a low shrinkage rate while increasing a biomass degree is provided. In the method, the polyethylene-based resin particles is composed of a mixed resin, which is obtained by kneading linear low-density polyethylene and branched low-density polyethylene, wherein the branched low-density polyethylene has a biomass degree of 30% or more and a heat of fusion of 95 J/g or more; a blending amount of the branched low-density polyethylene in the mixed resin is 5% by mass or more and less than 40% by mass, where a total of the linear low-density polyethylene and the branched low-density polyethylene is 100% by mass; and a heat of fusion of the polyethylene-based resin particle is 90 J/g or more.
A radiation-sensitive composition includes: a polymer including a first structural unit including a partial structure obtained by substituting a hydrogen atom of a carboxy group or a hydrogen atom of a phenolic hydroxyl group, with an acid-labile group represented by formula (1); and a compound including an anionic moiety and a radiation-sensitive onium cationic moiety. The anionic moiety includes one anion group and an aromatic ring in which at least one hydrogen atom is substituted with an iodine atom. Ar1 represents a group obtained by removing one hydrogen atom from an aromatic ring in which at least one hydrogen atom is substituted with an iodine atom.
A radiation-sensitive composition includes: a polymer including a first structural unit including a partial structure obtained by substituting a hydrogen atom of a carboxy group or a hydrogen atom of a phenolic hydroxyl group, with an acid-labile group represented by formula (1); and a compound including an anionic moiety and a radiation-sensitive onium cationic moiety. The anionic moiety includes one anion group and an aromatic ring in which at least one hydrogen atom is substituted with an iodine atom. Ar1 represents a group obtained by removing one hydrogen atom from an aromatic ring in which at least one hydrogen atom is substituted with an iodine atom.
Provided are a method for forming a resist pattern that demonstrates excellent performance in sensitivity, resolution, etc. in an exposure step when a next-generation exposure technique is applied, and a radiation-sensitive resin composition. The method for forming a resist pattern includes step (1) of forming a resist film in which a content of a radiation-sensitive acid generator (C) is 0.1% by mass or less, step (2) of exposing the resist film to EUV or an electron beam (EB), and step (3) of developing the resist film exposed in the step (2).
Provided are: a method for producing an organoid, the method comprising a step for culturing somatic stem cells in a culture medium containing an agonist of the interferon-γ receptor; and a culture medium for producing an organoid, the culture medium containing an agonist of the interferon-γ receptor.
Provided are: a method for producing a semiconductor substrate using a composition capable of forming a film having excellent embedding properties and flatness; and a composition for forming a resist underlayer film. The method for producing a semiconductor substrate comprises: a step for directly or indirectly coating a substrate with a composition for forming a resist underlayer film; a step for forming a resist pattern directly or indirectly on the resist underlayer film formed by the coating step; and a step for performing etching using the resist pattern as a mask. The composition for forming a resist underlayer film contains a nitrogen-containing compound and a solvent, and the nitrogen-containing compound comprises a partial structure that is represented by formula (1). (In formula (1), Ar1is a substituted or unsubstituted aromatic ring having 3 to 40 carbon atoms. Ar2 is a substituted or unsubstituted divalent aromatic ring having 3 to 40 carbon atoms. Each ＊ is a bond with another structure in the nitrogen-containing compound.)
G03F 7/11 - Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
C07D 215/14 - Radicals substituted by oxygen atoms
Provided is an electronic device in which an electronic component group is simply and satisfactorily bonded. A first electronic component (10) having a first insulator (12) and a first conductor (13) on a first-surface (10a) side, and a second electronic component (20) having a second insulator (22) and a second conductor (23) on a second-surface (20a) side, are prepared. A bonding layer (30) composed of an organic compound is provided to the first insulator (12), and the first surface (10a) and the second surface (20a) are made to face each other with the bonding layer (30) interposed therebetween such that the first insulator (12) and the second insulator (22) face each other and the first conductor (13) and the second conductor (23) face each other. Heat treatment is performed, the first insulator (12) and the second insulator (22) are bonded by the bonding layer (30), and the first conductor (13) and the second conductor (23) are brought into contact and bonded within the bonding layer (30) by thermal expansion. There is thereby obtained an electronic device (1) in which the first electronic component (10) and the second electronic component (20) are bonded.
H01L 21/60 - Attaching leads or other conductive members, to be used for carrying current to or from the device in operation
H01L 21/768 - Applying interconnections to be used for carrying current between separate components within a device
H01L 21/3205 - Deposition of non-insulating-, e.g. conductive- or resistive-, layers, on insulating layersAfter-treatment of these layers
H01L 23/522 - Arrangements for conducting electric current within the device in operation from one component to another including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
H05K 1/14 - Structural association of two or more printed circuits
H05K 1/18 - Printed circuits structurally associated with non-printed electric components
19.
METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE, COMPOSITION, AND METHOD FOR PRODUCING COMPOUND
Provided are: a method for producing a semiconductor substrate that can form a film that exhibits excellent embedding properties, an excellent heat resistance, an excellent etching resistance, and an excellent bending resistance; a composition; and a method for producing a compound. The method for producing a semiconductor substrate comprises: a step for directly or indirectly applying a resist underlayer film-forming composition on a substrate; a step for directly or indirectly forming a resist pattern on the resist underlayer film formed in the application step; and a step for carrying out etching by using the resist pattern as a mask. The resist underlayer film-forming composition contains a solvent and a compound represented by formula (1A) or (1B). (In formula (1A), Ar1Aand Ar2Aare each independently a substituted or unsubstituted C3-20 aromatic ring. Y is a single bond, an oxygen atom, a sulfur atom, or a methylene group. X is an n-valent organic group having an aromatic ring. A bond extending from X extends from the aromatic ring in X. n is an integer from 1-10. In formula (1B), Ar1Band Ar2B are each independently an unsubstituted C3-20 monovalent aromatic ring group or a C3-20 monovalent aromatic ring group substituted by a group selected from the group consisting of the hydroxy group and halogen atoms. X and n are defined as for formula (1A)).
G03F 7/11 - Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
C07C 2/86 - Preparation of hydrocarbons from hydrocarbons containing a smaller number of carbon atoms by condensation between a hydrocarbon and a non-hydrocarbon
C07C 37/16 - Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom of a six-membered aromatic ring by reactions increasing the number of carbon atoms by condensation involving hydroxy groups of phenols or alcohols or the ether or mineral ester group derived therefrom
C07C 39/23 - Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring polycyclic, containing six-membered aromatic rings and other rings, with unsaturation outside the aromatic rings
C07C 41/30 - Preparation of ethers by reactions not forming ether-oxygen bonds by increasing the number of carbon atoms, e.g. by oligomerisation
C07C 43/21 - Ethers having an ether-oxygen atom bound to a carbon atom of a six-membered aromatic ring containing rings other than six-membered aromatic rings
C07C 67/28 - Preparation of carboxylic acid esters by modifying the hydroxylic moiety of the ester, such modification not being an introduction of an ester group
C07C 67/035 - Preparation of carboxylic acid esters by reacting carboxylic acids or symmetrical anhydrides with saturated hydrocarbons
This radiation-sensitive composition comprises a polymer (P) including a structural unit having an acid-dissociable group, satisfies at least one among a first requirement, a second requirement, and a third requirement, and includes a specific cation having an acid-dissociable group or the like and an iodine group in at least one of a structural unit derived from a radiation-sensitive onium salt in the polymer (P), a structural unit derived from a radiation-sensitive onium salt in a polymer (Q1), and a radiation-sensitive onium salt (C). First requirement: The polymer (P) includes a structural unit derived from a radiation-sensitive onium salt. Second requirement: A polymer different from the polymer (P) and including a structural unit derived from a radiation-sensitive onium salt is contained. Third requirement: A radiation-sensitive onium salt (C) that is non-polymeric is contained.
C07C 309/10 - Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing oxygen atoms bound to the carbon skeleton containing etherified hydroxy groups bound to the carbon skeleton with the oxygen atom of at least one of the etherified hydroxy groups further bound to an acyclic carbon atom
C07C 309/12 - Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing oxygen atoms bound to the carbon skeleton containing esterified hydroxy groups bound to the carbon skeleton
C07C 309/17 - Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing carboxyl groups bound to the carbon skeleton
C07C 309/42 - Sulfonic acids having sulfo groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton containing singly-bound oxygen atoms bound to the carbon skeleton having the sulfo groups bound to carbon atoms of non-condensed six-membered aromatic rings
C07D 309/12 - Oxygen atoms only hydrogen atoms and one oxygen atom directly attached to ring carbon atoms, e.g. tetrahydropyranyl ethers
C07D 317/08 - Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms having the hetero atoms in positions 1 and 3
C07D 317/70 - Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms having the hetero atoms in positions 1 and 3 ortho- or peri-condensed with carbocyclic rings or ring systems condensed with ring systems containing two or more relevant rings
C07D 321/10 - Seven-membered rings condensed with carbocyclic rings or ring systems
C08F 212/02 - Monomers containing only one unsaturated aliphatic radical
C08F 212/14 - Monomers containing only one unsaturated aliphatic radical containing one ring substituted by hetero atoms or groups containing hetero atoms
Provided is a radiation-sensitive composition which contains a polymer (A) that includes: a first structural unit that is at least one type selected from the group consisting of a structural unit represented by formula (1-1) and a structural unit represented by formula (1-2); a second structural unit represented by formula (2); and a third structural unit having an acid-dissociable group, and which satisfies one or more of a first requirement, a second requirement and a third requirement. At least one selected from the group consisting of the polymer (A), a structural unit (b1) and a radiation-sensitive onium salt (C) has an iodine atom. First requirement: the polymer (A) also includes a fourth structural unit derived from a radiation-sensitive onium salt. Second requirement: a polymer (E1) which is different from the polymer (A) and which includes the structural unit (b1) derived from a radiation-sensitive onium salt is also contained. Third requirement: a non-polymer radiation-sensitive onium salt (C) is also contained.
G03F 7/039 - Macromolecular compounds which are photodegradable, e.g. positive electron resists
C08F 212/14 - Monomers containing only one unsaturated aliphatic radical containing one ring substituted by hetero atoms or groups containing hetero atoms
C08F 232/08 - Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system having condensed rings
This radiation-sensitive composition contains: a polymer (F) comprising a structural unit having a fluorine atom and an alkali dissociable group; and a compound represented by formula (1). In formula (1), R11, R12, and R13 are each independently a C1-20 monovalent aliphatic hydrocarbon group.
This radiation-sensitive composition contains: a polymer containing at least one structural unit selected from the group consisting of structural units represented by formula (1-1) to formula (1-3); and a compound represented by formula (2). In the formulae, A1represents an (n1+n2+1)-valent aromatic ring group. R2is an acid-dissociable group. A2is a substituted or unsubstituted aromatic ring group. R5and R6are alkyl groups having 1 to 10 carbon atoms, or are combined with each other to represent an aliphatic ring structure constituted together with carbon atoms to which R5and R6are bonded. However, R8and R9are combined with each other to form an aliphatic ring structure, and either the aliphatic ring structure has an ethylenically unsaturated bond or R10has an ethylenically unsaturated bond. R11, R12and R13 are monovalent aliphatic hydrocarbon groups having 1 to 20 carbon atoms.
G03F 7/039 - Macromolecular compounds which are photodegradable, e.g. positive electron resists
24.
METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE, COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, AND METHOD FOR PRODUCING NITROGEN-CONTAINING COMPOUND
The present invention provides: a method for manufacturing a semiconductor substrate, in which a composition that is capable of forming a film having excellent embedding properties and excellent flatness is used; a composition for forming a resist underlayer film; and a method for producing a nitrogen-containing compound. This method for manufacturing a semiconductor substrate includes: a step for directly or indirectly coating a substrate with a composition for forming a resist underlayer film; a step for forming a resist pattern directly or indirectly on the resist underlayer film formed by the coating step; and a step for performing etching using the resist pattern as a mask. The composition for forming a resist underlayer film contains a nitrogen-containing compound and a solvent. The nitrogen-containing compound includes a partial structure that is represented by formula (1). (In formula (1), Ar1is a substituted or unsubstituted aromatic ring having 3 to 40 carbon atoms. Ar2 is a substituted or unsubstituted divalent aromatic ring having 3 to 40 carbon atoms. X is a divalent organic group having 1 to 40 carbon atoms. Each * indicates an atomic bond with another structure in the nitrogen-containing compound.)
G03F 7/11 - Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
C07D 239/74 - QuinazolinesHydrogenated quinazolines with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, attached to ring carbon atoms of the hetero ring
C07D 239/82 - Oxygen atoms with an aryl radical attached in position 4
C07D 413/14 - Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and oxygen atoms as the only ring hetero atoms containing three or more hetero rings
Provided is a method for producing a foamed particle molded body enabling a reduction in the amount of steam supplied into a mold and an improvement in energy loss during in-mold molding. The method involves filling a cavity (10) of a split mold (100) composed of a first mold (30A) and a second mold (30B) with thermoplastic resin foam particles (50) and performing heating using steam to carry out in-mold molding. The first mold (30A) and/or the second mold (30B) have an exhaust chamber (20) provided so as to allow ventilation from the cavity (10). The method includes: a pressurizing step of supplying a pressurizing gas other than steam into the cavity (10) to adjust the pressure in the cavity (10) filled with the foam particles (50) to a pressure (P1) higher than atmospheric pressure; and a heating step of heating the foam particles (50) by supplying steam at a pressure (P2) higher than the pressure (P1) into the cavity (10) adjusted to the pressure (P1) in the pressurizing step, and exhausting the steam supplied into the cavity (10) to the exhaust chamber (20). In the heating step, the steam at the pressure (P2) is supplied into the cavity (10) while adjusting the pressure in the exhaust chamber (20) to a pressure (P3) higher than atmospheric pressure and lower than the pressure (P2).
Provided are: a diffractive optical element that is thin, realizes high mass productivity, has a high light-condensing performance which makes it possible to cope with a minute pixel pitch, and is capable of condensing light of a plurality of wavelengths; and a method for manufacturing the diffractive optical element. The diffractive optical element comprises: a base board which allows entering light to pass therethrough; and a resin layer which is formed from a curable resin composition, forms recesses and projections on a main surface of the base board, and also forms a diffraction pattern that is substantially concentrical when viewed in a direction orthogonal to the main surface of the base board. The diffraction pattern is divided into a plurality of pattern regions in the circumferential direction. The plurality of pattern regions at least include: a first pattern region which has a shape of a Fresnel zone plate, and which corresponds to light that is included in the entering light and that belongs to a first wavelength range; and a second pattern region which has a shape of a Fresnel zone plate, and which corresponds to light that is included in the entering light and that belongs to a second wavelength range different from the first wavelength range.
This radiation-sensitive composition contains a polymer that has: a structural unit that contains an acid-dissociable group; and a structural unit that contains a radiation-sensitive onium cation and a sulfonate anion. The radiation-sensitive composition additionally contains a carboxy group-containing compound different from the polymer.
Provided are an improved method and device for treating polymer beads by applying pressure. A polymer bead treatment method according to the present invention applies pressure to polymer beads having closed cells under a specific pressure condition in a specific pressure container. The polymer bead treatment method comprises: a step for acquiring at least one parameter related to the deformation behavior during application of pressure to the polymer beads; and a step for using the parameter related to the deformation behavior to determine gas information, which indicates at least one selected from the concentration, amount, and pressure of a gas in the closed cells of the polymer beads, during application of pressure to the polymer beads.
Provided is a method that allows selective modification of a substrate surface using an environmentally friendly component. This method for producing a surface-treated substrate comprises: a vaporizing step for vaporizing a nitrogen-containing compound; and a step for selectively modifying the surface of the substrate by causing contact between the substrate and the nitrogen-containing compound, the surface of the substrate including a first region and a second region made from a material different from the first region.
C23C 16/04 - Coating on selected surface areas, e.g. using masks
C23C 16/455 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into the reaction chamber or for modifying gas flows in the reaction chamber
H01L 21/285 - Deposition of conductive or insulating materials for electrodes from a gas or vapour, e.g. condensation
H01L 21/31 - Treatment of semiconductor bodies using processes or apparatus not provided for in groups to form insulating layers thereon, e.g. for masking or by using photolithographic techniquesAfter-treatment of these layersSelection of materials for these layers
30.
RADIATION-SENSITIVE COMPOSITION AND PATTERN FORMING METHOD
The present invention provides: a radiation-sensitive composition which is excellent in terms of sensitivity, CDU, and process margin during the formation of a pattern; and a pattern forming method. This radiation-sensitive composition contains a solvent and a polymer which has an iodine group and contains a structural unit (I) that has an acid dissociable group. At least the radiation-sensitive composition contains a radiation-sensitive acid generator which includes a partial structure represented by formula (a), or the polymer contains a structural unit (II) that includes a partial structure represented by formula (a). (In formula (a), R1is a nitro group, a cyano group, a carboxy group, an iodine atom, an amino group, an alkyl group, an acyl group, or an alkoxycarbonyl group; in cases where there are a plurality of R1moieties, the plurality of R1moieties are the same as or different from each other; L1212122 ≤ 2m + 4 is satisfied; * is an atomic bond in the corresponding polymer or radiation-sensitive acid generator to another moiety; and Z+ is a monovalent onium cation.)
A radiation-sensitive resin composition includes: an onium salt compound represented by formula (1), a resin including a structural unit which includes an acid-dissociable group, and a solvent. R1, R2, and R3 each independently represent a monovalent chain organic group having 1 to 10 carbon atoms; R4, R5, and R6 each independently represent a hydrogen atom, a fluorine atom, a monovalent hydrocarbon group, or a monovalent fluorinated hydrocarbon group; Rf1 represents a fluorine atom or a monovalent fluorinated hydrocarbon group; m1 represents an integer of 0 to 8; m2 represents an integer of 1 to 4; and Z+ represents a monovalent radiation-sensitive onium cation.
A radiation-sensitive resin composition includes: an onium salt compound represented by formula (1), a resin including a structural unit which includes an acid-dissociable group, and a solvent. R1, R2, and R3 each independently represent a monovalent chain organic group having 1 to 10 carbon atoms; R4, R5, and R6 each independently represent a hydrogen atom, a fluorine atom, a monovalent hydrocarbon group, or a monovalent fluorinated hydrocarbon group; Rf1 represents a fluorine atom or a monovalent fluorinated hydrocarbon group; m1 represents an integer of 0 to 8; m2 represents an integer of 1 to 4; and Z+ represents a monovalent radiation-sensitive onium cation.
G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
Provided is a copper film forming composition and a method, for manufacturing a glass substrate equipped with a through electrode, where a seed layer also having properties of an adhesion layer can be formed on a glass wall surface in a through-hole of the glass substrate. The method for manufacturing a glass substrate equipped with a through electrode comprises: a seed layer forming step for bringing a copper film forming composition directly into contact with a glass wall surface in at least a through-hole of a glass substrate having the through-hole, and forming a seed layer on the glass wall surface in the through-hole; and a through electrode forming step for forming a through electrode in the through-hole in which the seed layer was formed. The copper film forming composition contains a copper compound, a nitrogen-containing organic compound, and a solvent.
H05K 1/11 - Printed elements for providing electric connections to or between printed circuits
C23C 18/08 - Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coatingContact plating by thermal decomposition characterised by the deposition of metallic material
A radiation-sensitive resin composition includes: an onium salt compound represented by formula (1); a resin including a structural unit (I) represented by formula (2); and a solvent. R1, R2, and R3 are each independently a monovalent organic group having 1 to 10 carbon atoms, or two or three of R1, R2, and R3 taken together represent a monovalent or divalent group containing a cyclic structure having 3 to 20 carbon atoms together with the carbon atom to which the two or three of R1, R2, and R3 are bonded. R4 and R5 are each independently a hydrogen atom, a fluorine atom, a monovalent hydrocarbon group, or a monovalent fluorinated hydrocarbon group. R10 is a monovalent group including at least one structure selected from the group consisting of a lactone structure, a cyclic carbonate structure, and a sultone structure.
A radiation-sensitive resin composition includes: an onium salt compound represented by formula (1); a resin including a structural unit (I) represented by formula (2); and a solvent. R1, R2, and R3 are each independently a monovalent organic group having 1 to 10 carbon atoms, or two or three of R1, R2, and R3 taken together represent a monovalent or divalent group containing a cyclic structure having 3 to 20 carbon atoms together with the carbon atom to which the two or three of R1, R2, and R3 are bonded. R4 and R5 are each independently a hydrogen atom, a fluorine atom, a monovalent hydrocarbon group, or a monovalent fluorinated hydrocarbon group. R10 is a monovalent group including at least one structure selected from the group consisting of a lactone structure, a cyclic carbonate structure, and a sultone structure.
C08F 224/00 - Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a heterocyclic ring containing oxygen
G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
A radiation-sensitive resin composition includes: an onium salt compound (1) represented by formula (1); an onium salt compound (2) different from the onium salt compound (1); a resin including a structural unit which includes an acid-dissociable group; and a solvent. W is a monovalent chain organic group having 1 to 40 carbon atoms, a monovalent cyclic organic group having 5 or less carbon atoms, or a monovalent group obtained by combining a monovalent chain organic group having 1 to 40 carbon atoms and a cyclic structure having 5 or less carbon atoms; R1 and R2 are each independently a hydrogen atom, a fluorine atom, a monovalent hydrocarbon group, or a monovalent fluorinated hydrocarbon group; R3, R4, and R5 are each independently a fluorine atom or a monovalent fluorinated hydrocarbon group; m1 is an integer of 1 to 8; and Z+ is a monovalent radiation-sensitive onium cation.
A radiation-sensitive resin composition includes: an onium salt compound (1) represented by formula (1); an onium salt compound (2) different from the onium salt compound (1); a resin including a structural unit which includes an acid-dissociable group; and a solvent. W is a monovalent chain organic group having 1 to 40 carbon atoms, a monovalent cyclic organic group having 5 or less carbon atoms, or a monovalent group obtained by combining a monovalent chain organic group having 1 to 40 carbon atoms and a cyclic structure having 5 or less carbon atoms; R1 and R2 are each independently a hydrogen atom, a fluorine atom, a monovalent hydrocarbon group, or a monovalent fluorinated hydrocarbon group; R3, R4, and R5 are each independently a fluorine atom or a monovalent fluorinated hydrocarbon group; m1 is an integer of 1 to 8; and Z+ is a monovalent radiation-sensitive onium cation.
G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
G03F 7/038 - Macromolecular compounds which are rendered insoluble or differentially wettable
G03F 7/039 - Macromolecular compounds which are photodegradable, e.g. positive electron resists
35.
CHROMATOGRAPHIC SUPPORT FOR PURIFYING FC FUSION PROTEIN AND FC FUSION PROTEIN PURIFICATION METHOD USING SAME
The present invention provides a chromatographic support for purifying an Fc fusion protein and an Fc fusion protein purification method using said chromatographic support. The chromatographic support comprises porous particles to which a ligand is immobilized, wherein: the porous particles are synthetic polymer-based or natural polymer-based porous particles; the ligand is at least one substance selected from the group consisting of protein A, protein G, protein L, and related substances of these; and the average pore diameter of the porous particles to which the ligand is immobilized is 75-120 nm. The Fc fusion protein purification method comprises: (step 1) a step for passing a solution containing an Fc fusion protein through a column that is provided with said chromatographic support and causing the Fc fusion protein to bind with the support; (step 2) a step for washing the support; and (step 3) a step for collecting the Fc fusion protein from the support.
