A method for manufacturing an optical element according to the present invention involves using a mold comprising a first portion and a second portion. In this method for manufacturing an optical element , a plastic core member is inserted into a cavity of said mold surrounded by surfaces including a surface C of said first portion and a surface D of said second portion that faces said surface C, and molten plastic is poured into a space formed by surfaces including a surface A of said core member and the surface C of said first portion to form a layer on said surface A by injection molding; meanwhile, a surface B of said core member on the opposite side from said surface A is press-molded by being pressed, due to the filling pressure of said molten plastic, against a surface D of said second portion, which has been set to a temperature higher than the glass transition temperature of the plastic of said core member.
B29C 45/14 - Moulage par injection, c.-à-d. en forçant un volume déterminé de matière à mouler par une buse d'injection dans un moule ferméAppareils à cet effet en incorporant des parties ou des couches préformées, p. ex. moulage par injection autour d'inserts ou sur des objets à recouvrir
B29C 45/16 - Fabrication d'objets multicouches ou polychromes
B29D 11/00 - Fabrication d'éléments optiques, p. ex. lentilles ou prismes
Provided is a production method that makes it possible to efficiently produce a high-precision optical element by means of a simple device. According to the present invention, a production method for an optical element involves placing a core member inside a cavity that is enclosed by surfaces that include a surface C of a first section of a mold and a surface D of a second section and, while a layer is formed on a surface A of the core member by injection molding, pressing a surface B that is on the opposite side from the surface A onto the surface D as heated to a temperature that is higher than the glass transition temperature of a plastic of the core member and then cooling the surface D to make the surface B a surface Bd that has a target shape. The shape of the core member is determined such that the ratio of the volume of a gap that is formed between the surface B and the surface D when the core member has been placed inside the cavity such that only a portion of the surface B is in contact with the surface D and the volume of a space is no more than 0.15 when the core member has been placed inside the cavity such that only a portion of the surface B contacts the surface D.
B29C 45/14 - Moulage par injection, c.-à-d. en forçant un volume déterminé de matière à mouler par une buse d'injection dans un moule ferméAppareils à cet effet en incorporant des parties ou des couches préformées, p. ex. moulage par injection autour d'inserts ou sur des objets à recouvrir
This optical receptacle optically couples an optical fiber and a light receiving element and/or a light emitting element, and is composed of a receptacle body and a filter element. The receptacle body comprises an optical surface for the optical fiber, a first transmission optical surface, a second transmission optical surface, a reflection optical surface, a first transmission/reception optical surface, and a second transmission/reception optical surface. The filter element comprises an optical surface for a filter that reflects light of a wavelength in a certain range and transmits light of a wavelength in another range, and a third transmission optical surface. The optical receptacle is configured so as to pass through the optical surface for the optical fiber and the first transmission/reception optical surface, pass through a first path of light reflected on the optical surface for the filter, the optical surface for the optical fiber, and the second transmission/reception optical surface, transmit the optical surface for the filter, and form a second path of light reflected by the reflection optical surface.
A method for manufacturing fine surface roughness on a surface of a quartz glass substrate, the method comprising: making the substrate undergo ion etching with argon gas alone such that through the ion etching a layer of a thickness of 20 nanometers or greater is removed from the surface; and making the substrate undergo reactive ion etching with trifluoromethane gas or a mixed gas of trifluoromethane and oxygen such that after the reactive ion etching surface roughness having an average pitch in a range from 30 nanometers to 200 nanometers is formed and there exists light having a wavelength in a range from 350 to 800 nanometers, for the light normal-incidence reflectivity of the surface being 1.5 percent or smaller or there exists light having a wavelength in a range from 200 to 350 nanometers, for the light normal-incidence reflectivity of the surface being 2.5 percent or smaller.
C03C 15/00 - Traitement de surface du verre, autre que sous forme de fibres ou de filaments, par attaque chimique
G03F 7/00 - Production par voie photomécanique, p. ex. photolithographique, de surfaces texturées, p. ex. surfaces impriméesMatériaux à cet effet, p. ex. comportant des photoréservesAppareillages spécialement adaptés à cet effet
H01J 37/32 - Tubes à décharge en atmosphère gazeuse
An atomizing method comprises providing an atomizer including a mist generator and a plasma producer. The plasma producer includes a tube of dielectric material, an external electrode on an outside surface of the tube of dielectric material, an internal electrode on an inside surface of the tube of dielectric material, and a high-frequency power supply for applying a high-frequency voltage between the external electrode and the internal electrode. Mist from the mist generator is plasma-activated while passing through the tube of dielectric material and emitted from an end of the tube of dielectric material. The external electrode and the internal electrode are located such that location of the external electrode and location of the internal electrode does not overlap or merely partially overlap in the longitudinal direction of the tube of dielectric material. Peroxynitrous acid is continuously generated by generating hydrogen peroxide and nitrous acid using plasma-activated water mist.
A61L 2/14 - Procédés ou appareils de désinfection ou de stérilisation de matériaux ou d'objets autres que les denrées alimentaires ou les lentilles de contactAccessoires à cet effet utilisant des phénomènes physiques du plasma, c.-à-d. des gaz ionisés
A61L 2/22 - Procédés ou appareils de désinfection ou de stérilisation de matériaux ou d'objets autres que les denrées alimentaires ou les lentilles de contactAccessoires à cet effet utilisant des substances chimiques des substances à phases, p. ex. des fumées, des aérosols
An imaging optical system wherein the number of lenses is three or four, an aperture stop is located between the lens closest to the object and the lens closest to the image, a single aspheric lens in which radius of curvature of each surface is infinity in the paraxial region and which has a power of the third-order aberration region in the peripheral area is provided at a position not adjacent to the aperture stop, the lens closest to the object is a negative lens or the aspheric lens, at least one positive lens is located closer to the image than the aperture stop,
An imaging optical system wherein the number of lenses is three or four, an aperture stop is located between the lens closest to the object and the lens closest to the image, a single aspheric lens in which radius of curvature of each surface is infinity in the paraxial region and which has a power of the third-order aberration region in the peripheral area is provided at a position not adjacent to the aperture stop, the lens closest to the object is a negative lens or the aspheric lens, at least one positive lens is located closer to the image than the aperture stop,
0.18
<
(
∑
i
=
1
i
=
n
❘
"\[LeftBracketingBar]"
1
f
i
❘
"\[RightBracketingBar]"
)
·
f
n
<
0
.
9
An imaging optical system wherein the number of lenses is three or four, an aperture stop is located between the lens closest to the object and the lens closest to the image, a single aspheric lens in which radius of curvature of each surface is infinity in the paraxial region and which has a power of the third-order aberration region in the peripheral area is provided at a position not adjacent to the aperture stop, the lens closest to the object is a negative lens or the aspheric lens, at least one positive lens is located closer to the image than the aperture stop,
0.18
<
(
∑
i
=
1
i
=
n
❘
"\[LeftBracketingBar]"
1
f
i
❘
"\[RightBracketingBar]"
)
·
f
n
<
0
.
9
is satisfied, a bundle of rays reaching the maximum image height and a bundle of rays having the principal ray parallel to the optical axis do not intersect with each other within the first lens from the object side, and
An imaging optical system wherein the number of lenses is three or four, an aperture stop is located between the lens closest to the object and the lens closest to the image, a single aspheric lens in which radius of curvature of each surface is infinity in the paraxial region and which has a power of the third-order aberration region in the peripheral area is provided at a position not adjacent to the aperture stop, the lens closest to the object is a negative lens or the aspheric lens, at least one positive lens is located closer to the image than the aperture stop,
0.18
<
(
∑
i
=
1
i
=
n
❘
"\[LeftBracketingBar]"
1
f
i
❘
"\[RightBracketingBar]"
)
·
f
n
<
0
.
9
is satisfied, a bundle of rays reaching the maximum image height and a bundle of rays having the principal ray parallel to the optical axis do not intersect with each other within the first lens from the object side, and
40
°
<
HFOV
<
80
°
An imaging optical system wherein the number of lenses is three or four, an aperture stop is located between the lens closest to the object and the lens closest to the image, a single aspheric lens in which radius of curvature of each surface is infinity in the paraxial region and which has a power of the third-order aberration region in the peripheral area is provided at a position not adjacent to the aperture stop, the lens closest to the object is a negative lens or the aspheric lens, at least one positive lens is located closer to the image than the aperture stop,
0.18
<
(
∑
i
=
1
i
=
n
❘
"\[LeftBracketingBar]"
1
f
i
❘
"\[RightBracketingBar]"
)
·
f
n
<
0
.
9
is satisfied, a bundle of rays reaching the maximum image height and a bundle of rays having the principal ray parallel to the optical axis do not intersect with each other within the first lens from the object side, and
40
°
<
HFOV
<
80
°
is satisfied.
G02B 13/18 - Objectifs optiques spécialement conçus pour les emplois spécifiés ci-dessous avec des lentilles ayant une ou plusieurs surfaces non sphériques, p. ex. pour réduire l'aberration géométrique
G02B 13/06 - Objectifs panoramiquesLentilles dites "de ciel"
This scanning optical system includes: a deflector; a plurality of collimator lenses arranged in a direction of a rotation axis of the deflector; a first lens; a second lens; and an imaging optical system, and is configured so that a light beam passing through one of the collimator lenses, the first lens, and the second lens and deflected by the deflector is formed into a scanning light beam by the imaging optical system, wherein where a cross section perpendicular to the rotation axis and including a common optical axis of the first and second lenses is defined as a first cross section, and a cross section parallel to the rotation axis and including the optical axis is defined as a second cross section, the first cross section of one surface of the first lens is formed so as to diverge the light beam, the second cross section of the other surface of the first lens is formed so as to converge the light beam, and the first cross section of one surface of the second lens is formed so as to collimate or converge the light beam and is formed such that when the light beam reaches the surface of the deflector, the width of the light beam at the first cross section is greater than the width of the surface, and the light beam is focused on the surface at the second cross section.
An optical scanning system comprising a deflector, collimator lenses arranged in a line in the direction of the rotation axis of the deflector, a first lens, a second lens and an imaging optical system, wherein in both lens surfaces of the first lens and one lens surface of the second lens, the shape in a horizontal first cross section and the shape in a vertical second cross section is different from each other, in the first lens, a surface facing the second lens is shaped in the first cross section to diverge a light beam, a surface facing the collimator lenses is shaped in the second cross section to converge a light beam and a surface of the second lens is shaped in the first cross section to collimate or converge a light beam.
G02B 26/08 - Dispositifs ou dispositions optiques pour la commande de la lumière utilisant des éléments optiques mobiles ou déformables pour commander la direction de la lumière
Provided is a grating comprising linear ridges of a plurality of second materials arranged at a period p in a first direction on a flat surface of a member of a first material, wherein p is 0.3-1 micrometer, and, in a cross section perpendicular to the flat surface and the first direction, the shape of each ridge is a trapezoid having a line segment corresponding to the flat surface as a lower base, the height d of the trapezoid is 0.83 × p or less, a first side and a second side of the trapezoid other than the lower base and the upper base are defined as a first side and a second side, the interior angle α formed by the first side and the lower base is 60 degrees or less, the interior angle β formed by the second side with the lower base is 75 degrees or more, and the ratio of w1 and (w1 + w2) is 0.20-0.80, where w1 is the length of the upper base and w2 is the difference between p and the length of the lower base.
