LTC Co., Ltd.

Republic of Korea

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Date
2025 July 1
2025 (YTD) 2
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2022 1
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IPC Class
G03F 7/42 - Stripping or agents therefor 8
C11D 7/50 - Solvents 6
C11D 11/00 - Special methods for preparing compositions containing mixtures of detergents 5
C11D 7/32 - Organic compounds containing nitrogen 5
C08G 77/04 - Polysiloxanes 4
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Status
Pending 4
Registered / In Force 26
Found results for  patents

1.

HOW TO MOLD DIFFERENT TYPES OF MEDICAL PATCHES IN ONE PROCESS LINE

      
Application Number 18984859
Status Pending
Filing Date 2024-12-17
First Publication Date 2025-07-03
Owner LTY CO., Ltd (Republic of Korea)
Inventor Yang, Gyeongmo

Abstract

The present invention provides a method for molding medical patches using a medical patch molding apparatus including: a first process, which is an eye-mark recognition process for recognizing eye marks formed on the surface of a fabric sheet; a second process, which is a beveling process of compressing and thinning edges of a patch; and a third process, which is a complete cutting process of blanking a release sheet to form a handle part, wherein any one among the first to third processes is applied depending on the type of the patch, allowing different types of medical patches to be molded in a single process line.

IPC Classes  ?

2.

CARBON-REDUCED SOLAR STREET LAMP INCLUDING MOSS, OYSTER SHELL, AND RECYCLED RESIN, AND METHOD FOR PRODUCING SAME

      
Application Number KR2023018985
Publication Number 2025/070883
Status In Force
Filing Date 2023-11-23
Publication Date 2025-04-03
Owner MTC CO., LTD. (Republic of Korea)
Inventor Moon, Gwi Yeol

Abstract

The present invention relates to a carbon-reduced solar street lamp including moss, oyster shell, and recycled resin, and a method for producing same. Specifically, the present invention relates to the production of an antibacterial composition comprising metal powder, sea stone, nanocellulose, graphene, oyster shell, and water and provides a street lamp case including the composition.

IPC Classes  ?

  • C08K 13/08 - Ingredients of unknown constitution and ingredients covered by the main groups
  • C08K 13/02 - Organic and inorganic ingredients
  • C08K 3/015 - Biocides
  • C08K 3/08 - Metals
  • C08K 3/34 - Silicon-containing compounds
  • C08K 11/00 - Use of ingredients of unknown constitution, e.g. undefined reaction products
  • C08J 3/22 - Compounding polymers with additives, e.g. colouring using masterbatch techniques
  • C08K 3/04 - Carbon
  • C08L 101/00 - Compositions of unspecified macromolecular compounds
  • C08L 1/02 - CelluloseModified cellulose

3.

ANTIMICROBIAL COMPOSITION AND PEST-PROOF ANTIMICROBIAL LIGHTING COMPRISING SAME

      
Application Number KR2023007745
Publication Number 2024/214864
Status In Force
Filing Date 2023-06-07
Publication Date 2024-10-17
Owner MTC CO., LTD. (Republic of Korea)
Inventor Moon, Gwi Yeol

Abstract

The present invention relates to a pest-proof and antimicrobial composition and a pest-proof lighting comprising same. Particularly, the present invention provides a pest-proof and antimicrobial composition, wherein a pest-proof and antimicrobial composition comprising metal powder, sea marine stone, nanocellulose, and ultrapure water is manufactured, and the pest-proof and antimicrobial composition is coated on an LED lamp having the color temperature of 2000K to 3000K and the wavelength band of 510 to 700 ㎚.

IPC Classes  ?

  • A01M 29/10 - Scaring or repelling devices, e.g. bird-scaring apparatus using visual means, e.g. scarecrows, moving elements, specific shapes, patterns or the like using light sources, e.g. lasers or flashing lights
  • A01N 43/40 - Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with one nitrogen atom as the only ring hetero atom six-membered rings
  • A01N 59/00 - Biocides, pest repellants or attractants, or plant growth regulators containing elements or inorganic compounds
  • C09D 5/14 - Paints containing biocides, e.g. fungicides, insecticides or pesticides
  • C09D 7/61 - Additives non-macromolecular inorganic
  • C09D 7/63 - Additives non-macromolecular organic
  • C09D 7/45 - Anti-settling agents
  • A01M 29/12 - Scaring or repelling devices, e.g. bird-scaring apparatus using odoriferous substances, e.g. aromas, pheromones or chemical agents

4.

Apparatus for manufacturing display apparatus and method of manufacturing display apparatus

      
Application Number 18205370
Grant Number 12400852
Status In Force
Filing Date 2023-06-02
First Publication Date 2023-12-07
Grant Date 2025-08-26
Owner
  • Samsung Display Co., Ltd. (Republic of Korea)
  • TES CO., LTD (Republic of Korea)
  • LTC CO., LTD (Republic of Korea)
Inventor
  • Jo, Gugrae
  • Kim, Hyoungsik
  • Cho, Woojin
  • Lee, Jongsoon
  • Lee, Hongjae
  • Kim, Kyusang
  • Kim, Seonjeong
  • Ma, Heejeon
  • Park, Wonil
  • Byun, Kicheon
  • Lee, Woojin

Abstract

A method of manufacturing a display apparatus, the method includes removing an oxide layer formed on a surface of a substrate by utilizing a hydrofluoric acid gas and an ammonia gas, and thermally treating the substrate from which the oxide layer has been removed. A flow ratio between the hydrofluoric acid gas and the ammonia gas is about 0.8:1 to about 1:1.