C07K 1/16 - ExtractionSeparationPurification by chromatography
B01D 15/20 - Selective adsorption, e.g. chromatography characterised by constructional or operational features relating to the conditioning of the sorbent material
B01J 20/281 - Sorbents specially adapted for preparative, analytical or investigative chromatography
C07K 16/00 - Immunoglobulins, e.g. monoclonal or polyclonal antibodies
The purpose of the present invention is to provide: a radiation-sensitive composition having excellent sensitivity and LWR when forming a pattern; a pattern formation method; and a radiation-sensitive acid generator. This radiation-sensitive composition comprises: a polymer (A) which contains a structural unit (I) having an acid-dissociable group and has an iodine group; and a solvent (D), wherein said radiation-sensitive composition contains a radiation-sensitive acid generator (B) represented by formula (1), or the polymer (A) contains a structural unit (II) represented by formula (1'). (In formula (1), R1is a C1-C40 monovalent organic group. When a plurality of R2s are present, the plurality of R2s are each independently a hydrogen atom, a nitro group, a hydroxyl group, a cyano group, a carboxy group, a thiol group, a halogen atom, or a monovalent organic group, or a C3-C20 divalent cyclic group composed of two R2s aligned with each other and a carbon atom to which the two R2s are bonded. n is an integer of 0-20. W represents a ring structure with 5-8 membered rings which is formed together with a carbon atom and a nitrogen atom to which W is bonded.) (In formula (1'), R1ais a C1-C40 divalent organic group. Rais a hydrogen atom, a fluorine atom, a methyl group, or a trifluoromethyl group. R2, n, and W have the same meanings as those in formula (1).)
C07D 207/404 - 2,5-Pyrrolidine-diones with only hydrogen atoms or radicals containing only hydrogen and carbon atoms directly attached to other ring carbon atoms, e.g. succinimide
C07D 209/48 - Iso-indolesHydrogenated iso-indoles with oxygen atoms in positions 1 and 3, e.g. phthalimide
C07D 317/70 - Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms having the hetero atoms in positions 1 and 3 ortho- or peri-condensed with carbocyclic rings or ring systems condensed with ring systems containing two or more relevant rings
A radiation-sensitive composition contains a polymer having a partial structure represented by formula (1), and a radiation-sensitive acid generating substance. The radiation-sensitive composition satisfies one or more of requirement 1, requirement 2, and requirement 3. requirement 1: the partial structure represented by the formula (1) has two or more iodine atoms. requirement 2: the radiation-sensitive acid generating substance contains an onium salt having two or more iodine atoms. requirement 3: the partial structure represented by the formula (1) has an iodine atom, and the radiation-sensitive acid generating substance contains an onium salt having an iodine atom. In the formula (1), Y1 represents a divalent group represented by formula (2-1) or formula (2-2).
A radiation-sensitive composition contains a polymer having a partial structure represented by formula (1), and a radiation-sensitive acid generating substance. The radiation-sensitive composition satisfies one or more of requirement 1, requirement 2, and requirement 3. requirement 1: the partial structure represented by the formula (1) has two or more iodine atoms. requirement 2: the radiation-sensitive acid generating substance contains an onium salt having two or more iodine atoms. requirement 3: the partial structure represented by the formula (1) has an iodine atom, and the radiation-sensitive acid generating substance contains an onium salt having an iodine atom. In the formula (1), Y1 represents a divalent group represented by formula (2-1) or formula (2-2).
C07C 309/12 - Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing oxygen atoms bound to the carbon skeleton containing esterified hydroxy groups bound to the carbon skeleton
C07C 323/09 - Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and halogen atoms, or nitro or nitroso groups bound to the same carbon skeleton having sulfur atoms of thio groups bound to carbon atoms of six-membered aromatic rings of the carbon skeleton
C08F 212/14 - Monomers containing only one unsaturated aliphatic radical containing one ring substituted by hetero atoms or groups containing hetero atoms
C08F 220/18 - Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
The present invention provides: a radiation-sensitive composition which has excellent storage stability and is capable of exhibiting sensitivity, LWR, pattern rectangularity, CDU, and pattern circularity at sufficient levels when a pattern is formed; a pattern forming method; and an onium salt. This radiation-sensitive composition contains: an onium salt that is represented by formula (1-1) or (1-2); a polymer that contains a structural unit (I) having an acid-dissociable group; and a solvent. [Chemical formula 1] (In formulae (1-1) and (1-2), Ar11and Ar2122 + 1)-valent aromatic ring having 5 to 20 ring atoms. Ar1233 + 1)-valent aromatic ring having 5 to 20 ring atoms. Ar22312311 is 1, R111 is 2 or more, the plurality of R1s are the same as the R111 is 1, or two among the plurality of R1s combine with each other to form a cyclic structure having 3 to 10 carbon atoms, together with two carbon atoms of the ring in the formula to which the moieties are bonded. The plurality of R122 is 1, R2is the same as the R1122 is 2 or more, the plurality of R2s are the same as the R1133 is 1, R3is the same as the R1133 is 2 or more, the plurality of R3s are the same as the R1122-, -O-, or -S-. Y is a single bond or a divalent linking group. The bonds expressed by the formula are each independently a single bond or a double bond. [Chemical formula 2] In the formula, Z- is an organic acid anion having 2 or more carbon atoms.)
C07D 335/04 - Heterocyclic compounds containing six-membered rings having one sulfur atom as the only ring hetero atom condensed with carbocyclic rings or ring systems
Provided are a semiconductor substrate production method and a composition for forming a resist underlayer film that make it possible to form a resist underlayer film capable of exhibiting excellent pattern rectangularity and pattern defect suppression when forming a resist pattern. The semiconductor substrate production method comprises: a step in which a substrate is directly or indirectly coated with the composition for forming a resist underlayer film; a step in which a resist film is formed on the resist underlayer film formed by the step in which coating is performed with the composition for forming a resist underlayer film; a step in which the resist film is exposed to radiation; and a step in which at least the exposed resist film is developed. The composition for forming a resist underlayer film contains a polymer and a solvent. The polymer includes a repeating unit (1) represented by formula (1). (In formula (1), R1represents a hydrogen atom or a substituted or unsubstituted monovalent hydrocarbon group having 1-20 carbon atoms. L1represents a single bond or a divalent linking group. R2 is a monovalent group containing an atom selected from the group consisting of silicon, zinc, aluminum, germanium, tin, titanium, zirconium, and hafnium.)
G03F 7/11 - Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
C08F 30/04 - Homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal
An organometallic precursor solution comprising an organic solvent, a radiation sensitive organometallic precursor composition with hydrolysable metal ligands, and a radical scavenger additive is described. The radical scavenger additive or a blend of radical scavenger additives can provide for improvements to the stability of an organometallic precursor solution, such as improvements to storage stability, shelf-life, and/or batch-to-batch reproducibility through mitigation of the effects of reactive compounds in the environment, such as oxygen. A structure having a substrate, a radiation patternable organometallic coating composition, and a radical scavenging additive is also described. The radical scavenger additive or a blend thereof can result in patterning improvements, such as by improving coating quality and reducing patterning variability. Methods of using a radical scavenging additive in the formation of a structure comprising a radiation patternable organometallic film are described. Methods of producing a container of a stabilized organometallic precursor composition are also described.
A composition includes a compound including an iodine atom, and a solvent. The compound including an iodine atom is a polymer including a repeating unit represented by formula (1), an aromatic ring-containing compound including an iodine atom and having a molecular weight of 750 or more and 3,000 or less, or a combination thereof. A content ratio of the compound including an iodine atom to components other than the solvent in the composition for forming an underlayer film is 50% by mass or more. In the formula (1), Ar1 is a divalent group including an aromatic ring having 5 to 40 ring atoms; and R0 is a hydrogen atom or a monovalent organic group having 1 to 40 carbon atoms, R1 is a monovalent organic group having 1 to 40 carbon atoms, and at least one of Ar1, R0 or R1 includes an iodine atom.
A composition includes a compound including an iodine atom, and a solvent. The compound including an iodine atom is a polymer including a repeating unit represented by formula (1), an aromatic ring-containing compound including an iodine atom and having a molecular weight of 750 or more and 3,000 or less, or a combination thereof. A content ratio of the compound including an iodine atom to components other than the solvent in the composition for forming an underlayer film is 50% by mass or more. In the formula (1), Ar1 is a divalent group including an aromatic ring having 5 to 40 ring atoms; and R0 is a hydrogen atom or a monovalent organic group having 1 to 40 carbon atoms, R1 is a monovalent organic group having 1 to 40 carbon atoms, and at least one of Ar1, R0 or R1 includes an iodine atom.
G03F 7/11 - Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
H01L 21/027 - Making masks on semiconductor bodies for further photolithographic processing, not provided for in group or
H01L 21/308 - Chemical or electrical treatment, e.g. electrolytic etching using masks
42.
METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE, COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, AND METHOD FOR PRODUCING NITROGEN-CONTAINING COMPOUND
Provided are: a method for manufacturing a semiconductor substrate using a composition capable of forming a film excellent in embedding properties and flatness; a composition for forming a resist underlayer film; and a method for producing a nitrogen-containing compound. This method for manufacturing a semiconductor substrate includes: a step for directly or indirectly coating a substrate with a composition for forming a resist underlayer film; a step for forming a resist pattern directly or indirectly on the resist underlayer film formed by the coating step; and a step for performing etching using the resist pattern as a mask. The composition for forming a resist underlayer film contains a nitrogen-containing compound and a solvent. The nitrogen-containing compound includes a substructure represented by formula (1). (In formula (1), Ar1 is a substituted or unsubstituted aromatic ring having 5-40 rings and containing the carbon-carbon double bond in the formula. Each * is a bond with another structure in the nitrogen-containing compound.)
G03F 7/11 - Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
Provided is a method for producing an aliphatic polyester resin composition by heating and kneading an aliphatic polyester resin and a nitrogen compound, wherein the solubility of the nitrogen compound in water at 20℃ is 50 g/100 mL or less. Also provided are: a method for producing an aliphatic polyester resin composition that makes it possible to obtain an aliphatic polyester resin composition having marine degradability and excellent durability to moisture; an aliphatic polyester resin composition; and a marine degradation accelerator.
C08K 5/32 - Compounds containing nitrogen bound to oxygen
C08K 5/521 - Esters of phosphoric acids, e.g. of H3PO4
C08K 5/523 - Esters of phosphoric acids, e.g. of H3PO4 with hydroxyaryl compounds
C08L 67/00 - Compositions of polyesters obtained by reactions forming a carboxylic ester link in the main chainCompositions of derivatives of such polymers
C08L 101/16 - Compositions of unspecified macromolecular compounds the macromolecular compounds being biodegradable
44.
EXPANDED BEAD PRODUCTION METHOD, AND EXPANDED BEADS
A method for producing expanded beads having a bulk density of 10 to 240 kg/m3, the method including expanding resin particles containing a mixed resin of at least two linear low-density polyethylenes as a base resin, wherein the mixed resin contains polyethylene A having a biomass degree of 50% or more and a melt flow rate (MFR) of 0.1 to 3 g/10 min and polyethylene B; a difference between the MFR of A and the MFR of B is 0 to 2 g/10 min; a mass ratio of A to B is 5/95 to 95/5; the mixed resin has a biomass degree of 5% or more; the expanded bead has a crystal structure where a melting peak intrinsic to the linear low-density polyethylene and a high-temperature peak on a higher temperature side appear on a DSC curve; and a heat of fusion at the high-temperature peak is 10 to 50 J/g.
