Abstract

An apparatus and method for generating a vapor with a compact vaporizer design and exposing the gas and liquid mixture for vaporization to a reduced maximum temperature. A gas and liquid droplet flow through a metal housing (110) configured to heat the gas and liquid droplet mixture flow for vaporization includes directing the gas and liquid droplet mixture through an inlet (120) of the metal housing and flowing the gas through a tortious flow path defined by a plurality of tubular flow passageways (180) arranged around a central axis for vaporization. The flow path is directed through a heat exchanger (410) including one more changes in direction of flow path before flowing into the further tortious flow path described above. Residual liquid droplets may be further vaporized by flowing through a second metal housing configured to heat the gas and liquid droplet mixture for vaporization and having a similar construction to the first metal housing and providing a second tortious flow path.

IPC Classes  ?

• B01D 1/06 - Evaporators with vertical tubes
• B01D 1/26 - Multiple-effect evaporating

Abstract

An apparatus and method for generating a vapor with a compact vaporizer design and exposing the gas and liquid mixture for vaporization to a reduced maximum temperature. A gas and liquid droplet flow through a metal housing configured to heat the gas and liquid droplet mixture flow for vaporization includes directing the gas and liquid droplet mixture through an inlet of the metal housing and flowing the gas through a tortious flow path defined by a plurality of tubular flow passageways arranged around a central axis for vaporization. The flow path is directed through a heat exchanger including one more changes in direction of flow path before flowing into the further tortious flow path described above. Residual liquid droplets may be further vaporized by flowing through a second metal housing configured to heat the gas and liquid droplet mixture for vaporization and having a similar construction to the first metal housing and providing a second tortious flow path.

IPC Classes  ?

• F01K 5/00 - Plants characterised by use of means for storing steam in an alkali to increase steam pressure, e.g. of Honigmann or Koenemann type
• F16T 1/00 - Steam traps or like apparatus for draining-off liquids from enclosures predominantly containing gases or vapours, e.g. gas lines, steam lines, containers
• F22B 1/28 - Methods of steam generation characterised by form of heating method in boilers heated electrically
• C23C 16/448 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials

Abstract

A method and apparatus for generating aerosol particles that are substantially uniform in size said apparatus includes a droplet generator comprised of a metal capillary for a liquid to flow through to form a liquid stream flowing into a gas stream. The metal capillary is vibrated by a piezoelectric ceramic at a substantially constant frequency to cause the liquid stream to breakup into droplets that are substantially uniform in size in the gas stream, the gas stream being maintained at a velocity in the range between approximately 10% to 100% of the speed of sound.

IPC Classes  ?

• B05B 7/00 - Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
• B05B 7/06 - Spray pistolsApparatus for discharge with one outlet orifice surrounding another approximately in the same plane
• B05B 17/06 - Apparatus for spraying or atomising liquids or other fluent materials, not covered by any other group of this subclass operating with special methods using ultrasonic vibrations
• B05B 5/03 - Discharge apparatus, e.g. electrostatic spray guns characterised by the use of gas
• B05B 17/00 - Apparatus for spraying or atomising liquids or other fluent materials, not covered by any other group of this subclass

Abstract

An apparatus and method for generating vapor from a liquid precursor for a thin film deposition on a substrate includes an inlet 130 section in fluid communication with a downstream vaporization chamber 120 section. The inlet 130 section comprises a gas inlet for receiving gas from a gas source 180 through a gas flow sensor 202 and a gas flow control valve 230 and a liquid inlet 150 for receiving liquid from a liquid source 220 through a liquid flow sensor 210 and a liquid flow control valve 230. An electronic controller 600 controls the gas and liquid flow control valves 230 thereby controlling the rates of gas and liquid flow into the inlet 130 section to generate vapor in the downstream vaporization chamber 120 section for thin film deposition on the substrate.

IPC Classes  ?

• H01L 21/205 - Deposition of semiconductor materials on a substrate, e.g. epitaxial growth using reduction or decomposition of a gaseous compound yielding a solid condensate, i.e. chemical deposition

Abstract

The present disclosure relates to an apparatus 10 and a method for forming a droplet aerosol for vaporization and subsequent thin film deposition on a substrate. The apparatus 10 includes a mechanism to control the rate of liquid flow through the apparatus 10, the mechanism including a piezoelectric actuator 240 to adjust the rate of liquid flow and an atomizing mechanism drawing gas from a compressed gas source 70 such that when the gas source conjoins with the liquid, the liquid is atomized to form droplets suspended in the gas thereby forming a droplet aerosol suitable for subsequent thin film deposition on a substrate. The method includes drawing a gas from a compressed gas source and drawing a liquid from a liquid source. The liquid and gas are conjoined in either a coaxial flow relationship or a radial flow relationship or an angular relationship between radial and coaxial flow wherein the gas engages the liquid to form droplets suitable for vaporization and subsequent thin film deposition on a substrate.

IPC Classes  ?

• H01L 21/205 - Deposition of semiconductor materials on a substrate, e.g. epitaxial growth using reduction or decomposition of a gaseous compound yielding a solid condensate, i.e. chemical deposition

Abstract

The present disclosure describes a method and apparatus (90) for detecting particles in a gas by saturating the gas with vapor and causing the gas to flow through a chamber (410) with walls (440) that are at a temperature different than the temperature of the entering gas creating a gas turbulence within the chamber resulting in the gas becoming super- saturated with vapor and causing said super- saturated vapor to condense on said particles and form droplets, which are then detected and counted by an optical light-scattering detector (600).

IPC Classes  ?

• G01N 15/14 - Optical investigation techniques, e.g. flow cytometry
• G01N 21/47 - Scattering, i.e. diffuse reflection
• G01N 15/10 - Investigating individual particles

Abstract

An apparatus for vaporizing a liquid for subsequent thin film deposition on a substrate. The apparatus comprises a housing with an inlet and an outlet and a liquid reservoir. A mechanism controls the liquid level in the reservoir to a substantially constant level. A gas flow passageway extends along side a porous metal wall with interstitial spaces for containing liquid from the reservoir and with a package for a carrier gas to flow along side the porous metal wall, forming a gas/vapor mixture suitable for thin film deposition.

IPC Classes  ?

• B01D 47/00 - Separating dispersed particles from gases, air or vapours by liquid as separating agent

Goods & Services

Instruments and apparatus for determining the concentration and size range of particles carried in air and other fluids; particle impactors for classifying air borne particles into size ranges; personal environmental monitors; personal air sampler respirator for diesel smoke and coal dust; personal aerosol sampler; condensation particle counters; scientific apparatus, namely fog generators for clean room use; scientific and laboratory apparatus for deposing particles onto semiconductor wafers; filter leak detectors; filter efficiency measurement instruments; clean room air particle analyzers; sample recovery systems for particle impactors (scientific apparatus); scientific apparatus, namely pharmaceutical particle impactors; washers for particle impactors (scientific apparatus); aerosol particle differential mobility analyzers; aerosol concentrators for concentrating particles for scientific and laboratory use; aerosol size spectrometers. Aerosol generators.