IPC Classes  ?

  • H01L 21/02 - Manufacture or treatment of semiconductor devices or of parts thereof
  • B08B 5/00 - Cleaning by methods involving the use of air flow or gas flow
  • B08B 7/00 - Cleaning by methods not provided for in a single other subclass or a single group in this subclass
  • B08B 7/04 - Cleaning by methods not provided for in a single other subclass or a single group in this subclass by a combination of operations
  • B08B 13/00 - Accessories or details of general applicability for machines or apparatus for cleaning
  • H10D 86/01 - Manufacture or treatment
  • H10K 59/12 - Active-matrix OLED [AMOLED] displays

5.

METHOD OF MANUFACTURING DISPLAY APPARATUS

      
Application Number 18308740
Status Pending
Filing Date 2023-04-28
First Publication Date 2023-11-02
Owner
  • Samsung Display Co., Ltd. (Republic of Korea)
  • TES Co., Ltd (Republic of Korea)
  • LTC Co., Ltd (Republic of Korea)
Inventor
  • Jo, Gugrae
  • Kim, Hyoungsik
  • Cho, Woojin
  • Lee, Jongsoon
  • Lee, Hongjae
  • Kim, Kyusang
  • Kim, Seonjeong
  • Ma, Heejeon
  • Park, Wonil
  • Byun, Kicheon
  • Lee, Woojin

Abstract

A method of manufacturing a display apparatus includes forming a semiconductor layer on a substrate, forming an insulating layer on the semiconductor layer, forming a photoresist pattern on the insulating layer, forming, by etching the insulating layer, a contact hole exposing at least a portion of the semiconductor layer, and performing a primary cleaning of the insulating layer in which the contact hole is formed using a cleaning gas including a fluorine-containing gas and a hydrogencontaining gas.

IPC Classes  ?

  • H10K 71/00 - Manufacture or treatment specially adapted for the organic devices covered by this subclass
  • H10K 59/12 - Active-matrix OLED [AMOLED] displays

6.

PHOTOSENSITIVE RESIN COMPOSITION AND MANUFACTURING METHOD OF DISPLAY DEVICE USING THE SAME

      
Application Number 17867443
Status Pending
Filing Date 2022-07-18
First Publication Date 2023-03-30
Owner
  • Samsung Display Co., Ltd. (Republic of Korea)
  • LTC Co., Ltd (Republic of Korea)
Inventor
  • Kim, Jun Young
  • Park, Gwui-Hyun
  • Sugitani, Koichi
  • Kim, Hye In
  • Im, Do Hyuk
  • Han, Saehee
  • Hong, Pil Soon
  • Kim, Hwa Young
  • Seo, Do Hyun
  • Choi, Ho Sung
  • Han, Sung Goo

Abstract

A photosensitive resin composition including a silsesquioxane-based copolymer obtained by copolymerizing a first monomer represented by Chemical Formula 1 (R1—R2—Si (R3)3), a second monomer represented by Chemical Formula 2 ((R4)n—Si(R5)4-n), a third monomer represented by Chemical Formula 3 (Si(R6)4), and a fourth monomer represented by Chemical Formula 4 ((R7)3—Si—R8—Si—(R7)3) are provided.

IPC Classes  ?

  • G03F 7/039 - Macromolecular compounds which are photodegradable, e.g. positive electron resists
  • G03F 7/004 - Photosensitive materials
  • G03F 7/075 - Silicon-containing compounds

7.

PHOTORESIST STRIPPER COMPOSITION FOR MANUFACTURING DISPLAY

      
Application Number 17774737
Status Pending
Filing Date 2020-11-18
First Publication Date 2022-12-22
Owner LTC CO., LTD. (Republic of Korea)
Inventor
  • Choi, Ho Sung
  • Kim, Kyu Sang
  • Lee, Jong Soon
  • Ha, Sang Ku
  • Jeon, Byeong Woo
  • Yang, Yun Mo
  • Byun, Ki Cheon
  • Choi, Yeon Soo
  • Kim, Seon Jeong

Abstract

The present invention relates to a photoresist stripper composition for manufacturing a display, and more particularly, to an integrated photoresist stripper composition which can be used in every process for manufacturing a display. More specifically, the photoresist stripper composition for manufacturing a display according to the present invention can be applied to all of transition metals and oxide semiconductor wirings, and has an excellent ability to remove modified photoresist after a hard bake process, and implant process, and a dry etch process have been performed. In particular, the photoresist stripper composition for manufacturing a display according to the present invention exhibits a corrosion inhibitory effect that has been further specialized for copper (Cu) wiring pattern edge portions which are susceptible to corrosion following dry-etching.

IPC Classes  ?

8.

PHOTORESIST STRIPPER COMPOSITION FOR MANUFACTURING DISPLAY

      
Application Number KR2020016225
Publication Number 2021/101227
Status In Force
Filing Date 2020-11-18
Publication Date 2021-05-27
Owner LTC CO., LTD (Republic of Korea)
Inventor
  • Choi, Ho Sung
  • Kim, Kyu Sang
  • Lee, Jong Soon
  • Ha, Sang Ku
  • Jeon, Byeong Woo
  • Yang, Yun Mo
  • Byun, Ki Cheon
  • Choi, Yeon Soo
  • Kim, Seon Jeong

Abstract

The present invention relates to a photoresist stripper composition for manufacturing a display, and more particularly, to an integrated photoresist stripper composition which can be used in every process for manufacturing a display. More specifically, the photoresist stripper composition for manufacturing a display according to the present invention can be applied to all of transition metals, potential metals, and oxide semiconductor wirings, and has an excellent ability to remove modified photoresist after a hard bake process, an implant process, and a dry etch process have been performed. In particular, the photoresist stripper composition for manufacturing a display according to the present invention exhibits a corrosion inhibitory effect that has been further specialized for copper (Cu) wiring pattern edge portions which are susceptible to corrosion following dry-etching.

