A cylindrical heating part 14 of an exhaust gas treatment device 1 is configured from a cylindrical body 20 in which an exhaust gas E to be treated flows and which opens into an exhaust gas reaction processing space S within a reactor 10, an insulator 30 provided to the cylindrical body 20 over a plurality of stages in the vertical direction, an electric heater 80 suspended from the insulator 30, and a power supply member 85 connected to the electric heater 80. The electric heater 80 is configured as one electric resistor by alternately connecting upper-end portions 82 and lower-end portions 83 of a plurality of adjacent rod-form portions 81, the electric heater 80 being suspended from the insulator 30 at an upper-end portion 82. The power supply member 85 is configured from a guide cylinder 86 that is inserted and fixed to a bottom plate 11 of the reactor 10, and an electroconductive rod material 87 that is thinner than the inside diameter of the guide cylinder 86 and is connected to the lower-end portion 83a of the rod-form portion 81a positioned at the end of the electric heater 80.
Provided is a cylindrical heating part of an exhaust gas treatment device capable of extending the life of an electric heater wire by eliminating strain generated therein. A cylindrical heating part 14 of an exhaust gas treatment device 1 comprises: a cylindrical body 20 in which an exhaust gas E to be treated flows and that opens into an exhaust gas treatment space S in a reactor 10; an insulator 30 provided on the cylindrical body 20 over a plurality of stages in a vertical direction; an electric heater wire 80 suspended from the insulator 30; and a power supply member 85 connected to the electric heater wire 80. The electric heater wire 80 is configured as one electric resistor by alternately connecting upper end portions 82 and lower end portions 83 of a plurality of adjacent rod-like portions 81, and is suspended from the insulator 30 at an upper end portion 82. The power supply member 85 is composed of a guide cylinder 86 passed through and fixed to a bottom plate 11 of the reactor 10, and a conductive rod material 87 thinner than the inner diameter of the guide cylinder 86 and connected to a lower end portion 83a of the rod-like portion 81a positioned at the end of the electric heater wire 80.
A detoxification device (100) that detoxifies a processing gas is provided with a decompression detoxification unit (1), an atmospheric pressure detoxification unit (2), and an exhaust pump (12). The decompression detoxification unit (1) includes a first inflow port (4i) and a first outflow port (14c). The atmospheric pressure detoxification unit (2) includes a second inflow port (16i) and a second outflow port (16o). The first outflow port (14c) communicates with an intake port (12i) of the exhaust pump (12), the second inflow port (16i) is connected to an exhaust port (12o) of the exhaust pump (12), and the exhaust pump (12) increases the pressure of the processing gas. In the processing gas detoxification method according to the present invention the processing gas is detoxified in a reduced-pressure state, the pressure of the processing gas is increased to the atmospheric pressure, the processing gas is detoxified in the atmospheric-pressure state, and the processing gas is discharged.
The present invention addresses the problem of providing a gas purification apparatus (100) capable of purifying, with high controllability, a laser gas for use in a laser beam generation device (1). The gas purification apparatus (100) purifies a recovery gas recovered from the laser beam generation device (1) that uses a laser gas, and supplies the purified gas to the laser beam generation device (1). The gas purification apparatus is characterized by comprising: a mass flow controller (MFC) that controls the flow rate of a recovery gas; a constant volume supply device (15) that is provided downstream from the mass flow controller (MFC) and that supplies an additive gas; and a purifier (16) that is provided downstream from the constant volume supply device (15).
H01S 3/225 - Lasers, c.-à-d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet caractérisés par le matériau utilisé comme milieu actif à gaz le gaz actif étant polyatomique, c.-à-d. contenant plusieurs atomes comprenant un excimer ou un exciplex
H01S 3/036 - Moyens pour obtenir ou maintenir la pression désirée du gaz à l'intérieur du tube, p. ex. au moyen d'un getter ou d'une réactivationMoyens pour faire circuler le gaz, p. ex. pour uniformiser la pression à l'intérieur du tube
5.
