The present invention addresses the problem of providing a cleaning liquid composition that has high pH stability and demonstrates good cleaning performance with regard to organic residues and abrasive grains that contain cobalt (Co), on a substrate that has a cobalt (Co) contact hole and/or cobalt (Co) wiring. The present invention relates to a cleaning liquid composition for cleaning a substrate that has a cobalt (Co) contact plug and/or cobalt (Co) wiring, said cleaning liquid composition including one or more types of hydroxylamine derivatives as a reducing agent, one or more types of surfactants, one or more types of pH adjusting agents, and water, wherein the pH is 3 to 9.
The present invention addresses the problem of providing a removal composition which is capable of satisfactorily removing a strong resist, and a polymer residue and a resist residue on a substrate for the semiconductor device production, while reducing the toxicity to humans, and which is also capable of suppressing damage on a wiring metal. The present invention relates to a nonaqueous composition which is used for the purpose of removing a polymer residue, a resist, and/or a resist residue on a substrate for the semiconductor device production by applying ultrasonic waves thereto, and which contains 80% by mass to 100% by mass of diethylene glycol monoethyl ether or triethylene glycol monomethyl ether.
Provided is a cleaning composition for manganese contamination of a silicon carbide substrate, the cleaning composition having high stability and enabling transport of a product in the form of a solution. A cleaning liquid composition for cleaning a silicon carbide substrate polished by an abrasive containing a manganese compound or a silicon carbide substrate etched by an etching liquid containing a manganese compound, the cleaning liquid composition containing a reducing agent, a pH adjusting agent, and water, having a pH of less than 5, and the reducing agent being at least one selected from the group consisting of glyoxylic acid, diethylhydroxylamine, and six-membered ring compounds in which two or more hydroxyl groups are directly bonded to a ring.
It is known that when etching gold films using etching solutions containing iodine and iodide, N-methyl-2-pyrrolidinone (NP) is added to improve the etching solution's wettability, microfabrication property, and solution life. However, in recent years, the use of NMP has been regulated due to its adverse effects on human health. The present invention provides an etching solution and etching method for gold film that improves wettability, microfabrication property, and solution life without containing NP. In order to address the problem of the prior art, the present invention provides etching solutions and etching methods for gold films that improve wettability, microfabrication property, and liquid life without NMP, characterized by the inclusion of a specific organic solvent in the etching solution containing iodine and iodide.
[Problem] The present invention addresses the problem of providing a silicon nitride etching liquid composition which, for production of 3D non-volatile memory cells, or the like, is capable of suppressing the regrowth of silicon oxide in a step for selectively etching silicon nitride with a practical etching selectivity of silicon oxide, and which does not allow alcohol elimination to occur. [Solution] Provided is a silicon nitride etching liquid composition which comprises phosphoric acid, hydrolyzate of a water-soluble silicon compound and water, and which is for producing 3D non-volatile memory cells, and the like.
H01L 21/308 - Chemical or electrical treatment, e.g. electrolytic etching using masks
H01L 21/306 - Chemical or electrical treatment, e.g. electrolytic etching
H01L 21/336 - Field-effect transistors with an insulated gate
H01L 29/788 - Field-effect transistors with field effect produced by an insulated gate with floating gate
H01L 29/792 - Field-effect transistors with field effect produced by an insulated gate with charge trapping gate insulator, e.g. MNOS-memory transistor
H10B 41/27 - Electrically erasable-and-programmable ROM [EEPROM] devices comprising floating gates characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels the channels comprising vertical portions, e.g. U-shaped channels
H10B 43/27 - EEPROM devices comprising charge-trapping gate insulators characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels the channels comprising vertical portions, e.g. U-shaped channels
6.
ANTI-SARS-CoV-2 ANTIBODY AGAINST SARS-CoV-2 ANTIGEN IN BODY FLUID, INCLUDING MUTANT; METHOD FOR DETECTING SARS-CoV-2 USING ANTIBODY; AND KIT CONTAINING ANTIBODY
PUBLIC UNIVERSITY CORPORATION YOKOHAMA CITY UNIVERSITY (Japan)
KANTO KAGAKU KABUSHIKI KAISHA (Japan)
Inventor
Ryo, Akihide
Mihana, Yusaku
Yamaoka, Yutaro
Abstract
The present invention addresses the problem of providing a highly sensitive and highly specific means for detecting a protein constituting a nucleocapsid derived from SARS-CoV-2. The above problem has been solved by, for example, an antibody binding to a protein constituting the nucleocapsid derived from SARS-CoV-2 or a fragment thereof, or a combination thereof; a method for detecting, from a sample, a protein constituting the nucleocapsid derived from SARS-CoV-2 using said antibody or a fragment thereof, or a combination thereof; and a kit for detecting a protein constituting the nucleocapsid derived from SARS-CoV-2, the kit containing said antibody or a fragment thereof, or a combination thereof.
The present invention addresses the problem of providing an etching solution composition that imparts a good etched surface shape to a metal to be etched at a controlled etch rate. The present invention relates to an etching solution composition obtained by blending at least (A) nitric acid, (B) acetic acid, (C) a phosphorous compound, and (D) water, wherein the water concentration after blending is at most 3.0 M.
The present invention addresses the problem of providing an etching solution composition that imparts a good etched surface shape to a metal to be etched at a controlled etch rate. The present invention relates to an etching solution composition that contains (A) nitric acid, (B) acetic acid, (C) nitrilotris(methylenephosphonic acid), (D) a halogen compound, and (E) water.
C23F 1/26 - Acidic compositions for etching refractory metals
H01L 21/28 - Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups
H01L 21/306 - Chemical or electrical treatment, e.g. electrolytic etching
H01L 29/417 - Electrodes characterised by their shape, relative sizes or dispositions carrying the current to be rectified, amplified or switched
H01L 21/336 - Field-effect transistors with an insulated gate
H01L 29/788 - Field-effect transistors with field effect produced by an insulated gate with floating gate
H01L 29/792 - Field-effect transistors with field effect produced by an insulated gate with charge trapping gate insulator, e.g. MNOS-memory transistor
H10B 41/27 - Electrically erasable-and-programmable ROM [EEPROM] devices comprising floating gates characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels the channels comprising vertical portions, e.g. U-shaped channels
H10B 43/27 - EEPROM devices comprising charge-trapping gate insulators characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels the channels comprising vertical portions, e.g. U-shaped channels
The present invention addresses the problem of providing a photoresist remover composition which has the high ability to remove cured resists and is effective in inhibiting the corrosion of substrate-constituting metals in contact therewith, such as Cu and Al, and in inhibiting the Cu and other metals from being excessively oxidized during the removal process. This photoresist remover composition comprises (A) a quaternary ammonium hydroxide, (B) diethylene glycol monoethyl ether, (C) glycerin, and (D) water, wherein the content of (A) is 0.5-5 mass% with respect to the whole mass of the composition, the content of (B) is 50-95 mass% with respect to the whole mass of the composition, the content of (C) is 0.5-20 mass% with respect to the whole mass of the composition, and the content of (D) is less than 20 mass% with respect to the whole mass of the composition.
H05K 3/06 - Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
10.
ANTIBODY AGAINST SARS-COV-2, METHOD FOR DETECTING SARS-COV-2 USING ANTIBODY AND KIT CONTAINING ANTIBODY
PUBLIC UNIVERSITY CORPORATION YOKOHAMA CITY UNIVERSITY (Japan)
KANTO KAGAKU KABUSHIKI KAISHA (Japan)
Inventor
Ryo, Akihide
Yamaoka, Yutaro
Kikuchi, Sayaka
Abstract
The present invention addresses the problem of providing a means for detecting a constituting protein of nucleocapsid derived from SARS-CoV-2. This problem has been solved by providing an antibody binding to a constituting protein of nucleocapsid derived from SARS-CoV-2 or a fragment of the antibody, a method for detecting a constituting protein of the SARS-CoV-2-derived nucleocapsid with the use of the antibody or a fragment thereof, a kit for detecting a constituting protein of the SARS-CoV-2-derived nucleocapsid, said kit containing the antibody or a fragment thereof, etc.
The present invention addresses the problem of providing a photoresist stripping composition that exhibits a high stripping performance even with respect to a hardened resist, and that, even when the amount of water in the make-up is small, experiences little decrease in stripping performance when water evaporates and makes it possible to inhibit corrosion of a substrate-constituting metal that comes into contact with a liquid, such as Cu, Al, or Si. The above is accomplished by a photoresist stripping composition containing (A) a quaternary ammonium hydroxide, (B) a sugar alcohol, (C) an amine, (D) water, (E) DMSO, and (F) ethylene glycol, the (D) water content being 1.0-10 mass% relative to the total mass of the composition.
H05K 3/06 - Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
12.
