Laser annealing apparatus includes a plurality of frequency-tripled solid-state lasers, each delivering an output beam of radiation at a wavelength between 340 nm and 360 nm. Each output beam has a beam-quality factor (M2) greater of than 50 in one transverse axis and greater than 20 in another transverse axis. The output beams are combined and formed into a line-beam that is projected on a substrate being annealed. Each output beam contributes to the length of the line-beam.
H01S 3/109 - Multiplication de la fréquence, p. ex. génération d'harmoniques
B23K 26/00 - Travail par rayon laser, p. ex. soudage, découpage ou perçage
B23K 26/0622 - Mise en forme du faisceau laser, p. ex. à l’aide de masques ou de foyers multiples par commande directe du faisceau laser par impulsions de mise en forme
B23K 26/064 - Mise en forme du faisceau laser, p. ex. à l’aide de masques ou de foyers multiples au moyen d'éléments optiques, p. ex. lentilles, miroirs ou prismes
B23K 26/354 - Travail par rayon laser, p. ex. soudage, découpage ou perçage pour le traitement de surface par fusion
H01S 3/00 - Lasers, c.-à-d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet
H01S 3/08 - Structure ou forme des résonateurs optiques ou de leurs composants
H01S 3/094 - Procédés ou appareils pour l'excitation, p. ex. pompage utilisant le pompage optique par de la lumière cohérente
H01S 3/0941 - Procédés ou appareils pour l'excitation, p. ex. pompage utilisant le pompage optique par de la lumière cohérente produite par un laser à semi-conducteur, p. ex. par une diode laser
H01S 3/115 - Commutation-Q utilisant des dispositifs électro-optiques dans la cavité
A method for laser welding a metal foil stack to a metal substrate includes clamping the foil stack against a support surface of a substrate and irradiating the stack with a beam of laser pulses to weld the foils to the substrate. The beam is a composite beam including a center beam and a surrounding annular beam. An initial series of the laser pulses are incident on the stack at mutually distinct locations on a top surface of the stack, and a subsequent series of the laser pulses are incident on the stack at mutually distinct locations on a side of the stack. The resulting weld nuggets penetrate deeply into the stack, with an average penetration depth that exceeds an average pitch between the weld nuggets. The method is capable of welding more than 100 foils to the substrate. Welded assemblies have been demonstrated to withstand large shear forces.
B23K 26/244 - Soudage de joints du type à recouvrement
H01M 50/536 - Connexions d’électrodes dans un boîtier de batterie caractérisées par le procédé de fixation des conducteurs aux électrodes, p. ex. soudage
H01M 50/538 - Connexions de plusieurs conducteurs ou languettes d’électrodes empilées enroulées ou pliées
H01M 50/54 - Connexion de plusieurs conducteurs ou languettes d’électrodes empilées en forme de plaque, p. ex. barrettes ou ponts de pôles d’électrode
A method for laser welding a metal foil stack to a metal substrate includes clamping the foil stack against a support surface of a substrate and irradiating the stack with a beam of laser pulses to weld the foils to the substrate. The beam is a composite beam including a center beam and a surrounding annular beam. An initial series of the laser pulses are incident on the stack at mutually distinct locations on a top surface of the stack, and a subsequent series of the laser pulses are incident on the stack at mutually distinct locations on a side of the stack. The resulting weld nuggets penetrate deeply into the stack, with an average penetration depth that exceeds an average pitch between the weld nuggets. The method is capable of welding more than 100 foils to the substrate. Welded assemblies have been demonstrated to withstand large shear forces.
B23K 26/0622 - Mise en forme du faisceau laser, p. ex. à l’aide de masques ou de foyers multiples par commande directe du faisceau laser par impulsions de mise en forme
B23K 26/073 - Détermination de la configuration du spot laser
B23K 101/36 - Dispositifs électriques ou électroniques
A laser frequency conversion system with ultraviolet-damage mitigation includes a nonlinear crystal for frequency converting a laser beam, and a one-dimensional beam expander arranged to receive the laser beam from the nonlinear crystal and expand a first transverse dimension of the laser beam. This expansion protects subsequent optical elements from ultraviolet damage. To mitigate ultraviolet damage to the nonlinear crystal and the beam expander, the system also includes one or more translation stages configured to translate the nonlinear crystal and the beam expander along a translation direction that is orthogonal to the first transverse dimension of the laser beam and non-parallel to a propagation direction of the laser beam through the nonlinear crystal and the beam expander.
H01S 3/00 - Lasers, c.-à-d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet
H01S 3/109 - Multiplication de la fréquence, p. ex. génération d'harmoniques
5.
SEE-THROUGH NEAR-EYE DISPLAY DEVICE WITH CRYSTALLINE WAVEGUIDE
G02B 1/02 - Éléments optiques caractérisés par la substance dont ils sont faitsRevêtements optiques pour éléments optiques faits de cristaux, p. ex. sel gemme, semi-conducteurs
F21V 8/00 - Utilisation de guides de lumière, p. ex. dispositifs à fibres optiques, dans les dispositifs ou systèmes d'éclairage
A see-through near-eye display device includes an image source configured to emit light conveying an image, a one-dimensional waveguide made of a crystalline material transmissive to visible light and arranged to receive and guide the light emitted by the image source, and a first grating disposed on or in the waveguide. The first grating is configured to couple out of the waveguide at least a portion of the light from the image source after having been guided by the waveguide to the first grating. Several particularly advantageous crystalline waveguide materials are disclosed, which exhibit a high refractive index and high transparency in the visible spectrum. In one class of embodiments, the crystalline waveguide material is based on a bismuth germanium oxide crystal or a bismuth silicon oxide crystal, optionally with substitutions and/or doping. The crystalline waveguide material may be of the form of Bi12Ge1-x-ySixTiyO20, with or without further dopants.
G02B 1/02 - Éléments optiques caractérisés par la substance dont ils sont faitsRevêtements optiques pour éléments optiques faits de cristaux, p. ex. sel gemme, semi-conducteurs
A method laser cuts and laser pre-welds a stack of metal foils in a single laser process. The method includes clamping together the stack of metal foils, and irradiating the clamped stack with a laser beam to complete a cut through the entire stack and, while cutting the stack, form a weld joint joining the metal foils together at the cut. Subsequently, the cut and pre-welded stack of metal foils may be laser welded to a metal substrate that is significantly thicker than individual foils. The method may be applied to stacks of anode and cathode foils in electrochemical batteries, such as lithium-ion batteries.
B23K 28/02 - Procédés ou appareils combinés pour le soudage ou le découpage
B23K 37/04 - Dispositifs ou procédés auxiliaires non spécialement adaptés à un procédé couvert par un seul des autres groupes principaux de la présente sous-classe pour maintenir ou mettre en position les pièces
A method laser cuts and laser pre-welds a stack of metal foils in a single laser process. The method includes clamping together the stack of metal foils, and irradiating the clamped stack with a laser beam to complete a cut through the entire stack and, while cutting the stack, form a weld joint joining the metal foils together at the cut. Subsequently, the cut and pre-welded stack of metal foils may be laser welded to a metal substrate that is significantly thicker than individual foils. The method may be applied to stacks of anode and cathode foils in electrochemical batteries, such as lithium-ion batteries.
A method for frequency conversion in a single-longitudinal-mode linear resonator includes frequency converting intracavity laser radiation in a nonlinear crystal disposed in a linear resonator. The intracavity laser radiation is in a single longitudinal mode of the resonator and forms a standing wave between its end-mirrors. The method also includes repeatedly sweeping the standing wave back and forth, along an optical axis of the resonator, relative to the nonlinear crystal. This repeated sweeping may be achieved by dithering the longitudinal position of (a) one or both of the end-mirrors or (b) the nonlinear crystal. Dithering of a single end-mirror may be driven by modulating a reference wavelength to which the wavelength of the intracavity laser radiation is locked. Dithering of the longitudinal position of the nonlinear crystal may be achieved with a piezoelectric actuator arranged to adjust angles of a parallelogram-shaped flexure to which the nonlinear crystal is mounted.
H01S 3/00 - Lasers, c.-à-d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet
H01S 3/105 - Commande de l'intensité, de la fréquence, de la phase, de la polarisation ou de la direction du rayonnement, p. ex. commutation, ouverture de porte, modulation ou démodulation par commande de la position relative ou des propriétés réfléchissantes des réflecteurs de la cavité
H01S 3/109 - Multiplication de la fréquence, p. ex. génération d'harmoniques
H01S 3/131 - Stabilisation de paramètres de sortie de laser, p. ex. fréquence ou amplitude par commande du milieu actif, p. ex. par commande des procédés ou des appareils pour l'excitation
A composite filter (100) includes a substrate (110) and, disposed thereon, a dielectric reststrahlen coating (120) and a dielectric coating stack (130). The substrate (110) is transmissive in a first infrared wavelength range from 9 to 11 micrometers as well as in neighboring infrared wavelength ranges above and below the first infrared wavelength range. The dielectric reststrahlen coating (120) has a reststrahlen band that overlaps with the first infrared wavelength range and contains at least one carbon dioxide laser wavelength, and is partly absorptive at the carbon dioxide wavelength(s). The dielectric coating stack (130) forms a multilayer interference filter that is predominantly reflective at the carbon dioxide laser wavelength(s) and predominantly transmissive in a second infrared wavelength range below the reststrahlen band.
A laser frequency conversion system with ultraviolet-damage mitigation includes a nonlinear crystal for frequency converting a laser beam, and a one-dimensional beam expander arranged to receive the laser beam from the nonlinear crystal and expand a first transverse dimension of the laser beam. This expansion protects subsequent optical elements from ultraviolet damage. To mitigate ultraviolet damage to the nonlinear crystal and the beam expander, the system also includes one or more translation stages configured to translate the nonlinear crystal and the beam expander along a translation direction that is orthogonal to the first transverse dimension of the laser beam and non-parallel to a propagation direction of the laser beam through the nonlinear crystal and the beam expander.
A Q-switched gas laser apparatus with bivariate pulse equalization includes a gas laser, a sensor, and an electronic circuit. A Q-switch that switches the laser resonator between high-loss and low-loss states to generate a pulsed laser beam. The sensor obtains a measurement of the pulsed laser beam indicative of the laser pulse energy. The electronic circuitry operates the Q-switch to (a) repeatedly switch the laser resonator between the high-loss and low-loss states to set a repetition rate of laser pulses of the pulsed laser beam, (b) adjust a loss level of the low-loss state, based on the pulse energy measurement, to achieve a target laser pulse energy, and (c) adjust a duration of the low-loss state to achieve a target laser pulse duration. By adjusting both pulse energy and duration, uniform pulse energy and, if desired, uniform pulse duration are achieved over a wide range of repetition rates.