An optical scanning system comprising first and second light sources emitting first and second light beams, a polygon mirror and first to fourth scanning lenses, wherein when an x-axis is in a direction of the central axis of the polygon mirror, a y-axis is in a scanning direction, P1 and P2 respectively represent reference points of deflection of the first and second light beams, L1 and L2 respectively represent a distance between P1 and the first scanning lens and a distance between P2 and the second scanning lens, Lp12 represents a distance between P1 and P2, h1 and h2 respectively represent thicknesses of the first and second scanning lenses and each of θ1 and θ2 represent an acute angle between a projection of the principal ray each of the first and second light beams onto an x-y plane,
An optical scanning system comprising first and second light sources emitting first and second light beams, a polygon mirror and first to fourth scanning lenses, wherein when an x-axis is in a direction of the central axis of the polygon mirror, a y-axis is in a scanning direction, P1 and P2 respectively represent reference points of deflection of the first and second light beams, L1 and L2 respectively represent a distance between P1 and the first scanning lens and a distance between P2 and the second scanning lens, Lp12 represents a distance between P1 and P2, h1 and h2 respectively represent thicknesses of the first and second scanning lenses and each of θ1 and θ2 represent an acute angle between a projection of the principal ray each of the first and second light beams onto an x-y plane,
h
2
2.2
≤
(
2
·
L
1
+
L
2
+
L
p
12
)
·
tan
θ1
h
1
2.2
≤
(
2
·
L
2
+
L
1
+
L
p
12
)
·
tan
θ
2
An optical scanning system comprising first and second light sources emitting first and second light beams, a polygon mirror and first to fourth scanning lenses, wherein when an x-axis is in a direction of the central axis of the polygon mirror, a y-axis is in a scanning direction, P1 and P2 respectively represent reference points of deflection of the first and second light beams, L1 and L2 respectively represent a distance between P1 and the first scanning lens and a distance between P2 and the second scanning lens, Lp12 represents a distance between P1 and P2, h1 and h2 respectively represent thicknesses of the first and second scanning lenses and each of θ1 and θ2 represent an acute angle between a projection of the principal ray each of the first and second light beams onto an x-y plane,
h
2
2.2
≤
(
2
·
L
1
+
L
2
+
L
p
12
)
·
tan
θ1
h
1
2.2
≤
(
2
·
L
2
+
L
1
+
L
p
12
)
·
tan
θ
2
are satisfied.
G02B 26/12 - Systèmes de balayage utilisant des miroirs à facettes multiples
B41J 2/447 - Machines à écrire ou mécanismes d'impression sélective caractérisés par le procédé d'impression ou de marquage pour lequel ils sont conçus caractérisés par l'irradiation sélective d'un matériau d'impression ou de transfert d'impression utilisant des ensembles de sources de rayonnement
B41J 2/47 - Machines à écrire ou mécanismes d'impression sélective caractérisés par le procédé d'impression ou de marquage pour lequel ils sont conçus caractérisés par l'irradiation sélective d'un matériau d'impression ou de transfert d'impression utilisant la combinaison du balayage et de la modulation de lumière
G03G 15/04 - Appareils pour procédés électrographiques utilisant un dessin de charge pour exposer, c.-à-d. pour projeter optiquement l'image originale sur un matériau d'enregistrement photoconducteur
G03G 15/043 - Appareils pour procédés électrographiques utilisant un dessin de charge pour exposer, c.-à-d. pour projeter optiquement l'image originale sur un matériau d'enregistrement photoconducteur avec des moyens de commande de l'éclairage ou de l'exposition
A method of machining a mold for a microlens array, wherein for a surface of the mold corresponding to a microlens surface, an xyz coordinate system is defined such that a z-axis is parallel to the central axis of the surface, an angle φ is defined as an angle around a straight line passing through a point on the rotation axis and parallel to the z-axis, of a plane containing the rotation axis of a cutting tool and the straight line, in machining of a surface of the mold, the angle φ is kept constant and in machining of the surfaces of the mold, values of the angle φ for the surfaces of the mold are distributed so as to make variance of the values of the angle φ greater than a predetermined value.
The present invention provides a spraying method for mist containing peroxynitrite which can be used for wide applications such as finger disinfection and indoor spraying, wherein the spraying method can change a half-life for attenuation of concentration and a peak value of concentration of peroxynitrite contained in mist according to the application. In the spraying method, peroxynitrite is continuously generated by a spraying device with a plasma activated mist having a pH in the range of 2 to 5, the mist being generated from an aqueous solution containing nitrite having a concentration ranging from 10 micromolar to 10 millimolar.
B05D 7/24 - Procédés, autres que le flocage, spécialement adaptés pour appliquer des liquides ou d'autres matériaux fluides, à des surfaces particulières, ou pour appliquer des liquides ou d'autres matériaux fluides particuliers pour appliquer des liquides ou d'autres matériaux fluides particuliers
B05D 1/02 - Procédés pour appliquer des liquides ou d'autres matériaux fluides aux surfaces réalisés par pulvérisation
13.
THIN FILM TYPE FILTER FOR ATTENUATING LIGHT AND METHOD OF PRODUCING THE SAME
A thin film type filter for attenuating light comprising a multilayer film including a layer or layers of iron oxide and a layer or layers of other material having refractive index lower than refractive index of iron oxide, wherein the multilayer is made up of alternate layers of iron oxide and of other material, a ratio of the number of iron atoms to the number of oxygen atoms in each layer of iron oxide is equal to or greater than 4/3 and less than 3/2 and an attenuation coefficient of each layer of iron oxide is equal to or greater than 0.1 for light of wavelength of a certain wavelength in a wavelength from 700 nanometers to 2000 nanometers.
A projection optical system comprising a first lens having a positive refractive power, a second lens having a negative refractive power and a third lens having a positive refractive power, the lenses being arranged in ascending order in number from the side of an illuminated object, wherein when the optical system is regarded as an imaging optical system receiving a light beam from the side of the illuminated object, the effective focal length is represented by f, the total refractive power is represented by Pt=1/f, each lens surface of the three lenses are referred to as a first lens surface to a sixth lens surface from the side of the illuminated object, the refractive power is represented by Pt, the center thickness of the second lens is represented by L2 and f number is represented by F, the expressions
A projection optical system comprising a first lens having a positive refractive power, a second lens having a negative refractive power and a third lens having a positive refractive power, the lenses being arranged in ascending order in number from the side of an illuminated object, wherein when the optical system is regarded as an imaging optical system receiving a light beam from the side of the illuminated object, the effective focal length is represented by f, the total refractive power is represented by Pt=1/f, each lens surface of the three lenses are referred to as a first lens surface to a sixth lens surface from the side of the illuminated object, the refractive power is represented by Pt, the center thickness of the second lens is represented by L2 and f number is represented by F, the expressions
1.3
<
P
5
/
Pt
0.1
<
L
2
/
f
<
0.25
F
<
0.7
G02B 1/04 - Éléments optiques caractérisés par la substance dont ils sont faitsRevêtements optiques pour éléments optiques faits de substances organiques, p. ex. plastiques
G02B 9/16 - Objectifs optiques caractérisés à la fois par le nombre de leurs composants et la façon dont ceux-ci sont disposés selon leur signe, c.-à-d. + ou — ayant uniquement trois composants disposés + — + tous trois étant simples
15.
OPTICAL SYSTEM PROVIDED WITH ATTENUATING AREA AND METHOD OF PRODUCING THE SAME
An optical element for optically connecting a light source and a light receiving element, the optical element being provided with a lens surface for receiving light designed to face the light source, a lens surface for delivering light designed to face the light receiving element and an attenuating area for attenuating a light beam that is incident on the lens surface for receiving light and reaches the lens surface for delivering light, wherein the optical element is further provided with an additional lens surface and a surface for positioning another light source for the additional lens surface and wherein the additional lens surface is designed such that the conjugate point of the intersection of the optical axis of the additional lens surface with a plane containing the surface for positioning lies on a path of the light beam.
This illumination optical system comprises, in order from the illumination target side, a first lens having positive refractive power, a second lens having negative refractive power, and a third lens having positive refractive power. When the illumination optical system, being regarded as an imaging optical system with respect to a light flux made incident from the illumination object side, has a combined focal length of f millimeters and a combined refractive power Pt = 1/f, and when, assuming that the three lenses have first to sixth surfaces from the illumination object side, the fifth surface has a refractive power P5 and the second lens has a central thickness of L2, the following expressions are satisfied. 1.3 < P5/Pt 0.1 < L2/f < 0.25
A combination of an optical element and an antireflection film, the optical element being provided with a microlens array and configured to diverge a light beam, the maximum angle of a diverged ray to a reference axis being D, wherein in each microlens
A combination of an optical element and an antireflection film, the optical element being provided with a microlens array and configured to diverge a light beam, the maximum angle of a diverged ray to a reference axis being D, wherein in each microlens
Z
/
P
≥
0
.
8
A combination of an optical element and an antireflection film, the optical element being provided with a microlens array and configured to diverge a light beam, the maximum angle of a diverged ray to a reference axis being D, wherein in each microlens
Z
/
P
≥
0
.
8
is satisfied, where Z represents distance between the vertex and the bottom and P represents the diameter of the smallest circle enclosing the bottom and the antireflection film being designed such that
A combination of an optical element and an antireflection film, the optical element being provided with a microlens array and configured to diverge a light beam, the maximum angle of a diverged ray to a reference axis being D, wherein in each microlens
Z
/
P
≥
0
.
8
is satisfied, where Z represents distance between the vertex and the bottom and P represents the diameter of the smallest circle enclosing the bottom and the antireflection film being designed such that
{
T
(
0
)
/
T
(
D
)
}
/
{
T
′
(
0
)
/
T
′
(
D
)
}
≤
0
.
8
5
A combination of an optical element and an antireflection film, the optical element being provided with a microlens array and configured to diverge a light beam, the maximum angle of a diverged ray to a reference axis being D, wherein in each microlens
Z
/
P
≥
0
.
8
is satisfied, where Z represents distance between the vertex and the bottom and P represents the diameter of the smallest circle enclosing the bottom and the antireflection film being designed such that
{
T
(
0
)
/
T
(
D
)
}
/
{
T
′
(
0
)
/
T
′
(
D
)
}
≤
0
.
8
5
is satisfied, where T(0) and T(D) respectively represent transmittance of the film formed on a substrate made of the material of the optical element for incident rays at 0 and D, and T′(0) and T′(D) respectively represent transmittance of the substrate without an antireflection film for incident rays at 0 and D, wherein the combination is configured so as to realize a target intensity distribution of diverged rays.
This vehicle-use projection optical system includes first to fourth lenses in order from a projection target side. The first lens has positive refractivity, and has a surface on the projection target side such that the surface is convex towards the projection target side. The second lens has negative refractivity. The third lens has positive refractivity. The fourth lens is a meniscus lens that has positive refractivity and is convex on the projection target side. The second and third lenses constitute a cemented doublet that is a combination of a biconcave lens and a biconvex lens, or a combination of a plano-concave lens and a plano-convex lens. A surface of the fourth lens, which is on the opposite side from the projection target side, is concave around the optical axis of the optical system, and has a convex portion on the outside. When the optical system is regarded as an imaging optical system, 2.8 < f1/f < 5.8(1) 3.0 < f23/f < 8.4(2) is satisfied, where f is the overall focal length, f1 is the focal length of the first lens, and f23 is the focal length of the cemented doublet.
