FEI Efa, Inc.

United States of America

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IPC Class
G01R 31/311 - Contactless testing using non-ionising electromagnetic radiation, e.g. optical radiation of integrated circuits 10
G01R 31/26 - Testing of individual semiconductor devices 5
G01R 31/308 - Contactless testing using non-ionising electromagnetic radiation, e.g. optical radiation 5
G01N 21/95 - Investigating the presence of flaws, defects or contamination characterised by the material or shape of the object to be examined 3
G01N 21/956 - Inspecting patterns on the surface of objects 3
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Found results for  patents

1.

SWAB COLLECTION SYSTEMS AND METHODS

      
Application Number US2023017355
Publication Number 2023/196265
Status In Force
Filing Date 2023-04-04
Publication Date 2023-10-12
Owner
  • LIFE TECHNOLOGIES CORPORATION (USA)
  • FEI EFA, INC. (USA)
Inventor
  • Chapman, Laura
  • Vlassov, Alexandre
  • Jackson, Tommie
  • Ricica, Aaron
  • Thompson, Roy
  • Vangbo, Mattias
  • Frank, Jonathan

Abstract

Systems and methods under the present disclosure include swabs and storage tubes for use in medical environments. The various embodiments can help prevent cross contamination in laboratories or make swabs and storage tubes more compatible with automated laboratory processes. Accurate positioning of swabs can help make any pipetting procedures more accurate, easier and quicker.

IPC Classes  ?

  • A61B 10/00 - Instruments for taking body samples for diagnostic purposesOther methods or instruments for diagnosis, e.g. for vaccination diagnosis, sex determination or ovulation-period determinationThroat striking implements
  • B01L 3/00 - Containers or dishes for laboratory use, e.g. laboratory glasswareDroppers
  • A61B 10/02 - Instruments for taking cell samples or for biopsy

2.

Method and system for resolving hot spots in LIT

      
Application Number 16716370
Grant Number 11022646
Status In Force
Filing Date 2019-12-16
First Publication Date 2020-04-16
Grant Date 2021-06-01
Owner FEI EFA, Inc. (USA)
Inventor Schmidt, Christian

Abstract

Localizing hot spots in multi layered device under test (DUT) by using lock-in thermography (LIT) where plural hot spots of electrical circuits are buried in the DUT at different depth layers from a bottom layer to a top layer, comprises applying test signals of multiple frequencies to the electrical circuits of the DUT for exciting the hot spots; imaging a top surface of the top layer of the DUT at timed intervals to obtain IR images of the DUT while the test signal is applied to the electrical circuits wherein the images are in correlation to a propagation of heat from the hot spots in the DUT; detecting the thermal response signals at the timed intervals from the images taken from the DUT; and determining changes in the appearance of hot spot images on the top surface of the DUT in relation to the frequencies of the thermal response signals.

IPC Classes  ?

  • G01R 31/308 - Contactless testing using non-ionising electromagnetic radiation, e.g. optical radiation
  • H02S 50/10 - Testing of PV devices, e.g. of PV modules or single PV cells
  • G01R 31/26 - Testing of individual semiconductor devices
  • G01R 31/311 - Contactless testing using non-ionising electromagnetic radiation, e.g. optical radiation of integrated circuits
  • G01R 31/385 - Arrangements for measuring battery or accumulator variables
  • G01R 31/62 - Testing of transformers

3.

Laser-assisted device alteration using synchronized laser pulses

      
Application Number 16248423
Grant Number 11353479
Status In Force
Filing Date 2019-01-15
First Publication Date 2020-01-23
Grant Date 2022-06-07
Owner FEI EFA, Inc. (USA)
Inventor
  • Vedagarbha, Praveen
  • Reid, Derryck
  • Serrels, Keith
  • Vickers, James S.

Abstract

A pulsed-laser LADA system is provided, which utilizes temporal resolution to enhance spatial resolution. The system is capable of resolving CMOS pairs within the illumination spot using synchronization of laser pulses with the DUT clock. The system can be implemented using laser wavelength having photon energy above the silicon bandgap so as to perform single-photon LADA or wavelength having photon energy below the silicon bandgap so as to generate two-photon LADA. The timing of the laser pulses can be adjusted using two feedback loops tied to the clock signal of an ATE, or by adjusting the ATE's clock signal with reference to a fixed-pulse laser source.