H01S 3/223 - Lasers, c.-à-d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet caractérisés par le matériau utilisé comme milieu actif à gaz le gaz actif étant polyatomique, c.-à-d. contenant plusieurs atomes
H01S 3/117 - Commutation-Q utilisant des dispositifs acousto-optiques dans la cavité
H01S 3/13 - Stabilisation de paramètres de sortie de laser, p. ex. fréquence ou amplitude
H01S 3/136 - Stabilisation de paramètres de sortie de laser, p. ex. fréquence ou amplitude par commande de dispositifs placés dans la cavité
H01S 3/10 - Commande de l'intensité, de la fréquence, de la phase, de la polarisation ou de la direction du rayonnement, p. ex. commutation, ouverture de porte, modulation ou démodulation
H01S 3/106 - Commande de l'intensité, de la fréquence, de la phase, de la polarisation ou de la direction du rayonnement, p. ex. commutation, ouverture de porte, modulation ou démodulation par commande de dispositifs placés dans la cavité
H01S 3/23 - Agencement de plusieurs lasers non prévu dans les groupes , p. ex. agencement en série de deux milieux actifs séparés
A Q-switched gas laser apparatus with bivariate pulse equalization includes a gas laser, a sensor, and an electronic circuit. A Q-switch that switches the laser resonator between high-loss and low-loss states to generate a pulsed laser beam. The sensor obtains a measurement of the pulsed laser beam indicative of the laser pulse energy. The electronic circuitry operates the Q-switch to (a) repeatedly switch the laser resonator between the high-loss and low-loss states to set a repetition rate of laser pulses of the pulsed laser beam, (b) adjust a loss level of the low-loss state, based on the pulse energy measurement, to achieve a target laser pulse energy, and (c) adjust a duration of the low-loss state to achieve a target laser pulse duration. By adjusting both pulse energy and duration, uniform pulse energy and, if desired, uniform pulse duration are achieved over a wide range of repetition rates.
H01S 3/136 - Stabilisation de paramètres de sortie de laser, p. ex. fréquence ou amplitude par commande de dispositifs placés dans la cavité
H01S 3/117 - Commutation-Q utilisant des dispositifs acousto-optiques dans la cavité
H01S 3/13 - Stabilisation de paramètres de sortie de laser, p. ex. fréquence ou amplitude
H01S 3/223 - Lasers, c.-à-d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet caractérisés par le matériau utilisé comme milieu actif à gaz le gaz actif étant polyatomique, c.-à-d. contenant plusieurs atomes
14.
ACTIVELY COOLED END-PUMPED SOLID-STATE LASER GAIN MEDIUM
An actively cooled end-pumped solid-state laser gain device includes a bulk solid-state gain medium. An input-end of the gain medium receives a pump laser beam incident thereon and propagating in the direction toward an opposite output-end. The metal foil is disposed over a face of the gain medium extending between the input- and output-ends. A housing cooperates with the metal foil to form a coolant channel on the face the gain medium. The coolant channel has an inlet and an outlet configured to conduct a flow of coolant along the metal foil from the input-end towards the output-end. The metal foil is secured between the gain medium and portions of the housing running adjacent to the coolant channel. The metal foil provides a reliable thermal contact and imparts little or no stress on the bulk gain medium.
H01S 3/042 - Dispositions pour la gestion thermique pour des lasers à l'état solide
H01S 3/0941 - Procédés ou appareils pour l'excitation, p. ex. pompage utilisant le pompage optique par de la lumière cohérente produite par un laser à semi-conducteur, p. ex. par une diode laser
H01S 3/04 - Dispositions pour la gestion thermique
H05K 7/20 - Modifications en vue de faciliter la réfrigération, l'aération ou le chauffage
15.
ACTIVELY COOLED END-PUMPED SOLID-STATE LASER GAIN MEDIUM
An actively cooled end-pumped solid-state laser gain device includes a bulk solid-state gain medium. An input-end of the gain medium receives a pump laser beam incident thereon and propagating in the direction toward an opposite output-end. The metal foil is disposed over a face of the gain medium extending between the input- and output-ends. A housing cooperates with the metal foil to form a coolant channel on the face the gain medium. The coolant channel has an inlet and an outlet configured to conduct a flow of coolant along the metal foil from the input-end towards the output-end. The metal foil is secured between the gain medium and portions of the housing running adjacent to the coolant channel. The metal foil provides a reliable thermal contact and imparts little or no stress on the bulk gain medium.
H01S 3/0941 - Procédés ou appareils pour l'excitation, p. ex. pompage utilisant le pompage optique par de la lumière cohérente produite par un laser à semi-conducteur, p. ex. par une diode laser
A thermally actuated adaptive optic includes a base, a reflector, and a plurality of actuators coupled therebetween. The reflector has a light-receiving front surface, and a back surface facing the base. Each actuator includes a bracket rigidly bonded to the reflector at a perimeter of the reflector, and an inner rod and. an outer rod. Each rod is rigidly connected between the bracket and the base, with the inner rod being closer to a center of the reflector. The length of each rod is temperature dependent. In another adaptive optic, the rods are instead bonded directly to the reflector. This adaptive optic may be modified to implement an integrally formed, thermally actuated support. The disclosed adaptive optics are suitable for use in laser systems, allow for significant cost savings over piezoelectric devices, provide a reflective area free of surface-figure perturbations caused by the actuator- interfaces, and are relatively simple to manufacture.
G02B 26/08 - Dispositifs ou dispositions optiques pour la commande de la lumière utilisant des éléments optiques mobiles ou déformables pour commander la direction de la lumière
A thermally actuated adaptive optic includes a base, a reflector, and a plurality of actuators coupled therebetween. The reflector has a light-receiving front surface, and a back surface facing the base. Each actuator includes a bracket rigidly bonded to the reflector at a perimeter of the reflector, and an inner rod and an outer rod. Each rod is rigidly connected between the bracket and the base, with the inner rod being closer to a center of the reflector. The length of each rod is temperature dependent. In another adaptive optic, the rods are instead bonded directly to the reflector. This adaptive optic may be modified to implement an integrally formed, thermally actuated support. The disclosed adaptive optics are suitable for use in laser systems, allow for significant cost savings over piezoelectric devices, provide a reflective area free of surface-figure perturbations caused by the actuator-interfaces, and are relatively simple to manufacture.
G02B 7/182 - Montures, moyens de réglage ou raccords étanches à la lumière pour éléments optiques pour prismesMontures, moyens de réglage ou raccords étanches à la lumière pour éléments optiques pour miroirs pour miroirs
G02B 7/18 - Montures, moyens de réglage ou raccords étanches à la lumière pour éléments optiques pour prismesMontures, moyens de réglage ou raccords étanches à la lumière pour éléments optiques pour miroirs
18.
OPTOMECHANICAL ASSEMBLIES FOR TEMPERATURE-ROBUST LASER BEAM COMBINATION AND DELIVERY
An optomechanical assembly (100) for temperature-robust laser beam processing includes a baseplate (110) and an optics plate (130). The baseplate includes a source area (112) for accommodating a source (160) of the laser beam, and a light-processing area (114) located away from the source area and including first (116) and second anchor points (118). The optics plate is disposed in the light¬ processing area and includes first (132) and second portions (134) and a flexible coupling (136) interconnecting the first and second portions. The first and second portions are fixed to the baseplate at the first and second anchor points, respectively. The flexible coupling allows for a thermally-induced change in distance between the first and second anchor points in the presence of dissimilar thermal expansion of the optics plate and the baseplate. The assembly further includes a linearly arranged series of optical elements (142) for manipulating a laser beam from the laser source. Each of the optical elements is rigidly bonded to the first portion (132). The coefficient of thermal expansion (CTE) of the optics plate (130) is matched to the CTEs of the optical elements (142).
An optomechanical assembly for temperature-robust laser beam processing includes a baseplate and an optics plate. The baseplate includes a source area for accommodating a source of the laser beam, and a light-processing area located away from the source area and including first and second anchor points. The optics plate is disposed in the light-processing area and includes first and second portions and a flexible coupling interconnecting the first and second portions. The first and second portions are fixed to the baseplate at the first and second anchor points, respectively. The flexible coupling allows for a thermally-induced change in distance between the first and second anchor points in the presence of dissimilar thermal expansion of the optics plate and the baseplate. The assembly further includes a series of optical elements for manipulating a laser beam from the laser source. Each of the optical elements is rigidly bonded to the first portion.
B23K 26/064 - Mise en forme du faisceau laser, p. ex. à l’aide de masques ou de foyers multiples au moyen d'éléments optiques, p. ex. lentilles, miroirs ou prismes
B23K 26/06 - Mise en forme du faisceau laser, p. ex. à l’aide de masques ou de foyers multiples
G02B 7/02 - Montures, moyens de réglage ou raccords étanches à la lumière pour éléments optiques pour lentilles
H01S 3/00 - Lasers, c.-à-d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet
An ultrashort-pulse compressor includes (a) one or more bulk-optics intersecting a propagation path of an ultrashort-pulsed laser beam multiple times to spectrally broaden a pulse of the laser beam during each of multiple passes through the bulk-optic(s), (b) one or more dispersive optics for compressing a duration of the pulse after each of the multiple passes, and (c) a plurality of focusing elements for focusing the laser beam between the multiple passes. Propagation distances between the bulk-optic(s) and the focusing elements are detuned from imaging such that a spot size of the laser beam, at the bulk-optic(s), is greater at each successive one of the multiple passes. As the laser beam propagates through this compressor, each laser pulse is alternatingly spectral broadened and temporally compressed. The increasing spot size of the laser, for each pass, helps prevent optical damage, run- away self-focusing, and other undesirable outcomes.
H01S 3/00 - Lasers, c.-à-d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet
An ultrashort-pulse compressor includes (a) one or more bulk-optics intersecting a propagation path of an ultrashort-pulsed laser beam multiple times to spectrally broaden a pulse of the laser beam during each of multiple passes through the bulk-optic(s), (b) one or more dispersive optics for compressing a duration of the pulse after each of the multiple passes, and (c) a plurality of focusing elements for focusing the laser beam between the multiple passes. Propagation distances between the bulk-optic(s) and the focusing elements are detuned from imaging such that a spot size of the laser beam, at the bulk-optic(s), is greater at each successive one of the multiple passes. As the laser beam propagates through this compressor, each laser pulse is alternatingly spectral broadened and temporally compressed. The increasing spot size of the laser, for each pass, helps prevent optical damage, run-away self-focusing, and other undesirable outcomes.
B23K 26/0622 - Mise en forme du faisceau laser, p. ex. à l’aide de masques ou de foyers multiples par commande directe du faisceau laser par impulsions de mise en forme
B23K 26/046 - Focalisation automatique du faisceau laser
B23K 26/06 - Mise en forme du faisceau laser, p. ex. à l’aide de masques ou de foyers multiples
22.