In this image-forming optical system, a main light beam is designated as a light beam which: travels in a z-axis direction in a first plane perpendicular to an x-axis in a xyz orthogonal coordinate system; is reflected at a first reflective surface which is a convex surface; passes through an aperture; is reflected at a second reflective surface and a third reflective surface which are concave surfaces; and thereafter travels in the z-axis direction, the path of the light beam being included in the first plane. A parallel light flux incident on the first reflective surface is condensed on an image surface perpendicular to the z-axis, and the path of a light flux incident on the second reflective surface and the path of a light flux reflected by the third reflective surface intersect each other. When a composite focal distance of the second and third reflective surfaces along the path of the main light beam in the first plane is designated as fy, and a composite focal distance of the second and third reflective surfaces along the path of the main light beam in a plane perpendicular to the first plane and including the path of the main light beam is designated as fx, the image-forming optical system satisfies 1.05 < fy/fx < 1.5 (1).
This method for manufacturing a microlens array for irradiating a surface with a light flux having a prescribed wavelength includes: a step for determining the amplitude distribution of light on the surface to be irradiated from a target intensity distribution for light on the surface to be irradiated; a step for calculating the distribution of the absolute values of the amplitudes of light on a surface of the microlens array from the amplitude distribution of light on the surface to be irradiated; a step for determining the shape of the surface of the microlens array according to the distribution of the absolute values of the amplitudes of light on the surface of the microlens array; and a step for calculating the amplitude distribution of light that has passed through the microlens array on the surface to be irradiated. The step for calculating the distribution of the absolute values of the amplitudes of light on the surface of the microlens array, as well as the subsequent steps, are repeated, as needed, to reduce the sum of the respective differences between the absolute value of the amplitude of light at each position on the surface to be irradiated, obtained through calculation, and the absolute value of the amplitude of light corresponding to the target intensity of light at that position on the surface to be irradiated.
A light guiding device (100) according to the present invention has a light guiding substrate (150) that propagates light by internal reflection. The light guiding substrate (150) is provided with: a light incidence part (110) having a first section (111) that propagates received light as a first light beam along a first path within the light guiding substrate (150), and a second section (112) that propagates received light as a second light beam along a second path within the light guiding substrate (150), both sections being one-dimensional diffraction gratings; a first folding part (121) that directs the first light beam toward a light emission part (130); and a second folding part (122) that directs the second light beam toward the light emission part (130). On a surface of the light guiding substrate (150), the center of a minimum circle including the first section (111) is farther away from the light emission part (130) than the center of a minimum circle including the second section (112), and the first path is configured so as to pass a region of the light guiding substrate (150), the region being provided with the second section (112). A stray light-preventing structure is provided in a region other than the first path and the second path within a light ray path range in which a light ray incident on the first section (111) can propagate as first-order diffracted light of both the first section (111) and the second section (112) and reach the light emission part (130).
H04N 5/64 - Détails de structure des récepteurs, p. ex. ébénisterie ou housses
H04N 13/344 - Affichage pour le visionnement à l’aide de lunettes spéciales ou de visiocasques avec des visiocasques portant des affichages gauche et droit
This atomization device comprises a mist generating part and a plasma activity part. The plasma activity part comprises: a dielectric material tube; an external electrode installed on the outer surface of the dielectric material tube; an internal electrode installed on the inner surface of the dielectric material tube; and a high frequency power source that applies a high frequency voltage to the external electrode and the internal electrode. The positions of the external electrode and the internal electrode in the axial direction of the dielectric material tube are configured so as not to overlap or only partially overlap. Mist fed from the mist generating part into one end section of the dielectric material tube is plasma-activated and fed out from the other side of the dielectric material tube after having passed through the dielectric material tube.
B05B 5/025 - Appareillages pour délivrer le matériau, p. ex. pistolets de pulvérisation électrostatique
A61L 2/14 - Procédés ou appareils de désinfection ou de stérilisation de matériaux ou d'objets autres que les denrées alimentaires ou les lentilles de contactAccessoires à cet effet utilisant des phénomènes physiques du plasma, c.-à-d. des gaz ionisés
B05D 1/04 - Procédés pour appliquer des liquides ou d'autres matériaux fluides aux surfaces réalisés par pulvérisation comportant l'emploi d'un champ électrostatique
C01B 13/28 - Méthodes de préparation des oxydes ou hydroxydes en général par oxydation d'éléments à l'état gazeuxMéthodes de préparation des oxydes ou hydroxydes en général par oxydation ou hydrolyse de composés à l'état gazeux d'halogénures ou d'oxyhalogénures en utilisant un plasma ou une décharge électrique
C01B 15/03 - Préparation à partir de peroxycomposés inorganiques, p. ex. à partir de peroxysulfates
A press molding method of a glass optical element using a mold, the method including plural steps with pressurizing, in each of which load is imposed on a piece of glass material at a temperature above the glass transition temperature, and a step without pressurizing between two steps with pressurizing, wherein in a step without pressurizing between a first step with pressurizing and a second step with pressurizing, the second step with pressurizing being the next step with pressurizing after the first step with pressurizing, the temperature of the mold is reduced by 50 degrees centigrade or greater with respect to the temperature of the mold in the first step with pressurizing and then the mold is heated before the start of the second step with pressurizing.
B29C 43/14 - Moulage par pressage, c.-à-d. en appliquant une pression externe pour faire couler la matière à moulerAppareils à cet effet pour la fabrication d'objets de longueur définie, c.-à-d. d'objets séparés en plusieurs étapes
B29C 43/00 - Moulage par pressage, c.-à-d. en appliquant une pression externe pour faire couler la matière à moulerAppareils à cet effet
Provided is a scanning optical system that includes first and second light sources, a polygon mirror, and first through fourth scanning lenses, the scanning optical system being configured so that the mathematical expressions below are satisfied, where A1 and A2 are the respective apexes of incidence-side surfaces of the first and second scanning lenses, an x-axis is defined as the direction of a rotational axis of the polygon mirror, a y-axis is defined as the scanning direction of a luminous flux, a z-axis is defined so as to be orthogonal to the x-axis and the y-axis, P1 and P2 are respective reference points of deflection of luminous fluxes from the first and second light sources, L1 is the distance between point P1 and point A1 in the z-axis direction, L2 is the distance between point P2 and point A2 in the z-axis direction, Lp12 is the distance between point P1 and point P2 in the z-axis direction, h1 is the thickness of the first scanning lens in the x-axis direction, h2 is the thickness of the second scanning lens in the x-axis direction, and θ1 and θ2 are each acute angles formed with the y-axis by straight lines obtained by projecting the principal ray of luminous fluxes arriving at the polygon mirror from the first and second light sources onto the plane that includes the x-axis and the y-axis.
G02B 26/12 - Systèmes de balayage utilisant des miroirs à facettes multiples
B41J 2/47 - Machines à écrire ou mécanismes d'impression sélective caractérisés par le procédé d'impression ou de marquage pour lequel ils sont conçus caractérisés par l'irradiation sélective d'un matériau d'impression ou de transfert d'impression utilisant la combinaison du balayage et de la modulation de lumière
H04N 1/113 - Dispositions de balayage utilisant des miroirs oscillants ou rotatifs
This scanning optical system is equipped with a deflector and an imaging optical system equipped with a first scanning lens which is nearer said deflector and a second scanning lens which is farther from said deflector. The scanning optical system is configured in a manner such that: the scanning direction is perpendicular to the axis of rotation of the deflector and to the optical axis of the imaging optical system; 0.88≤f/L and d/L≤0.3 are satisfied, if a value obtained by dividing half the scan width by the maximum value of a deflection angle θ is a system focal distance f, the distance from the deflection surface of said deflector to the scanning surface along the optical axis is L, and the distance from the deflection surface to the surface of the second scanning lens which is farther from the deflector is d; when the scanning direction is the y-axis direction, the y-coordinate of the optical axis is 0, and the y-coordinates at the location on the scanning surface of the principal ray of the luminous flux is expressed as a deflection angle θ function, the absolute value of a differential function dy/dθ of said function increases according to the absolute value of the deflection angle θ; and the differential function dy/dθ has a plurality of inflection points which are each in the ranges of -1≤r≤-0.4 or 0.4≤r≤1 if the ratio of the deflection angle to the maximum value of the absolute value of the deflection angle θ is r.
ii is the focal length of each lens, f is the overall focal length, and n is the number of lenses, a luminous flux that is incident on the optical system and reaches the maximum image height and a principal ray incident on the optical system do not cross a luminous flux parallel to the optical axis within a first lens, and the imaging optical system satisfies formula (B), where HFOV is the angle formed with the optical axis by the principal ray of the luminous flux that is incident on the optical system and reaches the maximum image height.
G02B 13/00 - Objectifs optiques spécialement conçus pour les emplois spécifiés ci-dessous
G02B 13/18 - Objectifs optiques spécialement conçus pour les emplois spécifiés ci-dessous avec des lentilles ayant une ou plusieurs surfaces non sphériques, p. ex. pour réduire l'aberration géométrique
27.
OPTICAL UNIT WITH ATTENUATING PORTION AND METHOD OF PRODUCING THE SAME
An optical unit of plastic provided with a surface for incident light and a surface for outgoing light, wherein the surface for incident light is designed to face a light source and the surface for outgoing light is designed to face an element for receiving light so as to optically connect the light source and the element for receiving light and wherein the optical unit is so shaped that light that comes from the light source and is incident on the surface for incident light forms a first image of the light source within the optical unit and a second image of the light source after having gone through the surface for outgoing light and the optical unit is provided with an attenuating portion for attenuating the quantity of light passing therethrough in the vicinity of the position where the first image is formed.
Provided is a cutting method for a mold of a micro-lens array provided with a plurality of micro-lenses having approximately the same shape and each having an optical axis in the same direction. When one surface of the mold corresponding to a surface of one micro-lens is cut, in a coordinate system which has the x-axis, y-axis, and z-axis orthogonal to one another and in which the z-axis is defined as the direction of a center axis corresponding to the optical axis of the micro-lens of the one surface, and an angle between a rotational axis of the tool and a straight line in the direction of the z-axis passing through a point on the rotational axis of the tool is defined as θ, and an angle around the straight line in a plane including the rotational axis of the tool and the straight line is defined as Φ, cutting is performed while changing the value of the angle θ and maintaining the value of the angle Φ at a fixed value, and the variance of the angle Φ is distributed so as to be a prescribed value or higher with respect to the plurality of surfaces of the mold when the plurality of surfaces of the mold corresponding to the surfaces of the plurality of micro-lenses are cut.
The present invention provides an optical element that optically couples a light-emitting element which functions as a light source and a light-receiving element, that can be produced easily, and that achieves, with high precision, a wide range of desired transmissivity. Provided is an optical element that, in order to optically couple a light source and a light-receiving element which receives light from the light source, comprises an entry lens surface (111) configured to face the light source and an exit lens surface (131) configured to face the light-receiving element, and that is provided with an attenuation region for light which enters from the entry lens surface (111) and reaches the exit lens surface (131). The optical element further comprises an additional lens surface (LLP) other than the entry lens surface (111) and the exit lens surface (131), and a positioning surface for a separate light source for the additional lens surface (LLP). The additional lens surface (LLP) is configured such that a conjugate point of an intersection point between the optical axis of the additional lens surface (LLP) and a plane including the positioning surface is positioned on or in the vicinity of the path of light that enters from the entry lens surface (111) and reaches the exit lens surface (131).