IPC Classes  ?

  • G01R 1/07 - Non contact-making probes
  • G01R 31/26 - Testing of individual semiconductor devices
  • G01R 31/311 - Contactless testing using non-ionising electromagnetic radiation, e.g. optical radiation of integrated circuits
  • G01R 31/319 - Tester hardware, i.e. output processing circuits
  • G01R 31/30 - Marginal testing, e.g. by varying supply voltage

4.

Self correcting floating SIL tip

      
Application Number 16195268
Grant Number 10718933
Status In Force
Filing Date 2018-11-19
First Publication Date 2019-05-23
Grant Date 2020-07-21
Owner FEI EFA, Inc. (USA)
Inventor
  • Frank, Jonathan
  • Sabbineni, Prasad

Abstract

An optics arrangement for a solid immersion lens (SIL) is disclosed. The arrangement enables the SIL to freely tilt. The arrangement includes a SIL having an optical axis extending from an engaging surface and a rear surface of the SIL; a SIL housing having a cavity configured to accept the SIL therein while allowing the SIL to freely tilt within the cavity, wherein the cavity includes a hole positioned such that the optical axis passes there-through, to thereby allow light collected by the SIL to propagate to an objective lens; and, a SIL retainer attached to the SIL housing and configured to prevent the SIL from exiting the cavity.

IPC Classes  ?

  • G02B 21/02 - Objectives
  • G02B 21/33 - Immersion oils
  • G02B 7/02 - Mountings, adjusting means, or light-tight connections, for optical elements for lenses

5.

System and method for fault isolation by emission spectra analysis

      
Application Number 16027159
Grant Number 10620263
Status In Force
Filing Date 2018-07-03
First Publication Date 2018-11-15
Grant Date 2020-04-14
Owner FEI EFA, Inc. (USA)
Inventor
  • Deslandes, Herve
  • Sabbineni, Prasad
  • Freed, Regina

Abstract

An apparatus and method for optical probing of a DUT is disclosed. The system enables identifying, localizing and classifying faulty devices within the DUT. A selected area of the DUT is imaged while the DUT is receiving test signals, which may be static or dynamic, i.e., causing certain of the active devices to modulate. Light from the DUT is collected and is passed through a rotatable diffracting element prior to imaging it by a sensor and converting it into an electrical signal. The resulting image changes depending on the rotational positioning of the grating. The diffracted image is inspected to identify, localize and classify faulty devices within the DUT.

IPC Classes  ?

  • G01R 31/308 - Contactless testing using non-ionising electromagnetic radiation, e.g. optical radiation
  • G01R 31/311 - Contactless testing using non-ionising electromagnetic radiation, e.g. optical radiation of integrated circuits
  • G01N 21/956 - Inspecting patterns on the surface of objects
  • G01N 21/95 - Investigating the presence of flaws, defects or contamination characterised by the material or shape of the object to be examined

6.

Probe-based data collection system with adaptive mode of probing controlled by local sample properties

      
Application Number 15368516
Grant Number 09891280
Status In Force
Filing Date 2016-12-02
First Publication Date 2017-03-23
Grant Date 2018-02-13
Owner FEI EFA, Inc. (USA)
Inventor
  • Ukraintsev, Vladimir A.
  • Stallcup, Richard
  • Pryadkin, Sergiy
  • Berkmyre, Mike
  • Sanders, John

Abstract

A method for testing an integrated circuit (IC) using a nanoprobe, by using a scanning electron microscope (SEM) to register the nanoprobe to an identified feature on the IC; navigating the nanoprobe to a region of interest; scanning the nanoprobe over the surface of the IC while reading data from the nanoprobe; when the data from the nanoprobe indicates that the nanoprobe traverse a feature of interest, decelerating the scanning speed of the nanoprobe and performing testing of the IC. The scanning can be done at a prescribed nanoprobe tip force, and during the step of decelerating the scanning speed, the method further includes increasing the nanoprobe tip force.

IPC Classes  ?