A radiation-sensitive composition containing: a polymer that undergoes a change in solubility in a developing solution when subjected to the action of an acid; and a compound represented by formula (1).
C07C 65/21 - Compounds having carboxyl groups bound to carbon atoms of six-membered aromatic rings and containing any of the groups OH, O-metal, —CHO, keto, ether, groups, groups, or groups containing ether groups, groups, groups, or groups
C08F 212/14 - Monomers containing only one unsaturated aliphatic radical containing one ring substituted by hetero atoms or groups containing hetero atoms
C08F 220/18 - Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
Provided are a diffractive optical element that is thin and highly amenable to mass production, and that has high light condensing performance and is applicable to fine pixel pitch, and a method for manufacturing the diffractive optical element. The diffractive optical element causes diffraction of incident light in a wavelength range of 410-1,100 nm, and comprises: a substrate that transmits incident light; and a light shielding resin layer that forms unevenness on the main surface of the substrate and forms a diffraction pattern that is substantially concentric when viewed in a direction orthogonal to the main surface of the substrate, the light shielding resin layer being formed by a curable resin composition and shielding at least some wavelengths of light in the incident light.
An organometallic precursor solution comprising an organic solvent, a radiation sensitive organometallic precursor composition with hydrolysable metal ligands, and a radical scavenger additive is described. The radical scavenger additive or a blend of radical scavenger additives can provide for improvements to the stability of an organometallic precursor solution, such as improvements to storage stability, shelf-life, and/or batch-to-batch reproducibility through mitigation of the effects of reactive compounds in the environment, such as oxygen. A structure having a substrate, a radiation patternable organometallic coating composition, and a radical scavenging additive is also described. The radical scavenger additive or a blend thereof can result in patterning improvements, such as by improving coating quality and reducing patterning variability. Methods of using a radical scavenging additive in the formation of a structure comprising a radiation patternable organometallic film are described. Methods of producing a container of a stabilized organometallic precursor composition are also described.
This wiring board comprises a barrier film disposed directly or indirectly on a substrate including copper wiring, and the barrier film contains flaky titanium oxide or a flaky titanium-metal composite oxide.
H01L 21/768 - Applying interconnections to be used for carrying current between separate components within a device
H01L 23/532 - Arrangements for conducting electric current within the device in operation from one component to another including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body characterised by the materials
49.
RADIATION-SENSITIVE COMPOSITION, PATTERN FORMATION METHOD, POLYMER, AND COMPOUND
The purpose of the present invention is to provide a radiation-sensitive composition and a pattern formation method that enable formation of a resist film that, when a next-generation technology is applied, can exhibit sufficient levels of sensitivity and CDU and suppress development defects. Another purpose of the present invention is to provide a polymer and a compound applicable to the radiation-sensitive composition. The present invention relates to a radiation-sensitive composition containing a solvent and a polymer containing a structural unit (I) having an acid-dissociable group and a structural unit (II) represented by formula (1). (In the formula (1), R1is a hydrogen atom, a fluorine atom, a methyl group, or a trifluoromethyl group. R2is a divalent organic group having 1 to 50 carbon atoms. Z is an amide bond. R3is a single bond or an organic group having 1 to 5 carbon atoms. Rf1and Rf2are each independently a hydrogen atom, a fluorine atom, or a fluorinated hydrocarbon group, and at least one thereof is a fluorine atom or a fluorinated hydrocarbon group. When there are multiple Rf1s and multiple Rf2s, the multiple Rf1s and the multiple Rf2s are each the same or different. n is an integer of 1 to 3. M+ is a monovalent onium cation.)
C07C 309/17 - Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing carboxyl groups bound to the carbon skeleton
The purpose of the present invention is to provide: a photosensitive composition which has a high refractive index, has little change in viscosity and resolution even after a certain period of time has elapsed, has excellent storage stability, does not solidify when a coating slit nozzle or the like is used, has good coating properties over time, and has high resolution; a cured film which is formed from the photosensitive composition, and a method for producing the cured film; a display element which is provided with the cured film; and an imaging element which is provided with the cured film. The present invention relates to a photosensitive composition for forming an optical member, the photosensitive composition containing: (A) particles which each have a reactive group, an acidic group that is different from the reactive group, and at least one group that is selected from the group consisting of an oxygen atom-containing or oxygen atom-free alkyl group having 2-30 carbon atoms and an oxygen atom-containing or oxygen atom-free alkylene group having 2-30 carbon atoms; (B) a radically polymerizable compound; and (C) a photoradical generator.
A radiation-sensitive resin composition includes a solvent and a resin including a structural unit A which includes an acid-dissociable group and a structural unit D which includes an aromatic ring. The aromatic ring has a phenolic hydroxy group and an alkyl group which is adjacent to the phenolic hydroxy group. The radiation-sensitive resin composition satisfies Condition 1 and/or Condition 2. Condition 1: the resin further includes a structural unit B which includes an organic acid anion moiety and an onium cation moiety including an aromatic ring structure having a fluorine atom. Condition 2: the radiation-sensitive resin composition further includes an onium salt which includes an organic acid anion moiety and an onium cation moiety including an aromatic ring structure having a fluorine atom.
G03F 7/038 - Macromolecular compounds which are rendered insoluble or differentially wettable
C08F 220/18 - Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
C08F 220/28 - Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety
G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
A radiation-sensitive composition includes a polymer including: an acid-labile side chain including an acid-labile group; and an iodo group-containing side chain including two or more iodo groups and one or more radiation-sensitive onium cation structure(s). A method of forming a resist pattern includes: applying the radiation-sensitive composition directly or indirectly on a substrate to form a resist film; exposing the resist film; and developing the resist film exposed. A polymer includes: an acid-labile side chain including an acid-labile group; and an iodo group-containing side chain including two or more iodo groups and one or more radiation-sensitive onium cation structure(s). A monomer is a vinyl compound including two or more iodo groups and one or more radiation-sensitive onium cation structure(s).
C07C 309/12 - Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing oxygen atoms bound to the carbon skeleton containing esterified hydroxy groups bound to the carbon skeleton
C07C 321/30 - Sulfides having the sulfur atom of at least one thio group bound to two carbon atoms of six-membered aromatic rings
C07C 323/09 - Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and halogen atoms, or nitro or nitroso groups bound to the same carbon skeleton having sulfur atoms of thio groups bound to carbon atoms of six-membered aromatic rings of the carbon skeleton
C08F 212/14 - Monomers containing only one unsaturated aliphatic radical containing one ring substituted by hetero atoms or groups containing hetero atoms
C08F 220/18 - Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
Provided are: a radiation-sensitive composition which exhibits excellent sensitivity and CDU when a pattern is formed, and which exhibits good storage stability; and a method for forming a pattern. This radiation-sensitive composition contains: a polymer containing a structural unit (I) having an acid-dissociable group; a radiation-sensitive acid generator which contains a second organic acid anion and a second onium cation that is free from the second organic acid anion and which, upon exposure to light, generates an acid that dissociates the acid-dissociable group; an acid diffusion control agent which contains a third organic acid anion and a third onium cation that is free from the third organic acid anion and which, upon exposure to light, generates an acid that does not dissociate the acid-dissociable group; and a solvent. The radiation-sensitive acid generator contains a compound represented by formula (1). The polymer includes, at least, a first organic acid anion and an iodonium cation that is free from the first organic acid anion and includes a structural unit (II) that includes an acid-generating structure which, upon exposure to light, generates an acid that dissociates the acid-dissociable group, or at least a part of the second onium cation or the third onium cation is an iodonium cation. [Chemical formula 1] In formula (1), W is a 5- to 20-membered aromatic ring having a valency of (p+q+1). In a case where multiple W moieties are present, the multiple W moieties may be the same as, or different from, each other. L is a linking group having a valency of (r+1). r is an integer between 1 and 3. p is an integer between 0 and 3. In a case where multiple p values occur, the multiple p values may be the same as, or different from, each other. q is an integer between 1 and 3. In a case where multiple q values occur, the multiple q values may be the same as, or different from, each other. M+ is a monovalent onium cation.
C07C 25/00 - Compounds containing at least one halogen atom bound to a six-membered aromatic ring
C07C 309/12 - Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing oxygen atoms bound to the carbon skeleton containing esterified hydroxy groups bound to the carbon skeleton
C07C 309/17 - Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing carboxyl groups bound to the carbon skeleton
C07D 317/24 - Radicals substituted by singly bound oxygen or sulfur atoms esterified
C07D 317/30 - Radicals substituted by carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals
C07D 317/70 - Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms having the hetero atoms in positions 1 and 3 ortho- or peri-condensed with carbocyclic rings or ring systems condensed with ring systems containing two or more relevant rings
C08F 212/14 - Monomers containing only one unsaturated aliphatic radical containing one ring substituted by hetero atoms or groups containing hetero atoms
A method for producing a geopolymer foam, comprising obtaining a reaction slurry containing aluminosilicate, alkali metal silicate, aggregate, and water, adding a foaming agent to the reaction slurry to form a foaming slurry, and heating the foaming slurry, wherein the aggregate used is mica with an average particle size of 50 to 500 μm and a volume fraction (X) of particles with a particle size of 10 μm or less of 3% or less, and wherein the viscosity of the reaction slurry at 23° C. is 3000 to 15000 mPa·s.
C04B 28/00 - Compositions of mortars, concrete or artificial stone, containing inorganic binders or the reaction product of an inorganic and an organic binder, e.g. polycarboxylate cements
A method for forming a resist pattern, includes: forming a metal-containing resist film directly or indirectly on a substrate; laminating a protective film on the metal-containing resist film by applying a composition for forming a protective film; exposing to light the metal-containing resist film on which the protective film is laminated; and removing a portion of the exposed metal-containing resist film to form a pattern.
G03F 7/09 - Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
G03F 7/11 - Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
G03F 7/32 - Liquid compositions therefor, e.g. developers
56.
RADIATION-SENSITIVE COMPOSITION, RESIST PATTERN FORMATION METHOD, POLYMER, AND COMPOUND
A polymer containing a structural unit represented by formula (1) is included in this radiation-sensitive composition. In formula (1), R1is a hydrogen atom, a fluoro group, a methyl group, or a trifluoromethyl group. Ar1is a group obtained by removing (a+2) hydrogen atoms from an aromatic ring. R233 -or COO-. Provided that, R2is bonded to an atom adjacent to the bonding site with the main chain or is bonded to an atom also adjacent to an atom adjacent to the bonding site with the main chain among the atoms constituting the aromatic ring in Ar1. R3is a substituent. Mb+ is a b-valent cation.
An expanded bead containing a linear low-density polyethylene as a base resin, wherein the linear low-density polyethylene has a biomass degree of 40% or more as measured according to ASTM D 6866; the expanded bead has a crystal structure where a melting peak intrinsic to the linear low-density polyethylene (intrinsic peak) and at least one melting peak on a higher temperature side than the intrinsic peak (high-temperature peak) appear on a DSC curve drawn by heating the expanded bead from 23° C. to 200° C. at a heating rate of 10° C./min; a total heat of fusion of the expanded bead is 70 J/g or more and 100 J/g or less; and a heat of fusion at the high-temperature peak is 10 J/g or more and 50 J/g or less.
Provided are: a radiation-sensitive composition capable of exhibiting sensitivity, CDU, LWR, water repellency, and development defect suppression at sufficient levels during pattern formation, while reducing fluorine in a surface modifier; a pattern forming method; and a compound. This radiation-sensitive composition comprises: a first polymer including a structural unit (I) having an acid dissociable group; a second polymer including a structural unit (i) derived from a compound represented by formula (F1); and a solvent. (In formula (F1): W is a polymerizable group; L is a single bond or an (n+1)-valent linking group; R1is a divalent hydrocarbon group having 1-10 carbon atoms; X1, X2, and X3are each independently a hydrogen atom or a fluorine atom, provided that at least one selected from the group consisting of X1, X2, and X3is a fluorine atom; n is an integer from 1 to 3, provided that when L is a single bond, n is 1; and when n is 2 or more, each of the multiple R1s, X1s, X2s, and X3s are the same or different from one another.)
