A laser irradiation device includes an optical system including a light source emitting a laser, a pattern mask including a plurality of patterns on which the laser emitted from the optical system is incident and through which the laser passes, and a moving module moving the pattern mask in a direction perpendicular to the substrate while irradiating the metal layer with the laser to control an area in which the metal layer is irradiated with the laser. The plurality of pad electrodes and the plurality of bump electrodes are electrically connected through the plurality of metal patterns.
The present invention relates to a bearing retainer with reinforced strength. A bearing retainer according to an aspect of the present invention comprises a first retainer and a second retainer which are formed in a same shape and are coupled to each other, wherein the first retainer comprises ball insertion grooves which are formed in semi-circular shapes so that balls can be inserted therein, a coupling protrusion formed between ball insertion grooves, a coupling groove formed between the ball insertion grooves so that the coupling protrusion can be inserted therein, a reinforcing protrusion reinforcing the thickness of the coupling protrusion and the coupling groove in the inner circumference of the first retainer, and inner circumference grooves formed in the inner circumference of the first retainer at positions corresponding to the ball insertion grooves.
An apparatus and a method for sintering a conductive material using a laser are disclosed. An apparatus for sintering a conductive material, according to an aspect of the present invention, comprises: a laser beam source; a laser resonator capable of selectively outputting a laser beam having two or more different wavelengths by converting a wavelength of a laser beam outputted from the laser beam source; and an optical system for forming the laser beam outputted from the laser resonator into a line beam.
H05K 3/12 - Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using printing techniques to apply the conductive material
4.
DEVICE AND METHOD FOR CRYSTALLIZING ITO BY USING LASER
A device and a method for crystallizing ITO by using a laser are disclosed. A method for crystallizing ITO, according to another aspect of the present invention, comprises the steps of: forming an amorphous ITO layer on a film or glass at a room temperature; forming a metal layer on the amorphous ITO layer; partially crystallizing the amorphous ITO layer by using a laser and a mask; and removing the metal layer and amorphous ITO, which is not crystallized, by using an etching solution.
An ITO patterning device and a patterning method are disclosed. An ITO patterning method according to an aspect of the present invention comprises the steps of: forming an amorphous ITO layer on film or glass; forming a portion, which is to be formed as an ITO pattern, as polycrystalline ITO by partially annealing the amorphous ITO layer using a line beam-type laser beam and a mask, which has a to-be-formed ITO pattern formed thereon; and forming an ITO pattern by removing amorphous ITO, which has not been annealed, from the amorphous ITO layer by chemical etching such that the polycrystalline ITO remains. The wavelength of the laser beam is in a range above 0 and equal to or less than 250nm, and the amount of energy is in a range equal to or more than 60mJ/cm2 and equal to or less than 100mJ/cm2.
Disclosed is a rubbing and photo-aligning device. A rubbing and photo-aligning device according to an aspect of the present invention includes a gantry positioned above a table for supporting a liquid crystal display element, a lamp arranged within the gantry for generating a light for photo-aligning, and a photo-aligning case connected to the outside of the gantry for altering the properties of the light generated from the lamp, wherein the gantry may be joined selectively with a rubbing roller or the photo-aligning case.
A porous ceramic table is disclosed. The porous ceramic table according to one embodiment of the present invention comprises: a central portion comprising vacuum and purge lines; and a porous adsorption portion formed by a porous ceramic at the circumference of the central portion, wherein a plurality of lift pin holes are formed at the central portion and the porous adsorption portion.
H01L 21/683 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereofApparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for supporting or gripping
B23Q 3/08 - Work-clamping means other than mechanically-actuated
Disclosed are a stage rotation device and an optical orientation apparatus including same. The optical orientation apparatus according to one aspect of the present invention includes an optical irradiation unit, which has an electrodeless UV lamp which emits light by receiving microwaves and aligns liquid crystal elements in a certain direction by polarizing the light from the electrodeless UV lamp and irradiating an orientation film with the light, and the stage rotation device which is capable of changing the entry angle of the orientation film with respect to the irradiation direction of the optical irradiation unit.