  • G01R 31/317 - Testing of digital circuits
  • G01Q 60/18 - SNOM [Scanning Near-Field Optical Microscopy] or apparatus therefor, e.g. SNOM probes
  • G01R 31/311 - Contactless testing using non-ionising electromagnetic radiation, e.g. optical radiation of integrated circuits
  • G01Q 10/06 - Circuits or algorithms therefor
  • G01Q 30/04 - Display or data processing devices
  • G01Q 60/10 - STM [Scanning Tunnelling Microscopy] or apparatus therefor, e.g. STM probes
  • G01Q 60/30 - Scanning potential microscopy
  • G01Q 60/46 - SCM [Scanning Capacitance Microscopy] or apparatus therefor, e.g. SCM probes

7.

Method and system for resolving hot spots in LIT

      
Application Number 14913961
Grant Number 10545186
Status In Force
Filing Date 2014-08-22
First Publication Date 2016-08-25
Grant Date 2020-01-28
Owner FEI EFA, Inc. (USA)
Inventor Schmidt, Christian

Abstract

Localizing hot spots in multi layered device under test (DUT) by using lock-in thermography (LIT) where plural hot spots of electrical circuits are buried in the DUT at different depth layers from a bottom layer to a top layer, comprises applying test signals of multiple frequencies to the electrical circuits of the DUT for exciting the hot spots; imaging a top surface of the top layer of the DUT at timed intervals to obtain IR images of the DUT while the test signal is applied to the electrical circuits wherein the images are in correlation to a propagation of heat from the hot spots in the DUT; detecting the thermal response signals at the timed intervals from the images taken from the DUT; and determining changes in the appearance of hot spot images on the top surface of the DUT in relation to the frequencies of the thermal response signals.

IPC Classes  ?

  • G01R 31/308 - Contactless testing using non-ionising electromagnetic radiation, e.g. optical radiation

8.

Method for imaging a feature using a scanning probe microscope

      
Application Number 15015067
Grant Number 09869696
Status In Force
Filing Date 2016-02-03
First Publication Date 2016-08-11
Grant Date 2018-01-16
Owner FEI EFA, INC. (USA)
Inventor
  • Erickson, Andrew Norman
  • Ippolito, Stephen Bradley
  • Zumwalt, Sean

Abstract

Using a local-potential-driving probe drives a conductor to a known potential while adjacent lines are grounded through the sample body reduces electrostatic scanning microscope signal from adjacent lines, allows imaging of metal lines deeper in the sample. Providing different potentials locally on different conductive lines using multiple local-potential-driving probes allows different conductors to be highlighted in the same image, for example, by changing the phase of the signal being applied to the different local-potential-driving probes.

IPC Classes  ?

9.

Laser-assisted device alteration using synchronized laser pulses

      
Application Number 14922046
Grant Number 10209274
Status In Force
Filing Date 2015-10-23
First Publication Date 2016-07-14
Grant Date 2019-02-19
Owner FEI EFA, Inc. (USA)
Inventor
  • Vedagarbha, Praveen
  • Reid, Derryck
  • Serrels, Keith
  • Vickers, James S.

Abstract

A pulsed-laser LADA system is provided, which utilizes temporal resolution to enhance spatial resolution. The system is capable of resolving CMOS pairs within the illumination spot using synchronization of laser pulses with the DUT clock. The system can be implemented using laser wavelength having photon energy above the silicon bandgap so as to perform single-photon LADA or wavelength having photon energy below the silicon bandgap so as to generate two-photon LADA. The timing of the laser pulses can be adjusted using two feedback loops tied to the clock signal of an ATE, or by adjusting the ATE's clock signal with reference to a fixed-pulse laser source.

IPC Classes  ?

  • G01R 1/07 - Non contact-making probes
  • G01R 31/26 - Testing of individual semiconductor devices
  • G01R 31/311 - Contactless testing using non-ionising electromagnetic radiation, e.g. optical radiation of integrated circuits
  • G01R 31/319 - Tester hardware, i.e. output processing circuits
  • G01R 31/30 - Marginal testing, e.g. by varying supply voltage

10.