INDROPHENOXAZINE-BASED COMPOUND, ELECTRON-BLOCKING MATERIAL CONTAINING SAID COMPOUND, AND ORGANIC PHOTOELECTRIC CONVERSION ELEMENT IN WHICH SAID COMPOUND IS INCLUDED IN ELECTRON-BLOCKING LAYER
The present invention provides a novel compound represented by general formula (1), the compound exhibiting an effect for reducing dark current in a photoelectric conversion element. (R1to R14, independently of each other, are hydrogen, a straight-chain alkyl group that may have a substituent, a branched alkyl group that may have a substituent, a cyclic alkyl group that may have a substituent, or a phenyl group that may have a substituent; Ar, independently of each other, are one or more aromatic hydrocarbon groups that may have a substituent, one or more aromatic heterocyclic groups that may have a substituent, one or more condensed polycyclic aromatic groups that may have a substituent, one or more condensed polycyclic aromatic heterocyclic groups that may have a substituent, or a group that is a combination thereof).
C07D 519/00 - Heterocyclic compounds containing more than one system of two or more relevant hetero rings condensed among themselves or condensed with a common carbocyclic ring system not provided for in groups or
H01L 31/10 - SEMICONDUCTOR DEVICES NOT COVERED BY CLASS - Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by at least one potential-jump barrier or surface barrier, e.g. phototransistors
H10K 30/60 - Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation in which radiation controls flow of current through the devices, e.g. photoresistors
The present invention addresses the problem of providing a decomposition inhibitor for inhibiting the decomposition of hydrogen peroxide included in an etching liquid composition for titanium nitride.
The present invention relates to a decomposition inhibitor that is used to inhibit the decomposition of hydrogen peroxide included in an etching liquid composition for titanium nitride and that includes at least one compound selected from among azole compounds, aminocarboxylic acid compounds, and phosphonic acid compounds as an active component.
C09K 13/06 - Etching, surface-brightening or pickling compositions containing an inorganic acid with organic material
C09K 15/20 - Anti-oxidant compositionsCompositions inhibiting chemical change containing organic compounds containing nitrogen and oxygen
C09K 15/30 - Anti-oxidant compositionsCompositions inhibiting chemical change containing organic compounds containing heterocyclic ring with at least one nitrogen atom as ring member
C09K 15/32 - Anti-oxidant compositionsCompositions inhibiting chemical change containing organic compounds containing boron, silicon, phosphorus, selenium, tellurium or a metal
[Problem] Adding N-methyl-2-pyrrolidinone (NMP) in order to improve the wettability, microfabrication properties and solution lifespan of an etching solution when etching a gold film by using an etching solution which contains iodine and an iodide is well known. However, restrictions on the use of NMP from the perspective of the negative effect thereof on human health have, in recent years, posed a problem. The present invention provides a gold film etching solution and etching method which improve wettability, microfabrication properties and solution lifespan without including NMP in said solution. [Solution] Provided are a gold film etching solution and etching method which improve wettability, microfabrication properties and solution lifespan without including NMP in the solution as a result of said gold film etching solution, which contains iodine and an iodide, being characterized by containing a specific organic solvent.
Provided is a method for culturing hepatocytes, the method being characterized by comprising a step for culturing hepatocytes in a medium including cAMP, a cAMP analog, or a substance that increases the cAMP concentration in cells, for the purpose of improving adhesiveness of hepatocytes.
An object of the present invention is to provide a cleaning liquid that effectively removes in a short time organic residues and abrasive grains derived from a slurry in a semiconductor substrate in which a Co contact plug and/or Co wiring are present.
The present invention relates to a cleaning liquid composition for cleaning a substrate having a Co contact plug and/or Co wiring, which contains one or more reducing agents and water. Furthermore, the present invention relates to a cleaning liquid composition for cleaning a substrate having Co and not having Cu, which contains one or more reducing agents and water and has a pH of 3 or more and less than 12.
The present invention addresses the problem of providing: a culture medium that is for adherent culturing of pluripotent stem cells exhibiting high growth ability and that does not contain serum or albumin; and a highly versatile method for adherent culturing of pluripotent stem cells using the culture medium. According to the present invention, by adding, to a culture medium, a hydrophilic polymer that is conventionally known to inhibit adhesion of cells to the surface of a cell culture base material, so that the adhesion of pluripotent stem cell to the surface of the cell culture base material is enhanced, high growth ability is imparted in adherent culturing of pluripotent stem cells without adding serum or albumin thereto. In addition, by adding an antioxidant substance along with such a polymer to a culture medium, very high growth ability is imparted in adherent culturing of pluripotent stem cells.
4 gas. The remover composition, which is for removing ruthenium remaining on substrates, has a pH at 25° C. of 8 or higher and includes one or more pH buffer ingredients.
PUBLIC UNIVERSITY CORPORATION YOKOHAMA CITY UNIVERSITY (Japan)
KANTO KAGAKU KABUSHIKI KAISHA (Japan)
Inventor
Ryo, Akihide
Yamaoka, Yutaro
Kikuchi, Sayaka
Abstract
The present invention addresses the problem of providing a means for detecting a constituting protein of nucleocapsid derived from SARS-CoV-2. This problem has been solved by providing an antibody binding to a constituting protein of nucleocapsid derived from SARS-CoV-2 or a fragment of the antibody, a method for detecting a constituting protein of the SARS-CoV-2-derived nucleocapsid with the use of the antibody or a fragment thereof, a kit for detecting a constituting protein of the SARS-CoV-2-derived nucleocapsid, said kit containing the antibody or a fragment thereof, etc.
As a method for producing enterocytes derived from pluripotent stem cells and having functions corresponding to those of actual enterocytes, a method for producing enterocytes using an enterocyte differentiation medium containing a GSK3 inhibitor, and at least one selected from the group consisting of an activator of a hepatocyte growth factor receptor, an adrenal cortex hormone, calcitriol, and dimethyl sulfoxide is provided.
PUBLIC UNIVERSITY CORPORATION YOKOHAMA CITY UNIVERSITY (Japan)
KANTO KAGAKU KABUSHIKI KAISHA (Japan)
Inventor
Ryo, Akihide
Yamaoka, Yutaro
Aizawa, Daisuke
Abstract
The present invention addresses the problem of providing a means for accurately, easily and quickly detecting an anti-SARS-CoV-2-antibody. A solution to this problem is achieved by providing a SARS-CoV-2-derived nucleocapsid fragment, a method and a kit for detecting an anti-SARS-CoV-2-antibody from human-derived blood, plasma and/or serum with the use of the fragment, etc.
The present invention provides, in order to prepare matured hepatocytes analogous in various points to primary hepatocytes, a method for preparing hepatocytes or cells that can be differentiated into hepatocytes from pluripotent stem cells, comprising the steps of: (1) culturing the pluripotent stem cells in a medium containing an activator of an activin receptor-like kinase-4,7; (2) culturing the cells obtained in the step (1) in a medium containing a bone morphogenetic factor and a fibroblast growth factor; (3) culturing the cells obtained in the step (2) in a medium containing an activator of a hepatocyte growth factor receptor and an activator of an oncostatin M receptor; and (4) culturing the cells obtained in the step (3) to obtain hepatocytes or cells that can be differentiated into hepatocytes, wherein in at least one of the steps (2), (3) and (4), cells are cultured on a high-density collagen gel membrane.
An etchant composition that is capable of batch etching treatment of a tungsten film and a titanium nitride film and a method for etching using said etchant composition are provided. The etching composition of the present invention is an etchant composition comprising nitric acid and water for batch etching treatment of a tungsten film and a titanium nitride film.
The present invention addresses the problem of providing a decomposition inhibitor for inhibiting the decomposition of hydrogen peroxide included in an etching liquid composition for titanium nitride. The present invention relates to a decomposition inhibitor that is used to inhibit the decomposition of hydrogen peroxide included in an etching liquid composition for titanium nitride and that includes at least one compound selected from among azole compounds, aminocarboxylic acid compounds, and phosphonic acid compounds as an active component.
342222 film in the production of a 3D nonvolatile memory cell. A silicon nitride etching liquid composition for producing a 3D nonvolatile memory cell, which contains phosphoric acid, one or more silane coupling agents and water, but which does not contain ammonium ions.
H01L 21/306 - Chemical or electrical treatment, e.g. electrolytic etching
H01L 27/11556 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with floating gate characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels the channels comprising vertical portions, e.g. U-shaped channels
H01L 27/11582 - Electrically programmable read-only memories; Multistep manufacturing processes therefor with charge-trapping gate insulators, e.g. MNOS or NROM characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels the channels comprising vertical portions, e.g. U-shaped channels
H01L 21/336 - Field-effect transistors with an insulated gate
H01L 29/788 - Field-effect transistors with field effect produced by an insulated gate with floating gate
H01L 29/792 - Field-effect transistors with field effect produced by an insulated gate with charge trapping gate insulator, e.g. MNOS-memory transistor
C23C 18/16 - Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coatingContact plating by reduction or substitution, i.e. electroless plating
C23C 18/52 - Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coatingContact plating by reduction or substitution, i.e. electroless plating using reducing agents for coating with metallic material not provided for in a single one of groups
27.