IPC Classes  ?

  • G03F 7/42 - Stripping or agents therefor
  • C11D 11/00 - Special methods for preparing compositions containing mixtures of detergents
  • C11D 7/32 - Organic compounds containing nitrogen
  • C11D 7/36 - Organic compounds containing phosphorus
  • C11D 7/26 - Organic compounds containing oxygen
  • C11D 7/50 - Solvents

9.

Peeling solution composition for dry film resist

      
Application Number 16487905
Grant Number 11092895
Status In Force
Filing Date 2019-04-16
First Publication Date 2020-08-27
Grant Date 2021-08-17
Owner LTC Co., Ltd. (Republic of Korea)
Inventor
  • Choi, Hosung
  • Kim, Kyusang
  • Bae, Jongil
  • Lee, Jongsoon
  • Ha, Sangku
  • Yang, Yunmo

Abstract

The present invention relates to a peeling solution composition for dry film resist, which is usable for manufacturing a PCB for forming a microcircuit, and particularly is applicable for a process of manufacturing a flexible multi-layer PCB.

IPC Classes  ?

10.

DRY FILM RESIST STRIPPING SOLUTION COMPOSITION

      
Application Number KR2019004560
Publication Number 2019/203529
Status In Force
Filing Date 2019-04-16
Publication Date 2019-10-24
Owner LTC CO., LTD (Republic of Korea)
Inventor
  • Choi, Hosung
  • Kim, Kyusang
  • Bae, Jongil
  • Lee, Jongsoon
  • Ha, Sangku
  • Yang, Yunmo

Abstract

The present invention relates to a dry film resist stripping solution composition applicable to a method for manufacturing a printed circuit board (PCB) having a fine circuit and, particularly, for manufacturing a flexible multi-layer PCB.

IPC Classes  ?

  • G03F 7/42 - Stripping or agents therefor
  • C11D 11/00 - Special methods for preparing compositions containing mixtures of detergents
  • C11D 7/32 - Organic compounds containing nitrogen
  • C11D 7/34 - Organic compounds containing sulfur
  • C11D 7/50 - Solvents

11.

COATING COMPOSITION FOR SOLID OXIDE FUEL CELL METAL SEPARATOR, AND PREPARATION METHOD THEREFOR

      
Application Number KR2017012602
Publication Number 2019/088330
Status In Force
Filing Date 2017-11-08
Publication Date 2019-05-09
Owner LTC CO., LTD (Republic of Korea)
Inventor
  • Ryu, Kwang Hyun
  • Lee, Yong Jin
  • Park, Myung Geun
  • Jeong, Yong Hwan

Abstract

The present invention relates to a coating composition for a solid oxide fuel cell metal separator, and a preparation method therefor, and to a powder for plasma thermal spray coating and a preparation method therefor, the powder: being a main component of a solid oxide fuel cell metal separator coating composition for manufacturing a metal separator having excellent corrosion resistance and contact resistance; and generating no dust and being capable of forming a uniform coating film during thermal spray coating.

IPC Classes  ?

  • C01G 45/00 - Compounds of manganese
  • C23C 4/11 - Oxides
  • C23C 4/134 - Plasma spraying
  • H01M 8/0228 - Composites in the form of layered or coated products
  • H01M 8/0215 - GlassCeramic materials
  • H01M 8/124 - Fuel cells with solid electrolytes operating at high temperature, e.g. with stabilised ZrO2 electrolyte characterised by the process of manufacturing or by the material of the electrolyte

12.

Polysilsesquioxane resin composition for flexible substrate

      
Application Number 16067512
Grant Number 10934455
Status In Force
Filing Date 2016-12-29
First Publication Date 2019-01-24
Grant Date 2021-03-02
Owner LTC CO., Ltd. (USA)
Inventor
  • Kim, Jun Young
  • Kim, Hwa Young
  • Choi, Ho Sung

Abstract

The present invention relates to a polysilsesquioxane resin composition for a flexible substrate. More specifically, the present invention relates to a polysilsesquioxane resin composition for a flexible substrate, having excellent heat resistance and transparency, the resin composition being usable for a flexible display substrate. More specifically, a transparent thin film can be formed, excellent transmittance is exhibited in the visible range even after curing, heat resistance is excellent, and flexibility and crack resistance can be controlled. Compared to a conventional polyimide-based substrate material, the present invention has excellent insulation characteristics and passivation characteristics, which can be satisfied simultaneously, and is advantageous for productivity since release characteristics are ensured during a delamination process from a glass substrate.

IPC Classes  ?

  • C08L 83/06 - Polysiloxanes containing silicon bound to oxygen-containing groups
  • C09D 183/06 - Polysiloxanes containing silicon bound to oxygen-containing groups
  • C08K 5/5415 - Silicon-containing compounds containing oxygen containing at least one Si—O bond
  • C08G 77/16 - Polysiloxanes containing silicon bound to oxygen-containing groups to hydroxy groups
  • C09D 7/20 - Diluents or solvents
  • C08G 77/04 - Polysiloxanes
  • C08G 77/14 - Polysiloxanes containing silicon bound to oxygen-containing groups
  • H05K 1/03 - Use of materials for the substrate
  • C09D 7/65 - Additives macromolecular
  • H01L 27/12 - Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body
  • C08G 77/24 - Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen halogen-containing groups
  • C08G 77/00 - Macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon

13.