System and method for modulation mapping

      
Application Number 14997460
Grant Number 09915700
Status In Force
Filing Date 2016-01-15
First Publication Date 2016-05-12
Grant Date 2018-03-13
Owner FEI EFA, Inc. (USA)
Inventor Kasapi, Steven

Abstract

Probing an integrated circuit (IC), by: electrically applying stimulation signal to said IC; scanning a selected area of said IC with a monochromatic beam; collecting beam reflection from the selected area of said IC, wherein the beam reflection correspond to modulation of the monochromatic beam by active devices of said IC; converting said beam reflection to an electrical probing signal; selecting a frequency or a band of frequencies of said probing signal; utilizing the probing signal to generate a spatial modulation map for various locations over the selected area of said IC; and displaying the spatial map on a monitor, wherein grey scale values correspond to modulation signal values.

IPC Classes  ?

  • G01R 31/308 - Contactless testing using non-ionising electromagnetic radiation, e.g. optical radiation
  • G01R 31/302 - Contactless testing
  • G01R 31/311 - Contactless testing using non-ionising electromagnetic radiation, e.g. optical radiation of integrated circuits
  • G01R 31/28 - Testing of electronic circuits, e.g. by signal tracer

11.

Systems and method for laser voltage imaging

      
Application Number 14885873
Grant Number 10126360
Status In Force
Filing Date 2015-10-16
First Publication Date 2016-04-21
Grant Date 2018-11-13
Owner FEI EFA, Inc. (USA)
Inventor Vickers, James S.

Abstract

An apparatus and method for laser voltage testing of a DUT is disclosed. The system enables laser voltage probing and laser voltage imaging of devices within the DUT. A selected area of the DUT is illuminating a while the DUT is receiving test signals causing certain of the active devices to modulate. Light reflected from the DUT is collected and is converted into an electrical signal. The electrical signal is sampled by an ADC and the output of the ADC is sent to an FPGA. The FPGA operates on the signal so as to provide an output that emulates a spectrum analyzer or a vector analyzer.

IPC Classes  ?

  • G01R 31/311 - Contactless testing using non-ionising electromagnetic radiation, e.g. optical radiation of integrated circuits
  • G01R 31/28 - Testing of electronic circuits, e.g. by signal tracer

12.

Through process flow intra-chip and inter-chip electrical analysis and process control using in-line nanoprobing

      
Application Number 14751017
Grant Number 10539589
Status In Force
Filing Date 2015-06-25
First Publication Date 2015-12-31
Grant Date 2020-01-21
Owner FEI EFA, Inc. (USA)
Inventor
  • Ukraintsev, Vladimir
  • Niv, Israel
  • Benzion, Ronen

Abstract

System for performing in-line nanoprobing on semiconductor wafer. A wafer support or vertical wafer positioner is attached to a wafer stage. An SEM column, an optical microscope and a plurality of nanoprobe positioners are all attached to the ceiling. The nanoprobe positioners have one nanoprobe configured for physically contacting selected points on the wafer. A force (or touch) sensor measures contact force applied by the probe to the wafer (or the moment) when the probe physically contacts the wafer. A plurality of drift sensors are provided for calculating probe vs. wafer alignment drift in real-time during measurements.

IPC Classes  ?

  • G01Q 30/02 - Non-SPM analysing devices, e.g. SEM [Scanning Electron Microscope], spectrometer or optical microscope
  • G01R 31/26 - Testing of individual semiconductor devices
  • H01J 37/28 - Electron or ion microscopesElectron- or ion-diffraction tubes with scanning beams
  • H01L 21/66 - Testing or measuring during manufacture or treatment
  • G01R 31/28 - Testing of electronic circuits, e.g. by signal tracer
  • G01R 1/067 - Measuring probes

13.

Method and system for the examination of a sample by means of thermography

      
Application Number 14653226
Grant Number 09905014
Status In Force
Filing Date 2013-11-13
First Publication Date 2015-11-26
Grant Date 2018-02-27
Owner FEI EFA, Inc. (USA)
Inventor
  • Heissenstein, Hans
  • Stolz, Peter
  • Meinhardt-Wildegger, Raiko

Abstract

n are characteristic for gradients in heat flow velocity in further depths lying deeper as the second depth; and extracting from the thermal images an indication of the presence of any gradients of heat flow velocity at the respective depth distances from a surface of the sample. The system is configured to carry out the above method.

IPC Classes  ?