CLEANING METHOD FOR DRY VACUUM PUMP AND CLEANING DEVICE FOR DRY VACUUM PUMP
The present invention provides a cleaning method for a dry vacuum pump in which a deposit is accumulated, the cleaning method comprising: activation verification inspection to verify the feasibility of activation of the dry vacuum pump; a reproduction processing step performed when the activation of the dry vacuum pump is impossible; and a life extension processing step performed when the activation of the dry vacuum pump is possible or when the activation is made possible after the reproduction processing step. The cleaning method is characterized in that the reproduction processing step refers to a step for introducing a high-temperature fluid into the dry vacuum pump to remove the accumulated deposit, and that the life extension processing step refers to a step for introducing a high-temperature fluid into the dry vacuum pump in an activation state to remove the deposit accumulated inside the dry vacuum pump.
Provided are a gas removal apparatus and a gas treatment method with which it is possible to conserve energy and to expand the range of usage conditions. This gas removal apparatus has a first reactor 4 and a second reactor 5. The first reactor 4 has a first reaction space 6 surrounded by a heating wall 7, and the second reactor 5 has a second reaction space 16 surrounding the heating wall 7. A gas and a reducing agent are introduced from one end of the first reaction space 6, the other end of the first reaction space 6 being allowed to communicate with the second reaction space 16. Oxygen or an oxygen-containing gas is introduced into the second reaction space 16.
This heat-storage-type gas treatment device comprises: a heating chamber 1 having a heating mechanism 12; and a plurality of heat storage chambers 4 connected to the heating chamber 1. Each heat storage chamber 4 has a first heat storage layer 5, a second heat storage layer 6, and a reaction chamber 8 provided between the first heat storage layer 5 and the second heat storage layer 6. The first heat storage layer 5 is provided to the heating chamber 1-side of the heat storage chamber 4. The reaction chamber 8 has a catalyst layer 7 on the second heat storage layer 6-side thereof, a mixing part 90 on the first heat storage layer 5-side thereof, and a discharge part 9 in the mixing part 90. The discharge part 9 has a first discharge hole 921 and a second discharge hole 922 facing each other in the horizontal direction.
F23G 7/06 - Procédés ou appareils, p. ex. incinérateurs, spécialement adaptés à la combustion de déchets particuliers ou de combustibles pauvres, p. ex. des produits chimiques de gaz d'évacuation ou de gaz nocifs, p. ex. de gaz d'échappement
F23J 15/00 - Aménagement des dispositifs de traitement de fumées ou de vapeurs
8.
ELECTRIC HEATER AND SEMICONDUCTOR EXHAUST GAS TREATMENT DEVICE USING SAID HEATER
An electric heater 10 of this semiconductor exhaust gas treatment device is formed of: a tubular protection pipe 12 which is made of heat-resistant metal; a heat generation resistor 14 which is inserted into the protection pipe 12; and an insulating holding member 16 which is installed in a bottom portion 12a of the protection pipe 12 and holds an insertion end portion 14t of the heat generation resistor 14 such that the insertion end portion 14t aligns with a center line CL of the protection pipe 12.
H05B 3/44 - Éléments chauffants ayant la forme de tiges ou de tubes non flexibles le conducteur chauffant disposé à l'intérieur des tiges ou tubes en matériau isolant
H01L 21/02 - Fabrication ou traitement des dispositifs à semi-conducteurs ou de leurs parties constitutives
9.
GAS ADSORPTION DEVICE–EQUIPPED STORAGE CABINET SYSTEM
This gas adsorption device–equipped storage cabinet system comprises: a gas adsorption device–equipped storage cabinet 16 that includes an adsorption casing 12 and one or more adsorbent cartridges 14 that are installed in the adsorption casing 12; and an adsorbent regeneration device 26 that includes a regeneration casing 18, a heating means 20 that heats an adsorbent 14a in adsorbent cartridges 14 that have been removed from the gas adsorption device–equipped storage cabinet 16 and installed in the regeneration casing 18, an air supply piping system 22, and an exhaust piping system 24. The adsorbent cartridges 14 have a metal container 15 that has a fluid inlet 15a and a fluid outlet 15b provided therein. The gas adsorption device–equipped storage cabinet 16 is provided with battery-driven air delivery fans 28 that deliver air from inside the adsorption casing 12 toward the fluid inlets 15a of the adsorbent cartridges 14.
B01D 53/04 - Séparation de gaz ou de vapeursRécupération de vapeurs de solvants volatils dans les gazÉpuration chimique ou biologique des gaz résiduaires, p. ex. gaz d'échappement des moteurs à combustion, fumées, vapeurs, gaz de combustion ou aérosols par adsorption, p. ex. chromatographie préparatoire en phase gazeuse avec adsorbants fixes
F26B 9/00 - Machines ou appareils pour le séchage d'un matériau solide ou d'objets au repos animés uniquement d'une agitation localeAération des placards ou armoires d'appartements
10.
