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2009
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Invention
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Process optimization with free source and free mask. The present invention relates to lithographi... |
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Invention
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Methods and systems for parameter-sensitive and orthogonal gauge design for lithography calibrati... |
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Invention
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Illumination optimization. A method of optimizing an illumination pupil shape for a lithographic ... |
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Invention
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Methods for model-based process simulation. Lithography simulation using a differential model. Th... |
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Invention
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Model-based scanner tuning methods. Systems and methods for tuning photolithographic processes ar... |
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Invention
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Lens heating compensation methods. Methods are disclosed for calibrating a photolithographic syst... |
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2008
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Invention
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Methods for performing model-based lithography guided layout design. Methods are disclosed to cre... |
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2006
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Invention
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System and method for mask verification using an individual mask error model. Methods and systems... |
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Invention
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System and method for creating a focus-exposure model of a lithography process. A system and a me... |
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2005
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Invention
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Method and apparatus for synchronizing data acquisition of a monitored ic fabrication process. Th... |
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2004
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Invention
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System and method for lithography simulation. There are many inventions described and illustrated... |