Photoresist stripper composition for manufacturing liquid crystal display

      
Application Number 15751967
Grant Number 10859917
Status In Force
Filing Date 2016-08-10
First Publication Date 2018-08-23
Grant Date 2020-12-08
Owner LTC CO., LTD. (Republic of Korea)
Inventor
  • Choi, Ho-Sung
  • Ryu, Kwang-Hyun
  • Bae, Jong-Il
  • Lee, Jong-Soon
  • Ha, Sang-Ku
  • Yang, Hye-Sung
  • Han, Mi-Yeon
  • Lee, Hyo-Jin

Abstract

The present disclosure relates to a photoresist stripper composition for manufacturing an LCD, and relates to an integrated photoresist stripper composition capable of being used in all processes for manufacturing a TFT-LCD. More specifically, the present disclosure relates to an aqueous photoresist stripper composition capable of being used in all of transition metal, potential metal and oxide semiconductor wires. The aqueous photoresist stripper composition includes (a) a potential metal and metal oxide corrosion inhibitor, (b) a transition metal corrosion inhibitor, (c) a primary alkanolamine, (d) a cyclic alcohol, (e) water, (f) an aprotic polar organic solvent, and (g) a protic polar organic solvent, and has an excellent ability to remove a degenerated photoresist produced after progressing a hard baked process, an implant process and a dry etch process in a semiconductor or flat display panel process, may be used in aluminum that is a potential metal, copper or silver that is a transition metal, and metal oxide wires at the same time, and may be introduced to organic film and COA processes.

IPC Classes  ?

  • G03F 7/42 - Stripping or agents therefor
  • C11D 7/32 - Organic compounds containing nitrogen
  • C11D 3/00 - Other compounding ingredients of detergent compositions covered in group
  • C11D 11/00 - Special methods for preparing compositions containing mixtures of detergents
  • C11D 7/50 - Solvents
  • C11D 7/26 - Organic compounds containing oxygen
  • H01L 21/311 - Etching the insulating layers
  • C11D 3/20 - Organic compounds containing oxygen
  • G03F 7/32 - Liquid compositions therefor, e.g. developers
  • H01L 21/027 - Making masks on semiconductor bodies for further photolithographic processing, not provided for in group or
  • H01L 27/12 - Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body

14.

DIMMING-TYPE LED LIGHTING APPARATUS HAVING ELECTROLYTIC CAPACITOR-LESS POWER SUPPLY DEVICE

      
Application Number KR2017004501
Publication Number 2017/188757
Status In Force
Filing Date 2017-04-27
Publication Date 2017-11-02
Owner
  • LED POWER CO., LTD. (Republic of Korea)
  • LITC CO.,LTD (Republic of Korea)
Inventor
  • You, Won Dong
  • Seo, Wan Yong
  • Lee, Seung Hee

Abstract

The present invention relates to a dimming-type LED lighting apparatus having an electrolytic capacitor-less power supply device which senses and controls input voltage information of a primary side of a transformer, senses an input current thereof, and operates with reference to input power thereof. Therefore, the apparatus does not require a secondary-side electrolytic capacitor for stabilizing the output voltage and current thereof, and thus can improve the entire lifetime thereof. The LED lighting apparatus, which has an electrolytic capacitor-less power supply device for supplying power to an LED lighting, comprises: a voltage input unit for inputting a commercialized AC voltage; a transformer having a primary side connected to the voltage input unit and a secondary side connected to the LED lighting so as to drive the LED lighting; a power transistor connected between the primary side of the transformer and a ground terminal; a noise filter configured between the transformer and the LED lighting to remove noise included in power input to the LED lighting; a reference voltage generation unit for generating and outputting a commercialized AC voltage input through the voltage input unit, as a reference voltage; and a switching control unit for receiving, as an input, the reference voltage generated by the reference voltage generation unit and driving the power transistor.

IPC Classes  ?

  • H05B 33/08 - Circuit arrangements for operating electroluminescent light sources
  • H01G 4/12 - Ceramic dielectrics
  • H02M 1/14 - Arrangements for reducing ripples from DC input or output
  • H02M 1/00 - Details of apparatus for conversion

15.

POLYSILSESQUIOXANE RESIN COMPOSITION AND LIGHT-SHIELDING BLACK RESIST COMPOSITION CONTAINING SAME

      
Application Number KR2016010133
Publication Number 2017/142153
Status In Force
Filing Date 2016-09-09
Publication Date 2017-08-24
Owner LTC CO., LTD (Republic of Korea)
Inventor
  • Kim, Jun Young
  • Kim, Hwa Young
  • Choi, Ho Sung

Abstract

The present invention relates to: a high heat resistant and low dielectric polysilsesquioxane resin composition applicable to a liquid crystal display, an OLED, a touch panel, electronic paper, a flexible display and the like; and a light-shielding black resist composition containing the same. More specifically, the present invention relates to a light-shielding black resist composition having high heat resistant and low dielectric characteristics, and comprising: 1) a polysilsesquioxane random copolymer resin composition, which contains a polar heterocyclic structure and can be curable by UV rays; 2) a carbon black dispersion dispersed in the polysilsesquioxane resin and coated therewith; and 3) a photoinitiator. Compared with conventional acrylic or cardo-based black resist, the black resist resin composition of the present invention has excellent heat resistance even in a post high-temperature process of 350°C or higher, has no optical density (O.D.) deterioration, and can satisfy low dielectric properties at the same time.