UNDIFFERENTIATED STATE-MAINTAINING CULTURE MEDIUM FOR PLURIPOTENT STEM CELLS
The present invention addresses the problem of providing: a culture medium that is for adherent culturing of pluripotent stem cells exhibiting high growth ability and that does not contain serum or albumin; and a highly versatile method for adherent culturing of pluripotent stem cells using the culture medium. According to the present invention, by adding, to a culture medium, a hydrophilic polymer that is conventionally known to inhibit adhesion of cells to the surface of a cell culture base material, so that the adhesion of pluripotent stem cell to the surface of the cell culture base material is enhanced, high growth ability is imparted in adherent culturing of pluripotent stem cells without adding serum or albumin thereto. In addition, by adding an antioxidant substance along with such a polymer to a culture medium, very high growth ability is imparted in adherent culturing of pluripotent stem cells.
44 gas. The remover composition, which is for removing ruthenium remaining on substrates, has a pH at 25°C of 8 or higher and includes one or more pH buffer ingredients.
A problem is presented in that conventional photochromic compounds cannot be considered adequate in terms of the colorizing/decolorizing rate and durability, and the production process therefore has many steps. The present invention provides an industrially applicable photochromic compound that has both a rapid colorizing/decolorizing reaction and high durability and can also be synthesized at a low cost. This compound is characterized in that etheric oxygen atoms are bonded to the carbon atoms at position 1 of a pyranoquinazoline (8H-pyrano[3,2-f]quinazoline) skeleton and position 10 of a naphthopyran (3H-naphtho[2,1-b]pyran) skeleton, said compound having photochromic properties and being a photochromic compound that has both a rapid colorizing/decolorizing reaction and high durability. Also provided is an industrially applicable photochromic compound that can be synthesized at a low cost.
C07D 405/10 - Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings linked by a carbon chain containing aromatic rings
C07D 491/052 - Ortho-condensed systems with only one oxygen atom as ring hetero atom in the oxygen-containing ring the oxygen-containing ring being six-membered
The present invention addresses the problem of providing a cleaning liquid which can, in a short time, effectively remove abrasive grains and organic residues, derived from a slurry, from a semiconductor substrate in which a Co contact plug or a Co wire is present. The present invention relates to a cleaning liquid composition, which is used for cleaning a substrate having a Co contact plug and/or a Co wire, and which contains one or more types of reducing agent and water. The present invention also relates to a cleaning liquid composition, which is used for cleaning a substrate that contains Co but contains no Cu and which contains one or more types of reducing agent and water and has a pH of not less than 3 but less than 12.
Provided is a method for producing intestinal cells derived from pluripotent stem cells, the produced intestinal cells exhibiting functions which are similar to those of actual intestinal cells. This method for producing intestinal cells uses a culture for differentiation into intestinal cells, which is characterized by containing a GSK3 inhibitor and one type selected from the group consisting of an activating agent for hepatocyte growth factor receptors, adrenal cortex hormone, calcitriol, and dimethylsulfoxide.
C12N 5/071 - Vertebrate cells or tissues, e.g. human cells or tissues
C07K 14/78 - Connective tissue peptides, e.g. collagen, elastin, laminin, fibronectin, vitronectin or cold insoluble globulin [CIG]
C12N 1/00 - Microorganisms, e.g. protozoaCompositions thereofProcesses of propagating, maintaining or preserving microorganisms or compositions thereofProcesses of preparing or isolating a composition containing a microorganismCulture media therefor
Provided are: an etchant composition for titanium or titanium alloy, the etchant composition being used for selectively etching a titanium layer or titanium-containing layer formed on an oxide semiconductor layer; and an etching method using said etchant composition. The etchant composition according to the present invention, which is used for etching a titanium layer or titanium-containing layer on an oxide semiconductor, comprises: a compound containing ammonium ions; hydrogen peroxide; and a basic compound, wherein the etchant composition has a pH of 7-11.
4, Si, and the like forming a layer on the substrate surface, can be used under processing conditions applicable to a brush scrub cleaning chamber equipped with a CMP apparatus, and can efficiently remove compounds derived from abrasive particles in a slurry. This cleaning solution composition for cleaning the surface of a semiconductor substrate or glass substrate contains: one or two or more fluorine atom-containing inorganic acids or salts thereof; water; one or two or more reducing agents; and one or two or more anionic surfactants, and has a hydrogen ion concentration (pH) of less than 7.
Provided is a cleaning liquid composition which is useful for cleaning of a substrate or the like that has been subjected to a chemical mechanical polishing (CMP) process, etc in the production steps of an electronic device such as a semiconductor element. A cleaning liquid composition according to the present invention is used for the purpose of cleaning a substrate that has a Cu wiring, and comprises one or more basic compounds and one or more nitrogen-containing monocyclic heterocyclic aromatic compounds that contain one or more carboxyl groups or ester groups, provided that in cases where one or more amino groups are contained therein, only amino groups directly bonded to a nitrogen-containing heterocyclic rind are contained. This cleaning liquid composition has a hydrogen ion concentration (pH) of 8-12.
H01L 23/532 - Arrangements for conducting electric current within the device in operation from one component to another including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body characterised by the materials
01 - Chemical and biological materials for industrial, scientific and agricultural use
Goods & Services
Chemical reagents, other than for medical or veterinary
purposes; chemical substances for analyses in laboratories,
other than for medical or veterinary purposes; chemical
preparations for scientific purposes, other than for medical
or veterinary use; industrial chemicals; chemical substances
for preserving foodstuffs; chemical substances used as food
additives.
01 - Chemical and biological materials for industrial, scientific and agricultural use
05 - Pharmaceutical, veterinary and sanitary products
Goods & Services
Chemical reagents, other than for medical or veterinary
purposes; chemical substances for analyses in laboratories,
other than for medical or veterinary purposes; chemical
preparations for scientific purposes, other than for medical
or veterinary use; industrial chemicals; chemical substances
for preserving foodstuffs; chemical substances used as food
additives. Pharmaceutical preparations; veterinary preparations;
chemical reagents for medical or veterinary purposes;
diagnostic reagents; clinical diagnostic reagents;
diagnostic preparations for medical purposes; chemical
preparations for pharmaceutical purposes; chemical
preparations for medical purposes; chemical preparations for
veterinary purposes.
01 - Chemical and biological materials for industrial, scientific and agricultural use
05 - Pharmaceutical, veterinary and sanitary products
Goods & Services
Chemical reagents, other than for medical or veterinary
purposes; chemical substances for analyses in laboratories,
other than for medical or veterinary purposes; chemical
preparations for scientific purposes, other than for medical
or veterinary use; industrial chemicals; chemical substances
for preserving foodstuffs; chemical substances used as food
additives. Pharmaceutical preparations; veterinary preparations;
chemical reagents for medical or veterinary purposes;
diagnostic reagents; clinical diagnostic reagents;
diagnostic preparations for medical purposes; chemical
preparations for pharmaceutical purposes; chemical
preparations for medical purposes; chemical preparations for
veterinary purposes.
38.
METHOD FOR INDUCING DIFFERENTIATION OF PLURIPOTENT STEM CELLS INTO HEPATOCYTES
Provided is a method for preparing hepatocytes or cells that can be differentiated into hepatocytes from pluripotent stem cells for the purpose of preparing mature hepatocytes that are similar in many respects to primary cultured hepatocytes, wherein the method is characterized by including (1) a step for culturing pluripotent stem cells in a medium that contains an activator of activin receptor-like kinase-4,7, (2) a step for culturing the cells obtained in step (1) in a medium that contains an osteogenic factor and a fibroblast growth factor, (3) a step for culturing the cells obtained in step (2) in a medium that contains a hepatocyte growth factor receptor activator and an oncostatin M receptor activator, and (4) a step for culturing the cells obtained in step (3) and obtaining hepatocytes or cells that can be differentiated into hepatocytes, at least one of steps (2), (3), and (4) involving culturing the cells on a high-density collagen gel membrane.
Provided are: an etchant composition for titanium or titanium alloy, the etchant composition being used for selectively etching a titanium layer or titanium-containing layer formed on an oxide semiconductor layer; and an etching method using said etchant composition. The etchant composition according to the present invention, which is used for etching a titanium layer or titanium-containing layer on an oxide semiconductor, comprises: a compound containing ammonium ions; hydrogen peroxide; and a basic compound, wherein the etchant composition has a pH of 7-11.
2344, Si, etc., forming a layer on the substrate surface, when cleaning a surface of a semiconductor substrate or a glass substrate; can be used under processing conditions applicable to a brush scrub cleaning chamber attached to a CMP device; and exhibits high removal of compounds derived from polishing particles in a slurry. This cleaning solution composition is a cleaning solution composition for cleaning a surface of a semiconductor substrate or a glass substrate, contains water and one or two or more inorganic acids (excluding hydrofluoric acid) or salts thereof containing a fluorine atom in the structure thereof, and has a hydrogen ion concentration (pH) of less than 7.
2344, Si, and the like forming a layer on the substrate surface, can be used under processing conditions applicable to a brush scrub cleaning chamber equipped with a CMP apparatus, and can efficiently remove compounds derived from abrasive particles in a slurry. This cleaning solution composition for cleaning the surface of a semiconductor substrate or glass substrate contains: one or two or more fluorine atom-containing inorganic acids or salts thereof; water; one or two or more reducing agents; and one or two or more anionic surfactants, and has a hydrogen ion concentration (pH) of less than 7.
