Abstract

A method includes accessing a first data set for a light source, accessing a second data set for a light source, and comparing the plurality of stored settings of the second data set to the plurality of configuration settings of the first data set to determine if one or more changed settings exist. The first data set includes a plurality of configuration settings for the light source, and the second data set includes a plurality of stored settings for the light source. The changed setting is a configuration setting that is different from a corresponding stored setting. In response to determining one or more changed settings exist, the one or more changed settings are graphically displayed for a user of the light source. In response to determining no changed settings exist, the first data set is stored as a newly stored data set.

IPC Classes  ?

• G03F 7/20 - ExposureApparatus therefor
• G06F 3/048 - Interaction techniques based on graphical user interfaces [GUI]

Abstract

An optical system includes a processor and a memory. The memory has instructions stored thereon that, when executed, cause the processor to obtain time series data of light pulse signals from a light source. The processor can encode the time series data to obtain encoded data, which includes a time series of vectors. Each vector in the time series of vectors includes one or more values corresponding to features of a light pulse signal in the time series data of light pulse signals. The processor can use a machine learning model to determine one or more values corresponding to features of a next light pulse signal and advance an optical system simulation based on the features of the next light pulse signal.

IPC Classes  ?

• G03F 7/20 - ExposureApparatus therefor

Abstract

Systems for maintaining light sources for semiconductor photolithography in which a module making up part of the light source is evaluated at various pulse counts to produce a binary prediction as to whether the module is sufficiently likely to operate without failure in an ensuing sequence of pulses. The binary prediction may be made by a machine learning model trained on metrics extracted from measurements taken on deinstalled modules. A group of models, each trained differently, can be made available according to a selection made by the user or according to the maintenance objectives of the user.

IPC Classes  ?

• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor

Abstract

An optical system is in a pulse stretcher of a deep ultraviolet light source. The optical system includes: an optical element configured, in operation, along a path of a light beam produced by the deep ultraviolet light source; and an adjustable mounting apparatus to which the optical element is located. The adjustable mounting apparatus includes: a passive alignment mount, and a drive mechanism coupled to the passive alignment mount, the drive mechanism including a wedge that is rotationally constrained.

IPC Classes  ?

• H01S 3/00 - Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
• G02B 7/182 - Mountings, adjusting means, or light-tight connections, for optical elements for prismsMountings, adjusting means, or light-tight connections, for optical elements for mirrors for mirrors

Abstract

A process for replacing a gas lasing medium in a laser chamber of a deep ultraviolet (DUV) light source includes: selecting a target pumpdown pressure for replacing the gas lasing medium including fluorine in the laser chamber based on at least one of: (a) a temporal age and/or a pulse- count age of the laser chamber, (b) a temporal age and/or a pulse-count age of the gas in the laser chamber, and (c) one or more performance measures of the laser chamber; reducing the pressure of the gas in the laser chamber to the target pumpdown pressure; and adding more gas to the laser chamber to increase the pressure of the gas in the laser chamber up to an operating pressure.

IPC Classes  ?

• H01S 3/036 - Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering or replenishingMeans for circulating the gas, e.g. for equalising the pressure within the tube
• H01S 3/225 - Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex

Abstract

A light source includes a chamber configured to house a gas discharge medium, a first electrode, a second electrode, an actuator coupled to the second electrode, and a controller coupled to the actuator. The first and second electrodes are configured to excite the gas discharge medium and generate a light beam. The second electrode is spaced apart from the first electrode by a discharge gap. The actuator is configured to adjust a position of the second electrode to maintain the discharge gap. The controller is configured to adjust the actuator based on one or more measured parameters of the light source. Advantageously the system can maintain the discharge gap over time, provide feedback to adjust the actuator based on the measured parameters (e.g., chamber operating pressure, blower current signal, capacitor voltage waveform), reduce errors in the light beam, and increase a lifetime of the light source.

IPC Classes  ?

• H01S 3/036 - Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering or replenishingMeans for circulating the gas, e.g. for equalising the pressure within the tube
• H01S 3/038 - Electrodes, e.g. special shape, configuration or composition
• H01S 3/097 - Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
• H01S 3/0971 - Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited
• H01S 3/134 - Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the active medium, e.g. by controlling the processes or apparatus for excitation in gas lasers
• H01S 3/225 - Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
• H01S 3/23 - Arrangement of two or more lasers not provided for in groups , e.g. tandem arrangement of separate active media

Abstract

A pulsed-discharge radiation source includes a gas chamber, a window, and a conduit system. The conduit system includes a refill path and a conduit. The pulsed-discharge radiation source generates radiation. The gas chamber confines a gas and contaminants produced during the generation of radiation. The window isolates the gas from an environment external to the gas chamber and allows the radiation to travel between the gas chamber and the environment. The refill path allows a replacement of the gas. The conduit circulates the gas to or from the gas chamber during the generating. The conduit system directs a flow of one of a refill gas, the gas, or the refill gas and the gas at least during a refill operation to prevent the contaminant from contacting the window, whereby the conduit system increases the usable lifetime of at least the window.

IPC Classes  ?

• H01S 3/036 - Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering or replenishingMeans for circulating the gas, e.g. for equalising the pressure within the tube
• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
• H01S 3/034 - Optical devices within, or forming part of, the tube, e.g. windows, mirrors
• H01S 3/225 - Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex

Abstract

A lithographic apparatus includes an illumination system that includes a metrology system. The illumination system generates a beam of radiation to illuminate a pattern of a patterning device for projecting an image of the pattern onto a substrate. The metrology system includes an etalon, a detector having an array of pixels, and a computing system. The etalon generates a fringe pattern and a next fringe pattern respectively corresponding to a pulse and a next pulse of the beam. The array of pixels generate intensity signals based on fringe pattern intensities at positions of the pixels. The computing system determines a predicted range of pixel positions corresponding to intensity peaks of the next fringe pattern based on pixel positions of intensity peaks of the fringe pattern and performs an abbreviated analysis of the next fringe pattern. The abbreviated analysis is delimited by the predicted range of pixel positions.

IPC Classes  ?

• G03F 7/20 - ExposureApparatus therefor
• H01S 3/139 - Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the mutual position or the reflecting properties of the reflectors of the cavity

Abstract

A resonant charging supply for a pulsed power supply system for a discharge laser, the configurable resonant charging circuit having one or more of a variable inductor, a programmable energy calculation circuit, a programmable voltage scaling and control circuit, a programmable current scaling and control circuit, and a programmable repetition rate limiter so that the resonant charging circuit is configurable to be able to work with any one of a number of laser platforms having differing operational parameters.

IPC Classes  ?

• H03K 3/57 - Generators characterised by the type of circuit or by the means used for producing pulses by the use of an energy-accumulating element discharged through the load by a switching device controlled by an external signal and not incorporating positive feedback the switching device being a semiconductor device

Abstract

A calibration apparatus for a wavelength-tunable deep ultraviolet (DUV) light source includes a plasmonic device in a path of a light beam from a discharge chamber; and a calibration detector that receives the light beam exiting the plasmonic device. The calibration detector is configured to detect a fluence of the light beam.

IPC Classes  ?

• G01J 1/42 - Photometry, e.g. photographic exposure meter using electric radiation detectors
• G03F 7/20 - ExposureApparatus therefor
• G01J 3/02 - SpectrometrySpectrophotometryMonochromatorsMeasuring colours Details
• G01J 3/28 - Investigating the spectrum
• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor

Abstract

Apparatus for and methods of combining multiple, i.e., two or more laser beams to reduce even to the point of elimination a transverse gap between the two or more beams caused, for example, by a space between a coating on a surface of the mirror and the edge of the mirror, or by optic geometry, is avoided.

IPC Classes  ?

• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
• H01S 3/00 - Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
• H01S 3/225 - Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
• H01S 3/23 - Arrangement of two or more lasers not provided for in groups , e.g. tandem arrangement of separate active media

Abstract

A lithographic apparatus includes a projection system and an illumination system that includes an electrode and a set of capacitance structures. The electrode has an elongate shape. A length-wise strip of the electrode is defined from a first end of the elongate shape to a second end of the elongate shape. The length-wise strip includes electrical coupling positions including a first end coupling position proximal to the first end, a second end coupling position proximal to the second end, and a series of intermediary coupling positions between the first end coupling position and the second end coupling position. Each capacitance structure of the first set is coupled to a respective one of the electrical coupling positions. A capacitance value of a capacitance structure coupled to one of the intermediary coupling positions is less than a capacitance value of a capacitance structure coupled to the first end coupling position.

IPC Classes  ?

• G03F 7/20 - ExposureApparatus therefor
• H01S 3/032 - Constructional details of gas laser discharge tubes for confinement of the discharge, e.g. by special features of the discharge constricting tube
• H01S 3/038 - Electrodes, e.g. special shape, configuration or composition
• H01J 7/46 - Structurally associated resonator having distributed inductance and capacitance

Abstract

A lithographic apparatus includes a chamber that produces radiation. The chamber includes an internal wall having a surface facing into the chamber and a filter attached to the surface of the internal wall of the chamber. The filter includes a plurality of screens stacked on top of one another along a stacking direction that is perpendicular to the surface of the internal wall of the chamber on which the filter is disposed. The plurality of screens include a central region and an edge region surrounding the central region. A first separation between the central region and the surface of the internal wall of the chamber along the stacking direction is greater than a second separation between the edge region and the surface of the internal wall of the chamber along the stacking direction.