Pulsed laser with intracavity frequency conversion aided by extra-cavity frequency conversion
A pulsed third-harmonic laser system includes a pulsed laser, an extra-cavity nonlinear crystal, and an intracavity nonlinear crystal. The pulsed laser generates fundamental laser pulses and couples out a portion of each fundamental laser pulse out of the laser resonator to undergo second-harmonic-generation in the extra-cavity nonlinear crystal. Resulting second-harmonic laser pulses are directed back into the laser resonator and mixes with the fundamental laser pulses in the intracavity nonlinear crystal to generate third-harmonic laser pulses. The pulsed third-harmonic laser system thus maintains a non-zero output coupling efficiency regardless of the efficiency of the second-harmonic-generation stage, while the third-harmonic-generation stage benefits from the intracavity power of the fundamental laser pulses.
H01S 3/00 - Lasers, c.-à-d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet
H01S 3/11 - Blocage de modesCommutation-QAutres techniques d'impulsions géantes, p. ex. vidange de cavité
H01S 3/108 - Commande de l'intensité, de la fréquence, de la phase, de la polarisation ou de la direction du rayonnement, p. ex. commutation, ouverture de porte, modulation ou démodulation par commande de dispositifs placés dans la cavité utilisant des dispositifs optiques non linéaires, p. ex. produisant une diffusion par effet Brillouin ou Raman
23.
PULSED LASER WITH INTRACAVITY FREQUENCY CONVERSION AIDED BY EXTRA-CAVITY FREQUENCY CONVERSION
A pulsed third-harmonic laser system includes a pulsed laser, an extra-cavity nonlinear crystal, and an intracavity nonlinear crystal. The pulsed laser generates fundamental laser pulses and couples out a portion of each fundamental laser pulse out of the laser resonator to undergo second-harmonic-generation in the extra-cavity nonlinear crystal. Resulting second-harmonic laser pulses are directed back into the laser resonator and mixes with the fundamental laser pulses in the intracavity nonlinear crystal to generate third-harmonic laser pulses. The pulsed third-harmonic laser system thus maintains a non-zero output coupling efficiency regardless of the efficiency of the second-harmonic-generation stage, while the third-harmonic-generation stage benefits from the intracavity power of the fundamental laser pulses.
H01S 3/00 - Lasers, c.-à-d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet
H01S 3/109 - Multiplication de la fréquence, p. ex. génération d'harmoniques
H01S 3/108 - Commande de l'intensité, de la fréquence, de la phase, de la polarisation ou de la direction du rayonnement, p. ex. commutation, ouverture de porte, modulation ou démodulation par commande de dispositifs placés dans la cavité utilisant des dispositifs optiques non linéaires, p. ex. produisant une diffusion par effet Brillouin ou Raman
H01S 3/11 - Blocage de modesCommutation-QAutres techniques d'impulsions géantes, p. ex. vidange de cavité
H01S 3/115 - Commutation-Q utilisant des dispositifs électro-optiques dans la cavité
H01S 3/08 - Structure ou forme des résonateurs optiques ou de leurs composants
A method for laser keyhole welding is disclosed to weld two pieces together made of a metal alloy. The method independently adjusts power in a focused center beam and power in a concentric focused annular beam. At the termination of a weld, the power of the annular beam is reduced, motion of the focused beams is stopped, the power of the center beam is increased, and the power of both beams is initially ramped down rapidly and then ramped down slowly. Increasing the power of the center beam equalizes the temperature of both pieces prior to solidification and cooling at the termination of the weld. An additional pulse of power may be applied to prevent the formation of defects or to erase any defects.
B23K 26/244 - Soudage de joints du type à recouvrement
B23K 26/0622 - Mise en forme du faisceau laser, p. ex. à l’aide de masques ou de foyers multiples par commande directe du faisceau laser par impulsions de mise en forme
B23K 26/06 - Mise en forme du faisceau laser, p. ex. à l’aide de masques ou de foyers multiples
B23K 26/073 - Détermination de la configuration du spot laser
A method for laser keyhole welding is disclosed to weld two pieces together made of a metal alloy. The method independently adjusts power in a focused center beam and power in a concentric focused annular beam. At the termination of a weld, the power of the annular beam (PA) is reduced, motion of the focused beams is stopped, the power of the center beam (Pc) is increased, and the power of both beams is initially ramped down rapidly and then ramped down slowly. Increasing the power of the center beam equalizes the temperature of both pieces prior to solidification and cooling at the termination of the weld. An additional pulse of power may be applied to prevent the formation of defects or to erase any defects.
22) or carbon monoxide (CO) gas laser includes two electrodes, which have passivated surfaces, within a sealed housing. Features in a ceramic slab or a ceramic cylinder located between the electrodes define a gain volume. Surfaces of the ceramic slab or the ceramic cylinder are separated from the passivated surfaces of the electrodes by small gaps to prevent abrasion thereof. Reducing compressive forces that secure these components within the housing further reduces abrasion, thereby extending the operational lifetime of the gas laser.
H01S 3/032 - Détails de structure des tubes laser à décharge dans le gaz pour le confinement de la décharge, p. ex. par des caractéristiques particulières du tube pour la contraction de la décharge
H01S 3/038 - Électrodes, p. ex. forme, configuration ou composition particulières
H01S 3/0971 - Procédés ou appareils pour l'excitation, p. ex. pompage par décharge dans le gaz d'un laser à gaz excité transversalement
H01S 3/07 - Structure ou forme du milieu actif consistant en une pluralité de parties, p. ex. segments
H01S 3/081 - Structure ou forme des résonateurs optiques ou de leurs composants comprenant trois réflecteurs ou plus
H01S 3/223 - Lasers, c.-à-d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet caractérisés par le matériau utilisé comme milieu actif à gaz le gaz actif étant polyatomique, c.-à-d. contenant plusieurs atomes
H01S 3/03 - Détails de structure des tubes laser à décharge dans le gaz
2) or carbon monoxide (CO) gas laser includes two electrodes, which have passivated surfaces, within a sealed housing. Features in a ceramic slab or a ceramic cylinder located between the electrodes define a gain volume. Surfaces of the ceramic slab or the ceramic cylinder are separated from the passivated surfaces of the electrodes by small gaps to prevent abrasion thereof. Reducing compressive forces that secure these components within the housing further reduces abrasion, thereby extending the operational lifetime of the gas laser.
H01S 3/03 - Détails de structure des tubes laser à décharge dans le gaz
H01S 3/038 - Électrodes, p. ex. forme, configuration ou composition particulières
H01S 3/097 - Procédés ou appareils pour l'excitation, p. ex. pompage par décharge dans le gaz d'un laser à gaz
H01S 3/223 - Lasers, c.-à-d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet caractérisés par le matériau utilisé comme milieu actif à gaz le gaz actif étant polyatomique, c.-à-d. contenant plusieurs atomes
An optical parametric chirped-pulse amplifier includes first and second optical parametric amplifier stages that successively amplify a stretched signal beam. A pulsed laser provides a fundamental beam. The second amplifier stage is pumped by the full power of a second-harmonic beam that is generated from the fundamental beam. A residual fundamental beam is used to generate another second-harmonic beam that pumps the first amplifier stage.
H01S 3/091 - Procédés ou appareils pour l'excitation, p. ex. pompage utilisant le pompage optique
H01S 3/00 - Lasers, c.-à-d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet
H01S 3/23 - Agencement de plusieurs lasers non prévu dans les groupes , p. ex. agencement en série de deux milieux actifs séparés
G02F 1/39 - Optique non linéaire pour la génération ou l'amplification paramétrique de la lumière, des infrarouges ou des ultraviolets
An optical parametric chirped-pulse amplifier includes first and second optical parametric amplifier stages that successively amplify a stretched signal beam. A pulsed laser provides a fundamental beam. The second amplifier stage is pumped by the full power of a second-harmonic beam that is generated from the fundamental beam. A residual fundamental beam is used to generate another second-harmonic beam that pumps the first amplifier stage.
A wavelength sensor for wavelength stabilization of a laser beam includes an etalon placed in the laser beam and tilted with respect to the laser beam. Reflected beams from the etalon form an interference pattern on a segmented photodetector having two detector segments. Output signals from the two detector segments are used to derive an error signal for a closed control loop to effect the wavelength stabilization.
H01S 5/0683 - Stabilisation des paramètres de sortie du laser en surveillant les paramètres optiques de sortie
G01J 9/02 - Mesure du déphasage des rayons lumineuxRecherche du degré de cohérenceMesure de la longueur d'onde des rayons lumineux par des méthodes interférométriques
A wavelength sensor for wavelength stabilization of a laser beam includes an etalon placed in the laser beam and tilted with respect to the laser beam. Reflected beams from the etalon form an interference pattern on a segmented photodetector having two detector segments. Output signals from the two detector segments are used to derive an error signal for a closed control loop to effect the wavelength stabilization.
H01S 3/13 - Stabilisation de paramètres de sortie de laser, p. ex. fréquence ou amplitude
H01S 5/065 - Accrochage de modesSuppression de modesSélection de modes
H01S 5/0687 - Stabilisation de la fréquence du laser
H01S 3/137 - Stabilisation de paramètres de sortie de laser, p. ex. fréquence ou amplitude par commande de dispositifs placés dans la cavité pour la stabilisation de la fréquence
H01S 3/139 - Stabilisation de paramètres de sortie de laser, p. ex. fréquence ou amplitude par commande de la position relative ou des propriétés réfléchissantes des réflecteurs de la cavité
H01S 3/08 - Structure ou forme des résonateurs optiques ou de leurs composants
A fiber laser producing a beam of ultrashort laser pulses at a repetition rate greater than 200 MHz includes a linear fiber resonator and a fiber branch. Ultrashort laser pulses are generated by passive mode-locking and circulate within the linear fiber resonator. Each circulating laser pulse is split into a portion that continues propagating in the linear fiber resonator and a complementary portion that propagates through the fiber branch and is then returned to the linear fiber resonator. The optical length of the linear fiber resonator is an integer multiple of the optical length of the fiber branch. The repetition rate of the ultrashort laser pulses is the reciprocal of the propagation time of the laser pulses through the fiber branch.
H01S 3/08 - Structure ou forme des résonateurs optiques ou de leurs composants
H01S 3/10 - Commande de l'intensité, de la fréquence, de la phase, de la polarisation ou de la direction du rayonnement, p. ex. commutation, ouverture de porte, modulation ou démodulation
H01S 3/1055 - Commande de l'intensité, de la fréquence, de la phase, de la polarisation ou de la direction du rayonnement, p. ex. commutation, ouverture de porte, modulation ou démodulation par commande de la position relative ou des propriétés réfléchissantes des réflecteurs de la cavité un des réflecteurs étant constitué par un réseau de diffraction
An apparatus for generating visible light including a laser source emitting a fundamental beam, an optically nonlinear crystal, and a seed source emitting a seed beam. The optically nonlinear crystal receives the fundamental beam. The fundamental beam propagates in the nonlinear crystal at a first phase-matching angle for second-harmonic generation. A portion of the fundamental beam is converted into a second-harmonic beam that propagates in the nonlinear crystal at the first phase-matching angle for optical parametric generation. The seed source emits a seed beam having a wavelength longer than the second-harmonic beam. The seed beam is directed into the nonlinear crystal and propagates at a second phase-matching angle for the optical parametric amplification. A portion of the second-harmonic beam is converted into a signal beam at the seed wavelength and an idler beam by the optical parametric amplification.