[Problem] A problem was presented in that conventional photochromic compounds cannot be considered adequate in terms of the coloring/decoloring rate and durability, and the production process therefor has many steps. The present invention provides an industrially applicable photochromic compound that has both a rapid coloring/decoloring reaction and high durability and can also be synthesized at a low cost. [Solution] This compound is characterized in that etheric oxygen atoms are bonded to the carbon atoms at position 1 of a pyranoquinazoline (8H-pyrano[3,2-f]quinazoline) skeleton and position 10 of a naphthopyran (3H-naphtho[2,1-b]pyran) skeleton, said compound having photochromic properties and being a photochromic compound that has both a rapid coloring/decoloring reaction and high durability. Also provided is an industrially applicable photochromic compound that can be synthesized at a low cost.
C07D 491/052 - Ortho-condensed systems with only one oxygen atom as ring hetero atom in the oxygen-containing ring the oxygen-containing ring being six-membered
C07D 519/00 - Heterocyclic compounds containing more than one system of two or more relevant hetero rings condensed among themselves or condensed with a common carbocyclic ring system not provided for in groups or
C08F 220/18 - Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
G02B 1/04 - Optical elements characterised by the material of which they are madeOptical coatings for optical elements made of organic materials, e.g. plastics
Provided is a cleaning liquid composition which is useful for cleaning of a substrate or the like that has been subjected to a chemical mechanical polishing (CMP) process in the production steps of an electronic device such as a semiconductor element. A cleaning liquid composition according to the present invention is used for the purpose of cleaning a substrate that has a Cu wiring line, and comprises one or more basic compounds and one or more nitrogen-containing monocyclic heterocyclic aromatic compounds that contain one or more carboxyl groups or ester groups, provided that in cases where one or more amino groups are contained therein, only amino groups directly bonded to a nitrogen-containing heterocyclic ring are contained. This cleaning liquid composition has a hydrogen ion concentration (pH) of 8-12.
Provided are: a gold precipitation accelerator which is for use in electroless gold plating, and which contains at least one type of alkali metal compound, wherein the alkali metal compound is other than compounds that contain only sodium as the alkali metal or that solely comprise a halide of an alkali metal, potassium sulfite, or potassium sodium tartrate; an electroless gold plating solution containing said gold precipitation accelerator; a gold plating method using same; a gold precipitation acceleration method; and the like.
To provide a composition for removing photoresist residue and/or polymer residue formed in a process for producing a semiconductor circuit element, and a removal method employing same. A composition for removing photoresist residue and/or polymer residue, the composition containing saccharin and water, and the pH being no greater than 9.7.
Provided are: an etching liquid composition which is capable of collectively etching a tungsten film and a titanium nitride film; and an etching method which uses this etching liquid composition. An etching liquid composition according to the present invention contains nitric acid and water, and is used for the purpose of collectively etching a tungsten film and a titanium nitride film.
H01L 21/308 - Chemical or electrical treatment, e.g. electrolytic etching using masks
C23F 1/26 - Acidic compositions for etching refractory metals
H01L 21/3213 - Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer
H01L 21/768 - Applying interconnections to be used for carrying current between separate components within a device
47.
Long-term storage medium for culturing obligate anaerobic bacteria or microaerobic bacteria under aerobic environment, and method of detecting obligate anaerobic bacteria or microaerobic bacteria using said medium
[Problem] To provide a medium suitable for long-term storage, i.e., that ensures sufficient quality retention period, for growing obligate anaerobic bacteria or microaerobic bacteria under aerobic environment, and to provide a method of easily detecting obligate anaerobic bacteria or microaerobic bacteria using said medium.
[Means for solving the problem] A long-term storage medium comprising dithiothreitol and/or ascorbic acid as a reducing agent in a basal medium, for culturing obligate anaerobic bacteria or microaerobic bacteria under aerobic environment, and a method of detecting obligate anaerobic bacteria or microaerobic bacteria using said medium.
C12N 1/38 - Chemical stimulation of growth or activity by addition of chemical compounds which are not essential growth factorsStimulation of growth by removal of a chemical compound
48.
Pentaarylbiimidazole compound and production method for said compound
In order to address the problems of conventional photochromic compounds, which are the insufficient coloring/discoloring speed and durability exhibited thereby and the large number of production steps, the present invention provides a photochromic compound that exhibits a high speed coloring/discoloring reaction and high durability while it is able to be synthesized in low cost, and that has industrial applicability. The compound of the present invention is characterized by the insertion of a diarylimidazolyl radical into the ortho position of an aryl group. The compound exhibits photochromic properties, and achieves a photochromic compound having both a high speed color switching reaction and high durability. Furthermore low cost synthesis is possible, and the photochromic compound has industrial applicability.
C08K 5/3447 - Five-membered rings condensed with carbocyclic rings
C07D 233/58 - Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members with only hydrogen atoms or radicals containing only hydrogen and carbon atoms, attached to ring carbon atoms with only hydrogen atoms or radicals containing only hydrogen and carbon atoms, attached to ring nitrogen atoms
C07D 233/64 - Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members with substituted hydrocarbon radicals attached to ring carbon atoms, e.g. histidine
Provided are: a gelling agent for producing a gel that has exceptional conductivity and durability, especially a gel for an aluminum electrolytic capacitor; a method for producing a gel using the gelling agent; and a gel produced using the gelling agent. A gelling agent including a polymer compound and surface-modified inorganic particles that have a group containing at least one selected from the group consisting of optionally substituted amino groups, optionally substituted aliphatic amino groups, and optionally substituted alicyclic amino groups, the gelling agent being capable of forming a network structure due to these forming onium salts.
Objects of the present invention are to provide a novel dehydrogenation reaction catalyst, to provide a method that can produce a ketone, an aldehyde, and a carboxylic acid with high efficiency from an alcohol, and to provide a method for efficiently producing hydrogen from an alcohol, formic acid, or a formate, and they are accomplished by a catalyst containing an organometallic compound of Formula (1).
C01B 3/06 - Production of hydrogen or of gaseous mixtures containing hydrogen by reaction of inorganic compounds containing electro-positively bound hydrogen, e.g. water, acids, bases, ammonia, with inorganic reducing agents
C01B 3/32 - Production of hydrogen or of gaseous mixtures containing hydrogen by reaction of gaseous or liquid organic compounds with gasifying agents, e.g. water, carbon dioxide, air
C01B 3/00 - HydrogenGaseous mixtures containing hydrogenSeparation of hydrogen from mixtures containing itPurification of hydrogen
C01B 3/22 - Production of hydrogen or of gaseous mixtures containing hydrogen by decomposition of gaseous or liquid organic compounds
C07B 41/06 - Formation or introduction of functional groups containing oxygen of carbonyl groups
C07B 41/08 - Formation or introduction of functional groups containing oxygen of carboxyl groups or salts, halides or anhydrides thereof
C07J 13/00 - Normal steroids containing carbon, hydrogen, halogen, or oxygen, having a carbon-to-carbon double bond from or to position 17
51.
METHOD FOR MANUFACTURING NIOBIC-ACID-BASED FERROELECTRIC THIN-FILM ELEMENT
This manufacturing method for a thin-film element using a niobic-acid-based ferroelectric that does not include lead is characterized by comprising: a step for forming a lower electrode film, wherein a lower electrode film is formed on a substrate; a step for forming a ferroelectric thin film, wherein a niobic-acid-based ferroelectric thin film is formed on the lower electrode film; a step for forming an etching mask pattern, wherein an etching mask is formed on the niobic-acid-based ferroelectric thin film so as to become a desired pattern; and a step for etching a ferroelectric thin film, wherein the desired pattern is microfabricated on the niobic-acid-based ferroelectric thin film by performing wet etching using an etching liquid that includes a predetermined chelating agent in an alkali aqueous solution and H2O2 aq. on the niobic-acid-based ferroelectric thin film. The predetermined chelating agent is at least one selected from EDTMP, NTMP, CyDTA, HEDP, GBMP, DTPMP and citric acid, and the alkali aqueous solution includes NH3 aq.
H01L 41/316 - Applying piezo-electric or electrostrictive parts or bodies onto an electrical element or another base by depositing piezo-electric or electrostrictive layers, e.g. aerosol or screen printing by vapour phase deposition
H02N 2/00 - Electric machines in general using piezoelectric effect, electrostriction or magnetostriction
52.
ETCHANT COMPOSITION FOR MULTILAYERED METAL FILM OF COPPER AND MOLYBDENUM, METHOD OF ETCHING USING SAID COMPOSITION, AND METHOD FOR PROLONGING LIFE OF SAID COMPOSITION
Provided is an etchant composition for a multilayered metal film comprising both a layer comprising copper and a layer comprising molybdenum, the etchant composition: being capable of etching en bloc a multilayered metal film comprising a layer constituted of copper or an alloy including copper as the main component and a layer constituted of molybdenum or an alloy including molybdenum as the main component; being effective in preventing the molybdenum layer from being undercut; making it easy to regulate the component concentrations so as to accommodate the cross-sectional shape control and cross-section; and being stable. Also provided are a method of etching using the etchant composition and a method for prolonging the life of the etchant composition. The etchant composition according to the present invention is an etchant composition for use in etching en bloc a multilayered metal film comprising a layer constituted of copper or an alloy including copper as the main component and a layer constituted of molybdenum or an alloy including molybdenum as the main component, and comprises hydrogen peroxide, an organic acid, an amine compound, an azole, and a hydrogen peroxide stabilizer (no inorganic acid is contained therein).