IPC Classes  ?

  • C08G 77/16 - Polysiloxanes containing silicon bound to oxygen-containing groups to hydroxy groups
  • C08L 83/06 - Polysiloxanes containing silicon bound to oxygen-containing groups
  • C08K 3/04 - Carbon
  • G03F 7/075 - Silicon-containing compounds
  • H01L 21/3105 - After-treatment
  • H01L 51/52 - Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof specially adapted for light emission, e.g. organic light emitting diodes (OLED) or polymer light emitting devices (PLED) - Details of devices
  • G06F 3/041 - Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
  • G02F 1/1335 - Structural association of cells with optical devices, e.g. polarisers or reflectors

16.

Photosensitive resin composition, organic light emitting display device including the same, and method for manufacturing organic light emitting display device

      
Application Number 15417275
Grant Number 10494483
Status In Force
Filing Date 2017-01-27
First Publication Date 2017-08-10
Grant Date 2019-12-03
Owner
  • Samsung Display Co., Ltd. (Republic of Korea)
  • LTC Co., Ltd. (Republic of Korea)
Inventor
  • Kim, Jeong Won
  • Woo, Jun Hyuk
  • Ju, Jin Ho
  • Jeong, Beung Hwa
  • Kim, Jun-Young
  • Kim, Hwa-Young
  • Choi, Ho-Sung

Abstract

4.  [Chemical Formula 3]

IPC Classes  ?

  • G03F 7/004 - Photosensitive materials
  • H01L 27/32 - Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including components using organic materials as the active part, or using a combination of organic materials with other materials as the active part with components specially adapted for light emission, e.g. flat-panel displays using organic light-emitting diodes
  • C08G 77/16 - Polysiloxanes containing silicon bound to oxygen-containing groups to hydroxy groups
  • G03F 7/039 - Macromolecular compounds which are photodegradable, e.g. positive electron resists
  • G03F 7/075 - Silicon-containing compounds
  • H01L 51/56 - Processes or apparatus specially adapted for the manufacture or treatment of such devices or of parts thereof
  • G03F 7/023 - Macromolecular quinonediazidesMacromolecular additives, e.g. binders
  • C08L 83/14 - Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen, or carbon onlyCompositions of derivatives of such polymers in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
  • H01L 51/50 - Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof specially adapted for light emission, e.g. organic light emitting diodes (OLED) or polymer light emitting devices (PLED)
  • C08G 77/04 - Polysiloxanes
  • H01L 21/02 - Manufacture or treatment of semiconductor devices or of parts thereof
  • H01L 21/027 - Making masks on semiconductor bodies for further photolithographic processing, not provided for in group or
  • H01L 21/311 - Etching the insulating layers
  • C08G 77/52 - Macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms by carbon linkages containing aromatic rings

17.

POLYSILSESQUIOXANE RESIN COMPOSITION FOR FLEXIBLE SUBSTRATE

      
Application Number KR2016015491
Publication Number 2017/116171
Status In Force
Filing Date 2016-12-29
Publication Date 2017-07-06
Owner LTC CO., LTD (Republic of Korea)
Inventor
  • Kim, Jun Young
  • Kim, Hwa Young
  • Choi, Ho Sung

Abstract

The present invention relates to a polysilsesquioxane resin composition for a flexible substrate. More specifically, the present invention relates to a polysilsesquioxane resin composition for a flexible substrate, having excellent heat resistance and transparency, the resin composition being usable for a flexible display substrate. More specifically, a transparent thin film can be formed, excellent transmittance is exhibited in the visible range even after curing, heat resistance is excellent, and flexibility and crack resistance can be controlled. Compared to a conventional polyimide-based substrate material, the present invention has excellent insulation characteristics and passivation characteristics, which can be satisfied simultaneously, and is advantageous for productivity since release characteristics are ensured during a delamination process from a glass substrate.

IPC Classes  ?

  • C08G 77/16 - Polysiloxanes containing silicon bound to oxygen-containing groups to hydroxy groups
  • C08L 83/06 - Polysiloxanes containing silicon bound to oxygen-containing groups
  • C08K 5/5415 - Silicon-containing compounds containing oxygen containing at least one Si—O bond
  • C08K 5/00 - Use of organic ingredients
  • H05K 1/03 - Use of materials for the substrate

18.

Highly heat resistant polysilsesquioxane-based photosensitive resin composition

      
Application Number 15039740
Grant Number 10409162
Status In Force
Filing Date 2015-08-28
First Publication Date 2017-06-15
Grant Date 2019-09-10
Owner LTC CO., LTD. (Republic of Korea)
Inventor
  • Kim, Jun Young
  • Kim, Hwa Young
  • Cho, Sang Hun
  • Ryu, Kwang Hyun
  • Choi, Ho Sung

Abstract

The present invention relates to a highly heat resistant silsesquioxane-based photosensitive resin composition for a liquid crystal display device or an organic EL display device, and a positive resist insulating layer prepared therefrom, and in particular, to a silsesquioxane-based photosensitive resin composition having high heat resistance and a low dielectric property, capable of being used as an insulating layer forming a via hole of the thin film transistor (TFT), and simultaneously, capable of being used as an insulating layer for forming a bank pattern dividing pixels of an organic EL display device.

IPC Classes  ?