A method of producing a diffraction grating of borosilicate glass or barium borosilicate glass, the method comprising the steps of forming a grating on a surface of a silicon wafer the grating through the Bosch process; forming an oxide film on a surface of the grating by heating and exposure to water vapor of the silicon wafer; removing the oxide film using hydrofluoric acid; making the surface provided with the grating of the silicon wafer and a surface of a glass plate undergo anodic bonding; heating the silicon wafer and the glass plate bonded to each other; polishing a surface opposite to the boded surface of the silicon wafer and a surface opposite to the boded surface of the glass plate; and removing silicon from the glass plate by selective etching using xenon difluoride.
A method of producing a mold for a microlens array with a cutting tool rotating around a rotation axis, microlenses having the substantially same shapes. A z-axis of an (x, y, z) coordinate system is in the direction of the central axis of a surface of the mold. The method includes the steps of cutting a surface of the mold while each of angle θ between the rotation axis of the cutting tool and a straight line passing through a point on the rotation axis and parallel to the z-axis and angle φ of a plane containing the rotation axis and the straight line around the straight line is kept constant; and cutting the plural surfaces while the values of angle θ and angle φ are determined such that a variance of the values of at least one of angle θ and angle φ is greater than a predetermined value.
Provided is a thin film photosensitive filter comprising: one or more iron oxide layers; and one or more low refractive index layers having a lower refractive index than the one or more iron oxide layers. In the multilayer film, each iron oxide layer and each low refractive index layer are alternately laminated, the ratio of the number of oxygen atoms to the number of iron atoms in each iron oxide layer is greater than or equal to 4/3 and less than 3/2, and the extinction coefficient of each iron oxide layer is at least 0.1 for light having a wavelength in the 700-2000 nanometer wavelength range.
This optical element comprises a micro-lens array on a first surface and an anti-reflection film on a second surface, and is configured so as to cause a light flux, which has entered from the first surface and is parallel to the center axis of each micro-lens, to diverge from the second surface such that the maximum value of the angle formed between the center axis and diverged light beam is D. Each micro-lens is configured to satisfy Z/P≥0.8, where Z is the distance from the top to the bottom surface, and P is the diameter of the smallest circle surrounding the bottom surface. The anti-reflection film is formed to satisfy {T(0)/T(D)}/{T'(0)/T'(D)}≤0.85 and further configured to satisfy {T(0)/T(D)}/{T'(0)/T'(D)}≤Z/P, where T(0) and T(D) are the incident angle 0 and the transmittance of the incident light beam of D, respectively, and T'(0) and T'(D) are the incident angle 0 on an optical element main body surface not having the anti-reflection film and the transmittance of the incident light beam of D, respectively.
A light guiding apparatus comprising: a light guiding substrate; a light receiving unit including first and second units provided on a surface of the substrate, the first and second units transmitting received rays along first and second paths in the substrate as first and second light beams, respectively; a first direction changing unit for the first light beam; a second direction changing unit for the second light beam; and a light emitting unit receiving the first and the second light beams, combining the beams for emission and provided on the surface, wherein on the surface the center of the minimum circle encompassing the first unit is located farther away from the light emitting unit than the center of the minimum circle encompassing the second unit and the first path runs through the portion of the substrate on which the second unit is provided.
Provided are methods for manufacturing a microlens and a microlens array, wherein at the time of cutting, chipping and cracking are less likely to occur, and cuttings are prevented from occurring and adhering to the microlens or the microlens array. The present invention relates to methods for manufacturing a microlens and a microlens array, the methods including: a step for forming a plurality of microlens surfaces on a glass substrate; and a step for cutting the substrate. The step for cutting the substrate includes a sub-step for performing scribing on the substrate by a laser filament, and a sub-step for cutting the substrate by applying force by a braking bar in a position where the scribing has been performed, and the ratio between the thickness of the substrate and the minimum interval between a plurality of scribe lines is 4 or less.
The diffusor has a microlens array including microlenses with the bases placed on a plane. Concerning a curved surface of each microlens, the following expressions are satisfied, where in a cross section perpendicular to the plane and containing a straight line passing through the projection point onto the plane of the vertex and maximizing a distance between two points of the straight line on the periphery of the base, coordinate along the straight line, coordinate of the curved surface of the microlens in the direction perpendicular to the plane, the maximum value of the first derivative of z′ with respect to x′, the absolute value of the second derivative of z′ with respect to x′ at x′ coordinate of the projection point and the absolute value at x′ coordinate of an end of the straight line are represented respectively by x′, z′, d, D0 and D.
The diffusor has a microlens array including microlenses with the bases placed on a plane. Concerning a curved surface of each microlens, the following expressions are satisfied, where in a cross section perpendicular to the plane and containing a straight line passing through the projection point onto the plane of the vertex and maximizing a distance between two points of the straight line on the periphery of the base, coordinate along the straight line, coordinate of the curved surface of the microlens in the direction perpendicular to the plane, the maximum value of the first derivative of z′ with respect to x′, the absolute value of the second derivative of z′ with respect to x′ at x′ coordinate of the projection point and the absolute value at x′ coordinate of an end of the straight line are represented respectively by x′, z′, d, D0 and D.
D/D0<1
The diffusor has a microlens array including microlenses with the bases placed on a plane. Concerning a curved surface of each microlens, the following expressions are satisfied, where in a cross section perpendicular to the plane and containing a straight line passing through the projection point onto the plane of the vertex and maximizing a distance between two points of the straight line on the periphery of the base, coordinate along the straight line, coordinate of the curved surface of the microlens in the direction perpendicular to the plane, the maximum value of the first derivative of z′ with respect to x′, the absolute value of the second derivative of z′ with respect to x′ at x′ coordinate of the projection point and the absolute value at x′ coordinate of an end of the straight line are represented respectively by x′, z′, d, D0 and D.
D/D0<1
and
The diffusor has a microlens array including microlenses with the bases placed on a plane. Concerning a curved surface of each microlens, the following expressions are satisfied, where in a cross section perpendicular to the plane and containing a straight line passing through the projection point onto the plane of the vertex and maximizing a distance between two points of the straight line on the periphery of the base, coordinate along the straight line, coordinate of the curved surface of the microlens in the direction perpendicular to the plane, the maximum value of the first derivative of z′ with respect to x′, the absolute value of the second derivative of z′ with respect to x′ at x′ coordinate of the projection point and the absolute value at x′ coordinate of an end of the straight line are represented respectively by x′, z′, d, D0 and D.
D/D0<1
and
d≥2
This lens is composed of a core member and an outer layer covering the core member. The core member has flange parts that have first and second surfaces and that protrude in directions substantially perpendicular to the optical axis of the lens. The flange parts have, on the first surface, a first protrusion that protrudes substantially perpendicularly to the first surface and that is provided in a region along the outer circumference of the core member so as to correspond to 0.5% or more of the outer circumference, and have, on the second surface, a second protrusion that protrudes substantially perpendicularly to the second surface and that is provided in a region along the outer circumference of the core member so as to correspond to 0.5% or more of the outer circumference.
A method for manufacturing a mold for a retroreflective element, the mold having plural polygonal faces having a common vertex, the method including the steps of: roughing of a polygonal face in which cutting is carried out such that a predetermined cutting amount in a finishing process is left with respect to a desired shape; and finishing of the polygonal face in which a blade portion is made to move relatively towards the vertex while an angle of relief of the blade portion is kept within 1 degree so as to carry out cutting of the predetermined cutting amount, wherein a depth of cut for each one-time cutting operation is 2 micrometers or smaller, and the movement of the blade portion is a combination of a motion towards the vertex and an oscillation.
This device comprises a light guide substrate in which light is propagated by internal reflection. The light guide substrate is provided with: a light entry unit that is a one-dimensional diffraction grating and that comprises a first section where received light is caused to propagate along a first pathway within the light guide substrate as a first light beam, and a second section where received light is caused to propagate along a second pathway within the light guide substrate as a second light beam; a first turn-back unit and a second turn-back unit that are one-dimensional diffraction gratings, the former changing the direction of the first pathway of the first light beam and the latter changing the direction of the second pathway of the second light beam; and a light emission unit that is a two-dimensional diffraction grating and that receives a first and second beam from the first and second turn-back units and combines same to emit to the exterior of the light guide substrate. In the plane of the light guide substrate, the center of the smallest circle encompassing the first section is further away from the light emission unit than the center of the smallest circle encompassing the second section; and the first pathway passes through the region of the light guide substrate where the second section is provided.
Provided is a molding method of a glass optical element by which sufficiently high shape accuracy can be achieved regardless of the shape. The press molding method of a glass optical element using a mold according to the present invention comprises: a plurality of pressurizing steps for pressurizing a glass material at a temperature equal to or higher than the glass transition point; and a non-pressurizing step for not pressurizing the glass material, said non-pressurizing step being between two temporally adjacent pressurizing steps. When one of the plurality of pressurizing steps is referred to as a first pressurizing step and the subsequent pressurizing step that is temporally adjacent to the first pressurizing step is referred to as a second pressurizing step, then, in the non-pressurizing step between the first and second pressurizing steps, the temperature of the mold is set at a temperature lower by at least 50°C than the temperature in the first pressurizing step.
A method for illumination of an object to be observed to be observed and the background, the method comprising the steps of: obtaining a relationship between wavelength and spectral radiance of the object while the object and the background are illuminated by a first light source that emits light that has a continuous spectrum in the wavelength range from 380 nanometers and 780 nanometers, and determining a value of representative wavelength that corresponds to a maximum value of the spectral radiance of the object plotted against wavelength or values of representative wavelength that correspond to maximum values of the spectral radiance of the object plotted against wavelength; determining a value or values of comparative wavelength; and illuminating the object and the background with light of the value or values of representative wavelength and light of the value or values of comparative wavelength.
An optical element is provided which optically couples a light-receiving element and light-emitting element that functions as a light source, and which can be easily manufactured and realizes a desired attenuation rate with high precision. This optical element is provided with an incident surface (S1) configured opposite of the light source and an exit surface (S2) configured opposite of said light-receiving element so as to optically couple the light source (L0) and the light-receiving element which receives light from the light source, wherein the light incident from the light source onto the incident surface forms a first image (L1) of the light source inside the optical element, and forms a second image (L2) of the light source after emission from the exit surface, and, near the position where said first image (L1) is formed, the optical element has an attenuation region that reduces the amount of transmitted light.
An imaging optical system wherein the number of lenses is three to seven, one to four lenses, each of which is an aspheric lens in which radius of curvature of each of both surfaces is infinity in the paraxial region and which has a power of the third-order aberration region in the peripheral area are provided, the first lens from the object side is a negative lens or the aspheric lens, the relationship
is satisfied where HFOV represents angle that the principal ray of bundle of rays that enters the imaging optical system and reaches the maximum value of image height forms with the optical axis.