Provided are: a composition for removing a photoresist residue and/or a polymer residue that is generated during the production process of a semiconductor circuit element; and a removal method which uses this composition. A composition for removing a photoresist residue and/or a polymer residue, which is characterized by containing saccharin and water and having a pH of 9.7 or less.
The purpose of the invention is to provide a novel organometallic compound that can be utilized as a catalyst having high generality, high activity, and excellent functional group selectivity. The invention pertains to a novel organometallic compound represented by general formula (1) that catalyzes a reductive amination reaction.
C07C 255/58 - Carboxylic acid nitriles having cyano groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton containing cyano groups and singly-bound nitrogen atoms, not being further bound to other hetero atoms, bound to the carbon skeleton
C07C 209/28 - Preparation of compounds containing amino groups bound to a carbon skeleton by reductive alkylation of ammonia, amines or compounds having groups reducible to amino groups, with carbonyl compounds by reduction with other reducing agents
C07F 15/00 - Compounds containing elements of Groups 8, 9, 10 or 18 of the Periodic Table
C07C 211/27 - Compounds containing amino groups bound to a carbon skeleton having amino groups bound to acyclic carbon atoms of an unsaturated carbon skeleton containing at least one six-membered aromatic ring having amino groups linked to the six-membered aromatic ring by saturated carbon chains
C07C 211/29 - Compounds containing amino groups bound to a carbon skeleton having amino groups bound to acyclic carbon atoms of an unsaturated carbon skeleton containing at least one six-membered aromatic ring the carbon skeleton being further substituted by halogen atoms or by nitro or nitroso groups
C07C 211/35 - Compounds containing amino groups bound to a carbon skeleton having amino groups bound to carbon atoms of rings other than six-membered aromatic rings of a saturated carbon skeleton containing only non-condensed rings
C07C 211/40 - Compounds containing amino groups bound to a carbon skeleton having amino groups bound to carbon atoms of rings other than six-membered aromatic rings of an unsaturated carbon skeleton containing only non-condensed rings
C07C 211/42 - Compounds containing amino groups bound to a carbon skeleton having amino groups bound to carbon atoms of rings other than six-membered aromatic rings of an unsaturated carbon skeleton containing condensed ring systems with six-membered aromatic rings being part of the condensed ring systems
C07C 213/02 - Preparation of compounds containing amino and hydroxy, amino and etherified hydroxy or amino and esterified hydroxy groups bound to the same carbon skeleton by reactions involving the formation of amino groups from compounds containing hydroxy groups or etherified or esterified hydroxy groups
C07C 215/08 - Compounds containing amino and hydroxy groups bound to the same carbon skeleton having hydroxy groups and amino groups bound to acyclic carbon atoms of the same carbon skeleton the carbon skeleton being saturated and acyclic with only one hydroxy group and one amino group bound to the carbon skeleton
C07C 217/60 - Compounds containing amino and etherified hydroxy groups bound to the same carbon skeleton having etherified hydroxy groups bound to carbon atoms of at least one six-membered aromatic ring and amino groups bound to acyclic carbon atoms or to carbon atoms of rings other than six-membered aromatic rings of the same carbon skeleton with amino groups linked to the six-membered aromatic ring, or to the condensed ring system containing that ring, by carbon chains not further substituted by singly-bound oxygen atoms linked by carbon chains having two carbon atoms between the amino groups and the six-membered aromatic ring or the condensed ring system containing that ring
C07C 227/08 - Formation of amino groups in compounds containing carboxyl groups by addition or substitution reactions, without increasing the number of carbon atoms in the carbon skeleton of the acid by reaction of ammonia or amines with acids containing functional groups
C07C 227/32 - Preparation of optical isomers by stereospecific synthesis
C07C 229/14 - Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to acyclic carbon atoms of the same carbon skeleton the carbon skeleton being acyclic and saturated having only one amino and one carboxyl group bound to the carbon skeleton the nitrogen atom of the amino group being further bound to acyclic carbon atoms or to carbon atoms of rings other than six-membered aromatic rings to carbon atoms of carbon skeletons containing rings
C07C 253/30 - Preparation of carboxylic acid nitriles by reactions not involving the formation of cyano groups
C07C 213/08 - Preparation of compounds containing amino and hydroxy, amino and etherified hydroxy or amino and esterified hydroxy groups bound to the same carbon skeleton by reactions not involving the formation of amino groups, hydroxy groups or etherified or esterified hydroxy groups
C07D 217/14 - Heterocyclic compounds containing isoquinoline or hydrogenated isoquinoline ring systems with radicals, substituted by hetero atoms, attached to carbon atoms of the nitrogen-containing ring other than aralkyl radicals
C07D 277/28 - Radicals substituted by nitrogen atoms
C07D 209/48 - Iso-indolesHydrogenated iso-indoles with oxygen atoms in positions 1 and 3, e.g. phthalimide
C07D 213/38 - Radicals substituted by singly-bound nitrogen atoms having only hydrogen or hydrocarbon radicals attached to the substituent nitrogen atom
C07D 213/42 - Radicals substituted by singly-bound nitrogen atoms having hetero atoms attached to the substituent nitrogen atom
B01J 31/18 - Catalysts comprising hydrides, coordination complexes or organic compounds containing coordination complexes containing nitrogen, phosphorus, arsenic or antimony
C07B 43/04 - Formation or introduction of functional groups containing nitrogen of amino groups
55.
Dehydrogenation catalyst, and carbonyl compound and hydrogen production method using said catalyst
Objects of the present invention are to provide a novel dehydrogenation reaction catalyst, to provide a method that can produce a ketone, an aldehyde, and a carboxylic acid with high efficiency from an alcohol, and to provide a method for efficiently producing hydrogen from an alcohol, formic acid, or a formate, and they are accomplished by a catalyst containing an organometallic compound of Formula (1).
C01B 3/32 - Production of hydrogen or of gaseous mixtures containing hydrogen by reaction of gaseous or liquid organic compounds with gasifying agents, e.g. water, carbon dioxide, air
C01B 3/06 - Production of hydrogen or of gaseous mixtures containing hydrogen by reaction of inorganic compounds containing electro-positively bound hydrogen, e.g. water, acids, bases, ammonia, with inorganic reducing agents
C07C 45/00 - Preparation of compounds having C=O groups bound only to carbon or hydrogen atomsPreparation of chelates of such compounds
C07F 17/02 - Metallocenes of metals of Groups 8, 9 or 10 of the Periodic Table
C01B 3/00 - HydrogenGaseous mixtures containing hydrogenSeparation of hydrogen from mixtures containing itPurification of hydrogen
C01B 3/22 - Production of hydrogen or of gaseous mixtures containing hydrogen by decomposition of gaseous or liquid organic compounds
56.
PENTAARYLBIIMIDAZOLE COMPOUND AND PRODUCTION METHOD FOR SAID COMPOUND
In order to address the problems of conventional photochromic compounds, which are the insufficient coloring/discoloring speed and durability exhibited thereby and the large number of production steps, the present invention provides a photochromic compound that exhibits a high-speed coloring/discoloring reaction and high durability, that can be synthesized at low cost, and that has industrial applicability. The compound of the present invention is characterized by the insertion of a diarylimidazolyl radical into the ortho position of an ayrl group. The compound exhibits photochromic properties, and achieves a photochromic compound having both a high-speed coloring/discoloring reaction and high durability. Furthermore, low cost synthesis is possible, and the photochromic compound has industrial applicability.
C07D 233/64 - Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members with substituted hydrocarbon radicals attached to ring carbon atoms, e.g. histidine
NATIONAL UNIVERSITY CORPORATION HOKKAIDO UNIVERSITY (Japan)
Inventor
Katayama, Takeaki
Tsutsumi, Kunihiko
Murata, Kunihiko
Ohkuma, Takeshi
Arai, Noriyoshi
Abstract
Methods are provided for producing an optically active secondary alcohol at a high optical purity by hydrogenating a substrate carbonyl compound at a high efficiency using as a catalyst a ruthenium complex bearing as a ligand certain optically active diphosphine compound and a readily synthesized amine compound. For example, aromatic ketones and heteroaromatic ketones are reacted with hydrogen and/or a hydrogen donating compound in the presence of the ruthenium complex.