METHOD FOR TREATING EXHAUST GAS CONTAINING NITROGEN COMPOUND, AND APPARATUS FOR SAID METHOD
The present invention is a method for detoxifying a nitrogen compound in an exhaust gas containing the nitrogen compound, the method comprising: a first step for heating the exhaust gas (E1) containing the nitrogen compound to a temperature equal to or higher than the thermal decomposition temperature of the nitrogen compound to thermally decompose the nitrogen compound; and a second step for adding water to a high-temperature treated gas (E2) in which the nitrogen compound has been thermally decomposed and then allowing the resultant mixture to pass through a column member (18) in which a porous granular material is filled. The method is characterized in that, in the second step, cooling is performed in such a manner that the temperature of the treated gas (E2) at the outlet of the column member (18) becomes lower than 100°C.
A cylindrical heating unit 14 of an exhaust gas processing device 1 is installed in a reactor 10. The cylindrical heating unit 14 has an exhaust gas introduction port 15 at an insertion base and a heated exhaust gas outlet 16 at an insertion end. The cylindrical heating unit 14 is formed from a hollow cylinder 20, insulators 30, an electric heater H, and a holding member 40. The hollow cylinder 20 has a two-layered structure that is formed from an inner cylinder 21 and an outer cylinder 22 that are metal. The insulators 30 are provided at intervals in a heater installation space P that is between the inner cylinder 21 and the outer cylinder 22 and surround the inner cylinder 21. The electric heater H is mounted on the insulators 30. The holding member 40 is attached to one or both of the inner cylinder 21 and the outer cylinder 22 and holds the insulators 30 in the heater installation space P.
F23G 7/06 - Procédés ou appareils, p. ex. incinérateurs, spécialement adaptés à la combustion de déchets particuliers ou de combustibles pauvres, p. ex. des produits chimiques de gaz d'évacuation ou de gaz nocifs, p. ex. de gaz d'échappement
The present invention provides an exhaust gas purification device that can effectively remove not only fine dust but also most gaseous air pollutants from exhaust gas. An exhaust gas purification device according to the present invention comprises: a casing (12) that has an exhaust gas intake opening (12a) provided in a bottom surface, and an exhaust gas discharge opening (12b) provided in a side surface; a vaned wheel (14) that is fixed to a rotary shaft (18) and rotates around the same, said rotary shaft (18) being positioned along the vertical direction in the interior of the casing (12); and a dual fluid nozzle (16) that atomizes and sprays a cleaning liquid (20) into the vaned wheel (14). The vaned wheel (14) is made to rotate, an exhaust gas (E) to be processed is drawn into the casing (12) via the exhaust gas intake opening (12a), and the exhaust gas (E) is purified by the cleaning liquid (20) sprayed from the dual fluid nozzle (16), after which the result is discharged from the exhaust gas discharge opening (12b). The invention is characterized in that the exhaust gas (E) includes NOx and the cleaning liquid (20) is a hydrogen peroxide solution.
A gas purification device according to the present invention comprises: a casing (12) that has a gas intake opening (12a) provided in a bottom surface, and a gas discharge opening (12b) provided in a side surface; a vaned wheel (14) that is fixed to a rotary shaft (18) and rotates around the same, said rotary shaft (18) being positioned along the vertical direction in the interior of the casing (12); and a nozzle (16) that sprays a cleaning liquid (20) into the vaned wheel (14). The vaned wheel (14) is made to rotate, a gas (E) to be processed is drawn into the casing (12) via the gas intake opening (12a), and the gas (E) is purified by the cleaning liquid (20) sprayed from the nozzle (16), after which the result is discharged from the gas discharge opening (12b). The invention has an inner cylinder member (12c) that protrudes upward in the vertical direction from the circumferential edge of the gas intake opening (12a), and is provided at a height at which the upper end thereof does not contact a lower end section of the vaned wheel (14). Provided between this inner cylinder member (12c) and a sidewall inner surface of the casing (12) is a liquid reservoir section (12d), where the cleaning liquid (20) that has been sprayed from the nozzle (16) and has passed through the vaned wheel (14) pools temporarily.