IPC Classes  ?

• G03F 7/20 - ExposureApparatus therefor
• H01S 3/036 - Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering or replenishingMeans for circulating the gas, e.g. for equalising the pressure within the tube
• H01S 3/104 - Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation in gas lasers

Abstract

A lasing gas replenishment system for a discharge chamber in a deep ultraviolet radiation source in which an axial flow turbine is used to refresh lasing gas in the discharge chamber with a higher clearing ratio so that lasing gas in the discharge region may be replenished rapidly enough to support higher pulse repetition rates.

IPC Classes  ?

• H01S 3/036 - Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering or replenishingMeans for circulating the gas, e.g. for equalising the pressure within the tube

Abstract

A system includes first and second sections. The first section includes an elongated plate including a squared edge, a tapered edge, a first surface, a second surface, and first and second extensions extending from the second surface. The second section includes first and second chambers with a dividing wall between the first and second chambers, the first chamber including a planar surface and the second chamber including a sloped surface disposed opposite the tapered edge. The system includes first and second end plates to secure the first section above the second section such that the dividing wall is interposed between the first and second extensions.

IPC Classes  ?

• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor

Abstract

A deep ultraviolet laser system includes a line narrowing module including a plurality of prisms such that an incoming laser beam from a laser first interacts with a first prism, then interacts with a second prism after the first prism. The second prism includes two different portions including a first portion designed to work with and enable higher bandwidths of the incoming laser beam and a second portion designed to work with and enable lower bandwidths of the incoming laser beam. The second prism is movable between a first position in which the laser beam interacts with the first portion and a second position in which the laser beam interacts with the first portion. The second prism is movable by translation using an activation mechanism controlled by a controller to vary a target bandwidth of the laser beam.

IPC Classes  ?

• H01S 3/08 - Construction or shape of optical resonators or components thereof
• G03F 7/20 - ExposureApparatus therefor
• H01S 3/1055 - Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the mutual position or the reflecting properties of the reflectors of the cavity one of the reflectors being constituted by a diffraction grating

Abstract

A lithography system includes a light source. The light source generates radiation in a chamber, which includes a first electrode, a second electrode, and pre-ionization tube. A first surface of the first electrode and a first surface of the second electrode face inwards towards a discharge region. The pre-ionization tube can be adjacent to a second surface of either the first electrode or the second electrode. Altering the position of the pre-ionization tube can reduce acoustic effects in the chamber during discharge of the light source. The pre-ionization tube can be tilted by moving one end of the pre-ionization tube towards the discharge region.

IPC Classes  ?

• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
• H01S 3/038 - Electrodes, e.g. special shape, configuration or composition
• H01S 3/225 - Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex

Abstract

A light source for a lithography system includes an optical component and an aperture. The optical component includes a first side with first and second surfaces. The aperture is positioned on or adjacent to and parallel to the first surface of the first side of the prism. The aperture includes a first part and a second part. The first part of the aperture blocks light from entering the optical component, and can reflect a portion of an incoming beam towards a beam dump. The second part of the aperture allows a portion of a beam to enter and exit the first side of the optical component.

IPC Classes  ?

• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
• G02B 5/00 - Optical elements other than lenses

Abstract

A process for maintaining light sources includes obtaining one or more features of the light sources representing one or more operational aspects of the light sources stored over time; generating a decision tree, based on the one or more features, for classifying a given light source as either (1) no technical issue or (2) maintenance needed, the generating using the one or more features of the light sources to determine a split or splits for each of one or more levels by minimizing a hybrid cost function including a combination of (1) a first cost function minimized with increasing order (or orderliness) within resulting subsets and (2) one or more second cost functions minimized with increasing closeness to respective target parameters; applying the generated decision tree to a given light source; performing maintenance on the given light source when the given light source has been classified as maintenance needed.

IPC Classes  ?

• G06Q 10/20 - Administration of product repair or maintenance
• H01S 5/06 - Arrangements for controlling the laser output parameters, e.g. by operating on the active medium

Abstract

An optical pulse stretcher apparatus includes: a hermetically-sealed container including one or more walls that define an interior cavity that is maintained, in operation, at a controlled environment, at least one wall having one or more windows, each window configured to pass one or more of a pulsed light beam and a stretched pulsed light beam; an optical stretcher arranged within the interior cavity and configured to receive a pulsed light beam and generate at least one stretched pulsed light beam; and one or more actuation devices. Each actuation device physically communicates with an optical element within the interior cavity and includes an adjustment mechanism external to the hermetically-sealed container. The adjustment mechanism enables adjustment of one or more physical properties of the optical element in physical communication with the actuation device without disrupting the controlled environment within the interior cavity.

IPC Classes  ?

• G02B 26/00 - Optical devices or arrangements for the control of light using movable or deformable optical elements
• G02B 27/09 - Beam shaping, e.g. changing the cross-sectioned area, not otherwise provided for
• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
• G03F 7/20 - ExposureApparatus therefor

Abstract

A light source apparatus includes a gas discharge stage configured to output a light beam and a time-integral squared (TIS) apparatus configured to receive a portion of the light beam and measure a TIS pulse width of the light beam in the time domain. The TIS apparatus is configured to calculate a speckle contrast (SC) of the light beam based on the measured TIS pulse width. The TIS pulse width is measured in real-time or near real-time. The calculated SC can be provided to a lithographic apparatus to reduce errors in a lithographic process. Advantageously the apparatus can measure the TIS pulse width in real-time, calculate the SC in real-time, adjust one or more parameters of the SC to control the SC, reduce errors in a lithographic process, perform diagnostics of the light source apparatus, and identify optimal maintenance planning of the light source apparatus.

IPC Classes  ?

• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
• H01S 3/225 - Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex

Abstract

In an apparatus for generating laser radiation from discharges in a discharge chamber, with opposed surfaces of electrode supports defining at least a portion of a gas flow channel, in which at least one flow insert is positioned in the gas flow channel to regulate the flow of gas in the gas flow channel. The at least one flow insert may also be arranged to regulate acoustic phenomenon in the discharge chamber.

IPC Classes  ?

• H01S 3/034 - Optical devices within, or forming part of, the tube, e.g. windows, mirrors
• H01S 3/036 - Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering or replenishingMeans for circulating the gas, e.g. for equalising the pressure within the tube
• H01S 3/083 - Ring lasers
• H01S 3/225 - Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
• H01S 3/23 - Arrangement of two or more lasers not provided for in groups , e.g. tandem arrangement of separate active media

Abstract

An apparatus for and method of reducing the effects of vibrations on components in modules of a deep ultraviolet light source. The components are provided with sensors (325,335) to sense vibration waveforms and actuators (320,330) for applying a waveform opposed to and so cancelling the vibration waveform. In addition to application of active noise (vibration) cancellation the vibration waveform resulting from active vibration suppression is analyzed to identify residual vibrations to determine characteristics of a residual vibration cancelling waveform.

IPC Classes  ?

• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor

Abstract

Apparatus for and methods of performing multifocal imaging in a semiconductor lithography system in which a wavelength switching assembly is interposed in an optical path for laser radiation between a fine wavelength control assembly and a coarse wavelength control assembly to alter an angle of incidence of the laser radiation on a diffraction grating.

IPC Classes  ?

• H01S 3/08 - Construction or shape of optical resonators or components thereof
• H01S 3/1055 - Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the mutual position or the reflecting properties of the reflectors of the cavity one of the reflectors being constituted by a diffraction grating
• H01S 3/225 - Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
• H01S 3/139 - Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the mutual position or the reflecting properties of the reflectors of the cavity
• H01S 3/23 - Arrangement of two or more lasers not provided for in groups , e.g. tandem arrangement of separate active media
• H01S 3/10 - Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating

Abstract

A pulsed-discharge radiation source is provided. The pulsed-discharge radiation source generates DUV radiation. The pulsed-discharge radiation source includes electrodes, a fan, and a fan housing. The electrodes delivers a voltage to a gas to generate radiation. The fan delivers the gas in a first direction through a gap located between the electrodes. The fan housing encloses the fan and the gas. The fan housing includes a gas inlet and a gas guiding structure. The gas inlet receives the gas. The gas guiding structure directs the gas to the gap. The gas guiding structure has a tapered shape.

IPC Classes  ?

• H01S 3/036 - Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering or replenishingMeans for circulating the gas, e.g. for equalising the pressure within the tube
• H01S 3/0971 - Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited
• H01S 3/225 - Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
• H01S 3/10 - Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating

Abstract

An apparatus includes a gas discharge system including a gas discharge chamber and configured to produce a light beam; and a spectral feature adjuster in optical communication with a pre-cursor light beam generated by the gas discharge chamber. The spectral feature adjuster includes: a body defining an interior that is held at a pressure below atmospheric pressure; at least one optical pathway defined between the gas discharge chamber and the interior of the body, the optical pathway being transparent to the pre-cursor light beam; and a set of optical elements within the interior, the optical elements configured to interact with the pre-cursor light beam.

IPC Classes  ?

• H01S 3/00 - Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
• H01S 3/23 - Arrangement of two or more lasers not provided for in groups , e.g. tandem arrangement of separate active media

Abstract

Methods and systems for validating one or more sensors, one or more circuit boards, one or more connectors, or the like in lithographic apparatuses and systems are provided. For example, a metrology system (600) includes a first circuit board (603) including a sensor (611) and a multiplexer (613) configured to receive a first analog signal (621) corresponding to a first digital signal (619)) and output a second analog signal (625). The metrology system (600) further includes a second circuit board (601) including a processor (605) configured to generate the first digital signal (619). The processor (605) is further configured to receive a second digital signal (631) corresponding to the second analog signal (625) output from the multiplexer (613). The processor (605) is further configured to determine whether a fault exists in one or more of the first circuit board (603), the second circuit board (601), or a connection between the first circuit board (603) and the second circuit board (601) based on the received second digital signal (631).