C07C 41/26 - Preparation of ethers by reactions not forming ether-oxygen bonds by introduction of hydroxy or O-metal groups
C07C 29/145 - Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom not belonging to a six-membered aromatic ring by reduction of an oxygen-containing functional group of C=O containing groups, e.g. —COOH of ketones with hydrogen or hydrogen-containing gases
B01J 31/18 - Catalysts comprising hydrides, coordination complexes or organic compounds containing coordination complexes containing nitrogen, phosphorus, arsenic or antimony
A dried vitrigel membrane is produced by a method including the following steps of (1) a step of keeping a hydrogel in the inside of a wall surface mold with a shape the same as the desired shape disposed on a substrate, and discharging a part of free water within the hydrogel from a gap between the substrate and the wall surface mold; (2) a step of removing the wall surface mold from the top of the substrate; (3) a step of drying the hydrogel to remove the residual free water, thereby fabricating a vitrified dried hydrogel; (4) a step of rehydrating the dried hydrogel to fabricate a vitrigel membrane; and (5) a step of redrying the vitrigel membrane to remove free water, thereby fabricating a vitrified dried vitrigel membrane.
B29C 39/02 - Shaping by casting, i.e. introducing the moulding material into a mould or between confining surfaces without significant moulding pressureApparatus therefor for making articles of definite length, i.e. discrete articles
B29C 41/02 - Shaping by coating a mould, core or other substrate, i.e. by depositing material and stripping-off the shaped articleApparatus therefor for making articles of definite length, i.e. discrete articles
C12N 5/00 - Undifferentiated human, animal or plant cells, e.g. cell linesTissuesCultivation or maintenance thereofCulture media therefor
C12M 1/12 - Apparatus for enzymology or microbiology with sterilisation, filtration, or dialysis means
59.
METHOD FOR PRODUCING NOVEL ORGANOMETALLIC COMPLEX AND AMINE COMPOUND
The purpose of the invention is to provide a novel organometallic compound that can be utilized as a catalyst having high generality, high activity, and excellent functional group selectivity. The invention pertains to a novel organometallic compound represented by general formula (1) that catalyzes a reductive amination reaction.
C07C 209/28 - Preparation of compounds containing amino groups bound to a carbon skeleton by reductive alkylation of ammonia, amines or compounds having groups reducible to amino groups, with carbonyl compounds by reduction with other reducing agents
C07C 211/27 - Compounds containing amino groups bound to a carbon skeleton having amino groups bound to acyclic carbon atoms of an unsaturated carbon skeleton containing at least one six-membered aromatic ring having amino groups linked to the six-membered aromatic ring by saturated carbon chains
C07C 211/29 - Compounds containing amino groups bound to a carbon skeleton having amino groups bound to acyclic carbon atoms of an unsaturated carbon skeleton containing at least one six-membered aromatic ring the carbon skeleton being further substituted by halogen atoms or by nitro or nitroso groups
C07C 211/35 - Compounds containing amino groups bound to a carbon skeleton having amino groups bound to carbon atoms of rings other than six-membered aromatic rings of a saturated carbon skeleton containing only non-condensed rings
C07C 211/40 - Compounds containing amino groups bound to a carbon skeleton having amino groups bound to carbon atoms of rings other than six-membered aromatic rings of an unsaturated carbon skeleton containing only non-condensed rings
C07C 211/42 - Compounds containing amino groups bound to a carbon skeleton having amino groups bound to carbon atoms of rings other than six-membered aromatic rings of an unsaturated carbon skeleton containing condensed ring systems with six-membered aromatic rings being part of the condensed ring systems
C07C 213/02 - Preparation of compounds containing amino and hydroxy, amino and etherified hydroxy or amino and esterified hydroxy groups bound to the same carbon skeleton by reactions involving the formation of amino groups from compounds containing hydroxy groups or etherified or esterified hydroxy groups
C07C 215/08 - Compounds containing amino and hydroxy groups bound to the same carbon skeleton having hydroxy groups and amino groups bound to acyclic carbon atoms of the same carbon skeleton the carbon skeleton being saturated and acyclic with only one hydroxy group and one amino group bound to the carbon skeleton
C07C 217/60 - Compounds containing amino and etherified hydroxy groups bound to the same carbon skeleton having etherified hydroxy groups bound to carbon atoms of at least one six-membered aromatic ring and amino groups bound to acyclic carbon atoms or to carbon atoms of rings other than six-membered aromatic rings of the same carbon skeleton with amino groups linked to the six-membered aromatic ring, or to the condensed ring system containing that ring, by carbon chains not further substituted by singly-bound oxygen atoms linked by carbon chains having two carbon atoms between the amino groups and the six-membered aromatic ring or the condensed ring system containing that ring
C07C 227/08 - Formation of amino groups in compounds containing carboxyl groups by addition or substitution reactions, without increasing the number of carbon atoms in the carbon skeleton of the acid by reaction of ammonia or amines with acids containing functional groups
C07C 227/32 - Preparation of optical isomers by stereospecific synthesis
C07C 229/14 - Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to acyclic carbon atoms of the same carbon skeleton the carbon skeleton being acyclic and saturated having only one amino and one carboxyl group bound to the carbon skeleton the nitrogen atom of the amino group being further bound to acyclic carbon atoms or to carbon atoms of rings other than six-membered aromatic rings to carbon atoms of carbon skeletons containing rings
C07C 253/30 - Preparation of carboxylic acid nitriles by reactions not involving the formation of cyano groups
C07C 255/58 - Carboxylic acid nitriles having cyano groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton containing cyano groups and singly-bound nitrogen atoms, not being further bound to other hetero atoms, bound to the carbon skeleton
C07D 213/38 - Radicals substituted by singly-bound nitrogen atoms having only hydrogen or hydrocarbon radicals attached to the substituent nitrogen atom
C07D 213/42 - Radicals substituted by singly-bound nitrogen atoms having hetero atoms attached to the substituent nitrogen atom
C07D 217/14 - Heterocyclic compounds containing isoquinoline or hydrogenated isoquinoline ring systems with radicals, substituted by hetero atoms, attached to carbon atoms of the nitrogen-containing ring other than aralkyl radicals
C07D 277/28 - Radicals substituted by nitrogen atoms
The purpose of the present invention is to provide a cleaning liquid composition useful in cleaning substrates, etc., which have undergone treatment such as chemical mechanical polishing (CMP) in a process for manufacturing electronic devices such as semiconductor elements. This cleaning liquid composition for cleaning substrates having Cu wiring includes one or more basic compounds and one or more heteromonocyclic aromatic compounds containing a nitrogen atom, and has a hydrogen ion concentration (pH) of 8-11.
[Problem]
The present invention aims to provide a novel organometallic compound that can be used as a general-use highly active catalyst with superior selectivity for functional groups.
[Means for Solving Problem]
The present invention relates to an organometallic compound having a novel specific structure of general formula (1):
and to a general-use highly active catalyst used in reductive amination reaction with superior selectivity for functional groups that comprises said organometallic compound, and to a process for preparing amine compounds by reductive amination reaction using said catalyst.
C07F 15/00 - Compounds containing elements of Groups 8, 9, 10 or 18 of the Periodic Table
B01J 31/12 - Catalysts comprising hydrides, coordination complexes or organic compounds containing organic compounds or metal hydrides containing organo-metallic compounds or metal hydrides
C07C 209/78 - Preparation of compounds containing amino groups bound to a carbon skeleton from amines, by reactions not involving amino groups, e.g. reduction of unsaturated amines, aromatisation, or substitution of the carbon skeleton from carbonyl compounds, e.g. from formaldehyde, and amines having amino groups bound to carbon atoms of six-membered aromatic rings, with formation of methylene-diarylamines
An aim of the present invention is to provide a compound which can reversibly change the enzyme inhibitory activity in response to light, an enzyme inhibitor comprising the compound and a method of controlling an enzyme substrate reaction using the inhibitor. The above-mentioned problem is solved by providing a compound represented by formula (1).
The purposes of the present invention are: to provide a novel catalyst for a dehydrogenation reaction; to provide a method whereby high-efficiency production is possible of ketone, aldehyde, and carboxylic acid, from alcohols; and to provide a method for efficient production of hydrogen from alcohol, formic acid, or formate. Said purposes are achieved using a catalyst including an organic metal compound indicated by formula (1).
C07C 45/39 - Preparation of compounds having C=O groups bound only to carbon or hydrogen atomsPreparation of chelates of such compounds by oxidation with molecular oxygen of C—O— functional groups to C=O groups being a secondary hydroxy group
C07C 45/38 - Preparation of compounds having C=O groups bound only to carbon or hydrogen atomsPreparation of chelates of such compounds by oxidation with molecular oxygen of C—O— functional groups to C=O groups being a primary hydroxy group
C07C 47/02 - Saturated compounds having —CHO groups bound to acyclic carbon atoms or to hydrogen
The purposes of the present invention are: to provide a novel catalyst for a dehydrogenation reaction; to provide a method whereby high-efficiency production is possible of ketone, aldehyde, and carboxylic acid, from alcohols; and to provide a method for efficient production of hydrogen from alcohol, formic acid, or formate. Said purposes are achieved using a catalyst including an organic metal compound indicated by formula (1).
C07C 45/39 - Preparation of compounds having C=O groups bound only to carbon or hydrogen atomsPreparation of chelates of such compounds by oxidation with molecular oxygen of C—O— functional groups to C=O groups being a secondary hydroxy group
C07C 45/38 - Preparation of compounds having C=O groups bound only to carbon or hydrogen atomsPreparation of chelates of such compounds by oxidation with molecular oxygen of C—O— functional groups to C=O groups being a primary hydroxy group
C07C 47/02 - Saturated compounds having —CHO groups bound to acyclic carbon atoms or to hydrogen
[Purpose]
To provide a cleaning liquid composition that has excellent removability for metallic impurities and particulates, does not cause corrosion of Cu, and can clean a semiconductor substrate having copper wiring in a production process for an electronic device such as a semiconductor device.