The purpose of the present invention is to provide: a radiation-sensitive composition capable of forming a resist film that can exhibit sensitivity, LWR, DOF, EL, PED, CDU, and pattern circularity at sufficient levels; and a pattern formation method. The purpose of the present invention is also to provide a radiation-sensitive acid generator that can be applied to said radiation-sensitive composition. The radiation-sensitive composition comprises a polymer (A) containing a structural unit (I) having an acid-dissociable group, and a solvent (E), wherein at least the radiation-sensitive composition contains a radiation-sensitive acid generator (B) containing a partial structure represented by formula (a), or the polymer (A) contains a structural unit (VII) containing a partial structure represented by formula (a). (In formula (a): R1is a hydrogen atom, a nitro group, a hydroxy group, a cyano group, a carboxy group, a thiol group, or a monovalent fluorine-free organic group; when there are multiple R1s, the multiple R1s are the same or different from one another; R2and R3are each independently a hydrogen atom, a nitro group, a hydroxy group, a cyano group, a carboxy group, a thiol group, a halogen atom, or a monovalent organic group, or form a divalent alicyclic group which has 3 to 20 carbon atoms and which is formed from R2and R3combined with each other together with carbon atoms binding thereto; when there are multiple R2s and multiple R3s, the multiple R2s and the multiple R3s are the same or different from one another; L is *-C(=O)O-, *-C(=O)NR5-, or *-OC(=O)O-; R5is a hydrogen atom or a monovalent hydrocarbon group having 1-10 carbon atoms; * represents a bonding site on the R41side; R41is a divalent organic group having a cyclic structure and having a hetero atom; m is an integer of 1-5; n is an integer of 0-4; ** is a bonding site with the other moiety of the corresponding polymer (A) or radiation-sensitive acid generator (B); and M+ is a monovalent onium cation.)
C07C 309/12 - Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing oxygen atoms bound to the carbon skeleton containing esterified hydroxy groups bound to the carbon skeleton
C07D 209/42 - Carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals
C07D 211/62 - Carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals attached in position 4
C07D 295/15 - Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals with the ring nitrogen atoms and the carbon atoms with three bonds to hetero atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings to an acyclic saturated chain
C07D 305/06 - Heterocyclic compounds containing four-membered rings having one oxygen atom as the only ring hetero atoms not condensed with other rings having no double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to the ring atoms
C07D 307/00 - Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom
C07D 317/08 - Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms having the hetero atoms in positions 1 and 3
C07D 321/10 - Seven-membered rings condensed with carbocyclic rings or ring systems
C07D 327/08 - [b, e]-condensed with two six-membered carbocyclic rings
C07D 333/38 - Carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals
C07D 333/46 - Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings substituted on the ring sulfur atom
C07D 333/54 - Benzo [b] thiophenesHydrogenated benzo [b] thiophenes with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to carbon atoms of the hetero ring
C07D 335/02 - Heterocyclic compounds containing six-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings
C07D 407/12 - Heterocyclic compounds containing two or more hetero rings, at least one ring having oxygen atoms as the only ring hetero atoms, not provided for by group containing two hetero rings linked by a chain containing hetero atoms as chain links
The purpose of the present invention is to provide a radiation-sensitive composition whereby it is possible to form a resist film capable of exhibiting sensitivity, LWR, MEEF, CDU, development defect performance, pattern rectangularity, and pattern circularity at adequate levels, and a pattern formation method. Another purpose of the present invention is to provide a radiation-sensitive acid generation agent that can be applied to the radiation-sensitive composition. This radiation-sensitive composition contains: a polymer (A) including a structural unit (I) with an acid-dissociable group; a radiation-sensitive acid generation agent (B) represented by formula (1); and a solvent (E). Chemical Formula 1 (In formula (1), R1is a hydrogen atom, a nitro group, a hydroxyl group, a cyano group, a carboxy group, a methyl group, or an ethyl group. When there are a plurality of R1, the plurality of R1are each the same or different from each other. R2and R3are each independently a hydrogen atom, a nitro group, a hydroxyl group, a cyano group, a carboxy group, a thiol group, a halogen atom, a monovalent organic group, or a divalent alicyclic group that has 3 to 20 carbon atoms and is formed together with carbon atoms bonding together R2and R3when combined. When there are a plurality of R2and R3, the plurality of R2and R3are the same or different from each other. L is a divalent linking group. R4is a monovalent linear organic group having 3 or more carbon atoms or a monovalent branched organic group having 5 or more carbon atoms. m is an integer of 1 to 5. n is an integer of 0 to 4. M+ is a monovalent onium cation.)
C07C 309/12 - Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing oxygen atoms bound to the carbon skeleton containing esterified hydroxy groups bound to the carbon skeleton
C07C 309/17 - Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing carboxyl groups bound to the carbon skeleton
C07D 327/08 - [b, e]-condensed with two six-membered carbocyclic rings
C07D 333/46 - Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings substituted on the ring sulfur atom
C07D 333/54 - Benzo [b] thiophenesHydrogenated benzo [b] thiophenes with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to carbon atoms of the hetero ring
C07D 335/02 - Heterocyclic compounds containing six-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings
A method for producing polypropylene-based resin expanded beads includes dispersion, blowing agent impregnation, and foaming steps. Beads used in the dispersion step include a core layer having a polypropylene-based resin as a base material resin, and a fusion-bonding layer covering core layer; the beads fusion-bonding layer includes carbon black and a NOR-type hindered amine; a carbon black blending ratio is adjusted to 0.5 wt % or more and 5 wt % or less; and an amine blending ratio of the beads is adjusted to 0.03 wt % or more and 0.5 wt % or less; the polypropylene-based resin expanded beads have a surface on which a fusion-bonding layer is located; the fusion-bonding layer includes the carbon black and hindered amine; a carbon black blending ratio is 0.5 wt % or more and 5 wt % or less; and a blending ratio of the hindered amine is 0.03 wt % or more and 0.5 wt % or less.
The present invention provides a radiation-sensitive composition that makes it possible to exhibit satisfactory levels of sensitivity, CDU, LWR, water repellency, and development defect suppression performance in pattern formation while achieving reduction in fluorine in a surface modifier, a pattern formation method, and a compound. This radiation-sensitive composition contains: a first polymer including a structural unit (I) having an acid-dissociable group; a second polymer including a structural unit (i) derived from a compound represented by formula (F1); and a solvent. (In formula (F1), W is a polymerizable group. L111+1)-valent linking group. When L122H is –COO-*22H side. Note that L111 is an integer from 1 to 3.)
Provided are a radiation-sensitive composition, a pattern formation method, and a compound, which are capable of exhibiting sufficient levels of development defect suppression, water repellency, LWR, CDU, and sensitivity when forming a pattern, while reducing fluorine in a surface modifier. This radiation-sensitive composition contains: a first polymer including a structural unit (I) having an acid dissociable group; a second polymer including a structural unit (i) derived from a compound represented by formula (F1); and a solvent. (In formula (F1), W represents a polymerizable group. n represents 0 or 1. When n represents 0, L represents a linking group having a valance of (m+1) and having one or more carbon atoms. When n represents 1, L represents a linking group having a valance of (m+1) and having three or more carbon atoms. m represents an integer of 1-3. When m represents 2, L represents a trivalent linking group having four or more carbon atoms.)
To provide a radiation-sensitive composition and a pattern forming method capable of exhibiting sensitivity, pattern rectangularity, pattern circularity, exposure margin, focal depth, development defect suppression property, LWR and CDU at sufficient levels when forming a resist pattern, and having good storage stability. A radiation-sensitive composition contains an onium salt compound represented by formula (1), a polymer, and a solvent. In formula (1), Rfis a halogen atom or a cyano group. n is an integer of 0 to 4. When n is 2 or more, multiple Rfgroups are the same or different from each other. R1is a monovalent organic group having 1 to 20 carbon atoms, a hydrogen atom, a halogen atom, a cyano group or a fluorinated alkyl group that binds to a carbon atom to which R1is bonded via *-COO-, *-OCO-, *22-, *-S-, *-CO-, *-O-CO-O-, *-CONR'- or *-NR'CO-. Each R' independently is a hydrogen atom or a monovalent hydrocarbon group having 1 to 10 carbon atoms. *is a bond with a carbon atom to which R1is bonded. Provided that, when n is 0, R1is a halogen atom or a cyano group. R2is a hydroxy group, a nitro group, an amino group, a carboxy group, or a monovalent organic group having 1 to 20 carbon atoms. m is an integer of 0 to 4. When m is 2 or more, multiple R222-. Provided that when X is a methylene group, the aromatic ring of Ar is directly bonded to S+in the formula, and R1does not include a polymerizable group. R41, R42, R43, R44, R45and R48are each independently a hydrogen atom, a hydroxy group, a halogen atom or a monovalent organic group having 1 to 20 carbon atoms. R46and R47are each independently a hydrogen atom, a hydroxy group, a halogen atom, or a monovalent organic group having 1 to 20 carbon atoms, or R46and R47 are combined to represent a ring structure having 3 to 10 ring members together with two carbon atoms to which they are bonded.
C07C 309/39 - Sulfonic acids having sulfo groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton containing halogen atoms bound to the carbon skeleton
C07C 309/42 - Sulfonic acids having sulfo groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton containing singly-bound oxygen atoms bound to the carbon skeleton having the sulfo groups bound to carbon atoms of non-condensed six-membered aromatic rings
C07C 309/48 - Sulfonic acids having sulfo groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton containing nitrogen atoms, not being part of nitro or nitroso groups, bound to the carbon skeleton the carbon skeleton being further substituted by halogen atoms
C07C 309/58 - Carboxylic acid groups or esters thereof
C07C 317/14 - SulfonesSulfoxides having sulfone or sulfoxide groups bound to carbon atoms of six-membered aromatic rings
C07D 307/00 - Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom
C07D 307/33 - Oxygen atoms in position 2, the oxygen atom being in its keto or unsubstituted enol form
C07D 317/18 - Radicals substituted by singly bound oxygen or sulfur atoms
C07D 409/04 - Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings directly linked by a ring-member-to-ring- member bond
C07D 409/06 - Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings linked by a carbon chain containing only aliphatic carbon atoms
C08F 212/14 - Monomers containing only one unsaturated aliphatic radical containing one ring substituted by hetero atoms or groups containing hetero atoms
The purpose of the present invention is to provide: a radiation-sensitive composition with which it is possible to form a resist film capable of exhibiting sensitivity, LWR, pattern rectangularity, CDU, pattern circularity, and development defect performance at sufficient levels; and a pattern formation method. Additionally, the purpose of the present invention is to provide a radiation-sensitive acid generator that can be applied to the radiation-sensitive composition. This radiation-sensitive composition contains a polymer (A) that contains a structural unit (I) having an acid-dissociable group, a radiation-sensitive acid generator (B) that is represented by formula (1), and a solvent (E). Formula (1) (In formula (1), R1is a hydrogen atom, a nitro group, a hydroxyl group, a cyano group, a carboxy group, a thiol group, a halogen atom, or a monovalent organic group. When there are multiple R1, the R1are each the same or different. R2is a C1-40 monovalent organic group. m1 is an integer from 1 to 5. M+ is a monovalent onium cation.)