IPC Classes  ?

• G01R 31/66 - Testing of connections, e.g. of plugs or non-disconnectable joints
• G01R 31/50 - Testing of electric apparatus, lines, cables or components for short-circuits, continuity, leakage current or incorrect line connections
• G01R 31/28 - Testing of electronic circuits, e.g. by signal tracer
• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor

Abstract

A laser source includes a laser chamber configured to generate a first laser beam. The laser source further includes an optical system coupled to the laser chamber and configured to receive the first laser beam and output an output laser beam. The laser source also includes a gas purge system. According to some aspects, the gas purge system is configured to supply a nitrogen gas into the optical system at a pressure less than atmospheric pressure. According to some aspects, the gas purge system is configured to supply a helium gas into the optical system.

IPC Classes  ?

• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
• H01S 3/00 - Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
• H01S 3/036 - Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering or replenishingMeans for circulating the gas, e.g. for equalising the pressure within the tube

Abstract

An apparatus for generating laser radiation from discharges in a discharge chamber in which the discharges produce acoustic waves which would disrupt operation of the apparatus at certain repetition rates if reflected back to their origin in which a surface of an electrode adjacent the preionizer tube or a surface of the preionizer tube or both are provided with acoustic scattering features which scatter acoustic waves impinging on the electrode and preionizer tube surfaces.

IPC Classes  ?

• H01S 3/036 - Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering or replenishingMeans for circulating the gas, e.g. for equalising the pressure within the tube
• H01S 3/038 - Electrodes, e.g. special shape, configuration or composition
• H01S 3/0971 - Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited
• H01S 3/225 - Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
• H01S 3/23 - Arrangement of two or more lasers not provided for in groups , e.g. tandem arrangement of separate active media

Abstract

A discharge chamber for use in a deep ultraviolet radiation source in which a cross flow blower is used to refresh lasing gas in a discharge region and a flow block is placed in an intake region of the cross flow blower to reshape the flow profile of the gas entering the cross flow blower. This permits the cross flow blower to operate more efficiently, i.e., offer the same performance while consuming less energy, so that energy consumption can be reduced.

IPC Classes  ?

• H01S 3/034 - Optical devices within, or forming part of, the tube, e.g. windows, mirrors
• H01S 3/036 - Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering or replenishingMeans for circulating the gas, e.g. for equalising the pressure within the tube
• H01S 3/23 - Arrangement of two or more lasers not provided for in groups , e.g. tandem arrangement of separate active media
• H01S 3/0971 - Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited
• H01S 3/225 - Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex

Abstract

A computing device including a display screen is at a photolithography exposure facility. The facility includes one or more photolithography exposure apparatuses. The computing device is configured to display on the display screen: a status region including one or more status indicators, each status indicator associated with an ultraviolet (UV) light source configured to supply light to a respective photolithography exposure apparatus of the one or more photolithography apparatuses; a graph region including one or more graphs, each graph displaying information relating to the one or more status indicators; and a filtering region including one or more menu items selectable to control the information displayed in the status region and/or in the one or more graphs.

IPC Classes  ?

• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
• G03F 7/20 - ExposureApparatus therefor
• G06F 3/0482 - Interaction with lists of selectable items, e.g. menus

Abstract

Disclosed are apparatus for and methods of passivating a first electrode normally serving as a cathode in a laser discharge chamber also including a second electrode normally serving as an anode by supplying reversed polarity pulses to the first electrode either during part of a chamber manufacturing passivation procedure or intermittently or on demand after the chamber has been put in service.

IPC Classes  ?

• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
• H01S 3/038 - Electrodes, e.g. special shape, configuration or composition

Abstract

An apparatus includes an offload processing system in communication with a metrology system and a control system configured to control operation of a light source. the offload processing system configured to: receive data collected over a period of time from the metrology system; determine whether any disturbances in the collected data over the period of time are persistent disturbances; estimate whether a configuration of a sub-controller of the control system to compensate for a persistent disturbance improves overall performance gain associated with the light source; and, if it is determined that there is a persistent disturbance and if it is estimated that the configuration of the sub-controller of the control system to compensate for the persistent disturbance improves overall performance gain associated with the light source, then send a configuration signal to the sub-controller of the control system.

IPC Classes  ?

• G03F 7/20 - ExposureApparatus therefor
• H01S 3/13 - Stabilisation of laser output parameters, e.g. frequency or amplitude
• F21V 9/40 - Elements for modifying spectral properties, polarisation or intensity of the light emitted, e.g. filters with provision for controlling spectral properties, e.g. colour, or intensity

Abstract

A gas discharge apparatus of an ultraviolet (UV) light source includes: a gas chamber structure in which a gas discharge chamber is defined; and a blower fan within the gas discharge chamber. The blower fan includes: a fan mount that is fixed to the gas chamber structure; and a plurality of fan blades arranged in a cylindrical form about an axial direction and a plurality of fan blades arranged longitudinally along the axial direction such that a hollow cylindrical interior is defined. At least some of the fan blades have a surface with textures.

IPC Classes  ?

• H01S 3/036 - Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering or replenishingMeans for circulating the gas, e.g. for equalising the pressure within the tube
• H01S 3/225 - Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
• H01S 3/23 - Arrangement of two or more lasers not provided for in groups , e.g. tandem arrangement of separate active media

Abstract

One or both of the confronting discharge surfaces of the cathode and anode electrodes in a laser discharge chamber, that is, the surfaces between which the plasma is struck, are provided with an engineered surface structure forming distributed discharge initiation or nucleation sites in order to effect control over the discharge process.

IPC Classes  ?

• H01S 3/038 - Electrodes, e.g. special shape, configuration or composition

Abstract

An extended optical pulse stretcher is provided that combines confocal pulse stretchers in combination to produce, for example, 4 reflections, 4 reflections, 12 reflections, and 12 reflections per optical circuit configuration. The inclusion of the combination of different mirror separations and delay path lengths can result in very long pulse stretching, long optical delays, and minimal efficiency losses. Also, in the extended optical pulse stretcher, at least a beam splitter can be positioned relative to the center of curvature of the mirrors to “flatten” each of the circuits to enable the beam to propagate in the same plane (e.g., parallel to the floor). Also, the curvatures and sizes of the individual mirrors can be designed to position the beam splitter closer to one of the banks of mirrors to allow the optical pulse stretchers to properly fit in an allocated location in a laser system.

IPC Classes  ?

• H01S 3/00 - Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
• G02B 17/00 - Systems with reflecting surfaces, with or without refracting elements
• G02B 27/14 - Beam splitting or combining systems operating by reflection only
• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
• H01S 3/225 - Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex

Abstract

A system for use in a deep ultraviolet radiation source for managing purge and replenishment of gas in a discharge region between the tips of two electrodes in a discharge chamber in which a tip of at least one of the electrodes has a shape transverse to the length of the electrode that promotes the flow of gas through the discharge region.

IPC Classes  ?

• H01S 3/038 - Electrodes, e.g. special shape, configuration or composition
• H01S 3/036 - Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering or replenishingMeans for circulating the gas, e.g. for equalising the pressure within the tube
• H01S 3/0971 - Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited
• H01S 3/225 - Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
• H01S 3/23 - Arrangement of two or more lasers not provided for in groups , e.g. tandem arrangement of separate active media

Abstract

A system for and method of performing a calibration of a measurement module provided to measure of a spectral characteristic, for example, a spectrum, of a laser beam of a radiation source in which the system includes, and the method includes use of, a reference radiation source to calibrate the measurement module.

IPC Classes  ?

• H01S 3/225 - Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
• G01J 9/02 - Measuring optical phase differenceDetermining degree of coherenceMeasuring optical wavelength by interferometric methods
• G01J 3/02 - SpectrometrySpectrophotometryMonochromatorsMeasuring colours Details
• G01J 3/26 - Generating the spectrumMonochromators using multiple reflection, e.g. Fabry-Perot interferometer, variable interference filter
• G01J 3/28 - Investigating the spectrum
• G01J 1/42 - Photometry, e.g. photographic exposure meter using electric radiation detectors

Abstract

A spectral feature selection apparatus includes a dispersive optical element arranged to interact with a pulsed light beam; three or more refractive optical elements arranged in a path of the pulsed light beam between the dispersive optical element and a pulsed optical source; and one or more actuation systems, each actuation system associated with a refractive optical element and configured to rotate the associated refractive optical element to thereby adjust a spectral feature of the pulsed light beam. At least one of the actuation systems is a rapid actuation system that includes a rapid actuator configured to rotate its associated refractive optical element about a rotation axis. The rapid actuator includes a rotary stepper motor having a rotation shaft that rotates about a shaft axis that is parallel with the rotation axis of the associated refractive optical element.

IPC Classes  ?