An apparatus includes a beam source, beam forming optics, a first focusing lens having a focal length, a second focusing lens having a focal length similar to the focal length of the first lens, and a lens translator configured to move the second lens transversely relative to the beam forming optics and to the first lens, and thereby move the elongated focus transversely. In some embodiments, the beam forming optics are positioned between the beam source and the first focusing lens, the first focusing lens is positioned between the beam forming optics and the second focusing lens, and the beam forming optics, the first focusing lens, and the second focusing lens are arranged to receive a beam of laser radiation from the beam source and to form the beam into an elongated focus.
An apparatus includes a beam source, beam forming optics, a first focusing lens having a focal length, a second focusing lens having a focal length similar to the focal length of the first lens, and a lens translator configured to move the second lens transversely relative to the beam forming optics and to the first lens, and thereby move the elongated focus transversely. In some embodiments, the beam forming optics are positioned between the beam source and the first focusing lens, the first focusing lens is positioned between the beam forming optics and the second focusing lens, and the beam forming optics, the first focusing lens, and the second focusing lens are arranged to receive a beam of laser radiation from the beam source and to form the beam into an elongated focus.
G02B 26/08 - Dispositifs ou dispositions optiques pour la commande de la lumière utilisant des éléments optiques mobiles ou déformables pour commander la direction de la lumière
G02B 27/09 - Mise en forme du faisceau, p. ex. changement de la section transversale, non prévue ailleurs
B23K 26/06 - Mise en forme du faisceau laser, p. ex. à l’aide de masques ou de foyers multiples
B23K 26/073 - Détermination de la configuration du spot laser
A method for laser keyhole welding of metal alloys is disclosed. The method independently adjusts power in a focused center beam and power in a concentric focused annular beam. At the termination of a weld, the power in the center beam is initially ramped up and then ramped down, while the power in the annular beam is ramped down. Increasing the power in the center beam enables a controlled and prolonged contraction of the keyhole and melt pool, thereby preventing undesirable cracking.
A method for laser keyhole welding of metal alloys is disclosed. The method independently adjusts power in a focused center beam and power in a concentric focused annular beam. At the termination of a weld, the power in the center beam is initially ramped up and then ramped down, while the power in the annular beam is ramped down. Increasing the power in the center beam enables a controlled and prolonged contraction of the keyhole and melt pool, thereby preventing undesirable cracking.
An apparatus for cutting brittle material comprises an aspheric focusing lens, an aperture, and a laser-source generating a beam of pulsed laser-radiation. The aspheric lens and the aperture form the beam of pulsed laser-radiation into an elongated focus having a uniform intensity distribution along the optical axis of the aspheric focusing lens. The elongated focus extends through the full thickness of a workpiece made of a brittle material. The workpiece is cut by tracing the optical axis along a cutting line. Each pulse or burst of pulsed laser-radiation creates an extended defect through the full thickness of the workpiece.
B23K 26/06 - Mise en forme du faisceau laser, p. ex. à l’aide de masques ou de foyers multiples
B23K 26/073 - Détermination de la configuration du spot laser
B23K 26/00 - Travail par rayon laser, p. ex. soudage, découpage ou perçage
B23K 26/53 - Travail par transmission du faisceau laser à travers ou dans la pièce à travailler pour modifier ou reformer le matériau dans la pièce à travailler, p. ex. pour faire des fissures d'amorce de rupture
B23K 26/066 - Mise en forme du faisceau laser, p. ex. à l’aide de masques ou de foyers multiples au moyen d'éléments optiques, p. ex. lentilles, miroirs ou prismes par utilisation de masques
B23K 26/0622 - Mise en forme du faisceau laser, p. ex. à l’aide de masques ou de foyers multiples par commande directe du faisceau laser par impulsions de mise en forme
B23K 26/08 - Dispositifs comportant un mouvement relatif entre le faisceau laser et la pièce
B23K 26/402 - Enlèvement de matière en tenant compte des propriétés du matériau à enlever en faisant intervenir des matériaux non métalliques, p. ex. des isolants
C03B 33/02 - Découpe ou fendage des feuilles de verreDispositifs ou machines à cet effet
G02B 27/09 - Mise en forme du faisceau, p. ex. changement de la section transversale, non prévue ailleurs
Laser annealing apparatus includes a plurality of frequency- tripled solid-state lasers, each delivering an output beam of radiation at a wavelength between 340 nm and 360 nm. Each output beam has a beam-quality factor (M2) greater of than 50 in one transverse axis and greater than 20 in another transverse axis. The output beams are combined and formed into a line-beam that is projected on a substrate being annealed. Each output beam contributes to the length of the line-beam.
H01S 3/11 - Blocage de modesCommutation-QAutres techniques d'impulsions géantes, p. ex. vidange de cavité
H01S 3/00 - Lasers, c.-à-d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet
40.
Diode-pumped solid-state laser apparatus for laser annealing
2) greater of than 50 in one transverse axis and greater than 20 in another transverse axis. The output beams are combined and formed into a line-beam that is projected on a substrate being annealed. Each output beam contributes to the length of the line-beam.
H01S 3/109 - Multiplication de la fréquence, p. ex. génération d'harmoniques
B23K 26/00 - Travail par rayon laser, p. ex. soudage, découpage ou perçage
B23K 26/0622 - Mise en forme du faisceau laser, p. ex. à l’aide de masques ou de foyers multiples par commande directe du faisceau laser par impulsions de mise en forme
B23K 26/064 - Mise en forme du faisceau laser, p. ex. à l’aide de masques ou de foyers multiples au moyen d'éléments optiques, p. ex. lentilles, miroirs ou prismes
B23K 26/354 - Travail par rayon laser, p. ex. soudage, découpage ou perçage pour le traitement de surface par fusion
H01S 3/08 - Structure ou forme des résonateurs optiques ou de leurs composants
H01S 3/094 - Procédés ou appareils pour l'excitation, p. ex. pompage utilisant le pompage optique par de la lumière cohérente
H01S 3/0941 - Procédés ou appareils pour l'excitation, p. ex. pompage utilisant le pompage optique par de la lumière cohérente produite par un laser à semi-conducteur, p. ex. par une diode laser
H01S 3/115 - Commutation-Q utilisant des dispositifs électro-optiques dans la cavité
H01S 3/00 - Lasers, c.-à-d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet
A carbon dioxide gas-discharge slab-laser is assembled in a laser-housing. The laser-housing is formed from a hollow extrusion. An interior surface of the extrusion provides a ground electrode of the laser. Another live electrode is located within the extrusion, electrically insulated from and parallel to the ground electrode, forming a discharge-gap of the slab-laser. The electrodes are spaced apart by parallel ceramic strips. Neither the extrusion, nor the live electrode, include fluid coolant channels. The laser-housing is cooled by fluid-cooled plates attached to the outside thereof.
H01S 3/041 - Dispositions pour la gestion thermique pour des lasers à gaz
H01S 3/038 - Électrodes, p. ex. forme, configuration ou composition particulières
H01S 3/03 - Détails de structure des tubes laser à décharge dans le gaz
H01S 3/223 - Lasers, c.-à-d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet caractérisés par le matériau utilisé comme milieu actif à gaz le gaz actif étant polyatomique, c.-à-d. contenant plusieurs atomes
H01S 3/04 - Dispositions pour la gestion thermique
A source of high-radiance broad-band incoherent light includes an optical waveguide, having a core made of phosphor granules embedded in a matrix of glass and a cladding. The core having a relatively high refractive index and the cladding having a relatively low refractive index. The phosphor granules and the glass matrix having about the same refractive index. Radiation from one or more diode-lasers is injected into one end of the waveguide to energize the phosphor granules, producing broad-band incoherent light, which is confined and guided to an opposite end of the waveguide as output light.
A laser-radiation sensor includes a copper substrate on which is grown an oriented polycrystalline buffer layer surmounted by an oriented polycrystalline sensor-element of an anisotropic transverse thermoelectric material. An absorber layer, thermally connected to the sensor-element, is heated by laser-radiation to be measured and communicates the heat to the sensor-element, causing a thermal gradient across the sensor-element. Spaced-apart electrodes in electrical contact with the sensor-element sense a voltage corresponding to the thermal gradient as a measure of the incident laser-radiation power.
G01J 1/42 - Photométrie, p. ex. posemètres photographiques en utilisant des détecteurs électriques de radiations
H01L 31/0368 - Dispositifs à semi-conducteurs sensibles aux rayons infrarouges, à la lumière, au rayonnement électromagnétique d'ondes plus courtes, ou au rayonnement corpusculaire, et spécialement adaptés, soit comme convertisseurs de l'énergie dudit rayonnement e; Procédés ou appareils spécialement adaptés à la fabrication ou au traitement de ces dispositifs ou de leurs parties constitutives; Leurs détails caractérisés par leurs corps semi-conducteurs caractérisés par leur structure cristalline ou par l'orientation particulière des plans cristallins comprenant des semi-conducteurs polycristallins
G01J 5/12 - Pyrométrie des radiations, p. ex. thermométrie infrarouge ou optique en utilisant des détecteurs électriques de radiations en utilisant des éléments thermoélectriques, p. ex. des thermocouples
An apparatus for generating visible light including a laser source emitting a fundamental beam, an optically nonlinear crystal, and a seed source emitting a seed beam. The optically nonlinear crystal receives the fundamental beam. The fundamental beam propagates in the nonlinear crystal at a first phase-matching angle for second-harmonic generation. A portion of the fundamental beam is converted into a second-harmonic beam that propagates in the nonlinear crystal at the first phase-matching angle for optical parametric generation. The seed source emits a seed beam having a wavelength longer than the second-harmonic beam. The seed beam is directed into the nonlinear crystal and propagates at a second phase-matching angle for the optical parametric amplification. A portion of the second-harmonic beam is converted into a signal beam at the seed wavelength and an idler beam by the optical parametric amplification.
A third-harmonic conversion arrangement includes a second-harmonic generating crystal and a third-harmonic generating crystal arranged in a polarization loop. The polarization loop, which includes a plurality of mirrors, a polarization-selective reflector, and a polarization rotator, causes plane-polarized fundamental-wavelength radiation being converted to make two passes through the crystals in orthogonally-opposed polarization orientations.
G02B 27/09 - Mise en forme du faisceau, p. ex. changement de la section transversale, non prévue ailleurs
H01S 3/00 - Lasers, c.-à-d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet
H01S 3/11 - Blocage de modesCommutation-QAutres techniques d'impulsions géantes, p. ex. vidange de cavité
46.