C07C 309/03 - Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton
C07C 309/17 - Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing carboxyl groups bound to the carbon skeleton
C07D 327/08 - [b, e]-condensed with two six-membered carbocyclic rings
C07D 333/46 - Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings substituted on the ring sulfur atom
Provided are polyolefin-based resin foamed particles with which it is possible to easily mold a polyolefin-based resin foamed particle molded article exhibiting high flame retardancy as well as exceptional fusion properties and surface properties. These polyolefin-based resin foamed particles comprise a foam layer. The foam layer contains a base material resin, a phosphonic-acid-ester-based compound, and a NOR-type hindered-amine-based compound. The base material resin is configured from a polyolefin-based resin. The blending amount of the phosphonic-acid-ester-based compound in the foam layer is 5-25 parts by mass per 100 parts by mass of the base material resin. The blending amount of the NOR-type hindered-amine-based compound in the foam layer is 0.3-5 parts by mass per 100 parts by mass of the base material resin. The closed cell ratio of the foamed particles is 60% or greater.
A method for producing foamable polyamide-based resin particles according to the present invention includes impregnating polyamide-based resin particles with an inorganic physical foaming agent in a gas phase, wherein the polyamide-based resin particles have a water content of at least 2.5 mass % and contain 0.5-10 mass % of carbon black. Foamed polyamide-based resin particles are obtained by heating and foaming the foamable polyamide resin particles.
The present invention provides a method for easily producing a chromatographic carrier that has a high dynamic binding capacity to antibodies or fragments thereof, inhibits the leakage of protein ligands during isolation, and inhibits the aggregation of carriers. Provided is a production method for a chromatographic carrier comprising the ligand binding step, ligand-bound carrier bed forming step, ligand-bound carrier flushing and cleaning step, and ligand-bound carrier stirring and cleaning step described hereafter. Ligand binding step: a step in which a protein ligand is bound to a solid phase carrier. Ligand-bound carrier bed forming step: a step in which a container is filled with the ligand-bound carrier obtained in the ligand binding step to form a ligand-bound carrier bed. Ligand-bound carrier flushing and cleaning step: a step in which the ligand-bound carrier bed formed in the ligand-bound carrier bed forming step is cleaned one or more times by flushing the bed with a cleaning liquid. Ligand-bound carrier stirring and cleaning step: a step in which the ligand-bound carrier after the ligand-bound carrier flushing and cleaning step is cleaned one or more times by stirring in a cleaning liquid.
Provided are a radiation-sensitive composition capable of exhibiting sufficient levels of sensitivity, CDU performance, and development defect suppression property during pattern formation while achieving a reduction of fluorine in a surface modifier, and a pattern formation method. The radiation-sensitive composition comprises: a first polymer having a structural unit containing an acid-dissociable group; a second polymer different from the first polymer; at least one selected from the group consisting of a radiation-sensitive acid generator containing an iodine group, and an acid diffusion control agent containing an iodine group; and a solvent. The content ratio of the second polymer to the total mass of the first polymer and the second polymer is 0.1-20 mass% inclusive. The second polymer includes a partial structure represented by formula (i), and has a structural unit (B1) not containing a fluorine atom. (In formula (i), R1, R2, and R3 are each independently an alkyl group having 1 to 10 carbon atoms, and * is a bond to a structure other than the partial structure in the structural unit (B1).)
G03F 7/039 - Macromolecular compounds which are photodegradable, e.g. positive electron resists
C08F 12/14 - Monomers containing only one unsaturated aliphatic radical containing one ring substituted by hetero atoms or groups containing hetero atoms
The purpose of the present invention is to provide: a radiation-sensitive composition capable of forming a resist film that can exhibit sensitivity and CDU at satisfactory levels when next-generation technology is applied and can suppress development defects; and a pattern formation method. The purpose of the present invention is also to provide a radiation-sensitive acid generator that can be applied to said radiation-sensitive composition. The present invention relates to a radiation-sensitive composition containing: a polymer (A) containing a structural unit (I) having an acid-dissociable group; a radiation-sensitive acid generator (B) represented by formula (1); and a solvent (C). (In formula (1): A is an (n1+n2+n3+1)-valent aromatic ring; R1is a nitro group, a cyano group, a hydroxy group, an amino group, or a monovalent organic group; when there are multiple R1s, the multiple R1s are the same or different from one another; n1 is an integer of 1-5; n2 is an integer of 1-5; n3 is an integer of 0-5; m2 is an integer of 1-3; L is a single bond or an (m2+1)-valent linking group; Rf1and Rf2are each independently a fluorine atom or a monovalent fluorinated hydrocarbon group having 1-20 carbon atoms; Rf3and Rf4are each independently a hydrogen atom, a fluorine atom, a monovalent hydrocarbon group having 1-20 carbon atoms, or a monovalent fluorinated hydrocarbon group having 1-20 carbon atoms; when there are multiple Rf3s and multiple Rf4s, the multiple Rf3s and the multiple Rf4s may each be the same or different from one another; m1 is an integer of 0-10; and M+ is a monovalent onium cation.
C07C 309/11 - Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing oxygen atoms bound to the carbon skeleton containing etherified hydroxy groups bound to the carbon skeleton with the oxygen atom of at least one of the etherified hydroxy groups further bound to a carbon atom of a six-membered aromatic ring
C07D 317/70 - Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms having the hetero atoms in positions 1 and 3 ortho- or peri-condensed with carbocyclic rings or ring systems condensed with ring systems containing two or more relevant rings
The present invention provides a method for easily producing a chromatographic carrier that has a high dynamic binding capacity to antibodies or fragments thereof, inhibits the leakage of protein ligands during isolation, and inhibits the aggregation of carriers. Provided is a production method for a chromatographic carrier comprising the solid phase carrier cleaning step, ligand binding step, and ligand-bound carrier cleaning step described hereafter. Solid phase carrier cleaning step: a step in which a solid phase carrier is cleaned using at least one cleaning liquid selected from cleaning liquids containing hydrogen peroxide, cleaning liquids containing peracetic acid, and cleaning liquids (other than cleaning liquids containing hydrogen peroxide and cleaning liquids containing peracetic acid) having a pH of 0-3 or a pH of higher than 12.5 to 14, and the surface of the solid phase carrier is made hydrophilic. Ligand binding step: a step in which a protein ligand is bound to the solid phase carrier cleaned in the solid phase carrier cleaning step. Ligand-bound carrier cleaning step: a step in which the carrier obtained in the ligand binding step is cleaned.
What is provided is a therapeutic agent that is effective for the treatment of ovarian clear cell carcinoma. A therapeutic agent for ovarian clear cell carcinoma includes, as an active ingredient, a proteasome inhibitor. Furthermore, in the therapeutic agent for ovarian clear cell carcinoma, the proteasome inhibitor is a substance that reversibly or irreversibly binds to a 20s proteasome-β5 subunit and inhibits a chymotrypsin-like activity. Moreover, in the therapeutic agent for ovarian clear cell carcinoma, the proteasome is a 26s proteasome. In addition, in the therapeutic agent for ovarian clear cell carcinoma, a content proportion of the proteasome inhibitor is 80% by mass or more, 90% by mass or more, or 100% by mass.
Provided are a radiation-sensitive composition which has excellent sensitivity and CDU and good storage stability, and a pattern formation method. This radiation-sensitive composition comprises a polymer which contains a structural unit (I) that has an acid-dissociable group, an acid diffusion control agent which includes a third organic acid anion and a third onium cation and which, when exposed to light, generates an acid that does not dissociate the acid-dissociable group, and a solvent, wherein at least: the polymer includes a structural unit (II) which has a first organic acid anion and an iodonium cation and which includes an acid generation structure that, when exposed to light, generates an acid that dissociates the acid-dissociable group; the radiation-sensitive composition contains a radiation-sensitive acid generation agent which contains a second organic acid anion and an iodonium cation and which, when exposed to light, generates an acid that dissociates the acid-dissociable group; or the third onium cation is an iodonium cation, the third organic acid anion of the acid diffusion control agent includes an aromatic ring, -COO-is bound to one of the ring-forming atoms of the aromatic ring, -OH is bound to each of two ring-forming atoms which are adjacent to the one ring-forming atom, and the solvent includes a compound represented by formula (H). (In formula (H), R1to R3 are each independently a substituted or unsubstituted C1-20 monovalent aliphatic hydrocarbon group.)
One embodiment of the present invention pertains to a resin composition, a cured object, or an electronic component. The resin composition contains: a polymer (A) having a structural unit represented by formula (a1-1); and a hydrogenated styrene-based thermoplastic elastomer (B). In formula (a1-1), Ra1represents a divalent group represented by formula (a2), and Ra2represents a substituted or unsubstituted divalent aromatic heterocyclic group. In formula (a2), Ara1and Ara2each independently represent a substituted or unsubstituted aromatic hydrocarbon group, L represents a single bond, -O-, -S-, -N(R822-, -P(O)-, or a divalent organic group, y represents an integer of 0-5, and Ra6and Ra7 each independently represent a single bond, a methylene group, or an alkylene group having 2-4 carbon atoms.
C08L 71/10 - Polyethers derived from hydroxy compounds or from their metallic derivatives from phenols
C08G 65/40 - Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives derived from phenols from phenols and other compounds
POLYOLEFIN-BASED RESIN FOAM PARTICLE, FOAM PARTICLE MOLDED BODY OBTAINED BY IN-MOLD MOLDING OF SAID FOAM PARTICLE, METHOD FOR PRODUCING SAID FOAM PARTICLE, AND METHOD FOR ASSESSING FLAME RETARDANCY OF SAID FOAM PARTICLE
215235215tot215235 to t to t is a numerical value that indicates the mass percentage of phosphorus in the foam particle, and falls within the range 0.001-0.06.
A method for producing a molded article of thermoplastic resin expanded beads that includes cracking filling and in-mold molding. The expanded beads have a columnar shape and a defective portion that is a through hole and/or a groove. A ratio Ca/A of an average cross-sectional area Ca per defective portion to an average cross-sectional area A of a cut surface of the expanded bead obtained by cutting the expanded bead at a center in an axial direction along a plane perpendicular to the axial direction is 0.01 or more and 0.20 or less, and a ratio Ct/A of a total cross-sectional area Ct of the defective portion to the average cross-sectional area A of the expanded bead is 0.02 or more and 0.20 or less. When the mold is completely closed, a filling rate F of the expanded beads is 125% or more and 220% or less.
B29C 44/34 - Component parts, details or accessoriesAuxiliary operations
B29C 44/02 - Shaping by internal pressure generated in the material, e.g. swelling or foaming for articles of definite length, i.e. discrete articles
B29C 44/44 - Feeding the material to be shaped into a closed space, i.e. to make articles of definite length in the form of expandable particles or beads
A method for producing a molded article of thermoplastic resin expanded beads includes a cracking filling step and an in-mold molding step. Expanded beads to be used in the cracking filling step each have a columnar shape and each have one or more defective portions of one or two kinds, the defective portions being selected from the group consisting of through holes and grooves. A molding cavity of a mold has a first portion having a length in an opening/closing direction of the mold greater than an average length LA and a second portion shorter than the average length LA. In the cracking filling step, a difference P2max−P1min between a minimum value P1min of the compression rate of the first portion and a maximum value P2max of the compression rate of the second portion is 5% or more and 100% or less.