G02B 9/34 - Objectifs optiques caractérisés à la fois par le nombre de leurs composants et la façon dont ceux-ci sont disposés selon leur signe, c.-à-d. + ou — ayant uniquement quatre composants
G02B 9/60 - Objectifs optiques caractérisés à la fois par le nombre de leurs composants et la façon dont ceux-ci sont disposés selon leur signe, c.-à-d. + ou — ayant uniquement cinq composants
G02B 9/62 - Objectifs optiques caractérisés à la fois par le nombre de leurs composants et la façon dont ceux-ci sont disposés selon leur signe, c.-à-d. + ou — ayant uniquement six composants
G02B 9/64 - Objectifs optiques caractérisés à la fois par le nombre de leurs composants et la façon dont ceux-ci sont disposés selon leur signe, c.-à-d. + ou — ayant plus de six composants
G02B 13/00 - Objectifs optiques spécialement conçus pour les emplois spécifiés ci-dessous
44.
METHOD FOR MANUFACTURING FINE SURFACE ROUGHNESS ON QUARTZ GLASS SUBSTRATE
A method for manufacturing fine surface roughness having an average pitch of 50 nanometers to 5 micrometers on a quartz glass substrate without preparing a mask prior to an etching process, the method comprising the steps of: making the quartz glass substrate undergo ion etching with argon gas in an ion etching apparatus, in which the quartz glass substrate is placed on a first electrode, the first electrode is connected to a high frequency power source and a second electrode is grounded; and making the quartz glass substrate undergo reactive ion etching with trifluoromethane (CHF3) gas or a mixed gas of trifluoromethane (CHF3) and oxygen in the ion etching apparatus in which the quartz glass substrate is placed on the first electrode, the first electrode is connected to the high frequency power source and the second electrode is grounded.
Provided is a method for producing a glass diffraction grating that has a groove aspect ratio of at least 2 and that has a period of not more than 10 micrometers. The present method is a method for producing a borosilicate glass or barium borosilicate glass diffraction grating that has a period of 0.2 to 10 micrometers and a groove aspect ratio of at least 2. The present method comprises a step for forming a grating in the surface of a silicon substrate; a step for forming an oxide film on the surface of the grating by heating to around 1,000°C and carrying out exposure to water vapor; a step for removing the oxide film; a step for carrying out the anodic bonding of one side of a glass plate with the side of the silicon substrate that is provided with the grating; a step for heating the bonded silicon substrate and glass plate so as to melt the glass and fill it between the grating ridges composed of silicon; a step for polishing the surface opposite from the bonded surface, for each of the silicon substrate and the glass plate; and a step for removing, by selective etching, the silicon from the glass plate.
The present invention provides a processing method for a microlens array molding die, the microlens array comprising a plurality of microlenses of approximately the same shape, each of which comprises an optical axis in the same direction. When processing one surface, of the molding die, which corresponds to one microlens surface, in an (x, y, z) coordinate system comprising an x-axis, a y-axis, and a z-axis that are orthogonal to one another, wherein the z-axis is the direction of a central axis corresponding to the optical axis of the microlens one surface, processing is performed with (x, y, z) coordinates, which are processing points of a rotating implement, being changed, while keeping constant the value of an angle θ formed between the rotational axis of the implement and a straight line in the direction of the z-axis passing through a point on the rotational axis of the implement, and the value of an angle Φ around the straight line on a plane that includes the rotational axis of the implement and the straight line, and when processing a plurality of surfaces of the molding die, which correspond to a plurality of microlens surfaces, at least one value, between the angle θ and the angle Φ, is distributed within a prescribed range on each surface.
A method for manufacturing optical scanning systems by which plural optical scanning systems with different effective scanning widths can be manufactured by changing a polygon mirror alone is provided. The method includes the steps of designing a first scanning optical system using a first polygon mirror corresponding to a first value of effective scanning width; designing a second scanning optical system provided with a second polygon mirror corresponding to a second value of effective scanning width, the second value being smaller than the first value, wherein a reference point of deflection is located at the position of the reference point of deflection of the first scanning optical system; and adjusting a size and a position of the scanning lens so as to adjust a lateral magnification in a cross section in the sub-scanning direction of the imaging optical system.
G02B 27/00 - Systèmes ou appareils optiques non prévus dans aucun des groupes ,
G02B 26/12 - Systèmes de balayage utilisant des miroirs à facettes multiples
H04N 1/113 - Dispositions de balayage utilisant des miroirs oscillants ou rotatifs
G02B 7/04 - Montures, moyens de réglage ou raccords étanches à la lumière pour éléments optiques pour lentilles avec mécanisme de mise au point ou pour faire varier le grossissement
B41J 2/47 - Machines à écrire ou mécanismes d'impression sélective caractérisés par le procédé d'impression ou de marquage pour lequel ils sont conçus caractérisés par l'irradiation sélective d'un matériau d'impression ou de transfert d'impression utilisant la combinaison du balayage et de la modulation de lumière
50.
FORMING MOLD, PLATE MEMBERS OF FORMING MOLD, AND METHOD FOR MANUFACTURING FORMING MOLD
Provided is a forming mold for a corner cube reflector, the forming mold including a plurality of plate members, wherein each of the plate members includes two opposite positioning surfaces, each of the positioning surfaces has a shape obtained by alternately connecting two kinds of flat surfaces that form an angle of 120 degrees therebetween, the respective kinds of flat surfaces are parallel to each other, a cross-section of the plate member perpendicular to the two kinds of flat surfaces has a shape in which regular hexagons having the same shape with the centers thereof disposed on a straight line are arranged such that adjacent regular hexagons share one side, one surface of the plate member surrounded by the two opposite positioning surfaces includes a set of three surfaces approximately orthogonal to each other and approximately square including two adjacent sides of each of the regular hexagons and having two adjacent sides respectively on two surfaces perpendicular to the cross-section of the regular hexagon, and the plurality of plate members are assembled by fitting the positioning surfaces such that one surface of the forming mold includes the set of three surfaces.
G02B 5/124 - Réflecteurs reflex du type en sommet de cube, en trièdre ou en réflecteur triple plusieurs éléments réfléchissants faisant partie d'une plaque ou d'une feuille formant un tout
B29C 33/38 - Moules ou noyauxLeurs détails ou accessoires caractérisés par la matière ou le procédé de fabrication
51.
DIFFUSION ELEMENT AND OPTICAL SYSTEM INCLUDING DIFFUSION ELEMENT
This diffusion element comprises a microlens array that includes a plurality of microlenses, bottom surfaces of which are positioned in a plane. Curved surfaces of the microlenses are connected and smooth except for boundaries therebetween, and, in each of the microlenses, the expressions below are satisfied in a cross section which is perpendicular to said plane and includes a straight line which passes through a point of projection of the vertex point of the microlens onto the bottom surface thereof and at which the distance between two points of intersection with a peripheral edge of the bottom surface is at maximum, where x' is a coordinate along said straight line, z' is a coordinate of said curved surface in the direction perpendicular to said plane, d is the maximum value of the first derivative of z' with respect to x', D0 is the absolute value of the second derivative of z' with respect to x' at the x' coordinate of a center, and D is the value at the x' coordinate of an end part of a diagonal. D/D0 < 1, d ≥ 2
The reflector is provided with plural reflector units. Each reflector unit is shaped as a prism or a cylinder provided with a retroreflective structure at one end, the retroreflective structure is configured to reflect incident rays from the other end of the prism or the cylinder in a direction of incidence, and in a reference cross section of the reflector unit, the reference cross section containing the central axis of the prism or the cylinder and the reference cross section being determined such that the shape of the retroreflective structure is line-symmetric with respect to the central axis in the reference cross section, the shape of a light receiving surface at the other end is line-symmetric with respect to the central axis and has a portion inclined with respect to a direction perpendicular to the central axis in the reflector unit.
G02B 5/124 - Réflecteurs reflex du type en sommet de cube, en trièdre ou en réflecteur triple plusieurs éléments réfléchissants faisant partie d'une plaque ou d'une feuille formant un tout
Provided is an efficient manufacturing method for a retroreflective optical element mold, the method such that the shape accuracy of the mold to be manufactured is sufficiently high. This manufacturing method is for a retroreflective optical element mold including a plurality of faces having polygonal shapes. The manufacturing method includes: a step in which, on the basis of a target shape of a face, the face is rough machined so as to leave a predetermined cutting portion; and a step in which finishing machining of the face is carried out by maintaining an escape angle of a cutter part at 1 degree or less and cutting the predetermined cutting portion by relatively moving a tip of the cutter part in a direction of a vertex of a polygon of the face, the cutter part being configured so as to include a blade on two sides, so that an angle formed by the two sides is substantially identical to an inner angle of the polygon, and so that a length of the blade of the two sides is greater than or equal to a length of one side of the polygon. In the step of finishing machining the face, a cut for each cutting is two micrometers or less, the movement is a combination of linear progression in the direction of the vertex of the polygon and vibration, and the movement includes at least one of displacement in the direction of the linear progression and displacement in a direction perpendicular to the direction of linear progression.
G02B 5/124 - Réflecteurs reflex du type en sommet de cube, en trièdre ou en réflecteur triple plusieurs éléments réfléchissants faisant partie d'une plaque ou d'une feuille formant un tout
54.
Method for producing plastic element provided with fine surface roughness
A method for producing a plastic element provided with fine surface roughness is provided. In the method, etching of a surface of the plastic element is performed separately in a first step and in a second step, in the first step, fine roughness having a predetermined average value of pitch in the range from 0.05 to 1 micrometer is generated on the surface through reactive ion etching in an atmosphere of a first gas; and in the second step, an average value of depth of the fine roughness generated in the first step is adjusted to a predetermined value in the range from 0.15 to 1.5 micrometers while the predetermined average value of pitch is substantially maintained through reactive ion etching in an atmosphere of a second gas, reactivity to the plastic element of the second gas being lower than reactivity to the plastic element of the first gas.
H01L 21/3213 - Gravure physique ou chimique des couches, p. ex. pour produire une couche avec une configuration donnée à partir d'une couche étendue déposée au préalable
B29C 33/42 - Moules ou noyauxLeurs détails ou accessoires caractérisés par la forme de la surface de moulage, p. ex. par des nervures ou des rainures
B29C 59/14 - Façonnage de surface, p. ex. gaufrageAppareils à cet effet par plasma
G02B 1/04 - Éléments optiques caractérisés par la substance dont ils sont faitsRevêtements optiques pour éléments optiques faits de substances organiques, p. ex. plastiques
G02B 1/118 - Revêtements antiréfléchissants ayant des structures de surface de longueur d’onde sous-optique conçues pour améliorer la transmission, p. ex. structures du type œil de mite
G02B 1/12 - Revêtements optiques obtenus par application sur les éléments optiques ou par traitement de la surface de ceux-ci par traitement de la surface, p. ex. par irradiation
H01J 37/32 - Tubes à décharge en atmosphère gazeuse
H01L 21/3065 - Gravure par plasmaGravure au moyen d'ions réactifs
55.
OPTICAL ELEMENT AND METHOD FOR PRODUCING COMPOSITE COMPONENT WHICH COMPRISES ELECTRONIC COMPONENT AND OPTICAL ELEMENT ON SUBSTRATE
The present invention provides an optical element which is configured to be affixed to a substrate together with an electronic component by a reflow soldering step. An optical element according to the present invention is an optical element 100 which is mounted on a substrate 300, and which has a first surface that is provided with at least one of a chamfer part 110 and a groove part 115, said first surface being in contact with the substrate. With respect to this optical element, the angle (θ) between the first surface and a second surface of the chamfer part and the groove part, said second surface being connected to the first surface, is within the range of from 10 degrees to 75 degrees; and the second surface and at least a part of the first surface are covered by a film 1010 that is formed of a metal or silicon dioxide.
