• All sections
• G - Physics
• G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devicesmaterials therefororiginals thereforapparatus specially adapted therefor
• G03F 7/115 - Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having supports or layers with means for obtaining a screen effect or for obtaining better contact in vacuum printing

Patent holdings for IPC class G03F 7/115

Total number of patents in this class: 9

10-year publication summary

Principal owners for this class