B29C 39/00 - Shaping by casting, i.e. introducing the moulding material into a mould or between confining surfaces without significant moulding pressureApparatus therefor
B29C 39/10 - Shaping by casting, i.e. introducing the moulding material into a mould or between confining surfaces without significant moulding pressureApparatus therefor for making articles of definite length, i.e. discrete articles incorporating preformed parts or layers, e.g. casting around inserts or for coating articles
A radiation-sensitive composition contains a polymer having an acid-releasable group, and a compound represented by formula (1). In the formula (1), L1 represents a group having a (thio)acetal ring or the like. W1 represents a single bond or a (b+1)-valent organic group having 1 to 40 carbon atoms. R1, R2, and R3 each independently represent a hydrogen atom, a hydrocarbon group having 1 to 10 carbon atoms, a fluorine atom, or a fluoroalkyl group. Rf represents a fluorine atom or a fluoroalkyl group. a represents an integer of 0 to 8. b represents an integer of 1 to 4. d represents 1 or 2. When a represents 2 or more, a plurality of R1 are the same or different, and a plurality of R2 are the same or different. M+ represents a monovalent cation.
A radiation-sensitive composition contains a polymer having an acid-releasable group, and a compound represented by formula (1). In the formula (1), L1 represents a group having a (thio)acetal ring or the like. W1 represents a single bond or a (b+1)-valent organic group having 1 to 40 carbon atoms. R1, R2, and R3 each independently represent a hydrogen atom, a hydrocarbon group having 1 to 10 carbon atoms, a fluorine atom, or a fluoroalkyl group. Rf represents a fluorine atom or a fluoroalkyl group. a represents an integer of 0 to 8. b represents an integer of 1 to 4. d represents 1 or 2. When a represents 2 or more, a plurality of R1 are the same or different, and a plurality of R2 are the same or different. M+ represents a monovalent cation.
A radiation-sensitive composition includes: a first polymer comprising a structural unit (I) having an acid-dissociable group; a second polymer comprising a structural unit (i) represented by formula (f1); and a solvent. The acid-dissociable group has an iodo group. RK1 is a hydrogen atom, a fluorine atom, or the like; LY1 is a divalent hydrocarbon group having 1 to 10 carbon atoms; LY2 is —COO—* or —OCO—*, *is a bond on an Rf1 side; Rf1 is a monovalent hydrocarbon group having 1 to 10 carbon atoms or a monovalent fluorinated hydrocarbon group having 1 to 10 carbon atoms; Rf2 and Rf3 are each independently a fluorine atom or a monovalent fluorinated hydrocarbon group having 1 to 10 carbon atoms; s is an integer of 0 to 3, and when Rf1 is the monovalent hydrocarbon group having 1 to 10 carbon atoms, s is an integer of 1 to 3.
A radiation-sensitive composition includes: a first polymer comprising a structural unit (I) having an acid-dissociable group; a second polymer comprising a structural unit (i) represented by formula (f1); and a solvent. The acid-dissociable group has an iodo group. RK1 is a hydrogen atom, a fluorine atom, or the like; LY1 is a divalent hydrocarbon group having 1 to 10 carbon atoms; LY2 is —COO—* or —OCO—*, *is a bond on an Rf1 side; Rf1 is a monovalent hydrocarbon group having 1 to 10 carbon atoms or a monovalent fluorinated hydrocarbon group having 1 to 10 carbon atoms; Rf2 and Rf3 are each independently a fluorine atom or a monovalent fluorinated hydrocarbon group having 1 to 10 carbon atoms; s is an integer of 0 to 3, and when Rf1 is the monovalent hydrocarbon group having 1 to 10 carbon atoms, s is an integer of 1 to 3.
G03F 7/039 - Macromolecular compounds which are photodegradable, e.g. positive electron resists
C08L 25/18 - Homopolymers or copolymers of aromatic monomers containing elements other than carbon and hydrogen
C08L 33/06 - Homopolymers or copolymers of esters of esters containing only carbon, hydrogen, and oxygen, the oxygen atom being present only as part of the carboxyl radical
C08L 33/16 - Homopolymers or copolymers of esters containing halogen atoms
G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
An inorganic foam comprising an inorganic polymer having leucite crystal structure as a base material, the area of the peak derived from leucite crystal in the X-ray diffraction spectrum of the inorganic foam satisfies the following formula (1): D(geo)/D(pur)≥0.5 (1). In formula (1), D(geo) represents the area of the peak located at 2θ=27.3° derived from leucite crystal in the X-ray diffraction spectrum of the inorganic foam, and D(pur) represents the area of the peak located at 2θ=27.3° derived from leucite crystal in the X-ray diffraction spectrum of leucite pure material.
C04B 38/10 - Porous mortars, concrete, artificial stone or ceramic warePreparation thereof by using foaming agents
C04B 35/18 - Shaped ceramic products characterised by their compositionCeramic compositionsProcessing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxides based on silicates other than clay rich in aluminium oxide
NATIONAL UNIVERSITY CORPORATION TOKAI NATIONAL HIGHER EDUCATION AND RESEARCH SYSTEM (Japan)
JSR CORPORATION (Japan)
Inventor
Sato, Kazuhide
Shimada, Mibuko
Abstract
This complex for use in tumor chemodynamic therapy comprises: nanoparticles that enclose iron oxide and include a hydrophilic polymer in a surface layer thereof; and target recognition molecules that bind to the nanoparticles and can bind to target molecules of the tumor cells.
A61K 39/395 - AntibodiesImmunoglobulinsImmune serum, e.g. antilymphocytic serum
A61K 47/36 - PolysaccharidesDerivatives thereof, e.g. gums, starch, alginate, dextrin, hyaluronic acid, chitosan, inulin, agar or pectin
A61K 47/68 - Medicinal preparations characterised by the non-active ingredients used, e.g. carriers or inert additivesTargeting or modifying agents chemically bound to the active ingredient the non-active ingredient being chemically bound to the active ingredient, e.g. polymer-drug conjugates the non-active ingredient being a modifying agent the modifying agent being an antibody, an immunoglobulin or a fragment thereof, e.g. an Fc-fragment
A61K 49/18 - Nuclear magnetic resonance [NMR] contrast preparationsMagnetic resonance imaging [MRI] contrast preparations characterised by a special physical form, e.g. emulsions, microcapsules, liposomes
A radiation-sensitive composition contains: (A) a polymer, and (B) a radiation-sensitive acid-generator formed of an onium cation and an organic anion having 4 or more iodine atoms, the onium cation having at least one group Rf1 selected from the group consisting of a fluoroalkyl group and a fluoro group (excluding a fluoro group in the fluoroalkyl group).
G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
G03F 7/039 - Macromolecular compounds which are photodegradable, e.g. positive electron resists
84.
METHOD FOR PRODUCING ABRASIVE GRAINS, COMPOSITION FOR CHEMICAL MECHANICAL POLISHING, AND POLISHING METHOD
The present invention provides: a composition for chemical mechanical polishing, a polishing method which uses this composition for chemical mechanical polishing, and a method for producing abrasive grains which are used therein. The present invention also provides: a composition for chemical mechanical polishing, the composition being capable of polishing a silicon oxide film at a high polishing rate, while having excellent storage stability; a polishing method which uses this composition for chemical mechanical polishing; and a method for producing abrasive grains which are used therein. A method for producing abrasive grains according to the present invention comprises a step in which particles each having a surface to which a hydroxyl group (—OH) is immobilized via a covalent bond, an alkoxysilane having an epoxy group, and a basic compound are mixed and heated.
The present invention provides: a composition and a food/beverage item which can promote the elongation of pili of an intestinal bacterium and exhibits an anti-bacterial activity; and a method for assisting the examination and diagnosis of a disease caused by a pathogenic bacterium or a pathogenic fungus. The present invention provides a composition containing a bacterium capable of producing 3-phenylpropionic acid (PPA) or 3-(4-hydroxyphenyl)propionic acid (4OHPPA). The present invention also provides a food/beverage item containing PPA or 4OHPPA. The present invention further provides a method for assisting the examination and diagnosis of a disease caused by a pathogenic bacterium or a pathogenic fungus. The method comprises: quantifying the amount of PPA or the amount of 4OHPPA in feces from a subject by using 2-nitrophenylhydrazine; and comparing a value obtained by the quantification of the amount of PPA or the amount of 4OHPPA with a reference value. When the value obtained by the quantification of the amount of PPA or the amount of 4OHPPA is smaller than the reference value, it is determined that the subject is possibly affected by the disease.
A photosensitive resin composition includes a polymer (A), a photoacid generator (B), and an organic solvent (C). The polymer (A) includes: a structural unit having a phenolic hydroxy group; and a (meth)acrylate-derived structural unit having an acid-dissociable group. The organic solvent (C) includes 3-ethoxyethyl propionate. A solid content concentration of the photosensitive resin composition is 30 mass % or more.
C08K 5/45 - Heterocyclic compounds having sulfur in the ring
C09D 133/06 - Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
C09D 161/18 - Condensation polymers of aldehydes or ketones with aromatic hydrocarbons or their halogen derivatives only
C25D 5/02 - Electroplating of selected surface areas
G03F 7/038 - Macromolecular compounds which are rendered insoluble or differentially wettable
G03F 7/039 - Macromolecular compounds which are photodegradable, e.g. positive electron resists
H01L 21/288 - Deposition of conductive or insulating materials for electrodes from a liquid, e.g. electrolytic deposition
87.
RADIATION-SENSITIVE COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
A radiation-sensitive composition contains: (A) a polymer including a structural unit (U) represented by the following formula (1); and (B) a radiation-sensitive acid-generator formed of an onium cation having at least one group Rf1 selected from the group consisting of a fluoroalkyl group and a fluoro group (excepting a fluoro group in the fluoroalkyl group) and an organic anion having an iodine atom. In formula (1), R1 represents a hydrogen atom, a methyl group, or the like. X1 represents a single bond, an ether bond, an ester bond, or the like. Ar1 represents a cyclic group bound to X1 via an aromatic ring. A hydroxy group or group —ORY is bound to an atom adjacent to the atom bound to X1, among the atoms forming the aromatic group in Ar1. RY represents an acid-releasable group.
A radiation-sensitive composition contains: (A) a polymer including a structural unit (U) represented by the following formula (1); and (B) a radiation-sensitive acid-generator formed of an onium cation having at least one group Rf1 selected from the group consisting of a fluoroalkyl group and a fluoro group (excepting a fluoro group in the fluoroalkyl group) and an organic anion having an iodine atom. In formula (1), R1 represents a hydrogen atom, a methyl group, or the like. X1 represents a single bond, an ether bond, an ester bond, or the like. Ar1 represents a cyclic group bound to X1 via an aromatic ring. A hydroxy group or group —ORY is bound to an atom adjacent to the atom bound to X1, among the atoms forming the aromatic group in Ar1. RY represents an acid-releasable group.
G03F 7/039 - Macromolecular compounds which are photodegradable, e.g. positive electron resists
C08F 220/18 - Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
C08F 220/28 - Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety
G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
G03F 7/038 - Macromolecular compounds which are rendered insoluble or differentially wettable
88.
INFORMATION PROCESSING SYSTEM, PROGRAM, AND INFORMATION PROCESSING METHOD
NATIONAL CEREBRAL AND CARDIOVASCULAR CENTER (Japan)
Inventor
Takahashi, Shouadnas
Sawada, Katsutoshi
Fujioka, Masayasu
Kobayashi, Nobutoshi
Nakaoka, Yoshikazu
Asano, Ryotaro
Moriuchi, Kenji
Abstract
An information processing system (1) according to an embodiment comprises a determination unit (102) that inputs pulse information relating to the heartbeat of a subject and attribute information pertaining to the subject to a trained model and thereby generates a determination result indicating the presence/absence and the degree of heart disease in the subject. The trained model is trained using, for a plurality of providers who provide training data, pulse information relating to the heartbeat of the provider, attribute information pertaining to the provider, and diagnosis information indicating the state of cardiac function of the provider.