The present invention is a gas processing furnace that performs thermolysis on an exhaust gas (E) discharged from a semiconductor manufacturing step, the gas processing furnace comprising: a closed cylindrical furnace body (12) having formed therein a gas processing space (12a), and having a gas introduction port (12b) bored through the bottom surface thereof; and an electric heater (14) that heats the gas processing space (12a) inside the furnace body (12). The present invention is characterized in that a reducing gas source supply means (16), for supplying at least one of ammonia water or urea water as a reducing gas source (S) toward the periphery of the gas introduction port (12b) inside the gas processing space (12a), is provided to the furnace body (12).
An ethylene oxide gas removal method according to the present invention is used for the removal of an ethylene oxide gas discharged into a specific sectioned space (12). The method comprises: a first step for sucking EO-containing air (CA) that contains ethylene oxide discharged into the sectioned space (12) and supplying the EO-containing air (CA) to a concentration device (14); a second step for removing water from the sucked EO-containing air (CA) in the concentration device (14) and adsorbing ethylene oxide onto an adsorbent material (42), thereby concentrating ethylene oxide; a third step for detaching the concentrated ethylene oxide from the adsorbent material (42) and transferring the detached ethylene oxide to a removal device (16); and a fourth step for decomposing and removing an ethylene oxide gas in the removal device (16).
B01D 53/04 - Séparation de gaz ou de vapeursRécupération de vapeurs de solvants volatils dans les gazÉpuration chimique ou biologique des gaz résiduaires, p. ex. gaz d'échappement des moteurs à combustion, fumées, vapeurs, gaz de combustion ou aérosols par adsorption, p. ex. chromatographie préparatoire en phase gazeuse avec adsorbants fixes
B01D 53/72 - Composés organiques non prévus dans les groupes , p. ex. hydrocarbures
The device for treating PFC-containing exhaust gas according to the present invention comprises an inlet scrubber (12), a gas treatment furnace (14), and an outlet scrubber (16). The gas treatment furnace (14) comprises: an outer cylinder (18) including a gas introduction port (18c) formed through the bottom surface of a main body (18a) having a gas treatment space (18b) formed inside thereof; an inner cylinder (20) having one end attached on the inner bottom surface of the main body (18a) so as to surround the gas introduction port (18c) and the other end opened and extending to a position close to a ceiling surface of the main body (18a) so as to cross the gas treatment space (18b); and an electrical heater (22) suspending from a ceiling part (18d) of the main body (18a) and including a long rod-shaped heating element (22a) arranged within the internal space of the inner cylinder (20). A throttle part (24) and a reducing gas supply means (26) are provided before the gas introduction port (18c). The throttle part (24) has the inner diameter which is of a flow passage of an exhaust gas (E) after passing through the inlet scrubber (12) and is narrowed down at once to the diameter of the gas introduction port (18c) or less. The reducing gas supply means (26) supplies, in a vicinity of an end portion of the throttle part (24) on the upstream side in the exhaust gas flow direction, a predetermined amount of reducing gas (G) toward the exhaust gas (E).
The treatment device for semiconductor manufacturing exhaust gas according to the present invention is provided with an inlet scrubber (12), a gas treatment furnace (14), and an outlet scrubber (16). The gas treatment furnace (14) comprises: an outer cylinder (18) having a body (18a), a gas treatment space (18b) formed inside the body (18a), and a gas feed port (18c) drilled in a bottom surface of the body (18a); an inner cylinder (20) having one end attached to an inner bottom surface of the body (18a) so as to surround the gas feed port (18c), and an other end which is opened, the inner cylinder (20) extending across the gas treatment space (18b) to a position close to a ceiling surface of the body (18a); and an electrothermal heater (22) hung from a ceiling part (18d) of the body (18a) and having a heating body (22a) with an elongated rod shape placed in an internal space of the inner cylinder (20). Provided before the gas feed port (18c) are a narrow part (24) where the inner diameter of the flow path of exhaust gas (E) after passage through the inlet scrubber (12) is narrowed at once to the port diameter of the gas feed port (18c) or less, and a reducing gas supply means (26) that supplies a predetermined amount of reducing gas (G) toward the exhaust gas (E) in the vicinity of an end part of the narrow part (24) on the upstream side in the exhaust gas flow direction.