[Solution means]
A cleaning liquid composition for cleaning a semiconductor substrate having copper wiring, the cleaning liquid composition containing one or more types of basic compound containing no metal, and one or more types of phosphonic acid-based chelating agent, and having a hydrogen ion concentration (pH) of 8 to 10.
The purpose of the present invention is to provide an etching liquid and an etching method in which a silicon layer can be etched at a practical speed using wet etching, in which low contents of a nitrogen-containing compound and a fluorine compound are used, and minimize the amount of side etching, whereby a satisfactory etching shape can be obtained. An etching liquid for etching a silicon layer, the etching liquid being characterized in containing 0.1-30 wt% of a nitrogen-containing compound, a fluorine compound, and one or more types of acidic solvent selected from the group consisting of a phosphorous-containing compound, a sulfur-containing inorganic compound, and an organic compound having a sulfo group.
The purpose of the present invention is to provide: a gel which can overcome the disadvantages of conventional techniques, has high electrical conductivity, and does not cause the corrosion of a metal part of an electrochemical device or the like which is in contact with the gel; a gelling agent which can be used for the production of the gel; a gel production process which can produce the gel readily; and a crosslinking agent which can be used in the production of the gel. A gel produced using a gelling agent that comprises a specific crosslinking agent and a polymeric compound having an atom capable of forming an onium salt is found, whereby the purpose can be achieved.
NATIONAL INSTITUTE OF AGROBIOLOGICAL SCIENCES (Japan)
Kanto Kagaku Kabushiki Kaisha (Japan)
Inventor
Takezawa Toshiaki
Yamaguchi Hiroyuki
Kuroyama Hiroyuki
Sawaguchi Tomoya
Abstract
Provided is a monocameral cell culture chamber in which a dried vitrigel film is coated and secured to one open end surface of a tubular frame. Further provided is a bicameral cell culture chamber in which two tubular frames having the same planar cross-sectional shape are adhesively secured in a state where a dried vitrigel film is interposed between the opposite-facing open end surfaces of the frames, and the first and second chambers are formed with the dried vitrigel film interposed therebetween.
C12M 3/00 - Tissue, human, animal or plant cell, or virus culture apparatus
C12N 5/00 - Undifferentiated human, animal or plant cells, e.g. cell linesTissuesCultivation or maintenance thereofCulture media therefor
69.
Electroless gold plating solution for forming fine gold structure, method of forming fine gold structure using same, and fine gold structure formed using same
An electroless gold plating solution with which one or more openings formed in a resist overlying a substrate can be filled in a short time, the openings having a width on the order of micrometer, in particular, 100 μm or smaller, in terms of the width of the exposed substrate area, and having a height of 3 μm or larger. The electroless gold plating solution contains a deposition accelerator for deposition in fine areas, and a microfine pattern of 100 μm or finer is formed therefrom.
H01L 23/48 - Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads or terminal arrangements
H05K 3/18 - Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
C23C 18/16 - Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coatingContact plating by reduction or substitution, i.e. electroless plating
C23C 18/44 - Coating with noble metals using reducing agents
C23C 18/18 - Pretreatment of the material to be coated
70.
PHOTORESIST RESIDUE AND POLYMER RESIDUE REMOVING LIQUID COMPOSITION
Provided are a photoresist residue and polymer residue removing liquid composition, and a method of removing the residue used therewith, for removing photoresist residue and polymer residue produced during a process of manufacturing a semiconductor circuit element having metallic wiring. Specifically, the composition does not contain nitrogen-containing organic hydroxyl compounds, ammonia or fluorine compounds, and contains an aliphatic polycarboxylic acid having a melting point of 25 °C or higher with an excellent residue removing property and having a metallic oxide main component as the residue removing component. The photoresist residue and polymer residue removing liquid composition, and the method of removing the residue used therewith, is capable of preventing the aliphatic polycarboxylic acid from being recrystallized by evaporation of water after a solution has adhered around a cleaning device liquid ejecting nozzle or a cleaning tank and a chamber. In the photoresist residue and polymer residue removing liquid composition containing the aliphatic polycarboxylic acid with a melting point of 25 °C or higher, the removing liquid contains an organic solvent that is miscible with water and has a vapor pressure of 17 mm Hg or less at 20 °C and a hydroxyl group within the structure.
NATIONAL INSTITUTE OF AGROBIOLOGICAL SCIENCES (Japan)
Kanto Kagaku Kabushiki Kaisha (Japan)
Inventor
Takezawa Toshiaki
Oshikata Ayumi
Kuroyama Hiroyuki
Sawaguchi Tomoya
Yamaguchi Hiroyuki
Abstract
A dried vitrigel film is produced by a process comprising the following steps: (1) a step in which a hydrogel is held in a casting frame which has been disposed on a substrate and has the same shape as the desired shape, and some of the free water in the hydrogel is caused to flow out through the gap between the substrate and the casting frame; (2) a step in which the casting frame is removed from the substrate; (3) a step in which the hydrogel is dried to remove the remaining free water therefrom and thereby produce a vitrified dried hydrogel; (4) a step in which the dried hydrogel is rehydrated to produce a vitrigel film; and (5) a step in which the vitrigel film is redried to remove the free water therefrom and thereby produce a vitrified dried vitrigel film.
The problem to be resolved by the present invention is to provide a method for efficiently synthesizing optically active lower aliphatic alcohols that have difficulty in separation from organic solvents, without using a special reactor.
The present invention relates to a method for producing an optically active aliphatic alcohol having a fluorine atom at α position, wherein an optically active alcohol is produced by reacting an aliphatic ketone having a fluorine atom at α position in water using a formate, under the presence of an asymmetric catalyst represented by general formula (1) and an acid.
C07C 29/143 - Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom not belonging to a six-membered aromatic ring by reduction of an oxygen-containing functional group of C=O containing groups, e.g. —COOH of ketones
73.
Asymmetric catalyst and process for preparing optically active alcohols using the same
The present invention provides an organic metal compound, a ligand, an asymmetric catalyst, and a process for preparing optically-active alcohols using the asymmetric catalyst. The organic metal compound of the present invention is expressed by the following general formula (1):
2 are both a phenyl group.
[Problem]
The present invention aims to provide a novel organometallic compound that can be used as a general-use highly active catalyst with superior selectivity for functional groups.
[Means for Solving Problem]
The present invention relates to an organometallic compound having a novel specific structure of general formula (1):
and to a general-use highly active catalyst used in reductive amination reaction with superior selectivity for functional groups that comprises said organometallic compound, and to a process for preparing amine compounds by reductive amination reaction using said catalyst.
C07F 15/00 - Compounds containing elements of Groups 8, 9, 10 or 18 of the Periodic Table
B01J 31/12 - Catalysts comprising hydrides, coordination complexes or organic compounds containing organic compounds or metal hydrides containing organo-metallic compounds or metal hydrides
75.
ELECTROLESS GOLD PLATING SOLUTION FOR FORMING FINE GOLD STRUCTURE, METHOD OF FORMING FINE GOLD STRUCTURE USING SAME, AND FINE GOLD STRUCTURE FORMED USING SAME
An electroless gold plating solution with which one or more openings formed in a resist overlying a substrate can be filled in a short time, the openings having a width on the order of micrometer, in particular, 100 µm or smaller, in terms of the width of the exposed substrate area, and having a height of 3 µm or larger. The electroless gold plating solution contains a deposition accelerator for deposition in fine areas, and a microfine pattern of 100 µm or finer is formed thereform.
C23C 18/44 - Coating with noble metals using reducing agents
H01L 21/288 - Deposition of conductive or insulating materials for electrodes from a liquid, e.g. electrolytic deposition
H05K 3/18 - Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
Disclosed is a microcrystalline-to-amorphous gold alloy-plated film having excellent electrical properties and excellent mechanical properties. Physical properties including both the advantageous properties of a crystalline structure and the advantageous properties of an amorphous structure can be obtained by allowing a microcrystalline phase and an amorphous phase to exist in a mixed state at a specific ratio. The average particle diameter of the microcrystals is 30 nm or smaller, the volume fraction of the microcrystals is 10 to 90%, the knoop hardness is Hk 180 or more, the specific resistivity is 200 μΩ·cm or less. In the film, hardness and abrasion resistance can be improved while maintaining a good specific resistivity value and chemical stability both inherent to gold at practically insignificant levels. Therefore, the film is useful as a material for connecting an electric or electronic component such as a connector and a relay.
Disclosed are etching solution compositions that comprise fluorine compounds and iron ions, which are used for bulk etching of metal laminate films wherein a layer comprising aluminum or an aluminum alloy is laminated on top and a layer comprising titanium or a titanium alloy on bottom, and an etching method using said etching solution compositions.