  • G01J 5/02 - Constructional details
  • G01N 25/72 - Investigating presence of flaws
  • G06K 9/52 - Extraction of features or characteristics of the image by deriving mathematical or geometrical properties from the whole image
  • G06T 7/20 - Analysis of motion
  • H04N 5/33 - Transforming infrared radiation
  • H04N 5/243 - Circuitry for compensating for variation in the brightness of the object by influencing the picture signal
  • G06T 7/00 - Image analysis
  • G01J 5/00 - Radiation pyrometry, e.g. infrared or optical thermometry

14.

Spectral mapping of photo emission

      
Application Number 14682057
Grant Number 09903824
Status In Force
Filing Date 2015-04-08
First Publication Date 2015-10-15
Grant Date 2018-02-27
Owner FEI EFA, Inc. (USA)
Inventor
  • Deslandes, Herve
  • Reverdy, Antoine
  • Parrassin, Thierry

Abstract

An apparatus and method for optical probing of a DUT is disclosed. The system enables identifying, localizing and classifying faulty devices within the DUT. A selected area of the DUT is imaged while the DUT is receiving test signals, which may be static or dynamic, i.e., causing certain of the active devices to modulate. Light from the DUT is collected and is passed through a transparent diffracting grating prior to imaging it by a sensor and converting it into an electrical signal. The resulting image includes the zero order and first order diffraction of the grating. The grating is configured such that the zero order is in registration with emission sites imaged when the grating is outside the optical path.

IPC Classes  ?

  • G06F 17/18 - Complex mathematical operations for evaluating statistical data
  • G01N 21/956 - Inspecting patterns on the surface of objects
  • G01R 31/311 - Contactless testing using non-ionising electromagnetic radiation, e.g. optical radiation of integrated circuits
  • G01N 21/95 - Investigating the presence of flaws, defects or contamination characterised by the material or shape of the object to be examined
  • G01N 21/66 - Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light electrically excited, e.g. electroluminescence

15.

Self correcting floating SIL tip

      
Application Number 14645273
Grant Number 10133051
Status In Force
Filing Date 2015-03-11
First Publication Date 2015-09-17
Grant Date 2018-11-20
Owner FEI EFA, Inc. (USA)
Inventor
  • Frank, Jonathan
  • Sabbineni, Prasad

Abstract

An optics arrangement for a solid immersion lens (SIL) is disclosed. The arrangement enables the SIL to freely tilt. The arrangement includes a SIL having an optical axis extending from an engaging surface and a rear surface of the SIL; a SIL housing having a cavity configured to accept the SIL therein while allowing the SIL to freely tilt within the cavity, wherein the cavity includes a hole positioned such that the optical axis passes there-through, to thereby allow light collected by the SIL to propagate to an objective lens; and, a SIL retainer attached to the SIL housing and configured to prevent the SIL from exiting the cavity.

IPC Classes  ?

  • G02B 21/02 - Objectives
  • G02B 21/33 - Immersion oils
  • G02B 7/02 - Mountings, adjusting means, or light-tight connections, for optical elements for lenses

16.

System and method for fault isolation by emission spectra analysis

      
Application Number 14657605
Grant Number 10041997
Status In Force
Filing Date 2015-03-13
First Publication Date 2015-09-17
Grant Date 2018-08-07
Owner FEI EFA, Inc. (USA)
Inventor
  • Deslandes, Herve
  • Sabbineni, Prasad
  • Freed, Regina

Abstract

An apparatus and method for optical probing of a DUT is disclosed. The system enables identifying, localizing and classifying faulty devices within the DUT. A selected area of the DUT is imaged while the DUT is receiving test signals, which may be static or dynamic, i.e., causing certain of the active devices to modulate. Light from the DUT is collected and is passed through a rotatable diffracting element prior to imaging it by a sensor and converting it into an electrical signal. The resulting image changes depending on the rotational positioning of the grating. The diffracted image is inspected to identify, localize and classify faulty devices within the DUT.

IPC Classes  ?