THIRD-HARMONIC GENERATING APPARATUS FOR LASER-RADIATION
A third-harmonic conversion arrangement includes a second-harmonic generating crystal and a third-harmonic generating crystal arranged in a polarization loop. The polarization loop causes plane-polarized fundamental-wavelength radiation being converted to make two passes through the crystals in orthogonally-opposed polarization orientations.
A laser master-oscillator power-amplifier (MOPA) is operated to provide successive bursts of ultrashort pulses. The pulse-bursts are selected by an optical modulator from a pulse train delivered by the master oscillator prior to amplification in the power amplifier. The optical modulator has a selectively variable transmission specified by an analog voltage signal having a stepped waveform. The voltage signal is delivered by a sequentially-switched parallel switch-array connected in parallel with a parallel DAC having multiple parallel DC voltage outputs corresponding to steps of the stepped waveform.
H01S 3/10 - Commande de l'intensité, de la fréquence, de la phase, de la polarisation ou de la direction du rayonnement, p. ex. commutation, ouverture de porte, modulation ou démodulation
H01S 3/00 - Lasers, c.-à-d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet
H01S 5/062 - Dispositions pour commander les paramètres de sortie du laser, p. ex. en agissant sur le milieu actif en faisant varier le potentiel des électrodes
A laser master-oscillator power-amplifier (MOPA) is operated to provide successive bursts of ultrashort pulses. The pulse-bursts are selected by an optical modulator from a pulse train delivered by the master oscillator prior to amplification in the power amplifier. The optical modulator has a selectively variable transmission specified by an analog voltage signal having a stepped waveform. The voltage signal is delivered by a sequentially-switched parallel switch-array connected in parallel with a parallel DAC having multiple parallel DC voltage outputs corresponding to steps of the stepped waveform.
H01S 3/106 - Commande de l'intensité, de la fréquence, de la phase, de la polarisation ou de la direction du rayonnement, p. ex. commutation, ouverture de porte, modulation ou démodulation par commande de dispositifs placés dans la cavité
H01S 5/065 - Accrochage de modesSuppression de modesSélection de modes
A carbon dioxide gas-discharge slab-laser is assembled in a laser-housing. The laser-housing is formed from a hollow extrusion. An interior surface of the extrusion provides a ground electrode of the laser. Another live electrode is located within the extrusion, electrically insulated from and parallel to the ground electrode, forming a discharge-gap of the slab-laser. The electrodes are spaced apart by parallel ceramic strips. Neither the extrusion, nor the live electrode, include any direct fluid-cooling means. The laser-housing is cooled by fluid-cooled plates attached to the outside thereof.
H01S 3/041 - Dispositions pour la gestion thermique pour des lasers à gaz
H01S 3/038 - Électrodes, p. ex. forme, configuration ou composition particulières
H01S 3/03 - Détails de structure des tubes laser à décharge dans le gaz
H01S 3/223 - Lasers, c.-à-d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet caractérisés par le matériau utilisé comme milieu actif à gaz le gaz actif étant polyatomique, c.-à-d. contenant plusieurs atomes
H01S 3/04 - Dispositions pour la gestion thermique
A carbon dioxide gas-discharge slab-laser is assembled in a laser-housing. The laser-housing is formed from a hollow extrusion. An interior surface of the extrusion provides a ground electrode of the laser. Another live electrode is located within the extrusion, electrically insulated from and parallel to the ground electrode, forming a discharge-gap of the slab-laser. The electrodes are spaced apart by parallel ceramic strips. Neither the extrusion, nor the live electrode, include any direct fluid-cooling means. The laser-housing is cooled by fluid-cooled plates attached to the outside thereof.
An aluminum covered with an anodically formed aluminum oxide layer is marked by repeated bursts of two or more individual laser pulses. The intensity of the individual pulses in the bursts is kept below a level experimentally determined to compromise the integrity of the aluminum oxide layer. The collective fluence in a burst is sufficient to mark the aluminum, but not sufficient to compromise the integrity of the oxide layer.
B23K 26/06 - Mise en forme du faisceau laser, p. ex. à l’aide de masques ou de foyers multiples
B23K 26/0622 - Mise en forme du faisceau laser, p. ex. à l’aide de masques ou de foyers multiples par commande directe du faisceau laser par impulsions de mise en forme
B23K 26/356 - Travail par rayon laser, p. ex. soudage, découpage ou perçage pour le traitement de surface par traitement par choc
B23K 26/359 - Travail par rayon laser, p. ex. soudage, découpage ou perçage pour le traitement de surface en formant une ligne ou un motif linéaire, p. ex. une ligne en pointillés d'amorce de rupture
An anamorphic three-element objective lens projects a plurality of beams of different wavelengths and different diameters into an elongated focal spot in a working- plane. In one transverse direction of the lens, the beams are tightly focused with equal beam-waist widths in the working-plane, defining a height of the focal spot. In another transverse direction, the different beams are focused progressively beyond the working- plane such that the beams have a common beam-width in the working-plane, thereby defining a width of the focal spot.
G02B 9/16 - Objectifs optiques caractérisés à la fois par le nombre de leurs composants et la façon dont ceux-ci sont disposés selon leur signe, c.-à-d. + ou — ayant uniquement trois composants disposés + — + tous trois étant simples
G02B 13/00 - Objectifs optiques spécialement conçus pour les emplois spécifiés ci-dessous
An anamorphic three-element objective lens projects a plurality of beams of different wavelengths and different diameters into an elongated focal spot in a working-plane. In one transverse direction of the lens, the beams are tightly focused with equal beam-waist widths in the working-plane, defining a height of the focal spot. In another transverse direction, the different beams are focused progressively beyond the working-plane such that the beams have a common beam-width in the working-plane, thereby defining a width of the focal spot.
G02B 27/14 - Systèmes divisant ou combinant des faisceaux fonctionnant uniquement par réflexion
G02B 13/14 - Objectifs optiques spécialement conçus pour les emplois spécifiés ci-dessous à utiliser avec des radiations infrarouges ou ultraviolettes
G02B 27/18 - Systèmes ou appareils optiques non prévus dans aucun des groupes , pour projection optique, p. ex. combinaison de miroir, de condensateur et d'objectif
G02B 23/04 - Télescopes ou lunettes d'approche, p. ex. jumellesPériscopesInstruments pour voir à l'intérieur de corps creuxViseursPointage optique ou appareils de visée comprenant des prismes ou des miroirs afin de partager ou de combiner des faisceaux lumineux, p. ex. munis d'oculaires pour plus d'un observateur
G02B 27/10 - Systèmes divisant ou combinant des faisceaux
G02B 9/16 - Objectifs optiques caractérisés à la fois par le nombre de leurs composants et la façon dont ceux-ci sont disposés selon leur signe, c.-à-d. + ou — ayant uniquement trois composants disposés + — + tous trois étant simples
G02B 27/09 - Mise en forme du faisceau, p. ex. changement de la section transversale, non prévue ailleurs
G01N 15/14 - Techniques de recherche optique, p. ex. cytométrie en flux
A61B 5/00 - Mesure servant à établir un diagnostic Identification des individus
G01N 15/10 - Recherche de particules individuelles
Apparatus for distance gauging in laser material processing includes a source of laser-radiation, an electrically-conductive focusing assembly, a constant-current source, and a voltmeter. The focusing assembly focuses laser-radiation towards an electrically conductive workpiece being processed. The focusing assembly and the workpiece form a capacitive sensor. The constant current source provides a constant electrical current to the focusing assembly for a constant time. The focusing assembly and the workpiece are separated by a distance that is proportional to a change in voltage measured on the focusing assembly during the constant time.
B23K 26/04 - Alignement, pointage ou focalisation automatique du faisceau laser, p. ex. en utilisant la lumière rétrodiffusée
G01B 7/02 - Dispositions pour la mesure caractérisées par l'utilisation de techniques électriques ou magnétiques pour mesurer la longueur, la largeur ou l'épaisseur
Apparatus for distance gauging in laser material processing includes a source of laser-radiation, an electrically-conductive focusing assembly, a constant-current source, and a voltmeter. The focusing assembly focuses laser-radiation towards an electrically conductive workpiece being processed. The focusing assembly and the workpiece form a capacitive sensor. The constant current source provides a constant electrical current to the focusing assembly for a constant time. The focusing assembly and the workpiece are separated by a distance that is proportional to a change in voltage measured on the focusing assembly during the constant time.
B23K 26/04 - Alignement, pointage ou focalisation automatique du faisceau laser, p. ex. en utilisant la lumière rétrodiffusée
G01B 7/14 - Dispositions pour la mesure caractérisées par l'utilisation de techniques électriques ou magnétiques pour mesurer la distance ou la marge entre des objets ou des ouvertures espacés
B23K 26/38 - Enlèvement de matière par perçage ou découpage
56.
HIGH POWER SUB-400 FEMTOSECOND MOPA WITH SOLID-STATE POWER AMPLIFIER
Laser-apparatus includes a fiber-MOPA arranged to deliver amplified seed optical pulses having a wavelength of about 1043 nanometers to a multi-pass ytterbium-doped yttrium aluminum garnet solid-state optical amplifier for further amplification.
H01S 3/00 - Lasers, c.-à-d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet
H01S 3/23 - Agencement de plusieurs lasers non prévu dans les groupes , p. ex. agencement en série de deux milieux actifs séparés
H01S 3/0941 - Procédés ou appareils pour l'excitation, p. ex. pompage utilisant le pompage optique par de la lumière cohérente produite par un laser à semi-conducteur, p. ex. par une diode laser
H01S 3/10 - Commande de l'intensité, de la fréquence, de la phase, de la polarisation ou de la direction du rayonnement, p. ex. commutation, ouverture de porte, modulation ou démodulation
57.
High power sub-400 femtosecond MOPA with solid-state power amplifier
Laser-apparatus includes a fiber-MOPA arranged to deliver amplified seed optical pulses having a wavelength of about 1043 nanometers to a multi-pass ytterbium-doped yttrium aluminum garnet solid-state optical amplifier for further amplification.
A fiber-laser includes a gain-fiber in a laser-resonator. A polarizer is located in the laser-resonator at an end thereof, causing the output of the fiber-laser to be linearly polarized. A wavelength-selective element is also included in the laser-resonator for selecting an output wavelength of the fiber-laser from within a gain-bandwidth of the gain-fiber.
A fiber-laser includes a gain-fiber in a laser-resonator. A polarizer is located in the laser-resonator at an end thereof, causing the output of the fiber-laser to be linearly polarized. A wavelength-selective element is also included in the laser-resonator for selecting an output wavelength of the fiber-laser from within a gain-bandwidth of the gain-fiber.