  • G03F 7/023 - Macromolecular quinonediazidesMacromolecular additives, e.g. binders
  • G03F 7/075 - Silicon-containing compounds
  • C08G 77/04 - Polysiloxanes
  • G03F 7/004 - Photosensitive materials
  • G03F 7/039 - Macromolecular compounds which are photodegradable, e.g. positive electron resists
  • G03F 7/16 - Coating processesApparatus therefor
  • G03F 7/20 - ExposureApparatus therefor
  • G03F 7/32 - Liquid compositions therefor, e.g. developers
  • H01L 27/32 - Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including components using organic materials as the active part, or using a combination of organic materials with other materials as the active part with components specially adapted for light emission, e.g. flat-panel displays using organic light-emitting diodes
  • G03F 7/038 - Macromolecular compounds which are rendered insoluble or differentially wettable
  • G02F 1/1333 - Constructional arrangements
  • G02F 1/1362 - Active matrix addressed cells
  • C08G 77/14 - Polysiloxanes containing silicon bound to oxygen-containing groups
  • C08G 77/18 - Polysiloxanes containing silicon bound to oxygen-containing groups to alkoxy or aryloxy groups

19.

PHOTORESIST STRIPPING SOLUTION COMPOSITION FOR LCD MANUFACTURING

      
Application Number KR2016008810
Publication Number 2017/026803
Status In Force
Filing Date 2016-08-10
Publication Date 2017-02-16
Owner LTC CO., LTD. (Republic of Korea)
Inventor
  • Choi, Ho-Sung
  • Ryu, Kwang-Hyun
  • Bae, Jong-Il
  • Lee, Jong-Soon
  • Ha, Sang-Ku
  • Yang, Hye-Sung
  • Han, Mi-Yeon
  • Lee, Hyo-Jin

Abstract

The present invention relates to a photoresist stripping solution composition for LCD manufacturing, and to a combined photoresist stripping solution composition capable of being used in all processes for manufacturing a TFT-LCD. More particularly, the present invention relates to a water-based photoresist stripping solution composition that can be applied to all of transition metal, potential metal, and oxide semiconductor wiring. The water-based photoresist stripping solution composition comprises: (a) a potential metal and metal oxide corrosion inhibitor; (b) a transition metal corrosion inhibitor; (c) a primary alkanolamine; (d) a cyclic alcohol; (e) water; (f) an aprotic polar organic solvent; and (g) a protic polar organic solvent, wherein the photoresist stripping solution composition has an excellent ability to remove a photoresist that has been modified after a hard baked process, an implant process, and a dry etch process have been implemented, can be applied simultaneously to an aluminum (potential metal), copper or silver (transition metal), and metal oxide wiring, and can be introduced in organic film and COA processes.

IPC Classes  ?

  • G03F 7/42 - Stripping or agents therefor
  • H01L 21/311 - Etching the insulating layers
  • H01L 21/02 - Manufacture or treatment of semiconductor devices or of parts thereof

20.

INJECTION MOLDING APPARATUS FOR WORM WHEEL

      
Application Number KR2016002425
Publication Number 2016/148443
Status In Force
Filing Date 2016-03-11
Publication Date 2016-09-22
Owner MTC CO., LTD. (Republic of Korea)
Inventor
  • Cho, Jung Kwon
  • Cho, Ki Jung
  • Choi, Kwang Ryeal
  • Sohn, Won Bum
  • Yoo, Sung Jae

Abstract

An injection molding apparatus for a worm wheel of the present invention comprises: a boss injection-molding mold for integrally forming a worm wheel hub into which a worm wheel shaft is press-fit and a worm wheel boss, the boss injection-molding mold having a movable side template and a stationary side template; a movable side core on which the worm wheel boss, which is integrally formed with the worm wheel hub by the boss injection-molding mold, is positioned, the movable side core being capable of moving forward and backward; a stationary side core disposed such that the inside thereof faces the movable side core and having a resin injection hole at the outside thereof; a product injection-molding mold disposed inside the movable side core and having a worm gear tooth-form core on the inner peripheral surface thereof, which is configured in the gear tooth form of a worm gear; and an extracting means for extracting a worm wheel product having a worm gear formed by the product injection-molding mold, wherein the extracting means includes: a plurality of extracting pins coupled through the movable side core; an extracting plate to which end portions of the extracting pins are fixedly coupled; and a guide means for guiding the rotation of the worm gear tooth-form core when the worm wheel product is extracted.

IPC Classes  ?

  • B29C 45/03 - Injection moulding apparatus
  • B29C 45/40 - Removing or ejecting moulded articles
  • B29C 45/14 - Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mouldApparatus therefor incorporating preformed parts or layers, e.g. injection moulding around inserts or for coating articles
  • F16H 55/22 - Toothed membersWorms for transmissions with crossing shafts, especially worms, worm-gears

21.

MANUFACTURING METHOD FOR ALUMINUM NITRIDE WHISKER

      
Application Number KR2015000306
Publication Number 2016/114413
Status In Force
Filing Date 2015-01-13
Publication Date 2016-07-21
Owner
  • LTC CO., LTD (Republic of Korea)
  • INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YEUNGNAM UNIVERSITY (Republic of Korea)
Inventor
  • Jung, Woosik
  • Choi, Hosung
  • Ryu, Kwanghyun
  • Kim, Wonsik
  • Kim, Sungkook

Abstract

The present invention relates to a manufacturing method for an aluminum nitride whisker, and more particularly, to a manufacturing method for an aluminum nitride whisker, the method including: forming a mixture by mixing an aluminum supply source with a carbon supply source; and reduction-nitriding the aluminum supply source to be an aluminum nitride whisker by reacting the mixture under nitriding atmosphere, in which the carbon supply source contains an activator having a predetermined content.