• G02B 27/42 - Diffraction optics
• G01J 3/06 - Scanning arrangements
• G01J 3/12 - Generating the spectrumMonochromators
• G01J 3/14 - Generating the spectrumMonochromators using refracting elements, e.g. prism
• G01J 3/18 - Generating the spectrumMonochromators using diffraction elements, e.g. grating
• G02B 26/00 - Optical devices or arrangements for the control of light using movable or deformable optical elements
• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
• H01L 21/027 - Making masks on semiconductor bodies for further photolithographic processing, not provided for in group or
• H01S 3/00 - Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
• H01S 3/08 - Construction or shape of optical resonators or components thereof
• H01S 3/225 - Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
• H01S 3/23 - Arrangement of two or more lasers not provided for in groups , e.g. tandem arrangement of separate active media

Abstract

A method for predicting states of light sources, including laser systems, includes obtaining features of the light sources representing operational aspects of the light sources; clustering the features into clusters with a machine learning algorithm utilizing unsupervised learning, the clusters representing states of the light sources; generating a transition matrix between the clusters representing transition probabilities of transitions of the light sources between the clusters after an interval of time, the clusters including one or more terminal clusters from which the probability of transition to another cluster is zero; and for a given light source having features corresponding to a given cluster and state, generating a non-binary prediction of a future cluster and state of the given light source by one or more applications of the transition matrix.

IPC Classes  ?

• G03F 7/20 - ExposureApparatus therefor
• G06N 3/00 - Computing arrangements based on biological models

Abstract

A system for and method of measuring one or more spectral properties such as wavelength and/or bandwidth of a beam of deep ultraviolet excimer laser radiation in which an absolute reference is used to calibrate instrumentation for measuring the one or more spectral properties, the absolute reference being generated using Doppler free spectroscopy. Also disclose are systems and methods in which an isotopically concentrated material is used.

IPC Classes  ?

• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
• H01S 3/13 - Stabilisation of laser output parameters, e.g. frequency or amplitude

Abstract

A method of replacing a gas mixture in a gas discharge chamber in a light source includes determining a performance of the light source and/or gas discharge chamber based on one or more light source and/or gas discharge chamber performance metrics, determining a next refill pressure based on the determined performance and a current operating pressure of the gas discharge chamber, removing the gas mixture from the gas discharge chamber; and filling the gas discharge chamber with a replacement gas mixture to the determined next refill pressure. An apparatus for replacing the gas mixture is also disclosed.

IPC Classes  ?

• H01S 3/104 - Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation in gas lasers
• H01S 3/036 - Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering or replenishingMeans for circulating the gas, e.g. for equalising the pressure within the tube
• H01S 3/038 - Electrodes, e.g. special shape, configuration or composition
• H01S 3/083 - Ring lasers
• H01S 3/225 - Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
• H01S 3/23 - Arrangement of two or more lasers not provided for in groups , e.g. tandem arrangement of separate active media

Abstract

An apparatus for generating laser radiation from discharges in a gap, in a discharge chamber in which the discharges cause acoustic waves that reflect off of internal surfaces in the discharge chamber. The gap is angled with respect to the surfaces of structures in the chamber proximate to the gap so that acoustic waves reflected by those surfaces are less likely to reflect back to their origin and interfere with the operation of the laser especially at high repetition rates.

IPC Classes  ?

• H01S 3/038 - Electrodes, e.g. special shape, configuration or composition
• H01S 3/0971 - Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited
• H01S 3/225 - Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
• H01S 3/083 - Ring lasers
• H01S 3/23 - Arrangement of two or more lasers not provided for in groups , e.g. tandem arrangement of separate active media

Abstract

An apparatus for generating laser radiation from discharges in a discharge chamber in which the discharges produce acoustic waves which would disrupt operation of the apparatus at certain repetition rates if reflected back to their origin in which the surface of a preionizer tube positioned in the discharge chamber is provided with acoustic scattering features which scatter acoustic waves impinging on the preionizer tube surface. The preionizer tube may also be configured to have a transverse cross section that presents an angled surface to the region in which discharges are produced.

IPC Classes  ?

• H01S 3/03 - Constructional details of gas laser discharge tubes
• H01S 3/038 - Electrodes, e.g. special shape, configuration or composition
• H01S 3/0971 - Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited
• H01S 3/036 - Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering or replenishingMeans for circulating the gas, e.g. for equalising the pressure within the tube
• H01S 3/225 - Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
• H01S 3/23 - Arrangement of two or more lasers not provided for in groups , e.g. tandem arrangement of separate active media

Abstract

A prediction apparatus is in communication with an optical source configured to produce a pulsed light beam for use by a photolithography exposure apparatus. The prediction apparatus includes: a photolithography module in communication with the photolithography exposure apparatus and configured to receive an identifier, the received identifier lacking data relating to an actual firing pattern defining properties of the pulsed light beam; and an optical source module in communication with the optical source, the optical source module configured to provide a forecast firing pattern to the optical source. The forecast firing pattern is associated with and determined from the received identifier, and forecasts one or more properties of the actual firing pattern.

IPC Classes  ?

• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
• G03F 7/20 - ExposureApparatus therefor

Abstract

A set of the pulses of light in a light beam is passed through a mask toward a wafer during a single exposure pass; at least a first aerial image and a second aerial image on the wafer based on pulses of light in the set of pulses that pass through the mask is generated during a single exposure pass, the first aerial image is at a first plane on the wafer and the second aerial image is at a second plane on the wafer, the first plane and the second plane being spatially distinct from each other and separated from each other by a separation distance along the direction of propagation; and a three-dimensional semiconductor component is formed.

IPC Classes  ?

• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor

Abstract

A dust collector for a gas discharge chamber of a light source includes: an inlet port, an outlet port, and a passive dust trap. The inlet port fluidly communicates with a cavity of the gas discharge chamber. The outlet port fluidly communicates with an active dust trap such that an outflow path external to the cavity of the gas discharge chamber is defined from the inlet port to the outlet port along an outflow direction. The passive dust trap extends across the outflow path and is configured to define a second flow path that extends at least partly along a second direction different from the outflow direction and to a collection pocket defined in a collector body of the passive dust trap.

IPC Classes  ?

• H01S 3/034 - Optical devices within, or forming part of, the tube, e.g. windows, mirrors
• H01S 3/036 - Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering or replenishingMeans for circulating the gas, e.g. for equalising the pressure within the tube
• H01S 3/104 - Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation in gas lasers
• H01S 3/0971 - Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited
• H01S 3/225 - Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
• H01S 3/23 - Arrangement of two or more lasers not provided for in groups , e.g. tandem arrangement of separate active media

Abstract

A gas control apparatus includes a control system in communication with a gas discharge chamber. The control system includes a performance monitoring module configured to, during standard mode of operation of the gas discharge chamber and in between performance of gas recovery schemes on the gas discharge chamber that use a gas recovery setting: compare one or more performance parameters of the gas discharge chamber to respective thresholds; determine whether the gas recovery setting needs to be adjusted based on the comparison; and adjust the value for the gas recovery setting based on the determination. The control system includes a gas recovery module configured to perform the gas recovery scheme, the gas recovery module being configured to access the most recently adjusted value for the gas recovery setting from the performance monitoring module when performing the current gas recovery scheme.

IPC Classes  ?

• H01S 3/134 - Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the active medium, e.g. by controlling the processes or apparatus for excitation in gas lasers
• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
• G03F 7/20 - ExposureApparatus therefor
• H01S 3/036 - Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering or replenishingMeans for circulating the gas, e.g. for equalising the pressure within the tube
• H01S 3/13 - Stabilisation of laser output parameters, e.g. frequency or amplitude
• H01S 3/225 - Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
• H01S 3/23 - Arrangement of two or more lasers not provided for in groups , e.g. tandem arrangement of separate active media

Abstract

A pulsed power circuit including one or more magnetic switches respectively implemented as one or more inductors having saturable cores wherein, after a discharge pulse, each saturable core is repeatably reset to an initial bias point on its magnetization curve by a reset pulse having variable characteristics determined, for example, by chamber operating conditions so that the saturable core is able to function reliably and consistently.

IPC Classes  ?

• H01S 3/097 - Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
• G03F 7/20 - ExposureApparatus therefor
• H01S 3/083 - Ring lasers
• H01S 3/225 - Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
• H01S 3/23 - Arrangement of two or more lasers not provided for in groups , e.g. tandem arrangement of separate active media

Abstract

A computer-implemented process for maintaining a light source includes using a computer, for each of M machine-learning models, with each model trained to classify a state of a module of a light source as requiring maintenance or not requiring maintenance, to (1) form pairs of performance parameters of a set of N performance parameters, (2) score each of the pairs to produce pair scores, and (3) sum the pair scores to produce a model score; also to implement the model with the highest score and use the implemented model to repeatedly classify, over time, a state of a specific module of a specific light source as requiring maintenance or not requiring maintenance; and to perform maintenance of the specific module when indicated by the model, wherein M is an integer greater than one and N is an integer greater than two.

IPC Classes  ?

• G06N 20/00 - Machine learning
• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
• G06N 5/01 - Dynamic search techniquesHeuristicsDynamic treesBranch-and-bound
• H01S 3/00 - Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
• H01S 3/225 - Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
• H01S 3/23 - Arrangement of two or more lasers not provided for in groups , e.g. tandem arrangement of separate active media
• H01S 3/30 - Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range using scattering effects, e.g. stimulated Brillouin or Raman effects

Abstract

A system includes: an optical pulse stretcher including: a first reflective optical element: a second reflective optical element; and an optical coupling system, where a distance between the first reflective optical element and the second reflective optical element defines a separation distance in an optical cavity, and the optical coupling system is configured to bring pulses of light into the cavity and to allow pulses of light to exit the cavity. The system also includes an actuation system configured to control the separation distance; a sensor configured to produce data related to at least two pulses of light that exit the cavity; and a control system coupled to the actuation system, where the control system is configured to control the actuation system and the separation distance based on the data.