H01S 3/094 - Procédés ou appareils pour l'excitation, p. ex. pompage utilisant le pompage optique par de la lumière cohérente
H01S 3/00 - Lasers, c.-à-d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet
H01S 3/23 - Agencement de plusieurs lasers non prévu dans les groupes , p. ex. agencement en série de deux milieux actifs séparés
An intra-cavity frequency-tripled OPS laser has a laser-resonator including two optically nonlinear crystals arranged for type-I frequency conversion. One of the crystals generates horizontally polarized second-harmonic radiation from vertically plane-polarized fundamental-wavelength radiation circulating in the laser-resonator. A birefringent filter is located between the optically nonlinear crystals. The birefringent filter selects the fundamental-wavelength, establishes the vertical polarization-orientation, and selectively rotates the polarization-orientation of the second-harmonic radiation from horizontal to vertical. The vertically polarized fundamental and second-harmonic radiations are type-I sum-frequency mixed by the other optically nonlinear crystal.
H01S 3/10 - Commande de l'intensité, de la fréquence, de la phase, de la polarisation ou de la direction du rayonnement, p. ex. commutation, ouverture de porte, modulation ou démodulation
H01S 3/109 - Multiplication de la fréquence, p. ex. génération d'harmoniques
H01S 3/081 - Structure ou forme des résonateurs optiques ou de leurs composants comprenant trois réflecteurs ou plus
H01S 3/13 - Stabilisation de paramètres de sortie de laser, p. ex. fréquence ou amplitude
H01S 3/08 - Structure ou forme des résonateurs optiques ou de leurs composants
H01S 3/0941 - Procédés ou appareils pour l'excitation, p. ex. pompage utilisant le pompage optique par de la lumière cohérente produite par un laser à semi-conducteur, p. ex. par une diode laser
61.
LASER APPARATUS FOR CUTTING BRITTLE MATERIAL WITH ASPHERIC FOCUSING MEANS AND A BEAM EXPANDER
An apparatus for cutting brittle material comprises beam expander (18) in combination with an aspheric focusing lens (22), an aperture (CA), and a laser-source (12) generating a beam (14) of pulsed laser-radiation. The aspheric lens (22) and the aperture (CA) form the beam (24) of pulsed laser-radiation into an elongated focus having a uniform intensity distribution along the optical axis of the aspheric focusing lens (22). The elongated focus extends through the full thickness of a workpiece (38) made of a brittle material. The workpiece (38) is cut by tracing the optical axis along a cutting line. Each pulse or burst of pulsed laser-radiation creates an extended defect through the full thickness of the workpiece (38).
B23K 26/00 - Travail par rayon laser, p. ex. soudage, découpage ou perçage
B23K 26/06 - Mise en forme du faisceau laser, p. ex. à l’aide de masques ou de foyers multiples
B23K 26/073 - Détermination de la configuration du spot laser
B23K 26/08 - Dispositifs comportant un mouvement relatif entre le faisceau laser et la pièce
C03B 33/09 - Sectionnement du verre refroidi par chocs thermiques
B23K 26/53 - Travail par transmission du faisceau laser à travers ou dans la pièce à travailler pour modifier ou reformer le matériau dans la pièce à travailler, p. ex. pour faire des fissures d'amorce de rupture
B23K 26/0622 - Mise en forme du faisceau laser, p. ex. à l’aide de masques ou de foyers multiples par commande directe du faisceau laser par impulsions de mise en forme
B23K 26/066 - Mise en forme du faisceau laser, p. ex. à l’aide de masques ou de foyers multiples au moyen d'éléments optiques, p. ex. lentilles, miroirs ou prismes par utilisation de masques
B23K 103/00 - Matières à braser, souder ou découper
An apparatus for cutting brittle material comprises an aspheric focusing lens, an aperture, and a laser-source generating a beam of pulsed laser-radiation. The aspheric lens and the aperture form the beam of pulsed laser-radiation into an elongated focus having a uniform intensity distribution along the optical axis of the aspheric focusing lens. The elongated focus extends through the full thickness of a workpiece made of a brittle material. The workpiece is cut by tracing the optical axis along a cutting line. Each pulse or burst of pulsed laser-radiation creates an extended defect through the full thickness of the workpiece.
B23K 26/06 - Mise en forme du faisceau laser, p. ex. à l’aide de masques ou de foyers multiples
B23K 26/073 - Détermination de la configuration du spot laser
B23K 26/00 - Travail par rayon laser, p. ex. soudage, découpage ou perçage
B23K 26/53 - Travail par transmission du faisceau laser à travers ou dans la pièce à travailler pour modifier ou reformer le matériau dans la pièce à travailler, p. ex. pour faire des fissures d'amorce de rupture
B23K 26/066 - Mise en forme du faisceau laser, p. ex. à l’aide de masques ou de foyers multiples au moyen d'éléments optiques, p. ex. lentilles, miroirs ou prismes par utilisation de masques
B23K 26/0622 - Mise en forme du faisceau laser, p. ex. à l’aide de masques ou de foyers multiples par commande directe du faisceau laser par impulsions de mise en forme
B23K 26/08 - Dispositifs comportant un mouvement relatif entre le faisceau laser et la pièce
B23K 26/402 - Enlèvement de matière en tenant compte des propriétés du matériau à enlever en faisant intervenir des matériaux non métalliques, p. ex. des isolants
C03B 33/02 - Découpe ou fendage des feuilles de verreDispositifs ou machines à cet effet
G02B 27/09 - Mise en forme du faisceau, p. ex. changement de la section transversale, non prévue ailleurs
A mirror is used to form a beam of laser-radiation having a uniform intensity distribution from a beam of laser-radiation having a non-uniform intensity distribution. The mirror has a reflective surface that has a compound shape, which is two inclined surfaces joined by a rounded apex. The compound-mirror is achromatic and can form a uniform intensity distribution from a polychromatic beam of laser-radiation. The uniform intensity distribution may be an isotropic distribution or a flat-top distribution in a plane. The non-uniform intensity distribution may be a Gaussian distribution from a laser source.
A mirror is used to form a beam of laser-radiation having a uniform intensity distribution from a beam of laser-radiation having a non-uniform intensity distribution. The mirror has a reflective surface that has a compound shape, which is two inclined surfaces joined by a rounded apex. The compound-mirror is achromatic and can form a uniform intensity distribution from a polychromatic beam of laser-radiation. The uniform intensity distribution may be an isotropic distribution or a flat-top distribution in a plane. The non-uniform intensity distribution may be a Gaussian distribution from a laser source.
A laser-radiation detector is formed from a plurality of layers supported on a substrate. The plurality of layers includes a reflective metal layer and an oriented polycrystalline sensor-layer positioned between the metal layer and the substrate.
G01J 5/06 - Dispositions pour éliminer les effets des radiations perturbatricesDispositions pour compenser les changements de la sensibilité
G01J 5/12 - Pyrométrie des radiations, p. ex. thermométrie infrarouge ou optique en utilisant des détecteurs électriques de radiations en utilisant des éléments thermoélectriques, p. ex. des thermocouples
A method of delivering a beam of laser-radiation to a workpiece for processing the workpiece comprises transmitting the beam twice through an inactive acousto-optic modulator (AOM) crystal in opposite zero-order directions of the AOM at separate locations on the AOM crystal, before delivering the beam to the workpiece. When laser-radiation is to be blocked from reaching the workpiece, the AOM is activated.
G02F 1/33 - Dispositifs de déflexion acousto-optique
B23K 26/082 - Systèmes de balayage, c.-à-d. des dispositifs comportant un mouvement relatif entre le faisceau laser et la tête du laser
B23K 26/06 - Mise en forme du faisceau laser, p. ex. à l’aide de masques ou de foyers multiples
B23K 26/02 - Mise en place ou surveillance de la pièce à travailler, p. ex. par rapport au point d'impactAlignement, pointage ou focalisation du faisceau laser
A method of delivering a beam of laser-radiation to a workpiece for processing the workpiece comprises transmitting the beam twice through an acousto-optic modulator (AOM) crystal in opposite zero-order directions of the AOM at separate locations on the AOM crystal, before delivering the beam to the workpiece.
B23K 26/02 - Mise en place ou surveillance de la pièce à travailler, p. ex. par rapport au point d'impactAlignement, pointage ou focalisation du faisceau laser
G02F 1/11 - Dispositifs ou dispositions pour la commande de l'intensité, de la couleur, de la phase, de la polarisation ou de la direction de la lumière arrivant d'une source lumineuse indépendante, p. ex. commutation, ouverture de porte ou modulationOptique non linéaire pour la commande de l'intensité, de la phase, de la polarisation ou de la couleur basés sur des éléments acousto-optiques, p. ex. en utilisant la diffraction variable par des ondes sonores ou des vibrations mécaniques analogues
68.
APPARATUS FOR GENERATING A LINE-BEAM FROM A DIODE-LASER ARRAY
An apparatus for generating a line beam (26) includes a diode laser bar (20), a linear microlens array (34) and a plurality of lenses (30, 32, 36, 38) spaced apart and arranged along an optical axis. The linear microlens array (34) and the lenses (30, 32, 36, 38) shape laser radiation emitted by the diode laser bar (20) to form a uniform line beam (26) in an illumination plane (28). The lenses (30, 32, 36, 38) project a far-field image of the diode laser bar (20) onto an image plane (62) proximate to the illumination plane (28). The diode laser bar (20) is rotated from parallel alignment with the linear microlens array (34) for providing uniform line beam illumination over a range of locations along the optical axis.
In a flow cytometer, an objective lens (20) focuses in a common plane (P) an input laser-beam having four different wavelengths. The objective (20) consists of three single-lenses (CL1, CL2, FFL), the two first ones (CL1, CL2) being cylindrical for shaping and reducing the size of the input laser-beam, the third one (FFL) being spherical to focus the reduced-size laser-beam in the common plane (P).
G02B 9/16 - Objectifs optiques caractérisés à la fois par le nombre de leurs composants et la façon dont ceux-ci sont disposés selon leur signe, c.-à-d. + ou — ayant uniquement trois composants disposés + — + tous trois étant simples
G02B 13/00 - Objectifs optiques spécialement conçus pour les emplois spécifiés ci-dessous
G02B 27/09 - Mise en forme du faisceau, p. ex. changement de la section transversale, non prévue ailleurs
G01N 15/14 - Techniques de recherche optique, p. ex. cytométrie en flux
A61B 18/20 - Instruments, dispositifs ou procédés chirurgicaux pour transférer des formes non mécaniques d'énergie vers le corps ou à partir de celui-ci par application de radiations électromagnétiques, p. ex. de micro-ondes en utilisant des lasers
A housing for an optically pumped semiconductor (OPS) laser resonator is terminated at one end thereof by an OPS-chip. The laser resonator is assembled on a platform with the OPS-chip at one end of the platform. The platform is fixedly attached to a baseplate at the OPS-chip end of the platform. The remainder of the platform extends over the baseplate with a gap between the platform and the baseplate. A pump-laser is mounted directly on the baseplate and delivers pump radiation to the OPS-chip.