A gas processing furnace (10) according to the present invention is characterized by comprising a furnace main body (12) having a hollow cylindrical shape and including a gas processing space (12a) therein, a non-transferred plasma jet torch (14) that supplies a plasma jet (P) into the gas processing space (12a), and an electrothermal heater (16) that heats a region of the gas processing space (12a) where the plasma jet (P) is supplied.
F23G 7/06 - Procédés ou appareils, p. ex. incinérateurs, spécialement adaptés à la combustion de déchets particuliers ou de combustibles pauvres, p. ex. des produits chimiques de gaz d'évacuation ou de gaz nocifs, p. ex. de gaz d'échappement
This gas processing furnace (10) is characterized in being constituted by a heater body (12) filled with an electric heating element, and a tubular gas channel (14) penetrating through the heater body (12). This gas processing furnace (10) is also characterized in being provided with: a block-shaped heater body (12) that extends in the vertical direction and that is filled with an electric heating element; a plurality of gas channels (14) penetrating vertically through the heater body (12), the gas channels (14) being provided so as to be successive or so as to extend in the longitudinal direction and parallel to each other in the lateral direction in plan view; and a head box (16) attached to the upper end part of the heater body (12), the head box (16) communicating the gas channels (14) to each other through a communication space (16a) formed in the interior thereof.
F23G 7/06 - Procédés ou appareils, p. ex. incinérateurs, spécialement adaptés à la combustion de déchets particuliers ou de combustibles pauvres, p. ex. des produits chimiques de gaz d'évacuation ou de gaz nocifs, p. ex. de gaz d'échappement
The present invention is an electric heating device comprising: a radiation tube (12) made of high corrosion resistance metal; heater wires (14) disposed inside the radiation tube (12); a heater fixed shaft (16), the surface of which is covered by an insulator, and which is disposed on the center axial line of the radiation tube (12); and a disk-shaped ceramic insulator (18) which is attached to the heater fixed shaft (16) at a predetermined interval and supports the heater wires (14), the electric heating device being characterized in that a protective sheet (20) made of high heat resistance metal is layered on an inner surface of the radiation tube (12), and a portion of the protective sheet (20) layered on an inner peripheral surface (12a) of the radiation tube (12) is formed in a cylindrical shape which winds the protective sheet (20) and which sets at least one among a first end side (20a) and a second end side (20b) forming a pair therewith in the winding direction to be a free state.
The present invention is an electric heating device comprising: a metal radiation tube (12); multiple heater lines (14) positioned so as to be parallel to each other within the radiation tube (12); a heater fixed shaft (16), the surface of which is covered by an insulating body, the heater fixed shaft (16) being installed on the center axis line of the radiation tube (12); and disc-shaped ceramic insulators (18) attached to the heater fixed shaft (16) at a prescribed gap, and supporting the heater line (14), wherein the electric heating device is characterized in that a center hole (20), the heater fixed shaft (16) being inserted in the center thereof, and heater line holding holes (22) having the same center as the center hole (20) and being distributed equally on the circumference of the ceramic insulator, are bored in each ceramic insulator (18), and in a normal state, the outer diameter of the ceramic insulator (18) or the diameter of the circumscribing circle thereof, when viewed from the axial direction of the heat radiation tube (12), is formed so as to be smaller than the inner diameter of the heat radiation tube (12) or the diameter of the inscribed circle thereof.
According to the present invention, clogging of an exhaust gas passage from a foreline pipe to a thermal decomposition tower is significantly eliminated. An exhaust gas detoxification unit (U) includes a vacuum pump (1), an exhaust gas introduction nozzle part (20), and an exhaust gas cleaning part (40). The exhaust gas introduction nozzle part (20) includes: an exhaust gas nozzle (21); a protective gas nozzle (25) for forming a protective gas curtain (Gk) which encloses an exhaust gas (H) from the exhaust gas nozzle (21), and a moisture jetting nozzle (27) for enclosing the protective gas curtain (Gk). The exhaust gas cleaning part (40) includes a water tank (41) and a stirring part (46). The water tank (41) is a hollow container in which cleaning water (M) is stored, and is connected to the exhaust gas introduction nozzle part (20). The space between the water (M) of the water tank (41) and the ceiling part (41a) thereof is a flow passage space (45) through which the exhaust gas (H) flows. The stirring part (46) includes: a first bank (47) which is suspended from the ceiling part (41a) of the water tank (41) and of which the lower part is immersed in the water (M) in the water tank (41); and a second bank (48) which is provided downstream of the first bank (47) and of which the upper part is exposed above the water (M).
