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2025
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Invention
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Compositions and processes for depositing carbon-doped silicon-containing films.
Described herei... |
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Invention
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High purity ethylenediamine for semiconductor applications.
Ethylenediamine (EDA) compositions a... |
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Invention
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High temperature atomic layer deposition of silicon-containing film.
A method and composition fo... |
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Invention
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Cmp formulations and methods for polishing ruthenium films. Present CMP compositions contain sili... |
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Invention
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Passivation of polysilicon material and selective deposition of dielectric material utilizing alk... |
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Invention
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Chemical mechanical planarization polishing for interconnects diffusion barrier materials. Presen... |
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Invention
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Selective passivation of silicon oxide containing films utilizing organoamino-alkoxysilanes. A me... |
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Invention
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Compositions comprising silacycloalkanes and methods using same for deposition of silicon-contain... |
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Invention
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Hydrofluorocarbon compounds and their use integrated circuit manufacturing processes. 48462223358... |
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Invention
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Selective deposition of aluminum-containing dielectric material on dielectric over metals utilizi... |
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Invention
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Corrosion inhibitors for metal chemical mechanical planarization (cmp) polishing compositions. Ch... |
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Invention
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Compositions and methods using same for deposition of silicon-containing film.
Described herein ... |
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Invention
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Organoaminosilane precursors and methods for depositing films comprising same.
Described herein ... |
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Invention
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Metal organic resist photosensitivity improvement using organotin amide and organotin alkoxide.
... |
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2024
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Invention
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Transition metal dichalcogenide interlayers for improved electrical device performance.
A semico... |
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Invention
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Chemical additives for chemical mechanical planarization (cmp) polishing compositions. Present in... |
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Invention
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Method and related circuit for providing supplemental dielectric material. An integrated circuit,... |
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Invention
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Cmp formulations and methods for polishing polysilicon films. Present CMP compositions contain si... |
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Invention
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Eco-friendly biocides for chemical mechanical planarization (cmp) polishing compositions. Present... |
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Invention
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Biocides for chemical mechanical planarization (cmp) polishing compositions. Present invention pr... |
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Invention
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Hydrofluorocarbon compounds and their use in integrated circuit manufacturing processes. Structur... |
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Invention
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Silicon-containing films having surfaces modified from halogenated silicon-containing compounds. ... |
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Invention
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Selective deposition of silicon containing films utilizing organoaminopolysiloxanes and organoami... |
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Invention
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Selective deposition of aluminum-containing dielectric material on dielectric over metal utilizin... |
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Invention
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Stabilized organosilane compositions and methods of using same to form dense low-k films. A compo... |
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Invention
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Assembly having a face-to-face bonded chiplet. An integrated circuit (240), and related method, a... |
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Invention
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Integrated circuit having memories and a shared write port. A semiconductor package is provided t... |
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Invention
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Method and system for testing stacked face-to face bonded chiplets. A method, and related systems... |
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Invention
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Integrated circuit having microvault memories. An integrated circuit is disclosed herein that may... |
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Invention
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Fefet structures using amorphous oxide semiconductor channels on integrated circuits. Disclosed h... |
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Invention
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System and method for having correct-by-construction timing closure for face-to-face bonding. A s... |
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Invention
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System, method, and apparatus for wafer-scale memory. A semiconductor package is provided that in... |
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Invention
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Metal organic resist photosensitivity improvement using carboxylic acid. The disclosed and claime... |
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2023
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Invention
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Compositions and methods using same for carbon doped silicon containing films.
A composition and... |
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Invention
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Boron-containing precursors for the ald deposition of boron nitride films.
A boron-containing pr... |
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Invention
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Formulated alkaline chemistry for polysilicon exhume.
The disclosed and claimed subject matter r... |
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Invention
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Chemical mechanical planarization using amino-polyorganosiloxane-coated abrasives.
Chemical mech... |
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Invention
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Stable chemical mechanical planarization polishing compositions and methods for high rate silicon... |
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Invention
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Halide-functionalized cyclotrisilazanes as precursors for deposition of silicon-containing films.... |
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2022
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Invention
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Alkyl and aryl heteroleptic bismuth precursors for bismuth oxide containing thin films.
The disc... |
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Invention
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Tungsten chemical mechanical polishing slurries.
This invention pertains to slurries, methods an... |
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Invention
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Ald deposition utilizing moo2cl2 and moo2br2.
The disclosed and claimed subject matter relates t... |
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Invention
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Silanols and silanediols.
A composition useful in depositing low dielectric constant (low k) ins... |
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Invention
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Selective thermal atomic layer etching.
The disclosed and claimed subject matter relates to sele... |
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Invention
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Alkoxysilanes and dense organosilica films made therefrom.
A method for making a dense organosil... |
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Invention
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Multiple zone heated enclosure for optimized sublimation of solid-phase precursors.
A heated enc... |
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Invention
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Compositions for removing a photoresist from a substrate and uses thereof.
The disclosed and cla... |
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2021
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Invention
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Additives to enhance the properties of dielectric films.
A method for improving the elastic modu... |
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Invention
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Material supply system.
This invention provides gas supply and dispensing system and method of o... |