Provided is an observation target/background illumination method comprising: a step in which the observation target and the background are irradiated with a first light source that emits light having an average color rendering index of 40 or more, a color temperature in the range of 3000-10000 K, and a continuous spectrum in the wavelength range of 380-780 nanometers, and in that state, a relationship is found between a wavelength and a spectral radiance for the observation target, and one or a plurality of representative wavelengths are determined from wavelengths corresponding to a maximum value of the spectral radiance related to the wavelength of the observation target; a step in which, in a state where the observation target and the background are irradiated with the first light source, a relationship is found between a wavelength and a spectral radiance for the background, and one or a plurality of comparison wavelengths are determined from wavelengths corresponding to a maximum value or a minimum value of the spectral radiance related to the wavelength of the background; and a step in which the observation target and the background are irradiated with light of the representative wavelength and the comparison wavelength.
The present invention provides a reflector that reflects a light beam in a direction having a predetermined angle with respect to an incidence direction, and can be manufactured easily at low cost according to the predetermined angle. This reflector is provided with a plurality of reflector units. Each of the reflector units has a retroreflective structure at one end of a rectangular column or a circular column. The retroreflective structure is configured so as to reflect a light beam incident from the other end of the rectangular column or the circular column in an incidence direction, and is configured such that, in a reference section of the reflector unit, the reference section including the central axis of the rectangular column or the circular column and being defined such that the shape of the retroreflective structure is line-symmetric with respect to the central axis therein, the shape of an incidence surface at the other end is line-symmetric with respect to the central axis within the reflector unit, and has a portion inclined with respect to a direction perpendicular to the central axis.
An illumination optical system having a light source and a single convex lens with a diffractive structure, wherein the phase function of the diffractive structure is represented by
is satisfied where R represents effective radius of the lens, the second derivative of the phase function has at least one extreme value and at least one point of inflection where r is greater than 30% of R, and the area of a surface of the light source is equal to or greater than 3% of the area of the entrance pupil when the light source side of the lens is defined as the image side.
G02B 13/18 - Objectifs optiques spécialement conçus pour les emplois spécifiés ci-dessous avec des lentilles ayant une ou plusieurs surfaces non sphériques, p. ex. pour réduire l'aberration géométrique
Provided is an assembly device that comprises moving mechanisms for three orthogonal directions, and that can use a hand attached to one of the moving mechanisms to implement high precision assembly of a plurality of components. The assembly device is provided with: an x-axis moving mechanism 101; a y-axis moving mechanism 103; a z-axis moving mechanism 105; a hand 107 for holding a workpiece, the hand 107 being attached to the z-axis moving mechanism so as to be movable in the z-axis direction; a base 1000 having a surface that is parallel to the x-axis and the y-axis; a first camera 201 attached to the z-axis moving mechanism such that the optical axis thereof is oriented in the z-axis direction; and a second camera 203 attached to the base such that the optical axis thereof is oriented in the z-axis direction.
The present invention relates to a method for manufacturing a scanning optical system with which it is possible to obtain scanning optical systems with different effective scanning widths by changing only a polygon mirror without changing an image formation optical system including a scanning lens and an incidence optical system, the method comprising: a step for designing a first scanning optical system using a first polygon mirror (1101) corresponding to an effective scanning width of a first value; a step for designing a second optical system provided with a second polygon mirror (1102) corresponding to an effective scanning width of a second value smaller than the first value by setting a deflection reference point to the position of a deflection reference point (0 (0, 0)) of the first scanning optical system that is a reflection point on a reflection surface of the first polygon mirror (1101) of a light ray when the deflection angle is zero; and a step for adjusting the shape and position of the scanning lens such that the lateral magnification of the image formation optical system in a cross section in a subscanning direction is adjusted.
G02B 26/12 - Systèmes de balayage utilisant des miroirs à facettes multiples
B41J 2/47 - Machines à écrire ou mécanismes d'impression sélective caractérisés par le procédé d'impression ou de marquage pour lequel ils sont conçus caractérisés par l'irradiation sélective d'un matériau d'impression ou de transfert d'impression utilisant la combinaison du balayage et de la modulation de lumière
H04N 1/113 - Dispositions de balayage utilisant des miroirs oscillants ou rotatifs
62.
OPTICAL SYSTEM FOR LINE GENERATOR AND LINE GENERATOR
Provided is an optical system for a line generator, the optical system configured so that adjustment is easy, the uniformity of the light intensity of a line is high, and the light intensity of the line can be easily changed. The optical system for a line generator generates a line by means of a light flux, and comprises: an optical element having a curvature in only a first direction; and first and second lens array surfaces. The first and second lens array surfaces each include a plurality of lens surfaces arranged in a second direction that is orthogonal to the first direction. The plurality of lens surfaces have a curvature mainly in the second direction. A discretionary lens surface of one of the first and second lens array surfaces corresponds to one lens surface of the other of the first and second lens array surfaces, and the direction of a first straight line connecting the apexes of two corresponding lens surfaces is orthogonal to the second direction. In a cross-section including the first straight line and a second straight line in the second direction that is orthogonal to the first straight line, one of the two lens surfaces is configured as an image formation surface for an infinite object point of the other lens surface.
Provided is a method for producing a plastic element having a fine irregular structure on a surface thereof, the method making it possible to directly generate, on the surface of the plastic element, a fine irregular structure having a desired pitch and a depth of a desired value by a reactive ion etching process. The method for producing a plastic element having a fine irregular structure on a surface thereof comprises: a first step in which, by reactive ion etching performed in an atmosphere of a first gas, a fine irregular structure having an average pitch of a predetermined value ranging from 0.05 to 1 micrometers is formed on the surface of the plastic element; and a second step in which, by reactive ion etching performed in an atmosphere of a second gas having lower reactivity to the plastic element than reactivity of the first gas to the plastic element, an average depth of the fine irregular structure is made a predefined value ranging from 0.15 to 1.5 micrometers while the predetermined value of the average pitch is substantially maintained.
A diffusion element is configured by combining: a structure for diffusion constituted by combining periodic surface structures having multiple periods to achieve a light intensity distribution in which the light intensity is uniform at angles less than or equal to a predetermined diffusion angle θ and the light intensity is as close as possible to zero intensity at angles greater than the diffusion angle θ; and a diffractive structure having a period of 1 or more and 2 or less times of Λmax, where Λmax is the maximum period of the structure for diffusion.
Provided is an imaging optical system with five lenses that include no cemented lenses for achieving an endoscope that is sufficiently small with a sufficiently wide angle and high resolution. The imaging optical system is provided with, in order from the object side to an image side: a first lens that has a negative refractive power with a flat or convex surface facing the object; a second lens that has a positive refractive power with both surfaces as convex lenses; a diaphragm; a third lens that has a positive refractive power with both surfaces as convex lenses; a fourth lens that has a negative refractive power with both surfaces as concave lenses; and a fifth lens that has a positive refractive power. The imaging optical system has five lenses that include no cemented lenses and satisfies the expression 2.6 < f5/f <7, where f5 represents the focal distance of the fifth lens and f represents the focal distance of the entire system.
G02B 13/18 - Objectifs optiques spécialement conçus pour les emplois spécifiés ci-dessous avec des lentilles ayant une ou plusieurs surfaces non sphériques, p. ex. pour réduire l'aberration géométrique
Provided is a scanning optical system, wherein, with a scanning direction on a surface as a y-axis, a principal ray perpendicularly incident on the surface as a z-axis, a reflection point on the deflector of the principal ray as an origin point, the distance from the origin point to the surface as L, the length of a scanning path on the surface as W, the maximum value and the minimum value of the y-coordinate of a point at which the principal ray passes an emission surface of the scanning lens as ymax and ymin, respectively, the curvature in a main scanning direction of the emission surface at the point as c, and the refractive index of a material as n, power Φ = (1-n)∙c in the main scanning direction at the point is defined, and with the maximum value of the absolute value of dΦ/dy in ranges from ymin to 0.6ymin and from 0.6ymax to ymax as |dΦ/dy|out, and the maximum value of the absolute value of dΦ/dy in a range from 0.6ymin to 0.6ymax as |dΦ/dy|in, 0.54 ≤ L/W ≤ 0.64 |dΦ/dy|out/|dΦ/dy|in ≤ 0.5 is satisfied.
B41J 2/47 - Machines à écrire ou mécanismes d'impression sélective caractérisés par le procédé d'impression ou de marquage pour lequel ils sont conçus caractérisés par l'irradiation sélective d'un matériau d'impression ou de transfert d'impression utilisant la combinaison du balayage et de la modulation de lumière
G02B 13/18 - Objectifs optiques spécialement conçus pour les emplois spécifiés ci-dessous avec des lentilles ayant une ou plusieurs surfaces non sphériques, p. ex. pour réduire l'aberration géométrique
G02B 13/24 - Objectifs optiques spécialement conçus pour les emplois spécifiés ci-dessous pour reproduire ou copier à de courtes distances de l'objet
G02B 26/12 - Systèmes de balayage utilisant des miroirs à facettes multiples
H04N 1/113 - Dispositions de balayage utilisant des miroirs oscillants ou rotatifs
A mold machining method using an endmill, the contour of a cross section of the mold being concave and continuous in an area, a ratio of the maximum to the minimum of radius of curvature of the contour of a portion of the area (a first area) being 2 or greater, and a blade of the endmill having a second area where the contour of a cross section is similar to the contour of the first area, the method comprising the steps of determining a spiral path of the endmill such that each point of the first area is machined by a portion of the second area, corresponding to said each point in the similarity, and a radial interval between the spiral tool path is maximized while keeping surface roughness of the machined mold at or below a predetermined value; and machining the mold along the path.
Provided is an optical element whereby positioning can be performed easily and with high precision. This optical element comprises a first surface provided with a lens surface of a condensing lens and a lens surface of an image forming lens, and a second surface, and is configured so that the principal axis of the condensing lens and the principal axis of the image forming lens are parallel, and is configured so that light reaching the condensing lens is condensed after exiting from the second surface.
Provided is a mold manufacturing method that is capable of manufacturing a mold of a complex shape particularly of an optical element with sufficient shape accuracy and within a relatively short time. This mold manufacturing method includes: a step for forming a base made of metal into a first shape through machining; a step for coating the base with a resin layer; a step for forming the resin layer into a second shape; and a step for forming the base into a third shape through dry-etching.
This illumination optical system is provided with a light source and a single convex lens equipped with a diffraction structure on one surface thereof, and is configured such that: the phase function of the diffraction structure is expressed by an equation AA where r is a distance from the central axis of the lens, β is a constant, and N and i are natural numbers, the phase function satisfying a relationship BB where R is the effective radius of the lens; the second-order differential of the phase function with respect to r has at least one extreme value and at least one inflection point in a region of the one surface where r is greater than 30% of the effective radius R of the lens; and the difference between the maximum and minimum values of spherical aberration of light having a wavelength in a visible region corresponding to an arbitrary position of 0 ≤ r ≤ R is less than or equal to axial chromatic aberration. The diffraction structure is provided in at least a part of the region where r is greater than 30% of the effective radius R of the lens. The light source comprises a surface having a luminance in a predetermined range, and is formed such that the area of the surface of the light source is greater than or equal to 3% of the area of entrance pupil when the light source side is the image side.