IPC Classes  ?

  • C01B 21/072 - Binary compounds of nitrogen with metals, with silicon, or with boron with aluminium

22.

HIGHLY HEAT RESISTANT POLYSILSESQUIOXANE-BASED PHOTOSENSITIVE RESIN COMPOSITION

      
Application Number KR2015009030
Publication Number 2016/032269
Status In Force
Filing Date 2015-08-28
Publication Date 2016-03-03
Owner LTC CO., LTD. (Republic of Korea)
Inventor
  • Kim, Jun Young
  • Kim, Hwa Young
  • Cho, Sang Hun
  • Ryu, Kwang Hyun
  • Choi, Ho Sung

Abstract

The present invention relates to: a highly heat resistant silsesquioxane-based photosensitive resin composition for a liquid crystal display device or an organic EL display device; and a positive resist insulating layer prepared therefrom and, specifically, to a silsesquioxane-based photosensitive resin composition, having high heat resistance and low dielectric characteristics, capable of being used as an insulating layer forming a via hole of a thin film transistor (TFT) and, simultaneously, capable of being used as an insulating layer for forming a bank pattern dividing pixels of an organic EL display device.

IPC Classes  ?

23.

Composition for removing and preventing formation of oxide on the surface of metal wire

      
Application Number 14648647
Grant Number 09353339
Status In Force
Filing Date 2013-07-24
First Publication Date 2015-10-22
Grant Date 2016-05-31
Owner LTC Co., Ltd. (Republic of Korea)
Inventor
  • Choi, Ho Sung
  • Ryu, Kwang Hyun
  • Bae, Jong Il
  • Lee, Jong Soon
  • Yang, Hye Sung
  • Ha, Sang Ku

Abstract

The present invention proposes a method for removing an oxide formed on the surface of a copper film used in the process of manufacturing a circuit for a semiconductor, an organic light-emitting diode, an LED, or a liquid crystal display without causing corrosion on a lower metal film. The composition including corrosive amine may remove a metal oxide depending on the content of additive ranging from 0.01 to 10% regardless of the content of ultrapure water. A polar solvent other than the corrosive amine may efficiently remove an oxide from the surface of the metal when the same contains water and 0.01 to 20% of the additive.

IPC Classes  ?

  • C11D 3/28 - Heterocyclic compounds containing nitrogen in the ring
  • C11D 3/30 - AminesSubstituted amines
  • C11D 3/43 - Solvents
  • C11D 7/32 - Organic compounds containing nitrogen
  • C11D 11/00 - Special methods for preparing compositions containing mixtures of detergents
  • C11D 3/20 - Organic compounds containing oxygen
  • C23G 1/20 - Other heavy metals
  • H01L 21/02 - Manufacture or treatment of semiconductor devices or of parts thereof
  • C11D 7/34 - Organic compounds containing sulfur
  • C11D 7/50 - Solvents
  • C23C 22/02 - Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using non-aqueous solutions
  • C23C 22/63 - Treatment of copper or alloys based thereon
  • C23F 11/16 - Sulfur-containing compounds

24.

COMPOSITION FOR REMOVING AND PREVENTING FORMATION OF OXIDE ON THE SURFACE OF METAL WIRE

      
Application Number KR2013006615
Publication Number 2014/017819
Status In Force
Filing Date 2013-07-24
Publication Date 2014-01-30
Owner LTC CO., LTD. (Republic of Korea)
Inventor
  • Choi, Ho Sung
  • Ryu, Kwang Hyun
  • Bae, Jong Il
  • Lee, Jong Soon
  • Yang, Hye Sung
  • Ha, Sang Ku

Abstract

The present invention proposes a method for removing an oxide formed on the surface of a copper film used in the process of manufacturing a circuit for a semiconductor, an organic light-emitting diode, an LED, or a liquid crystal display without causing corrosion on a lower metal film. The composition comprising corrosive amine may remove a metal oxide depending on the content of additive ranging from 0.01 to 10% regardless of the content of ultrapure water. A polar solvent other than the corrosive amine may efficiently remove an oxide from the surface of metal when same contains water and 0.01 to 20% of the additive.

IPC Classes  ?

  • C23F 1/44 - Compositions for etching metallic material from a metallic material substrate of different composition
  • C23F 1/10 - Etching compositions

25.

Photoresist stripping composition for manufacturing LCD

      
Application Number 13993278
Grant Number 09360761
Status In Force
Filing Date 2010-08-19
First Publication Date 2013-12-26
Grant Date 2016-06-07
Owner LTC Co., Ltd. (Republic of Korea)
Inventor Choi, Ho Sung

Abstract

The present invention relates to a photoresist stripping composition for all process of manufacturing LCD, more specifically to a water-borne united photoresist stripping composition, as a weak basic composite comprising a tertiary alkanolamine, water, and an organic solvent. The composition according to the present invention prevents a corrosion of Al and Cu metal wiring in process of manufacturing LCD, has a good capability of removing photoresist, and is applied to all Al process, Cu process, an organic film process, and COA process.

IPC Classes  ?

  • G03F 7/42 - Stripping or agents therefor
  • C11D 11/00 - Special methods for preparing compositions containing mixtures of detergents

26.