B01D 53/78 - Procédés en phase liquide avec un contact gaz-liquide
B01D 47/02 - Séparation de particules dispersées dans l'air, des gaz ou des vapeurs en utilisant un liquide comme agent de séparation par passage de l'air, du gaz ou de la vapeur sur ou à travers un bain liquide
The present invention provides an exhaust gas purifier capable of improving the rate of removal of, inter alia, fine dust in exhaust gas. Specifically, this exhaust gas purifier comprises a casing (12) having an exhaust gas intake port (12a) and an exhaust gas discharge port (12b), an impeller (14) disposed in the casing (12) and supported by a rotating shaft (18), and a nozzle (16) through which a cleaning solution (20) is ejected into the impeller (14), the impeller (14) being caused to rotate to draw in a dust-containing exhaust gas (E) via the exhaust gas intake port (12a), and the cleaning solution (20) ejected from the nozzle (16) being caused to capture the dust in the exhaust gas (E) to remove the dust included in the exhaust gas (E), wherein the exhaust gas purifying device is characterized in that the rotating shaft (18) is disposed vertically, the impeller (14) rotates horizontally, and the exhaust gas intake port (12a) opens in the bottom surface of the casing (12).
F23G 7/06 - Procédés ou appareils, p. ex. incinérateurs, spécialement adaptés à la combustion de déchets particuliers ou de combustibles pauvres, p. ex. des produits chimiques de gaz d'évacuation ou de gaz nocifs, p. ex. de gaz d'échappement
Provided is a heat storage material which has a simple structure, which is easy to maintain and is economical, and with which it is easy to obtain a material with the target heat exchange efficiency. That is to say, this heat storage material is characterized by comprising: a casing (12) made from metal or ceramic and open in the gas flow direction; and a plurality of tubes (14) made from metal or ceramic and filling the casing (12) in such a manner that the axial direction thereof faces the gas flow direction.
F23G 7/06 - Procédés ou appareils, p. ex. incinérateurs, spécialement adaptés à la combustion de déchets particuliers ou de combustibles pauvres, p. ex. des produits chimiques de gaz d'évacuation ou de gaz nocifs, p. ex. de gaz d'échappement
F28D 20/00 - Appareils ou ensembles fonctionnels d'accumulation de chaleur en généralAppareils échangeurs de chaleur de régénération non couverts par les groupes ou
25.
EXHAUST-GAS PLASMA DETOXIFICATION METHOD, AND DEVICE FOR SAME
Provided is a plasma detoxification method in which all of exhaust gas charged into a thermolysis column is necessarily passed through a high-temperature region formed by a plasma jet and reliably decomposed. In a method for concentrating a plurality of plasma jets (P) toward a point (Q), the respective plasma jets (P) are generated from a plurality of plasma jet torches (2a, 2b, (2c)) installed facing toward a reaction space (D) of exhaust gas (H), the plasma jets (P) jetting toward the given point (Q) within the reaction space (D), and the exhaust gas (H) is supplied toward the point (Q) from between the plurality of plasma jet torches (2a, 2b, (2c)).
B01J 19/08 - Procédés utilisant l'application directe de l'énergie ondulatoire ou électrique, ou un rayonnement particulaireAppareils à cet usage
H01L 21/205 - Dépôt de matériaux semi-conducteurs sur un substrat, p. ex. croissance épitaxiale en utilisant la réduction ou la décomposition d'un composé gazeux donnant un condensat solide, c.-à-d. un dépôt chimique
The present invention provides a plasma generation unit (10) capable of maintaining ICP even at higher gas pressure and higher flow rate than in the prior art, and an exhaust gas detoxifying device (20) with high exhaust gas decomposition efficiency to which the plasma generation unit (10) is applied. More specifically, this plasma generation unit (10) includes a chamber (12) which has airtightness and through which gas flows, a high-frequency coil (14) which is disposed in the chamber (12), and generates inductively coupled plasma (18), and a high-frequency power source (16) which applies high-frequency voltage to the high-frequency coil (14).