G02B 13/18 - Objectifs optiques spécialement conçus pour les emplois spécifiés ci-dessous avec des lentilles ayant une ou plusieurs surfaces non sphériques, p. ex. pour réduire l'aberration géométrique
A diffuser provided with plural shapes obtained by translation on an xy plane of at least one of z=g(x, y) and z=−g(x, y), z=g(x, y) being a smooth function within a rectangle having sides of length of s in x direction and sides of length of t in y direction, the origin being the center of the rectangle, wherein on the sides of the rectangle,
is continuous in
has a single point of discontinuity in
is continuous in
has a single point of discontinuity in
.
A lens for headlamps of vehicles provided with a diffraction grating on a surface, wherein a phase function of the diffraction grating is represented by
is equal to or less than the longitudinal chromatic aberration for visible light, the diffraction grating is at least partially on the surface where r is greater than 30%, and the relationship
is satisfied.
Provided is a production method for a plastic molded article comprising a fine uneven structure on the surface thereof, said production method being capable of efficiently producing a plastic molded article that has a fine uneven structure arranged at a pitch (period) that is smaller than the wavelength of light or substantially corresponds to the wavelength range for visible light. This production method for a plastic molded article comprising a fine uneven structure on the surface thereof forms a fine even structure having a pitch of 0.1–0.5 micrometers, on the surface of the plastic molded article, by simultaneously plasma dry etching the plastic molded article and a silicon piece, a semiconductor piece including silicon, or a metal piece including silicon, in a mixed gas atmosphere comprising fluorine gas and oxygen.
Provided is a method for producing a mold for an optical element that produces an image with a clear boundary and that is composed of a first portion, which is a substantially flat surface, and a second portion, which is an optical structure for causing a ray of light to diffract, diffuse, or the like. This method for producing a mold for an optical element comprises: a step for forming, by resist patterning and etching, a first groove that has a substantially flat bottom surface having a width of 2 micrometers or more in a first region of a surface of a substrate; and a step for machining a second region that surrounds the first region in the surface of the substrate into a shape constituted of a surface that is not parallel to the bottom surface.
The projector-type headlamp comprises a projection lens unit and a light source unit. A diffraction grating designed to eliminate chromatic aberrations is provided on at least part of a lens surface of the lens unit. When an x axis in the horizontal direction and a y axis in the vertical direction are defined on a plane perpendicular to the optical axis, R1 is the maximum y coordinate on the lens surface, and 0≤A<1, an area of the lens surface in which y
F21V 21/00 - Soutien, suspension ou fixation des dispositifs d'éclairagePoignées
F21S 41/255 - Lentilles à contour circulaire ou circulaire tronqué, lorsque vues de face
G02B 13/00 - Objectifs optiques spécialement conçus pour les emplois spécifiés ci-dessous
F21V 5/04 - Réfracteurs pour sources lumineuses de forme lenticulaire
F21S 41/00 - Dispositifs d’éclairage spécialement adaptés à l’extérieur des véhicules, p. ex. phares
F21S 41/275 - Surfaces de lentille, p. ex. revêtements ou structures de surface
F21S 41/40 - Dispositifs d’éclairage spécialement adaptés à l’extérieur des véhicules, p. ex. phares caractérisés par des écrans, des éléments non réfléchissants, des éléments faisant écran à la lumière ou des éléments d’occultation fixes
Provided is a mold machining method using an endmill that is capable of improving machining efficiency while keeping the post-machining surface roughness of the mold at or below a specified value. For the mold in the mold machining method using an endmill: a cross-section that contains the central axis comprises a continuous region with a recessed contour; and taking at least a portion of said region to be a first region (S), the ratio of the maximum value to the minimum value of the radius of curvature of the contour in said first region is at least 2. For the cutting edge of the endmill, the contour of a second region (M), which is a portion of the contour of a cross-section that contains the central axis, is similar to the contour of the first region. The method comprises: a step for determining a spiral path for the endmill so that each point on the contour of the first region is machined by a similar corresponding portion of the second region and the post-machining surface roughness is kept at or below a specified value while the radial spacing of said path is made as large as possible; and a step for executing the machining by the endmill along said path.
The imaging optical system is provided with a first lens having a negative refractive power, a second lens having a positive refractive power, an aperture stop, and a third lens having a positive refractive power, disposed from the object side to the image side. With |d| being the distance between the image-side principal point of the first lens and the object-side principal point of the second lens, d=−|d| being the signed distance between the image-side principal point of the first lens and the object-side principal point of the second lens when the image-side principal point of the first lens is further towards the image side than the object-side principal point of the second lens, and f12 being the composite focal length of the first lens and the second lens, the relationships d<0 and 0.005
A61B 1/00 - Instruments pour procéder à l'examen médical de l'intérieur des cavités ou des conduits du corps par inspection visuelle ou photographique, p. ex. endoscopesDispositions pour l'éclairage dans ces instruments
G02B 9/12 - Objectifs optiques caractérisés à la fois par le nombre de leurs composants et la façon dont ceux-ci sont disposés selon leur signe, c.-à-d. + ou — ayant uniquement trois composants
G02B 13/00 - Objectifs optiques spécialement conçus pour les emplois spécifiés ci-dessous
G02B 23/24 - Instruments pour regarder l'intérieur de corps creux, p. ex. endoscopes à fibres
Provided is a mold manufacturing method that is capable of manufacturing a mold of a complex shape particularly of an optical element with sufficient shape accuracy and within a relatively short time. This mold manufacturing method includes: a step for forming a base made of a metal into a first shape through machining; a step for coating the base with a resin layer; a step for forming the resin layer into a second shape; and a step for forming the base into a third shape through dry-etching.
A position determination method for determining a position of a point on a flat surface by observing the position of the point and a position of a fiducial portion on the flat surface in an image of a measuring system provided with an imaging optical system using coaxial episcopic illumination is provided. The fiducial portion is in the shape of a pillar at least in the basal portion and provided with an inclined surface surrounding the foot of the pillar. The method includes the steps of determining a position of the outer boundary of the foot from the boundary between the inclined surface and the flat surface in the image; determining the position of the fiducial portion from the position of the outer boundary of the foot; and determining the position of the point with respect to the position of the fiducial portion.
G02B 6/38 - Moyens de couplage mécaniques ayant des moyens d'assemblage fibre à fibre
G01B 11/00 - Dispositions pour la mesure caractérisées par l'utilisation de techniques optiques
G01B 11/14 - Dispositions pour la mesure caractérisées par l'utilisation de techniques optiques pour mesurer la distance ou la marge entre des objets ou des ouvertures espacés
Provided is a position measurement method for highly accurately determining the position of a lens, or the like, using a position reference part of a component. In this position measurement method, the position of a given point in an image of a measurement device provided with an imaging optical system using coaxial epi-illumination is determined using the position of a position reference part as a reference. At least a base part of the position reference part has a columnar shape. A groove of a fixed width is provided around the base of the column 115. The bottom surface 121 of the groove is parallel to a flat surface. An inclined surface 123 that rises from the bottom surface at an angle θ in relation to the bottom surface and reaches the flat surface is provided at the outer circumferential edge of the bottom surface. This method includes, in an image of the measurement device, determining the position of the circumferential edge of the base of the column from the position of the outer circumferential edge E of the bottom surface and the position of a reflected image E' of the outer circumferential edge, determining the position of the position reference part from the position of the circumferential edge of the base of the column, and determining the position of the given point using the position of the position reference part as a reference.
A light-receiving optical system includes a rotating mirror configured to rotate around a rotation axis and having a reflection plane arranged at an angle with the rotation axis; an imaging optical system having an optical axis that coincides with the rotation axis; a multifocal Fresnel lens having sections formed concentrically around the optical axis; and light-receiving elements, wherein the imaging optical system is configured such that rays of light that enter the rotating mirror are converged onto one of the sections depending on an angle of the rays with the optical axis, and the multifocal Fresnel lens is configured such that the rays reach one of the light-receiving elements, which corresponds to the one of the sections so that a light-receiving element that the rays reach is determined depending on the angle of the rays with the optical axis independently of a rotational position of the rotating mirror.
G02B 26/08 - Dispositifs ou dispositions optiques pour la commande de la lumière utilisant des éléments optiques mobiles ou déformables pour commander la direction de la lumière
G02B 3/08 - Lentilles simples ou composées à surfaces non sphériques à surfaces discontinues, p. ex. lentille de Fresnel
Provided is a diffusion element which enables control of a diffusion angle of a diffused light beam, has a smooth shape as a whole, and the design and manufacturing process of which are simple. This diffusion element satisfies the following relationships, where z=g(x, y) is a function having a smooth shape taking the center of a reference unit shape of a planar lattice on an (x, y) plane as an origin, S is a region inside the unit shape, ∂S is the boundary thereof, the overall shape of the diffusion element is represented by z=f(x, y), and the coordinates of the center of an arbitrarily defined unit shape are (xk, yk).
Provided is a lens having a diffraction structure on one face thereof. The phase function of the diffraction structure is expressed by an equation given below, wherein r signifies the distance from the central axis of the lens, β signifies a constant, and N and i signify natural numbers, and is configured to satisfy the following relationships, wherein R signifies the effective radius of the lens: on the abovementioned one face, the second derivative of the phase function with respect to r has at least one extremum and at least one inflection point in a region where r is greater than 30% of the effective radius R of the lens, and the difference between a maximum value and a minimum value of the spherical aberration of light having wavelengths in the visible spectrum among arbitrary positions 0 ≤ r ≤ R is not greater than the axial chromatic aberration. The diffraction structure is provided in at least a portion of the region where r is greater than 30% of the effective radius R of the lens.
An optical element to be interposed between an optical transmission line and a light-emitting element or a light-receiving element such that an optical path from one side to the other passes through the optical element is provided. At least one surface of the optical element is provided with a first light-collecting area and a second light-collecting area. A surface of the first light-collecting area is configured such that light from the one side is received by the other side. A surface of the second light-collecting area is an annular surface or a part of the annular surface and is configured such that light that has passed through the second light-collecting area forms an image in the shape of a ring or a part of the ring at a position between the optical element and the other side.
A method for manufacturing a mold according to the first aspect of the present invention includes the steps of: placing a base material of semiconductor or metal that reacts with sulfur hexafluoride in a reactive ion etching apparatus; supplying a mixed gas of sulfur hexafluoride and oxygen thereto; making the base material undergo a plasma dry-etching process such that oxides are scattered on a surface of the base material, etching advances on the surface of the base material while the oxides function as etching masks, and thereby a fine surface roughness is formed on the surface of the base material; and irradiating the fine surface roughness with an ion beam such that shapes of protrusions of the fine surface roughness can be adjusted.
B29C 33/38 - Moules ou noyauxLeurs détails ou accessoires caractérisés par la matière ou le procédé de fabrication
B29C 33/42 - Moules ou noyauxLeurs détails ou accessoires caractérisés par la forme de la surface de moulage, p. ex. par des nervures ou des rainures
G02B 1/118 - Revêtements antiréfléchissants ayant des structures de surface de longueur d’onde sous-optique conçues pour améliorer la transmission, p. ex. structures du type œil de mite
A method for manufacturing a mold or an optical element provided with a fine surface roughness for anti-reflection or for diffusing, may include placing a substrate or a film made of a semiconductor or a metal into a reacting etching apparatus, introducing a mixed gas of sulfur hexafluoride and oxygen into the etching apparatus with the substrate or the film, tuning the mixed gas into plasma such that oxides are made to be scattered on a surface of the substrate or the film, and etching the surface of the substrate of the film by the sulfur hexafluoride while the oxides function as an etching mask to form the fine surface roughness on the surface of the substrate or the film. Further, etching conditions may be determined such that the pitch of the fine surface roughness is made from 3 to 18 micrometers.
