Applied Materials, Inc.
United States of America
New patents and trademarks in the last week
Last updated : 2026-07-26
Summary
Patents |
Trademarks |
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14 | 0 |
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12 | 0 |
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Viewing 1 - 26 of 26
trademarks
patents
| # | ID | Jurisdiction | Title |
|---|---|---|---|
| 1 | 19073823 |
|
ELECTROSTATIC CHUCK WITH LIGHT-UP RESISTANT FLOW ENHANCEMENT PLUG |
| 2 | 19577871 |
|
EQUIPMENT PARAMETER MANAGEMENT AT A MANUFACTURING SYSTEM USING MACHINE LEARNING |
| 3 | 19035016 |
|
FLEXIBLE HEATSINK INTERFACE |
| 4 | 19434506 |
|
METHODS AND APPARATUS FOR WAFER DETECTION |
| 5 | 19566215 |
|
RESISTIVITY-CONTROLLED DIELECTRIC MATERIALS FOR SUBSTRATE SUPPORTS WITH IMPROVED HIGH TEMPERATURE CHUCKING |
| 6 | US2026011167 |
|
HIGH ELONGATION INTERFACE BETWEEN LENS AND WAVEGUIDE FOR AUGMENTED REALITY ASSEMBLY WITH IMPROVED RELIABILITY |
| 7 | US2025050540 |
|
GRADIENT ETCHING WITH MICROWAVE OXIDATION |
| 8 | IB2025050447 |
|
EVAPORATION SOURCE, VACUUM DEPOSITION SYSTEM, AND METHOD OF COATING A SUBSTRATE |
| 9 | US2026010498 |
|
ELECTROSTATIC CHUCK WITH LIGHT-UP RESISTANT FLOW ENHANCEMENT PLUG |
| 10 | US2026011412 |
|
INTEGRATED ASSEMBLY INCLUDING EMBEDDED COMPONENTS |
| 11 | IB2025050511 |
|
METHOD AND APPARATUS FOR MANUFACTURING PIXELS ON A SUBSTRATE |
| 12 | 19035121 |
|
WAFER BACKSIDE DEPOSITION CLEANING |
| 13 | 19572618 |
|
HIGH HEAT LOSS HEATER AND ELECTROSTATIC CHUCK FOR SEMICONDUCTOR PROCESSING |
| 14 | 19371235 |
|
SYSTEMS AND METHODS FOR PREDICTING FILM THICKNESS USING VIRTUAL METROLOGY |
| 15 | 19035302 |
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SYSTEMS, APPARATUS, AND METHODS FOR MULTI-WAVELENGTH MONITORING FOR SEMICONDUCTOR MANUFACTURING |
| 16 | 19035245 |
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SUBSTRATE STRESS MANAGEMENT USING HIGH TEMPERATURE IMPLANTATION |
| 17 | 19034794 |
|
CAVITY CONTACT FORMATION USING PLASMA DOPING PROCESS |
| 18 | 19032114 |
|
PATTERN TRANSFER BY DIRECTED SELF-ASSEMBLY (DSA) OF BLOCK COPOLYMERS (BCPS) |
| 19 | US2026011394 |
|
LIGHT ENGINE POLARIZATION SWITCHING FOR BIREFRINGENT WAVEGUIDE SUBSTRATES |
| 20 | US2025050558 |
|
PLASMA PROCESSING SYSTEMS WITH DIRECT CURRENT VOLTAGE FOR PLASMA ENERGY CONTROL |
| 21 | IB2025050425 |
|
METHOD OF LOADING AN EVAPORATION SOURCE WITH MATERIAL FOR EVAPORATION, EVAPORATION CRUCIBLE, EVAPORATION SOURCE AND DEPOSITION SYSTEM |
| 22 | US2025049161 |
|
ION IMPLANTER AND METHOD OF ION BEAM CONTROL USING ION BEAM IMAGING SYSTEM |
| 23 | US2025047807 |
|
PATTERN TRANSFER BY DIRECTED SELF-ASSEMBLY (DSA) OF BLOCK COPOLYMERS (BCPS) |
| 24 | CN2025073060 |
|
SEQUENCE TO ELIMINATE RING SIGNATURE ON SUBSTRATE |
| 25 | GD1135980 |
|
Flux-optimizer |
| 26 | GD1135979 |
|
Flux-optimizer assembly |
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