IPC Classes  ?

• H01S 3/00 - Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
• G02B 17/00 - Systems with reflecting surfaces, with or without refracting elements
• G02B 26/00 - Optical devices or arrangements for the control of light using movable or deformable optical elements
• H01S 3/225 - Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
• H01S 3/23 - Arrangement of two or more lasers not provided for in groups , e.g. tandem arrangement of separate active media

Abstract

An apparatus includes: a magnetic switching network configured to activate an excitation mechanism in a discharge chamber. The magnetic switching network includes: an initial energy storage node configured to receive electrical current from an electrical charger; an additional energy storage node; and at least one electrical element between the initial energy storage node and the additional energy storage node. The apparatus also includes an electronic network electrically connected to the additional energy storage node, the electronic network configured to control a voltage at the additional energy storage node.

IPC Classes  ?

• H01S 3/097 - Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
• G03F 7/20 - ExposureApparatus therefor
• H01S 3/10 - Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
• H01S 3/23 - Arrangement of two or more lasers not provided for in groups , e.g. tandem arrangement of separate active media
• H01S 3/225 - Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex

Abstract

A method for controlling a light source includes: operating the light source in idle mode in which the light source does not produce any radiation; receiving a request from a photolithography exposure apparatus to enter production mode, the production mode including the light source producing radiation and supplying the radiation to the photolithography exposure apparatus; upon receipt of the request to enter production mode, initiating cold start if an idle parameter is exceeded, cold start indicating that an efficiency of the light source is lower than a nominal efficiency required by the photolithography exposure apparatus for exposing the substrate to radiation from the light source; and automatically adjusting the idle parameter based on a model of characteristics that are associated with cold start, the model developed from prior operating data of the light source.

IPC Classes  ?

• G03F 7/20 - ExposureApparatus therefor
• H01S 3/134 - Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the active medium, e.g. by controlling the processes or apparatus for excitation in gas lasers

Abstract

Disclosed is an apparatus and method in which one or more trained classifiers are used to determine whether to perform an automated containment action and, if an automated containment action is to be performed, which automated containment action is to be performed with less invasive automated containment actions being performed first and more invasive automated containment actions subsequently being performed only of the less invasive automated containment actions are ineffective. Also disclosed is an apparatus and method in which a first data type is used to train a first classifier which is then used to obtain a first classification and then the first classification is used to train a second classifier to classify a second data type.

IPC Classes  ?

• H01S 3/10 - Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
• H01S 3/13 - Stabilisation of laser output parameters, e.g. frequency or amplitude
• G05B 19/18 - Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form
• H01S 3/22 - Gases

Abstract

A radiation source includes a chamber, a window, and a conduit system. The chamber confines a gas and contaminants produced during the generation of radiation. The window isolates the gas from an environment external to the chamber and allows the radiation to travel between the gas chamber and the environment. The refill path allows a replacement of the gas. The conduit system directs a flow of one of a refill gas, the gas, or the refill gas and the gas at least during a refill operation to prevent the contaminant from contacting the window. The conduit system may include one or more unidirectional valves which may be magnetic check valves. A permanent magnet component of the magnetic check valve may be disposed external to the conduit and the chamber so that the permanent magnet component is not subjected to corrosion by the gas in the conduit or the chamber.

IPC Classes  ?

• H01S 3/036 - Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering or replenishingMeans for circulating the gas, e.g. for equalising the pressure within the tube
• H01S 3/034 - Optical devices within, or forming part of, the tube, e.g. windows, mirrors
• H01S 3/225 - Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
• F16K 31/08 - Operating meansReleasing devices electricOperating meansReleasing devices magnetic using a magnet using a permanent magnet
• H01S 3/03 - Constructional details of gas laser discharge tubes
• H01S 3/0971 - Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited
• H01S 3/104 - Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation in gas lasers

Abstract

Systems for maintaining light sources for semiconductor photolithography in which a module making up part of the light source is evaluated at various pulse counts to produce a binary prediction as to whether the module is sufficiently likely to operate without failure in an ensuing sequence of pulses. The binary prediction may be made by a machine learning model trained on metrics extracted from measurements taken on deinstalled modules. A group of models, each trained differently, can be made available according to a selection made by the user or according to the maintenance objectives of the user.

IPC Classes  ?

• G03F 7/20 - ExposureApparatus therefor
• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor

Abstract

Disclosed is an apparatus for adjusting the position or orientation of an internal component across a pressurized wall in a system sealed to contain a controlled internal environment, wherein a through-the-wall adjuster projecting out of the system through the pressurized wall includes a concertinaed connector. Also disclosed is a lithographic apparatus including the through-the-wall adjuster. Also disclosed is an apparatus for adjusting the position or orientation of an internal component across a pressurized wall in a system sealed to contain a controlled internal environment, wherein rotation around a first axis of part of a through-the-wall adjuster projecting out of the system through the pressurized wall results in rotation about a different axis inside the sealed system through the use of a concertinaed coupling element.

IPC Classes  ?

• G02B 7/22 - Extensible connections, e.g. bellows
• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor

Abstract

A control apparatus for a light source including a plurality of gas discharge chambers with a blower being arranged in each gas discharge chamber. The control apparatus includes: a fault monitoring module configured to, at regular intervals of usage of the light source, monitor one or more operating conditions of the light source, and, for each monitored operating condition, determine a fault status and a fault type that relates to which blower of a gas discharge chamber influences the monitored operating condition; and a control module configured to receive the determined fault statuses and the determined fault types from the fault monitoring module; select at least one gas discharge chamber; and send an instruction to the blower in the selected at least one gas discharge chamber, the instruction being based on the determined fault statuses and the determined fault types.

IPC Classes  ?

• H01S 3/134 - Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the active medium, e.g. by controlling the processes or apparatus for excitation in gas lasers
• H01S 3/036 - Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering or replenishingMeans for circulating the gas, e.g. for equalising the pressure within the tube
• H01S 3/00 - Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
• H01S 3/10 - Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
• H01S 3/104 - Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation in gas lasers
• H01S 3/13 - Stabilisation of laser output parameters, e.g. frequency or amplitude
• H01S 3/225 - Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
• H01S 3/23 - Arrangement of two or more lasers not provided for in groups , e.g. tandem arrangement of separate active media

Abstract

A deep ultraviolet laser system includes a line narrowing module including a plurality of prisms such that an incoming laser beam from a laser first interacts with a first prism, then interacts with a second prism after the first prism. The second prism includes two different portions including a first portion designed to work with and enable higher bandwidths of the incoming laser beam and a second portion designed to work with and enable lower bandwidths of the incoming laser beam. The second prism is movable between a first position in which the laser beam interacts with the first portion and a second position in which the laser beam interacts with the first portion. The second prism is movable by translation using an activation mechanism controlled by a controller to vary a target bandwidth of the laser beam.

IPC Classes  ?

• H01S 3/08 - Construction or shape of optical resonators or components thereof
• H01S 3/1055 - Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the mutual position or the reflecting properties of the reflectors of the cavity one of the reflectors being constituted by a diffraction grating
• H01S 3/225 - Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
• G01J 3/14 - Generating the spectrumMonochromators using refracting elements, e.g. prism
• G01J 3/06 - Scanning arrangements
• G01J 3/02 - SpectrometrySpectrophotometryMonochromatorsMeasuring colours Details
• G02B 27/42 - Diffraction optics

Abstract

Photolithography. Perform source mask optimization SMO for a plurality of laser spectra. Generate training data by determining for each optimized source-mask-combination performance metrics such as EPE, CDU, LER, LWR, DOF, NILS for the different laser spectra. Train a machine learning ML model to determine an optimal laser spectrum based on the generated training data. Predict optimal spectra for production design layouts using the trained ML model.

IPC Classes  ?

• G03F 7/20 - ExposureApparatus therefor
• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor

Abstract

A method of and apparatus for optimizing cold start conditioning of a laser with one or more chambers, is provided. The method of and apparatus invoke cold start conditioning procedures when restarting a laser with one or more chambers after an idle period. One or more of various parameters such as the chamber age and the duration of the idle period preceding restarting the laser may be used to determine whether or what type of cold start conditioning should be performed.

IPC Classes  ?

• H01S 3/134 - Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the active medium, e.g. by controlling the processes or apparatus for excitation in gas lasers
• H01S 3/225 - Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex

Abstract

A method for improving a lithographic process of imaging a portion of a design layout onto a substrate using a lithographic apparatus. The method includes computing a multi-variable cost function that is a function of: (i) a plurality of design variables that affect characteristics of the lithographic process and (ii) a radiation bandwidth of a radiation source of the lithographic apparatus; and reconfiguring one or more of the characteristics (e.g., EPE, image contrast, resist, etc.) of the lithographic process by adjusting one or more of the design variables (e.g., source, mask layout, bandwidth, etc.) until a termination condition is satisfied. The termination condition includes a speckle characteristic (e.g., a speckle contrast) maintained within a speckle specification associated with the radiation source and also maintaining an image contrast associated with the lithographic process within a desired range. The speckle characteristic being a function of the radiation bandwidth.

IPC Classes  ?

• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
• G03F 7/20 - ExposureApparatus therefor

Abstract

Apparatus for and methods of rapidly achieving a target peak wavelength separation in a system for producing laser radiation at more than one wavelength (color) in which one or more actuators control wavelength in response to being supplied with a waveform. The characteristics of the waveform are determined using a model reference control system.

IPC Classes  ?

• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
• H01S 3/13 - Stabilisation of laser output parameters, e.g. frequency or amplitude
• H01S 3/225 - Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex

Abstract

A radiation system for controlling pulses of radiation comprising an optical element configured to interact with the pulses of radiation to control a characteristic of the pulses of radiation, an actuator configured to actuate the optical element according to a control signal received from a controller, the control signal at least partially depending on a reference pulse repetition rate of the radiation system and, a processor configured to receive pulse information from the controller and use the pulse information to determine an adjustment to the control signal. The radiation system may be used to improve an accuracy of a lithographic apparatus operating in a multi-focal imaging mode.

IPC Classes  ?

• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
• H01S 3/08 - Construction or shape of optical resonators or components thereof
• H01S 3/10 - Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating

Abstract

In some general aspects, an apparatus for a light source includes: a monitoring module configured to monitor a fault status of one or more operating conditions of the light source; a decrement module configured to reduce an operating speed of a blower arranged in a gas discharge chamber of the light source if the fault status relating to one or more operating conditions of the light source is clear and if the decreased operating speed would be at or above a baseline speed; and an increment module configured to increase the operating speed of the blower if the fault status relating to one or more operating conditions of the light source is flagged. The blower is configured to displace a gas mixture including a gain medium from an energy source within the gas discharge chamber, the energy source configured to supply energy to the gas mixture.

IPC Classes  ?

• H01S 3/036 - Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering or replenishingMeans for circulating the gas, e.g. for equalising the pressure within the tube
• H01S 3/225 - Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
• H01S 3/104 - Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation in gas lasers

Abstract

A pulsed power circuit (30, 31, 32) including an inductor (55) having a hybrid core of a switch magnetic material arranged and selected to function as a magnetic switch a damping magnetic material arranged and selected to damp energy reflections without interfering with the switch magnetic material functioning as a magnetic switch so that the circuit can mitigate resonances caused by reflected energy without any significant degradation of its switching function as part of an saturable reactor inductor.

IPC Classes  ?

• H01S 3/097 - Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
• H03K 3/45 - Generators characterised by the type of circuit or by the means used for producing pulses by the use, as active elements, of non-linear magnetic or dielectric devices
• H01F 21/08 - Variable inductances or transformers of the signal type continuously variable, e.g. variometers by varying the permeability of the core, e.g. by varying magnetic bias
• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor

Abstract

Disclosed is an apparatus for and method of permitting automatic alignment of optical components in the beam path of a laser. Images of the beam are obtained at one or more positions in the beam path. Alignment and possibly other information is derived from the images and then actuators are controlled to alter the alignment of the optical components in the beam path based on the derived information.

IPC Classes  ?

• G02B 7/00 - Mountings, adjusting means, or light-tight connections, for optical elements
• B23K 26/04 - Automatically aligning, aiming or focusing the laser beam, e.g. using the back-scattered light
• B23K 26/70 - Auxiliary operations or equipment
• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor

Abstract

One or more properties of an electrical quantity are determined based on one or more operating characteristics of an optical system that includes a laser system; an impedance of a magnetic core of a magnetic switching network is adjusted by providing the electrical quantity to a coil that is magnetically coupled to the magnetic core; and after adjusting the impedance of the magnetic core, a pulse of light is produced. Producing the pulse of light includes: saturating the magnetic core such that an electrical pulse is provided to an excitation mechanism of the laser system.

IPC Classes  ?

• H01S 3/091 - Processes or apparatus for excitation, e.g. pumping using optical pumping
• H01S 3/23 - Arrangement of two or more lasers not provided for in groups , e.g. tandem arrangement of separate active media
• H01S 3/225 - Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
• H01S 3/094 - Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light
• H01F 27/24 - Magnetic cores

Abstract

Apparatus for and method of aligning optical components such as beam splitters in an optical pulse stretcher in which a landing spot of a beam which has traversed a portion of the optical beam splitter and a coincident landing spot of a beam split from a retroreflected input beam are made to align on a target spot. Also disclosed is an apparatus and method for aligning the retroreflector to facilitate proper beam alignment. A fluorescent material may be used to render a beam landing spot visible.

IPC Classes  ?

• H01S 3/00 - Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
• G02B 17/08 - Catadioptric systems
• G02B 27/14 - Beam splitting or combining systems operating by reflection only
• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor

Abstract

Apparatus for and method of aligning optical components such as mirrors to facilitate proper beam alignment using an image integration optical system is used to integrate images from multiple optical features such as from both left mirror bank and right mirror bank to present the images simultaneously to the camera system. A fluorescent material may be used to render a beam footprint visible and the relative positions of the footprint and an alignment feature may be used to align the optical feature.

IPC Classes  ?

• H01S 3/00 - Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
• G02B 5/20 - Filters
• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor

Abstract

Apparatus for and methods of controlling wavelength in a system for producing laser radiation at more than one wavelength (color) in which one or more actuators control wavelength in response to being supplied with a waveform. The characteristics of the waveform, and/or of a controller for controlling the waveform, are determined based on a current repetition rate of the laser. A current repetition rate is determined and if it is new then a new waveform is commanded. Also disclosed is a system in which a correction depending on repetition rate is applied to an ILC algorithm determining a wavelength.

IPC Classes  ?

• H01S 3/225 - Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
• H01S 3/10 - Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
• H01S 3/13 - Stabilisation of laser output parameters, e.g. frequency or amplitude
• H01S 3/08 - Construction or shape of optical resonators or components thereof

Abstract

A system includes first and second sections. The first section includes an elongated plate including a squared edge, a tapered edge, a first surface, a second surface, and first and second extensions extending from the second surface. The second section includes first and second chambers with a dividing wall between the first and second chambers, the first chamber including a planar surface and the second chamber including a sloped surface disposed opposite the tapered edge. The system includes first and second end plates to secure the first section above the second section such that the dividing wall is interposed between the first and second extensions.

IPC Classes  ?

• B01D 45/06 - Separating dispersed particles from gases or vapours by gravity, inertia, or centrifugal forces by utilising inertia by reversal of direction of flow
• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor

Abstract

An optical component includes: a calcium fluoride substrate including an atomically-smooth substrate surface that forms at least a portion of an optically-interacting surface; and a sealant layer covering the atomically-smooth substrate surface to thereby form a smooth interface between the calcium fluoride substrate and the sealant layer. A profile roughness parameter Ra of the atomically-smooth substrate surface defined as a mean deviation of a profile of the atomically-smooth substrate surface is within a range of 0.01 nanometers (nm) to and including 0.17 nm.

IPC Classes  ?

• G03F 7/20 - ExposureApparatus therefor
• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
• G03F 1/82 - Auxiliary processes, e.g. cleaning

Abstract

An apparatus for and method of reducing the effects of vibrations on components in modules of a deep ultraviolet light source. The components are provided with sensors (325,335) to sense vibration waveforms and actuators (320,330) for applying a waveform opposed to and so cancelling the vibration waveform. In addition to application of active noise (vibration) cancellation the vibration waveform resulting from active vibration suppression is analyzed to identify residual vibrations to determine characteristics of a residual vibration cancelling waveform.

IPC Classes  ?

• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
• F16F 15/02 - Suppression of vibrations of non-rotating, e.g. reciprocating, systemsSuppression of vibrations of rotating systems by use of members not moving with the rotating system

Abstract

An optical pulse stretcher apparatus includes: a hermetically-sealed container including one or more walls that define an interior cavity that is maintained, in operation, at a controlled environment, at least one wall having one or more windows, each window configured to pass one or more of a pulsed light beam and a stretched pulsed light beam; an optical stretcher arranged within the interior cavity and configured to receive a pulsed light beam and generate at least one stretched pulsed light beam: and one or more actuation devices. Each actuation device physically communicates with an optical element within the interior cavity and includes an adjustment mechanism external to the hermetically-sealed container. The adjustment mechanism enables adjustment of one or more physical properties of the optical element in physical communication with the actuation device without disrupting the controlled environment within the interior cavity.

IPC Classes  ?

• H01S 3/00 - Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
• G02B 27/00 - Optical systems or apparatus not provided for by any of the groups ,
• G02B 27/62 - Optical apparatus specially adapted for adjusting optical elements during the assembly of optical systems
• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor

Abstract

An apparatus for a light source includes: an electrical insulator that defines a channel; a gasket that surrounds at least a portion of the electrical insulator; and a shield between the channel and the gasket. The channel is configured to receive an electrical conductor. The gasket includes a non-metallic material.

IPC Classes  ?

• H05K 9/00 - Screening of apparatus or components against electric or magnetic fields
• H01S 3/038 - Electrodes, e.g. special shape, configuration or composition
• H01S 3/10 - Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
• H01S 3/225 - Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex

Abstract

A computing device including a display screen is at a photolithography exposure facility. The facility includes one or more photolithography exposure apparatuses. The computing device is configured to display on the display screen: a status region including one or more status indicators, each status indicator associated with an ultraviolet (UV) light source configured to supply light to a respective photolithography exposure apparatus of the one or more photolithography apparatuses; a graph region including one or more graphs, each graph displaying information relating to the one or more status indicators; and a filtering region including one or more menu items selectable to control the information displayed in the status region and/or in the one or more graphs.

