- All sections
- G - Physics
- G01N - Investigating or analysing materials by determining their chemical or physical properties
- G01N 23/2252 - Measuring emitted X-rays, e.g. electron probe microanalysis [EPMA]
Patent holdings for IPC class G01N 23/2252
Total number of patents in this class: 162
10-year publication summary
|
4
|
8
|
13
|
22
|
18
|
23
|
23
|
18
|
18
|
13
|
| 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| JEOL Ltd. | 594 |
18 |
| FEI Company | 958 |
13 |
| Applied Materials Israel, Ltd. | 615 |
10 |
| HORIBA, Ltd. | 825 |
10 |
| Oxford Instruments NanoTechnology Tools Limited | 155 |
8 |
| Hitachi High-Tech Corporation | 5396 |
8 |
| Shimadzu Corporation | 6193 |
7 |
| Bruker Nano GmbH | 67 |
5 |
| Commissariat à l'énergie atomique et aux energies alternatives | 10949 |
4 |
| Proterial, Ltd. | 869 |
4 |
| Pratt & Whitney Canada Corp. | 4834 |
3 |
| JFE Steel Corporation | 6965 |
3 |
| Rigaku Corporation | 444 |
3 |
| Shenzhen Xpectvision Technology Co., Ltd. | 375 |
3 |
| Delmic IP B.V. | 21 |
3 |
| General Electric Company | 13858 |
2 |
| International Business Machines Corporation | 61537 |
2 |
| Canon Inc. | 40509 |
2 |
| Hitachi High-Technologies Corporation | 1998 |
2 |
| Hitachi High-Tech Science Corporation | 285 |
2 |
| Other owners | 50 |