H01L 21/308 - Chemical or electrical treatment, e.g. electrolytic etching using masks
C23F 1/20 - Acidic compositions for etching aluminium or alloys thereof
C23F 1/26 - Acidic compositions for etching refractory metals
G02F 1/1368 - Active matrix addressed cells in which the switching element is a three-electrode device
78.
NOVEL CROSSLINKED HEXAARYL BISIMIDAZOLE COMPOUND AND DERIVATIVE THEREOF, METHOD FOR PRODUCING THE COMPOUND AND PRECURSOR COMPOUND TO BE USED IN THE PRODUCTION METHOD
Provided is a crosslinked hexaaryl bisimidazole compound which can achieve photochromic characteristics, i.e., visually showing decoloring simultaneously with the stop of light irradiation, and enables precise control of color tone, density and so on in coloring. Also provided are a method for producing the aforesaid compound whereby the degrees of freedom in molecular design and synthesis can be increased, and a precursor compound to be used in the production method.
C07D 233/58 - Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members with only hydrogen atoms or radicals containing only hydrogen and carbon atoms, attached to ring carbon atoms with only hydrogen atoms or radicals containing only hydrogen and carbon atoms, attached to ring nitrogen atoms
C07F 7/10 - Compounds having one or more C—Si linkages containing nitrogen
Nagoya Industrial Science Research Institute (Japan)
Inventor
Noyori, Ryoji
Okuma, Takeshi
Tsutsumi, Kunihiko
Utsumi, Noriyuki
Murata, Kunihiko
Katayama, Takeaki
Abstract
A novel ruthenium complex which is a highly efficient catalyst useful for the production of optically active 3-quinuclidinols, and a process for production of optically active 3-quinuclidinols using the ruthenium complex as a catalyst, where the optically active 3-quinuclidinols are useful as an optically active, physiologically active compound utilized in medicines and agrichemicals or as a synthetic intermediate such as a liquid crystal material.
C07F 15/00 - Compounds containing elements of Groups 8, 9, 10 or 18 of the Periodic Table
C07D 453/02 - Heterocyclic compounds containing quinuclidine or iso-quinuclidine ring systems, e.g. quinine alkaloids containing not further condensed quinuclidine ring systems
Provided is an etching solution composition for selectively etching a metal film, which is composed of Al, Al alloy or the like and is arranged on an amorphous oxide film, from a laminated film including the metal film and an amorphous oxide film of various types. The etching solution composition is used for selectively etching the metal film from the laminated film which includes the amorphous oxide film and the metal film composed of Al, Al alloy, Cu, Cu alloy, Ag or Ag alloy, and is composed of an aqueous solution containing an alkali.
Provided is a liquid composition for, at a low temperature in a short time, removing a photoresist residue and a polymer residue generated in a semiconductor circuit element manufacturing process. A residue removing method using such composition is also provided. The composition removes the photoresist residue and/or the polymer residue generated in the manufacturing process of a semiconductor circuit element having a metal wiring. The composition includes a fluorine compound of 0.5-3.0 mass% and water not over 30 mass%, and has a pH of 4 or less.
Disclosed is a positive resist processing liquid composition which is composed of an aqueous solution containing a quaternary ammonium hydroxide represented by the following general formula (I). In the formula, R1 and R3 independently represent a methyl group, and R2 represents an alkyl group having 12-18 carbon atoms.
Disclosed is an iodine-based etching solution for etching a material wherein palladium and gold coexist. This etching solution contains at least one additive selected from the group consisting of nitrogen-containing five-membered ring compounds, alcohol compounds, amide compounds, ketone compounds, thiocyanic acid compounds, amine compounds and imide compounds. The etching rate ratio between palladium and gold (etching rate of palladium/etching rate of gold) is not less than 1.
NAGOYA INDUSTRIAL SCIENCE RESEARCH INSTITUTE (Japan)
Inventor
Utsumi, Noriyuki
Murata, Kunihiko
Tsutsumi, Kunihiko
Katayama, Takeaki
Ohkuma, Takeshi
Noyori, Ryoji
Abstract
An optically active alcohol is produced by incorporating in a solvent a ketone compound together with a Lewis acid and a ruthenium complex of the formula: and mixing them together in the presence of hydrogen to thereby hydrogenate the ketone compound.
B01J 31/26 - Catalysts comprising hydrides, coordination complexes or organic compounds containing in addition, inorganic metal compounds not provided for in groups
C07C 29/149 - Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom not belonging to a six-membered aromatic ring by reduction of an oxygen-containing functional group of C=O containing groups, e.g. —COOH of carboxylic acids or derivatives thereof with hydrogen or hydrogen-containing gases
C07C 33/20 - Monohydroxylic alcohols containing only six-membered aromatic rings as cyclic part monocyclic
C07C 35/32 - Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a ring other than a six-membered aromatic ring polycyclic, at least one hydroxy group bound to a condensed ring system with a hydroxy group on a condensed ring system having two rings the condensed ring system being a [4.3.0] system, e.g. indenols
C07D 311/22 - Benzo [b] pyrans, not hydrogenated in the carbocyclic ring with oxygen or sulfur atoms directly attached in position 4
85.
SULFONATE CATALYST AND PROCESS FOR PRODUCING ALCOHOL COMPOUND THEREWITH
NAGOYA INDUSTRIAL SCIENCE RESEARCH INSTITUTE (Japan)
Inventor
Utsumi, Noriyuki
Murata, Kunihiko
Tsutsumi, Kunihiko
Katayama, Takeaki
Ohkuma, Takeshi
Noyori, Ryoji
Abstract
An optically active alcohol is produced by incorporating in a solvent a ketone compound and a sulfonate catalyst of the formula: and mixing them together in the presence of hydrogen to thereby hydrogenate the ketone compound.
C07C 29/149 - Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom not belonging to a six-membered aromatic ring by reduction of an oxygen-containing functional group of C=O containing groups, e.g. —COOH of carboxylic acids or derivatives thereof with hydrogen or hydrogen-containing gases
C07C 33/20 - Monohydroxylic alcohols containing only six-membered aromatic rings as cyclic part monocyclic
C07C 33/46 - Halogenated unsaturated alcohols containing only six-membered aromatic rings as cyclic part
C07C 35/32 - Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a ring other than a six-membered aromatic ring polycyclic, at least one hydroxy group bound to a condensed ring system with a hydroxy group on a condensed ring system having two rings the condensed ring system being a [4.3.0] system, e.g. indenols
C07D 311/22 - Benzo [b] pyrans, not hydrogenated in the carbocyclic ring with oxygen or sulfur atoms directly attached in position 4
86.
SULFONATE CATALYST AND PROCESS FOR PRODUCING ALCOHOL COMPOUND WITH THE SAME
NAGOYA INDUSTRIAL SCIENCE RESEARCH INSTITUTE (Japan)
Inventor
Utsumi, Noriyuki
Murata, Kunihiko
Tsutsumi, Kunihiko
Katayama, Takeaki
Watanabe, Masahito
Ohkuma, Takeshi
Noyori, Ryoji
Abstract
The sulfonate catalyst represented by the following formula and a ketone compound are added to a solvent and the ingredients are mixed together in the presence of hydrogen. Thus, the ketone compound is hydrogenated to produce an optically active alcohol.
C07C 29/145 - Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom not belonging to a six-membered aromatic ring by reduction of an oxygen-containing functional group of C=O containing groups, e.g. —COOH of ketones with hydrogen or hydrogen-containing gases
C07C 33/26 - Polyhydroxylic alcohols containing only six-membered aromatic rings as cyclic part
C07C 33/46 - Halogenated unsaturated alcohols containing only six-membered aromatic rings as cyclic part
C07C 35/32 - Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a ring other than a six-membered aromatic ring polycyclic, at least one hydroxy group bound to a condensed ring system with a hydroxy group on a condensed ring system having two rings the condensed ring system being a [4.3.0] system, e.g. indenols
C07C 37/00 - Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom of a six-membered aromatic ring
C07C 39/11 - Alkylated hydroxy benzenes containing also acyclically bound hydroxy groups, e.g. saligenol
C07C 41/00 - Preparation of ethersPreparation of compounds having groups, groups or groups
C07C 43/23 - Ethers having an ether-oxygen atom bound to a carbon atom of a six-membered aromatic ring containing hydroxy or O-metal groups
C07C 67/317 - Preparation of carboxylic acid esters by modifying the acid moiety of the ester, such modification not being an introduction of an ester group by splitting-off hydrogen or functional groupsPreparation of carboxylic acid esters by modifying the acid moiety of the ester, such modification not being an introduction of an ester group by hydrogenolysis of functional groups
C07C 69/732 - Esters of carboxylic acids having esterified carboxyl groups bound to acyclic carbon atoms and having any of the groups OH, O-metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety of unsaturated acids of unsaturated hydroxy carboxylic acids
C07C 253/30 - Preparation of carboxylic acid nitriles by reactions not involving the formation of cyano groups
C07C 255/53 - Carboxylic acid nitriles having cyano groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton containing cyano groups and hydroxy groups bound to the carbon skeleton
C07D 311/22 - Benzo [b] pyrans, not hydrogenated in the carbocyclic ring with oxygen or sulfur atoms directly attached in position 4