IPC Classes  ?

• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
• G06F 3/0483 - Interaction with page-structured environments, e.g. book metaphor
• G06F 3/04847 - Interaction techniques to control parameter settings, e.g. interaction with sliders or dials

Abstract

A method is performed for scheduling a calibration relating to an optical device in a light source. The method can be performed by a calibration system including a calibration apparatus and a prediction controller. The method includes: receiving a property associated with the optical device while the optical device is being calibrated; calculating a current degradation metric based at least on the optical device property, the degradation metric modeling behavior of the optical device; estimating when a degradation of the optical device would exceed a threshold based on the current degradation metric; and scheduling a calibration of the optical device based at least in part on the estimate of optical device degradation.

IPC Classes  ?

• G01J 3/28 - Investigating the spectrum
• G01J 3/02 - SpectrometrySpectrophotometryMonochromatorsMeasuring colours Details
• G03F 7/20 - ExposureApparatus therefor
• H01S 3/00 - Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
• H01S 3/225 - Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
• H01S 3/10 - Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating

Abstract

Apparatus for and method of aligning optical components such as mirrors to facilitate proper beam alignment using an image integration optical system is used to integrate images from multiple optical features such as from both left mirror bank and right mirror bank to present the images simultaneously to the camera system. A fluorescent material may be used to render a beam footprint visible and the relative positions of the footprint and an alignment feature may be used to align the optical feature.

IPC Classes  ?

• H01S 3/00 - Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
• G02B 5/20 - Filters
• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
• G03F 7/20 - ExposureApparatus therefor

Abstract

The present disclosure is directed to systems and methods for controlling a center wavelength. In one example, a method includes estimating a center wavelength error. The method also includes determining a first actuation amount for a first actuator controlling movement a first prism based on the estimated center wavelength error. The method also includes actuating the first actuator based on the actuation amount. The method also includes determining whether the first prism is off-center. The method also includes, in response to determining that the first prism is off-center, determining a second actuation amount for the first actuator and determining a third actuation amount for a second actuator for controlling movement of a second prism. The method also includes actuating the first actuator and the second actuator based on the second and third actuation amounts, respectively. The method finds application in multi-focal imaging operations.

IPC Classes  ?

• H01S 3/13 - Stabilisation of laser output parameters, e.g. frequency or amplitude
• G03F 7/20 - ExposureApparatus therefor
• H01S 3/08 - Construction or shape of optical resonators or components thereof

Abstract

A light source includes one or more modules that together are configured to produce a light beam for semiconductor photolithography. An apparatus for maintaining the light source includes: a prediction unit and an ensemble unit. The prediction unit is configured to: receive a plurality of sub-feature datasets, each sub-feature dataset associated with a unique performance criterion of the light source; and for each sub-feature dataset, evaluate whether a failure mode is detected in the light source in a prediction increment. The ensemble unit is configured to: receive the plurality of evaluations from the prediction unit; and for each failure mode, determine which one or more performance criterion is related to the failure mode based on the associated sub-feature dataset of that failure mode.

IPC Classes  ?

• G03F 7/20 - ExposureApparatus therefor

Abstract

An apparatus includes: an estimation system configured to: determine a set of values related to an initial light beam based on sensed wavefronts of the initial light beam, the set of values including a first value and a second value. The estimation system is also configured to determine an estimate of a property of an exposure light beam based on a non-linear relationship that includes the first value and the second value. The exposure light beam is formed by interacting the initial light beam with an optical system. The apparatus also includes a communications module coupled to the estimation system and configured to output the estimate of the property of the exposure light beam.

IPC Classes  ?

• G03F 7/20 - ExposureApparatus therefor

Abstract

A metrology apparatus includes: a probe apparatus configured to produce a probe in a vicinity of an optical element that is in fluid communication with a gain medium of a gas discharge chamber and is exposed to one or more dust particles; a detection apparatus configured to detect an interaction between the probe and one or more dust particles, and to produce an output signal based on the detected interaction; and a processing apparatus configured to receive the output signal and to estimate a property of the one or more dust particles.

IPC Classes  ?

• G01N 15/06 - Investigating concentration of particle suspensions
• G01N 21/53 - Scattering, i.e. diffuse reflection within a body or fluid within a flowing fluid, e.g. smoke
• G01N 21/94 - Investigating contamination, e.g. dust
• H01S 3/034 - Optical devices within, or forming part of, the tube, e.g. windows, mirrors
• H01S 3/225 - Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
• G01N 21/15 - Preventing contamination of the components of the optical system or obstruction of the light path

Abstract

Disclosed is an apparatus and method for use in a system in which light pulses of different wavelengths are generated by moving an optical element connected to an actuator and in which the actuator is driven by a command voltage having a threshold cap depending on a position of a pulse in a burst of pulses.

IPC Classes  ?

• G03F 7/20 - ExposureApparatus therefor

Abstract

A pulsed-discharge radiation source includes a gas chamber, a window, and a conduit system. The conduit system includes a refill path and a conduit. The pulsed-discharge radiation source generates radiation. The gas chamber confines a gas and contaminants produced during the generation of radiation. The window isolates the gas from an environment external to the gas chamber and allows the radiation to travel between the gas chamber and the environment. The refill path allows a replacement of the gas. The conduit circulates the gas to or from the gas chamber during the generating. The conduit system directs a flow of one of a refill gas, the gas, or the refill gas and the gas at least during a refill operation to prevent the contaminant from contacting the window, whereby the conduit system increases the usable lifetime of at least the window.

IPC Classes  ?

• H01S 3/036 - Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering or replenishingMeans for circulating the gas, e.g. for equalising the pressure within the tube
• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
• H01S 3/034 - Optical devices within, or forming part of, the tube, e.g. windows, mirrors
• H01S 3/225 - Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex

Abstract

A set of the pulses of light in a light beam is passed through a mask toward a wafer during a single exposure pass; at least a first aerial image and a second aerial image on the wafer based on pulses of light in the set of pulses that pass through the mask is generated during a single exposure pass, the first aerial image is at a first plane on the wafer and the second aerial image is at a second plane on the wafer, the first plane and the second plane being spatially distinct from each other and separated from each other by a separation distance along the direction of propagation; and a three-dimensional semiconductor component is formed.

IPC Classes  ?

• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor

Abstract

Information relating to an etalon is accessed, the etalon being associated with a calibration parameter having a pre-set default value, the etalon being configured to produce an interference pattern including a plurality of fringes from a received light beam, and the information relating to the etalon including first spatial information related to a first fringe of the plurality of fringes and second spatial information related to a second fringe of the plurality of fringes. A first wavelength value of the received light beam is determined based on the spatial information related to the first fringe and an initial value of the calibration parameter. A second wavelength value of the received light beam is determined based on the spatial information related to the second fringe and the initial value of the calibration parameter. The first wavelength value and the second wavelength value are compared to determine a measurement error value.

IPC Classes  ?

• G01B 9/02055 - Reduction or prevention of errorsTestingCalibration
• G01J 3/28 - Investigating the spectrum
• G01J 3/26 - Generating the spectrumMonochromators using multiple reflection, e.g. Fabry-Perot interferometer, variable interference filter
• G01J 9/02 - Measuring optical phase differenceDetermining degree of coherenceMeasuring optical wavelength by interferometric methods
• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor

Abstract

Disclosed are apparatus for and methods of passivating a first electrode normally serving as a cathode in a laser discharge chamber also including a second electrode normally serving as an anode by supplying reversed polarity pulses to the first electrode either during part of a chamber manufacturing passivation procedure or intermittently or on demand after the chamber has been put in service.

IPC Classes  ?

• H01S 3/225 - Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex

Abstract

A spectral feature selection apparatus includes a dispersive optical element arranged to interact with a pulsed light beam; three or more refractive optical elements arranged in a path of the pulsed light beam between the dispersive optical element and a pulsed optical source; and one or more actuation systems, each actuation system associated with a refractive optical element and configured to rotate the associated refractive optical element to thereby adjust a spectral feature of the pulsed light beam. At least one of the actuation systems is a rapid actuation system that includes a rapid actuator configured to rotate its associated refractive optical element about a rotation axis. The rapid actuator includes a rotary stepper motor having a rotation shaft that rotates about a shaft axis that is parallel with the rotation axis of the associated refractive optical element.

IPC Classes  ?

• G02B 26/00 - Optical devices or arrangements for the control of light using movable or deformable optical elements
• G01J 3/06 - Scanning arrangements
• G01J 3/14 - Generating the spectrumMonochromators using refracting elements, e.g. prism
• G01J 3/18 - Generating the spectrumMonochromators using diffraction elements, e.g. grating
• G02B 5/04 - Prisms
• G02B 27/12 - Beam splitting or combining systems operating by refraction only
• G02B 27/14 - Beam splitting or combining systems operating by reflection only
• G02B 27/42 - Diffraction optics
• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
• H01L 21/027 - Making masks on semiconductor bodies for further photolithographic processing, not provided for in group or
• H01S 3/00 - Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
• H01S 3/08 - Construction or shape of optical resonators or components thereof
• H01S 3/23 - Arrangement of two or more lasers not provided for in groups , e.g. tandem arrangement of separate active media
• G01J 3/12 - Generating the spectrumMonochromators
• H01S 3/225 - Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex

Abstract

One or both of the confronting discharge surfaces of the cathode and anode electrodes in a laser discharge chamber, that is, the surfaces between which the plasma is struck, are provided with an engineered surface structure forming distributed discharge initiation or nucleation sites in order to effect control over the discharge process.