Disclosed are a stage rotating apparatus and a rubbing apparatus comprising same. The stage rotating apparatus according to one aspect of the present invention comprises: a driving unit for providing rotating force to a stage and serving as a rotation center of the stage; a first support unit arranged and fixed at the circumference of the driving unit to support the rotating stage with respect to a height direction; and a second support unit arranged circularly along the circumference of the first support unit to support the stage with respect to the height direction. Furthermore, predetermined spacing is formed in a joint portion between the stage and the driving unit in the height direction.
G02F 1/1337 - Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
G02F 1/13 - Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulatingNon-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
A photo-orienting illumination device comprising: a polarizing means (3) comprising a plurality of unit polarizers (31a-f) arranged adjacent in the adjacency direction; and a scanning means that scans in a prescribed scanning direction ultraviolet rays from a polarized light irradiation means (2) on to a substrate (9) mounted on a stage (4), by moving at least either the stage (4) or the polarized light irradiation means (2). The photo-orienting illumination device has good orienting characteristics as a result of the adjacent surfaces of the unit polarizers (31a-f) and the adjacency direction of the unit polarizers (31a-f) being inclined relative to the scanning direction.
G02F 1/13 - Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulatingNon-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
A photo-orienting illumination device having good orienting characteristics and comprising: a polarizing means (3) comprising a plurality of unit polarizers (31a-f) arranged adjacent in the adjacency direction; a scanning means that scans in a prescribed scanning direction ultraviolet rays from a polarized light irradiation means (2) on to a substrate (9) mounted on a stage (4), by moving at least either the stage (4) or the polarized light irradiation means (2); and polarizing direction detection means (6a-f) that enable the detection, for each unit polarizer (31a-f), of the polarizing direction of the ultraviolet light emitted from the unit polarizers (31a-f).
G02F 1/13 - Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulatingNon-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
In a laser reflective mask and a fabricating method thereof, reflective layers with different reflectances are sequentially and repeatedly laminated on top of a base substrate which has a reflective layer filling groove having a predetermined depth in a reflection region for a laser beam and then the remaining reflective layer laminated on the other region except for the portion filled in the reflective layer filling groove are removed through a chemical mechanical polishing (CMP) process, or a lift-off process using irradiation with the laser beam or an etchant, so that a reflective layer pattern configured to be filled in the reflective layer filling groove may be formed, thereby capable of not only facilitating a fabricating process of the laser reflective mask but also forming a more precise reflective layer pattern.
Disclosed is a selective thin film removal apparatus using divided laser beams. The thin film removal apparatus of the present invention includes: a beam generating unit for generating an excimer laser beam of a deep UV wavelength; two or more head units for outputting divided beams by dividing the laser beam; a head supporting unit for enabling the head units to move linearly from an upper part of a processing target; a stage which is located at a lower part of each head unit and can be moved on a plane; and a head driving unit for independently moving each head unit from the heat supporting unit to set a location of each head unit. Additionally, the head unit includes: a beam shutter for enabling on/off of the divided beams; a beam homogenizer for improving the uniformity of the divided beams at an upper end of the processing target; and a projection lens unit for reducing the divided beams at an upper part of the processing target.
[PROBLEM] To provide a photo-alignment exposure apparatus and a photo-alignment exposure method, whereby an alignment film having excellent characteristics can be formed. [SOLUTION] A photo-alignment exposure apparatus (1) of the present invention is characterized in being provided with: a radiation optical system (11), which includes a polarization light radiating means (12) and a polarization control element (14), and which radiates a beam to a substrate (2) having an alignment film on the surface; and a scanning means (15), which moves at least the substrate (2) or a part of the radiation optical system (11), and scans the substrate (2) in the predetermined scanning direction with the beam. The photo-alignment exposure apparatus is also characterized in that the polarization light radiating means (12) outputs linear polarization light to the polarization control element (14), the polarization control element (14) has unit polarization control regions disposed in the direction that orthogonally intersects the scanning direction, and the polarization direction of the beam radiated from the unit polarization control regions periodically changes by the predetermined number of unit polarization control regions, and within the period, the polarization direction is substantially symmetric with respect to the flat surface that is parallel to the scanning direction and is substantially symmetric with respect to the flat surface that orthogonally intersects the substrate.