A61B 5/352 - Detecting R peaks, e.g. for synchronising diagnostic apparatusEstimating R-R interval
G16H 50/20 - ICT specially adapted for medical diagnosis, medical simulation or medical data miningICT specially adapted for detecting, monitoring or modelling epidemics or pandemics for computer-aided diagnosis, e.g. based on medical expert systems
01 - Chemical and biological materials for industrial, scientific and agricultural use
Goods & Services
Chemicals for use in industry; industrial chemicals for use
in the manufacture of semiconductors; photoresists; chemical
compositions for developing photographs; chemical
preparations for use in photography; photographic
sensitizers; photographic developers.
90.
CRYSTALLINE THERMOPLASTIC RESIN EXPANDED BEAD, MOLDED ARTICLE OF CRYSTALLINE THERMOPLASTIC RESIN EXPANDED BEADS, AND METHOD FOR PRODUCING SAME
A molded article of expanded beads is obtained by mutual fusion-bonding of columnar crystalline thermoplastic resin expanded beads each having no through-hole. The molded article ratio of the molded article of crystalline thermoplastic resin expanded beads is 15 times or more and 90 times or less. The molded article of crystalline thermoplastic resin expanded beads has a closed cell content of 90% or more. The molded article of crystalline thermoplastic resin expanded beads has an open cell content of 2% or more and 12% or less.
The purpose of the present invention is to provide: a radiation sensitive composition which exhibits sensitivity and CDU at satisfactory levels when next generation techniques are used and which can form a resist film in which developing defects are suppressed; and a pattern formation method. Another purpose of the present invention is to provide a polymer and a compound able to be used in the radiation-sensitive composition. The present invention relates to a radiation-sensitive composition which contains: a polymer (A) including a structural unit (I) represented by general formula (1); and a solvent (B). The polymer (A) includes a radiation-sensitive acid-generating structural unit (IV): and/or a radiation-sensitive acid generator (C) is contained in a component other than the polymer (A). An iodo group is contained in at least one component selected from the group consisting of the polymer (A) and the radiation-sensitive acid generator (C). In formula (1), R1is a hydrogen atom, a fluorine atom, a methyl group or a trifluoromethyl group. L1is a single bond or a divalent linking group. Ar denotes a furan ring, a thiophene ring, or a 9- to 20-membered aromatic heterocyclic ring having a furan ring or a thiophene ring. R2is a hydrogen atom or a monovalent organic group having 1-20 carbon atoms. R3is a halogen atom, a hydroxyl group, a cyano group, a nitro group, an amino group, a thiol group or a monovalent organic group having 1-20 carbon atoms. n is an integer between 0 and 4. If the value of n is 2 or more, multiple R3 moieties may be the same as, or different from, each other.
G03F 7/039 - Macromolecular compounds which are photodegradable, e.g. positive electron resists
C07D 307/68 - Carbon atoms having three bonds to hetero atoms with at the most one bond to halogen
C07D 307/85 - Carbon atoms having three bonds to hetero atoms with at the most one bond to halogen attached in position 2
C07D 333/38 - Carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals
C07D 333/70 - Carbon atoms having three bonds to hetero atoms with at the most one bond to halogen attached in position 2
C07D 407/12 - Heterocyclic compounds containing two or more hetero rings, at least one ring having oxygen atoms as the only ring hetero atoms, not provided for by group containing two hetero rings linked by a chain containing hetero atoms as chain links
C07D 409/12 - Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings linked by a chain containing hetero atoms as chain links
C08F 24/00 - Homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a heterocyclic ring containing oxygen
C08F 28/00 - Homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a bond to sulfur or by a heterocyclic ring containing sulfur
12 - Land, air and water vehicles; parts of land vehicles
17 - Rubber and plastic; packing and insulating materials
Goods & Services
structural parts for automobiles; vehicle running boards; body panels for vehicles; roof panels for land vehicles semi-processed thermoplastics; semi-processed plastics; plastic padding for shipping containers; Thermoplastic foam in the form of cores for use in the manufacture of insulation; Thermoplastic foam in the form of boards for use in the manufacture of insulation; Fiber-reinforced plastic boards being raw material for use in manufacture
93.
METHOD FOR PRODUCING GENE-MODIFIED T CELL POPULATION
Provided is a method of producing a gene-modified T cell population, including mixing a cell population containing T cells with beads each having bound thereto a virus containing a target gene to introduce the target gene into each of the cells of the cell population, wherein the cell population containing the T cells is cultured in a solution containing a CD3 signal activator that is present without being immobilized on a solid phase.
Provided is a method for manufacturing a semiconductor substrate that has excellent embedding properties, in which a composition for forming a metal-containing film is embedded in a substrate pattern. The method for manufacturing the semiconductor substrate comprises: a step for coating a substrate with a film-forming composition; and a step for performing, on the coating film formed in the film-forming composition coating step, at least one process selected from the group consisting of exposure to radiation and exposure to plasma. The film-forming composition contains a metal compound composed of at least a metal atom and an organic acid, and a solvent.
01 - Chemical and biological materials for industrial, scientific and agricultural use
Goods & Services
Chemical source material for the deposition of thin films
upon semiconductor wafers for the manufacture of
semiconductors; industrial chemicals for use in the
manufacture of semiconductors; industrial chemicals;
adhesives for industrial purposes; chemical preparations for
use in photography; photoresists; unprocessed artificial
resins as raw materials in the form of powders, liquids or
pastes; unprocessed plastics in primary form.
96.
POLYMER, COMPOSITION, CURED PRODUCT, LAMINATED BODY, AND ELECTRONIC COMPONENT
A composition includes a polymer containing a repeating unit represented by Formula (1). —N(R′)—R3—N(R′)— is a structure derived from a dimer diamine that is unsubstituted or substituted by a substituent, R′, R1, and R2 each are independently a hydrogen atom, a halogen atom, a hydrocarbon group that is unsubstituted or substituted by a substituent and has 1 to 20 carbon atoms, a heterocyclic aliphatic group that is unsubstituted or substituted by a substituent and has 3 to 20 carbon atoms, or a heterocyclic aromatic group that is unsubstituted or substituted by a substituent and has 3 to 20 carbon atoms, and —NR1R2 may be a nitrogen-containing heterocyclic group which has 5 to 20 ring-constituting atoms and in which R1 and R2 are bonded to each other.
A composition includes a polymer containing a repeating unit represented by Formula (1). —N(R′)—R3—N(R′)— is a structure derived from a dimer diamine that is unsubstituted or substituted by a substituent, R′, R1, and R2 each are independently a hydrogen atom, a halogen atom, a hydrocarbon group that is unsubstituted or substituted by a substituent and has 1 to 20 carbon atoms, a heterocyclic aliphatic group that is unsubstituted or substituted by a substituent and has 3 to 20 carbon atoms, or a heterocyclic aromatic group that is unsubstituted or substituted by a substituent and has 3 to 20 carbon atoms, and —NR1R2 may be a nitrogen-containing heterocyclic group which has 5 to 20 ring-constituting atoms and in which R1 and R2 are bonded to each other.
C09D 151/08 - Coating compositions based on graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bondsCoating compositions based on derivatives of such polymers grafted on to macromolecular compounds obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds
C09D 183/10 - Block or graft copolymers containing polysiloxane sequences
97.
RESIST UNDERLAYER FILM-FORMING COMPOSITION AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE
Provided are a resist underlayer film-forming composition with which it is possible to form a resist underlayer film having excellent solvent resistance and excellent resist pattern rectangularity, and a method for manufacturing a semiconductor substrate. The resist underlayer film-forming composition contains a polymer having a repeating unit represented by formula (1), and a solvent. (In formula (1), R1represents a hydrogen atom or a substituted or unsubstituted monovalent hydrocarbon group having 1 to 20 carbon atoms. L1represents a 1+n-valent linking group. Ar1represents a monovalent group having an aromatic ring having 6 to 20 ring members. The aromatic ring has at least one halogen atom. n represents an integer of 1 to 3. When n is 2 or more, a plurality of the Ar1s are the same as or different from one another. L1has at least one group (A) selected from the group consisting of a group represented by formula (2-1), a group represented by formula (2-2), a group represented by formula (2-3), a group represented by formula (2-4), a group represented by formula (2-5), a group represented by formula (2-6), a group represented by formula (2-7), and a group represented by formula (2-8).) (In formulae (2-1) to (2-8), R7each independently represent a divalent organic group having 1 to 20 carbon atoms or a single bond. R8, R9, R10, and R13each independently represent a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms. Cy represents a ring structure constituted together with two carbon atoms in formula (2-2) and having 3 to 20 ring members. R11represents a hydrogen atom, a monovalent organic group having 1 to 20 carbon atoms, or a single bond. R12represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms. ** represents a bond with an atom constituting Cy. Note that if R11is a single bond, R11is combined with **. * represents a bond with an atom constituting L1.)
G03F 7/11 - Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
C08F 12/32 - Monomers containing only one unsaturated aliphatic radical containing two or more rings
Provided are a radiation-sensitive composition and a pattern formation method that can exhibit, at the time of pattern formation, a sufficient level of sensitivity, LWR performance, pattern rectangularity, development defect suppression, CDU performance, and pattern circularity. This radiation-sensitive composition includes: a polymer that includes a structural unit (I) represented by formula (1); an onium salt that includes an organic acid anion including a cyclic structure, and an onium cation; and a solvent. (In formula (1), R1is a hydrogen atom or a C1-20 monovalent organic group, L is a single bond or a divalent linking group, R2is a C1-5 substituted or unsubstituted monovalent hydrocarbon group, R3is a C1-10 monovalent organic group, a hydroxy group, a nitro group, a cyano group, an amino group, a halogen atom, or a sulfanyl group, in cases in which there are a plurality of R3s present, the plurality of R3s may be the same as or different from each other, and n is an integer from 0 to 10.)
A radiation-sensitive resin composition includes: a first polymer and a compound. A solubility of the first polymer in a developer solution is capable of being altered by an action of an acid. The first polymer includes: a first structural unit containing a partial structure obtained by substituting a hydrogen atom of a carboxy group, a phenolic hydroxy group, or an amide group with a group represented by the following formula (1); and a second structural unit containing a phenolic hydroxy group. The compound includes: a monovalent radiation-sensitive onium cation containing an aromatic ring obtained by substituting at least one hydrogen atom with a fluorine atom or a fluorine atom-containing group; and a monovalent organic acid anion.
A radiation-sensitive resin composition includes: a first polymer and a compound. A solubility of the first polymer in a developer solution is capable of being altered by an action of an acid. The first polymer includes: a first structural unit containing a partial structure obtained by substituting a hydrogen atom of a carboxy group, a phenolic hydroxy group, or an amide group with a group represented by the following formula (1); and a second structural unit containing a phenolic hydroxy group. The compound includes: a monovalent radiation-sensitive onium cation containing an aromatic ring obtained by substituting at least one hydrogen atom with a fluorine atom or a fluorine atom-containing group; and a monovalent organic acid anion.
G03F 7/039 - Macromolecular compounds which are photodegradable, e.g. positive electron resists
C08F 212/14 - Monomers containing only one unsaturated aliphatic radical containing one ring substituted by hetero atoms or groups containing hetero atoms
C08F 220/18 - Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
100.
RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING RESIST PATTERN
A radiation-sensitive resin composition includes a polymer, solubility of which in a developer solution is capable of being altered by an action of an acid, and which has a first structural unit represented by the following formula (1); a radiation-sensitive acid generating agent; and an acid diffusion control agent having a monovalent radiation-sensitive onium cation and a monovalent organic acid anion.
A radiation-sensitive resin composition includes a polymer, solubility of which in a developer solution is capable of being altered by an action of an acid, and which has a first structural unit represented by the following formula (1); a radiation-sensitive acid generating agent; and an acid diffusion control agent having a monovalent radiation-sensitive onium cation and a monovalent organic acid anion.