A housing for an optically pumped semiconductor (OPS) laser resonator is terminated at one end thereof by an OPS-chip. The laser resonator is assembled on a platform with the OPS-chip at one end of the platform. The platform is fixedly attached to a baseplate at the OPS-chip end of the platform. The remainder of the platform extends over the baseplate with a gap between the platform and the baseplate. A pump-laser is mounted directly on the baseplate and delivers pump radiation to the OPS-chip.
In a flow cytometer, an objective lens for focusing an input laser-radiation beam including at least four different laser-radiation wavelengths in a common plane includes only three singlet lens-elements. Two of the elements are cylindrical elements arranged as a cylindrical telescope for shaping and reducing the size of the input laser-beam. The third element is a spherical element arranged to focus the reduced size beam in the common plane. In one example, all three elements are made from the same optical material.
G02B 13/18 - Objectifs optiques spécialement conçus pour les emplois spécifiés ci-dessous avec des lentilles ayant une ou plusieurs surfaces non sphériques, p. ex. pour réduire l'aberration géométrique
G01N 15/14 - Techniques de recherche optique, p. ex. cytométrie en flux
G02B 9/16 - Objectifs optiques caractérisés à la fois par le nombre de leurs composants et la façon dont ceux-ci sont disposés selon leur signe, c.-à-d. + ou — ayant uniquement trois composants disposés + — + tous trois étant simples
G02B 27/09 - Mise en forme du faisceau, p. ex. changement de la section transversale, non prévue ailleurs
G02B 27/10 - Systèmes divisant ou combinant des faisceaux
G02B 27/14 - Systèmes divisant ou combinant des faisceaux fonctionnant uniquement par réflexion
G02B 13/00 - Objectifs optiques spécialement conçus pour les emplois spécifiés ci-dessous
A61B 5/00 - Mesure servant à établir un diagnostic Identification des individus
73.
Apparatus for generating a line-beam from a diode-laser array
Apparatus for generating a line-beam includes a diode-laser bar, a linear micro-lens array, and a plurality of lenses spaced apart and arranged along an optical axis. The linear micro-lens array and the lenses shape laser-radiation emitted by the diode-laser bar to form a uniform line-beam in an illumination plane. The lenses project a far-field image of the diode-laser bar onto an image plane proximate to the illumination plane. The diode-laser bar is rotated from parallel alignment with the linear micro-lens array for providing uniform line-beam illumination over a range of locations along the optical axis.
H01S 3/08 - Structure ou forme des résonateurs optiques ou de leurs composants
G02B 27/20 - Systèmes ou appareils optiques non prévus dans aucun des groupes , pour projection optique, p. ex. combinaison de miroir, de condensateur et d'objectif pour donner une image d'objets minuscules, p. ex. indicateur lumineux
G02B 27/09 - Mise en forme du faisceau, p. ex. changement de la section transversale, non prévue ailleurs
A modular solid-state laser (10) comprises a fiber coupled diode-laser pump module (20) and a laser-enclosure (50). The diode-laser pump module comprises a connector assembly 26 including a collimating lens (32) and produces a collimated beam (28B) of laser-radiation for pumping a gain-element (56) within the laser-enclosure. The beam of pump laser-radiation is focused into the gain-element by optics (54) located within the laser-enclosure. The diode-laser pump module can be replaced or exchanged without realigning optics located within the laser-enclosure by detaching and replacing the connector assembly from the laser enclosure.
H01S 3/094 - Procédés ou appareils pour l'excitation, p. ex. pompage utilisant le pompage optique par de la lumière cohérente
H01S 3/0941 - Procédés ou appareils pour l'excitation, p. ex. pompage utilisant le pompage optique par de la lumière cohérente produite par un laser à semi-conducteur, p. ex. par une diode laser
A diode-laser bar assembly comprises a diode-laser bar mounted onto a cooler by way of an electrically-insulating submount. A laminated connector is provided that includes two electrically-conducting sheets bonded to opposite sides on an electrically- insulating sheet. An electrical insulator is located between the laminated connector and the cooler. One electrically-conducting sheet is connected to n-side of the diode-laser bar and the other electrically-conducting sheet is connected to p-side of the diode-laser bar.
A diode-laser bar assembly comprises a diode-laser bar mounted onto a cooler by way of an electrically-insulating submount. A laminated connector is provided that includes two electrically-conducting sheets bonded to opposite sides on an electrically-insulating sheet. An electrical insulator is located between the laminated connector and the cooler. One electrically-conducting sheet is connected to n-side of the diode-laser bar and the other electrically-conducting sheet is connected to p-side of the diode-laser bar.
H01L 23/44 - Dispositions pour le refroidissement, le chauffage, la ventilation ou la compensation de la température le dispositif complet étant totalement immergé dans un fluide autre que l'air
H01S 5/024 - Dispositions pour la gestion thermique
H01S 5/40 - Agencement de plusieurs lasers à semi-conducteurs, non prévu dans les groupes
A method for cutting a transparent brittle material using pulsed laser-radiation is disclosed. A beam of pulsed laser-radiation having an optical-axis is focused in the material by a variable-focus lens or mirror. The focus is translated along the optical-axis while the material is moved with respect to the beam to create an array of defects along a cutting path.
C03B 33/02 - Découpe ou fendage des feuilles de verreDispositifs ou machines à cet effet
B23K 26/53 - Travail par transmission du faisceau laser à travers ou dans la pièce à travailler pour modifier ou reformer le matériau dans la pièce à travailler, p. ex. pour faire des fissures d'amorce de rupture
B23K 26/0622 - Mise en forme du faisceau laser, p. ex. à l’aide de masques ou de foyers multiples par commande directe du faisceau laser par impulsions de mise en forme
B23K 103/00 - Matières à braser, souder ou découper
A cooler for diode-laser bars comprises a machined base including a water-input plenum and a water-output plenum, and a top plate on which the diode-laser bars can be mounted. A stack of three etched plates is provided between the base and first plate. The stack of etched plates is configured to provide a five longitudinally spaced-apart rows of eight laterally spaced-apart cooling-channels connected to the water-input and water-output plenums. Water flows in the cooling-channels and in thermal contact with the first plate.
H01S 5/024 - Dispositions pour la gestion thermique
H01L 23/473 - Dispositions pour le refroidissement, le chauffage, la ventilation ou la compensation de la température impliquant le transfert de chaleur par des fluides en circulation par une circulation de liquides
H01S 5/40 - Agencement de plusieurs lasers à semi-conducteurs, non prévu dans les groupes
A cooler for diode-laser bars comprises a machined base including a water- input plenum and a water-output plenum, and a top plate on which the diode-laser bars can be mounted. A stack of three etched plates is provided between the base and first plate. The stack of etched plates is configured to provide a five longitudinally spaced- apart rows of eight laterally spaced-apart cooling-channels connected to the water-input and water-output plenums. Water flows in the cooling-channels and in thermal contact with the first plate.
Optical output beams from a vertical stack of diode-laser bars are focused by a simple focusing lens on an optical axis of the lens. The optical output beams from outlying diode-laser bars in the vertical stack are tilted with respect to the optical axis of the focusing lens such that optical output from the whole vertical stack is brought to a common focus location on the optical axis of the focusing lens.
Optical output beams from a vertical stack of diode-laser bars are focused by a simple focusing lens on an optical axis of the lens. The optical output beams from outlying diode-laser bars in the vertical stack are tilted with respect to the optical axis of the focusing lens such that optical output from the whole vertical stack is brought to a common focus location on the optical axis of the focusing lens.
A mode- stripper for an optical fiber includes a water-cooled enclosure. A portion of an optical fiber to be mode-stripped is modified in a way which allows radiation to leak from cladding of the fiber. The optical fiber extends through the enclosure from a proximal end thereof to a distal end thereof, with the modified portion of the fiber within the enclosure. The fiber is fixedly held in the enclosure at the proximal end thereof and held at the distal end of the enclosure by an elastomeric diaphragm.
A diode-laser assembly having an electrically isolated diode-laser bar on a cooled base-element is disclosed. The diode-laser bar is electrically isolated from the base-element and electrically isolated from any coolant water, thereby eliminating the need for de-ionized water and mitigating corrosion due to galvanic action. Multiple such diode-laser assemblies are stackable, with small bar-to-bar pitch, enabling a high-current and high-brightness diode-laser stack.
A diode-laser assembly having an electrically isolated diode-laser bar (20) on a cooled base-element (80) is disclosed. The diode-laser bar is electrically isolated from the base-element and electrically isolated from any coolant water, thereby eliminating the need for de-ionized water and mitigating corrosion due to galvanic action. Multiple such diode-laser assemblies are stackable, with small bar-to-bar pitch, enabling a high-current and high-brightness diode-laser stack.The laser diode bar (20) may be attached to an insulating submount (70) by a hard solder (110). The submount (70) may be attached to a base (80) by a soft solder (120). The upper surface of the submount (70) may be plated with copper (90) to allow wire bonding (150) of the p-side (40) of the laser diode bar to an electrical p-contact (130).. The n-side (30) of the laser diode bar is wire bonded (190A,190B) to electrical n-contacts (170A,170B).
Laser-drilling apparatus includes a gas-discharge for laser emitting laser-radiation pulses, and two acousto-optic modulators (AOMs). The laser radiation pulses are characterized as having two temporal central portions between temporal leading and trailing edge portions. The AOMs are arranged to spatially separate the central temporal portions of the pulses from each other and from the leading and trailing edge portions of the pulses.
G02F 1/33 - Dispositifs de déflexion acousto-optique
B23K 26/382 - Enlèvement de matière par perçage ou découpage par perçage
H01S 3/00 - Lasers, c.-à-d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet
H01S 3/223 - Lasers, c.-à-d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet caractérisés par le matériau utilisé comme milieu actif à gaz le gaz actif étant polyatomique, c.-à-d. contenant plusieurs atomes
H05K 3/00 - Appareils ou procédés pour la fabrication de circuits imprimés
A45D 19/00 - Dispositifs pour laver les cheveux ou le cuir cheveluDispositifs similaires pour teindre les cheveux
A45D 24/22 - Peignes avec dispositifs de distribution de liquides, de pâtes ou de poudres
B23K 26/067 - Division du faisceau en faisceaux multiples, p. ex. foyers multiples
B23K 26/064 - Mise en forme du faisceau laser, p. ex. à l’aide de masques ou de foyers multiples au moyen d'éléments optiques, p. ex. lentilles, miroirs ou prismes
B23K 26/0622 - Mise en forme du faisceau laser, p. ex. à l’aide de masques ou de foyers multiples par commande directe du faisceau laser par impulsions de mise en forme
Laser-drilling apparatus includes a gas-discharge for laser emitting laser- radiation pulses, and two acousto-optic modulators (AOMs). The laser radiation pulses are characterized as having two temporal central portions between temporal leading and trailing edge portions. The AOMs are arranged to spatially separate the central temporal portions of the pulses from each other and from the leading and trailing edge portions of the pulses.
