Abrégé

Novel photoacid generator compounds are provided. Compositions that include the novel photoacid generator compounds are also provided. The present disclosure further provides methods of making and using the photoacid generator compounds and compositions disclosed herein. The compounds and compositions are useful as photoactive components in chemically amplified resist compositions for various microfabrication applications.

Classes IPC  ?

• G03F 7/039 - Composés macromoléculaires photodégradables, p. ex. réserves positives sensibles aux électrons
• G03F 7/004 - Matériaux photosensibles
• C07C 309/19 - Acides sulfoniques ayant des groupes sulfo liés à des atomes de carbone acycliques d'un squelette carboné saturé contenant des cycles
• C07C 309/09 - Acides sulfoniques ayant des groupes sulfo liés à des atomes de carbone acycliques d'un squelette carboné acyclique saturé contenant des atomes d'oxygène liés au squelette carboné contenant des groupes hydroxy éthérifiés liés au squelette carboné
• G03F 7/038 - Composés macromoléculaires rendus insolubles ou sélectivement mouillables
• G03F 7/20 - ExpositionAppareillages à cet effet
• G03F 7/40 - Traitement après le dépouillement selon l'image, p. ex. émaillage

Abrégé

Novel photoacid generator compounds are provided. Compositions that include the novel photoacid generator compounds are also provided. The present disclosure further provides methods of making and using the photoacid generator compounds and compositions disclosed herein. The compounds and compositions are useful as photoactive components in chemically amplified resist compositions for various microfabrication applications.

Classes IPC  ?

• C07D 221/14 - Aza-phénalènes, p. ex. naphtalimide-1, 8
• C07D 401/10 - Composés hétérocycliques contenant plusieurs hétérocycles comportant des atomes d'azote comme uniques hétéro-atomes du cycle, au moins un cycle étant un cycle à six chaînons avec un unique atome d'azote contenant deux hétérocycles liés par une chaîne carbonée contenant des cycles aromatiques
• G03F 7/004 - Matériaux photosensibles

Abrégé

Novel photoacid generator compounds are provided. Photoresist compositions that include the novel photoacid generator compounds are also provided. The invention further provides methods of making and using the photoacid generator compounds and photoresist compositions disclosed herein. The compounds and compositions are useful as photoactive components in chemically amplified resist compositions for various microfabrication applications.

Classes IPC  ?

• C07D 221/14 - Aza-phénalènes, p. ex. naphtalimide-1, 8
• G03F 7/025 - Composés photopolymérisables non macromoléculaires contenant des triples liaisons carbone-carbone, p. ex. composés acétyléniques

Abrégé

Novel photoacid generator compounds are provided. Photoresist compositions that include the novel photoacid generator compounds are also provided. The invention further provides methods of making and using the photoacid generator compounds and photoresist compositions disclosed herein. The compounds and compositions are useful as photoactive components in chemically amplified resist compositions for various microfabrication applications.

Classes IPC  ?

• C07D 221/14 - Aza-phénalènes, p. ex. naphtalimide-1, 8
• G03F 7/004 - Matériaux photosensibles
• C09K 3/00 - Substances non couvertes ailleurs