IPC Classes  ?

• H01S 3/038 - Electrodes, e.g. special shape, configuration or composition
• H01S 3/097 - Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
• H01S 3/225 - Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
• G03F 7/20 - ExposureApparatus therefor
• H01S 3/0971 - Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited
• H01S 3/23 - Arrangement of two or more lasers not provided for in groups , e.g. tandem arrangement of separate active media

Abstract

A light source apparatus (100) includes: a chamber (101) having a chamber wall (103) defining an opening (107); and a support apparatus (110) including a support device (111) positioned within the opening of the chamber wall. The support device includes: a cup (112) having an inner surface (114) configured to retain a movable apparatus and an outer surface (116) having a first outer diameter; and a plurality of rods (118) arranged at the outer surface of the cup such that the arrangement of the plurality of rods defines a second outer diameter, the second outer diameter greater than the first outer diameter. The chamber wall is configured to hold the support device such that the chamber wall contacts the plurality of rods when the support device is positioned within the opening of the chamber wall, and the outer surface of the cup does not contact the chamber wall.

IPC Classes  ?

• H01S 3/036 - Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering or replenishingMeans for circulating the gas, e.g. for equalising the pressure within the tube
• F16C 19/06 - Bearings with rolling contact, for exclusively rotary movement with bearing balls essentially of the same size in one or more circular rows for radial load mainly with a single row of balls
• F16C 35/04 - Rigid support of bearing unitsHousings, e.g. caps, covers in the case of ball or roller bearings
• H01J 61/02 - Gas-discharge or vapour-discharge lamps Details
• H01J 61/16 - Selection of substances for gas fillingsSpecified operating pressure or temperature having helium, argon, neon, krypton, or xenon as the principle constituent
• H01J 61/30 - VesselsContainers
• H01J 61/52 - Cooling arrangementsHeating arrangementsMeans for circulating gas or vapour within the discharge space
• H01S 3/225 - Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex

Abstract

In some general aspects, a light beam control apparatus includes: a spectral feature actuator associated with a set of different states, each state configured to cause an optical apparatus to generate one or more pulses of a light beam at a discrete value of a spectral feature of the light beam; and a controller in communication with the spectral feature actuator. The controller includes: an actuator drive module configured to cause the spectral feature actuator to transition among the set of different states according to a control waveform; a waveform module configured to compute the control waveform for the spectral feature actuator that governs the transition among the set of discrete values; and a predictive module configured to receive one or more sensed aspects of the spectral feature actuator and instruct the waveform module to adjust the control waveform based on the received sensed aspects.

IPC Classes  ?

• H01S 3/10 - Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating

Abstract

A method includes driving, while producing a burst of pulses at a pulse repetition rate, a spectral feature adjuster among a set of discrete states at a frequency correlated with the pulse repetition rate; and in between the production of the bursts of pulses (while no pulses are being produced), driving the spectral feature adjuster according to a driving signal defined by a set of parameters. Each discrete state corresponds to a discrete value of a spectral feature. The method includes ensuring that the spectral feature adjuster is in one of the discrete states that corresponds to a discrete value of the spectral feature of the amplified light beam when a pulse in the next burst is produced by adjusting one or more of: an instruction to the lithography exposure apparatus, the driving signal to the spectral feature adjuster, and/or the instruction to the optical source.

IPC Classes  ?

• G03F 7/20 - ExposureApparatus therefor
• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
• H01S 3/07 - Construction or shape of active medium consisting of a plurality of parts, e.g. segments
• H01S 3/08 - Construction or shape of optical resonators or components thereof
• H01S 3/11 - Mode lockingQ-switchingOther giant-pulse techniques, e.g. cavity dumping
• H01S 3/13 - Stabilisation of laser output parameters, e.g. frequency or amplitude
• H01S 3/137 - Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling devices placed within the cavity for stabilising of frequency
• H01S 3/23 - Arrangement of two or more lasers not provided for in groups , e.g. tandem arrangement of separate active media

Abstract

Systems, apparatuses, methods, and computer program products are provided for controlling a laser source that includes two laser discharge chambers. An example laser control system can include a first pulsed powertrain including a first independent circuit configured to generate a first resonant charging supply (RCS) output voltage. The first RCS output voltage can be configured to drive a first laser discharge chamber. The example laser control system can further include a second pulsed powertrain including a second independent circuit configured to generate a second RCS output voltage independent from the first RCS output voltage. The second RCS output voltage can be configured to drive a second laser discharge chamber independent from the first laser discharge chamber.

IPC Classes  ?

• H01S 3/097 - Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
• H01S 3/23 - Arrangement of two or more lasers not provided for in groups , e.g. tandem arrangement of separate active media
• H01S 3/104 - Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation in gas lasers
• H01S 3/10 - Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating

Abstract

A pulsed power circuit including one or more magnetic switches respectively implemented as one or more inductors having saturable cores wherein, after a discharge pulse, each saturable core is repeatably reset to an initial bias point on its magnetization curve by a reset pulse having variable characteristics determined, for example, by chamber operating conditions so that the saturable core is able to function reliably and consistently.

IPC Classes  ?

• H01S 3/225 - Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
• H01S 3/097 - Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
• H01S 3/23 - Arrangement of two or more lasers not provided for in groups , e.g. tandem arrangement of separate active media
• H01S 3/13 - Stabilisation of laser output parameters, e.g. frequency or amplitude
• H01S 3/134 - Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the active medium, e.g. by controlling the processes or apparatus for excitation in gas lasers
• H01S 3/10 - Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
• H01S 3/0975 - Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser using inductive or capacitive excitation

Abstract

Provided is a light source apparatus and an electrode design for use in a discharge chamber of the light source apparatus. The discharge chamber is configured to hold a gas discharge medium configured to output a light beam. The light source apparatus include a pair of opposed electrodes configured to excite a gas medium to form a discharge plasma. At least one electrode of the pair of opposing electrodes may include recessed portions or hollowed-out portions at each end of the electrode, or at other suitable locations. The disclosed electrode structures improve uniformity of the erosion profile of the electrodes, significantly extending the lifespan of the discharge chamber by redistributing the discharge particle flux through the electrode with an optimized design of the electrode geometry, as the local discharge particle flux is reduced at the recessed portions.

IPC Classes  ?

• H01S 3/038 - Electrodes, e.g. special shape, configuration or composition
• H01S 3/036 - Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering or replenishingMeans for circulating the gas, e.g. for equalising the pressure within the tube
• H01S 3/225 - Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
• G03F 7/20 - ExposureApparatus therefor
• H01S 3/134 - Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the active medium, e.g. by controlling the processes or apparatus for excitation in gas lasers
• H01S 3/034 - Optical devices within, or forming part of, the tube, e.g. windows, mirrors

Abstract

An apparatus includes a decision module that is configured to: receive a performance metric relating to performance conditions of an optical system emitting a light beam; estimate, based on the performance metric and a predetermined learning model, an effectiveness of a proposed change to the optical system; and output a change command to the optical system if it is estimated that the proposed change to the optical system would be effective.

IPC Classes  ?

• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor

Abstract

A system for deep ultraviolet (DUV) optical lithography includes an optical source apparatus including N optical oscillators, N being an integer number greater than or equal to two, and each of the N optical oscillators is configured to produce a pulse of light in response to an excitation signal; and a control system coupled to the optical source apparatus. The control system is configured to determine a corrected excitation signal for a first one of the N optical oscillators based on an input signal, the input signal including an energy property of a pulse of light produced by another one of the N optical oscillators.

IPC Classes  ?

• G03F 7/20 - ExposureApparatus therefor
• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor

Abstract

A prediction apparatus is in communication with an optical source configured to produce a pulsed light beam for use by a photolithography exposure apparatus. The prediction apparatus includes: a photolithography module in communication with the photolithography exposure apparatus and configured to receive an identifier, the received identifier lacking data relating to an actual firing pattern defining properties of the pulsed light beam; and an optical source module in communication with the optical source, the optical source module configured to provide a forecast firing pattern to the optical source. The forecast firing pattern is associated with and determined from the received identifier, and forecasts one or more properties of the actual firing pattern.

IPC Classes  ?

• G03F 7/20 - ExposureApparatus therefor

Abstract

A light source apparatus (200) includes a gas discharge stage (210) and a metal fluoride trap (300). The gas discharge stage includes an optical amplifier (206) and a set of optical elements (250, 260). The optical amplifier includes a chamber (211) configured to hold a gas discharge medium (213), the gas discharge medium outputting a light beam. The set of optical elements is configured to form an optical resonator around the optical amplifier. The metal fluoride trap is configured to trap metal fluoride dust generated from the gas discharge stage. The metal fluoride trap includes an electrostatic precipitator (320) and a packed-bed filter (400, 402, 404) disposed around the electrostatic precipitator. The packed-bed filter includes a plurality of beads configured (406, 408) to absorb metal fluoride dust (208).

IPC Classes  ?

• H01S 3/08 - Construction or shape of optical resonators or components thereof
• H01S 3/23 - Arrangement of two or more lasers not provided for in groups , e.g. tandem arrangement of separate active media
• H01S 3/104 - Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation in gas lasers
• G03F 7/20 - ExposureApparatus therefor
• H01S 3/22 - Gases
• B03C 3/41 - Ionising-electrodes
• B03C 3/155 - Filtration
• B03C 3/49 - Collecting-electrodes tubular