H01L 21/3213 - Gravure physique ou chimique des couches, p. ex. pour produire une couche avec une configuration donnée à partir d'une couche étendue déposée au préalable
H01L 21/02 - Fabrication ou traitement des dispositifs à semi-conducteurs ou de leurs parties constitutives
B29C 33/42 - Moules ou noyauxLeurs détails ou accessoires caractérisés par la forme de la surface de moulage, p. ex. par des nervures ou des rainures
C23F 4/00 - Procédés pour enlever des matériaux métalliques des surfaces, non couverts par le groupe ou
G02B 1/118 - Revêtements antiréfléchissants ayant des structures de surface de longueur d’onde sous-optique conçues pour améliorer la transmission, p. ex. structures du type œil de mite
B29C 33/56 - RevêtementsAgents de démoulage, de lubrification ou de séparation
88.
Element provided with portion for position determination and measuring method
A method for measuring a position of a target surface provided with portions for position determination thereon, wherein a diffuse reflectance of the target surface is 0.1% or less, and a diffuse reflectance of the portions for position determination is 5% or more, and wherein the target surface is configured such that a tangential plane at any point on the target surface where each of the portions for position determination is installed forms an arbitrary angle between 15 degrees and 75 degrees inclusive with a certain direction, the method including the steps of illuminating the target surface with parallel light in the certain direction; determining positions of border lines of the plural portions for position determination from an image of the target surface; and determining the position of the target surface from the positions of the border lines of the plural portions for position determination.
G01B 11/26 - Dispositions pour la mesure caractérisées par l'utilisation de techniques optiques pour mesurer des angles ou des cônesDispositions pour la mesure caractérisées par l'utilisation de techniques optiques pour tester l'alignement des axes
G06T 7/73 - Détermination de la position ou de l'orientation des objets ou des caméras utilisant des procédés basés sur les caractéristiques
The element according to the present invention has a first plane (201) and a second plane (203) forming a prescribed angle with the first plane. The second plane is provided with at least three portions for position determination (101A 101B, 101C, 101D) arranged on the second plane sufficiently spaced apart from each other, allowing the identification of the second plane. Each portion for position determination is formed in a convex shape with respect to the second plane. A tangential plane (TL) to the surface of each portion for position determination at a point on a border line between the second plane and the surface forms a single plane and tangential planes of the portions for position determination are parallel to one another.
G01B 11/00 - Dispositions pour la mesure caractérisées par l'utilisation de techniques optiques
G01B 11/26 - Dispositions pour la mesure caractérisées par l'utilisation de techniques optiques pour mesurer des angles ou des cônesDispositions pour la mesure caractérisées par l'utilisation de techniques optiques pour tester l'alignement des axes
The present invention reduces color bleeding near light/dark boundaries without increasing the light intensity above a cut-off line. The projector-type headlamp comprises a projection lens and a light source unit. The projection lens includes two lenses. A diffraction grating is provided to at least part of the light source-side lens surface S3, which faces away from the light source. The light source-side surface S4, which faces the light source, has a positive power. The diffraction grating is designed to eliminate chromatic aberration. Where the intersection of the optical axis and a plane perpendicular to the optical axis is the point of origin, the direction horizontal to the plane is the x-axis, the direction vertical to the plane is the y-axis, R1 is the maximum y coordinate on the surface S3, and A is a constant greater than or equal to 0 and less than 1, an area of the surface S3 in which y ឬ A·R1 comprises a continuously curved surface or a planar surface, at least part of which is provided with the diffraction grating, and an area of the surface S3 in which y ≥ A·R1 comprises a separate curved surface 245 that has a power greater than the power of the continuously curved surface or planar surface, and is not provided with a diffraction grating.
F21S 8/12 - donnant un faisceau unique de forme particulière, p.ex. un faisceau asymétrique, p. ex. pour percer le brouillard ou empêcher l'éblouissement
F21V 5/04 - Réfracteurs pour sources lumineuses de forme lenticulaire
G02B 13/00 - Objectifs optiques spécialement conçus pour les emplois spécifiés ci-dessous
Provided is an imaging optical system for realizing an endoscope that is sufficiently small, sufficiently wide-angle, and sufficiently high-resolution. The imaging optical system is provided with a first lens having a negative refractive power, a second lens having a positive refractive power, a diaphragm, and a third lens having a positive refractive power, disposed from the object side to the image side. With |d| being the distance between the image-side principal point of the first lens and the object-side principal point of the second lens, d = -|d| being the signed distance between the image-side principal point of the first lens and the object-side principal point of the second lens when the image-side principal point of the first lens is further towards the image side than the object-side principal point of the second lens, and f12 being the composite focal length of the first lens and the second lens, the relationships d ឬ 0 and 0.005 ឬ d / f12 ឬ 16 are satisfied.
A61B 1/00 - Instruments pour procéder à l'examen médical de l'intérieur des cavités ou des conduits du corps par inspection visuelle ou photographique, p. ex. endoscopesDispositions pour l'éclairage dans ces instruments
G02B 13/18 - Objectifs optiques spécialement conçus pour les emplois spécifiés ci-dessous avec des lentilles ayant une ou plusieurs surfaces non sphériques, p. ex. pour réduire l'aberration géométrique
G02B 23/26 - Instruments pour regarder l'intérieur de corps creux, p. ex. endoscopes à fibres utilisant des guides de lumière
The purpose of the present invention is to provide an optical element that has a simple structure and simultaneously achieves both wide light distribution and uniform illuminance on an illuminated surface. This optical element is provided with a bottom surface (107), an entrance surface (101) having an open section on the bottom surface and formed so as to cover a light source, and an exit surface (103) that covers the entrance surface, and is configured such that light from the light source is irradiated to the outside after passing through the entrance surface and the exit surface. The bottom surface is provided with leg sections (109) for attaching the optical element, and at least a part of the leg section is constituted by a light absorbing member, or at least a part is covered by the light absorbing member (150).
Provided is an optical element wherein optical alignment can be easily performed. This optical element 100 is interposed between an optical transmission line and a light-emitting element or a light-receiving element so that light is transmitted from one side to the other through the optical element. At least one surface of the optical element is provided with a first light collection region and a second light collection region. With an optical path for a light beam passing through the center of the light-emitting element or the light-receiving element, the center of the optical element, and the center of the end surface of the optical transmission line serving as the optical axis, the surface 105 of the first light collection region is formed so that the light from the one side can be received by the other side, and the surface 107 of the second light collection region is formed so that the light from the one side is focused at a prescribed position between the optical element and the other side. The surface of the second light collection region is configured so that the light passing through the second light collection region forms an image of a ring or a part thereof at the prescribed position.
A microlens array includes N microlenses arranged in a predetermined direction on an x-y plane. A projection onto the x-y plane of the vertex of each microlens is arranged in the vicinity of a lattice point of a reference lattice on the x-y plane, the lattice spacing of the reference lattice in the predetermined direction being D/M (millimeters) where M is a positive integer. A distance between two sides of a lens facing each other is approximately equal to D, and a distance between the projection onto the x-y plane of the vertex of the lens and the projection onto the x-y plane of a side of the lens is D/2+εi. Letting n represent the refractive index of the material of each microlens and letting f (millimeters) represent the focal length of each microlens, the following relationships are satisfied.
0
The purpose of the present invention is to provide a molding mold manufacturing method by which the shape of a fine uneven structure of a wide-region pitch can be sufficiently adjusted to a satisfactory degree. Provided is a molding mold manufacturing method which includes a plasma dry-etching process in which a semiconductor or a metal base material which react to sulfur hexafluoride is disposed in a reactive ion etching device, and a mixed gas of sulfur hexafluoride and oxygen is introduced into the etching device. In the plasma dry-etching process, an oxide is scattered onto the surface of the base material, etching is caused to progress on the surface of the base material using sulfur hexafluoride and with the oxide serving as an etching-prevention mask, and as a result thereof, a fine uneven structure is formed on the surface of the base material. Thereafter, an ion beam is projected onto the fine uneven structure in order to adjust the shape of the projections of the fine uneven structure.
B29C 33/38 - Moules ou noyauxLeurs détails ou accessoires caractérisés par la matière ou le procédé de fabrication
B29C 33/42 - Moules ou noyauxLeurs détails ou accessoires caractérisés par la forme de la surface de moulage, p. ex. par des nervures ou des rainures
G02B 1/118 - Revêtements antiréfléchissants ayant des structures de surface de longueur d’onde sous-optique conçues pour améliorer la transmission, p. ex. structures du type œil de mite
H01L 21/302 - Traitement des corps semi-conducteurs en utilisant des procédés ou des appareils non couverts par les groupes pour changer leurs caractéristiques physiques de surface ou leur forme, p. ex. gravure, polissage, découpage
H01L 21/3065 - Gravure par plasmaGravure au moyen d'ions réactifs
refractive index of the microlens is no, A and C represents constants, and
is satisfied and f (x) is determined such that an illuminance distribution in an illuminated area is more uniform than that in the case that the curved surface is shaped in a segment of a circle.
G02B 26/08 - Dispositifs ou dispositions optiques pour la commande de la lumière utilisant des éléments optiques mobiles ou déformables pour commander la direction de la lumière
G02B 26/12 - Systèmes de balayage utilisant des miroirs à facettes multiples
Provided is a diffractive optical filter allowing the screen door effect and isolated appearances of red dots which have high spectral sensitivity and resolution in the human eye to be sufficiently suppressed. The diffractive optical filter is used in a color image display device including two-dimensionally arranged dots, the diffractive optical filter including a plane provided with a two-dimensional diffraction grating. The multidirectional cross-sections of the two-dimensional diffracting grating have a substantially sine wave shape. The diffractive optical filter satisfies the following relational expression: dg = ελ / Δn pg = kλL / αpp 0.32 < α < 0.39 5Pp < L 0.445 ≤ ε ≤ 0.465 (k = 1) 1.15 ≤ ε ≤ 1.25 (k = 3) Where λ represents a wavelength of red light at peak intensity in the image display device; Δn represents the refractive index deviation of the grating at the wavelength λ; ε represents a constant; dg represents the depth of the sine wave shape; L represents a distance between a first plane and a second plane; pp represents the dot pitch of a color having a maximum interval between dots; pg represents the period of the sine wave shape; k represents 1 or 3; and α is a constant.
Provided is a diffraction optical element having a simple configuration enabling zero-order efficiency to be reduced. This diffraction optical element generates a prescribed image using prescribed incidence-angle parallel light beams of light of wavelength λ. This diffraction optical element includes a grating constituted by N-levels where N is an integer of at least 2, the grating having a plurality of periods. The height of the grating is h, and h changes according to the period and has a maximum value hmax. When the refractive index of the grating material is n, the refractive index of a peripheral medium is n0, and the proportion of the width of a valley portion within a grating period is F, a given formula is satisfied.