In a laser reflective mask and a fabricating method thereof, reflective layers with different reflectances are sequentially and repeatedly laminated on top of a base substrate which has a reflective layer filling groove having a predetermined depth in a reflection region for a laser beam and then the remaining reflective layer laminated on the other region except for the portion filled in the reflective layer filling groove are removed through a chemical mechanical polishing (CMP) process, or a lift-off process using irradiation with the laser beam or an etchant, so that a reflective layer pattern configured to be filled in the reflective layer filling groove may be formed, thereby capable of not only facilitating a fabricating process of the laser reflective mask but also forming a more precise reflective layer pattern.
The present invention relates to an apparatus for printing fine patterns using a three-axis driving mechanism. More particularly, the present invention relates to an apparatus for printing fine patterns using a three-axis driving mechanism, in which a pair of vertical driving means for driving a circular, arc-shaped, and nearly flat printing plate in a vertical direction are connected to the respective ends of the printing plate, and a horizontal driving means for driving the printing plate in a horizontal direction is connected to one side of the printing plate, such that the pair of vertical driving means and the horizontal driving means are synchronized with each other to drive the printing plate via a three-axis mechanism during pattern-printing, and the circular arc-shaped printing plate moves along the path of rotation of a circle having a radius of curvature identical to that of the circular arc of the printing plate so as to form a pattern on the upper surface of a substrate to be printed, thereby improving the reproducibility of the pattern formed on the substrate to be printed. The apparatus for printing fine patterns using a three-axis driving mechanism according to the present invention comprises: a stage having an upper surface on which a substrate to be printed is disposed; a printing plate which is arranged above the stage, and which has a lower surface having a circular arc-shaped printing plane; a pair of vertical driving means connected to the respective ends of the printing plate so as to drive the printing plate in a vertical direction; and a horizontal driving means connected to the printing plate so as to drive the printing plate in a horizontal direction. The printing plate moves along the path of rotation of a circle having a radius of curvature identical to that of the circular arc of the printing plane of the printing plate through the three-axis mechanism in which the pair of vertical driving means and the horizontal driving means are synchronized with each other, and the printing plane thus tightly contacts and is separated from the substrate to be printed, from one side toward the other side of the substrate, in order to print a pattern.
The present invention relates to a laser-reflective mask and to a method for manufacturing same, and more particularly, to a laser-reflective mask and to a method for fabricating same that can facilitate mask processing and accurately form a pattern by sequentially and repetitively stacking reflective layers having different reflectivities on a baseboard in which reflective layer filling recesses having a predetermined depth are defined therein in a laser beam reflective region, and removing the stacked reflective layers from regions other than the portions filling the reflective layer filling recesses by means of a chemical mechanical polishing (CMP) process, laser beam irradiation, or a lift-off process with an etching solution, in order to form a reflective layer pattern that fills the recesses. The method for manufacturing a laser-reflective mask according to the present invention comprises the steps of: forming a sacrificial layer on a baseboard; forming a sacrificial layer pattern and reflective layer filling recesses having a predetermined depth by forming recesses in the sacrificial layer and the baseboard through an etching process on a region to become a laser beam reflective region on the baseboard; alternatingly and repetitively stacking a first reflective layer and a second reflective layer having mutually different reflectivities on the baseboard, on which the sacrificial layer pattern and the reflective layer filling recess are formed, until the reflective layer recesses are completely filled; forming a reflective layer pattern filling the reflective layer filling recesses by performing a laser lift-off process that irradiates a laser beam on the baseboard from a direction under the baseboard to remove the sacrificial layer pattern and the first and second reflective layers stacked on the sacrificial layer pattern; and removing a residual portion of the sacrificial layer pattern remaining on the baseboard.
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