B23K 26/0622 - Mise en forme du faisceau laser, p. ex. à l’aide de masques ou de foyers multiples par commande directe du faisceau laser par impulsions de mise en forme
B23K 26/064 - Mise en forme du faisceau laser, p. ex. à l’aide de masques ou de foyers multiples au moyen d'éléments optiques, p. ex. lentilles, miroirs ou prismes
B23K 26/067 - Division du faisceau en faisceaux multiples, p. ex. foyers multiples
G02F 1/11 - Dispositifs ou dispositions pour la commande de l'intensité, de la couleur, de la phase, de la polarisation ou de la direction de la lumière arrivant d'une source lumineuse indépendante, p. ex. commutation, ouverture de porte ou modulationOptique non linéaire pour la commande de l'intensité, de la phase, de la polarisation ou de la couleur basés sur des éléments acousto-optiques, p. ex. en utilisant la diffraction variable par des ondes sonores ou des vibrations mécaniques analogues
An apparatus for generating and amplifying laser beams at approximately 1 micrometer wavelength is disclosed. The apparatus includes an ytterbium-doped gain-crystal pumped by an ytterbium fiber-laser. The fiber-laser enables a pump wavelength to be selected that minimizes heating of the gain-crystal. The apparatus can be configured for generating and amplifying ultra- fast pulses, utilizing the gain-bandwidth of ytterbium-doped gain-crystals.
An apparatus for generating and amplifying laser beams at approximately 1 micrometer wavelength is disclosed. The apparatus includes an ytterbium-doped gain-crystal pumped by an ytterbium fiber-laser. The fiber-laser enables a pump wavelength to be selected that minimizes heating of the gain-crystal. The apparatus can be configured for generating and amplifying ultra-fast pulses, utilizing the gain-bandwidth of ytterbium-doped gain-crystals.
H01S 3/23 - Agencement de plusieurs lasers non prévu dans les groupes , p. ex. agencement en série de deux milieux actifs séparés
H01S 3/10 - Commande de l'intensité, de la fréquence, de la phase, de la polarisation ou de la direction du rayonnement, p. ex. commutation, ouverture de porte, modulation ou démodulation
H01S 3/11 - Blocage de modesCommutation-QAutres techniques d'impulsions géantes, p. ex. vidange de cavité
H01S 3/094 - Procédés ou appareils pour l'excitation, p. ex. pompage utilisant le pompage optique par de la lumière cohérente
Laser-machining apparatus includes a carbon monoxide (CO) laser emitting a beam of laser-radiation having forty-four different wavelength components and optical elements for delivering the radiation to workpiece. An acousto-optic modulator is provided for modulating the beam on the workpiece. A birefringent plate is provided in the beam transported to the workpiece for randomly polarizing radiation incident on the workpiece. A minimum distance of the workpiece from the laser, and the number of different-wavelength components in the laser beam provides that no optical isolator is required for preventing feedback of radiation into the laser.
B23K 26/06 - Mise en forme du faisceau laser, p. ex. à l’aide de masques ou de foyers multiples
B23K 26/03 - Observation, p. ex. surveillance de la pièce à travailler
H01S 3/223 - Lasers, c.-à-d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet caractérisés par le matériau utilisé comme milieu actif à gaz le gaz actif étant polyatomique, c.-à-d. contenant plusieurs atomes
H01S 3/00 - Lasers, c.-à-d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet
B23K 26/08 - Dispositifs comportant un mouvement relatif entre le faisceau laser et la pièce
H01S 3/08 - Structure ou forme des résonateurs optiques ou de leurs composants
B23K 26/062 - Mise en forme du faisceau laser, p. ex. à l’aide de masques ou de foyers multiples par commande directe du faisceau laser
Laser-machining apparatus includes a carbon monoxide (CO) laser emitting a beam of laser-radiation having forty-four different wavelength components and optical elements for delivering the radiation to workpiece. An acousto-optic modulator is provided for modulating the beam on the workpiece. A birefringent plate is provided in the beam transported to the workpiece for randomly polarizing radiation incident on the workpiece. A minimum distance of the workpiece from the laser, and the number of different-wavelength components in the laser beam provides that no optical isolator is required for preventing feedback of radiation into the laser.
H01S 3/00 - Lasers, c.-à-d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet
H01S 3/223 - Lasers, c.-à-d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet caractérisés par le matériau utilisé comme milieu actif à gaz le gaz actif étant polyatomique, c.-à-d. contenant plusieurs atomes
B23K 26/06 - Mise en forme du faisceau laser, p. ex. à l’aide de masques ou de foyers multiples
B23K 26/08 - Dispositifs comportant un mouvement relatif entre le faisceau laser et la pièce
H01S 3/08 - Structure ou forme des résonateurs optiques ou de leurs composants
91.
TRANSPORT OF POLARIZED LASER-RADIATION USING A HOLLOW-CORE-FIBER
Plane-polarized laser-radiation from a laser-source is converted to circularly polarized radiation by a quarter-wave plate (12). The circularly polarized radiation is input into a hollow-core fiber for transport to a point of use (20). The transported radiation is converted back to plane-polarized radiation by another quarter-wave (22) plate between the fiber and the point of use.
Plane-polarized laser-radiation from a laser-source is converted to circularly polarized radiation by a quarter-wave plate. The circularly polarized radiation is input into a hollow-core fiber for transport to a point of use. The transported radiation is converted back to plane-polarized radiation by another quarter-wave plate between the fiber and the point of use.
G02B 6/024 - Fibres optiques avec revêtement avec des propriétés maintenant la polarisation
G02B 6/27 - Moyens de couplage optique avec des moyens de sélection et de réglage de la polarisation
A61B 18/22 - Instruments, dispositifs ou procédés chirurgicaux pour transférer des formes non mécaniques d'énergie vers le corps ou à partir de celui-ci par application de radiations électromagnétiques, p. ex. de micro-ondes en utilisant des lasers le faisceau étant dirigé le long, ou à l'intérieur d'un conduit flexible, p. ex. d'une fibre optiquePièces à main à cet effet
93.
Uniformity adjustment method for a diode-laser line-projector
In a line projector a diode-laser beam having an elliptical cross-section is projected onto a Powell lens which spreads the beam to form a line of light. Distribution of power along the line of light is adjusted by rotating the diode-laser beam with respect to the Powell lens.
A carbon dioxide waveguide-laser includes an elongated resonator compartment and an elongated RF power supply compartment. The resonator and RF power-supply compartments are separated by a water-cooled heat sink.
H01S 3/04 - Dispositions pour la gestion thermique
H01S 3/041 - Dispositions pour la gestion thermique pour des lasers à gaz
H01S 3/223 - Lasers, c.-à-d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet caractérisés par le matériau utilisé comme milieu actif à gaz le gaz actif étant polyatomique, c.-à-d. contenant plusieurs atomes
Diverging beams (13, 15, 17) from three fiber-lasers (12, 14, 16) are collimated by a three-segment composite lens (20). The collimated beams propagate parallel to each other to a single focusing lens (32) that focuses the collimated beams into a transport fiber (18).
A carbon dioxide waveguide-laser includes an elongated resonator unit and an elongated power-supply unit. The resonator and power-supply units are spaced by a cooling unit including a plurality of longitudinally extending, spaced-apart fins, with fans arranged to drive air through the spaces between the fins.
H01S 3/04 - Dispositions pour la gestion thermique
H01S 3/223 - Lasers, c.-à-d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet caractérisés par le matériau utilisé comme milieu actif à gaz le gaz actif étant polyatomique, c.-à-d. contenant plusieurs atomes
H01S 3/041 - Dispositions pour la gestion thermique pour des lasers à gaz
H01S 3/09 - Procédés ou appareils pour l'excitation, p. ex. pompage
A carbon dioxide waveguide-laser includes an elongated resonator unit and an elongated RF power-supply unit. The resonator and RF power-supply units are spaced by a air cooling unit including a plurality of longitudinally extending, spaced-apart fins, with fans arranged to drive air through the spaces between the fins.
H01S 3/223 - Lasers, c.-à-d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet caractérisés par le matériau utilisé comme milieu actif à gaz le gaz actif étant polyatomique, c.-à-d. contenant plusieurs atomes
H01S 3/04 - Dispositions pour la gestion thermique
H01S 3/041 - Dispositions pour la gestion thermique pour des lasers à gaz
98.
Multi-wavelength source of femtosecond infrared pulses
A source of femtosecond pulses at center wavelengths of about 940 nm and about 1140 nanometers (nm) includes a mode-locked fiber MOPA delivering pulses having a center wavelength of about 1040 nm. The 1040-nanometer pulses are spectrally spread into a continuum spectrum extending in range between about 900 nm and about 1200 nm and having well defined side-lobes around the 940-nm and 1140-wavelengths. Radiation is spatially selected from these side-lobes and delivered as the 940-nm and 1140-nm pulses.
H01S 3/00 - Lasers, c.-à-d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet
A carbon dioxide waveguide-laser includes an elongated resonator compartment and an elongated power supply compartment. The resonator and power-supply compartments are separated by a water-cooled heat sink.
H01S 3/04 - Dispositions pour la gestion thermique
H01S 3/041 - Dispositions pour la gestion thermique pour des lasers à gaz
H01S 3/223 - Lasers, c.-à-d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet caractérisés par le matériau utilisé comme milieu actif à gaz le gaz actif étant polyatomique, c.-à-d. contenant plusieurs atomes
H01S 3/097 - Procédés ou appareils pour l'excitation, p. ex. pompage par décharge dans le gaz d'un laser à gaz
H01S 3/03 - Détails de structure des tubes laser à décharge dans le gaz
The present disclosure is directed to simultaneously controlling peak pulse power and pulse energy in gas-discharge lasers. In an aspect, a radio-frequency power supply (104) that is coupled to a gas-discharge laser (102) is turned ON to initiate delivery of a laser pulse. The radio-frequency power supply is modulated ON/OFF to maintain the amplitude of the laser pulse at about a desired or prescribed value. Further, the radio-frequency power supply is turned OFF to terminate delivery of the laser pulse when the accumulated energy reaches reached a predefined energy threshold value.
H01S 3/03 - Détails de structure des tubes laser à décharge dans le gaz
H01S 1/06 - Masers, c.-à-d. dispositifs utilisant l’émission stimulée de rayonnement électromagnétique dans la gamme des micro-ondes gazeux
H01S 3/091 - Procédés ou appareils pour l'excitation, p. ex. pompage utilisant le pompage optique
H01S 3/134 - Stabilisation de paramètres de sortie de laser, p. ex. fréquence ou amplitude par commande du milieu actif, p. ex. par commande des procédés ou des appareils pour l'excitation dans des lasers à gaz
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