Provided is a heat-storage-type exhaust gas scrubbing device that is capable of efficiently pyrolyzing toxic components, especially persistent components such as PFCs that decompose at high temperatures, in exhaust gas with less fuel expenditure, regardless of heat source type. Specifically, thermal energy storage elements (16) are disposed so that the central axes thereof in the gas flow direction are arranged on concentric circles, and a heat source (24) is disposed at a position on a ceiling of a combustion chamber (22), said position corresponding to the center of the concentric circles. The gas flow path in heat storage chambers (18) is controlled so that there are multiple exhaust-side chambers per intake-side chamber leading to the combustion chamber (22). In addition, the inner surface of the combustion chamber (22) is formed so that the gas flow path therein is symmetrical within the concentric circles as seen in a plan view.
F23G 7/06 - Procédés ou appareils, p. ex. incinérateurs, spécialement adaptés à la combustion de déchets particuliers ou de combustibles pauvres, p. ex. des produits chimiques de gaz d'évacuation ou de gaz nocifs, p. ex. de gaz d'échappement
In a water treatment device of an exhaust gas treatment device, there is provided an exhaust gas introduction nozzle with which it is possible to reliably eliminate clogging of solid reactants. This exhaust gas introduction nozzle 1 is configured from: an inner tube 2 for jetting an introduced exhaust gas H from a first jetting hole 2f into a high-humidity environment inside a water treatment tank 20; and an outer tube 5 arranged so as to surround the outer periphery of the first jetting hole 2f in the inner tube 2, the outer tube 5 jetting an inert gas F so as to surround the vicinity of the exhaust gas H jetted from the first jetting hole 2f, and having a second jetting hole 5f that forms an inert gas curtain F1 in the vicinity of the exhaust gas H.
B01D 53/14 - Séparation de gaz ou de vapeursRécupération de vapeurs de solvants volatils dans les gazÉpuration chimique ou biologique des gaz résiduaires, p. ex. gaz d'échappement des moteurs à combustion, fumées, vapeurs, gaz de combustion ou aérosols par absorption
B01D 53/18 - Unités d'absorptionDistributeurs de liquides
B01D 53/78 - Procédés en phase liquide avec un contact gaz-liquide
H01L 21/02 - Fabrication ou traitement des dispositifs à semi-conducteurs ou de leurs parties constitutives
29.
EXHAUST GAS DECOMPRESSION AND DETOXIFICATION METHOD, AND DEVICE THEREFOR
The present invention provides an exhaust gas detoxification method and a device therefor, in which use of nitrogen gas for dilution can be minimized, and the energy usage efficiency of which is excellent. Specifically, the present invention is an exhaust gas decompression and detoxification method and a device therefor, characterized in that exhaust gas supplied from a generation source via a vacuum pump is kept in a decompressed state, is heated by an electrothermal heater, and is subjected to degradative and/or reaction treatment.
The present invention provides an exhaust gas detoxification method and a device therefor that can minimize the use of a nitrogen gas for dilution and have superior energy usage efficiency. Namely, the present invention is an exhaust gas decompression detoxification method and a device therefor that are characterized in that an exhaust gas that is supplied by a production source via a vacuum pump is kept in a decompressed state and is subjected to decomposition processing with the heat of a high-temperature plasma.
B01D 53/74 - Procédés généraux pour l'épuration des gaz résiduairesAppareils ou dispositifs spécialement adaptés à ces procédés
B01D 53/46 - Élimination des composants de structure définie
H01L 21/31 - Traitement des corps semi-conducteurs en utilisant des procédés ou des appareils non couverts par les groupes pour former des couches isolantes en surface, p. ex. pour masquer ou en utilisant des techniques photolithographiquesPost-traitement de ces couchesEmploi de matériaux spécifiés pour ces couches
H05H 1/30 - Torches à plasma utilisant des champs électromagnétiques appliqués, p. ex. de l'énergie à haute fréquence ou sous forme de micro-ondes
The present invention provides an exhaust gas detoxification method and a device therefor that can minimize the use of a nitrogen gas for dilution and have superior energy usage efficiency. Namely, the present invention is an exhaust gas decompression detoxification method and a device therefor that are characterized in that an exhaust gas that is supplied by a production source via a vacuum pump is kept in a decompressed state and is subjected to decomposition processing with the combustion heat of a flame.