  • G01R 31/308 - Contactless testing using non-ionising electromagnetic radiation, e.g. optical radiation
  • G01R 31/311 - Contactless testing using non-ionising electromagnetic radiation, e.g. optical radiation of integrated circuits
  • G01N 21/956 - Inspecting patterns on the surface of objects
  • G01N 21/95 - Investigating the presence of flaws, defects or contamination characterised by the material or shape of the object to be examined

17.

Optimized wavelength photon emission microscope for VLSI devices

      
Application Number 14250361
Grant Number 09817060
Status In Force
Filing Date 2014-04-10
First Publication Date 2015-04-02
Grant Date 2017-11-14
Owner FEI EFA, Inc. (USA)
Inventor Deslandes, Herve

Abstract

A method for emission testing of a semiconductor device (DUT), by mounting the DUT onto an test bench of an emission tester, the emission tester having an optical detector; electrically connecting the DUT to an electrical tester; applying electrical test signals to the DUT while keeping test parameters constant; serially inserting one of a plurality of shortpass filters into an optical path of the emission tester and collecting emission test signal from the optical detector until all available shortpass filters have been inserted into the optical path; determining appropriate shortpass filter providing highest signal to noise ratio of the emission signal; inserting the appropriate shortpass filter into the optical path; and, performing emission testing on the DUT.

IPC Classes  ?

  • G01R 31/26 - Testing of individual semiconductor devices
  • G01R 31/311 - Contactless testing using non-ionising electromagnetic radiation, e.g. optical radiation of integrated circuits
  • G01R 15/24 - Adaptations providing voltage or current isolation, e.g. for high-voltage or high-current networks using light-modulating devices

18.

Method for examination of a sample by means of the heat flow thermography

      
Application Number 14362122
Grant Number 09816866
Status In Force
Filing Date 2012-12-10
First Publication Date 2014-11-06
Grant Date 2017-11-14
Owner FEI EFA, Inc. (USA)
Inventor
  • Lang, Haymo
  • Mielke, Jochen

Abstract

The invention provides a method for a non-destructive, non-contacting and image forming examination of a sample by means of the heat flow thermography method where the examination consists of evaluating an existence and/or depth distance values of any heat flow velocity transitions below a surface of the sample, wherein the sample is excited by heat pulses of at least one excitation source, and a thermal flow originating therefrom is captured by at least one infrared sensor in an image sequence of thermal images, and wherein the thermal images obtained from the image sequence are evaluated by means of a signal and image processing and depicting a thermal flow with a resolution in time and in space. The method comprises: exciting the sample at least twice independently from each other by means of the heat pulses from the excitation source where a second excitation and any succeeding excitation is delayed with respect to a preceding excitation by a time delay whereby the start of the captured sequence happens at another defined point of time within the time between two images within an image sequence; detecting the respective total thermal flow processes generated by the at least two excitation processes of the sample by the infrared sensor in the independent image sequences containing the excitation as well as the thermal answer signal from the sample, combining all captured image sequences to a total image sequence in which all images are arranged in a sequence which is correct in time with respect to the point of time of the pulse like excitation, and extracting from the total image sequence, in a manner known per se, an indication of the depth distance of a heat flow velocity transition from a surface of the sample. Therein, the heat flow velocity transitions can be a boarder layer of a layered material or defects in a substrate or below a surface of a work piece.

IPC Classes  ?

  • G01J 5/00 - Radiation pyrometry, e.g. infrared or optical thermometry
  • G01J 5/32 - Special adaptation for indicating or recording
  • G01N 25/72 - Investigating presence of flaws

19.

Apparatus and method for annular optical power management

      
Application Number 14250373
Grant Number 09885878
Status In Force
Filing Date 2014-04-10
First Publication Date 2014-10-16
Grant Date 2018-02-06
Owner FEI EFA, Inc. (USA)
Inventor Serrels, Keith

Abstract

A system and method for obtaining super-resolution image of an object. An illumination beam is directed through an optical axis onto the object to be imaged. Paraxial rays of the illumination beam are deflected away from the optical axis and into a beam dump. The non-paraxial rays are collected after being reflected by the object so as to generate an image only from the non-paraxial rays.

IPC Classes  ?

  • G02B 27/58 - Optics for apodization or superresolutionOptical synthetic aperture systems
  • G02B 21/32 - Micromanipulators structurally combined with microscopes
  • G02B 21/00 - Microscopes