INORGANIC SCATTERING FILM HAVING HIGH LIGHT EXTRACTION PERFORMANCE

      
Application Number KR2011008076
Publication Number 2013/008982
Status In Force
Filing Date 2011-10-27
Publication Date 2013-01-17
Owner LTC CO., LTD. (Republic of Korea)
Inventor
  • Ryu, Kwang Hyun
  • Kim, Sung Kook
  • Kim, Jun Yeon
  • Lee, Yong Jin

Abstract

The present invention relates to an inorganic scattering film having high light extraction performance, and more particularly, to an optical thin film having high light extraction effects caused by forming an inorganic particle film including a void at an interface of a light emitting device or on a transparent substrate, and to a method for manufacturing same. A method for manufacturing a nano-size particle powder according to the present invention may be applied to many types of complex oxide powder composites since the size and shape of composite powders can be controlled, and an inorganic scattering film including the powder has high light extraction effects caused by the inorganic particle scattering film having the void, and can thus be applied to image display devices, lighting elements, solar cells, and the like.

IPC Classes  ?

  • C01G 25/02 - Oxides
  • B82B 3/00 - Manufacture or treatment of nanostructures by manipulation of individual atoms or molecules, or limited collections of atoms or molecules as discrete units
  • H01L 31/042 - PV modules or arrays of single PV cells

27.

INORGANIC PARTICLE SCATTERING FILM HAVING A GOOD LIGHT-EXTRACTION PERFORMANCE

      
Application Number KR2012005635
Publication Number 2013/009150
Status In Force
Filing Date 2012-07-13
Publication Date 2013-01-17
Owner LTC CO., LTD. (Republic of Korea)
Inventor
  • Ryu, Kwang Hyun
  • Kim, Hwa Young
  • Kim, Sung Kook
  • Lee, Yong Jin
  • Min, Sung Hwan

Abstract

The present invention relates to an inorganic particle scattering film which exhibits a good light-extraction effect via a light-scattering effect because of the formation of an inorganic particle layer comprising voids on a light-emitting-element interface or transparent substrate, and which exhibits outstanding flatness and hardness because of the formation of a flattening layer on the inorganic particle layer, and the invention relates to a production method for the inorganic particle scattering film. Because the inorganic particle scattering film according to the present invention has a good light-extraction effect and outstanding flatness and hardness, it can be put to diverse uses in fields such as picture display devices, lighting elements and solar photovoltaic cells.

IPC Classes  ?

  • C01G 25/02 - Oxides
  • B82B 3/00 - Manufacture or treatment of nanostructures by manipulation of individual atoms or molecules, or limited collections of atoms or molecules as discrete units
  • H01L 31/042 - PV modules or arrays of single PV cells
  • B82Y 30/00 - Nanotechnology for materials or surface science, e.g. nanocomposites

28.

VACUUM FORMING APPARATUS AND IMAGE DISPLAY MANUFACTURING FACILITY INCLUDING SAME

      
Application Number KR2010001092
Publication Number 2011/096613
Status In Force
Filing Date 2010-02-22
Publication Date 2011-08-11
Owner LTL CO., LTD. (Republic of Korea)
Inventor
  • Park, Young Nam
  • Ko, Dae Woon

Abstract

The invention relates to a vacuum forming apparatus including a housing, a first valve plate, a second valve plate, a support panel, a first cylinder unit, a second cylinder unit, and a driving unit. The housing includes a first inlet at one side and a second inlet at the other side thereof. The first valve plate is disposed in the housing to open and close the first inlet. The second valve plate is disposed in the housing to open and close the second inlet. The support panel is disposed in the housing. The first cylinder unit is installed on a surface of the support panel to horizontally move the first valve plate. The second cylinder unit is installed on the other surface of the support panel to horizontally move the second valve plate. The driving unit is connected to the support panel to vertically move the first and second valve plates. The valve plate is hydraulically or pneumatically operated by the cylinder unit.

IPC Classes  ?

  • G02F 1/13 - Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulatingNon-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells

29.

A PHOTORESIST STRIPPING COMPOSITION FOR MANUFACTURING LCD

      
Application Number KR2010005494
Publication Number 2011/025180
Status In Force
Filing Date 2010-08-19
Publication Date 2011-03-03
Owner LTC CO., LTD. (Republic of Korea)
Inventor Choi, Ho Sung

Abstract

The present invention relates to a photoresist stripping composition for all process of manufacturing LCD, more specifically to a water-borne united photoresist stripping composition, as a weak basic composite comprising a tertiary alkanolamine, water, and an organic solvent. The composition according to the present invention prevents a corrosion of Al and Cu metal wiring in process of manufacturing LCD, has a good capability of removing photoresist, and is applied to all Al process, Cu process, an organic film process, and COA process.

IPC Classes  ?

30.

Composition for removing polymer residue of photosensitive etching-resistant layer

      
Application Number 12087137
Grant Number 07858572
Status In Force
Filing Date 2006-12-19
First Publication Date 2009-07-02
Grant Date 2010-12-28
Owner LTC CO., LTD. (Republic of Korea)
Inventor
  • Choi, Ho-Sung
  • Kim, Deok-Ho

Abstract

Provided is a composition for removing polymer residue of a photosensitive etching-resistant layer. The composition includes 0.1 to 80% by weight of a corrosion inhibitor shown in Formula 1; 10 to 80% by weight of a pH control agent of which hydrogen ion concentration is in a weak basic range; 0.1 to 2% by weight of ammonium fluoride; and the remaining percentage by weight of water. The composition for removing the polymer residue can effectively remove insoluble residue generated during a semiconductor fabrication process without inflicting damage on an underlying layer and contains environment-friendly components.

IPC Classes  ?