F23G 7/06 - Procédés ou appareils, p. ex. incinérateurs, spécialement adaptés à la combustion de déchets particuliers ou de combustibles pauvres, p. ex. des produits chimiques de gaz d'évacuation ou de gaz nocifs, p. ex. de gaz d'échappement
B01D 53/76 - Procédés en phase gazeuse, p. ex. utilisant des aérosols
C23C 16/44 - Revêtement chimique par décomposition de composés gazeux, ne laissant pas de produits de réaction du matériau de la surface dans le revêtement, c.-à-d. procédés de dépôt chimique en phase vapeur [CVD] caractérisé par le procédé de revêtement
32.
EXHAUST GAS PRESSURE-REDUCING DETOXIFYING APPARATUS
The present invention provides an exhaust gas detoxifying apparatus that has high energy utilization efficiency and economic efficiency and that is capable of minimizing use of a dilution nitrogen gas. An exhaust gas pressure-reducing detoxifying apparatus according to the present invention has a reaction cylinder (16) for carrying out decomposing and/or reaction process on an exhaust gas (E) supplied from an exhaust gas generation source (12) via a vacuum pump (14), by heating or exciting the exhaust gas in an exhaust gas processing space (16a) formed therein by means of an electrothermal heater (18) or a plasma. A rear-stage vacuum pump (22) for reducing the pressure from an exhaust port of the vacuum pump (14) to the inside of the reaction cylinder (16) is connected to an exhaust gas outlet (20) side of the reaction cylinder (16). The rear-stage vacuum pump (22) includes a water seal pump, and is provided with a water-washing means (24) for washing the downstream end side of an exhaust gas flow passage of the reaction cylinder (16) by using washing water (W). The washing water (W) supplied from the water-washing means (24) is used as water to seal the rear-stage vacuum pump (22).
F23G 7/06 - Procédés ou appareils, p. ex. incinérateurs, spécialement adaptés à la combustion de déchets particuliers ou de combustibles pauvres, p. ex. des produits chimiques de gaz d'évacuation ou de gaz nocifs, p. ex. de gaz d'échappement
H01L 21/02 - Fabrication ou traitement des dispositifs à semi-conducteurs ou de leurs parties constitutives
A dehumidification device according to the present invention has a physical hygroscopic material comprising an inorganic porous material and uses said material in a granulated or agglomerated state, and thus is capable of maximizing moisture absorption per unit volume of a hygroscopic structure 10. Furthermore, when regenerating the absorption ability of a hygroscopic material 42, the dehumidification device is capable of removing, from the hygroscopic material, a high-boiling point compound along with moisture by heating the hygroscopic material 42 to a high temperature of no less than roughly 300°C. A heating means 46 directly heats the hygroscopic material 42, so the moisture adsorbed by the hygroscopic material 42 rises in temperature without waste and desorbs from the hygroscopic material 42, and by pushing, with low-humidity regenerated air extracted from a cooling circuit, the desorbed moisture from a dehumidifier, low energy consumption regeneration of a hygroscopic material is possible. In addition, a fixed-type hygroscopic tower comprises at least three dehumidifiers, so the three steps of returned air dehumidification, hygroscopic material regeneration, and cooling following hygroscopic material regeneration can be performed simultaneously in the same manner as in a honeycomb rotor rotating-type dehumidifier.
B01D 53/04 - Séparation de gaz ou de vapeursRécupération de vapeurs de solvants volatils dans les gazÉpuration chimique ou biologique des gaz résiduaires, p. ex. gaz d'échappement des moteurs à combustion, fumées, vapeurs, gaz de combustion ou aérosols par adsorption, p. ex. chromatographie préparatoire en phase gazeuse avec adsorbants fixes
F24F 3/14 - Systèmes de conditionnement d'air dans lesquels l'air conditionné primaire est fourni par une ou plusieurs stations centrales aux blocs de distribution situés dans les pièces ou enceintes, blocs dans lesquels il peut subir un traitement secondaireAppareillage spécialement conçu pour de tels systèmes caractérisés par le traitement de l'air autrement que par chauffage et refroidissement par humidificationSystèmes de conditionnement d'air dans lesquels l'air conditionné primaire est fourni par une ou plusieurs stations centrales aux blocs de distribution situés dans les pièces ou enceintes, blocs dans lesquels il peut subir un traitement secondaireAppareillage spécialement conçu pour de tels systèmes caractérisés par le traitement de l'air autrement que par chauffage et refroidissement par déshumidification
brevets